JPH07162136A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH07162136A
JPH07162136A JP31141093A JP31141093A JPH07162136A JP H07162136 A JPH07162136 A JP H07162136A JP 31141093 A JP31141093 A JP 31141093A JP 31141093 A JP31141093 A JP 31141093A JP H07162136 A JPH07162136 A JP H07162136A
Authority
JP
Japan
Prior art keywords
photo
solder resist
photo solder
insulating substrate
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31141093A
Other languages
Japanese (ja)
Other versions
JP2550899B2 (en
Inventor
Takanori Tsunoda
貴徳 角田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP5311410A priority Critical patent/JP2550899B2/en
Publication of JPH07162136A publication Critical patent/JPH07162136A/en
Application granted granted Critical
Publication of JP2550899B2 publication Critical patent/JP2550899B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To provide a highly reliable printed wiring board having no faulty soldering after mounting of a part by a method wherein the generation of saggings by heat when a photosolder resist is exposed and the prescribed front and back side continuity holes are completely blocked up. CONSTITUTION:A photo-cured part 6 is formed by coating photosolder resist 4 on one surface of an insulating substrate 1 with a front-back continuity hole 2, the internal photosolder resist 4 is exposed by passing light through the prescribed front-back continuity hole 2 only from the other surface, and a photo- cured part 6 is formed. Then, the non-exposed part of the photosolder resist 4 is developed and removed by exposing from the coated surface. Pertaining to the other surface, photosolder resist 4 is applied, exposed and developed using the ordinary method, the photosolder resist 4 on both sides of the insulating film 1 is completely hardened, and a printed wiring board, having the completely blocked front-back continuity hole 2, is obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は印刷配線板の製造方法に
関し、特に表裏導通孔をフォトソルダレジストで閉塞し
た構造の印刷配線板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for manufacturing a printed wiring board having a structure in which front and back conduction holes are closed with a photo solder resist.

【0002】[0002]

【従来の技術】従来の印刷配線板の製造方法として表裏
導通孔をフォトソルダレジストにて閉塞する方法が特開
平2−67786号公報に開示されている。この印刷配
線板の製造方法は、まず、図2(a)に示すように、直
径が0.6mm以下の表裏導通孔2,3及び導体パター
ンを有する絶縁基板1の片面(一方の面)にスクリーン
印刷法によりフォトソルダレジスト4を塗布後、予備乾
燥(通常温度100℃以下)し半硬化状態の感光層を形
成する。次に、図2(b)に示すように、所定のパター
ンを有するマスクフィルム7を介してフォトソルダレジ
スト4を紫外線露光(通常500〜1,000mJ/c
2 )し光硬化部6を形成する。この時、絶縁基板1の
温度は50℃以上に上昇しフォトソルダレジスト4は若
干際溶融する。次に、図2(c)に示すように、炭酸ナ
トリウム水溶液等で現像を行い未露光部のフォトソルダ
レジスト4を除去する。
2. Description of the Related Art As a conventional method of manufacturing a printed wiring board, a method of closing front and back conduction holes with a photo solder resist is disclosed in Japanese Patent Application Laid-Open No. 2-67786. As shown in FIG. 2 (a), first, as shown in FIG. 2 (a), this printed wiring board is manufactured on one surface (one surface) of the insulating substrate 1 having front and back conduction holes 2 and 3 having a diameter of 0.6 mm or less and a conductor pattern. After applying the photo solder resist 4 by the screen printing method, preliminary drying (normal temperature of 100 ° C. or less) is performed to form a semi-cured photosensitive layer. Next, as shown in FIG. 2B, the photo solder resist 4 is exposed to ultraviolet rays through a mask film 7 having a predetermined pattern (usually 500 to 1,000 mJ / c).
m 2 ), and the photo-cured portion 6 is formed. At this time, the temperature of the insulating substrate 1 rises to 50 ° C. or higher, and the photo solder resist 4 slightly melts. Next, as shown in FIG. 2C, development is performed with an aqueous solution of sodium carbonate or the like to remove the photosolder resist 4 in the unexposed portion.

