JP2633424B2 - Manufacturing method of printed wiring board - Google Patents

Manufacturing method of printed wiring board

Info

Publication number
JP2633424B2
JP2633424B2 JP26158291A JP26158291A JP2633424B2 JP 2633424 B2 JP2633424 B2 JP 2633424B2 JP 26158291 A JP26158291 A JP 26158291A JP 26158291 A JP26158291 A JP 26158291A JP 2633424 B2 JP2633424 B2 JP 2633424B2
Authority
JP
Japan
Prior art keywords
holes
back conduction
solder resist
coating method
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP26158291A
Other languages
Japanese (ja)
Other versions
JPH05102644A (en
Inventor
秀輝 寺西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOYAMA NIPPON DENKI KK
Original Assignee
TOYAMA NIPPON DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOYAMA NIPPON DENKI KK filed Critical TOYAMA NIPPON DENKI KK
Priority to JP26158291A priority Critical patent/JP2633424B2/en
Publication of JPH05102644A publication Critical patent/JPH05102644A/en
Application granted granted Critical
Publication of JP2633424B2 publication Critical patent/JP2633424B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、印刷配線板の製造方法
に関し、特に、高密度,高精度の印刷配線板の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for manufacturing a high-density, high-precision printed wiring board.

【0002】[0002]

【従来の技術】一般に、印刷配線板(以下、PWBと記
す)の表面には、ソルダレジスト(以下SRと称す)と
呼ばれる絶縁特性を持つ樹脂層を有するが、特に、高密
度,高精度の印刷配線板の製造には、光硬化性樹脂を主
成分とした液状SRインクが、多く用いられており、こ
の方法によれば、図4(a)の如く、基板12に表裏導
通用スルーホール1を含む導体パターンを形成した後、
図4(b)の如く、粘度範囲が1〜400psの液状S
Rインク2をバーコート法,スクリーン印刷法,ロール
コート法,スプレーコート法,カーテンコート法等によ
り、表裏導通用スルーホール1を含む基板12全面に1
2 当り70〜100gの割合で塗布し、70〜100
℃で5〜40分間乾燥して、半硬化状態の感光層を形成
する。次に、図4(c)の如く、マスクフィルム3,4
を介して、所定のSRパターンをUV光5で露光した
後、現像液で未露光部を除去したのち、120〜160
℃で20〜90分間加熱処理を行い図4(d)の如く、
SRパターン6を得ていた。
2. Description of the Related Art Generally, a printed wiring board (hereinafter, referred to as PWB) has a resin layer having an insulating property called a solder resist (hereinafter, referred to as SR) on a surface thereof. In the production of printed wiring boards, a liquid SR ink containing a photocurable resin as a main component is often used. According to this method, as shown in FIG. After forming the conductor pattern including 1
As shown in FIG. 4B, the liquid S having a viscosity range of 1 to 400 ps.
The R ink 2 is applied to the entire surface of the substrate 12 including the through hole 1 for front and back conduction by a bar coating method, a screen printing method, a roll coating method, a spray coating method, a curtain coating method, or the like.
70 to 100 g per 2 m 2 , 70 to 100 g
Dry at 5 ° C. for 5 to 40 minutes to form a semi-cured photosensitive layer. Next, as shown in FIG.
After exposing a predetermined SR pattern with UV light 5 through the above, the unexposed portion is removed with a developing solution,
Heat treatment at 20 ° C. for 20 to 90 minutes, as shown in FIG.
SR pattern 6 was obtained.

【0003】また、高密度,高精度を問わないPWBに
おいては、図5(a)の如く、基板12に表裏導通用ス
ルーホール1を含む導体パターンを形成した後、図5
(b)の如く、液状SRインク2を表裏導通用スルーホ
ール1を含む基板12の片面に1m2 当り70〜100
gの割合でバーコート法,スクリーン印刷法,ロールコ
ート法,スプレーコート法,カーテンコート法により塗
布し、70〜100℃で5〜40分間乾燥して、半硬化
状態の感光層を形成する。次に、図5(c)の如く、マ
スクフィルム3を介して所定のパターンをUV光5で露
光し、現像液で未露光部を除去した後、図5(d)の如
く、SRパターン6を得る。更に、図6(a)の如く、
相対する面に液状SRインク2の塗布量の1.1〜1.
3倍量の液状SRインク8をバーコート法,スクリーン
印刷法,ロールコート法,スプレーコート法,カーテン
コート法等により塗布し、70〜100℃で5〜40分
間乾燥して、半硬化状態の感光層を形成する。この時、
塗布量が1.1〜1.3倍量で塗布されるため、表裏導
通用スルーホール1は、中のエアーの熱膨張による液状
SRインク8の破裂がなく閉塞されている。次に、図6
(b)の如く、マスクフィルム4を介して所定のパター
ンをUV光5の露光量の1.1〜1.3倍量であるUV
光10で露光した後、現像液で未露光部を除去した後1
20〜160℃で20〜90分間加熱処理を行い、図6
(c)の如く、SRパターン11を得ていた。
[0005] In a PWB which does not require high density and high precision, as shown in FIG. 5A, after a conductor pattern including a through hole 1 for front and back conduction is formed on a substrate 12, FIG.
As shown in (b), the liquid SR ink 2 is applied to one surface of the substrate 12 including the through holes 1 for front / back conduction at a rate of 70 to 100 / m 2.
The composition is applied by a bar coating method, a screen printing method, a roll coating method, a spray coating method, a curtain coating method at a ratio of g, and dried at 70 to 100 ° C. for 5 to 40 minutes to form a semi-cured photosensitive layer. Next, as shown in FIG. 5C, a predetermined pattern is exposed to UV light 5 through a mask film 3 and an unexposed portion is removed with a developing solution. Then, as shown in FIG. Get. Further, as shown in FIG.
The amount of the liquid SR ink 2 applied to the opposing surfaces is 1.1 to 1.
Three times the amount of the liquid SR ink 8 is applied by a bar coating method, a screen printing method, a roll coating method, a spray coating method, a curtain coating method or the like, and dried at 70 to 100 ° C. for 5 to 40 minutes to obtain a semi-cured state. Form a photosensitive layer. At this time,
Since the application amount is 1.1 to 1.3 times the application amount, the through hole 1 for front and back conduction is closed without bursting of the liquid SR ink 8 due to thermal expansion of the air inside. Next, FIG.
As shown in (b), a predetermined pattern is formed through the mask film 4 so that the exposure amount of the UV light 5 is 1.1 to 1.3 times the amount of UV light.
After exposing with light 10 and removing unexposed portions with a developing solution,
A heat treatment is performed at 20 to 160 ° C. for 20 to 90 minutes, and FIG.
As shown in (c), the SR pattern 11 was obtained.

【0004】[0004]

【発明が解決しようとする課題】この従来のPWBの製
造方法では、表裏導通用スルーホールを完全に塞ぐこと
ができず、部品搭載後のはんだ付けにおいて、搭載面側
まではんだが昇り、ブリッジを発生すること、また、は
んだが表裏導通用スルーホールを通して昇って部品へ接
触して熱衝撃を与えること、近接する表裏導通用スルー
ホール間のはんだブリッジを発生させること、近接する
表裏導通用スルーホール間のはんだブリッジを発生させ
ること、表裏導通用スルーホールにフラックス等の残渣
により腐食し電気的故障をおこすこと等の問題点があ
り、また、相対する面のSR膜厚を厚くすることにより
表裏導通用スルーホールの閉塞は可能となるが、半面、
高密度,高精度対応のSRパターンが得られなくなると
いう問題点があった。
In this conventional method of manufacturing a PWB, the through hole for front and back conduction cannot be completely closed, and the solder rises to the mounting surface side in the soldering after the component is mounted, and the bridge is formed. That the solder rises through the through-holes for front-to-back conduction and makes thermal shock by contacting the component; generates a solder bridge between the adjacent through-holes for front-to-back conduction; There are problems such as the occurrence of solder bridges between them, and corrosion of residual residues such as flux in the through-holes for front-to-back conduction, causing electrical failure, and the like. Although the through hole for conduction can be closed,
There is a problem that a high-density, high-precision SR pattern cannot be obtained.

【0005】本発明の目的は、表裏導通用スルーホール
に対し、部品搭載面側でのはんだ昇りでのブリッジ及び
部品への熱衝撃の防止,表裏導通用スルーホール間のブ
リッジの防止、更に表裏導通用スルーホール内への腐食
物質の進入の防止を実施するPWBの製造方法を提供す
ることにある。
SUMMARY OF THE INVENTION It is an object of the present invention to prevent a thermal shock to a bridge and a component when a solder rises on a component mounting surface, a bridge between a front and a back conductive through hole, and a front and a back. It is an object of the present invention to provide a method for manufacturing a PWB that prevents a corrosive substance from entering a through hole for conduction.

【0006】[0006]

【課題を解決するための手段】本発明の印刷配線板の製
造方法は、基板に表裏導通用スルーホールを含む導体パ
ターンを形成する工程と、光硬化性液状ソルダレジスト
インクを両面に全面塗布する工程と、マスクフィルムを
当接し露光後現像により前記光硬化性液状ソルダレジス
トインクの未露光部を除去することにより所定のソルダ
レジストパターンを形成する工程と、該ソルダレジスト
パターンを含む基板に片面ずつ再度光硬化性液状ソルダ
レジストインクを重ねて塗布する工程と、前記表裏導通
用スルーホールの内閉塞を必要とする表裏導通用スルー
ホールのみ露光した後現像により未露光部を除去する工
程と、その後熱硬化により前記閉塞を必要とする表裏導
通用スルーホールの穴を閉塞する工程を含んで構成され
る。
According to the method of manufacturing a printed wiring board of the present invention, a step of forming a conductor pattern including through holes for front and back conduction on a substrate and a step of applying a photocurable liquid solder resist ink on both surfaces are performed. Forming a predetermined solder resist pattern by removing a non-exposed portion of the photocurable liquid solder resist ink by abutting a mask film and developing after exposure, and one surface at a time on a substrate including the solder resist pattern. A step of applying the photocurable liquid solder resist ink again, and a step of removing the unexposed portions by developing after exposing only the front and back conduction through holes that require the obstruction of the front and back conduction through holes, and thereafter The method includes a step of closing a hole of the front-back conduction through-hole requiring the closing by thermosetting.

【0007】[0007]

【実施例】次に、本発明の実施例について、図面を参照
して説明する。
Next, embodiments of the present invention will be described with reference to the drawings.

【0008】図1(a)〜(d),図2(a)〜(c)
及び図3(a)〜(c)は本発明の一実施例を説明する
工程順に示した断面図である。
FIGS. 1 (a) to 1 (d), 2 (a) to 2 (c)
3 (a) to 3 (c) are cross-sectional views shown in the order of steps for explaining one embodiment of the present invention.

【0009】まず、図1(a)の如く、基板12に表裏
導通用スルーホール1を含む導体パターンを形成する。
First, as shown in FIG. 1A, a conductor pattern including a through hole 1 for front and back conduction is formed on a substrate 12.

【0010】次に、図1(b)の如く、粘度範囲が1〜
400psの液状SRインク2をバーコート法,スクリ
ーン印刷法,ローラーコート法,スプレーコート法,カ
ーテンコート法等により、基板12全面に1m2 当り7
0〜100gの割合で塗布し、70〜100℃で5〜4
0分間乾燥して半硬化状態の感光層を形成する。
Next, as shown in FIG.
A 400 ps liquid SR ink 2 is applied to the entire surface of the substrate 12 at a rate of 7 / m 2 by a bar coating method, a screen printing method, a roller coating method, a spray coating method, a curtain coating method, or the like.
It is applied at a rate of 0 to 100 g, and 5 to 4 at 70 to 100 ° C.
Dry for 0 minutes to form a semi-cured photosensitive layer.

