JP2660226B2 - Heat treatment equipment - Google Patents

Heat treatment equipment

Info

Publication number
JP2660226B2
JP2660226B2 JP63241959A JP24195988A JP2660226B2 JP 2660226 B2 JP2660226 B2 JP 2660226B2 JP 63241959 A JP63241959 A JP 63241959A JP 24195988 A JP24195988 A JP 24195988A JP 2660226 B2 JP2660226 B2 JP 2660226B2
Authority
JP
Japan
Prior art keywords
process tube
heat treatment
plate
opening
main body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63241959A
Other languages
Japanese (ja)
Other versions
JPH01280312A (en
Inventor
伸吾 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of JPH01280312A publication Critical patent/JPH01280312A/en
Application granted granted Critical
Publication of JP2660226B2 publication Critical patent/JP2660226B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67757Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/14Wafer cassette transporting

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Heat Treatment Of Articles (AREA)

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) この発明は、熱処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial application field) The present invention relates to a heat treatment apparatus.

(従来の技術) 半導体の製造において、半導体ウエハ(以下ウエハと
称す)を酸化処理などの処理を行うために使用する縦型
の熱処理装置は、電気ヒータを有する炉体の内部に、プ
ロセスチューブを搬入搬出可能に設け、このプロセスチ
ューブ内にウエハを収容したウエハボートを搬挿入でき
るようにしたものである。
(Prior Art) In the manufacture of semiconductors, a vertical heat treatment apparatus used to perform a process such as an oxidation process on a semiconductor wafer (hereinafter, referred to as a wafer) includes a process tube inside a furnace body having an electric heater. It is provided so that it can be loaded and unloaded so that a wafer boat containing wafers can be loaded into the process tube.

熱処理装置の本体はクリーンルームを有効に利用する
ためスルーザウォール形でパーティションを介してクリ
ーンルームに面するように配置されている。この本体の
クリーンルーム側の領域にはウエハボート出し入れ用の
開口部が設けられる。
The main body of the heat treatment apparatus is arranged in a through-the-wall type so as to face the clean room via a partition in order to effectively use the clean room. An opening for taking in and out the wafer boat is provided in a region on the clean room side of the main body.

このような熱処理装置において、プロセスチューブは
通常炉体内にセットされる。ウエハ移換え位置におい
て、前工程からウエハキャリアにより搬送されたウエハ
を熱処理用ウエハボートに移換える。その後プロセスチ
ューブの下部にボートを配置し、このボートを炉体内の
プロセスチューブにセットし、熱処理を行なう。
In such a heat treatment apparatus, the process tube is usually set in a furnace. At the wafer transfer position, the wafer transported by the wafer carrier from the previous process is transferred to a wafer boat for heat treatment. Thereafter, a boat is placed below the process tube, and the boat is set on the process tube in the furnace, and heat treatment is performed.

この熱処理装置を例えば1週間使用すると、プロセス
チューブの内壁面上に処理残渣が付着し、汚染される。
このプロセスチューブを交換する時は、プロセスチュー
ブを炉本体外の下部側までさげる。その後プロセスチュ
ーブは本体の側面部に設けられたドアを開けて取り出さ
れる。
If this heat treatment apparatus is used, for example, for one week, processing residues adhere to the inner wall surface of the process tube and become contaminated.
When replacing the process tube, lower the process tube to the lower side outside the furnace body. Thereafter, the process tube is taken out by opening a door provided on a side portion of the main body.

また、上記のように構成された熱処理装置において、
従来プロセスチューブを炉体に装着する場合には、プロ
セスチューブを運搬車やフォークリフトなどで炉体の下
側空間部の外部近傍まで搬送して、その箇所で垂直に立
てて待機させる。その後に作業者がプロセスチューブを
持って炉体の上記下側空間部に搬入させ、下側空間部に
設けたエレベータ装置に上記プロセスチューブを載せて
炉体内に上昇搬入し炉体の内部に挿入するようにしてい
る。また、炉体からプロセスチューブを取り出す場合は
エレベータ装置により炉体の下側空間部に下降搬送し、
その後でプロセスチューブを下側空間部の内部から外部
に移動する場合にも、作業者がプロセスチューブを持っ
て移動するようにしている。
Further, in the heat treatment apparatus configured as described above,
Conventionally, when a process tube is mounted on a furnace body, the process tube is transported to the vicinity of the outside of the lower space portion of the furnace body by a truck or a forklift, and stands upright at that location. Thereafter, the worker carries the process tube into the lower space of the furnace body, places the process tube on an elevator device provided in the lower space portion, lifts the process tube into the furnace body, and inserts the inside of the furnace body. I am trying to do it. Also, when removing the process tube from the furnace body, it is transported down to the lower space of the furnace body by an elevator device,
Thereafter, even when the process tube is moved from the inside of the lower space portion to the outside, the operator moves with the process tube.

(発明が解決しようとする課題) しかしながら、プロセスチューブを着脱する際、塵が
発生しその塵がクリーンエアユニットから供給される清
浄な空気により飛散して、開口部よりクリーンルームに
流入されクリーンルームが汚染されるという問題があっ
た。
(Problems to be Solved by the Invention) However, when the process tube is attached and detached, dust is generated, and the dust is scattered by the clean air supplied from the clean air unit, flows into the clean room from the opening, and contaminates the clean room. There was a problem that was.

この発明は上記点に対処してなされたもので、はプロ
セスチューブの取り出し時などに生ずる塵がクリーンル
ーム内に流入するのを防止し、クリーンルームが常にク
リーンな状態を保ち得る熱処理装置を提供するものであ
る。
The present invention has been made in view of the above points, and provides a heat treatment apparatus capable of preventing dust generated at the time of removing a process tube from flowing into a clean room and keeping the clean room always in a clean state. It is.

〔発明の構成〕[Configuration of the invention]

(課題を解決するための手段) この発明の熱処理装置は、クリーンルームとメンテナ
ンスルームとを仕切る仕切り部材と、上部側に炉体が設
けられると共に下部側に被処理体の搬入出領域である空
間部が形成され、この仕切り部材よりもメンテナンスル
ーム側に配置された本体と、前記空間部内の空気雰囲気
を清浄化するために設けられたクリーンエアユニット
と、前記炉体に対し下方側に取り出すことができるよう
に着脱自在に設けられた縦型のプロセスチューブと、前
記空間部とクリーンルームとを連通するように前記本体
に形成された、被処理体の出入口用の開口部と、前記空
間部とメンテナンスルームとの間に設けられ、少なくと
も前記プロセスチューブの搬入出時に開かれるドアと、
を具備し、前記被処理体をボートに保持して前記炉体内
に搬入して熱処理を行なう熱処理装置において、前記開
口部に対して開閉可能に汚染防止板を設け、前記プロセ
スチューブを炉体に対して着脱する時に、前記本体内で
発生した塵によるクリーンルームの汚染を防止するため
に、被処理体の出入口用の開口部を前記汚染防止板によ
り閉じることを特徴とする。
(Means for Solving the Problems) A heat treatment apparatus according to the present invention includes a partition member for partitioning a clean room and a maintenance room, and a space portion in which a furnace body is provided on an upper side and a loading / unloading area of a workpiece is provided on a lower side. Is formed, a main body disposed on the maintenance room side of the partition member, a clean air unit provided for purifying an air atmosphere in the space portion, and a lower portion with respect to the furnace body. A vertical process tube detachably provided so as to be capable of being opened and closed, and an opening for entrance and exit of an object to be processed formed in the main body so as to communicate the space and the clean room; A door that is provided between the room and is opened at least when the process tube is carried in and out;
In a heat treatment apparatus for holding the object to be processed in a boat, carrying it into the furnace, and performing heat treatment, a contamination prevention plate is provided so as to be openable and closable with respect to the opening, and the process tube is mounted on the furnace body. In order to prevent contamination of the clean room due to dust generated in the main body, the opening for opening and closing the object to be processed is closed by the contamination prevention plate.

(作用効果) 本発明の熱処理装置は、炉体の下部側における被処理
体の搬入出領域とクリーンルームとの間の開口部に対し
て、閉時には前記開口部を遮断する防止板を開閉可能に
設けた構成であるため、プロセスチューブの取り出し時
等には、汚染防止板によって開口部を遮断することによ
りクリーンルーム内への塵の流入を防ぐことが出来る。
(Function and Effect) The heat treatment apparatus of the present invention enables the opening and closing of the prevention plate for shutting off the opening when closed with respect to the opening between the loading / unloading area of the object to be processed and the clean room on the lower side of the furnace body. With the configuration, when the process tube is taken out, the opening can be blocked by the contamination prevention plate to prevent dust from flowing into the clean room.

