JP3755193B2 - Method and apparatus for manufacturing printed wiring board - Google Patents

Method and apparatus for manufacturing printed wiring board Download PDF

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Publication number
JP3755193B2
JP3755193B2 JP15204896A JP15204896A JP3755193B2 JP 3755193 B2 JP3755193 B2 JP 3755193B2 JP 15204896 A JP15204896 A JP 15204896A JP 15204896 A JP15204896 A JP 15204896A JP 3755193 B2 JP3755193 B2 JP 3755193B2
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JP
Japan
Prior art keywords
wiring board
printed wiring
exposure
photosensitive material
solder resist
Prior art date
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Expired - Fee Related
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JP15204896A
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Japanese (ja)
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JPH09331137A (en
Inventor
紀子 宮村
一智 比嘉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP15204896A priority Critical patent/JP3755193B2/en
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Description

【0001】
【発明の属する技術分野】
本発明は各種電子機器などに用いられるプリント配線板の製造方法とその製造装置に関するものである。
【0002】
【従来の技術】
近年、各種電子機器等に多く使用されているプリント配線板は、電子機器の小型化や多機能化に伴い配線の高密度化や電子部品の表面実装化が著しく、絶縁基板上に形成される導体パターンや電子部品が実装されるランドはますます狭ピッチ、細線化や小型化し、はんだ付け不要部分のはんだ付着の防止、導体パターンの酸化に対する保護、絶縁性の維持やはんだ付け性の向上などの目的でプリント配線板上に形成されるソルダレジストも高解像度、高位置精度が要求されるようになりその形成方法もスクリーン印刷法からマスクフィルムによる写真現像法に変わってきた。
【0003】
以下に従来のプリント配線板の製造方法について図面を用いて説明する。
図4(a)〜(c)は従来のプリント配線板の製造方法を示す断面図であり、図5は従来のプリント配線板の製造装置を示す概略図である。
【0004】
図4、図5において21はプリント配線板、22は絶縁基板、23は導体パターン、24は感光性材料である感光性ソルダレジストインキ、25はソルダレジスト、26はマスクフィルム、27は紫外線、28は乾燥炉、29は露光部、30は位置決め部、31は現像部である。
【0005】
以上のように構成されたプリント配線板のソルダレジストの形成について、以下詳細に説明する。まず、所定の大きさに切断された銅張積層板(図示せず)に公知のスクリーン印刷法や写真法などによりエッチングレジストを形成した後、塩化第2銅などの溶剤を用いてエッチングを行い導体パターン23を形成する。次に図4(a)に示すように、絶縁基板22上に導体パターン23が形成されたプリント配線板21に感光性ソルダレジストインキ24を塗布し、乾燥炉にて熱風などにより指触乾燥を行い、放置冷却または強制冷却を行う。
【0006】
次に図4(b)に示すようにソルダレジスト形成用のマスクフィルム26を指触乾燥・冷却した感光性ソルダレジストインキ24面に真空密着させ、図5に示す位置決め部30にて位置合わせを行い、露光部29にて400〜500mJ/cm2の光量の紫外線27で露光したのち、現像部31にて未露光部分を所定の現像液で現像除去し、約140〜150℃、50〜60分の熱風条件で本硬化を行いソルダレジスト25を形成する。
【0007】
【発明が解決しようとする課題】
しかしながら上記従来の構成では、形成されたソルダレジスト25は高解像性を有するものの感光性ソルダレジストインキ24の塗布、指触乾燥、放置冷却、露光、現像、再硬化と製造工程が非常に多く製造工程の中でも露光工程はソルダレジスト形成用マスクフィルム26とプリント配線板21の位置合わせ、真空密着、紫外線照射、真空解除で、ソルダレジスト形成用のマスクフィルムの剥離、現像までの設置など煩雑であり、多くの工程が必要となり、スクリーン印刷法に比較して生産性が低かった。
【0008】
そこで写真現像法での生産性向上の施策が種々検討されてきたが、その中のひとつとして特開平6−45735号公報に開示されているように、感光性ソルダレジストの露光直後に加温することによって生産性を向上させる方法もあるが、現像後に線太りが生じやすく解像性が低下する可能性があり、それを防止するために露光量や加温の熱量を減少させると逆に現像後にアンダカットが発生する可能性があった。
【0009】
それは次のことから推測できる。一般に感光性ソルダレジストは露光時の紫外線で光重合反応を生じるが、まず感光性ソルダレジスト成分中の光重合開始剤がラジカル(中間活性体)に開裂するとともにモノマーも開裂し活性化する。次に生長反応・連鎖移動反応が発生し架橋密度が上昇し、最後に停止反応がある。
【0010】
このことから、露光直後に加温することによって停止反応の開始が遅れ、その分生長反応・連鎖移動反応が促進され光重合が進むことにより生産性の向上を図る方法である。これはマスクフィルムを介して露光し紫外線が照射された部分のみで促進される現象である。露光の際、紫外線が感光性ソルダレジストを透過し絶縁基板の表面まで達している場合、露光後に加温することによって停止反応が遅れ光重合が促進すると未露光部となるべき部分まで硬化が進み、現像後に線太りとなる可能性がある。
【0011】
逆に露光の際の紫外線量が不足すると感光性ソルダレジストの表面を透過した紫外線が絶縁基板の表面まで達せず、その状態で露光直後に現像残りが生じない範囲で加温しても現像後にアンダカットが発生する可能性があった。
【0012】
そこで上記の理由から露光時の紫外線光量は感光性ソルダレジストを透過し絶縁基板の表面まで達する直前程度の露光量に設定する必要があり、実際には適正露光量の70〜80%の紫外線光量が必要になり、生産性を著しく向上させる方法としては不十分であり、露光量や加熱条件の設定や工程条件の管理が煩雑な方法でもあった。
【0013】
本発明は上記従来の問題点を解決するもので、感光性ソルダレジストの現像後の解像性を安定向上させ、上記従来の方法よりさらにソルダレジスト形成工程の生産性を高め製造工程の歩留まりを著しく向上させるとともに、電子機器の信頼性をも向上させるプリント配線板の製造方法とその製造装置を提供することを目的とするものである。
【0014】
【課題を解決するための手段】
この課題を解決するために本発明は、導体パターンが形成された絶縁基板上に感光性ソルダレジスト塗布・指触乾燥する工程と、露光直前に加温または光あるいは熱線を照射する工程と、マスクフィルムを基板に真空密着し露光する工程と、未露光部を現像する工程とを有する方法である。
【0015】
この方法により生産性が向上し、歩留まりの向上が図れることになる。
【0016】
【発明の実施の形態】
本発明の請求項1に記載の発明は、感光性材料を導電パターンが形成された絶縁基板上に塗布・指触乾燥する工程と、露光直前に加温または光あるいは熱線を照射する工程と、マスクフィルムをプリント配線板に真空密着し露光する工程と、未露光部を現像する工程とを有するプリント配線板の製造方法としたものであり、感光性材料をプリント配線板上に塗布・指触乾燥した後、露光直前に感光性材料を加温または光あるいは熱線を照射することによって感光性材料を活性化し、マスクフィルムを真空密着し露光する際に低露光量の紫外線で露光したのち現像することにより生産性および解像性を向上するという作用を有する。
【0017】
本発明の請求項2に記載の発明は、感光性材料を低露光量の紫外線で照射する請求項1記載のプリント配線板の製造方法としたものであり、露光直前に低露光量の紫外線を照射し感光性材料を活性化することにより露光での反応が促進され、低露光量、短露光時間での露光ができ生産性が向上するという作用を有する。
【0018】
本発明の請求項3に記載の発明は、感光性材料を感光性材料の適正露光量の50%以内の紫外線量で照射する請求項2記載のプリント配線板の製造方法としたものであり、感光性材料の現像可能な紫外線量である適正露光量の50%以内の紫外線量で照射することにより感光性材料が活性化すると同時に低露光量での露光ができしかも現像残りをも防止するという作用を有する。
【0019】
本発明の請求項4に記載の発明は、感光性材料を赤外線または近赤外線で照射する請求項1記載のプリント配線板の製造方法としたものであり、露光直前に赤外線又は近赤外線で照射することによって、感光性材料を光および熱により活性化すると同時に低露光量時間での露光ができ、生産性を向上するという作用を有する。
【0020】
