JPH0718765Y2 - 薄膜形成装置 - Google Patents
薄膜形成装置Info
- Publication number
- JPH0718765Y2 JPH0718765Y2 JP9138689U JP9138689U JPH0718765Y2 JP H0718765 Y2 JPH0718765 Y2 JP H0718765Y2 JP 9138689 U JP9138689 U JP 9138689U JP 9138689 U JP9138689 U JP 9138689U JP H0718765 Y2 JPH0718765 Y2 JP H0718765Y2
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- point
- chamber
- wafer
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims description 21
- 235000012431 wafers Nutrition 0.000 claims description 54
- 239000002994 raw material Substances 0.000 claims description 19
- 239000007789 gas Substances 0.000 description 60
- 238000009792 diffusion process Methods 0.000 description 5
- 150000004678 hydrides Chemical class 0.000 description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- OTRPZROOJRIMKW-UHFFFAOYSA-N triethylindigane Chemical compound CC[In](CC)CC OTRPZROOJRIMKW-UHFFFAOYSA-N 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9138689U JPH0718765Y2 (ja) | 1989-08-01 | 1989-08-01 | 薄膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9138689U JPH0718765Y2 (ja) | 1989-08-01 | 1989-08-01 | 薄膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0330269U JPH0330269U (enrdf_load_stackoverflow) | 1991-03-25 |
| JPH0718765Y2 true JPH0718765Y2 (ja) | 1995-05-01 |
Family
ID=31640871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9138689U Expired - Fee Related JPH0718765Y2 (ja) | 1989-08-01 | 1989-08-01 | 薄膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0718765Y2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000025719A (ja) * | 1998-07-08 | 2000-01-25 | Saitama Medeikomu Kk | 薬袋作成システム |
| JP4987192B2 (ja) * | 2001-03-28 | 2012-07-25 | 東日本メディコム株式会社 | 薬剤の服用時点別包装システム |
| JP2005183834A (ja) | 2003-12-22 | 2005-07-07 | Toshiba Ceramics Co Ltd | バレル型サセプタ |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5948789B2 (ja) | 2011-10-18 | 2016-07-06 | 大日本印刷株式会社 | 複写帳票 |
-
1989
- 1989-08-01 JP JP9138689U patent/JPH0718765Y2/ja not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5948789B2 (ja) | 2011-10-18 | 2016-07-06 | 大日本印刷株式会社 | 複写帳票 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0330269U (enrdf_load_stackoverflow) | 1991-03-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |