JPH07268073A - Epoxy resin composition for sealing semiconductor - Google Patents

Epoxy resin composition for sealing semiconductor

Info

Publication number
JPH07268073A
JPH07268073A JP6159894A JP6159894A JPH07268073A JP H07268073 A JPH07268073 A JP H07268073A JP 6159894 A JP6159894 A JP 6159894A JP 6159894 A JP6159894 A JP 6159894A JP H07268073 A JPH07268073 A JP H07268073A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
substituted
groups
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6159894A
Other languages
Japanese (ja)
Inventor
Kazuya Shigeno
数也 滋野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP6159894A priority Critical patent/JPH07268073A/en
Publication of JPH07268073A publication Critical patent/JPH07268073A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To obtain an epoxy resin composition improved in storage stability at ordinary temperatures without detriment to electrical properties by mixing a specified epoxy resin with a specified phenolic compound curing agent and a specified trisubstituted phosphine-trisubstituted borane compound and an inorganic filler. CONSTITUTION:An epoxy resin having at least two epoxy groups is mixed with a curing agent comprising a phenolic compound having at least two hydroxyl groups and used in such an amount that the ratio of the epoxy equivalent of the epoxy resin to the hydroxyl equivalent of the phenolic compound is nearly 1; 1, 0.1-1.5wt.% trisubstituted phosphine-trisubstituted borane compound represented by the formula [wherein R1 to R8 are a 1-8C alkyl or a(substituted) phenyl] and 60-90wt.% inorganic filler.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は常温保存性に優れた半導
体封止用エポキシ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in storage stability at room temperature.

【0002】[0002]

【従来の技術】エポキシ樹脂は耐熱性、耐湿性、電気特
性、接着性などに優れており、電気絶縁材料、塗料、接
着剤など幅広い分野で使用されている。ダイオード、ト
ランジスタ、集積回路等の電子部品についても熱硬化性
樹脂が使われ、特にIC、LSIといった集積回路で
は、耐熱性、耐湿性に優れたオルソクレゾールノボラッ
ク型エポキシ樹脂に硬化剤としてノボラック型フェノー
ル樹脂を配合し、これに更に無機充填材を多量に加えた
エポキシ樹脂組成物が一般的に用いられておる。このエ
ポキシ樹脂組成物を用いて半導体装置をトランスファ成
形機でモールドする方式は、生産性等が優れる点で、現
在半導体装置を樹脂封止する場合の主流技術である。
2. Description of the Related Art Epoxy resins are excellent in heat resistance, moisture resistance, electrical characteristics, adhesiveness and the like, and are used in a wide variety of fields such as electrical insulating materials, paints and adhesives. Thermosetting resins are also used for electronic parts such as diodes, transistors, and integrated circuits. Especially in integrated circuits such as ICs and LSIs, orthocresol novolac epoxy resin, which has excellent heat resistance and moisture resistance, is used as a curing agent for novolac phenols. An epoxy resin composition in which a resin is blended and a large amount of an inorganic filler is further added thereto is generally used. A method of molding a semiconductor device with a transfer molding machine using the epoxy resin composition is a mainstream technique for resin-sealing a semiconductor device because of its excellent productivity.

【0003】このエポキシ樹脂組成物には、モールド時
に硬化を促進するために硬化促進剤としてアミン類、イ
ミダゾール化合物やジアザビシクロウンデセン等の含窒
素複素環式化合物、オルガノホスフィン化合物、第4級
アンモニウムあるいはホスホニウム化合物等が使用され
ている。一般に使用される硬化促進剤は比較的低温でも
促進効果を示すことから、例えば樹脂と他の成分を混合
する際の加熱もしくは発熱によって樹脂の硬化を進行さ
せるほか、混合後室温で保管する間にも硬化反応が進む
ため、溶融粘度の上昇や流動性低下による硬化性のバラ
ツキ等を生じやすいので、成形上の障害や成形品の機械
的、電気的特性の低下の原因となっている。従ってこの
ような硬化促進剤を使用する場合、他の成分との混合時
の品質管理を厳重にし、しかも保管や運搬の際には低温
に保ち、更に成形条件の厳密な管理などの煩雑さを避け
て通ることはできなかった。
In this epoxy resin composition, amines, nitrogen-containing heterocyclic compounds such as imidazole compounds and diazabicycloundecene, organophosphine compounds and quaternary compounds are used as curing accelerators to accelerate curing during molding. Ammonium or phosphonium compounds are used. Since commonly used curing accelerators have an accelerating effect even at relatively low temperatures, for example, curing of the resin can be promoted by heating or heat generation when the resin and other components are mixed, and during storage at room temperature after mixing. However, since the curing reaction progresses, variations in curability due to an increase in melt viscosity and a decrease in fluidity are likely to occur, which causes obstacles in molding and deterioration of mechanical and electrical characteristics of a molded product. Therefore, when using such a curing accelerator, strict quality control is required when mixing with other components, and the temperature is kept low during storage and transportation, and the complexity of strict control of molding conditions is required. I couldn't avoid it.

【0004】そのため近年比較的低温では樹脂の硬化反
応を余り促進せず、成形時に金型中で加熱された際に硬
化反応を著しく促進させるといった潜在性硬化促進剤の
開発が行なわれているが、この場合でも潜在性が低いた
めに前述したような問題を生じたり、逆に潜在性が高す
ぎるために、通常の成形条件では硬化に長時間要した
り、硬化温度を高くしなければならないといった問題が
あり、要求を満足するような硬化促進剤の開発が急務と
なっている。
Therefore, in recent years, a latent curing accelerator has been developed, which does not accelerate the curing reaction of the resin at a relatively low temperature but significantly accelerates the curing reaction when heated in a mold during molding. However, even in this case, the potential is low and the above-mentioned problems occur. Conversely, the potential is too high, so that it takes a long time to cure under normal molding conditions or the curing temperature must be increased. Therefore, there is an urgent need to develop a curing accelerator that satisfies the requirements.

【0005】[0005]

【発明が解決しようとする課題】本発明はこのような状
況に鑑みて種々の検討の結果なされたもので、その目的
とするところは電気的特性等を劣化させることなく、常
温保存性に優れた半導体封止用エポキシ樹脂組成物を提
供することにある。
SUMMARY OF THE INVENTION The present invention has been made as a result of various studies in view of such a situation, and its object is excellent in storage stability at room temperature without deteriorating electrical characteristics and the like. Another object is to provide an epoxy resin composition for semiconductor encapsulation.

【0006】[0006]

【課題を解決するための手段】本発明は、(A)少なく
とも2個以上のエポキシ基を有するエポキシ樹脂、
(B)少なくとも2個以上の水酸基を有するフェノール
化合物硬化剤、(C)式(1)で示されるトリ置換ホス
フィン・トリ置換ボラン化合物、
The present invention provides (A) an epoxy resin having at least two epoxy groups,
(B) a phenol compound curing agent having at least two hydroxyl groups, (C) a tri-substituted phosphine / tri-substituted borane compound represented by the formula (1),

【0007】[0007]

【化2】 (式中のR1〜R6は炭素数1〜8のアルキル基、フェニ
ル基又は置換フェニル基の中から選択される同一もしく
は異なる基)
[Chemical 2] (R 1 to R 6 in the formula are the same or different groups selected from an alkyl group having 1 to 8 carbon atoms, a phenyl group or a substituted phenyl group)

【0008】(D)無機充填材を必須成分とする半導体
封止用エポキシ樹脂組成物である。
(D) An epoxy resin composition for semiconductor encapsulation containing an inorganic filler as an essential component.

【0009】以下本発明について詳細に説明する。本発
明に用いられるトリ置換ホスフィン・トリ置換ボラン化
合物は硬化促進剤である。式中のR1〜R6は炭素数1〜
8のアルキル基、フェニル基又は置換フェニル基の中か
ら選択される同一もしくは異なる基である。具体的に
は、トリフェニルホスフィン・トリフェニルボラン、ト
リフェニルホスフィン・エチルジフェニルボラン、トリ
フェニルホスフィン・トリエチルボラン、トリフェニル
ホスフィン・トリブチルボラン、トリブチルホスフィン
・トリブチルボラン、トリブチルホスフィン・トリエチ
ルボラン、トリブチルホスフィン・トリフェニルボラ
ン、トリトリルホスフィン・トリフェニルボラン等があ
り、これらは単独でも、混合して用いてもよい。これら
の中ではトリフェニルホスフィン・トリフェニルボラ
ン、トリフェニルホスフィン・トリブチルボランが好ま
しい。これらの硬化促進剤は高温で極めて大きい硬化促
進作用を発揮するため、この硬化促進剤の配合量は全樹
脂組成物中に0.1〜1.5重量%である。0.1重量
%未満だと硬化不足により離型性が悪いという問題があ
り、1.5重量%を越えると保存性が悪化する問題を生
じる。
The present invention will be described in detail below. The tri-substituted phosphine / tri-substituted borane compound used in the present invention is a curing accelerator. In the formula, R 1 to R 6 are each a carbon number of 1 to
8 are the same or different groups selected from an alkyl group, a phenyl group and a substituted phenyl group. Specifically, triphenylphosphine / triphenylborane, triphenylphosphine / ethyldiphenylborane, triphenylphosphine / triethylborane, triphenylphosphine / tributylborane, tributylphosphine / tributylborane, tributylphosphine / triethylborane, tributylphosphine / tributylphosphine / tributylborane Examples thereof include triphenylborane, tritolylphosphine and triphenylborane, and these may be used alone or in combination. Among these, triphenylphosphine / triphenylborane and triphenylphosphine / tributylborane are preferable. Since these curing accelerators exert an extremely large curing acceleration effect at high temperatures, the content of the curing accelerator is 0.1 to 1.5% by weight based on the total resin composition. If it is less than 0.1% by weight, there is a problem that the releasability is poor due to insufficient curing, and if it exceeds 1.5% by weight, there is a problem that storage stability is deteriorated.

【0010】次に本発明に用いるエポキシ樹脂は、少な
くとも2個以上のエポキシ基を有するエポキシ樹脂なら
ば特に限定するものではないが、例えばフェノールノボ
ラック、クレゾールノボラック、ビスフェノールA、ビ
スフェノールFなどのフェノール類のグリシジルエーテ
ル、ポリエチレングリコール、ポリプロピレングリコー
ルなどのアルコール類のグリシジルエーテル、イソフタ
ル酸、フタル酸、テトラヒドロフタル酸などのカルボン
酸類のグリシジルエステル、アニリン、イソシアヌール
酸などの窒素原子に結合した活性水素をグリシジル基で
置換したもの等のグリシジル型エポキシ樹脂、分子内の
オレフィン結合を過酸等でエポキシ化して得られるよう
な脂環型エポキシ等の内、室温で固体状のエポキシ樹脂
が用いられる。これらの固体状のエポキシ樹脂の内で
は、特にクレゾールノボラック、フェノールノボラック
などのグリシジルエーテル類が好適である。又、これら
の固体状エポキシ樹脂は液状のエポキシ樹脂と併用して
もよい。
Next, the epoxy resin used in the present invention is not particularly limited as long as it is an epoxy resin having at least two epoxy groups. For example, phenols such as phenol novolac, cresol novolac, bisphenol A and bisphenol F. Glycidyl ethers, glycidyl ethers of alcohols such as polyethylene glycol and polypropylene glycol, glycidyl esters of carboxylic acids such as isophthalic acid, phthalic acid and tetrahydrophthalic acid, aniline and isocyanuric acid. Among the glycidyl type epoxy resins such as those substituted with a group, and the alicyclic epoxies obtained by epoxidizing the olefinic bond in the molecule with peracid or the like, the solid epoxy resin at room temperature is used. Among these solid epoxy resins, glycidyl ethers such as cresol novolac and phenol novolac are particularly preferable. Further, these solid epoxy resins may be used in combination with a liquid epoxy resin.

【0011】本発明に用いるフェノール化合物硬化剤
は、少なくとも2個以上の水酸基を有するフェノール化
合物ならば、特に限定するものでないが、例えばビスフ
ェノールA、ビスフェノールFといった2官能のフェノ
ール化合物やフェノール、クレゾール、キシレノール等
のフェノール類とホルムアルデヒド等のアルデヒドとを
酸性触媒で縮合させて得られるノボラック類及びアルケ
ニルフェノールの重合物等が挙げられる。前述のエポキ
シ樹脂とフェノール化合物は、エポキシ樹脂のエポキシ
当量とフェノール化合物の水酸基当量との比がほぼ1対
1になるように配合することが望ましい。
The phenol compound curing agent used in the present invention is not particularly limited as long as it is a phenol compound having at least two hydroxyl groups. For example, a bifunctional phenol compound such as bisphenol A or bisphenol F, phenol, cresol, Examples thereof include novolaks obtained by condensing phenols such as xylenol and aldehydes such as formaldehyde with an acidic catalyst, and alkenylphenol polymers. The above-mentioned epoxy resin and phenol compound are preferably blended so that the ratio of the epoxy equivalent of the epoxy resin to the hydroxyl equivalent of the phenol compound is approximately 1: 1.

【0012】本発明で用いる無機充填材としては、溶融
シリカ粉末、球状シリカ粉末、結晶シリカ粉末、2次凝
集シリカ粉末、多孔質シリカ粉末、2次凝集シリカ粉末
または多孔質シリカ粉末を粉砕したシリカ粉末などのシ
リカ粉、アルミナなどが一般的に用いられ、他に炭酸カ
ルシウム、ケイ酸カルシウム、タルク、クレー、マイ
カ、ガラス繊維粉などがある。これらの無機充填材は単
独でも混合して用いてもよく、又配合量としては組成物
全体に対して60〜90重量%の範囲で用いることが望
ましい。60重量%未満だと半田クラック、耐湿性等の
性能が低下し、90重量%を越えると流動性が低下し、
充填性が悪くなる等の問題が生じる。
As the inorganic filler used in the present invention, fused silica powder, spherical silica powder, crystalline silica powder, secondary agglomerated silica powder, porous silica powder, secondary agglomerated silica powder or silica obtained by crushing porous silica powder is used. Silica powder such as powder, alumina and the like are generally used, and in addition, there are calcium carbonate, calcium silicate, talc, clay, mica, glass fiber powder and the like. These inorganic fillers may be used alone or as a mixture, and the compounding amount is preferably in the range of 60 to 90% by weight based on the whole composition. If it is less than 60% by weight, the performance such as solder cracking and moisture resistance is deteriorated, and if it exceeds 90% by weight, the fluidity is deteriorated.
Problems such as poor filling properties occur.

【0013】本発明のエポキシ樹脂組成物には必要に応
じて、難燃剤としてブロム化エポキシ樹脂等の各種のハ
ロゲン化化合物、三酸化アンチモン、無機水和物、離型
剤としてカルナバワックス、モンタン酸ワックスやポリ
アルキレン系ワックス等、カップリング剤として各種の
シラン系化合物、チタン系化合物、アルミニウムキレー
ト系化合物等が用いられる。更に着色剤してカーボンブ
ラック、ベンガラ、酸化チタン、鉛丹、群青、各種の油
性染料なども用いることができる。また、本発明の封止
用エポキシ樹脂組成物を成形材料として製造するには、
エポキシ樹脂、フェノール樹脂硬化剤、無機充填材、そ
の他の添加剤をミキサー等によって充分に均一に混合し
た後、更に熱ロール又はニーダー等で溶融混練し、冷却
後粉砕して成形材料とすることができる。これらの成形
材料は電子部品あるいは電気部品の封止、被覆、絶縁等
に適用することができる。
The epoxy resin composition of the present invention may optionally contain various halogenated compounds such as brominated epoxy resin as a flame retardant, antimony trioxide, an inorganic hydrate, and carnauba wax and montanic acid as a release agent. As the coupling agent, various silane compounds, titanium compounds, aluminum chelate compounds, etc. are used such as wax and polyalkylene wax. Further, as a colorant, carbon black, red iron oxide, titanium oxide, red lead, ultramarine blue, various oil dyes and the like can be used. Further, in order to produce the encapsulating epoxy resin composition of the present invention as a molding material,
Epoxy resin, phenolic resin curing agent, inorganic filler, and other additives are sufficiently and uniformly mixed by a mixer or the like, and then melt-kneaded with a hot roll or a kneader, and after cooling, crushed to obtain a molding material. it can. These molding materials can be applied to sealing, coating, insulating, etc. of electronic parts or electric parts.

【0014】以下本発明を実施例で具体的に説明する。 実施例1 O−クレゾールノボラック型エポキシ樹脂(エポキシ当量:200g/eq、 軟化点:70℃) 100重量部 フェノールノボラック樹脂硬化剤(水酸基当量:106g/eq、軟化点:8 5℃) 57重量部 トリフェニルホスフィン・トリフェニルボラン 1.5重量部 ブロム化ビスフェノールA型エポキシ樹脂(エポキシ当量:400g/eq、 軟化点:85℃) 16重量部 三酸化アンチモン 3.5重量部 溶融シリカ粉末 465重量部 カップリング剤(エポキシシラン) 2重量部 カルナバワックス 1重量部 カーボンブラック 1重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕し成形材料とした。得られ
た成形材料をタブレット化し、低圧トランスファー成形
機にて175℃、70kg/cm2で16pDIPを成形
し、離型開き10秒後にバコール硬度を測定した。得ら
れた成形品により、バリ(ベント)、離型性、外観のチ
エックを行なった。
The present invention will be specifically described below with reference to examples. Example 1 O-cresol novolac type epoxy resin (epoxy equivalent: 200 g / eq, softening point: 70 ° C.) 100 parts by weight Phenol novolac resin curing agent (hydroxyl group equivalent: 106 g / eq, softening point: 85 ° C.) 57 parts by weight Triphenylphosphine / triphenylborane 1.5 parts by weight Brominated bisphenol A type epoxy resin (epoxy equivalent: 400 g / eq, softening point: 85 ° C.) 16 parts by weight Antimony trioxide 3.5 parts by weight Fused silica powder 465 parts by weight Coupling agent (epoxysilane) 2 parts by weight Carnauba wax 1 part by weight Carbon black 1 part by weight was mixed with a mixer at room temperature, kneaded with a biaxial roll at 70 to 100 ° C., cooled and pulverized to obtain a molding material. The obtained molding material was tabletted, 16 pDIP was molded at 175 ° C. and 70 kg / cm 2 with a low-pressure transfer molding machine, and Bacol hardness was measured 10 seconds after the mold was opened. The obtained molded product was subjected to burr (vent), releasability, and appearance check.

【0015】スパイラルフロー残存率:成形材料にした
直後のスパイラルフローをEMMI−I−66に準じた
金型を用いて、175℃、70kg/cm2、120秒の条
件で測定し、測定値Aとし、得られた同一の成形材料を
25℃で2週間保存した後のスパイラルフローを同様に
測定し、測定値Bとする。以下の式によりスパイラルフ
ロー残存率を算出する。 スパイラルフロー残存率(%)=〔(測定値B)/(測
定値A)〕×100 ゲルタイム:175℃の熱盤上で測定。 評価結果を表1に示す。 実施例2、3 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料で実施例1と同様に評価試験
を行なった。評価結果を表1に示す。 比較例1〜3 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料で実施例1と同様に評価試験
を行なった。評価結果を表1に示す。
Spiral flow residual rate: The spiral flow immediately after forming a molding material is measured using a mold according to EMMI-I-66 under the conditions of 175 ° C., 70 kg / cm 2 , 120 seconds, and the measured value A The same molding material obtained was stored at 25 ° C. for 2 weeks, and the spiral flow was measured in the same manner. The spiral flow residual rate is calculated by the following formula. Spiral flow residual rate (%) = [(measured value B) / (measured value A)] × 100 Gel time: Measured on a hot plate at 175 ° C. The evaluation results are shown in Table 1. Examples 2 and 3 Compounding was performed according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. An evaluation test was conducted on this molding material in the same manner as in Example 1. The evaluation results are shown in Table 1. Comparative Examples 1 to 3 Compounding was performed according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. An evaluation test was conducted on this molding material in the same manner as in Example 1. The evaluation results are shown in Table 1.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【発明の効果】本発明のエポキシ樹脂組成物は、従来技
術では得ることができなかった常温保存が可能であり、
保管や運搬の際の管理の簡略化を図ることができる。
The epoxy resin composition of the present invention can be stored at room temperature, which could not be obtained by the prior art.
The management during storage and transportation can be simplified.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/29 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location H01L 23/29 23/31

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 (A)少なくとも2個以上のエポキシ基
を有するエポキシ樹脂、(B)少なくとも2個以上の水
酸基を有するフェノール化合物硬化剤、(C)式(1)
で示されるトリ置換ホスフィン・トリ置換ボラン化合
物、 【化1】 (式中のR1〜R6は炭素数1〜8のアルキル基、フェニ
ル基又は置換フェニル基の中から選択される同一もしく
は異なる基)(D)無機充填材を必須成分とすることを
特徴とする半導体封止用エポキシ樹脂組成物。
1. An epoxy resin having (A) at least two epoxy groups, (B) a phenol compound curing agent having at least two hydroxyl groups, and (C) a formula (1).
A tri-substituted phosphine / tri-substituted borane compound represented by: (Wherein R 1 to R 6 are the same or different groups selected from an alkyl group having 1 to 8 carbon atoms, a phenyl group or a substituted phenyl group) (D) An inorganic filler is an essential component The epoxy resin composition for semiconductor encapsulation.
【請求項2】 全樹脂組成物中にトリ置換ホスフィン・
トリ置換ボラン化合物を0.1〜1.5重量%含む請求
項1記載のエポキシ樹脂組成物。
2. A tri-substituted phosphine.
The epoxy resin composition according to claim 1, which contains 0.1 to 1.5% by weight of a tri-substituted borane compound.
【請求項3】 式(1)のR1〜R6がフェニル基又は置
換フェニル基、又はR1〜R3がフェニル基又は置換フェ
ニル基で、R4〜R6がブチル基である請求項1又は請求
項2記載の半導体封止用エポキシ樹脂組成物。
3. R 1 to R 6 of the formula (1) are phenyl groups or substituted phenyl groups, or R 1 to R 3 are phenyl groups or substituted phenyl groups, and R 4 to R 6 are butyl groups. The epoxy resin composition for semiconductor encapsulation according to claim 1 or claim 2.
JP6159894A 1994-03-30 1994-03-30 Epoxy resin composition for sealing semiconductor Pending JPH07268073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6159894A JPH07268073A (en) 1994-03-30 1994-03-30 Epoxy resin composition for sealing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6159894A JPH07268073A (en) 1994-03-30 1994-03-30 Epoxy resin composition for sealing semiconductor

Publications (1)

Publication Number Publication Date
JPH07268073A true JPH07268073A (en) 1995-10-17

Family

ID=13175760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6159894A Pending JPH07268073A (en) 1994-03-30 1994-03-30 Epoxy resin composition for sealing semiconductor

Country Status (1)

Country Link
JP (1) JPH07268073A (en)

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