(実施例) 次に、本発明熱処理装置の一実施例を図面を参照して
説明する。
(Example) Next, an example of the heat treatment apparatus of the present invention will be described with reference to the drawings.

第6図に示す如く、熱処理装置本体2の前面にはパネ
ル3が設けられており、このパネル3には開口部4が設
けられている。この開口部4は本体2内部のメンテナン
スルームとクリーンルームとを連通するものである。本
体2内部にはプロセスチューブ6が配置され、また本体
2の前面には扉16が設けられ、この扉16にはピラニー真
空計8、リモートパネル10、温度制御器12、操作板14が
配置されている。また、本体2の上部にはパーティーシ
ョン26が設けられる。このパーティーション26はメンテ
ナンスルームとクリーンルームを仕切るものである。
As shown in FIG. 6, a panel 3 is provided on the front surface of the heat treatment apparatus main body 2, and the panel 3 has an opening 4. The opening 4 connects the maintenance room and the clean room inside the main body 2 to each other. A process tube 6 is disposed inside the main body 2, and a door 16 is provided on the front of the main body 2, and a Pirani vacuum gauge 8, a remote panel 10, a temperature controller 12, and an operation plate 14 are disposed on the door 16. ing. In addition, a partition 26 is provided on the upper part of the main body 2. This partition 26 separates the maintenance room and the clean room.

第7図に示される如く、本体2の側面には、メンテナ
ンスドア18が設けられる他、マニュアル操作時の温度制
御器20、後述するエレベータ装置を制御するエレベータ
制御器22および多数の通気孔24が設けられている。
As shown in FIG. 7, a maintenance door 18 is provided on a side surface of the main body 2, a temperature controller 20 for manual operation, an elevator controller 22 for controlling an elevator device described later, and a large number of ventilation holes 24 are provided. Is provided.

第8図に示される如く本体2の内部上方には抵抗加熱
形ヒータからなる円筒状縦型炉体28が設けられ、この炉
体28の下部に底板29、マニホルド31が設けられ、炉体2
8、マニホルド31に対してほぼ同軸的に昇降自在に石英
製プロセスチューブ6が配置される。
As shown in FIG. 8, a cylindrical vertical furnace body 28 composed of a resistance heater is provided above the inside of the main body 2, and a bottom plate 29 and a manifold 31 are provided below the furnace body 28.
8. A quartz process tube 6 is disposed so as to be able to move up and down substantially coaxially with respect to the manifold 31.

このプロセスチューブ6を挟んで開口部4と対向する
側に清浄な空気を送るクリーンエアユニット33例えば扁
平モータが設けられる。
A clean air unit 33 that sends clean air, for example, a flat motor, is provided on the side facing the opening 4 with the process tube 6 interposed therebetween.

第1図及び第3図に示される如く、本体2のパネル3
には凸部30が形成される。この凸部30にはプーリ32がボ
ルト34によって螺着される。このプーリ32には板バネ36
が巻回され、この板バネ36の一端は防止板(汚染防止
板)38の凸部40に板42を介してボルト44によって螺着さ
れる。
As shown in FIG. 1 and FIG.
Is formed with a convex portion 30. A pulley 32 is screwed to the projection 30 by a bolt 34. This pulley 32 has a leaf spring 36
Is wound, and one end of the leaf spring 36 is screwed to a convex portion 40 of a prevention plate (contamination prevention plate) 38 via a plate 42 by a bolt 44.

この防止板38は開口部4を遮断できるだけの大きさを
有している。
The prevention plate 38 is large enough to block the opening 4.

第4図に示される如く、この防止板38にはガラス板4
6、枠体48、のぞき窓50がボルト52、ナット54を介して
設けられる。
As shown in FIG. 4, this preventing plate 38 has a glass plate 4
6. A frame 48 and a viewing window 50 are provided via bolts 52 and nuts 54.