本発明の請求項5に記載の発明は、感光性材料を加熱した低湿度の乾燥気体で加温する請求項1記載のプリント配線板の製造方法としたものであり、感光性材料を乾燥気体で加温することによって材料を活性化するとともに指触乾燥性を向上させ、露光後の真空解除の際のプリント配線板上の写真現像用ソルダレジストインキのソルダレジスト形成用マスクフィルムへの付着が防止でき、同時に低露光量、短露光時間での露光ができ、生産性を向上するという作用を有する。
【0021】
本発明の請求項6に記載の発明は、導電パターンが形成され感光性材料を塗布・指触乾燥した絶縁基板の搬送位置決め部と、露光直前のプリント配線板を加温または光あるいは熱線を照射する手段と、プリント配線板を紫外線露光する露光部を備えたプリント配線板の製造装置であり、露光直前に感光性材料を加熱する加温部または光あるいは熱線を照射する照射部を備えた製造装置というものであり、これにより露光時間を短縮し生産性を向上することのできるという作用を有している。
【0022】
以下、本発明の一実施の形態について、図面を参照しながら説明する。
図1(a)〜(d)は本発明の一実施の形態におけるプリント配線板の製造方法を示す断面図であり、図2は本発明の一実施の形態におけるプリント配線板の製造方法を示す断面図であり、図3は本発明の一実施の形態におけるプリント配線板の製造装置を示す概略図である。
【0023】
図1〜図3において1はプリント配線板、2は絶縁基板、3は導体パターン、4は感光性材料としての感光性ソルダレジストインキ、5はソルダレジスト、6はマスクフィルム、7は照射部での紫外線、8は露光部での紫外線、9は加温部での乾燥気体、10は乾燥部、11は位置決め部、12は加温部または照射部、13は露光部、14は現像部である。
【0024】
本発明のプリント配線板の製造装置は、図3に示すように位置決め部11の後の露光部13の直前に加温部または照射部12を備えた構成になっている。
【0025】
以上のように構成されたプリント配線板の製造装置を用いて本発明のプリント配線板の製造方法を以下詳細に説明する。
【0026】
まず、絶縁基板2上に導体パターン3を形成したプリント配線板1上に、感光性ソルダレジストインキ4をスクリーン印刷、ロールコータやカーテンコータなどの公知の手段を用いて塗布し、図3の乾燥部10にて温度60〜80℃、時間15〜30分程度の条件で指触乾燥を行い、図1(a)に示すようなプリント配線板1を得る。次に図3に示す位置決め部11においてCCDカメラで位置決めを行い、照射部12にてプリント配線板1を露光部13へ搬送しながら感光性ソルダレジストインキ4の適正露光量である300mJ/cm2の50%以内、望ましくは40〜50%程度の露光量に相当する120〜150mJ/cm2の紫外線量を照射・加温を行う(図1(b))。
【0027】
次に図3の露光部13にてマスクフィルム6とプリント配線板1を真空密着させた後、図1(c)に示すように適正露光量の30〜40%に相当する90〜120mJ/cm2の露光量で紫外線露光を行った後1wt%の炭酸ソーダの現像液で未露光部を現像除去し、図1(d)に示すようなプリント配線板1を形成する。その後、熱風循環炉などで、本硬化を行って、絶縁基板2、導体パターン3とソルダレジスト5との密着性等の塗膜特性の向上を図る。以上の方法で製造したプリント配線板のソルダレジスト5は線太りや現像残りも発生することなく高い解像性を有している。
【0028】
上記の紫外線での加温方法の他に近赤外線や遠赤外線を用いて加温することも可能であり、さらに図2(a)〜(d)に示すように加熱した低湿度の乾燥気体9で加温することによってソルダレジスト表面の指触乾燥性を向上させ、露光時のマスクフィルム6とプリント配線板1との真空密着時に生じるタッキネスを解消し、生産性および工程歩留まりの向上を図ることも可能である。
【0029】
【発明の効果】
以上のように本発明は、写真現像法によるプリント配線板のソルダレジストの形成を高い生産性で高解像および高歩留まりで生産することができるという効果を有するものである。
【図面の簡単な説明】
【図1】(a)〜(d)は本発明の一実施の形態におけるプリント配線板の製造方法を示す断面図
【図2】(a)〜(d)は本発明の一実施の形態におけるプリント配線板の製造方法を示す断面図
【図3】本発明の一実施の形態におけるプリント配線板の製造装置を示す概略図
【図4】(a)〜(c)は従来のプリント配線板の製造方法を示す断面図
【図5】従来のプリント配線板の製造装置を示す概略図
【符号の説明】
1 プリント配線板
2 絶縁基板
3 導体パターン
4 感光性ソルダレジストインキ
5 ソルダレジスト
6 マスクフィルム
7 照射部での紫外線
8 露光部での紫外線
9 乾燥気体
10 乾燥部
11 位置決め部
12 加温部または照射部
13 露光部
14 現像部
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for manufacturing a printed wiring board used in various electronic devices and the like and an apparatus for manufacturing the same.
