JPH07193162A - Ball-grid array semiconductor device and mounting substrate thereof - Google Patents

Ball-grid array semiconductor device and mounting substrate thereof

Info

Publication number
JPH07193162A
JPH07193162A JP5330641A JP33064193A JPH07193162A JP H07193162 A JPH07193162 A JP H07193162A JP 5330641 A JP5330641 A JP 5330641A JP 33064193 A JP33064193 A JP 33064193A JP H07193162 A JPH07193162 A JP H07193162A
Authority
JP
Japan
Prior art keywords
semiconductor device
substrate
solder bumps
semiconductor chip
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5330641A
Other languages
Japanese (ja)
Other versions
JP3632930B2 (en
Inventor
Akiro Sumiya
彰朗 角谷
Ichiro Anjo
一郎 安生
Junichi Arita
順一 有田
Sueo Kawai
末男 河合
Kunihiro Tsubosaki
邦宏 坪崎
Kunihiko Nishi
邦彦 西
Kenichi Otsuka
憲一 大塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP33064193A priority Critical patent/JP3632930B2/en
Publication of JPH07193162A publication Critical patent/JPH07193162A/en
Application granted granted Critical
Publication of JP3632930B2 publication Critical patent/JP3632930B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To provide a BGA semiconductor device, which does not have defective electric connections even if a package is warped, a mounting substrate for the BGA semiconductor device and the mounting method thereof. CONSTITUTION:A semiconductor chip 3 is mounted on a substrate 1 having the circuit wiring. The electrodes of the semiconductor chip 3 and the circuit wirings are electrically connected. At least the semiconductor chip and the electric connecting part are sealed with resin 5. A plurality of solder bumps 8 are provided at the face on the opposite side of the face of the substrate 1, on which the semiconductor chip 3 is mounted. In this BGA semiconductor device, the central part of the substrate l is warped in the direction of the face 6 on the opposite side with respect to the face 2, on which the semiconductor chip 3 is mounted, in the protruding shape.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、実装性に優れたボール
グリッドアレイ(以下、BGAと称する)半導体装置及
びそれを搭載する実装基板に関し、特に、回路配線を有
する基板上に半導体チップが搭載され、該半導体チップ
の電極と前記回路配線とを電気的に接続し、少なくとも
前記半導体チップ部が樹脂で封止され、前記基板の前記
半導体チップが搭載された面と反対側の面に複数のはん
だバンプが設けられているボールグリッドアレイ半導体
装置に適用して有効な技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ball grid array (hereinafter referred to as "BGA") semiconductor device having excellent mountability and a mounting board on which the semiconductor device is mounted. In particular, a semiconductor chip is mounted on a board having circuit wiring. And electrically connecting the electrodes of the semiconductor chip to the circuit wiring, at least the semiconductor chip portion is sealed with resin, and a plurality of surfaces of the substrate opposite to the surface on which the semiconductor chip is mounted are provided. The present invention relates to a technique effectively applied to a ball grid array semiconductor device provided with solder bumps.

【0002】[0002]

【従来の技術】近年の半導体装置の高機能化に伴い、面
付実装型パッケージの外部リードの数は増大する傾向に
ある。これらの半導体装置の代表例がQFP(Quad Fla
t Package)である。QFPは半導体装置の側面に外部
リードを設けているため、外部リードの間隔を狭くした
としても、外部リードの数の増大によりパッケージサイ
ズは大型化の傾向にある。これに対して、近年、開発さ
れた面付実装型パッケージがBGA半導体装置である。
このBG半導体A装置は、図14に示すように、回路配
線を有する基板1の片側の面2に半導体チップを搭載
し、基板1と半導体チップを金ワイヤー等で電気的に接
続し、基板1の半導体チップを搭載した面2を封止樹脂
5で封止している。また、基板1の半導体チップを搭載
した面の反対側の面6に、半導体チップと電気的に接続
した複数の電極7を形成し、電極7上にはんだバンプ8
を設けて外部電極としている。このはんだバンプ8は、
面6上にアレイ状に配置されているため、QFPと比較
するとより多くの外部電極が設けられ、また、同じ外部
電極数なら、QFPよりもパッケージサイズが小さくで
きるという特徴を有する。このBGA半導体装置を、実
装基板9上に位置決めして搭載し、実装基板9とパッケ
ージを加熱することによりはんだバンプ8をリフロー
し、実装基板9上の電極10と接続する。
2. Description of the Related Art As semiconductor devices have become more sophisticated in recent years, the number of external leads in surface-mounting type packages tends to increase. Typical examples of these semiconductor devices are QFP (Quad Fla
t Package). Since the QFP has external leads on the side surface of the semiconductor device, the package size tends to increase due to the increase in the number of external leads even if the interval between the external leads is narrowed. On the other hand, a surface mounted package developed in recent years is a BGA semiconductor device.
In this BG semiconductor A device, as shown in FIG. 14, a semiconductor chip is mounted on a surface 2 on one side of a substrate 1 having circuit wiring, and the substrate 1 and the semiconductor chip are electrically connected by a gold wire or the like. The surface 2 on which the semiconductor chip is mounted is sealed with the sealing resin 5. A plurality of electrodes 7 electrically connected to the semiconductor chip are formed on the surface 6 of the substrate 1 opposite to the surface on which the semiconductor chip is mounted, and the solder bumps 8 are formed on the electrodes 7.
Is provided as an external electrode. This solder bump 8 is
Since they are arranged in an array on the surface 6, more external electrodes are provided as compared with the QFP, and if the number of external electrodes is the same, the package size can be made smaller than the QFP. This BGA semiconductor device is positioned and mounted on the mounting substrate 9, and the mounting substrate 9 and the package are heated to reflow the solder bumps 8 and connect to the electrodes 10 on the mounting substrate 9.

【0003】前記BGA半導体装置に関する技術につい
ては、米国特許第5,241,133号明細書(Aug,31,19
93)に記載されている。
Regarding the technique relating to the BGA semiconductor device, US Pat. No. 5,241,133 (Aug, 31, 19)
93).

【0004】[0004]

【発明が解決しようとする課題】本発明者は、前記従来
技術を検討した結果、以下の問題点を見い出した。
The present inventor has found the following problems as a result of examining the above-mentioned prior art.

【0005】すなわち、図14に示すように、BGA半
導体装置は基板1の片面を樹脂封止する構造であるた
め、内部の半導体チップ、基板1及び封止樹脂5のそれ
ぞれの熱膨張係数の違いによりBGA半導体装置のパッ
ケージが反ることがある。このときBGA半導体装置を
実装基板9に搭載すると、図14に示すように、実装基
板9上の電極10とはんだバンプ8の間に隙間11が生
じるため、はんだバンプをリフローしても電極10とは
んだバンプ8が接続されない問題が生じる。
That is, as shown in FIG. 14, since the BGA semiconductor device has a structure in which one side of the substrate 1 is resin-sealed, the difference in thermal expansion coefficient between the semiconductor chip inside, the substrate 1 and the sealing resin 5 is different. This may warp the package of the BGA semiconductor device. At this time, when the BGA semiconductor device is mounted on the mounting substrate 9, a gap 11 is formed between the electrode 10 on the mounting substrate 9 and the solder bump 8 as shown in FIG. There is a problem that the solder bumps 8 are not connected.

【0006】特に、熱膨張係数が大きい封止樹脂5を使
用した場合、はんだリフロー温度まで加熱したときには
基板1の上面の封止樹脂5が大きく膨張し、パッケージ
の反りは上に凸になる。このとき、パッケージの端面に
近いはんだバンプ8は接続されているが、パッケージの
中央部に近いはんだバンプ8は接続されない。さらに、
BGA半導体装置は外部端子であるはんだバンプ8がパ
ッケージの下側にあるため、実装基板9とパッケージの
接続点がパッケージの下に隠れてしまい、接続の外観検
査が実際上不可能である。そのため、パッケージの反り
によるはんだバンプ8の接続不良が生じたとしても、実
装終了後、電気的な検査を行うまで発見することができ
ないという問題があった。
In particular, when the encapsulating resin 5 having a large coefficient of thermal expansion is used, the encapsulating resin 5 on the upper surface of the substrate 1 expands greatly when heated to the solder reflow temperature, and the package warps upward. At this time, the solder bumps 8 near the end faces of the package are connected, but the solder bumps 8 near the center of the package are not connected. further,
In the BGA semiconductor device, since the solder bumps 8 as external terminals are located under the package, the connection point between the mounting substrate 9 and the package is hidden under the package, and the visual inspection of the connection is practically impossible. Therefore, even if the solder bumps 8 have a defective connection due to the warp of the package, they cannot be found until an electrical inspection is performed after the mounting is completed.

【0007】本発明の目的は、パッケージの反りが生じ
ても電気的接続のない実装が可能なBGA半導体装置を
提供することにある。
An object of the present invention is to provide a BGA semiconductor device which can be mounted without electrical connection even if the package warps.

【0008】本発明の他の目的は、パッケージの反りが
生じても電気的に接続された実装が可能なBGA半導体
装置用実装基板を提供することにある。
Another object of the present invention is to provide a mounting substrate for a BGA semiconductor device, which can be mounted electrically connected even if the package warps.

【0009】本発明の他の目的は、BGA半導体装置の
実装歩留の向上をはかることが可能な技術を提供するこ
とにある。
Another object of the present invention is to provide a technique capable of improving the mounting yield of a BGA semiconductor device.

【0010】本発明の他の目的は、BGA半導体装置の
実装外観検査が可能な技術を提供することにある。
Another object of the present invention is to provide a technique capable of inspecting the mounting appearance of a BGA semiconductor device.

【0011】本発明の前記ならびにその他の目的及び新
規な特徴は、本明細書の記述及び添付図面によって明ら
かになるであろう。
The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

【0012】[0012]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
下記のとおりである。
Among the inventions disclosed in the present application, a brief description will be given to the outline of typical ones.
It is as follows.

【0013】すなわち、(1)回路配線を有する基板上
に半導体チップが搭載され、該半導体チップの電極と前
記回路配線とを電気的に接続し、少なくとも前記半導体
チップ及び電気接続部が樹脂で封止され、前記基板の前
記半導体チップが搭載された面と反対側の面に複数のは
んだバンプが設けられているBGA半導体装置であっ
て、前記封止樹脂の熱膨張係数が、前記基板の熱膨張係
数よりも小さい。
That is, (1) a semiconductor chip is mounted on a substrate having circuit wiring, and an electrode of the semiconductor chip and the circuit wiring are electrically connected, and at least the semiconductor chip and the electrical connection portion are sealed with resin. A BGA semiconductor device in which a plurality of solder bumps are provided on the surface of the substrate opposite to the surface on which the semiconductor chip is mounted, wherein the thermal expansion coefficient of the sealing resin is the heat of the substrate. Less than expansion coefficient.

【0014】(2)前記(1)のBGA半導体装置の最
外周のはんだバンプが、封止樹脂の端面より外側にあ
る。
(2) The solder bumps on the outermost periphery of the BGA semiconductor device of (1) are outside the end surface of the sealing resin.

【0015】(3)当該BGA半導体装置の反り量に応
じて前記電極の前記はんだバンプとの接触面積の大きさ
を変えたものである。
(3) The size of the contact area of the electrode with the solder bump is changed according to the amount of warpage of the BGA semiconductor device.

【0016】(4)基板の半導体チップを搭載した面と
反対側面に複数のはんだバンプが設けられたBGA半導
体装置が実装される、前記はんたバンプに対応した複数
の電極を有する実装基板であって、前記実装基板上の電
極の前記はんだバンプとの接触面積は、前記BGA半導
体装置を当該実装基板に搭載し、はんだをリフローした
時に生じる前記はんだバンプと前記電極の間の隙間に応
じた面積の大きさになっている。
(4) A mounting board having a plurality of electrodes corresponding to the solder bumps, on which a BGA semiconductor device having a plurality of solder bumps provided on the side opposite to the side on which the semiconductor chip is mounted is mounted. The contact area of the electrodes on the mounting board with the solder bumps depends on the gap between the solder bumps and the electrodes generated when the BGA semiconductor device is mounted on the mounting board and the solder is reflowed. It is the size of the area.

【0017】(5)基板の半導体チップを搭載した面と
反対側の面に複数のはんだバンプが設けられたボールグ
リッドアレイ半導体装置を実装基板に実装し、前記はん
だをリフローした時に、前記ボールグリッドアレイ半導
体装置の基板の中央部が前記半導体チップを搭載した面
と反対側の面方向に凸に反らせて前記実装基板上の電極
と前記はんだバンプとを電気的に接続する実装方法であ
る。
(5) The ball grid array semiconductor device having a plurality of solder bumps on the surface of the substrate opposite to the surface on which the semiconductor chip is mounted is mounted on a mounting substrate, and the ball grid is formed when the solder is reflowed. This is a mounting method in which the central portion of the substrate of the array semiconductor device is convexly warped in the surface direction opposite to the surface on which the semiconductor chip is mounted to electrically connect the electrodes on the mounting substrate to the solder bumps.

【0018】[0018]

【作用】前記の(1)によれば、実装基板に実装し、は
んだリフロー温度まで加熱した時の基板の熱膨張係数よ
り小さい熱膨張係数の封止樹脂を使用することにより、
基板の中央部を前記半導体チップを搭載した面と反対側
の面方向に凸に反るので、パッケージの中央部に近いは
んだバンプをすべて確実に接続することができ、かつ、
実装基板とパッケージの接続点のはんだバンプの接続部
は側面から観察することができる。
According to the above (1), by using the sealing resin having the coefficient of thermal expansion smaller than that of the board when mounted on the mounting board and heated to the solder reflow temperature,
Since the central portion of the substrate is convexly warped in the surface direction opposite to the surface on which the semiconductor chip is mounted, all solder bumps near the central portion of the package can be reliably connected, and
The connection portion of the solder bump at the connection point between the mounting board and the package can be observed from the side surface.

【0019】前記(2)によれば、前記BGA半導体装
置の最外周のはんだバンプが、封止樹脂の端面より外側
にあるので、実装基板とパッケージの接続点の接続部が
側面からさらに容易に観察することができ、外観検査が
より確実に行うことができる。これにより、パッケージ
の反りによるはんだバンプの接続不良が生じたとして
も、それを直ちに発見することができる。
According to the above (2), since the solder bumps on the outermost periphery of the BGA semiconductor device are outside the end face of the sealing resin, the connecting portion at the connecting point between the mounting substrate and the package can be more easily made from the side surface. It can be observed and the visual inspection can be performed more reliably. As a result, even if the solder bump connection failure occurs due to the warp of the package, it can be immediately detected.

【0020】前記(3)によれば、前記BGA半導体装
置のパッケージの反りに応じて基板上のはんだバンプ下
の電極の面積を変えることにより、電極上に形成される
はんだバンプの高さを変えることができるので、パッケ
ージの反りによるはんだバンプの接続不良を防止もしく
は低減することができる。
According to (3), the height of the solder bump formed on the electrode is changed by changing the area of the electrode under the solder bump on the substrate according to the warpage of the package of the BGA semiconductor device. Therefore, it is possible to prevent or reduce the connection failure of the solder bump due to the warp of the package.

【0021】前記(4)によれば、実装基板上の電極の
はんだバンプとの接触面積は、前記BGA半導体装置を
当該実装基板に搭載し、前記はんだのリフローした時
に、前記はんだバンプと前記電極の間に生じる隙間に応
じた面積の大きさにすることにより、実装前と実装後の
はんだバンプ高さの差を制御することができるので、パ
ッケージの反りによるはんだバンプの接続不良を防止も
しくは低減することができる。
According to (4) above, the contact area of the electrodes on the mounting substrate with the solder bumps is such that when the BGA semiconductor device is mounted on the mounting substrate and the solder is reflowed, the solder bumps and the electrodes are contacted. By adjusting the size of the area according to the gap between the solder bumps, the height difference between the solder bumps before and after mounting can be controlled, so solder bump connection failure due to package warpage can be prevented or reduced. can do.

【0022】前記の(1)及び(5)によれば、実装基
板に実装した時、基板の中央部を前記半導体チップを搭
載した面と反対側の面方向に凸に反らせることにより、
パッケージのはんだバンプをすべて確実に接続すること
ができ、かつ、実装基板とパッケージの接続点のはんだ
バンプの接続部は側面から観察することができる。これ
により、簡単に外観検査ができ、かつ、パッケージの反
りによるはんだバンプの接続不良を防止もしくは低減す
ることができる。
According to the above (1) and (5), when mounted on the mounting substrate, the central portion of the substrate is convexly warped in the surface direction opposite to the surface on which the semiconductor chip is mounted,
All the solder bumps of the package can be reliably connected, and the connection portion of the solder bumps at the connection point between the mounting substrate and the package can be observed from the side surface. As a result, a visual inspection can be performed easily, and a solder bump connection failure due to package warpage can be prevented or reduced.

【0023】[0023]

【実施例】以下、本発明の実施例を図面を参照して詳細
に説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0024】なお、実施例を説明する全図において、同
一機能を有するものは、同一符号を付け、その繰り返し
の説明は省略する。
In all the drawings for explaining the embodiments, those having the same function are designated by the same reference numerals, and the repeated description thereof will be omitted.

【0025】(実施例1)図1は、本発明のBGA半導
体装置の実施例1の構成を示す断面図、図2は、本実施
例のBGA半導体装置のはんだパンプの配列を示す平面
図、図3は、本実施例のBGA半導体装置の各製造工程
における断面図、図4は、本実施例1のBGA半導体装
置を実装する実装基板の電極の配列を示す平面図、図5
は、本実施例1のBGA半導体装置を実装基板に実装す
る方法を説明するための図である。
(Embodiment 1) FIG. 1 is a sectional view showing the structure of Embodiment 1 of a BGA semiconductor device of the present invention, and FIG. 2 is a plan view showing the arrangement of solder bumps of the BGA semiconductor device of this embodiment. 3 is a cross-sectional view in each manufacturing process of the BGA semiconductor device of the present embodiment, FIG. 4 is a plan view showing an array of electrodes of a mounting board on which the BGA semiconductor device of the first embodiment is mounted, and FIG.
FIG. 6 is a diagram for explaining a method of mounting the BGA semiconductor device of the first embodiment on a mounting board.

【0026】図1乃至図5において、1はその表面及び
その内部に回路配線を有する基板、2は基板の半導体チ
ップを搭載する面、3は半導体チップ、4はAuワイ
ヤ、5は封止樹脂、6は基板のはんだバンプを設ける
面、7は基板上の電極、8ははんだバンプ、20は実装
基板、22は実装基板上の電極である。また第14図に
おいて、11はリフロー時の温度における実装基板上の
電極とはんだバンプとの間に生じるであろうところの隙
間である。
In FIGS. 1 to 5, 1 is a substrate having circuit wiring on its surface and inside thereof, 2 is a surface on which a semiconductor chip of the substrate is mounted, 3 is a semiconductor chip, 4 is Au wire, 5 is sealing resin. , 6 is a surface of the substrate on which solder bumps are provided, 7 is an electrode on the substrate, 8 is a solder bump, 20 is a mounting substrate, and 22 is an electrode on the mounting substrate. Further, in FIG. 14, reference numeral 11 denotes a gap that will occur between the electrode on the mounting substrate and the solder bump at the temperature during reflow.

【0027】本実施例1のBGA半導体装置は、図1に
示すように、回路配線を有する基板1上に半導体チップ
3が搭載され、この半導体チップ3の電極と前記回路配
線とをAuワイヤ4で電気的に接続し、少なくとも前記
半導体チップ3,Auワイヤ4及び電気的接続の部分が
封止樹脂5で封止され、前記基板1の前記半導体チップ
3が搭載された面2と反対側の面6に、図2に示すよう
に、複数のほぼ均一の量のはんだバンプ8がアレイ状に
配設されている。そして、前記BGA半導体装置の最外
周のはんだバンプ8Aが、封止樹脂5の端面5Aより外
側に配置されている。
In the BGA semiconductor device according to the first embodiment, as shown in FIG. 1, a semiconductor chip 3 is mounted on a substrate 1 having circuit wiring, and electrodes of the semiconductor chip 3 and the circuit wiring are connected by Au wires 4. Are electrically connected to each other, and at least the semiconductor chip 3, the Au wire 4 and an electrically connected portion are sealed with a sealing resin 5, and the surface of the substrate 1 opposite to the surface 2 on which the semiconductor chip 3 is mounted is mounted. As shown in FIG. 2, a plurality of substantially uniform solder bumps 8 are arranged in an array on the surface 6. The outermost solder bump 8A of the BGA semiconductor device is arranged outside the end surface 5A of the sealing resin 5.

【0028】前記基板1の材料としては、熱膨張係数α
=17×10~6/℃のガラスエポキシ(JIS“FR-
4”)を使用する。また、前記封止樹脂5としては、レ
ジンを用いるが、このレジンの熱膨張係数が、前記基板
1の熱膨張係数よりも小さいものを使用する。基板1と
して熱膨張係数α=17×10~6/℃のガラスエポキシ
を使用した場合、理想的なレジンの熱膨張係数αは、1
7×10~6/℃であるが、シリコン(Si)の半導体チ
ップ3熱膨張係数の関係から、17×10~/℃6以下の
レジンを使用する。好ましいレジンの熱膨張係数αは、
10×10~6〜14×10~6/℃である。
The material of the substrate 1 is a coefficient of thermal expansion α
= 17 × 10 ~ 6 / ℃ of glass epoxy (JIS "FR-
4 ″). Further, a resin is used as the sealing resin 5, and a resin whose coefficient of thermal expansion is smaller than that of the substrate 1 is used. when using the glass epoxy coefficient α = 17 × 10 ~ 6 / ℃, the thermal expansion coefficient of the ideal resin alpha, 1
Although it is 7 × 10 6 / ° C., a resin of 17 × 10 6 / ° C. 6 or less is used because of the coefficient of thermal expansion of the semiconductor chip 3 of silicon (Si). The thermal expansion coefficient α of the preferable resin is
It is 10 × 10 6 to 14 × 10 6 / ° C.

【0029】また、前記本実施例1のBGA半導体装置
の各部の寸法は、図1に示すように、基板1の底面から
封止樹脂5の上面までの高さ1.5mm、封止樹脂5の
厚さ0.9mm、基板1の厚さ0.6mm、電極を含むは
んだバンプ8の高さ0.6mmである。そして、例え
ば、はんだバンプ8は119個がピッチ1.27mmで
7×17のアレイ状に配設されている。外形は14mm
×22mmの長方形である。
The dimensions of each part of the BGA semiconductor device of the first embodiment are, as shown in FIG. 1, 1.5 mm in height from the bottom surface of the substrate 1 to the top surface of the sealing resin 5 and the sealing resin 5. Is 0.9 mm, the thickness of the substrate 1 is 0.6 mm, and the height of the solder bumps 8 including electrodes is 0.6 mm. Then, for example, 119 solder bumps 8 are arranged in a 7 × 17 array with a pitch of 1.27 mm. The outer shape is 14 mm
It is a rectangle of × 22 mm.

【0030】次に、本実施例1のBGA半導体装置の製
造方法を説明する。
Next, a method of manufacturing the BGA semiconductor device of the first embodiment will be described.

【0031】まず、図3(A)に示すように、基板1上
に半導体チップ3をエポキシペースト等で接着する。次
に、図3(B)に示すように、基板1と半導体チップ3
をAuワイヤー4で接続する。次いで、図3(C)に示
すように、基板1の面2をトランスファー成型で樹脂封
止する。この時に、熱膨張係数が17×10~6/℃以下
の封止樹脂を使用する。例えば、熱膨張係数αが10×
10~6/℃〜14×10~6/℃のレジンを使用することが
好ましい。封止後、樹脂を硬化させるが、樹脂の硬化収
縮によりBGA半導体装置は、図1に示すように、ほぼ
水平もしくは少し湾曲している。樹脂の硬化収縮率は5
%程度であるので、封止樹脂部の大きさが10mm□
(平方)の場合、一辺の収縮量は約2.5μmである。
最後に、図2(D)に示すように、はんだバンプ8を基
板1上の電極7に転写後、はんだリフロー炉に基板1を
通してはんだバンプ8を形成し、BGA半導体装置が完
成する。
First, as shown in FIG. 3A, the semiconductor chip 3 is bonded onto the substrate 1 with an epoxy paste or the like. Next, as shown in FIG. 3B, the substrate 1 and the semiconductor chip 3 are
With an Au wire 4. Next, as shown in FIG. 3C, the surface 2 of the substrate 1 is resin-molded by transfer molding. At this time, a sealing resin having a coefficient of thermal expansion of 17 × 10 6 / ° C. or less is used. For example, the coefficient of thermal expansion α is 10 ×
It is preferred to use a resin of 10 ~ 6 / ℃ ~14 × 10 ~ 6 / ℃. After sealing, the resin is cured, but the BGA semiconductor device is almost horizontal or slightly curved as shown in FIG. 1 due to the curing shrinkage of the resin. Curing shrinkage of resin is 5
%, The size of the sealing resin part is 10 mm □
In the case of (square), the contraction amount on one side is about 2.5 μm.
Finally, as shown in FIG. 2D, after the solder bumps 8 are transferred to the electrodes 7 on the substrate 1, the solder bumps 8 are formed through the substrate 1 in a solder reflow furnace, and the BGA semiconductor device is completed.

【0032】図4は、本実施例1の実装基板を上面から
見た平面図であり、20は実装基板、21は通常の直径
の円形電極、22は直径を大きくした円形電極である。
FIG. 4 is a plan view of the mounting substrate according to the first embodiment as seen from above, in which 20 is a mounting substrate, 21 is a circular electrode having a normal diameter, and 22 is a circular electrode having a large diameter.

【0033】前記実装基板20上に前記BGA半導体装
置のパッケージ(以下、単にパッケージと称す)を搭載
する工程を図5に示す。まず、図5(A)に示すよう
に、実装基板20上の電極21,22にフラックス23
を塗布する。次に、図5(B)に示すように、半導体装
置を位置決めして実装基板20上に搭載する。次いで、
実装基板20とBGA半導体装置をはんだリフロー炉に
通し、はんだバンプ8をリフローさせると、はんだバン
プ8と実装基板20上の電極21との接続は、まずBG
A半導体装置の中央部から行なわれ、図5(C)に示す
ように最外周のバンプ8Aは最後に接続が行われる。最
外周のはんだバンプ8Aと実装基板20上の電極21と
の間には、基板1の熱膨張係数と封止樹脂5の熱膨張係
数の差によりパッケージ中央部が下に凸に反り、約50
μm〜60μm(データによる)の隙間が生じるが、図
5(C)に示すように、最外周のはんだバンプ8Aと実
装基板20上の電極22との間が接続され、すべてのは
んだバンプ8及び8Aが接続され実装が終了する。
FIG. 5 shows a step of mounting a package of the BGA semiconductor device (hereinafter, simply referred to as a package) on the mounting substrate 20. First, as shown in FIG. 5A, the flux 23 is applied to the electrodes 21 and 22 on the mounting substrate 20.
Apply. Next, as shown in FIG. 5B, the semiconductor device is positioned and mounted on the mounting substrate 20. Then
When the mounting board 20 and the BGA semiconductor device are passed through a solder reflow furnace to reflow the solder bumps 8, the solder bumps 8 and the electrodes 21 on the mounting board 20 are first connected to each other by BG.
This is performed from the central portion of the A semiconductor device, and the bumps 8A on the outermost periphery are connected last as shown in FIG. 5 (C). Between the outermost solder bumps 8A and the electrodes 21 on the mounting substrate 20, the central portion of the package warps downward due to the difference between the thermal expansion coefficient of the substrate 1 and the thermal expansion coefficient of the encapsulation resin 5, and the package central portion warps downwards by about 50.
Although a gap of μm to 60 μm (depending on the data) is generated, as shown in FIG. 5C, the solder bumps 8A on the outermost periphery and the electrodes 22 on the mounting substrate 20 are connected to each other, and 8A is connected and the mounting is completed.

【0034】すなわち、実装後、BGA半導体装置の中
央部付近のバンプ高さは約430μmになっており、実
装前とのバンプ高さの差は、約70μmである。これに
より、実装前に最外周のはんたバンプ8Aと実装基板2
0上の電極21との間の隙間は吸収され、最外周のはん
だバンプ8Aも実装基板1上の電極21と接触するた
め、はんだが電極21上に濡れ広がり接続が行われる。
That is, after mounting, the bump height near the central portion of the BGA semiconductor device is about 430 μm, and the difference in bump height from before mounting is about 70 μm. This allows the outermost solder bumps 8A and the mounting substrate 2 to be mounted before mounting.
The gap with the electrode 21 on the electrode 0 is absorbed, and the solder bumps 8A on the outermost periphery also come into contact with the electrode 21 on the mounting substrate 1, so that the solder wets and spreads on the electrode 21 to establish a connection.

【0035】また、前記実施例1においては、実装基板
20上の電極21の直径を大きくしたが、実装基板20
上の電極を同一の直径とし、BGA半導体装置のパッケ
ージの電極を、図6に示すように、最外周付近のはんだ
バンプ8Aの電極31は、BGA半導体装置のパッケー
ジの中央部付近のはんだバンプ8の電極32よりも、小
さい直径にしても同様の作用効果を得ることができる。
また、更に最外周付近のはんだバンプ8Aの電極31の
直径を小さくすることによって電極31間の距離が大き
くなる為、実装基板20上の配線34の引き回し自由度
が増す。
In the first embodiment, the diameter of the electrode 21 on the mounting substrate 20 is increased, but the mounting substrate 20
As shown in FIG. 6, the electrodes of the BGA semiconductor device package have the same diameter, and the electrodes 31 of the solder bumps 8A near the outermost periphery are the solder bumps 8 near the center of the package of the BGA semiconductor device. Even if the diameter is smaller than that of the electrode 32, the same effect can be obtained.
Further, since the distance between the electrodes 31 is increased by further reducing the diameter of the electrodes 31 of the solder bumps 8A near the outermost circumference, the degree of freedom in routing the wiring 34 on the mounting substrate 20 is increased.

【0036】ここで、電極の面積とその上に形成される
はんだパンプの高さの関係について説明する。
Here, the relationship between the area of the electrode and the height of the solder bump formed thereon will be described.

【0037】電極の面積とはんだバンプ高さの関係は近
似的に次式で表せる。
The relationship between the electrode area and the solder bump height can be approximately expressed by the following equation.

【0038】[0038]

【数1】 [Equation 1]

【0039】例えば、はんだの体積V=1.03mm3
とすると電極の直径0.60mmのときははんぶバンプ
高さは0.61mmとなり、電極の直径0.4のときは
はんだバンプ高さは0.7mmとなる。
For example, the volume of solder V = 1.03 mm 3
Then, when the electrode diameter is 0.60 mm, the bump height is 0.61 mm, and when the electrode diameter is 0.4, the solder bump height is 0.7 mm.

【0040】このように、供給するはんだの重を一定に
したとしても電極の面積を変えることにより、はんだバ
ンプ高さを変えることが可能となる。
As described above, even if the weight of the solder to be supplied is constant, the height of the solder bump can be changed by changing the area of the electrode.

【0041】図7乃至図10は、前記好ましいレジンの
熱膨張係数αが10×10~6〜14×10~6/℃におけ
るそれぞれのパッケジの反り量の実験結果を示したもの
であり、図7は熱膨張係数αが10×10~6/℃のレジ
ンを使用した場合、図8は熱膨張係数αが12×10~6
/℃のレジンを使用した場合、図9は熱膨張係数αが1
3×10~6/℃のレジンを使用した場合、図10は熱膨
張係数αが14×10~6/℃のレジンを使用した場合で
ある。ここで、パッケジの反り量とは、図11に示すよ
うに、基板1上の封止樹脂5を下側にして支持し、基板
1の上面の端部を含む水平面を基準Sとし、この基準S
からの前記基板1の上面Hの高さである。そして、基板
1の材料としては熱膨張係数α=17×10~6/℃のガ
ラスエポキシ(JIS“FR-4”)を使用した。
7 to 10 show experimental results of the warpage amount of each package when the thermal expansion coefficient α of the preferable resin is 10 × 10 to 6 to 14 × 10 to 6 / ° C. 7 If the thermal expansion coefficient α was used and the resin of 10 × 10 ~ 6 / ℃, 8 thermal expansion coefficient α is 12 × 10 ~ 6
Fig. 9 shows that the thermal expansion coefficient α is 1 when the resin of / ° C is used.
When a resin having a temperature of 3 × 10 6 / ° C. is used, FIG. 10 shows a resin having a thermal expansion coefficient α of 14 × 10 6 / ° C. Here, the warpage amount of the package is, as shown in FIG. 11, the sealing resin 5 on the substrate 1 supported downward, and the horizontal plane including the end portion of the upper surface of the substrate 1 is used as a reference S. S
Is the height of the upper surface H of the substrate 1 from. As the material of the substrate 1, glass epoxy (JIS “FR-4”) having a coefficient of thermal expansion α = 17 × 10 6 / ° C. was used.

【0042】図7乃至図10において、横軸は基板1の
端からの距離(mm)、縦軸は反り量(μm)であり、
△印は実装基板9に実装する時のリフロー温度(170
℃)の時のパッケージの反り量、□印はモールド完了の
常温(22℃)の時のパッケージの反り量、四辺形の黒
印は常温(22℃)とリフロー温度(170℃)との間
の任意の温度(90℃,93℃,86℃,95℃)の時
のパッケージの反り量である。この任意の温度はパッケ
ージの反り量の傾向を見るための温度である。
7 to 10, the horizontal axis represents the distance (mm) from the edge of the substrate 1, and the vertical axis represents the warp amount (μm).
The triangle marks indicate the reflow temperature (170
(° C) package warp amount, □ indicates package warp amount when molding is completed at room temperature (22 ° C), quadrilateral black mark indicates between room temperature (22 ° C) and reflow temperature (170 ° C) Is the amount of warpage of the package at any temperature (90 ° C, 93 ° C, 86 ° C, 95 ° C). This arbitrary temperature is a temperature for checking the tendency of the warp amount of the package.

【0043】前記図7乃至図10からわかるように、い
ずれも△印で示す実装基板9に実装する時のリフロー温
度(170℃)の時は、パッケージが反った状態となり
下方向に凸となる。特に、図1及び図2に示すように、
□印で示すモールド完了の常温(22℃)の時は、パッ
ケージは平担もしくは逆の下方向に凸となり、本発明で
希望する下方向に凸の形状となっていないが、△印で示
す実装基板9に実装する時のリフロー温度(170℃)
の時は、パッケージの中央部が反った状態となり、実装
基板9の実装面に対して下方向に凸の反りが生じること
がわかる。
As can be seen from FIGS. 7 to 10, at the reflow temperature (170 ° C.) when mounting on the mounting substrate 9 indicated by Δ, the package becomes warped and convex downward. . In particular, as shown in FIGS. 1 and 2,
At room temperature (22 ° C.) at which molding is completed as indicated by □, the package is flat or convex downward in the opposite direction, and does not have the downward convex shape desired by the present invention, but is indicated by Δ. Reflow temperature (170 ℃) when mounting on the mounting board 9
At the time of, it is understood that the central portion of the package is warped and a downward warp is generated with respect to the mounting surface of the mounting substrate 9.

【0044】以上の説明からわかるように、実施例1に
よれば、実装時の加熱による封止樹脂5の膨張が基板1
の膨張より小さくすることにより、前記パッケージの基
板1の外周部が中央部に対して前記半導体チップ3を搭
載した面2側方向に反って、パッケジが実装基板9の実
装面に対して下に凸の反りを生じるので、BGA半導体
装置のパッケージの反りは下に凸の状態に保たれる。こ
の時、はんだバンプ8と実装基板9上の電極10との接
続は、前記パッケージの中央部から行われ、最外周のは
んだバンプ8は最後に接続が行われる。そのため、最外
周のバンプの接続の外観検査を行い、その最外周のすべ
てのはんだバンプ8Aが接続されていれば、その内側の
はんだバンプ8も接続されていると判断できる。
As can be seen from the above description, according to the first embodiment, the expansion of the sealing resin 5 due to the heating at the time of mounting causes the expansion of the substrate 1.
Is smaller than the expansion of the package 1, the outer peripheral portion of the substrate 1 of the package warps in the direction of the side of the surface 2 on which the semiconductor chip 3 is mounted with respect to the central portion, and the package is positioned below the mounting surface of the mounting substrate 9. Since the warpage of the convex is generated, the warpage of the package of the BGA semiconductor device is kept in the state of being convex downward. At this time, the connection between the solder bump 8 and the electrode 10 on the mounting substrate 9 is performed from the central portion of the package, and the outermost solder bump 8 is connected last. Therefore, a visual inspection of the connection of the outermost peripheral bumps is performed, and if all the outermost peripheral solder bumps 8A are connected, it can be determined that the innermost solder bumps 8 are also connected.

【0045】また、前記パッケージの最外周のはんだバ
ンプ8が、封止樹脂5の端面5Aより外側にあるので、
実装基板9とパッケージの接続点の接続部を周囲から観
察できるので、パッケージの反りによるはんだバンプの
接続不良が生じたとしても、それを直ちに発見すること
ができる。
Further, since the outermost solder bumps 8 of the package are located outside the end surface 5A of the sealing resin 5,
Since the connection portion at the connection point between the mounting substrate 9 and the package can be observed from the surroundings, even if the solder bump has a defective connection due to the warp of the package, it can be immediately found.

【0046】(実施例2)図12は、本発明のBGA半
導体装置の実装基板の実施例2の構成を示す平面図、図
13は本実施例2の実装基板上にBGA半導体装置を実
装した状態を示す断面図である。
(Embodiment 2) FIG. 12 is a plan view showing a structure of a mounting board for a BGA semiconductor device according to the present invention in Embodiment 2, and FIG. 13 is a plan view showing a BGA semiconductor device mounted on the mounting board according to Embodiment 2. It is sectional drawing which shows a state.

【0047】本実施例2のBGA半導体装置の実装基板
は、前記実装基板上の電極の接触面積を、前記BGA半
導体装置を当該実装基板に搭載し、はんだリフロー時の
熱による基板1の反りによって前記はんだバンプと前記
電極の間に生じる隙間に応じた面積の大きさにしたもの
である。
In the mounting substrate of the BGA semiconductor device of the second embodiment, the contact area of the electrodes on the mounting substrate is set by mounting the BGA semiconductor device on the mounting substrate and warping the substrate 1 by heat during solder reflow. The size of the area is determined according to the gap between the solder bump and the electrode.

【0048】例えば、図1に示すように、前記封止樹脂
5の熱膨張係数が、前記基板1の熱膨張係数よりも小さ
いという条件がないと、基板1の半導体チップ3を搭載
した面2と反対側の面6に複数のはんだバンプ8が設け
られたBGA半導体装置を実装基板9に実装した時、前
記BGA半導体装置の基板1の中央部が前記半導体チッ
プ3を搭載した面2方向に凸に反った場合(前記実施例
1と反対方向に反った場合)が生じる。この場合におい
ても、前記実装基板9上の電極と前記はんだバンプ8と
を確実に電気的に接続するためには、図13に示すよう
に、パッケージの基板1の中央部に生じる前記はんだバ
ンプ8と電極32との間の隙間33に対応する高さ分だ
けはんだバンプ8を高くしなけばならない。その反面、
パッケージの基板1の周辺部付近のはんだバンプ8Aは
下に押し付られて高さが低くなる。そこで、本実施例2
の実装基板9上の電極は、図12に示すように、前記実
装基板9上の電極のうちパッケージの基板1の中央部付
近のはんだバンプ8に対応する部分の電極32の面積を
周辺部付近の電極31よりも小さくしてある。
For example, as shown in FIG. 1, unless the coefficient of thermal expansion of the sealing resin 5 is smaller than the coefficient of thermal expansion of the substrate 1, the surface 2 of the substrate 1 on which the semiconductor chip 3 is mounted is used. When a BGA semiconductor device in which a plurality of solder bumps 8 are provided on the surface 6 on the opposite side is mounted on the mounting substrate 9, the central portion of the substrate 1 of the BGA semiconductor device is in the direction of the surface 2 on which the semiconductor chip 3 is mounted. The case where it is convexly warped (the case where it is warped in the direction opposite to that of Example 1) occurs. Also in this case, in order to reliably electrically connect the electrodes on the mounting substrate 9 and the solder bumps 8, as shown in FIG. 13, the solder bumps 8 formed in the central portion of the package substrate 1 are formed. The solder bump 8 must be raised by a height corresponding to the gap 33 between the electrode 32 and the electrode 32. On the other hand,
The solder bumps 8A in the vicinity of the peripheral portion of the substrate 1 of the package are pressed downward and the height becomes low. Therefore, the second embodiment
As shown in FIG. 12, the electrodes on the mounting board 9 of the mounting board 9 have the area of the electrode 32 of the portion corresponding to the solder bumps 8 in the vicinity of the central portion of the package substrate 1 of the electrodes on the mounting board 9 in the vicinity of the peripheral portion. The electrode 31 is smaller than the electrode 31.

【0049】このようにすることにより、はんだリフロ
ー後、冷却されて封止樹脂5が収縮し、半導体装置の反
りが再び大きくなり、中央部付近のはんだバンプ8A
は、上方に大きく引き延ばされるが、前記のように実装
基板30上の電極31の直径を小さしてあることによ
り、はんだバンプ8Aのはんだが実装基板30上の電極
31と基板1上の電極7との間で引き伸ばされても、は
んだが不足することがないため切断されず、電気的に確
実に接続される。
By doing so, after the solder reflow, it is cooled and the sealing resin 5 contracts, the warp of the semiconductor device increases again, and the solder bumps 8A near the center portion
Are greatly extended upward, but the solder of the solder bumps 8A is soldered to the electrodes 31 on the mounting substrate 30 and the electrodes 7 on the substrate 1 by reducing the diameter of the electrodes 31 on the mounting substrate 30 as described above. Even if it is stretched between and, it is not cut because the solder does not run short, and it is electrically connected reliably.

【0050】本実施例2では、前記実装基板9上の電極
のうちパッケージの基板1の中央部のはんだバンプ8に
対応する部分の電極31の面積を小さくしたが、反対に
前記実装基板9上の電極のうちパッケージの基板1の周
辺部付近のはんだバンプ8Aに対応する部分の電極32
の面積を中央部付近の電極よりも大きくしても同様の作
用効果が得られる。
In the second embodiment, of the electrodes on the mounting substrate 9, the area of the electrode 31 of the portion corresponding to the solder bump 8 in the central portion of the substrate 1 of the package is made small. 32 of the electrodes of the electrodes corresponding to the solder bumps 8A near the periphery of the package substrate 1.
Even if the area of the electrode is larger than that of the electrode in the vicinity of the central portion, the same effect can be obtained.

【0051】以上、本発明者によってなされた発明を、
前記実施例に基づき具体的に説明したが、本発明は、前
記実施例に限定されるものではなく、その要旨を逸脱し
ない範囲において種々変更可能であることは勿論であ
る。
The inventions made by the present inventors are as follows.
Although the present invention has been specifically described based on the above-mentioned embodiments, the present invention is not limited to the above-mentioned embodiments, and it goes without saying that various modifications can be made without departing from the scope of the invention.

【0052】[0052]

【発明の効果】本願において開示される発明のうち代表
的なものによって得られる効果を簡単に説明すれば、下
記のとおりである。
The effects obtained by the typical ones of the inventions disclosed in the present application will be briefly described as follows.

【0053】(1)BGA半導体装置を実装基板に実装
する時、そのパッケージの反りに起因するパッケージ中
央部付近のバンプの接続不良を防止もしくは低減するこ
とができる。
(1) When a BGA semiconductor device is mounted on a mounting substrate, it is possible to prevent or reduce defective connection of bumps near the center of the package due to warpage of the package.

【0054】(2)BGA半導体装置を実装基板に実装
する時、そのパッケージの最外周のバンプの外観検査の
みで接続の判定ができ、実装の外観検査を容易にするこ
とができる。
(2) When the BGA semiconductor device is mounted on the mounting substrate, the connection can be determined only by the visual inspection of the outermost bumps of the package, and the visual inspection of the mounting can be facilitated.

【0055】(3)BGA半導体装置を実装基板に実装
する時、BGA半導体装置のパッケージが反っていて
も、電気的接続不良がなく確実に実装することが容易に
でき、かつ、歩留を向上することができる。
(3) When the BGA semiconductor device is mounted on the mounting board, even if the package of the BGA semiconductor device is warped, there is no electrical connection failure and the mounting can be performed easily and reliably, and the yield is improved. can do.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のBGA半導体装置の実施例1の構成を
示す断面図である。
FIG. 1 is a sectional view showing a configuration of a first embodiment of a BGA semiconductor device of the present invention.

【図2】本実施例1のBGA半導体装置のはなだバンプ
の配列を示す平面図である。
FIG. 2 is a plan view showing an array of bare bumps of the BGA semiconductor device according to the first embodiment.

【図3】本実施例1のBGA半導体装置の各製造工程に
おける断面図である。
FIG. 3 is a cross-sectional view in each manufacturing process of the BGA semiconductor device of the first embodiment.

【図4】本実施例1のBGA半導体装置を実装する実装
基板の電極の配列を示す平面図である。
FIG. 4 is a plan view showing an arrangement of electrodes on a mounting board on which the BGA semiconductor device of the first embodiment is mounted.

【図5】本実施例1のBGA半導体装置を実装基板に実
装する方法を説明するための図である。
FIG. 5 is a diagram for explaining a method of mounting the BGA semiconductor device of the first embodiment on a mounting board.

【図6】本実施例1のBGA半導体装置の電極の変形例
を示す平面図である。
FIG. 6 is a plan view showing a modification of the electrodes of the BGA semiconductor device according to the first embodiment.

【図7】本実施例1の熱膨張係数αが10×10~6のレ
ジンを使用した場合の反り量の実験結果を示す図であ
る。
FIG. 7 is a diagram showing an experimental result of a warp amount when a resin having a thermal expansion coefficient α of 10 × 10 6 was used in Example 1 of the present invention.

【図8】本実施例1の熱膨張係数αが12×10~6のレ
ジンを使用した場合の反り量の実験結果を示す図であ
る。
FIG. 8 is a diagram showing an experimental result of a warp amount when a resin having a thermal expansion coefficient α of 12 × 10 6 was used in Example 1 of the present invention.

【図9】本実施例1の熱膨張係数αが13×10~6のレ
ジンを使用した場合の反り量の実験結果を示す図であ
る。
FIG. 9 is a diagram showing an experimental result of a warp amount when a resin having a thermal expansion coefficient α of 13 × 10 6 was used in Example 1 of the present invention.

【図10】本実施例1の熱膨張係数αが14×10~6
レジンを使用した場合の反り量の実験結果を示す図であ
る。
FIG. 10 is a diagram showing an experimental result of a warp amount when using a resin having a thermal expansion coefficient α of 14 × 10 6 in Example 1 of the present invention.

【図11】本実施例1のパッケジの反り量の実験を説明
するための図である。
FIG. 11 is a diagram for explaining an experiment of a warpage amount of a package according to the first embodiment.

【図12】本発明の実施例2の実装基板を上面から見た
平面図である。
FIG. 12 is a plan view of a mounting board according to a second embodiment of the present invention as viewed from above.

【図13】本実施例2のPGA半導体装置を実装基板に
搭載した状態を示す断面図である。
FIG. 13 is a cross-sectional view showing a state where the PGA semiconductor device of the second embodiment is mounted on a mounting board.

【図14】従来のBGA装置の問題点を説明するための
実装基板上に実装した側面図である。
FIG. 14 is a side view of a conventional BGA device mounted on a mounting substrate for explaining problems.

【符号の説明】[Explanation of symbols]

1…回路配線を有する基板、2…基板の半導体チップを
搭載する面、3…半導体チップ、4…Auワイヤ、5…
封止樹脂、6…基板のはんだバンプを設ける面、7…基
板上の電極、8,8A…はんだバンプ、9…実装基板、
10…実装基板上の電極、11…実装基板上の電極とは
んだバンプとの隙間、20…実装基板、21…通常の直
径の円形電極、22…直径を大きくた円形電極、30…
実装基板、31…バンプ8Aに対応する電極、32…バ
ンプ8に対応する電極、33…実装基板上の電極とはん
だバンプとの隙間。
DESCRIPTION OF SYMBOLS 1 ... Substrate having circuit wiring, 2 ... Surface on which semiconductor chip is mounted, 3 ... Semiconductor chip, 4 ... Au wire, 5 ...
Sealing resin, 6 ... Surface of substrate on which solder bumps are provided, 7 ... Electrodes on substrate, 8, 8A ... Solder bumps, 9 ... Mounting substrate,
10 ... Electrode on mounting board, 11 ... Gap between electrode on mounting board and solder bump, 20 ... Mounting board, 21 ... Circular electrode with normal diameter, 22 ... Circular electrode with large diameter, 30 ...
Mounting substrate, 31 ... Electrode corresponding to bump 8A, 32 ... Electrode corresponding to bump 8, 33 ... Gap between electrode on mounting substrate and solder bump.

フロントページの続き (72)発明者 河合 末男 東京都小平市上水本町5丁目20番1号 株 式会社日立製作所半導体事業部内 (72)発明者 坪崎 邦宏 東京都小平市上水本町5丁目20番1号 株 式会社日立製作所半導体事業部内 (72)発明者 西 邦彦 東京都小平市上水本町5丁目20番1号 株 式会社日立製作所半導体事業部内 (72)発明者 大塚 憲一 東京都小平市上水本町5丁目20番1号 株 式会社日立製作所半導体事業部内Front Page Continuation (72) Inventor Sueo Kawai 5-20-1 Kamimizuhoncho, Kodaira-shi, Tokyo Inside the Semiconductor Business Division, Hitachi, Ltd. (72) Inventor Kunihiro Tsubozaki 5-20, Kamimizuhoncho, Kodaira-shi, Tokyo No. 1 Incorporated company Hitachi Ltd. Semiconductor Division (72) Kunihiko Nishi Nishi 5-20-1, Kamimizuhonmachi, Kodaira-shi, Tokyo Incorporated Hitachi Ltd Semiconductor Division (72) Kenichi Otsuka Kodaira, Tokyo 5-20-1 Kamimizuhonmachi, Semiconductor Company, Hitachi Ltd. Semiconductor Division

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 回路配線を有する基板上に半導体チップ
が搭載され、該半導体チップの電極と前記回路配線とを
電気的に接続し、少なくとも前記半導体チップ及び電気
接続部が樹脂で封止され、前記基板の前記半導体チップ
が搭載された面と反対側の面に複数のはんだバンプが設
けられているボールグリッドアレイ半導体装置であっ
て、前記封止樹脂の熱膨張係数が、前記基板の熱膨張係
数よりも小さいことを特徴とするボールグリッドアレイ
半導体装置。
1. A semiconductor chip is mounted on a substrate having circuit wiring, electrodes of the semiconductor chip and the circuit wiring are electrically connected, and at least the semiconductor chip and the electrical connection portion are sealed with resin, A ball grid array semiconductor device in which a plurality of solder bumps are provided on the surface of the substrate opposite to the surface on which the semiconductor chip is mounted, wherein the thermal expansion coefficient of the sealing resin is the thermal expansion of the substrate. A ball grid array semiconductor device characterized by being smaller than a coefficient.
【請求項2】 請求項1に記載のボールグリッドアレイ
半導体装置の最外周のはんだバンプが、封止樹脂の端面
より外側にあることを特徴とするボールグリッドアレイ
半導体装置。
2. The ball grid array semiconductor device according to claim 1, wherein the outermost solder bumps of the ball grid array semiconductor device are outside the end faces of the sealing resin.
【請求項3】 回路配線を有する基板上に半導体チップ
が搭載され、該半導体チップの電極と前記回路配線とを
電気的に接続し、少なくとも前記半導体チップ及び電気
接続部が樹脂で封止され、前記基板の前記半導体チップ
が搭載された面と反対側の面に複数のはんだバンプが設
けられているボールグリッドアレイ半導体装置であっ
て、該半導体装置の反り量に応じて前記電極の前記はん
だバンプとの接触面積の大きさを変えたことを特徴とす
るボールグリッドアレイ半導体装置。
3. A semiconductor chip is mounted on a substrate having circuit wiring, and an electrode of the semiconductor chip and the circuit wiring are electrically connected to each other, and at least the semiconductor chip and the electrical connection portion are sealed with resin, A ball grid array semiconductor device in which a plurality of solder bumps are provided on the surface of the substrate opposite to the surface on which the semiconductor chip is mounted, the solder bumps of the electrodes depending on the amount of warpage of the semiconductor device. A ball grid array semiconductor device, wherein the size of the contact area with the ball grid array semiconductor is changed.
【請求項4】 基板の半導体チップを搭載した面と反対
側の面に複数のはんだバンプが設けられたボールグリッ
ドアレイ半導体装置が実装される前記はんたバンプに対
応した複数の電極を有する実装基板であって、前記実装
基板上の電極の前記はんだバンプとの接触面積は、前記
ボールグリッドアレイ半導体装置を当該実装基板に搭載
し、はんだをリフローした時に生じる前記はんだバンプ
と前記電極の間の隙間に応じた面積の大きさになってい
ることを特徴とする実装基板。
4. A mounting having a plurality of electrodes corresponding to the solder bumps, on which a ball grid array semiconductor device having a plurality of solder bumps provided on a surface opposite to a surface of the substrate on which the semiconductor chip is mounted is mounted. The area of contact between the electrodes on the mounting board and the solder bumps is between the solder bumps and the electrodes generated when the ball grid array semiconductor device is mounted on the mounting board and solder is reflowed. A mounting board having an area corresponding to a gap.
【請求項5】 基板の半導体チップを搭載した面と反対
側の面に複数のはんだバンプが設けられたボールグリッ
ドアレイ半導体装置を実装基板に実装し、前記はんだを
リフローした時に、前記ボールグリッドアレイ半導体装
置の基板の中央部が前記半導体チップを搭載した面と反
対側の面方向に凸に反らせて前記実装基板上の電極と前
記はんだバンプとを電気的に接続することを特徴とする
実装方法。
5. The ball grid array when a ball grid array semiconductor device having a plurality of solder bumps provided on the surface opposite to the surface on which a semiconductor chip is mounted is mounted on a mounting board and the solder is reflowed. A mounting method characterized in that a central portion of a substrate of a semiconductor device is convexly warped in a surface direction opposite to a surface on which the semiconductor chip is mounted to electrically connect electrodes on the mounting board to the solder bumps. .
JP33064193A 1993-12-27 1993-12-27 Ball grid array semiconductor device Expired - Lifetime JP3632930B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33064193A JP3632930B2 (en) 1993-12-27 1993-12-27 Ball grid array semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33064193A JP3632930B2 (en) 1993-12-27 1993-12-27 Ball grid array semiconductor device

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2000386583A Division JP2001168239A (en) 2000-12-20 2000-12-20 Ball grid array semiconductor device and its packaging method
JP2002300143A Division JP3745329B2 (en) 2002-10-15 2002-10-15 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPH07193162A true JPH07193162A (en) 1995-07-28
JP3632930B2 JP3632930B2 (en) 2005-03-30

Family

ID=18234948

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3632930B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08298264A (en) * 1995-04-27 1996-11-12 Hitachi Ltd Electronic circuit device
JPH098081A (en) * 1995-06-20 1997-01-10 Fujitsu General Ltd Mounting structure of bga package
KR100253870B1 (en) * 1996-03-15 2000-04-15 니시무로 타이죠 Semiconductor device, manufacture thereof, and board frame package tube
US6400019B1 (en) 1999-11-25 2002-06-04 Hitachi, Ltd. Semiconductor device with wiring substrate
US6498390B1 (en) * 1998-09-16 2002-12-24 Intel Corporation Integrated circuit package that includes a thermally conductive tape which attaches a thermal element to a plastic housing
JP2007123478A (en) * 2005-10-27 2007-05-17 Shindengen Electric Mfg Co Ltd Chip-carrier package
KR100899251B1 (en) * 2006-09-12 2009-05-27 가부시키가이샤 히타치세이사쿠쇼 Mounting structure
JP2011103398A (en) * 2009-11-11 2011-05-26 Canon Inc Semiconductor device
US8940629B2 (en) 2010-09-22 2015-01-27 Seiko Instruments Inc. Ball grid array semiconductor package and method of manufacturing the same
KR20160108200A (en) 2015-03-05 2016-09-19 에스아이아이 세미컨덕터 가부시키가이샤 Resin-encapsulated semiconductor device and method of manufacturing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63313846A (en) * 1987-06-17 1988-12-21 Hitachi Ltd Module packaging structure
JPH0722538A (en) * 1993-07-06 1995-01-24 Citizen Watch Co Ltd Structure of ball grid array type semiconductor package

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63313846A (en) * 1987-06-17 1988-12-21 Hitachi Ltd Module packaging structure
JPH0722538A (en) * 1993-07-06 1995-01-24 Citizen Watch Co Ltd Structure of ball grid array type semiconductor package

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08298264A (en) * 1995-04-27 1996-11-12 Hitachi Ltd Electronic circuit device
JPH098081A (en) * 1995-06-20 1997-01-10 Fujitsu General Ltd Mounting structure of bga package
KR100253870B1 (en) * 1996-03-15 2000-04-15 니시무로 타이죠 Semiconductor device, manufacture thereof, and board frame package tube
US6498390B1 (en) * 1998-09-16 2002-12-24 Intel Corporation Integrated circuit package that includes a thermally conductive tape which attaches a thermal element to a plastic housing
US6400019B1 (en) 1999-11-25 2002-06-04 Hitachi, Ltd. Semiconductor device with wiring substrate
JP2007123478A (en) * 2005-10-27 2007-05-17 Shindengen Electric Mfg Co Ltd Chip-carrier package
KR100899251B1 (en) * 2006-09-12 2009-05-27 가부시키가이샤 히타치세이사쿠쇼 Mounting structure
JP2011103398A (en) * 2009-11-11 2011-05-26 Canon Inc Semiconductor device
US8940629B2 (en) 2010-09-22 2015-01-27 Seiko Instruments Inc. Ball grid array semiconductor package and method of manufacturing the same
US9245864B2 (en) 2010-09-22 2016-01-26 Seiko Instruments Inc. Ball grid array semiconductor package and method of manufacturing the same
KR20160108200A (en) 2015-03-05 2016-09-19 에스아이아이 세미컨덕터 가부시키가이샤 Resin-encapsulated semiconductor device and method of manufacturing the same

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