第5図に示される如く、本体2の一部を構成する角パ
イプ60に対してガイド58が螺着される。このガイド58は
防止板38が移動する場合のガイドをするものである。な
お、ガイド58と防止板38の間にはパッキン59が設けられ
る。このパッキン59は本体2内の密閉性を保持する。さ
らに、防止板38の最下端には取手部62が突設される。こ
の取手部62は人がこれをつまんで防止板38の移動を行な
うためのものである。
As shown in FIG. 5, a guide 58 is screwed to a square pipe 60 constituting a part of the main body 2. The guide 58 guides when the prevention plate 38 moves. Note that a packing 59 is provided between the guide 58 and the prevention plate 38. The packing 59 keeps the inside of the main body 2 airtight. Further, a handle 62 is protruded from the lowermost end of the prevention plate 38. The handle 62 is for a person to pinch it to move the prevention plate 38.

次に、この熱処理装置の動作について説明する。 Next, the operation of the heat treatment apparatus will be described.

防止板38は通常プロセス中はウエハ出し入れ用の開口
部4よりも上部の本体2内部に収納されている。この状
態では開口部4を介して本体2のメンテナンスルームと
クリーンルームとが連通している。
The prevention plate 38 is normally housed inside the main body 2 above the opening 4 for taking in and out the wafer during the process. In this state, the maintenance room and the clean room of the main body 2 communicate with each other through the opening 4.

次に、プロセスチューブ6の着脱等を行なう場合、防
止板38の取手部62を引きさげる。防止板38の上部は板ば
ね36と連結されているので、防止板38が引き下げられる
と、プーリ32に巻回されている板ばね36が巻きほどか
れ、板ばね36と防止板38とが共に下方に移動し防止板38
が第8図に示すように、開口部4を遮断するようにな
る。この状態でプロセスチューブ6の着脱等を行うと、
塵が発生しても、防止板38により塵がクリーンルーム内
に流入することはない。
Next, when attaching or detaching the process tube 6, the handle 62 of the prevention plate 38 is pulled down. Since the upper portion of the prevention plate 38 is connected to the plate spring 36, when the prevention plate 38 is pulled down, the plate spring 36 wound around the pulley 32 is unwound, and both the plate spring 36 and the prevention plate 38 Move down and prevent plate 38
8 blocks the opening 4 as shown in FIG. When the process tube 6 is attached and detached in this state,
Even if dust is generated, the dust does not flow into the clean room due to the prevention plate 38.

プロセスチューブ6の着脱等が完了し、取手部62を押
しあげると、板バネ36がプーリ32によって巻きとられ、
防止板38が引きあげられ、防止板38が再び本体2の上部
に収納される。
When the attachment / detachment of the process tube 6 is completed and the handle portion 62 is pushed up, the leaf spring 36 is wound by the pulley 32,
The prevention plate 38 is pulled up, and the prevention plate 38 is stored in the upper portion of the main body 2 again.

しかして、この熱処理装置によれば、プロセスチュー
ブ6の着脱等により塵の発生がある場合のみ手動により
防止板38を降下させ開口部4を遮断するようにしたので
プロセスチューブ6の着脱等によって塵が発生しても防
止板38により塵がクリーンルーム内に流入することはな
く常にクリーンルーム内を清浄な状態に保つことができ
る。
According to this heat treatment apparatus, the prevention plate 38 is manually lowered to block the opening 4 only when dust is generated due to the attachment / detachment of the process tube 6 or the like. Even if dust occurs, dust does not flow into the clean room due to the prevention plate 38, and the clean room can always be kept in a clean state.

なお、この熱処理装置では、防止板38を手動により移
動した場合について述べたが、モータ等の駆動源を用い
て移動させることもできる。
In this heat treatment apparatus, the case where the prevention plate 38 is manually moved has been described. However, the prevention plate 38 may be moved using a drive source such as a motor.

次にプロセスチューブ6を移動させる機構について説
明する。
Next, a mechanism for moving the process tube 6 will be described.

第2図及び第9図から第11図に示すように、床63に設
置された下板64に架台66が垂設され、この架台66に支持
された底板29に炉体28が設置されており、プロセスチュ
ーブ6を架台66の内部すなわち炉体28の下側空間部にお
いて本体2の内部に対して挿入および取り出しできるよ
うになっている。
As shown in FIGS. 2 and 9 to 11, a gantry 66 is suspended from a lower plate 64 installed on a floor 63, and a furnace body 28 is installed on a bottom plate 29 supported by the gantry 66. In addition, the process tube 6 can be inserted into and taken out of the inside of the main body 2 in the inside of the gantry 66, that is, in the lower space portion of the furnace body 28.