【0011】次いで、図1(c)の如く、マスクフィル
ム3,4を介して所定のSRパターンをUV光5で露光
した後、現像液で未露光部を除去し、図1(d)の如
く、SRパターン6を得る。
Next, as shown in FIG. 1C, a predetermined SR pattern is exposed to UV light 5 through the mask films 3 and 4, and the unexposed portions are removed with a developing solution. Thus, the SR pattern 6 is obtained.

【0012】更に、図2(a)の如く、粘度範囲が1〜
400psの液状SRインク2をバーコート法,スクリ
ーン印刷法,ロールコート法,スプレーコート法,カー
テンコート法等により片面に重ねて塗布し、70〜10
0℃で5〜40分間乾燥する。
Further, as shown in FIG.
400 ps of the liquid SR ink 2 is applied on one side by a bar coating method, a screen printing method, a roll coating method, a spray coating method, a curtain coating method, etc.
Dry at 0 ° C. for 5-40 minutes.

【0013】この後、図2(b)の如く、閉塞を必要と
する表裏導通用スルーホール1以外を遮光したマスクフ
ィルム7を介してUV光5で露光した後、現像液により
未露光部を除去し、図2(c)の如く、片面に、表裏導
通スルーホール1を閉塞するSRパターン6を得る。
Thereafter, as shown in FIG. 2 (b), after exposing with UV light 5 through a mask film 7 which shields the portions other than the front and back conduction through holes 1 which need to be closed, the unexposed portions are developed with a developing solution. Then, as shown in FIG. 2C, an SR pattern 6 for closing the front and back conductive through holes 1 is obtained on one surface.

【0014】次に、図3(a)の如く、粘度範囲が1〜
400psで液状SRインク2の塗布量の1.1〜1.
3倍量の液状SRインク8をバーコート法,スクリーン
印刷法,スプレーコート法,カーテンコート法等により
他面に重ねて塗布し、70〜100℃で5〜40分間乾
燥する。
Next, as shown in FIG.
At 400 ps, the application amount of the liquid SR ink 2 is 1.1 to 1.
A triple amount of the liquid SR ink 8 is applied on the other surface by a bar coating method, a screen printing method, a spray coating method, a curtain coating method or the like, and dried at 70 to 100 ° C. for 5 to 40 minutes.

【0015】この後、図3(b)の如く、閉塞を必要と
する表裏導通用スルーホール1以外を遮光したマスクフ
ィルム9を介してUV光10で露光した後、未露光部を
除去し120〜160℃で20〜90分間加熱処理を行
い、図3(c)の如く、他面に表裏導通用スルーホール
1を閉塞するSRパターン11を得る。
Thereafter, as shown in FIG. 3 (b), after exposing with UV light 10 through a mask film 9 which blocks light except for the front and back conduction through holes 1 which need to be closed, an unexposed portion is removed. A heat treatment is performed at a temperature of up to 160 ° C. for 20 to 90 minutes to obtain an SR pattern 11 for closing the front and back conduction through holes 1 on the other surface as shown in FIG.

【0016】尚、図3(b)において、マスクフィルム
9は、図2(b)のマスクフィルム7を共用することが
できる。また、UV光の代わりに、電子線にて露光する
こともできる。
In FIG. 3B, the mask film 9 in FIG. 2B can be used as the mask film 9. In addition, exposure can be performed with an electron beam instead of UV light.

【0017】[0017]

【発明の効果】以上、説明したように本発明によれば、
高精度,高密度のPWBの表裏導通用スルーホールを完
全に塞ぐことができるため、部品搭載後のはんだ付けに
おいて、はんだ昇りによるブリッジを防止できること、
はんだが表裏導通用スルーホールを通して昇って部品へ
接触して熱衝撃を与えることを防止できること、近接す
る表裏導通用スルーホール間のはんだブリッジを防止で
きること、表裏導通用スルーホール内の腐食物質の進入
を防止できること等の効果がある。
As described above, according to the present invention,
High-precision, high-density PWB through-holes for front-to-back conduction can be completely closed, so that soldering after mounting components can prevent bridges due to solder rise.
It can prevent the solder from rising through the front and back conduction through-holes and coming into contact with the parts to give a thermal shock, prevent solder bridging between adjacent front and back conduction through-holes, and ingress of corrosive substances into the front and back conduction through-holes And the like.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を説明する工程順に示した断
面図である。
FIG. 1 is a cross-sectional view shown in the order of steps for explaining an embodiment of the present invention.

