JPH0741983A - Electroforming method for master disk of stamper for production of optical recording medium and specific gravity measuring machine and electroforming device used in the method - Google Patents

Electroforming method for master disk of stamper for production of optical recording medium and specific gravity measuring machine and electroforming device used in the method

Info

Publication number
JPH0741983A
JPH0741983A JP19041493A JP19041493A JPH0741983A JP H0741983 A JPH0741983 A JP H0741983A JP 19041493 A JP19041493 A JP 19041493A JP 19041493 A JP19041493 A JP 19041493A JP H0741983 A JPH0741983 A JP H0741983A
Authority
JP
Japan
Prior art keywords
electroforming
specific gravity
liquid
stamper
master
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19041493A
Other languages
Japanese (ja)
Inventor
Hitoshi Yoshino
斉 芳野
Takeshi Santo
剛 三東
Hirofumi Kamitakahara
弘文 上高原
Toshiya Yuasa
俊哉 湯浅
Osamu Shikame
修 鹿目
Naoki Kushida
直樹 串田
Takashi Kai
丘 甲斐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP19041493A priority Critical patent/JPH0741983A/en
Publication of JPH0741983A publication Critical patent/JPH0741983A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To electroform the master disk for a stamper which decreases the variations in the film thickness value and film thickness distribution of an electroforming film by continuously measuring the sp. gr. of an electroforming liquid, replenishing the electroforming liquid with necessary components and maintaining the sp. gr. of the electroforming liquid within a prescribed range. CONSTITUTION:The electroforming liquid is supplied through a filter 10 and a discharge port 11 by a pump 9 for liquid circulation from an electroforming standby vessel 6 into an electroforming main vessel 5 and is again returned from an overflow vessel 14 into the standby vessel 6. Electroforming is executed by applying a DC voltage between an anode 8 and cathode 7 in the electroforming main vessel 5. A floating type sp. gr. measuring machine 1, a pH measuring instrument 17 and a liquid component replenishing device 16 are installed in the standy vessel 6. The sp. gr. of the electroforming liquid is measured by the sp. gr. measuring machine 1. The electroforming liquid is replenished with the necessary components from the replenishing device 16 in accordance with the measured value thereof, to control the sp.gr. of the electroforming liquid within + or -0.001 and to maintain the ion concn. of the electroforming liquid to maintain constant. As a result, the electroformed stamper having the decreased variations in the film thickness and film thickness distribution of the electroforming film is obtd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光記録媒体製造用スタン
パーを製造するための原盤の電鋳方法、同方法に用いる
比重測定機及び電鋳装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of electroforming a master for producing a stamper for producing an optical recording medium, a specific gravity measuring machine and an electroforming apparatus used in the method.

【0002】[0002]

【従来の技術】従来、各種情報の記録には、磁気テー
プ、磁気ディスク等の磁気材料、各種半導体メモリー等
が主として用いられてきた。このような磁気メモリー、
半導体メモリーは情報の書き込み及び読み出しが容易に
行なえるという利点はあるが、反面、情報の内容を容易
に改ざんされたり、また高密度記録ができないという問
題点があった。かかる問題点を解決するために、多種多
様の情報を効率よく取り扱う手段として、光記録媒体に
よる光学的情報記録方法が提案され、そのための光学的
情報記録担体、記録再生方法、記録再生装置が提案され
ている。かかる情報記録担体としての光記録媒体は、一
般にレーザー光を用いて情報記録担体上の光記録層の一
部を揮散させるか、反射率の変化を生じさせるか、ある
いは変形を生じさせて、光学的な反射率や透過率の差に
よって情報を記録し、あるいは再生を行なっている。こ
の場合、光記録層は情報を書き込み後、現像処理等の必
要がなく、「書いた後に直読する」ことのできる、いわ
ゆるDRAW(ダイレクト リード アフター ライ
ト)媒体であり、高密度記録が可能であり、また追加書
き込みも可能であることから、情報の記録・保存媒体と
して有効である。
2. Description of the Related Art Conventionally, magnetic materials such as magnetic tapes and magnetic disks, and various semiconductor memories have been mainly used for recording various information. Magnetic memory like this,
The semiconductor memory has an advantage that information can be written and read easily, but on the other hand, there are problems that the contents of information are easily tampered with and high-density recording cannot be performed. In order to solve such a problem, an optical information recording method using an optical recording medium has been proposed as a means for efficiently handling a wide variety of information, and an optical information recording carrier, a recording / reproducing method, and a recording / reproducing apparatus therefor are proposed. Has been done. The optical recording medium as such an information recording carrier is generally an optical recording medium that volatilizes a part of the optical recording layer on the information recording carrier using a laser beam, causes a change in reflectance, or causes a deformation to produce an optical recording medium. Information is recorded or reproduced by the difference in the typical reflectance or transmittance. In this case, the optical recording layer is a so-called DRAW (direct read after write) medium that can be “read directly after writing” without the need for development processing after writing information, and high density recording is possible. Moreover, since additional writing is possible, it is effective as an information recording / storing medium.

【0003】図3(a),(b)はそれぞれ従来の光記
録媒体(光ディスク、光カード、光テープ等)を示す模
式的断面図である。情報の記録・再生は、トラック溝の
微細な凹凸パターン22を利用してレーザー光の位相差
により位置決めをしながら行なっている。なお、21は
透明樹脂基板、23は光記録層、24はスペーサー、2
5は裏材、26は接着剤層である。一般的な光記録媒体
では、熱可塑性樹脂であるポリカーボネート樹脂やポリ
メチルメタクリル樹脂を、トラックや情報に対応する凹
凸パターン22が記録されているスタンパーを用いて、
その凹凸パターン22を転写してトラック溝を形成して
いる。スタンパーの製造方法としては一般的に、図4に
示すように、平面性よく研磨されたガラス等の基板41
の上に、レジストや感光性樹脂等の樹脂42で所定の深
さにトラック溝等の凹凸パターン43を形成した後(図
4a)、導電膜44を形成し(図4b)、所定の厚さま
で電鋳を行なって電鋳膜45を得、その後凹凸パターン
43から電鋳膜45を剥離して金属スタンパーを得てい
る(図4c)。
FIGS. 3A and 3B are schematic sectional views showing a conventional optical recording medium (optical disk, optical card, optical tape, etc.). Information recording / reproduction is performed while positioning is performed by the phase difference of the laser light using the fine concavo-convex pattern 22 of the track groove. In addition, 21 is a transparent resin substrate, 23 is an optical recording layer, 24 is a spacer, 2
5 is a backing material and 26 is an adhesive layer. In a general optical recording medium, a thermoplastic resin such as polycarbonate resin or polymethylmethacrylate resin is used by using a stamper on which a concavo-convex pattern 22 corresponding to a track or information is recorded.
The uneven pattern 22 is transferred to form a track groove. As a method for manufacturing a stamper, generally, as shown in FIG.
After forming a concavo-convex pattern 43 such as a track groove at a predetermined depth with a resin 42 such as a resist or a photosensitive resin (FIG. 4a), a conductive film 44 is formed (FIG. 4b), and a predetermined thickness is obtained. Electroforming is performed to obtain an electroformed film 45, and then the electroformed film 45 is peeled from the concavo-convex pattern 43 to obtain a metal stamper (FIG. 4c).

【0004】また、従来の電鋳方法では以下のことが行
なわれている。電鋳を行なうときには、電鋳槽の陽極と
陰極の間に邪魔板を挿入して板厚分布を良くすること
(特開昭59−177388、同60−17089、同
61−279699)。ピンホールの防止のために、電
鋳槽に生成する不溶解性酸化物スライムやスマット等の
異物を予備槽に取り除いている(実開昭58−1414
35)。また、電鋳したときの通電治具跡を紫外線硬化
樹脂でシールして、研磨時の研磨剤等のしみ込みを防止
している(特開昭62−209746)。
Further, in the conventional electroforming method, the following is performed. When performing electroforming, a baffle plate should be inserted between the anode and the cathode of the electroforming tank to improve the plate thickness distribution (JP-A-59-177388, JP-A-60-17089, and JP-A-61-2799699). In order to prevent pinholes, foreign substances such as insoluble oxide slime and smut generated in the electroforming tank are removed in the preliminary tank (Actual Development Sho 58-1414).
35). Further, the traces of the current-carrying jig at the time of electroforming are sealed with an ultraviolet curable resin to prevent penetration of an abrasive or the like at the time of polishing (JP-A-62-209746).