第2図で示すように下板69にはレール68を取り付けた
レール台70が垂直に設けられ、レール台70と並んで送り
ねじ72が軸受け74で支承して垂直に設けられていて、こ
の送りねじ72は底板29に設けられた電動機74で回転され
る。レール68には軸受け76を介して昇降体78が昇降可能
に設けられ、この昇降体78には前記送りねじ72が貫通し
て螺挿されている。昇降体78は水平方向に伸びる腕形を
なしている。これらレール68、送りねじ72、電動機74お
よび昇降体78により第2の昇降手段たるエレベータ装置
が構成されている。
As shown in FIG. 2, a rail base 70 to which a rail 68 is attached is provided vertically on the lower plate 69, and a feed screw 72 is provided vertically along with the rail base 70 by being supported by a bearing 74. The feed screw 72 is rotated by an electric motor 74 provided on the bottom plate 29. An elevating body 78 is provided on the rail 68 via a bearing 76 so as to be able to ascend and descend, and the feed screw 72 is threaded through the elevating body 78. The elevating body 78 has an arm shape extending in the horizontal direction. The rail 68, the feed screw 72, the electric motor 74, and the elevating body 78 constitute an elevator apparatus as second elevating means.

架台66の下板64には送りねじ72の前方に昇降体76を挟
んで一対の支持体80が間隔を存して平行に固設されてお
り、この支持体80の対面する部分には夫々レール82が垂
直に取り付けられている。このレール82には軸受け84を
介して昇降板86が昇降可能に設けてある。なお、昇降板
86は昇降体78の上側に位置し、昇降体78に対応して切欠
部86aが形成されている。
A pair of supports 80 are fixed to the lower plate 64 of the gantry 66 in front of the feed screw 72 in parallel with an elevating body 76 with an interval therebetween. Rails 82 are mounted vertically. A lift plate 86 is provided on the rail 82 via a bearing 84 so as to be able to move up and down. The lifting plate
Reference numeral 86 is located above the elevating body 78, and a cutout portion 86a is formed corresponding to the elevating body 78.

一方の支持体80には電動機88に回転される送りねじ90
が垂直に設けてあり、この送りねじ90には昇降板86に取
り付けた突片92に螺合している。これらレール82、昇降
板86、電動機88および送りねじ90で第1の昇降手段たる
上下動装置が構成されている。
One support 80 has a feed screw 90 which is rotated by an electric motor 88.
The feed screw 90 is screwed to a protruding piece 92 attached to an elevating plate 86. The rail 82, the lifting plate 86, the electric motor 88, and the feed screw 90 constitute a vertical moving device as first lifting means.

また、昇降板86の上面には前記支持体80と平行に一対
のレール92が平行に間隔を存して固設されており、各レ
ール92には夫々アーム94が移動自在に嵌合されている。
このアーム94は連結体94aを介して連結されている。昇
降板86には一方のレール94に隣接してこれと平行に送り
ねじ96が設けてあり、この送りねじ96は軸受け98で支承
されるとともに、電動機100で回転される。送りねじ96
には一方のアーム94に突設した突片102に貫通して螺合
されている。これらアーム94、送りねじ96および電動機
100でスライド手段たるスライド装置が構成されてい
る。
A pair of rails 92 are fixedly mounted on the upper surface of the elevating plate 86 in parallel with the support body 80 at an interval in parallel with each other, and arms 94 are movably fitted to the respective rails 92. I have.
The arm 94 is connected via a connector 94a. The elevating plate 86 is provided with a feed screw 96 adjacent to and parallel to one of the rails 94. The feed screw 96 is supported by a bearing 98 and rotated by an electric motor 100. Lead screw 96
Is screwed through a protruding piece 102 protruding from one arm 94. These arm 94, lead screw 96 and electric motor
Reference numeral 100 denotes a slide device serving as a slide means.

さらに、第9図ないし第11図で示すように架台66の外
部近傍における床63には、前記スライド装置のアーム94
の前進スライド方向の前側に位置して受け渡し台104が
配設されており、受け渡し台104の上面には治具板106が
載せてある。なお、治具板106の幅は前記アーム94の間
隔よりも大きく設定してある。治具板106にはアーム94
に対応する部分の中央に切欠部106aが形成され、この切
欠部106aには着脱治具108が着脱可能に嵌合されてい
る。そして、この着脱治具108には前述したプロセスチ
ューブ6が直立して保持されている。プロセスチューブ
6の下端部には支持リング110が取り付けてあり、この
支持リング110が着脱治具108に嵌合される。
Further, as shown in FIGS. 9 to 11, the floor 63 near the outside of the gantry 66 is provided with an arm 94 of the slide device.
A delivery table 104 is disposed on the front side in the forward slide direction of the vehicle, and a jig plate 106 is placed on the upper surface of the delivery table 104. The width of the jig plate 106 is set larger than the interval between the arms 94. Arm 94 on jig plate 106
A notch 106a is formed at the center of the portion corresponding to the above, and a detachable jig 108 is detachably fitted to this notch 106a. The above-described process tube 6 is held upright by the detachable jig 108. A support ring 110 is attached to the lower end of the process tube 6, and the support ring 110 is fitted to a detachable jig 108.

次に、プロセスチューブ6を本体2の内部に装着する
場合について説明する。
Next, a case where the process tube 6 is mounted inside the main body 2 will be described.

第9図に示すようにプロセスチューブ6を搬送車など
により架台66の外部近傍に設けた受け渡し台104まで搬
送し、受け渡し台104に治具板106を介して設けた着脱治
具108の直立した状態で保持する。次いで、スライド装
置の電動機100の駆動により送りねじ96を回転し、突片1
02を介して一方のアーム94をレール92に沿って架台66か
ら外部に設けた受け渡し台104に向けて水平方向に前進
スライドさせ、同時に連結体94aを介して他方のアーム9
4も一体に前進スライドさせる。これらアームが受け渡
し台104の下方まで前進スライドさせた後に、上下動装
置の電動機88を駆動して送りねじ90を回転させ突片92を
介して昇降板86を上昇させる。昇降板86の上昇によりア
ーム94が上昇し受け渡し台104に載置した治具板106を支
える。すなわち、着脱治具108を介してプロセスチュー
ブ6を支持する。
As shown in FIG. 9, the process tube 6 is transported by a transport vehicle or the like to a transfer table 104 provided near the outside of the gantry 66, and a detachable jig 108 provided on the transfer table 104 via a jig plate 106 stands upright. Keep in state. Next, the feed screw 96 is rotated by driving the electric motor 100 of the slide device,
02, one arm 94 is slid in the horizontal direction from the gantry 66 along the rail 92 toward the transfer table 104 provided outside, and at the same time, the other arm 94 is connected via the connecting body 94a.
4 also slide forward together. After the arms are slid forward to a position below the transfer table 104, the motor 88 of the up / down movement device is driven to rotate the feed screw 90 and raise the elevating plate 86 via the projection 92. The arm 94 is raised by the lifting plate 86 to support the jig plate 106 placed on the transfer table 104. That is, the process tube 6 is supported via the attachment / detachment jig 108.

この状態で電動機100により送りねじ96を逆方向に回
転して、アーム94がレール92に沿って架台66の外部から
内部に向けて水平方甲に後退スライドさせる。これによ
りアーム94に支持された治具板106と着脱治具108に支持
されたプロセスチューブ6が架台66の内部に後退移動す
る(第10図)。
In this state, the feed screw 96 is rotated in the reverse direction by the electric motor 100, and the arm 94 slides back along the rail 92 from the outside to the inside of the gantry 66 to the horizontal instep. This causes the jig plate 106 supported by the arm 94 and the process tube 6 supported by the detachable jig 108 to retreat inside the gantry 66 (FIG. 10).