【図2】本発明の一実施例を説明する工程順に示した断
面図である。
FIG. 2 is a cross-sectional view shown in the order of steps for explaining an embodiment of the present invention.

【図3】本発明の一実施例を説明する工程順に示した断
面図である。
FIG. 3 is a cross-sectional view showing the order of steps for explaining one embodiment of the present invention.

【図4】従来のPWBの製造方法の一例を説明する工程
順に示した断面図である。
FIG. 4 is a cross-sectional view shown in a process order for explaining an example of a conventional PWB manufacturing method.

【図5】従来のPWBの製造方法の他の例を説明する工
程順に示した断面図である。
FIG. 5 is a cross-sectional view shown in the order of steps for explaining another example of the conventional PWB manufacturing method.

【図6】従来のPWBの製造方法の他の例を説明する工
程順に示した断面図である。
FIG. 6 is a cross-sectional view shown in the order of steps for explaining another example of the conventional PWB manufacturing method.

【符号の説明】[Explanation of symbols]

1 表裏導通用スルーホール 2,8 液状SRインク 3,4,7,9 マスクフィルム 5,10 UV光 6,11 SRパターン 12 基板 DESCRIPTION OF SYMBOLS 1 Through hole for front and back conduction 2,8 Liquid SR ink 3,4,7,9 Mask film 5,10 UV light 6,11 SR pattern 12 Substrate

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板に表裏導通用スルーホールを含む導
体パターンを形成する工程と、光硬化性液状ソルダレジ
ストインクを両面に全面塗布する工程と、マスクフィル
ムを当接し露光後現像により前記光硬化性液状ソルダレ
ジストインクの未露光部を除去することにより所定のソ
ルダレジストパターンを形成する工程と、該ソルダレジ
ストパターンを含む基板に片面ずつ再度光硬化性液状ソ
ルダレジストインクを重ねて塗布する工程と、前記表裏
導通用スルーホールの内閉塞を必要とする表裏導通用ス
ルーホールのみ露光した後現像により未露光部を除去す
る工程と、その後熱硬化により前記閉塞を必要とする表
裏導通用スルーホールの穴を閉塞することを特徴とする
印刷配線板の製造方法。
1. A step of forming a conductor pattern including through holes for front and back conduction on a substrate, a step of applying a photo-curable liquid solder resist ink on both surfaces, and a step of contacting a mask film and developing after exposure by the photo-curing. Forming a predetermined solder resist pattern by removing the unexposed portions of the liquid solder resist ink, and applying a photocurable liquid solder resist ink again on each side of the substrate containing the solder resist pattern again The step of removing the unexposed part by development after exposing only the front and back conduction through-holes that need to close the inside of the front and back conduction through-holes, and then removing the unexposed portions by thermal curing of the front and back conduction through-holes that need to be closed A method for manufacturing a printed wiring board, comprising closing a hole.
JP26158291A 1991-10-09 1991-10-09 Manufacturing method of printed wiring board Expired - Fee Related JP2633424B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26158291A JP2633424B2 (en) 1991-10-09 1991-10-09 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26158291A JP2633424B2 (en) 1991-10-09 1991-10-09 Manufacturing method of printed wiring board

Publications (2)

Publication Number Publication Date
JPH05102644A JPH05102644A (en) 1993-04-23
JP2633424B2 true JP2633424B2 (en) 1997-07-23

Family

ID=17363924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26158291A Expired - Fee Related JP2633424B2 (en) 1991-10-09 1991-10-09 Manufacturing method of printed wiring board

Country Status (1)

Country Link
JP (1) JP2633424B2 (en)

Also Published As

Publication number Publication date
JPH05102644A (en) 1993-04-23

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