【0003】次に、図2(d)に示すように、フォトソ
ルダレジスト4の未塗布面(他方の面)に前に塗布した
フォトソルダレジスト4の1.1〜1.3倍の厚みのフ
ォトソルダレジスト4をスクリーン印刷法により塗布し
予備乾燥し半硬化状態の感光層を形成する。次に、図2
(e)に示すように、所定のパターンを有するマスクフ
ィルム8を介してフォトソルダレジスト4を前の1〜
1.5倍のエネルギーで紫外線露光し光硬化部6を形成
する。次に、図2(f)に示すように、炭酸ナトリウム
水溶液等で現像を行い未露光部のフォトソルダレジスト
4を除去した後、本加熱処理(通常温度100℃以上)
を行い、両面のフォトソルダレジスト4を完全に硬化さ
せ、表裏導通孔2を閉塞した印刷配線板を得る。
Next, as shown in FIG. 2D, the uncoated surface (the other surface) of the photo solder resist 4 is 1.1 to 1.3 times as thick as the photo solder resist 4 previously coated. The photo solder resist 4 is applied by screen printing and pre-dried to form a semi-cured photosensitive layer. Next, FIG.
As shown in (e), the photo solder resist 4 is covered with the mask film 8 having a predetermined pattern from the previous 1
Ultraviolet exposure is performed with 1.5 times the energy to form the photo-cured portion 6. Next, as shown in FIG. 2 (f), after developing with an aqueous solution of sodium carbonate or the like to remove the photosolder resist 4 in the unexposed portion, main heat treatment (normal temperature 100 ° C. or higher)
Then, the photo solder resists 4 on both sides are completely cured to obtain a printed wiring board in which the front and back conduction holes 2 are closed.

【0004】[0004]

【発明が解決しようとする課題】この従来の印刷配線板
の製造方法では、フォトソルダレジストを露光する際に
フォトソルダレジストが硬化していないため、露光時の
熱によりフォトソルダレジストが再溶融しだれて、図2
(f)に示すように閉塞しない表裏導通孔3が発生する
という問題点があった。
In this conventional method for manufacturing a printed wiring board, since the photo solder resist is not cured when the photo solder resist is exposed, the photo solder resist is remelted by the heat during the exposure. Fig. 2
As shown in (f), there is a problem that front and back conduction holes 3 that are not closed are generated.

【0005】本発明の目的は、閉塞しない表裏導通孔の
発生を防止し部品搭載後のはんだ付け不良がなく信頼性
の高い印刷配線板の製造方法を提供することにある。
An object of the present invention is to provide a method of manufacturing a printed wiring board which prevents the occurrence of front and back conduction holes that do not close and does not cause soldering defects after component mounting and has high reliability.

【0006】[0006]

【課題を解決するための手段】本発明の印刷配線板の製
造方法は、表裏導通孔及び導体パターンを有する絶縁基
板の一方の面上にフォトソルダレジストを塗布し予備乾
燥する工程と、前記絶縁基板の他方の面側から前記表裏
導通孔のみに光を通してこの表裏導通孔内部の前記フォ
トソルダレジストを露光して光硬化する工程と、前記絶
縁基板の前記一方の面からマスクフィルムを介して前記
フォトソルダレジストを露光して光硬化する工程と、こ
のフォトソルダレジストを現像し未露光部を除去する工
程と、前記絶縁基板の前記他方の面上にフォトソルダレ
ジストを塗布し予備乾燥する工程と、このフォトソルダ
レジストをマスクフィルムを介して露光し光硬化する工
程と、前記フォトソルダレジストを現像し未露光部を除
去する工程と、加熱または紫外線照射処理により両面の
フォトソルダレジストを完全に硬化し表裏導通孔を閉塞
する工程とを含む。
A method of manufacturing a printed wiring board according to the present invention comprises a step of applying a photo solder resist on one surface of an insulating substrate having front and back conduction holes and a conductor pattern, and predrying the insulating substrate. Light-curing by exposing the photo solder resist inside the front and back conduction holes from the other surface side of the substrate only through the light through the front and back conduction holes, and through the mask film from the one surface of the insulating substrate. A step of exposing and photo-curing the photo solder resist, a step of developing the photo solder resist to remove an unexposed portion, and a step of applying a photo solder resist on the other surface of the insulating substrate and preliminary drying. A step of exposing the photo solder resist through a mask film to photo-cure it, a step of developing the photo solder resist to remove an unexposed portion, Or comprising the ultraviolet irradiation treatment and the step of closing the sides introducing hole completely cured both sides of the photo solder resist.

