JPH0734922Y2 - 移動成膜式スパッタリング装置 - Google Patents

移動成膜式スパッタリング装置

Info

Publication number
JPH0734922Y2
JPH0734922Y2 JP1989022358U JP2235889U JPH0734922Y2 JP H0734922 Y2 JPH0734922 Y2 JP H0734922Y2 JP 1989022358 U JP1989022358 U JP 1989022358U JP 2235889 U JP2235889 U JP 2235889U JP H0734922 Y2 JPH0734922 Y2 JP H0734922Y2
Authority
JP
Japan
Prior art keywords
substrate
sputtering
target
shutter
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989022358U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02115562U (cs
Inventor
淳一郎 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1989022358U priority Critical patent/JPH0734922Y2/ja
Publication of JPH02115562U publication Critical patent/JPH02115562U/ja
Application granted granted Critical
Publication of JPH0734922Y2 publication Critical patent/JPH0734922Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP1989022358U 1989-02-27 1989-02-27 移動成膜式スパッタリング装置 Expired - Lifetime JPH0734922Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989022358U JPH0734922Y2 (ja) 1989-02-27 1989-02-27 移動成膜式スパッタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989022358U JPH0734922Y2 (ja) 1989-02-27 1989-02-27 移動成膜式スパッタリング装置

Publications (2)

Publication Number Publication Date
JPH02115562U JPH02115562U (cs) 1990-09-17
JPH0734922Y2 true JPH0734922Y2 (ja) 1995-08-09

Family

ID=31240403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989022358U Expired - Lifetime JPH0734922Y2 (ja) 1989-02-27 1989-02-27 移動成膜式スパッタリング装置

Country Status (1)

Country Link
JP (1) JPH0734922Y2 (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09209127A (ja) * 1996-02-05 1997-08-12 Idemitsu Kosan Co Ltd 真空蒸着装置およびその真空蒸着装置を用いた有機エレクトロルミネッセンス素子の製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6045031B2 (ja) * 2013-05-13 2016-12-14 株式会社島津製作所 成膜装置
CN117836463A (zh) * 2021-09-28 2024-04-05 芝浦机械株式会社 表面处理装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194454U (cs) * 1987-12-10 1989-06-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09209127A (ja) * 1996-02-05 1997-08-12 Idemitsu Kosan Co Ltd 真空蒸着装置およびその真空蒸着装置を用いた有機エレクトロルミネッセンス素子の製造方法

Also Published As

Publication number Publication date
JPH02115562U (cs) 1990-09-17

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