そして、電動機74を駆動して送りねじ72を回転させ昇
降体78をレール68に沿って上昇させる。昇降体78は上昇
に伴ない昇降板86の切欠部86aを通り治具板106の切欠部
106aに嵌合されている着脱治具108に当ってこれを持ち
上げ治具板106から離し、これによりプロセスチューブ
6を持ち上げる。昇降体78は治具板100の切欠部106aを
抜け、そのまま上昇しプロセスチューブ6を炉本体の内
部に挿入した時点で停止する。ここで、作業車が人手に
よりプロセスチューブ6と支持リング110を架台の上板
に固定する(第11図)。
Then, the electric motor 74 is driven to rotate the feed screw 72 to raise the elevating body 78 along the rail 68. The elevating body 78 passes through the notch 86a of the elevating plate 86 as it rises, and the notch of the jig plate 106
The attachment / detachment jig 108 fitted to 106a is lifted and separated from the jig plate 106, thereby lifting the process tube 6. The elevating body 78 passes through the notch 106a of the jig plate 100, rises as it is, and stops when the process tube 6 is inserted into the furnace main body. Here, the work vehicle manually fixes the process tube 6 and the support ring 110 to the upper plate of the gantry (FIG. 11).

その後電動機74の駆動により送りねじ72を逆回転させ
て昇降体78を最低位置まで下降し、治具板106を昇降体7
8から取り外す。
Thereafter, the feed screw 72 is rotated in the reverse direction by the drive of the electric motor 74 to lower the elevating body 78 to the lowest position, and the jig plate 106 is moved to the elevating body 7.
Remove from 8.

このようにして人手によらずプロセスチューブ6を架
台66の外部から移動して本体2に装着することができ
る。
In this way, the process tube 6 can be moved from the outside of the gantry 66 and attached to the main body 2 without manual operation.

プロセスチューブ6を交換するなどの理由のために本
体2からプロセスチューブ6を取り外す場合には、これ
まで説明した作業順序と逆の順序で作業を行なうことに
より、人手によらずプロセスチューブ6を本体2から架
台66の外部に移動することができる。
When the process tube 6 is detached from the main body 2 for the reason of exchanging the process tube 6 or the like, the operation is performed in a reverse order to the above-described operation order, so that the process tube 6 can be removed without manual operation. 2 to the outside of the gantry 66.

かくして、プロセスチューブ6を人手によらず移動し
て本体に対して装着しおよび取り外しを行なうことがで
き、プロセスチューブ6を移動する作業を容易に行なえ
て経済性が向上できるとともに、安全性を向上させるこ
とができる。
Thus, the process tube 6 can be moved and attached to and detached from the main body without manual operation, and the operation of moving the process tube 6 can be easily performed, thereby improving the economic efficiency and improving the safety. Can be done.

以上説明したようにこの実施例によれば、クリーンル
ーム側に開口部を有する本体と、前記本体内に設けられ
た炉体と、前記炉体に対し昇降自在に設けられたプロセ
スチューブと、前記開口部に対して開閉可能に設けられ
閉時には前記開口部を遮断する防止板とを具備している
ので、、この熱処理装置では、通常時には開口部は防止
板によって遮断されておらず、本体内部のメンテナンス
ルームとクリーンルームとが連通される。プロセスチュ
ーブの着脱時等には防止板によって開口部が遮断される
のでプロセスチューブの着脱時等に発生する塵が防止板
により遮蔽され、クリーンルーム側に流入することはな
いのでクリーンルーム内が清浄な状態に保たれる。
As described above, according to this embodiment, the main body having the opening on the clean room side, the furnace body provided in the main body, the process tube provided to be able to move up and down with respect to the furnace body, and the opening Since the heat treatment apparatus is provided with a preventive plate which is provided to be able to open and close with respect to the portion and shuts off the opening when closed, the opening is not normally shut off by the preventive plate when the heat treatment apparatus is used. The maintenance room and the clean room are communicated. When the process tube is attached / detached, the opening is blocked by the prevention plate, so dust generated when the process tube is attached / detached, etc. is shielded by the prevention plate, and does not flow into the clean room side, so the inside of the clean room is clean. Is kept.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明装置の一実施例を説明するための熱処理
装置の拡大破断側面図、第2図は第1図熱処理装置のプ
ロセスチューブを移動する装置の斜視図、第3図は第1
図をメンテナンスルーム側から見た図、第4図は第1図
の防止板を下方から見た図、第5図は第4図の防止板の
端部の部分拡大図、第6図は第1図熱処理装置の正面
図、第7図は第1図熱処理装置の側面図、第8図は第1
図熱処理装置の一部破断側面図、第9図から第11図は第
1図プロセスチューブを移動する装置の正面図であっ
て、プロセスチューブを本体に装着する場合の作業順序
を示す図である。 2……本体、6……プロセスチューブ、 32……プーリ、38……防止板。
FIG. 1 is an enlarged cutaway side view of a heat treatment apparatus for explaining an embodiment of the apparatus of the present invention, FIG. 2 is a perspective view of an apparatus for moving a process tube of the heat treatment apparatus of FIG. 1, and FIG.
FIG. 4 is a view from the maintenance room side, FIG. 4 is a view of the prevention plate of FIG. 1 from below, FIG. 5 is a partially enlarged view of an end of the prevention plate of FIG. 4, and FIG. 1 is a front view of the heat treatment apparatus, FIG. 7 is a side view of the heat treatment apparatus of FIG. 1, and FIG.
FIG. 9 is a front view of a device for moving a process tube, and FIG. 9 to FIG. 11 are front views of a device for moving a process tube, showing a work sequence when the process tube is mounted on a main body. . 2 ... body, 6 ... process tube, 32 ... pulley, 38 ... prevention plate.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】クリーンルームとメンテナンスルームとを
仕切る仕切り部材と、上部側に炉体が設けられると共に
下部側に被処理体の搬入出領域である空間部が形成さ
れ、この仕切り部材よりもメンテナンスルーム側に配置
された本体と、前記空間部内の空気雰囲気を清浄化する
ために設けられたクリーンエアユニットと、前記炉体に
対し下方側に取り出すことができるように着脱自在に設
けられた縦型のプロセスチューブと、前記空間部とクリ
ーンルームとを連通するように前記本体に形成された、
被処理体の出入口用の開口部と、前記空間部とメンテナ
ンスルームとの間に設けられ、少なくとも前記プロセス
チューブの搬入出時に開かれるドアと、を具備し、前記
被処理体をボートに保持して前記炉体内に搬入して熱処
理を行なう熱処理装置において、 前記開口部に対して開閉可能に汚染防止板を設け、 前記プロセスチューブを炉体に対して着脱する時に、前
記本体内で発生した塵によるクリーンルームの汚染を防
止するために、被処理体の出入口用の開口部を前記汚染
防止板により閉じることを特徴とする熱処理装置。
1. A partition member for separating a clean room from a maintenance room, and a furnace body provided on an upper side and a space portion serving as a carry-in / out area of an object to be processed formed on a lower side. Side, a clean air unit provided for purifying the air atmosphere in the space, and a vertical type detachably provided so that it can be taken out below the furnace body. A process tube, formed in the main body so as to communicate the space and the clean room,
An opening for the entrance of the object to be processed, and a door provided between the space and the maintenance room and opened at least when the process tube is loaded and unloaded, holding the object to be processed in a boat A heat treatment apparatus for carrying out heat treatment by carrying into the furnace body, wherein a contamination prevention plate is provided so as to be openable and closable with respect to the opening, and dust generated in the main body when the process tube is attached to and detached from the furnace body. A heat treatment apparatus, wherein an opening for entrance and exit of the object to be processed is closed by the contamination prevention plate in order to prevent contamination of the clean room by the above.
JP63241959A 1987-09-29 1988-09-27 Heat treatment equipment Expired - Lifetime JP2660226B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP24249787 1987-09-29
JP62-242497 1988-01-27
JP1464288 1988-01-27
JP63-14642 1988-01-27

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP7023516A Division JP2766804B2 (en) 1987-09-29 1995-01-18 Heat treatment equipment

Publications (2)

Publication Number Publication Date
JPH01280312A JPH01280312A (en) 1989-11-10
JP2660226B2 true JP2660226B2 (en) 1997-10-08

Family

ID=26350630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63241959A Expired - Lifetime JP2660226B2 (en) 1987-09-29 1988-09-27 Heat treatment equipment

Country Status (3)

Country Link
US (1) US4976613A (en)
JP (1) JP2660226B2 (en)
KR (1) KR960001161B1 (en)

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Also Published As

Publication number Publication date
KR960001161B1 (en) 1996-01-19
US4976613A (en) 1990-12-11
KR890005832A (en) 1989-05-17
JPH01280312A (en) 1989-11-10

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