JPH0728695Y2 - イオン注入装置 - Google Patents
イオン注入装置Info
- Publication number
- JPH0728695Y2 JPH0728695Y2 JP1988058229U JP5822988U JPH0728695Y2 JP H0728695 Y2 JPH0728695 Y2 JP H0728695Y2 JP 1988058229 U JP1988058229 U JP 1988058229U JP 5822988 U JP5822988 U JP 5822988U JP H0728695 Y2 JPH0728695 Y2 JP H0728695Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- detection electrode
- ion detection
- ions
- waveform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000002500 ions Chemical class 0.000 claims description 221
- 238000001514 detection method Methods 0.000 claims description 116
- 238000010884 ion-beam technique Methods 0.000 claims description 60
- 238000005468 ion implantation Methods 0.000 claims description 16
- 230000001133 acceleration Effects 0.000 description 18
- 238000004458 analytical method Methods 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 238000002513 implantation Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 3
- -1 boron ion Chemical class 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988058229U JPH0728695Y2 (ja) | 1988-04-27 | 1988-04-27 | イオン注入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988058229U JPH0728695Y2 (ja) | 1988-04-27 | 1988-04-27 | イオン注入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01160653U JPH01160653U (enrdf_load_html_response) | 1989-11-08 |
| JPH0728695Y2 true JPH0728695Y2 (ja) | 1995-06-28 |
Family
ID=31284053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988058229U Expired - Lifetime JPH0728695Y2 (ja) | 1988-04-27 | 1988-04-27 | イオン注入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0728695Y2 (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7453059B2 (en) * | 2006-03-10 | 2008-11-18 | Varian Semiconductor Equipment Associates, Inc. | Technique for monitoring and controlling a plasma process |
| US11476084B2 (en) * | 2019-09-10 | 2022-10-18 | Applied Materials, Inc. | Apparatus and techniques for ion energy measurement in pulsed ion beams |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5132353U (enrdf_load_html_response) * | 1974-08-30 | 1976-03-09 | ||
| JPS59173939A (ja) * | 1983-03-23 | 1984-10-02 | Univ Nagoya | 飛行時間型イオン質量分析装置 |
-
1988
- 1988-04-27 JP JP1988058229U patent/JPH0728695Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01160653U (enrdf_load_html_response) | 1989-11-08 |
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