[0002]
[Prior art]
In recent years, printed wiring boards that are widely used in various electronic devices, etc., are formed on an insulating substrate due to the remarkable increase in wiring density and surface mounting of electronic components as electronic devices become smaller and multifunctional. Lands on which conductor patterns and electronic components are mounted are becoming increasingly narrow pitch, thinner and smaller, prevent solder adhesion on parts that do not require soldering, protect the conductor pattern against oxidation, maintain insulation, improve solderability, etc. For this purpose, the solder resist formed on the printed wiring board is required to have high resolution and high positional accuracy, and the formation method has changed from the screen printing method to the photographic development method using a mask film.
[0003]
Hereinafter, a conventional method for manufacturing a printed wiring board will be described with reference to the drawings.
4A to 4C are cross-sectional views showing a conventional printed wiring board manufacturing method, and FIG. 5 is a schematic view showing a conventional printed wiring board manufacturing apparatus.
[0004]
4 and 5, 21 is a printed wiring board, 22 is an insulating substrate, 23 is a conductor pattern, 24 is a photosensitive solder resist ink that is a photosensitive material, 25 is a solder resist, 26 is a mask film, 27 is an ultraviolet ray, 28 Is a drying furnace, 29 is an exposure unit, 30 is a positioning unit, and 31 is a development unit.
[0005]
The formation of the solder resist of the printed wiring board configured as described above will be described in detail below. First, after forming an etching resist on a copper clad laminate (not shown) cut to a predetermined size by a known screen printing method or photographic method, etching is performed using a solvent such as cupric chloride. Conductive pattern 23 is formed. Next, as shown in FIG. 4A, a photosensitive solder resist ink 24 is applied to the printed wiring board 21 on which the conductor pattern 23 is formed on the insulating substrate 22, and the touch is dried with hot air in a drying furnace. And leave or cool.
[0006]
Next, as shown in FIG. 4 (b), the solder resist forming mask film 26 is brought into vacuum contact with the surface of the photosensitive solder resist ink 24 that has been dried and cooled by touching, and is aligned by the positioning unit 30 shown in FIG. Then, the exposure unit 29 is exposed to ultraviolet rays 27 having a light quantity of 400 to 500 mJ / cm 2 , and then the unexposed part is developed and removed with a predetermined developer in the developing unit 31, and about 140 to 150 ° C., 50 to 60 ° C. The main curing is performed under hot air conditions for a minute to form a solder resist 25.
[0007]
[Problems to be solved by the invention]
However, in the above conventional configuration, although the formed solder resist 25 has high resolution, there are very many manufacturing processes such as application of the photosensitive solder resist ink 24, touch drying, standing cooling, exposure, development, recuring and the like. Among the manufacturing processes, the exposure process is complicated, such as the positioning of the solder resist forming mask film 26 and the printed wiring board 21, vacuum adhesion, UV irradiation, and release of the vacuum, the peeling of the mask film for forming the solder resist, and installation until development. In addition, many processes are required, and the productivity is low compared with the screen printing method.
[0008]
Thus, various measures for improving productivity in the photographic development method have been studied, and as one of them, as disclosed in JP-A-6-45735, heating is performed immediately after exposure of the photosensitive solder resist. Although there is a method to improve productivity, there is a possibility that line thickening is likely to occur after development, and resolution may be reduced. To prevent this, if the exposure amount and the heat amount of heating are reduced, the development is reversed. There was a possibility that undercut would occur later.
[0009]
It can be inferred from the following. In general, a photosensitive solder resist undergoes a photopolymerization reaction by ultraviolet rays at the time of exposure. First, the photopolymerization initiator in the photosensitive solder resist component is cleaved into radicals (intermediate active substances) and the monomer is also cleaved and activated. Next, a growth reaction / chain transfer reaction occurs to increase the crosslinking density, and finally there is a termination reaction.
[0010]
For this reason, heating is started immediately after exposure to delay the start of the termination reaction, and the fractional growth reaction / chain transfer reaction is promoted to promote photopolymerization, thereby improving productivity. This is a phenomenon that is promoted only in the portion exposed through the mask film and irradiated with ultraviolet rays. During exposure, if UV rays pass through the photosensitive solder resist and reach the surface of the insulating substrate, curing proceeds to the part that should become the unexposed part when the photopolymerization is delayed due to the termination reaction being delayed by heating after exposure. , There is a possibility of line thickening after development.
[0011]
On the contrary, if the amount of ultraviolet rays at the time of exposure is insufficient, the ultraviolet rays that have passed through the surface of the photosensitive solder resist will not reach the surface of the insulating substrate. Undercutting may occur.
[0012]
Therefore, for the above reason, it is necessary to set the amount of ultraviolet light at the time of exposure to an amount of light just before passing through the photosensitive solder resist and reaching the surface of the insulating substrate. Actually, the amount of ultraviolet light is 70 to 80% of the appropriate amount of exposure. Therefore, it is insufficient as a method for significantly improving productivity, and it is also a complicated method for setting an exposure amount and heating conditions and managing process conditions.
[0013]
The present invention solves the above-mentioned conventional problems, stably improves the resolution after development of the photosensitive solder resist, increases the productivity of the solder resist formation process further than the conventional method, and increases the yield of the manufacturing process. It is an object of the present invention to provide a printed wiring board manufacturing method and a manufacturing apparatus for the same that can significantly improve the reliability of electronic equipment.
[0014]
[Means for Solving the Problems]
In order to solve this problem, the present invention includes a step of applying a photosensitive solder resist on the insulating substrate on which a conductor pattern is formed and touch-drying, a step of heating or irradiating light or heat rays immediately before exposure, a mask This is a method having a step of exposing a film in vacuum contact with a substrate and a step of developing an unexposed portion.
[0015]
By this method, productivity can be improved and yield can be improved.
[0016]
DETAILED DESCRIPTION OF THE INVENTION
The invention according to claim 1 of the present invention includes a step of applying a photosensitive material on an insulating substrate on which a conductive pattern is formed and touch-drying, a step of heating or irradiating light or heat rays immediately before exposure, It is a method for producing a printed wiring board having a step of exposing a mask film to a printed wiring board by vacuum adhesion and a step of developing an unexposed portion. A photosensitive material is applied to the printed wiring board and touched. After drying, the photosensitive material is activated by heating or irradiating light or heat rays immediately before exposure, and the mask film is vacuum-adhered and exposed with a low exposure amount of ultraviolet light for development. This has the effect of improving productivity and resolution.
[0017]
Invention of Claim 2 of this invention is a manufacturing method of the printed wiring board of Claim 1 which irradiates a photosensitive material with the ultraviolet-ray of a low exposure amount, The ultraviolet-ray of a low exposure amount is just before exposure. By irradiating and activating the photosensitive material, the reaction in the exposure is promoted, and the exposure can be performed with a low exposure amount and a short exposure time, thereby improving the productivity.
[0018]
Invention of Claim 3 of this invention is a manufacturing method of the printed wiring board of Claim 2 which irradiates a photosensitive material by the ultraviolet-ray amount within 50% of the appropriate exposure amount of a photosensitive material, By irradiating the photosensitive material with an ultraviolet ray amount within 50% of the appropriate exposure amount, which is the developable ultraviolet ray amount, the photosensitive material is activated, and at the same time, the exposure can be performed at a low exposure amount, and also the remaining development is prevented. Has an effect.
[0019]
Invention of Claim 4 of this invention is set as the manufacturing method of the printed wiring board of Claim 1 which irradiates a photosensitive material with infrared rays or near infrared rays, and irradiates with infrared rays or near infrared rays just before exposure. Thus, the photosensitive material is activated by light and heat, and at the same time, it can be exposed with a low exposure time, thereby improving the productivity.
[0020]
The invention according to claim 5 of the present invention is a method for producing a printed wiring board according to claim 1, wherein the photosensitive material is heated with a dry gas having a low humidity and heated. The material is activated by heating at the same time, and the dryness to the touch is improved, and the solder resist ink for photographic development on the printed wiring board at the time of releasing the vacuum after exposure adheres to the mask film for forming the solder resist. At the same time, the exposure can be performed with a low exposure amount and a short exposure time, thereby improving the productivity.
