JPH0735564B2 - 耐食性と密着性とに優れた金属表面薄膜の形成方法 - Google Patents

耐食性と密着性とに優れた金属表面薄膜の形成方法

Info

Publication number
JPH0735564B2
JPH0735564B2 JP1216011A JP21601189A JPH0735564B2 JP H0735564 B2 JPH0735564 B2 JP H0735564B2 JP 1216011 A JP1216011 A JP 1216011A JP 21601189 A JP21601189 A JP 21601189A JP H0735564 B2 JPH0735564 B2 JP H0735564B2
Authority
JP
Japan
Prior art keywords
metal
film
thin film
forming
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1216011A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0382747A (ja
Inventor
寛 山形
Original Assignee
ワイケイケイ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ワイケイケイ株式会社 filed Critical ワイケイケイ株式会社
Priority to JP1216011A priority Critical patent/JPH0735564B2/ja
Priority to US07/565,556 priority patent/US5024721A/en
Priority to DE4025615A priority patent/DE4025615A1/de
Publication of JPH0382747A publication Critical patent/JPH0382747A/ja
Publication of JPH0735564B2 publication Critical patent/JPH0735564B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP1216011A 1989-08-24 1989-08-24 耐食性と密着性とに優れた金属表面薄膜の形成方法 Expired - Fee Related JPH0735564B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1216011A JPH0735564B2 (ja) 1989-08-24 1989-08-24 耐食性と密着性とに優れた金属表面薄膜の形成方法
US07/565,556 US5024721A (en) 1989-08-24 1990-08-10 Method of forming metal surface thin film having high corrosion resistance and high adhesion
DE4025615A DE4025615A1 (de) 1989-08-24 1990-08-13 Verfahren zur erzeugung eines duennen metalloberflaechenfilms mit einer hohen korrosionsbestaendigkeit und einer guten haftung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1216011A JPH0735564B2 (ja) 1989-08-24 1989-08-24 耐食性と密着性とに優れた金属表面薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPH0382747A JPH0382747A (ja) 1991-04-08
JPH0735564B2 true JPH0735564B2 (ja) 1995-04-19

Family

ID=16681905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1216011A Expired - Fee Related JPH0735564B2 (ja) 1989-08-24 1989-08-24 耐食性と密着性とに優れた金属表面薄膜の形成方法

Country Status (3)

Country Link
US (1) US5024721A (enExample)
JP (1) JPH0735564B2 (enExample)
DE (1) DE4025615A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9320310D0 (en) * 1993-10-01 1993-11-17 Kodak Ltd Production of carriers for surface plasmon resonance
US5728431A (en) * 1996-09-20 1998-03-17 Texas A&M University System Process for forming self-assembled polymer layers on a metal surface
JP2009173975A (ja) * 2008-01-22 2009-08-06 Canon Anelva Corp 金属微粒子の生成方法、金属含有ペーストの製造方法及び金属薄膜配線の形成方法
CN103014628B (zh) * 2012-12-31 2014-12-31 厦门建霖工业有限公司 一种金属基材全干法拉丝表面处理的方法
DE102015106811B4 (de) 2015-04-30 2022-02-03 VON ARDENNE Asset GmbH & Co. KG Verwendung einer Folienstruktur in einem Energiespeicher und Energiespeicher

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829969A (en) * 1969-07-28 1974-08-20 Gillette Co Cutting tool with alloy coated sharpened edge
US4428812A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds

Also Published As

Publication number Publication date
US5024721A (en) 1991-06-18
DE4025615C2 (enExample) 1992-04-09
JPH0382747A (ja) 1991-04-08
DE4025615A1 (de) 1991-02-28

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees