JPH04356994A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH04356994A
JPH04356994A JP13100891A JP13100891A JPH04356994A JP H04356994 A JPH04356994 A JP H04356994A JP 13100891 A JP13100891 A JP 13100891A JP 13100891 A JP13100891 A JP 13100891A JP H04356994 A JPH04356994 A JP H04356994A
Authority
JP
Japan
Prior art keywords
solder resist
photosensitive
ink
road map
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13100891A
Other languages
Japanese (ja)
Other versions
JP2900639B2 (en
Inventor
Akiko Tsujii
辻井 章子
Kazutomo Higa
比嘉 一智
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13100891A priority Critical patent/JP2900639B2/en
Publication of JPH04356994A publication Critical patent/JPH04356994A/en
Application granted granted Critical
Publication of JP2900639B2 publication Critical patent/JP2900639B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To provide a printed wiring board where a high resolution road map is made by remarkably improving the yield rate and the productivity in a solder resist and road map formation process, in the printed wiring board used for each kind of electronic equipment. CONSTITUTION:Photosensittve solder resist ink 3a and photosensitive road map ink 5a are developed at the same time, and the omission of a photosensitive solder resist ink developing process becomes possible. Moreover. the exposed part of the photosensitive solder resist ink 3a remains undevolved, so the occurrence of remarkable irregularity between the photosensitive road map ink 5a and the photosensitive solder resist ink 3a and between the insulating board 1 and the conductor pattern 2 surface is suppressed. The close sticking condition with the mask film 6 for road map formation during exposure can be preserved, and for the shape of the road map after exposure and formation, the shape of the mask film can be reproduced accurately.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、パーソナルコンピュー
タやワードプロセッサなどの各種電子機器に使用される
プリント配線板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing printed wiring boards used in various electronic devices such as personal computers and word processors.

【0002】0002

【従来の技術】近年、各種電子機器に数多く使用されて
いるプリント配線板は、電子機器の小型・軽量化や多機
能化に伴い、配線の高密度化や電子部品の表面実装化が
著しく、絶縁基板上に形成される導体パターンや電子部
品が実装されるランドはますます狭ピッチ、細線化や小
形状化し、はんだ不要部分のはんだ付着の防止、導体パ
ターンの酸化に対する保護、絶縁性の維持やはんだ付け
性の向上などの目的でプリント配線板上に形成されるソ
ルダレジストやロードマップも高解像度、高位置精度が
要求されるようになり、その形成方法もスクリーン印刷
法からマスクフィルムによる写真現像法に代わりつつあ
る。
[Prior Art] In recent years, printed wiring boards have been widely used in various electronic devices.As electronic devices become smaller, lighter, and more multifunctional, the density of wiring and the surface mounting of electronic components have increased significantly. Conductor patterns formed on insulating substrates and lands on which electronic components are mounted are becoming increasingly narrower in pitch, thinner, and smaller in size, making it necessary to prevent solder from adhering to areas that do not require soldering, protect conductor patterns from oxidation, and maintain insulation. Solder resists and roadmaps formed on printed wiring boards for the purpose of improving solderability and other purposes are now required to have high resolution and high positional accuracy, and the method of forming them has changed from screen printing to mask film photography. It is gradually replacing the developing method.

【0003】以下に、従来のプリント配線板について説
明する。図2は従来のプリント配線板の写真現像法によ
るソルダレジストおよびロードマップ形成の製造過程を
示すものである。図2において、1は絶縁基板、2は導
体パターン、3aは感光性ソルダレジストインキ、3b
はソルダレジスト、4はソルダレジスト形成用マスクフ
ィルム、5aは感光性ロードマップインキ、5bはロー
ドマップ、6はロードマップ形成用マスクフィルムであ
る。
[0003] A conventional printed wiring board will be explained below. FIG. 2 shows a manufacturing process for forming a solder resist and a roadmap using a conventional photo-development method for a printed wiring board. In FIG. 2, 1 is an insulating substrate, 2 is a conductive pattern, 3a is a photosensitive solder resist ink, and 3b is a photosensitive solder resist ink.
4 is a solder resist, 4 is a mask film for forming a solder resist, 5a is a photosensitive road map ink, 5b is a road map, and 6 is a mask film for forming a road map.

【0004】以上のように構成されたプリント配線板の
ソルダレジストおよびロードマップの形成について、以
下に説明する。
[0004] The formation of the solder resist and roadmap for the printed wiring board constructed as described above will be explained below.

【0005】まず、所定の大きさに切断された銅張積層
板(図示せず)にスクリーン印刷法や写真現像法などに
よりエッチングレジストを形成した後、塩化第2銅など
の溶液を用いてエッチングを行い、導体パターン2を形
成し、エッチングレジストを剥離する。図2(a)に示
すように、絶縁基板1上に導体パターン2が形成された
プリント配線板に感光性ソルダレジストインキ3aを塗
布し、熱風などにより指触乾燥を行う。
First, an etching resist is formed on a copper-clad laminate (not shown) cut to a predetermined size using a screen printing method or a photo development method, and then etching is performed using a solution such as cupric chloride. A conductor pattern 2 is formed, and the etching resist is peeled off. As shown in FIG. 2(a), a photosensitive solder resist ink 3a is applied to a printed wiring board on which a conductor pattern 2 is formed on an insulating substrate 1, and the ink is dried to the touch using hot air or the like.

【0006】次に、図2(b)示すように、ソルダレジ
スト形成用マスクフィルム4を指触乾燥された感光性ソ
ルダレジスト3a面に密着させ、紫外線露光したのち、
図2(c)のように未露光部を所定の現像液で現像・除
去し、ソルダレジスト3bを形成する。その後、図2(
d)に示すように、感光性ロードマップインキ5aをソ
ルダレジスト3b上にロードマップ3b形成に必要な部
分よりやや大きな範囲に塗布し、同様に指触乾燥を行い
、図2(e)に示すように、ロードマップ形成用マスク
フィルム6を指触乾燥した感光性ロードマップインキ5
a面に密着させ、紫外線露光したのち、図2(f)のよ
うに,未露光部を所定の現像液で現像・除去する。
Next, as shown in FIG. 2(b), a mask film 4 for forming a solder resist is brought into close contact with the surface of the photosensitive solder resist 3a which has been dried to the touch and exposed to ultraviolet light.
As shown in FIG. 2C, the unexposed areas are developed and removed using a predetermined developer to form a solder resist 3b. After that, Figure 2 (
As shown in d), photosensitive roadmap ink 5a is applied onto the solder resist 3b in an area slightly larger than the area required to form the roadmap 3b, and similarly dried to the touch, as shown in FIG. 2(e). The photosensitive road map ink 5 is prepared by drying the road map forming mask film 6 to the touch.
After bringing it into close contact with the a-side and exposing it to ultraviolet light, the unexposed areas are developed and removed using a prescribed developer, as shown in FIG. 2(f).

【0007】その後、絶縁基板や導体パターンへの接着
性や硬度などを向上させるため熱風などで再度処理し、
ソルダレジスト3bとロードマップ5bをプリント配線
板上に形成する。
[0007] Thereafter, in order to improve the adhesion and hardness to the insulating substrate and conductor pattern, it is treated again with hot air or the like.
A solder resist 3b and a roadmap 5b are formed on a printed wiring board.

【0008】[0008]

【発明が解決しようとする課題】しかしながら上記の従
来の構成では、プリント配線板上に形成されたソルダレ
ジストおよびロードマップは高解像性を有するものの、
感光性ソルダレジストインキの塗布、指触乾燥、ソルダ
レジスト形成用マスクフィルムの位置合わせ、露光、現
像、そして感光性ロードマップインキの塗布、指触乾燥
、ロードマップ形成用マスクフィルムの位置合わせ、露
光、現像と製造工程が煩雑で長時間を有するため量産性
に乏しく、また現像・形成後の表面に凹凸を有するソル
ダレジスト上に感光性ロードマップインキの塗布を行う
ため塗布された感光性ロードマップインキと感光性ソル
ダレジストインキ3a表面、絶縁基板1や導体パターン
表面との間が凹凸状態となる。このため露光時のロード
マップ形成用マスクフィルムと十分な密着状態が保持で
きず、マスクフィルム遮閉部分での紫外線の回折現象を
招き、現像・形成後のロードマップ形状が設計状態であ
るマスクフィルムの形状を再現せず、著しい場合は文字
・記号などの判読ができず、ロードマップ形成工程にお
けるプリント配線板製造の歩留りを悪化させるという問
題点を有していた。
[Problems to be Solved by the Invention] However, in the above conventional configuration, although the solder resist and roadmap formed on the printed wiring board have high resolution,
Application of photosensitive solder resist ink, drying to the touch, positioning of the mask film for forming the solder resist, exposure, development, and application of photosensitive roadmap ink, drying to the touch, alignment of the mask film for forming the roadmap, exposure. , the development and manufacturing process are complicated and take a long time, making it difficult to mass-produce, and the photosensitive roadmap ink is coated on the solder resist, which has uneven surfaces after development and formation. There is an uneven state between the ink and the surface of the photosensitive solder resist ink 3a, the insulating substrate 1, and the surface of the conductor pattern. For this reason, sufficient adhesion with the roadmap forming mask film during exposure cannot be maintained, leading to the diffraction phenomenon of ultraviolet rays at the mask film shielding part, and the roadmap shape after development and formation is the designed state. The shape of the printed wiring board cannot be reproduced, and in severe cases, the characters and symbols cannot be read, leading to a problem in that the yield rate of printed wiring board manufacturing in the roadmap forming process is deteriorated.

【0009】本発明は上記従来の問題点を解決するもの
で、感光性ソルダレジストインキおよび感光性ロードマ
ップインキでのソルダレジストおよびロードマップ形成
工程におけるプリント配線板製造歩留りと生産性を著し
く向上させ、高解像度ロードマップの形成された高品質
のプリント配線板を提供することを目的とする。
The present invention solves the above-mentioned conventional problems, and significantly improves printed wiring board manufacturing yield and productivity in the solder resist and road map forming process using photosensitive solder resist ink and photosensitive road map ink. , our objective is to provide high-quality printed wiring boards with high-resolution roadmaps.

【0010】0010

【課題を解決するための手段】この目的を達成するため
に本発明は、プリント配線板に感光性ソルダレジストイ
ンキを塗布、指触乾燥する工程と、指触乾燥された感光
性ソルダレジストインキを所望する形状が描画されたマ
スクフィルム・パターンで露光する工程と、樹脂、フィ
ラー、着色顔料、添加剤等の成分が感光性ソルダレジス
トインキと同一である感光性ロードマップインキを少な
くとも感光性ソルダレジストインキが塗布された範囲に
塗布、指触乾燥する工程と、指触乾燥された感光性ロー
ドマップインキを所望する形状が描画されたマスクフィ
ルム・パターンで露光する工程と、感光性ソルダレジス
トインキと感光性ロードマップインキを同時に現像する
という構成を有している。
[Means for Solving the Problems] In order to achieve this object, the present invention includes a process of applying photosensitive solder resist ink to a printed wiring board and drying it to the touch, and applying the photosensitive solder resist ink that has been dried to the touch. A process of exposing with a mask film pattern on which a desired shape has been drawn, and applying a photosensitive roadmap ink whose ingredients such as resin, filler, coloring pigment, additives, etc. are the same as the photosensitive solder resist ink, at least to the photosensitive solder resist. A process of applying the ink to the coated area and drying it to the touch, a process of exposing the dry to the touch photosensitive roadmap ink using a mask film pattern drawn with the desired shape, and a process of applying the photosensitive solder resist ink. It has a structure in which photosensitive roadmap ink is developed at the same time.

【0011】[0011]

【作用】この構成によって、感光性ソルダレジストイン
キの現像工程を省略することが可能となり、また感光性
ソルダレジストインキの未露光部分は現像・除去されず
残るため、感光性ロードマップインキ塗布後の感光性ロ
ードマップインキと感光性ソルダレジストインキ、絶縁
基板や導体パターン表面との間に著しい凹凸状態の発生
は抑制され、露光時のロードマップ形成用マスクフィル
ムとの密着状態を保持することができ、マスクフィルム
遮閉部分での紫外線の回折現象を招くこともほとんどな
くなり、現像・形成後のロードマップ形状はマスクフィ
ルムの形状を精度よく再現することができる。
[Function] With this configuration, it is possible to omit the developing process of the photosensitive solder resist ink, and since the unexposed areas of the photosensitive solder resist ink remain without being developed or removed, The occurrence of significant unevenness between the photosensitive roadmap ink and the photosensitive solder resist ink and the surfaces of the insulating substrate and conductor pattern is suppressed, and the adhesion to the roadmap forming mask film can be maintained during exposure. In this case, the diffraction phenomenon of ultraviolet rays at the mask film shielding portion is almost eliminated, and the road map shape after development and formation can accurately reproduce the shape of the mask film.

【0012】0012

【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0013】図1(a)、(b)、(c)、(d)、(
e)は、本発明の一実施例おけるプリント配線板のソル
ダレジストおよびロードマップ形成の過程を示すもので
ある。なお、図1において、図2と同一部分には同一番
号を付与するものとし、説明は省略する。
FIGS. 1(a), (b), (c), (d), (
e) shows the process of forming a solder resist and roadmap for a printed wiring board in one embodiment of the present invention. Note that in FIG. 1, the same parts as in FIG. 2 are given the same numbers, and their explanations will be omitted.

【0014】図1(a)において、従来例と同様の方法
を用い、絶縁基板1上に導体パターン2を形成したプリ
ント配線板上にアルカリ現像型の感光性ソルダレジスト
インキ3aをスクリーン印刷、ロールコータやカーテン
コータなどの手段を用いて塗布し、熱風循環槽などで温
度60〜80℃、時間15〜30分程度の条件で指触乾
燥を行う。
In FIG. 1(a), using the same method as in the conventional example, an alkali-developable photosensitive solder resist ink 3a is screen printed and rolled onto a printed wiring board on which a conductor pattern 2 is formed on an insulating substrate 1. It is coated using a coater, curtain coater, or the like, and dried to the touch in a hot air circulation tank or the like at a temperature of 60 to 80° C. for about 15 to 30 minutes.

【0015】次に、図1(b)に示すように、ソルダレ
ジスト形成用マスクフィルム4を密着させ、紫外線光量
約500〜700mJ/cm2 で露光する。次に、図
1(c)に示すように、感光性ロードマップインキ5a
を感光性ソルダレジスト3aと同様の方法で露光状態の
感光性ソルダレジストインキ3a上に塗布し、指触乾燥
を行う。
Next, as shown in FIG. 1(b), a solder resist forming mask film 4 is brought into close contact and exposed to ultraviolet light at an amount of about 500 to 700 mJ/cm2. Next, as shown in FIG. 1(c), a photosensitive roadmap ink 5a is applied.
is applied onto the exposed photosensitive solder resist ink 3a in the same manner as the photosensitive solder resist 3a, and dried to the touch.

【0016】図1(d)に示すように、ロードマップ形
成用マスクフィルム6を指触乾燥された感光性ロードマ
ップインキ5a面に密着させ、ソルダレジスト形成と同
様の条件で紫外線露光し、図1(e)に示すように、炭
酸ナトリウムを主成分とする現像液で感光性ソルダレジ
ストインキ3aと感光性ロードマップインキ5aの未露
光部を同時に現像・除去する。その後、熱風循環槽など
で温度130〜160℃、時間30〜60分程度の条件
で最終の乾燥・硬化を行って、絶縁基板1や導体パター
ン2とソルダレジスト3bやロードマップ5bとの密着
性を安定化させる。
As shown in FIG. 1(d), a mask film 6 for forming a roadmap is brought into close contact with the surface of the photosensitive roadmap ink 5a which has been dried to the touch, and exposed to ultraviolet light under the same conditions as for forming a solder resist. 1(e), the unexposed areas of the photosensitive solder resist ink 3a and the photosensitive roadmap ink 5a are simultaneously developed and removed using a developer containing sodium carbonate as a main component. After that, final drying and curing is performed in a hot air circulation tank or the like at a temperature of 130 to 160°C for about 30 to 60 minutes to ensure the adhesion of the insulating substrate 1 and conductor pattern 2 to the solder resist 3b and the road map 5b. stabilize.

【0017】ここで、本発明の実施例では、従来の感光
性ソルダレジストの未露光部の現像・除去後に感光性ロ
ードマップを塗布する方法で、感光性ロードマップイン
キ塗布・指触乾燥後の凹部と凸部との落差は最大75μ
mであったが、20μm程度に抑制でき、形成後のロー
ドマップのマスクフィルムに対する再現率は60〜10
0%が90〜100%と向上することができた。
Here, in the embodiment of the present invention, a conventional method of applying a photosensitive roadmap after developing and removing the unexposed area of a photosensitive solder resist is used. Maximum drop between concave and convex parts is 75μ
m, but it can be suppressed to about 20 μm, and the reproduction rate of the roadmap after formation with respect to the mask film is 60 to 10
0% could be improved to 90-100%.

【0018】なお、本発明の実施例において、プリント
配線板の構造は片面プリント配線板としたが、両面や多
層プリント配線板であってもよく、また感光性ソルダレ
ジストインキ3a、感光性ロードマップインキ5aはア
ルカリ現像型としたが、感光性ソルダレジスト3a、感
光性ロードマップインキ5aは溶剤現像型としてもよい
ことは言うまでもない。
In the embodiments of the present invention, the structure of the printed wiring board is a single-sided printed wiring board, but it may be a double-sided printed wiring board or a multilayer printed wiring board. Although the ink 5a is of an alkali-developable type, it goes without saying that the photosensitive solder resist 3a and the photosensitive roadmap ink 5a may be of a solvent-developable type.

【0019】[0019]

【発明の効果】以上のように本発明は、感光性ソルダレ
ジストインキと感光性ロードマップインキを同時に現像
することにより、プリント配線板のソルダレジスト、ロ
ードマップ形成における製造工程を短縮でき、生産性の
向上に寄与すると同時に、高解像度ロードマップの形成
された高品質のプリント配線板を提供することができる
という、優れたプリント配線板の製造方法を実現できる
ものである。
As described above, the present invention can shorten the manufacturing process for forming solder resists and roadmaps for printed wiring boards by simultaneously developing photosensitive solder resist ink and photosensitive roadmap ink, thereby improving productivity. This makes it possible to realize an excellent method for manufacturing printed wiring boards, which contributes to the improvement of performance and at the same time provides a high quality printed wiring board on which a high-resolution roadmap is formed.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】(a)〜(e)は本発明の一実施例におけるプ
リント配線板の製造方法における要部工程を示す断面図
[Fig. 1] (a) to (e) are cross-sectional views showing main steps in a method for manufacturing a printed wiring board according to an embodiment of the present invention.

【図2】(a)〜(f)は従来のプリント配線板の製造
方法における要部工程を示す断面図
[Fig. 2] (a) to (f) are cross-sectional views showing main steps in a conventional printed wiring board manufacturing method.

【符号の説明】[Explanation of symbols]

1  絶縁基板 2  導体パターン 3a  感光性ソルダレジストインキ 3b  ソルダレジスト 4  ソルダレジスト形成用マスクフィルム5a  感
光性ロードマップインキ 5b  ロードマップ
1 Insulating substrate 2 Conductor pattern 3a Photosensitive solder resist ink 3b Solder resist 4 Mask film for forming solder resist 5a Photosensitive road map ink 5b Road map

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】プリント配線板に感光性ソルダレジストイ
ンキを塗布、指触乾燥する工程と、指触乾燥された前記
感光性ソルダレジストインキを所望する形状が描画され
たマスクフィルム・パターンで露光する工程と、樹脂、
フィラー、着色顔料、添加剤等の成分が前記感光性ソル
ダレジストインキと同一である感光性ロードマップイン
キを少なくとも前記感光性ソルダレジストインキが塗布
された範囲に塗布、指触乾燥する工程と、指触乾燥され
た感光性ロードマップインキを所望する形状が描画され
たマスクフィルム・パターンで露光する工程と、前記感
光性ソルダレジストインキと該感光性ロードマップイン
キを同時に現像する工程とを備えたプリント配線板の製
造方法。
1. A step of applying photosensitive solder resist ink to a printed wiring board and drying it to the touch, and exposing the dry to the touch photosensitive solder resist ink with a mask film pattern in which a desired shape is drawn. Process, resin,
A step of applying a photosensitive roadmap ink having the same components such as fillers, coloring pigments, additives, etc. as the photosensitive solder resist ink to at least the area coated with the photosensitive solder resist ink and drying it to the touch; Printing comprising the steps of: exposing the touch-dried photosensitive roadmap ink with a mask film pattern in which a desired shape is drawn; and developing the photosensitive solder resist ink and the photosensitive roadmap ink at the same time. Method of manufacturing wiring boards.
JP13100891A 1991-06-03 1991-06-03 Manufacturing method of printed wiring board Expired - Fee Related JP2900639B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13100891A JP2900639B2 (en) 1991-06-03 1991-06-03 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13100891A JP2900639B2 (en) 1991-06-03 1991-06-03 Manufacturing method of printed wiring board

Publications (2)

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JPH04356994A true JPH04356994A (en) 1992-12-10
JP2900639B2 JP2900639B2 (en) 1999-06-02

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Application Number Title Priority Date Filing Date
JP13100891A Expired - Fee Related JP2900639B2 (en) 1991-06-03 1991-06-03 Manufacturing method of printed wiring board

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011077191A (en) * 2009-09-29 2011-04-14 Mitsubishi Paper Mills Ltd Method of forming solder resist

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011077191A (en) * 2009-09-29 2011-04-14 Mitsubishi Paper Mills Ltd Method of forming solder resist

Also Published As

Publication number Publication date
JP2900639B2 (en) 1999-06-02

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