JPH0734926Y2 - イオン処理装置 - Google Patents
イオン処理装置Info
- Publication number
- JPH0734926Y2 JPH0734926Y2 JP1988137289U JP13728988U JPH0734926Y2 JP H0734926 Y2 JPH0734926 Y2 JP H0734926Y2 JP 1988137289 U JP1988137289 U JP 1988137289U JP 13728988 U JP13728988 U JP 13728988U JP H0734926 Y2 JPH0734926 Y2 JP H0734926Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- ion
- holder
- sample
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 51
- 238000000034 method Methods 0.000 claims description 9
- 238000011282 treatment Methods 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000005468 ion implantation Methods 0.000 description 18
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000002513 implantation Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988137289U JPH0734926Y2 (ja) | 1988-10-20 | 1988-10-20 | イオン処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988137289U JPH0734926Y2 (ja) | 1988-10-20 | 1988-10-20 | イオン処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0257956U JPH0257956U (enExample) | 1990-04-26 |
| JPH0734926Y2 true JPH0734926Y2 (ja) | 1995-08-09 |
Family
ID=31398578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988137289U Expired - Fee Related JPH0734926Y2 (ja) | 1988-10-20 | 1988-10-20 | イオン処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0734926Y2 (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60185657U (ja) * | 1984-05-17 | 1985-12-09 | 三洋電機株式会社 | 薄膜形成装置 |
-
1988
- 1988-10-20 JP JP1988137289U patent/JPH0734926Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0257956U (enExample) | 1990-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |