JPH0747866Y2 - プラズマ処理装置 - Google Patents
プラズマ処理装置Info
- Publication number
- JPH0747866Y2 JPH0747866Y2 JP1989061437U JP6143789U JPH0747866Y2 JP H0747866 Y2 JPH0747866 Y2 JP H0747866Y2 JP 1989061437 U JP1989061437 U JP 1989061437U JP 6143789 U JP6143789 U JP 6143789U JP H0747866 Y2 JPH0747866 Y2 JP H0747866Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- sample holder
- plasma processing
- temperature
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001020 plasma etching Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004380 ashing Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989061437U JPH0747866Y2 (ja) | 1989-05-26 | 1989-05-26 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989061437U JPH0747866Y2 (ja) | 1989-05-26 | 1989-05-26 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH031531U JPH031531U (OSRAM) | 1991-01-09 |
| JPH0747866Y2 true JPH0747866Y2 (ja) | 1995-11-01 |
Family
ID=31589686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989061437U Expired - Lifetime JPH0747866Y2 (ja) | 1989-05-26 | 1989-05-26 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0747866Y2 (OSRAM) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6132510A (ja) * | 1984-07-25 | 1986-02-15 | Hitachi Ltd | 基板の温度制御機構 |
-
1989
- 1989-05-26 JP JP1989061437U patent/JPH0747866Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH031531U (OSRAM) | 1991-01-09 |
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