【0005】しかしながら、電鋳の膜厚や膜厚分布は、
電鋳を行なっている間の電鋳液中のイオン濃度の変化に
よって変わってしまうという問題点がある。電鋳膜の厚
さが変動しても電鋳膜の裏面を研磨して所定の厚さのス
タンパーを得るためには、電鋳膜のバラツキを見込んで
膜厚を厚く設定して電鋳する必要が生じる。しかし、電
鋳膜厚が厚くなると、その分だけ研磨量が多くなって、
研磨時間が長くなるという問題点がある。電鋳膜の厚み
分布が変動しても面内全部を一定の厚みにするために
は、電鋳したスタンパーの裏面を研磨する前、及び研磨
途中に、電鋳膜の膜厚分布のバラツキを各スタンパー毎
に測定して、スタンパー外周部の盛り上がりの研磨量を
変えて研磨しなければならないという問題点も発生して
いる。そのため、電鋳液のイオン濃度を測定して電鋳を
行なうことも行なわれているが、電鋳液のイオン濃度の
分析には化学定量分析、比色分析等の方法が必要であ
る。これらの方法は、測定精度は良いものの、測定に時
間と労力を要し、断続的にしか測定を行なうことができ
ないため、電鋳を行なっている時間のうち、一部の時間
しか電鋳液のイオン濃度を一定に管理することができ
ず、連続的なイオン濃度の管理ができないという問題点
も発生している。
However, the film thickness and film thickness distribution of electroforming are
There is a problem that it changes depending on the change in ion concentration in the electroforming liquid during electroforming. Even if the thickness of the electroformed film fluctuates, in order to obtain a stamper with a predetermined thickness by polishing the back surface of the electroformed film, the thickness of the electroformed film is set to a large value in consideration of variations in the electroformed film, and then electroforming The need arises. However, as the electroformed film thickness increases, the polishing amount increases correspondingly,
There is a problem that the polishing time becomes long. Even if the thickness distribution of the electroformed film fluctuates, in order to make the entire surface of the electroformed film have a uniform thickness, variations in the film thickness distribution of the electroformed film are produced before and during the polishing of the back surface of the electroformed stamper. There is also a problem that it is necessary to measure for each stamper and change the polishing amount of the bulge on the outer peripheral portion of the stamper to perform polishing. For this reason, electroforming is performed by measuring the ion concentration of the electroforming liquid, but chemical quantitative analysis, colorimetric analysis, and other methods are required to analyze the ion concentration of the electroforming liquid. Although these methods have good measurement accuracy, they require time and labor for measurement and can be measured only intermittently.Therefore, only a part of the time during electroforming is used for electroforming. However, there is also a problem that the ion concentration cannot be controlled to be constant and continuous ion concentration cannot be controlled.

【0006】[0006]

【発明が解決しようとする課題】本発明は上記事情に鑑
みなされたもので、その目的とするところは、電鋳膜の
膜厚値や、膜厚分布のバラツキの少ないスタンパーを製
造することのできる光記録媒体製造用スタンパーの原盤
の電鋳方法、同方法に用いる比重測定機、及び電鋳装置
を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to produce a stamper with less variation in the film thickness value of the electroformed film and the film thickness distribution. An object of the present invention is to provide an electroforming method for a master of a stamper for producing an optical recording medium, a specific gravity measuring machine used in the method, and an electroforming apparatus.

【0007】[0007]

【課題を解決するための手段】上記目的を達成する本発
明は、 (第1の発明)記録すべき情報に対応した凹凸パターン
が形成された原盤に電鋳を行なうことによって光記録媒
体製造用スタンパーを製造する光記録媒体製造用スタン
パーの電鋳方法において、電鋳液の比重を連続的に測定
してその測定値に基づいて必要成分を電鋳液に補充する
ことで、電鋳液の比重を±0.001以内に制御して、
電鋳液のイオン濃度を一定に保ちながら電鋳を行なうこ
とを特徴とする光記録媒体製造用スタンパーの原盤の電
鋳方法である。 (第2の発明)連結杆を比重の異なる複数の環状浮きに
比重の順に摺動自在に挿通してなる電鋳液の比重測定に
用いる比重測定機である。 (第3の発明)電鋳を行なう電鋳本槽と、電鋳液を収納
した電解予備槽と、電鋳液を前記本槽と予備槽の間で循
環させる手段とを少なくとも有する光記録媒体製造用ス
タンパー製造用の原盤の電鋳装置において、予備槽に電
鋳液の比重を連続的に測定してその測定結果を電気信号
として送出する比重測定装置と、前記信号に基づいて電
鋳液に必要成分を電鋳液に補充する補充装置とを付設す
ることにより、電鋳液の比重を連続的に測定して、必要
成分を電鋳液に補充することで電鋳液のイオン濃度を一
定に保ちながら電鋳を行なうように構成したことを特徴
とする光記録媒体製造用のスタンパー製造用の原盤の電
鋳装置で、比重測定装置が浮きの電鋳液中への浸漬度に
よって比重測定を行なうものであると共に、前記浮きの
周囲の少なくとも一部に電鋳液の揺動防止手段を設けた
前記の電鋳装置であることを含む。
The present invention which achieves the above object is intended for manufacturing an optical recording medium by electroforming a master having a concavo-convex pattern corresponding to information to be recorded. In the electroforming method of the optical recording medium manufacturing stamper for manufacturing the stamper, by continuously measuring the specific gravity of the electroforming liquid and replenishing the electroforming liquid with the necessary components based on the measured values, Control the specific gravity within ± 0.001,
This is an electroforming method for a master of a stamper for producing an optical recording medium, which comprises performing electroforming while keeping the ion concentration of the electroforming solution constant. (Second invention) A specific gravity measuring instrument used for measuring the specific gravity of an electroforming liquid, in which a connecting rod is slidably inserted in a plurality of annular floats having different specific gravities in the order of specific gravity. (Third invention) An optical recording medium having at least an electroformed main tank for electroforming, an electrolytic preliminary tank containing an electroforming solution, and a means for circulating the electroformed solution between the main tank and the preliminary tank. In a master electroforming device for manufacturing a stamper, a specific gravity measuring device that continuously measures the specific gravity of the electroforming liquid in a preliminary tank and sends out the measurement result as an electric signal, and the electroforming liquid based on the signal. By additionally installing a replenishing device for replenishing the electroforming liquid with the necessary components, the specific gravity of the electroforming liquid is continuously measured, and the ion concentration of the electroforming liquid can be increased by replenishing the electroforming liquid with the necessary components. An electroforming apparatus for a master disk for manufacturing a stamper for optical recording medium production, characterized in that it is configured to perform electroforming while maintaining a constant value. The measurement is performed and at least the circumference of the float is measured. Comprising a said electroforming apparatus provided with the rocking motion preventing means of the electroformed liquid part.

【0008】以下、本発明を詳細に説明する。The present invention will be described in detail below.

【0009】(第1、第2の発明)図2は、本発明のス
タンパーの電鋳方法を示す概略断面図である。電鋳本槽
5の中に陽極8と陰極7を設置して、陽極8と陰極7の
間に直流電圧をかけて電鋳を行なう。電鋳液は電鋳予備
槽6から液循環用ポンプ9で汲み出され、フィルター1
0、吐出口11を経由して電鋳本槽5内に供給される。
電鋳本槽5に供給された電鋳液は仕切板13より溢れ
て、オーバーフロー槽14を経て再び電鋳予備槽6に戻
る。電鋳予備槽6には浮き式比重測定機1と、pH測定
器17と、液成分補充装置16とが設置されていて、測
定機1によって電鋳実行中に電鋳液の比重を測定する。
電鋳実行中のイオン濃度の変化は主として水やスルファ
ミン酸、ニッケル等の濃度変化であるため、電鋳液のイ
オン濃度の変化は電鋳液の比重とpHを測定していれば
正確に知ることができる。pHと後述する本発明の浮き
式比重測定機1よりイオン濃度を測定して、必要な液成
分を補充して電鋳実行中のイオン濃度を一定に保つ。
(First and Second Inventions) FIG. 2 is a schematic sectional view showing an electroforming method of a stamper of the present invention. An anode 8 and a cathode 7 are installed in the electroforming main tank 5, and a DC voltage is applied between the anode 8 and the cathode 7 to perform electroforming. The electroforming liquid is pumped out of the electroforming preparatory tank 6 by the liquid circulation pump 9, and the filter 1
0, and is supplied into the electroforming main tank 5 via the discharge port 11.
The electroforming liquid supplied to the electroforming main tank 5 overflows from the partition plate 13, passes through the overflow tank 14, and returns to the electroforming preliminary tank 6 again. A floating-type specific gravity measuring device 1, a pH measuring device 17, and a liquid component replenishing device 16 are installed in the electroforming preliminary tank 6, and the measuring device 1 measures the specific gravity of the electroforming liquid during electroforming. .
The change in ion concentration during electroforming is mainly due to the change in concentration of water, sulfamic acid, nickel, etc., so the change in ion concentration of the electroforming liquid can be known accurately if the specific gravity and pH of the electroforming liquid are measured. be able to. The pH and the ion concentration are measured by the floating-type specific gravity measuring device 1 of the present invention described below, and necessary ion components are replenished to keep the ion concentration constant during electroforming.

【0010】図1に示すように浮き式比重測定機1は一
定の比重で釣り合うように作られた複数個の比重計3を
連結杆2を通して縦に繋いで電鋳液中に設置するもので
ある。この方法では電鋳液の比重を測定するときに液の
比重を簡便に測定できる。電鋳液の比重は本発明で用い
ているスルファミン酸ニッケル液では1.200〜1.
350の間で決められた値に設定する。比重の管理幅と
しては0.001単位で測定して、最大幅で0.003
程度の範囲で、より好ましくは±0.001の範囲に制
御しなければならない。そのために本発明で用いる一連
の縦に繋いだ個個の比重計の測定幅は0.001単位で
あることが望ましい。本発明における浮き式比重測定機
1としては、所定の比重を測定するように浮力と重りを
調整してある浮き式比重計であれば、一般に用いられて
いる浮きの中から自由に選択して用いることができる。
この浮き式比重測定機1で電鋳液の比重を測定するとき
に、必要に応じて電鋳液の循環による波の影響防止機
構、すなわち揺動防止手段を設けてもよい。波防止機構
としては一般に用いられている方法の中から自由に選択
して用いることができる。例えば防波堤、波緩和用網等
を用いることができる。液成分補充装置16は、補充液
槽に液成分を入れて、補充量に応じて液成分を電鋳予備
槽6に供給する。
As shown in FIG. 1, a floating-type specific gravity measuring machine 1 is one in which a plurality of specific gravity meters 3 made to be balanced at a constant specific gravity are vertically connected through a connecting rod 2 and installed in an electroforming liquid. is there. According to this method, the specific gravity of the liquid can be easily measured when measuring the specific gravity of the electroforming liquid. The specific gravity of the electroforming liquid is 1.20 to 1.000 in the nickel sulfamate liquid used in the present invention.
Set to a value determined between 350. The control width of specific gravity is measured in 0.001 units, and the maximum width is 0.003
It should be controlled within a range of about 0.001 and more preferably within a range of ± 0.001. Therefore, it is desirable that the measurement width of the series of individually connected hydrometers used in the present invention is 0.001 unit. As the float-type specific gravity measuring machine 1 in the present invention, if it is a float-type specific gravity meter in which buoyancy and weight are adjusted so as to measure a predetermined specific gravity, freely selected from generally used floats. Can be used.
When measuring the specific gravity of the electroforming liquid with the floating-type specific gravity measuring device 1, a mechanism for preventing the influence of waves due to the circulation of the electroforming liquid, that is, a rocking preventing means may be provided as necessary. The wave preventing mechanism can be freely selected from the commonly used methods. For example, a breakwater, a wave relaxation net, or the like can be used. The liquid component replenishing device 16 puts the liquid component in the replenishing liquid tank and supplies the liquid component to the electroforming preliminary tank 6 according to the replenishing amount.

【0011】原盤は一般的に用いられている材料、製法
で製作することができる。例えば研磨したガラス上にレ
ジストで凹凸パターンを形成する方法で製作できる。電
鋳に際して電極と原盤とを電気的に接続する導電リング
は、電気伝導度が大きく、加工し易い材料であれば、一
般的に用いられている材料の中から選択できる。例えば
銅等の金属材料を用いることができる。また原盤を保持
する原盤ホールダーは一般的に用いられているホールダ
ーを使うことができる。ホールダーの材質は電気伝導性
を持って十分な強度を持つ材料、例えばステンレス、チ
タン等の金属材料を用いることができる。上蓋は例えば
ポリメチルメタクリル樹脂、塩化ビニル樹脂等を用いる
ことができる。
The master can be manufactured by a generally used material and manufacturing method. For example, it can be manufactured by a method of forming an uneven pattern with a resist on a polished glass. The conductive ring that electrically connects the electrode and the master during electroforming can be selected from commonly used materials as long as the material has high electrical conductivity and is easy to process. For example, a metal material such as copper can be used. As a master holder for holding the master, a commonly used holder can be used. As the material of the holder, a material having electrical conductivity and sufficient strength, for example, a metal material such as stainless steel or titanium can be used. For the upper lid, for example, polymethylmethacryl resin, vinyl chloride resin or the like can be used.

【0012】電鋳するときの電流密度は電鋳膜の反りや
応力が発生しない範囲で選択することができる。1〜3
0A/dm2 、好ましくは3〜10A/dm2 の範囲で
用いることができる。
The current density at the time of electroforming can be selected within a range in which the electroformed film is not warped or stressed. 1-3
It can be used in the range of 0 A / dm 2 , preferably 3 to 10 A / dm 2 .

【0013】本発明の電鋳スタンパーの製造用の原盤の
電鋳方法によれば、原盤に電鋳を行なうときに、本発明
の一定の比重で釣り合う浮きを複数個電鋳液中に入れ
て、電鋳液の比重を連続的に測定しながら電鋳を行なう
ことによって簡便に比重を測定して、必要成分を電鋳液
に補充することで、電鋳液の比重を連続的に±0.00
1以内に制御しながら電鋳を行なうことによって、電鋳
膜の膜厚及び膜厚分布のバラツキの少ない電鋳スタンパ
ーを製造できるものである。 (第3の発明)第3の発明においては、図2に示す電鋳
装置において、予備槽6には比重測定装置1と液成分補
充装置16が設置されていて、電鋳実行中の電鋳液の各
成分濃度を一定に管理する。
According to the electroforming method of the master for producing the electroforming stamper of the present invention, when electroforming is performed on the master, a plurality of floats balanced with a certain specific gravity of the present invention are put in the electroforming liquid. , The specific gravity of the electroforming liquid is continuously measured within ± 0 by continuously measuring the specific gravity by performing electroforming while continuously measuring the specific gravity of the electroforming liquid and replenishing the necessary components with the electroforming liquid. .00
By performing electroforming while controlling the electroforming to be within 1, it is possible to manufacture an electroformed stamper with less variation in the film thickness and film thickness distribution of the electroformed film. (Third invention) In the third invention, in the electroforming apparatus shown in FIG. 2, the specific gravity measuring device 1 and the liquid component replenishing device 16 are installed in the preliminary tank 6, and the electroforming is being performed. Keep the concentration of each component in the solution constant.

【0014】本発明において、比重測定装置1は一定時
間毎に電鋳予備槽6の電鋳液の比重を測定し、図示しな
いコンピューターに情報を与える。比重値の変化があれ
ば液成分補充装置16から必要な量の液成分を補充す
る。補充量の計算には一般に用いられている制御方法
(ファジイ、PID)を用いることができる。
In the present invention, the specific gravity measuring device 1 measures the specific gravity of the electroforming liquid in the electroforming preparatory tank 6 at regular intervals and gives information to a computer (not shown). If there is a change in the specific gravity, the liquid component replenishing device 16 replenishes the required amount of liquid component. A commonly used control method (fuzzy, PID) can be used to calculate the replenishment amount.