【0007】[0007]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will now be described with reference to the drawings.

【0008】図1(a)〜(g)は本発明の第1の実施
例を説明する工程順に示した断面図である。本発明の第
1の実施例は、まず、図1(a)に示すように、直径が
0.6mmの表裏導通孔2及び導体パターンを有する絶
縁基板1の片面(一方の面)にスクリーン印刷法により
フォトソルダレジスト4を厚みがほぼ5μm以上になる
ように塗布後、温度80℃で30分間予備乾燥し半硬化
状態の感光層を形成する。この時、表裏導通孔2はフォ
トソルダレジスト4で閉塞された状態となる。次に、図
1(b)に示すように、フォトソルダレジスト4の未塗
布面(他方の面)から閉塞する表裏導通孔2のみに光を
透過する第1のマスクフィルム5を介して表裏導通孔2
の内部のフォトソルダレジスト4を100mJ/cm2
で紫外線露光し光硬化部6を形成する。この時、フォト
ソルダレジスト4の温度は20〜30℃程度しか上昇し
ないため、再溶融することなくだれは生じない。次に、
図1(c)に示すように、フォトソルダレジスト4の塗
布面より所定のパターンを有する第2のマスクフィルム
7を介して500mJ/cm2 の紫外線露光を行いフォ
トソルダレジスト4に光硬化部6を形成する。この時、
フォトソルダレジスト4の温度は50℃以上になるが表
裏導通孔2内のフォトソルダレジスト4は光硬化して光
硬化部6を形成しているのでだれは生じない。次に、図
1(d)に示すように、濃度が約1重量%の炭酸ナトリ
ウム水溶液で現像を行い未露光部のフォトソルダレジス
ト4を除去する。
FIGS. 1A to 1G are sectional views showing a first embodiment of the present invention in the order of steps. In the first embodiment of the present invention, as shown in FIG. 1A, first, screen printing is performed on one surface (one surface) of an insulating substrate 1 having front and back conduction holes 2 having a diameter of 0.6 mm and a conductor pattern. Method, the photo solder resist 4 is applied to a thickness of about 5 μm or more, and then pre-dried at a temperature of 80 ° C. for 30 minutes to form a semi-cured photosensitive layer. At this time, the front and back conduction holes 2 are closed by the photo solder resist 4. Next, as shown in FIG. 1B, front and back conduction is performed through the first mask film 5 that transmits light only to the front and back conduction holes 2 that are blocked from the uncoated surface (the other surface) of the photo solder resist 4. Hole 2
100mJ / cm 2 of photo solder resist 4 inside the
And is exposed to ultraviolet light to form the photo-cured portion 6. At this time, the temperature of the photo solder resist 4 rises only about 20 to 30 ° C., so that no dripping occurs without remelting. next,
As shown in FIG. 1C, 500 mJ / cm 2 of UV light is exposed from the coated surface of the photo solder resist 4 through the second mask film 7 having a predetermined pattern to expose the photo solder resist 4 to the photo-cured portion 6. To form. This time,
The temperature of the photo solder resist 4 becomes 50 ° C. or higher, but since the photo solder resist 4 in the front and back conduction holes 2 is photo-cured to form the photo-cured portion 6, no sagging occurs. Next, as shown in FIG. 1D, development is performed with a sodium carbonate aqueous solution having a concentration of about 1% by weight to remove the photosolder resist 4 in the unexposed portion.

【0009】次に、図1(e)に示すように、他方の面
にスクリーン印刷法によりフォトソレダレジスト4を厚
みがほぼ5μm以上になるように塗布後、温度80℃で
30分間予備乾燥し半硬化状態の感光層を形成する。次
に、図1(f)に示すように、所定のパターンを有する
第3のマスクフィルム8を介して500mJ/cm2
紫外線露光を行いフォトソルダレジスト4に光硬化部6
を形成する。次に、図1(g)に示すように、濃度が約
1重量%の炭酸ナトリウム水溶液で現像を行い未露光部
のフォトソルダレジスト4を除去した後、温度150℃
で60分間の本加熱処理を行い両面のフォトソルダレジ
スト4を完全に硬化させ表裏導通孔2を閉塞した第1の
実施例による印刷配線板を得る。
Next, as shown in FIG. 1 (e), a photosolder resist 4 is applied to the other surface by a screen printing method so that the thickness is about 5 μm or more, and then pre-dried at a temperature of 80 ° C. for 30 minutes. A photosensitive layer in a semi-cured state is formed. Next, as shown in FIG. 1 (f), UV exposure of 500 mJ / cm 2 is performed through the third mask film 8 having a predetermined pattern, and the photo solder resist 4 is exposed to the photo-cured portion 6.
To form. Next, as shown in FIG. 1 (g), after developing with an aqueous solution of sodium carbonate having a concentration of about 1% by weight to remove the unexposed portion of the photo solder resist 4, a temperature of 150 ° C.
Then, the main heat treatment is performed for 60 minutes to completely cure the photo solder resists 4 on both sides to obtain the printed wiring board according to the first embodiment in which the front and back conduction holes 2 are closed.

【0010】本発明の第2の実施例は、フォトソルダレ
ジストのコート法と硬化法が異るのみで各工程の構成は
図1(a)〜(g)に示すように第1の実施例と同じで
ある。まず、図1(a)に示すように、直径が0.6m
mの表裏導通孔2及び導体パターンを有する絶縁基板1
の片面(一方の面)にカーテンコート法によりフォトソ
ルダレジスト4を厚みが5μm以上になるように塗布
後、温度80℃で30分間予備乾燥し半硬化状態の感光
層を形成する。この時、表裏導通孔2はフォトソルダレ
ジスト4で閉塞された状態となる。次に、図1(b)に
示すように、フォトソルダレジスト4未塗布面(他方の
面)から閉塞する表裏導通孔2のみに光を透過する第1
のマスクフィルム5を介して表裏導通孔2の内部のフォ
トソルダレジスト4を100mJ/cm2 で紫外線露光
し光硬化部6を形成する。この時、フォトソルダレジス
ト4の温度は20〜30℃程度しか上昇しないため、再
溶融することはなくだれは生じない。次に、図1(c)
に示すように、フォトソルダレジスト4の塗布面より所
定のパターンを有する第2のマスクフィルム7を介して
500mJ/cm2 の紫外線露光を行いフォトソルダレ
ジスト4に光硬化部6を形成する。この時、フォトソル
ダレジスト4の温度は50℃以上になるが表裏導通孔2
内のフォトソルダレジスト4は光硬化して光硬化部6を
形成しているのでだれは生じない。次に、図1(d)に
示すように、濃度が約1重量%の炭酸ナトリウム水溶液
で現像を行い未露光部のフォトソルダレジスト4を除去
する。
The second embodiment of the present invention is different only in the photo solder resist coating method and the curing method, and the constitution of each step is as shown in FIGS. 1 (a) to 1 (g). Is the same as. First, as shown in FIG. 1A, the diameter is 0.6 m.
Insulating substrate 1 having m front and back conduction holes 2 and conductor pattern
After applying the photo solder resist 4 to one side (one side) by the curtain coating method so that the thickness is 5 μm or more, it is pre-dried at a temperature of 80 ° C. for 30 minutes to form a semi-cured photosensitive layer. At this time, the front and back conduction holes 2 are closed by the photo solder resist 4. Next, as shown in FIG. 1B, the first solder layer 4 transmits light only to the front and back conduction holes 2 that are closed from the non-coated surface (the other surface) of the photo solder resist 4.
The photo-solder resist 4 inside the front and back conduction holes 2 is exposed to ultraviolet rays at 100 mJ / cm 2 through the mask film 5 of (1) to form a photo-cured portion 6. At this time, the temperature of the photo solder resist 4 rises only about 20 to 30 ° C., so that the photo solder resist 4 does not melt again and no drool occurs. Next, FIG. 1 (c)
As shown in FIG. 3, the photocured portion 6 is formed on the photosolder resist 4 by exposing the coated surface of the photosolder resist 4 to ultraviolet rays of 500 mJ / cm 2 through the second mask film 7 having a predetermined pattern. At this time, the temperature of the photo solder resist 4 becomes 50 ° C. or higher, but the front and back conduction holes 2
Since the photo solder resist 4 therein is photo-cured to form the photo-cured portion 6, no sagging occurs. Next, as shown in FIG. 1D, development is performed with a sodium carbonate aqueous solution having a concentration of about 1% by weight to remove the photosolder resist 4 in the unexposed portion.