【0015】本発明における比重測定装置1としては、
所定の比重を測定するように浮力と重り調整してある浮
き式比重計であれば、一般に用いられている装置を用い
ることができる。
As the specific gravity measuring device 1 in the present invention,
A commonly used device can be used as long as it is a float-type specific gravity meter in which buoyancy and weight are adjusted so as to measure a predetermined specific gravity.

【0016】比重測定装置1は電鋳液の循環による波の
影響を受けるため、図5(a),(b)で示す波防止堤
防52や波防止網53を設置することができる。波防止
堤防52、波防止網53の長さは、比重測定への波の影
響を防止できるのに必要なだけ比重測定装置1の外周を
覆うことができれば、いずれの長さでも用いることがで
きる。長さが短いと比重測定への波の影響を防止するこ
とができなくなり、長いと比重測定装置1近傍の電鋳液
の循環が悪くなる。比重測定装置1の下面から電鋳液液
面51の上面まで覆うことができる長さがあることが好
ましく、より好ましくは、電鋳液液面51の上から比重
測定装置1の下面よりも比重測定装置1の電鋳液液中部
分長さの1〜10倍の長さが電鋳液中に設置されている
ことである。また、波防止堤防52、波防止網53は、
比重測定への波の影響を防止できるのに必要なだけ比重
測定装置1の外周を覆うことができれば、いずれの割合
で外周を覆うように設置してもよい。比重測定装置1の
外周の1/3〜全周を覆うことができることが好まし
い。比重測定装置1の外周の一部を覆うことは、波防止
堤防52、波防止網53を分割して多数個均等にまたは
波の来る方向のみに設置することができる。その他の方
法として、図6(a),(b)に示すように、電鋳予備
槽4の外側に比重測定槽54を設置することもできる。
比重測定槽54と電鋳予備槽4との間に電鋳液循環の波
を防止するために、細い管55または抵抗体57の付い
た管56を設置して用いてもよい。比重測定槽54の容
量は、比重測定装置1が設置できるだけの容量があれ
ば、いずれの容量の槽でも用いることができる。容量が
大きいと電鋳予備槽4との電鋳液の循環が悪くなり、小
さいと比重測定が正しくできなくなる。比重測定装置1
の電鋳液中に浸漬されている部分の長さの2〜10倍の
深さ、比重測定装置1の5〜100倍の容量があること
が望ましい。細い管55の直径は、比重測定への波の影
響を防止できるだけの抵抗があれば、いずれの直径のも
のでも用いることができる。比重測定装置1の電鋳液中
に浸漬されている部分の長さの1/10〜2倍の範囲の
直径とすることが好ましい。抵抗付き管56も比重測定
への波の影響を防止できる抵抗があれば、いずれの形状
の管でも用いることができる。比重測定装置1の電鋳液
中に浸漬されている部分の長さの1〜10倍の長さを持
ち、管の直径の1/10〜2/3の長さの抵抗を持つ形
状が好ましい。
Since the specific gravity measuring apparatus 1 is affected by waves due to the circulation of the electroforming liquid, it is possible to install the wave prevention bank 52 and the wave prevention net 53 shown in FIGS. 5 (a) and 5 (b). Any length can be used as the length of the wave prevention bank 52 and the wave prevention net 53 as long as the outer circumference of the specific gravity measuring device 1 can be covered as long as necessary to prevent the influence of the wave on the specific gravity measurement. . If the length is short, it is impossible to prevent the influence of waves on the measurement of the specific gravity, and if the length is long, the circulation of the electroforming liquid in the vicinity of the specific gravity measuring device 1 is deteriorated. It is preferable that there is a length that can cover from the lower surface of the specific gravity measuring device 1 to the upper surface of the electroforming liquid surface 51, and more preferably from the upper surface of the electroforming liquid surface 51 to the specific gravity of the lower surface of the specific gravity measuring device 1. That is, a length 1 to 10 times the partial length of the measuring apparatus 1 in the electroforming liquid is installed in the electroforming liquid. In addition, the wave prevention levees 52 and the wave prevention nets 53 are
As long as the outer circumference of the specific gravity measuring device 1 can be covered as necessary to prevent the influence of waves on the specific gravity measurement, the specific gravity measuring device 1 may be installed so as to cover the outer circumference at any ratio. It is preferable that 1/3 to the entire circumference of the specific gravity measuring device 1 can be covered. By covering a part of the outer circumference of the specific gravity measuring device 1, the wave preventing levee 52 and the wave preventing net 53 can be divided and installed evenly or only in the direction in which the waves come. As another method, as shown in FIGS. 6A and 6B, a specific gravity measuring tank 54 can be installed outside the electroforming preliminary tank 4.
A thin tube 55 or a tube 56 with a resistor 57 may be installed and used between the specific gravity measuring tank 54 and the electroforming preliminary tank 4 in order to prevent waves of circulation of the electroforming liquid. As for the capacity of the specific gravity measuring tank 54, any capacity can be used as long as the specific gravity measuring device 1 can be installed. If the volume is large, the circulation of the electroforming liquid with the electroforming preliminary tank 4 is deteriorated, and if it is small, the specific gravity cannot be measured correctly. Specific gravity measuring device 1
It is desirable that the depth is 2 to 10 times the length of the portion immersed in the electroforming liquid and the capacity is 5 to 100 times that of the specific gravity measuring device 1. The diameter of the thin tube 55 can be any diameter as long as it has a resistance capable of preventing the influence of waves on the measurement of specific gravity. The diameter is preferably in the range of 1/10 to 2 times the length of the portion of the specific gravity measuring device 1 immersed in the electroforming liquid. The tube 56 with resistance can also be used in any shape of tube as long as it has a resistance capable of preventing the influence of waves on the measurement of specific gravity. A shape having a length of 1 to 10 times the length of the portion of the specific gravity measuring device 1 immersed in the electroforming liquid and a resistance of 1/10 to 2/3 of the diameter of the pipe is preferable. .

【0017】電鋳液成分補充装置2は図7に示すよう
に、補充液槽31に液成分を入れて、補充量に応じて供
給用ポンプ32を動かして液成分を電鋳予備槽4に供給
する。簡易的には供給用ポンプ32の代わりに電磁弁等
の弁を設置して、補充量に応じて弁を開閉して液成分を
補充してもよい。なお、33は予備槽4に液成分を供給
するパイプである。
As shown in FIG. 7, the electroforming liquid component replenishing device 2 puts the liquid component in the replenishing liquid tank 31 and operates the supply pump 32 according to the replenishing amount to move the liquid component to the electroforming preparatory tank 4. Supply. For simplicity, a valve such as a solenoid valve may be installed in place of the supply pump 32, and the valve may be opened / closed according to the replenishment amount to replenish the liquid component. Reference numeral 33 is a pipe for supplying a liquid component to the preliminary tank 4.

【0018】本発明の光記録媒体製造用スタンパーの原
盤の電鋳方法によれば、原盤の電鋳を行なうときに、電
鋳液の比重を連続的に測定して、必要成分を電鋳液に補
充することで電鋳液の比重を一定に保つ装置を設けて、
電鋳液のイオン濃度を一定に保ちながら電鋳を行なうこ
とによって、電鋳膜の膜厚及び膜厚分布のバラツキの少
ない電鋳スタンパーを製造できるものである。
According to the electroforming method of the master of the stamper for producing an optical recording medium of the present invention, when the master is electroformed, the specific gravity of the electroforming liquid is continuously measured to determine the necessary components. By installing a device to keep the specific gravity of the electroforming liquid constant by replenishing
By performing electroforming while keeping the ion concentration of the electroforming liquid constant, an electroformed stamper with less variation in the film thickness and film thickness distribution of the electroformed film can be manufactured.

【0019】[0019]

【実施例】以下、実施例を示し、第1及び第2の本発明
をさらに具体的に説明するが、本発明はこれらに限定さ
れるものではない。 (実施例1)厚さ10mm、300×340mmのガラ
ス板(旭ガラス)と、同じ大きさで表面にピッチ12μ
m、幅3.0μm、深さ3000Åの凹凸パターンが光
カードの標準フォーマットで形成されたフォトマスク
(HOYA)との間に20μmの厚さに紫外線硬化樹脂
(旭化成工業、A.P.R.)を挟んだ状態で紫外線を
照射して樹脂を硬化させた。硬化後にフォトマスクを外
してガラス原盤を得た。この原盤にスパッターでニッケ
ルを1000Å被覆して導電化をした後、外形φ550
mmの円形状の原盤ホールダーに設置した。導電リング
は厚さ0.5mmの銅板を用いた。陽極としてはニッケ
ル球(ハーショー村田、Sニッケル)をチタンの篭に入
れて、綿布で覆って不溶解物の流失を抑えたものを用い
た。電鋳液としては下記の組成に混合した電鋳液を50
0リットル用いた。電鋳本槽150リットル、予備槽3
50リットル。電鋳装置(日化エンジニアリング、特注
品)に前記電鋳液を入れて、前記電鋳液温度を45℃に
保って、液全体を10回/時間のサイクルで循環させ
た。
EXAMPLES The first and second aspects of the present invention will be described in more detail below with reference to examples, but the present invention is not limited thereto. (Example 1) A glass plate (Asahi Glass) having a thickness of 10 mm and a size of 300 × 340 mm and having the same size and a pitch of 12 μm on the surface.
m, a width of 3.0 μm, and a depth of 3000 Å, and an ultraviolet curable resin (Asahi Kasei Kogyo, A.P.R. The resin was cured by irradiating it with ultraviolet rays in a state of sandwiching). After curing, the photomask was removed to obtain a glass master. This master is coated with 1000 liters of nickel by sputtering to make it conductive, and then the outer diameter φ550
It was installed in a circular master holder of mm. A copper plate having a thickness of 0.5 mm was used as the conductive ring. As the anode, a nickel ball (Harshaw Murata, S nickel) was placed in a titanium basket and covered with a cotton cloth to prevent the insoluble matter from being washed away. As the electroforming liquid, an electroforming liquid mixed with the following composition is used.
0 liter was used. Electroformed main tank 150 liters, spare tank 3
50 liters. The electroforming liquid was put in an electroforming device (Nikka Engineering, custom-made product), the temperature of the electroforming liquid was kept at 45 ° C., and the whole liquid was circulated at a cycle of 10 times / hour.

【0020】電鋳液組成は下表のものであった。The composition of the electroforming liquid was as shown in the table below.

【0021】[0021]

【表1】 浮き式比重計としては外形100mm、内径30mmの
ドーナツ状の中空のガラス管に所定の比重で釣り合うよ
うに鉛の粒を入れてからガラス管を封止した。前記浮き
式比重計は測定比重として1.280から1.290ま
で0.001単位で11個製作した。前記11個の比重
計を直径25mmのガラス棒に通した。この11個連の
比重測定機を図1に示すように電鋳装置の予備槽に設置
した。前記比重計の電鋳液循環による波の影響を防止す
る堤防として、厚さ1mmの透明塩化ビニル樹脂(筒中
プラスチック)を300×600mmに切断して、長辺
側を筒形状にして前記一連の比重計を覆うように設置し
た。一連の比重計では目視で容易に電鋳液の比重を測定
することができた。液の循環を行なわないで電鋳液の比
重を測定すると1.285であった。液循環を行なって
から比重の測定を行なうと、測定値の誤差は最大で0.
001であった。電鋳液の比重を前記一連の比重計で測
定を行なって、必要に応じて液成分補充装置から純水を
必要量だけ供給して、比重を常に一定化するようにし
た。電鋳実行中の電鋳液の比重は設定値1.285に対
して、常に±0.001以内に保たれた。
[Table 1] As a float-type specific gravity meter, a donut-shaped hollow glass tube having an outer diameter of 100 mm and an inner diameter of 30 mm was filled with lead particles so as to be balanced with a predetermined specific gravity, and then the glass tube was sealed. Eleven floating-type pycnometers having a specific gravity of 1.280 to 1.290 were manufactured in 0.001 units. The eleven hydrometers were passed through a glass rod having a diameter of 25 mm. This 11-unit specific gravity measuring machine was installed in a preliminary tank of an electroforming apparatus as shown in FIG. As a bank to prevent the influence of waves due to the circulation of the electroforming liquid of the pycnometer, a transparent vinyl chloride resin (plastic in a cylinder) having a thickness of 1 mm is cut into 300 × 600 mm, and the long side is formed into a cylindrical shape. It was installed so as to cover the hydrometer. With a series of densitometers, the specific gravity of the electroforming liquid could be easily measured visually. When the specific gravity of the electroforming liquid was measured without circulating the liquid, it was 1.285. When the specific gravity is measured after circulating the liquid, the error in the measured value is at most 0.
It was 001. The specific gravity of the electroforming liquid was measured with the above-described series of densitometers, and if necessary, pure water was supplied from the liquid component replenishing device in the required amount so that the specific gravity was always kept constant. The specific gravity of the electroforming liquid during electroforming was always kept within ± 0.001 with respect to the set value of 1.285.

【0022】前記原盤と原盤ホールダーを用いて、前記
比重測定機を用いて電鋳液のイオン濃度を一定に保っ
て、原盤と陽極間の電流密度としては、最初は0.1A
/dm 2 で30分間流してから、5A/dm2 まで電流
密度を上げて、12000A・分の積算電流値になるま
で電鋳を行なって、250μmの厚さの電鋳スタンパー
を得た。
Using the master and the master holder,
Keep the ion concentration of the electroforming liquid constant using a specific gravity measuring machine.
The current density between the master and anode is 0.1A at first.
/ Dm 2 For 30 minutes, then 5 A / dm2 Up to current
Increase the density until the integrated current value of 12000A · min is reached.
Electroformed stamping with a thickness of 250 μm
Got

【0023】10枚の電鋳を終了した後、各原盤の電鋳
膜厚を測定してみると、各原盤とも、原盤中央部で25
0±5μm、外周部で290±10μmで面内の膜厚分
布は良好で、かつ各原盤の膜厚のバラツキは中央部、外
周部ともに最大で10μmで、十分小さかった(ミツト
ヨ、マイクロメーター)。 (実施例2)実施例1と同じ原盤、同じ原盤ホールダ
ー、同じ導電リング、同じ電鋳装置、同じ陽極、同じ電
鋳液、同じ波防止堤防を用いた。実施例1と同じドーナ
ツ形状の浮き式比重計を実施例1と同じ11個用いた。
11個の浮き式比重計を測定比重別に3つに分けて、3
本の芯棒(連結杆)を用いてそれぞれの芯棒に比重計を
通した。浮き式比重計の分け方は(1.280,1.2
83,1.286,1.289)、(1.281,1.
284,1.287,1.290)、(1.282,
1.285,1.288)のように測定比重の近い浮き
式比重計が、同じ芯棒に通らないようにした。この3本
の芯棒を通した一連の比重測定機をそれぞれ実施例1と
同じ方法で電鋳予備槽に設置した。実施例1と同じよう
に測定を行なうと、電鋳液の比重は1.285であっ
た。測定誤差は最大0.001であった。電鋳液の比重
の測定は極めて容易に行なうことができた。実施例1と
同じ電流条件で電鋳を行なった。電鋳実行中の比重は設
定値1.285に対して、±0.001以内に保たれ
た。
After the electroforming of 10 sheets was completed, the electroformed film thickness of each master was measured and found to be 25 at the center of each master.
The in-plane film thickness distribution was good at 0 ± 5 μm and 290 ± 10 μm at the outer peripheral part, and the variation in the film thickness of each master was 10 μm at the maximum in both the central part and the outer peripheral part, which was sufficiently small (Mitutoyo, micrometer). . (Embodiment 2) The same master, the same master holder, the same conductive ring, the same electroforming apparatus, the same anode, the same electroforming liquid, and the same wave preventing dike as in Example 1 were used. The same donut-shaped floating type hydrometer as in Example 1 was used as in Example 1.
11 floating type hydrometers are divided into 3 by measurement specific gravity and 3
A hydrometer was passed through each core rod using a core rod (connecting rod). How to divide the floating hydrometer (1.280, 1.2
83, 1.286, 1.289), (1.281, 1.
284, 1.287, 1.290), (1.282,
A floating type hydrometer having a similar measurement specific gravity such as 1.285, 1.288) is prevented from passing through the same core rod. A series of specific gravity measuring machines, through which these three core rods were passed, were installed in the electroforming preliminary tank in the same manner as in Example 1. When measured in the same manner as in Example 1, the specific gravity of the electroforming liquid was 1.285. The maximum measurement error was 0.001. The specific gravity of the electroforming liquid could be measured extremely easily. Electroforming was performed under the same current conditions as in Example 1. The specific gravity during the electroforming was kept within ± 0.001 with respect to the set value of 1.285.

【0024】実施例1と同じように10枚の原盤の電鋳
を行なって電鋳膜の厚さを測定してみると、各原盤と
も、原盤中央部250±10μmで、外周部ともに28
2±10μmで面内の膜厚分布は十分良く、かつ各原盤
の膜厚のバラツキは中央部、外周部ともに最大で10μ
mで、十分小さかった。
When 10 masters were electroformed in the same manner as in Example 1 to measure the thickness of the electroformed film, each master had a master central part of 250 ± 10 μm and an outer peripheral part of 28 mm.
The film thickness distribution within the plane is sufficiently good at 2 ± 10 μm, and the variation in film thickness of each master is 10 μm at the maximum in both the central part and the outer peripheral part.
m was small enough.

【0025】以下、実施例を示し第3の本発明をさらに
具体的に説明する。 (実施例3)厚さ10mm、300×340mmのガラ
ス板(旭ガラス)と、同じ大きさで表面にピッチ12μ
m、幅3.0μm、深さ3000Åの凹凸パターンが光
カードの標準フォーマットで形成されたフォトマスク
(HOYA)との間に50μmの厚さに紫外線硬化樹脂
(旭化成工業、A.P.R.)を挟んだ状態で紫外線を
照射して樹脂を硬化させた。硬化後にフォトマスクを外
してガラス原盤を得た。この原盤に、スパッターでニッ
ケルを1000Å被覆して導電化をした後、250×2
90mmの四角い開口部を上蓋に持つ、外形φ550m
mの円形状の原盤ホールダーに設置した。開口部には角
度10度、長さ10mmのテーパー部を設けた。導電リ
ングは厚さ0.5mm、外形φ550mmの銅板に、2
90×330mmの四角い穴を設けて製作した。陽極と
してはニッケル球(ハーショー村田、Sニッケル)をチ
タンの篭に入れて、綿布で覆ってごみの流失を抑えたも
のを用いた。電鋳液としては下記の組成に混合した電鋳
液を500リットル用いて、電鋳槽150リットル、予
備槽350リットルの電鋳装置(日化エンジニアリン
グ、特注品)に入れて、液温度45℃で、液全体を10
回/時間のサイクルで循環させた。
Hereinafter, the third aspect of the present invention will be described more specifically with reference to examples. (Example 3) A glass plate (Asahi Glass) having a thickness of 10 mm and a size of 300 x 340 mm and having the same size and a pitch of 12 µ on the surface.
m, width 3.0 μm, and depth 3,000 Å concave-convex pattern with a photomask (HOYA) formed in a standard format of an optical card, and an ultraviolet curable resin (Asa Kasei Kogyo, A.P.R. The resin was cured by irradiating it with ultraviolet rays in a state of sandwiching). After curing, the photomask was removed to obtain a glass master. This master was coated with 1000 liters of nickel by sputtering to make it conductive, and then 250 x 2
External shape φ550m with 90mm square opening on top lid
It was installed in a circular master holder of m. The opening was provided with a taper portion having an angle of 10 degrees and a length of 10 mm. The conductive ring is a copper plate with a thickness of 0.5 mm and an outer diameter of 550 mm.
It was manufactured by forming a square hole of 90 × 330 mm. As the anode, a nickel ball (Harshaw Murata, S-nickel) was placed in a titanium basket and covered with a cotton cloth to prevent dust from flowing away. As an electroforming liquid, 500 liters of an electroforming liquid mixed with the following composition was put into an electroforming device (Nikka Engineering, custom-made product) with an electroforming tank of 150 liters and a reserve tank of 350 liters, and a liquid temperature of 45 ° C. Then, the whole liquid is 10
It was circulated in a cycle of times / hour.

【0026】電鋳液組成を下表に示した。The composition of the electroforming liquid is shown in the table below.

【0027】[0027]

【表2】 予備槽には浮き式比重計(マルコム、MD−02)と波
防止堤防として、厚さ1mmの塩化ビニル樹脂(筒中プ
ラスチック)を300×600mmに切断して、長辺側
を筒形状にして比重計の外周全周を覆うように設置し
た。電鋳実施前に液循環をしないで電鋳液の比重を測定
すると1.285であった。液循環を行なって比重の測
定を行なうと、測定値の誤差は最大で±0.001であ
った。比重計の出力を1分間隔でデジタル化してコンピ
ューター(HP、9000/310)に取り込み、以下
のルールのファジイ制御を行なって、コンピューターで
電磁弁(CKD、EMB51−15−4)を開閉して、
液成分の補充装置から純水を必要量だけ供給して、比重
を常に一定化するようにした。電鋳実行中の電鋳液の比
重は設定値1.285に対して、常に±0.001以内
に保たれた。
[Table 2] As a floating hydrometer (Malcolm, MD-02) and a wave prevention levee in the spare tank, cut vinyl chloride resin (plastic in a cylinder) with a thickness of 1 mm into 300 × 600 mm, and make the long side into a cylindrical shape to give a specific gravity. It was installed so as to cover the entire circumference of the meter. The specific gravity of the electroforming liquid was 1.285 when the liquid was not circulated before electroforming. When the specific gravity was measured by circulating the liquid, the error in the measured value was ± 0.001 at maximum. The output of the pycnometer is digitized at 1-minute intervals and is taken into a computer (HP, 9000/310), fuzzy control of the following rules is performed, and the computer opens and closes the solenoid valve (CKD, EMB51-15-4). ,
The required amount of pure water was supplied from the liquid component replenishing device to keep the specific gravity constant. The specific gravity of the electroforming liquid during electroforming was always kept within ± 0.001 with respect to the set value of 1.285.

【0028】if 比重=EQorN then
補充量=ZERO if 比重=PS then 補充量=PS if 比重=PB then 補充量=PB 前件部、EQ:設定値と同じ、N:設定値以下、PS:
設定値から少し高い、PB:設定値から大きく高い。
If specific gravity = EQorN then
Replenishment amount = ZERO if Specific gravity = PS then Replenishment amount = PS if Specific gravity = PB then Replenishment amount = PB Antecedent part, EQ: same as set value, N: below set value, PS:
A little higher than the set value, PB: Greatly higher than the set value.

【0029】後件部、ZERO:補充しない、PS:少
し補充する、PB:大きく補充する。
Consequent part, ZERO: no replenishment, PS: little replenishment, PB: large replenishment.

【0030】原盤と陽極間の電流密度は、最初は0.1
A/dm2 で30分間流してから、5A/dm2 まで電
流密度を上げて、12000A・分の積算電流値になる
まで電鋳を行なって、250μmの厚さの電鋳スタンパ
ーを得た。
The current density between the master and the anode is initially 0.1.
Since flowing in A / dm 2 30 minutes, by increasing the current density to 5A / dm 2, by performing electroforming to a cumulative current value of 12000 A · minute, to obtain a stamper electroforming thickness of 250 [mu] m.

【0031】10枚電鋳終了後、各原盤の電鋳膜厚を測
定してみると、各原盤とも、原盤中央部で250±5μ
m、外周部で290±10μmで面内の膜厚分布はよ
く、かつ各原盤の膜厚のバラツキは中央部、外周部とも
に最大で10μmで、十分小さかった(マイクロメータ
ー、ミツトヨ)。 (実施例4)実施例3と同じ原盤、同じ原盤ホールダ
ー、同じ導電リング、同じ電鋳装置、同じ陽極、同じ電
鋳液を用いた。波防止用網としてメッシュのステンレス
材料の網を400×200mmの長さに3枚切断して、
各切断した網の短辺どうしを5mmの間隔を開けて銅線
で、輪になるように繋ぎ合わせた。実施例3と同じ比重
計、液成分補充装置、コンピュータを用いた制御システ
ムを用いた。電鋳液の比重は電鋳実施前に液循環を止め
て測定すると1.285であった。液循環させながら比
重を測定しても、測定誤差は±0.001であった。実
施例3と同じ電流条件で電鋳を行なった。電鋳実行中の
比重は設定値1.285に対して±0.001以内に保
たれた。
After the electroforming of 10 sheets was completed, the electroformed film thickness of each master was measured and found to be 250 ± 5 μm at the center of each master.
m, the outer peripheral portion was 290 ± 10 μm, the in-plane film thickness distribution was good, and the variation in the film thickness of each master was 10 μm at the maximum in both the central portion and the outer peripheral portion, which was sufficiently small (micrometer, Mitutoyo). (Example 4) The same master, the same master holder, the same conductive ring, the same electroforming apparatus, the same anode, and the same electroforming liquid as in Example 3 were used. As a wave prevention net, cut three mesh nets of stainless material into a length of 400 x 200 mm,
The short sides of each of the cut nets were connected with a copper wire at a distance of 5 mm so as to form a loop. The same densitometer, liquid component replenishing device, and control system using a computer as in Example 3 were used. The specific gravity of the electroforming liquid was 1.285 as measured by stopping the liquid circulation before the electroforming. Even when the specific gravity was measured while circulating the liquid, the measurement error was ± 0.001. Electroforming was performed under the same current conditions as in Example 3. The specific gravity during electroforming was kept within ± 0.001 with respect to the set value of 1.285.

【0032】実施例3と同じように10枚の原盤の電鋳
を行なって電鋳膜の厚さを測定してみると、各原盤と
も、原盤中央部で250±10μmで、外周部ともに2
82±10μmで面内の膜厚分布は十分よく、かつ各原
盤の膜厚のバラツキは中央部、外周部ともに最大で10
μmで、十分小さかった。 (実施例5)実施例3と同じ原盤、同じ原盤ホールダ
ー、同じ導電リング、同じ電鋳装置、同じ陽極、同じ電
鋳液を用いた。電鋳補助槽の側面に容積5リットル、深
さ500mmの直方体の比重測定槽を設け、直径30m
m、長さ150mmの細い管を10本用いて、電鋳補助
槽と比重測定槽を繋いだ。実施例1と同じ比重測定機を
比重測定用に設置した。実施例1と同じ液成分補充装
置、コンピュータを用いた制御システムを用いた。電鋳
液の比重は電鋳実施前に液循環を止めて測定すると1.
285であった。液循環をさせながら比重を測定して
も、測定誤差は±0.001であった。実施例1と同じ
電流条件で電鋳を行なった。電鋳実行中の比重は設定値
1.285に対して±0.001以内に保たれた。
When the thickness of the electroformed film was measured by electroforming 10 masters in the same manner as in Example 3, it was 250 ± 10 μm at the center of each master and 2 at both outer circumferences.
82 ± 10 μm, the in-plane film thickness distribution is sufficiently good, and the variation of the film thickness of each master is 10 at maximum in both the central part and the outer peripheral part.
μm was sufficiently small. (Example 5) The same master, the same master holder, the same conductive ring, the same electroforming apparatus, the same anode, and the same electroforming liquid as in Example 3 were used. A rectangular parallelepiped specific gravity measuring tank with a volume of 5 liters and a depth of 500 mm is installed on the side surface of the electroforming auxiliary tank, and the diameter is 30 m.
An electroforming auxiliary tank and a specific gravity measuring tank were connected using 10 thin tubes each having a length of m and a length of 150 mm. The same specific gravity measuring machine as in Example 1 was installed for measuring specific gravity. The same liquid component replenishing device as in Example 1 and the control system using a computer were used. The specific gravity of the electroforming liquid is measured by stopping the liquid circulation before performing the electroforming.
It was 285. Even when the specific gravity was measured while circulating the liquid, the measurement error was ± 0.001. Electroforming was performed under the same current conditions as in Example 1. The specific gravity during electroforming was kept within ± 0.001 with respect to the set value of 1.285.

【0033】実施例3と同じように10枚の原盤の電鋳
を行なって電鋳膜の厚さを測定してみると、各原盤と
も、原盤中央部で250±7μmで、外周部ともに28
0±10μmで面内の膜厚分布は十分よく、かつ各原盤
の膜厚のバラツキは中央部、外周部ともに最大で10μ
mで、十分小さかった。 (比較例1)実施例3と同じ原盤、同じ原盤ホールダ
ー、同じ導電リング、同じ電鋳装置、同じ陽極、同じ電
鋳液を用いた。液成分補充装置は設置しないで、実施例
3と同じ電流条件で、同じ積算電流まで電鋳を行なっ
た。比重測定装置で電鋳液の比重測定を行なった。電鋳
実施前は1.285であったが、電鋳終了時には1.2
96にまで上昇していた。
When 10 masters were electroformed in the same manner as in Example 3 and the thickness of the electroformed film was measured, each master had 250 ± 7 μm at the center of the master and 28 at the outer periphery.
The film thickness distribution in the plane is sufficiently good at 0 ± 10 μm, and the variation of the film thickness of each master is 10 μm at the maximum in both the central part and the outer peripheral part.
m was small enough. (Comparative Example 1) The same master, the same master holder, the same conductive ring, the same electroforming apparatus, the same anode, and the same electroforming liquid as in Example 3 were used. No liquid component replenishing device was installed, and electroforming was performed under the same current conditions as in Example 3 up to the same integrated current. The specific gravity of the electroforming liquid was measured with a specific gravity measuring device. It was 1.285 before electroforming, but 1.2 at the end of electroforming.
It had risen to 96.

【0034】実施例3と同じように10枚の原盤を電鋳
して、各原盤の電鋳膜の厚さを測定してみると、中央部
で230±50μmで、外周部ともに340±70μm
で、原盤ごとの電鋳膜の厚さのバラツキが大きい。また
実施例1,3〜5と比較して外周部の膜厚が厚くなって
膜厚分布も悪くなっていた。
As in Example 3, ten masters were electroformed, and the thickness of the electroformed film of each master was measured. The thickness was 230 ± 50 μm at the center and 340 ± 70 μm at the outer periphery.
Therefore, there is a large variation in the thickness of the electroformed film for each master. Further, as compared with Examples 1 and 3 to 5, the film thickness of the outer peripheral portion was thicker and the film thickness distribution was worse.

【0035】[0035]

【発明の効果】本発明によれば、原盤に電鋳を行なうと
きに、一定の比重で釣り合う浮きを複数個電鋳液中にい
入れて、電鋳液の比重を連続的に測定しながら電鋳を行
なうことによって簡便に比重を測定して、必要な液成分
を補充でき、電鋳液のイオン濃度を連続的に精度よく制
御することができる。さらに電鋳液の比重を±0.00
1以内に制御して電鋳液のイオン濃度を一定に保って電
鋳することで、電鋳膜の膜厚値及び膜厚分布のバラツキ
の少ない電鋳スタンパーを得られるという効果がある。
According to the present invention, when electroforming is performed on a master, a plurality of floats balanced with a constant specific gravity are put in the electroforming liquid to continuously measure the specific gravity of the electroforming liquid. By performing electroforming, the specific gravity can be easily measured, necessary liquid components can be replenished, and the ion concentration of the electroforming liquid can be continuously and accurately controlled. Furthermore, the specific gravity of the electroforming liquid is ± 0.00
By controlling within 1 and performing electroforming while keeping the ion concentration of the electroforming liquid constant, it is possible to obtain an electroforming stamper with less variation in the film thickness value and film thickness distribution of the electroformed film.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の比重測定機の一例を用いて比重測定を
している状態を示す概略説明図である。
FIG. 1 is a schematic explanatory view showing a state in which specific gravity is measured using an example of the specific gravity measuring device of the present invention.

【図2】本発明の電鋳装置の一実施例を示す構成図であ
る。
FIG. 2 is a configuration diagram showing an embodiment of an electroforming apparatus of the present invention.

【図3】従来の光記録媒体の二つの例(a),(b)を
示す概略断面図である。
FIG. 3 is a schematic cross-sectional view showing two examples (a) and (b) of a conventional optical recording medium.

【図4】従来のスタンパーの製造方法の一例を示す工程
図である。
FIG. 4 is a process drawing showing an example of a conventional stamper manufacturing method.

【図5】(a),(b)はそれぞれ本発明に用いる比重
測定装置の波防止具の一例を示す概略説明図である。
5 (a) and 5 (b) are schematic explanatory views each showing an example of a wave preventive tool of the specific gravity measuring apparatus used in the present invention.

【図6】(a),(b)はそれぞれ本発明に用いる比重
測定装置の波防止装置の一例を示す概略説明図である。
6A and 6B are schematic explanatory views each showing an example of the wave prevention device of the specific gravity measuring device used in the present invention.

【図7】本発明に用いる電鋳液成分補充装置の一例を示
す概略構成図である。
FIG. 7 is a schematic configuration diagram showing an example of an electroforming liquid component replenishing device used in the present invention.

【符号の説明】[Explanation of symbols]

1 浮き式比重測定機 2 芯棒 3 比重計 4 電鋳液 5 電鋳本槽 6 電鋳予備槽 7 陰極 8 陽極 9 電鋳液循環用ポンプ 10 電鋳液濾過フィルター 11 吐出口 12 バッフル板 13 仕切板A 14 オーバーフロー槽 15 仕切板B 16 液成分補充装置 21 透明樹脂基板 22 凹凸パターン 23 光記録層 24 スペーサー 25 裏材 26 接着剤層 31 補充液槽 32 補充液供給用ポンプ 33 パイプ 41 平板 42 レジスト層 43 凹凸パターン 44 導電膜 45 電鋳膜 51 電鋳液液面 52 波防止堤防 53 波防止網 54 比重測定槽 55 細い管 56 抵抗付き管 57 抵抗体 1 Floating-type specific gravity measuring device 2 Core rod 3 Density meter 4 Electroforming liquid 5 Electroforming main tank 6 Electroforming preliminary tank 7 Cathode 8 Anode 9 Electroforming liquid circulation pump 10 Electroforming liquid filter 11 Discharge port 12 Baffle plate 13 Partition plate A 14 Overflow tank 15 Partition plate B 16 Liquid component replenishing device 21 Transparent resin substrate 22 Uneven pattern 23 Optical recording layer 24 Spacer 25 Backing material 26 Adhesive layer 31 Replenishing liquid tank 32 Replenishing liquid supply pump 33 Pipe 41 Flat plate 42 Resist layer 43 Concavo-convex pattern 44 Conductive film 45 Electroformed film 51 Electroformed liquid level 52 Wave prevention bank 53 Wave prevention network 54 Specific gravity measuring tank 55 Thin tube 56 Resistive tube 57 Resistor

───────────────────────────────────────────────────── フロントページの続き (72)発明者 湯浅 俊哉 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 鹿目 修 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 串田 直樹 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 甲斐 丘 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiya Yuasa 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Osamu Kaname 3-30-2 Shimomaruko, Ota-ku, Tokyo Kya Non-Incorporated (72) Inventor Naoki Kushida 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Kai-Oka 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 記録すべき情報に対応した凹凸パターン
が形成された原盤に電鋳を行なうことによって光記録媒
体製造用スタンパーを製造する光記録媒体製造用スタン
パーの電鋳方法において、電鋳液の比重を連続的に測定
してその測定値に基づいて必要成分を電鋳液に補充する
ことで、電鋳液の比重を±0.001以内に制御して、
電鋳液のイオン濃度を一定に保ちながら電鋳を行なうこ
とを特徴とする光記録媒体製造用スタンパーの原盤の電
鋳方法。
1. An electroforming solution for a stamper for producing an optical recording medium, which comprises producing a stamper for producing an optical recording medium by electroforming a master having an uneven pattern corresponding to information to be recorded. By continuously measuring the specific gravity of and replenishing the electroforming liquid with necessary components based on the measured values, the specific gravity of the electroforming liquid is controlled within ± 0.001,
An electroforming method for a master of a stamper for manufacturing an optical recording medium, which comprises performing electroforming while maintaining a constant ion concentration of the electroforming liquid.
【請求項2】 連結杆を比重の異なる複数の環状浮きに
比重の順に摺動自在に挿通してなる請求項1記載の電鋳
液の比重測定に用いる比重測定機。
2. The specific gravity measuring machine used for measuring the specific gravity of an electroforming liquid according to claim 1, wherein the connecting rod is slidably inserted into a plurality of annular floats having different specific gravities in the order of specific gravity.
【請求項3】 電鋳を行なう電鋳本槽と、電鋳液を収納
した電解予備槽と、電鋳液を前記本槽と予備槽の間で循
環させる手段とを少なくとも有する光記録媒体製造用ス
タンパー製造用の原盤の電鋳装置において、予備槽に電
鋳液の比重を連続的に測定してその測定結果を電気信号
として送出する比重測定装置と、前記信号に基づいて電
鋳液の必要成分を電鋳液に補充する補充装置とを付設す
ることにより、電鋳液の比重を連続的に測定して、必要
成分を電鋳液に補充することで電鋳液のイオン濃度を一
定に保ちながら電鋳を行なうように構成したことを特徴
とする光記録媒体製造用のスタンパー製造用の原盤の電
鋳装置。
3. An optical recording medium manufacturing method comprising at least an electroforming main tank for electroforming, an electrolytic preliminary tank containing an electroforming solution, and means for circulating the electroforming solution between the main tank and the preliminary tank. In the electroforming device of the master for manufacturing stamper, the specific gravity measuring device that continuously measures the specific gravity of the electroforming liquid in the preliminary tank and sends out the measurement result as an electric signal, and the electroforming liquid based on the signal. By installing a replenishment device that replenishes the electroforming liquid with the necessary components, the specific gravity of the electroforming liquid can be continuously measured, and the ion concentration of the electroforming liquid can be kept constant by replenishing the electroforming liquid with the necessary components. An electroforming apparatus for a master for manufacturing a stamper for manufacturing an optical recording medium, which is configured to perform electroforming while maintaining the above.
【請求項4】 比重測定装置が浮きの電鋳液中への浸漬
度によって比重測定を行なうものであると共に、前記浮
きの周囲の少なくとも一部に電鋳液の揺動防止手段を設
けた請求項3に記載の電鋳装置。
4. The specific gravity measuring device measures the specific gravity by the degree of immersion of the float in the electroforming liquid, and at least a part of the periphery of the float is provided with means for preventing the rocking of the electroforming liquid. Item 3. The electroforming apparatus according to Item 3.
JP19041493A 1993-07-30 1993-07-30 Electroforming method for master disk of stamper for production of optical recording medium and specific gravity measuring machine and electroforming device used in the method Pending JPH0741983A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19041493A JPH0741983A (en) 1993-07-30 1993-07-30 Electroforming method for master disk of stamper for production of optical recording medium and specific gravity measuring machine and electroforming device used in the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19041493A JPH0741983A (en) 1993-07-30 1993-07-30 Electroforming method for master disk of stamper for production of optical recording medium and specific gravity measuring machine and electroforming device used in the method

Publications (1)

Publication Number Publication Date
JPH0741983A true JPH0741983A (en) 1995-02-10

Family

ID=16257747

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH0741983A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980040721A (en) * 1996-11-29 1998-08-17 안기훈 Method for manufacturing mold for glass molding and apparatus for manufacturing same
JP2012041600A (en) * 2010-08-18 2012-03-01 Morioka Seiko Instruments Inc Method for manufacturing electroformed component

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980040721A (en) * 1996-11-29 1998-08-17 안기훈 Method for manufacturing mold for glass molding and apparatus for manufacturing same
JP2012041600A (en) * 2010-08-18 2012-03-01 Morioka Seiko Instruments Inc Method for manufacturing electroformed component

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