【0011】次に、図1(e)に示すように、他方の面
にカーテンコート法によりフォトソルダレジスト4を厚
みがほぼ5μm以上になるように塗布後、温度180℃
で30分間予備乾燥し半硬化状態の感光層を形成する。
次に、図1(f)に示すように、所定のパターンを有す
る第3のマスクフィルム8を介して500mJ/cm2
の紫外線露光を行いフォトソルダレジスト4に光硬化部
6を形成する。次に、図1(g)に示すように、濃度が
約1重量%の炭酸ナトリウム水溶液で現像を行い未露光
部のフォトソルダレジスト4を除去した後、2,000
mJ/cm2 の紫外線照射を行い両面のフォトソルダレ
ジスト4を完全に硬化させ表裏導通孔2を閉塞した第2
の実施例による印刷配線板を得る。第2の実施例では、
カーテンコート法によりフォトソルダレジストを塗布す
るので生産効率を高めることができるという効果があ
る。
Next, as shown in FIG. 1 (e), a photo solder resist 4 is applied to the other surface by a curtain coating method so that the thickness is about 5 μm or more, and then the temperature is 180 ° C.
And pre-dried for 30 minutes to form a semi-cured photosensitive layer.
Next, as shown in FIG. 1 (f), 500 mJ / cm 2 is applied through the third mask film 8 having a predetermined pattern.
Then, the photo-cured portion 6 is formed on the photo solder resist 4. Next, as shown in FIG. 1 (g), after developing with an aqueous solution of sodium carbonate having a concentration of about 1% by weight to remove the unexposed portion of the photo solder resist 4, 2,000
By irradiating with ultraviolet rays of mJ / cm 2 , the photo solder resist 4 on both sides was completely cured and the front and back conduction holes 2 were closed.
A printed wiring board according to the example is obtained. In the second embodiment,
Since the photo solder resist is applied by the curtain coating method, the production efficiency can be improved.

【0012】[0012]

【発明の効果】以上説明したように本発明は、表裏導通
孔及び導体パターンを有する絶縁基板の一方の面上にフ
ォトソルダレジストを塗布し予備乾燥した後絶縁基板の
他方の面から表裏導通孔のみに光を透して内部のフォト
ソルダレジストを露光して光硬化するのでフォトソルダ
レジストの露光時の熱によるだれの発生を防止でき所定
の表裏導通孔を完全に閉塞できるので、部品搭載後のは
んだ付け不良がなく信頼性の高い印刷配線板が得られる
という効果がある。
As described above, according to the present invention, a photo solder resist is applied on one surface of an insulating substrate having front and back conduction holes and a conductor pattern and pre-dried, and then the front and back conduction holes are formed from the other surface of the insulating substrate. The internal photosolder resist is exposed to light and is photo-cured, so that it is possible to prevent dripping due to heat during exposure of the photosolder resist and completely close the specified front and back conduction holes. It is possible to obtain a highly reliable printed wiring board without soldering defects.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)〜(g)は本発明の第1の実施例を説明
する工程順に示した断面図である。
1A to 1G are cross-sectional views showing a process sequence of a first embodiment of the present invention.

【図2】(a)〜(f)は従来の印刷配線板の製造方法
の一例を説明する工程順に示した断面図である。
2A to 2F are cross-sectional views showing the order of steps for explaining an example of a conventional method for manufacturing a printed wiring board.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2,3 表裏導通孔 4 フォトソルダレジスト 5 第1のマスクフィルム 6 光硬化部 7 第2のマスクフィルム 8 第3のマスクフィルム DESCRIPTION OF SYMBOLS 1 Insulating substrate 2 and 3 Front and back conduction hole 4 Photo solder resist 5 1st mask film 6 Photocuring part 7 2nd mask film 8 3rd mask film

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 表裏導通孔及び導体パターンを有する絶
縁基板の一方の面上にフォトソルダレジストを塗布し予
備乾燥する工程と、前記絶縁基板の他方の面側から前記
表裏導通孔のみに光を通してこの表裏導通孔内部の前記
フォトソルダレジストを露光して光硬化する工程と、前
記絶縁基板の前記一方の面からマスクフィルムを介して
前記フォトソルダレジストを露光して光硬化する工程
と、このフォトソルダレジストを現像し未露光部を除去
する工程と、前記絶縁基板の前記他方の面上にフォトソ
ルダレジストを塗布し予備乾燥する工程と、このフォト
ソルダレジストをマスクフィルムを介して露光し光硬化
する工程と、前記フォトソルダレジストを現像し未露光
部を除去する工程と、前記絶縁基板両面の光硬化したフ
ォトソルダレジストを完全に硬化し前記表裏導通孔を閉
塞する工程とを含むことを特徴とする印刷配線板の製造
方法。
1. A step of applying a photo solder resist on one surface of an insulating substrate having front and back conduction holes and a conductor pattern and pre-drying, and passing light from the other surface side of the insulating substrate to only the front and back conduction holes. A step of exposing and photo-curing the photo solder resist inside the front and back conduction holes; a step of exposing and photo-curing the photo solder resist from the one surface of the insulating substrate through a mask film; The step of developing the solder resist to remove the unexposed portion, the step of applying the photo solder resist on the other surface of the insulating substrate and pre-drying, and the photo-curing by exposing the photo solder resist through the mask film. And a step of developing the photo solder resist to remove the unexposed portion, and a photo-cured photo solder resist on both surfaces of the insulating substrate. Completely curing and closing the front and back conduction holes.
【請求項2】 前記絶縁基板両面の光硬化したフォトソ
ルダレジストを完全に硬化する工程が加熱処理により硬
化する工程を含むことを特徴とする請求項1記載の印刷
配線板の製造方法。
2. The method for manufacturing a printed wiring board according to claim 1, wherein the step of completely curing the photo-cured photo solder resist on both surfaces of the insulating substrate includes a step of curing by heat treatment.
【請求項3】 前記絶縁基板両面の光硬化したフォトソ
ルダレジストを完全に硬化する工程が紫外線照射処理に
より硬化する工程を含むことを特徴とする請求項1記載
の印刷配線板の製造方法。
3. The method of manufacturing a printed wiring board according to claim 1, wherein the step of completely curing the photo-cured photo solder resist on both surfaces of the insulating substrate includes a step of curing by ultraviolet irradiation treatment.
JP5311410A 1993-12-13 1993-12-13 Method for manufacturing printed wiring board Expired - Fee Related JP2550899B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5311410A JP2550899B2 (en) 1993-12-13 1993-12-13 Method for manufacturing printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5311410A JP2550899B2 (en) 1993-12-13 1993-12-13 Method for manufacturing printed wiring board

Publications (2)

Publication Number Publication Date
JPH07162136A true JPH07162136A (en) 1995-06-23
JP2550899B2 JP2550899B2 (en) 1996-11-06

Family

ID=18016873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5311410A Expired - Fee Related JP2550899B2 (en) 1993-12-13 1993-12-13 Method for manufacturing printed wiring board

Country Status (1)

Country Link
JP (1) JP2550899B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102170758A (en) * 2011-04-13 2011-08-31 深南电路有限公司 Circuit board double window resistance welding hole filling processing method and resistance welding exposure film
CN102281724A (en) * 2011-08-26 2011-12-14 广州杰赛科技股份有限公司 Method for machining double-sided windowed plug hole
CN104010454A (en) * 2013-02-21 2014-08-27 Si弗莱克斯有限公司 BVH coating PSR printing technology using via fill copper plating
CN107529281A (en) * 2017-09-30 2017-12-29 生益电子股份有限公司 A kind of PCB preparation method and PCB

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102170758A (en) * 2011-04-13 2011-08-31 深南电路有限公司 Circuit board double window resistance welding hole filling processing method and resistance welding exposure film
CN102281724A (en) * 2011-08-26 2011-12-14 广州杰赛科技股份有限公司 Method for machining double-sided windowed plug hole
CN104010454A (en) * 2013-02-21 2014-08-27 Si弗莱克斯有限公司 BVH coating PSR printing technology using via fill copper plating
CN107529281A (en) * 2017-09-30 2017-12-29 生益电子股份有限公司 A kind of PCB preparation method and PCB
CN107529281B (en) * 2017-09-30 2019-09-20 生益电子股份有限公司 A kind of production method and PCB of PCB

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