[0021]
The invention according to claim 6 of the present invention is that the conductive substrate is formed with a conductive pattern, and the photosensitive substrate is coated and dried by touching the insulating substrate, and the printed wiring board immediately before exposure is heated or irradiated with light or heat rays. And a printed wiring board manufacturing apparatus including an exposure unit that exposes the printed wiring board to ultraviolet light, and includes a heating unit that heats the photosensitive material immediately before exposure or an irradiation unit that irradiates light or heat rays. This is an apparatus, and has the effect of reducing the exposure time and improving the productivity.
[0022]
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
1A to 1D are cross-sectional views showing a method for manufacturing a printed wiring board according to an embodiment of the present invention, and FIG. 2 shows a method for manufacturing a printed wiring board according to an embodiment of the present invention. FIG. 3 is a cross-sectional view, and FIG. 3 is a schematic diagram showing a printed wiring board manufacturing apparatus according to an embodiment of the present invention.
[0023]
1-3, 1 is a printed wiring board, 2 is an insulating substrate, 3 is a conductor pattern, 4 is a photosensitive solder resist ink as a photosensitive material, 5 is a solder resist, 6 is a mask film, and 7 is an irradiated portion. UV is 8 in the exposure unit, 9 is a dry gas in the heating unit, 10 is a drying unit, 11 is a positioning unit, 12 is a heating unit or irradiation unit, 13 is an exposure unit, and 14 is a development unit. is there.
[0024]
As shown in FIG. 3, the printed wiring board manufacturing apparatus according to the present invention includes a heating unit or an irradiation unit 12 immediately before the exposure unit 13 after the positioning unit 11.
[0025]
The method for manufacturing a printed wiring board according to the present invention will be described in detail below using the printed wiring board manufacturing apparatus configured as described above.
[0026]
First, a photosensitive solder resist ink 4 is applied on a printed wiring board 1 having a conductor pattern 3 formed on an insulating substrate 2 by a known means such as screen printing, a roll coater or a curtain coater, and the drying shown in FIG. Touch drying is performed in the part 10 under conditions of a temperature of 60 to 80 ° C. and a time of about 15 to 30 minutes to obtain a printed wiring board 1 as shown in FIG. Next, the positioning unit 11 shown in FIG. 3 performs positioning with a CCD camera, and the irradiation unit 12 conveys the printed wiring board 1 to the exposure unit 13 while being 300 mJ / cm 2 which is an appropriate exposure amount of the photosensitive solder resist ink 4. Is irradiated and heated with an ultraviolet ray amount of 120 to 150 mJ / cm 2 corresponding to an exposure amount of about 50 to 50%, preferably about 40 to 50% (FIG. 1B).
[0027]
Next, after the mask film 6 and the printed wiring board 1 are brought into vacuum contact with each other in the exposure section 13 of FIG. 3, as shown in FIG. 1 (c), 90 to 120 mJ / cm corresponding to 30 to 40% of the appropriate exposure amount. After performing ultraviolet exposure at an exposure amount of 2, the unexposed portion is developed and removed with a 1 wt% sodium carbonate developer to form a printed wiring board 1 as shown in FIG. Thereafter, main curing is performed in a hot-air circulating furnace or the like to improve coating film properties such as adhesion between the insulating substrate 2, the conductor pattern 3 and the solder resist 5. The solder resist 5 of the printed wiring board manufactured by the above method has high resolution without causing line thickening or development residue.
[0028]
In addition to the above-described heating method using ultraviolet rays, it is also possible to perform heating using near infrared rays or far infrared rays. Further, as shown in FIGS. To improve the touch-drying property of the solder resist surface by heating, and to eliminate the tackiness that occurs when the mask film 6 and the printed wiring board 1 are in close contact with each other at the time of exposure, thereby improving productivity and process yield. Is also possible.
[0029]
【The invention's effect】
As described above, the present invention has an effect that the formation of a solder resist of a printed wiring board by a photographic development method can be produced with high productivity and high resolution and high yield.
[Brief description of the drawings]
FIGS. 1A to 1D are cross-sectional views showing a method of manufacturing a printed wiring board according to an embodiment of the present invention. FIGS. 2A to 2D are diagrams illustrating an embodiment of the present invention. Sectional drawing which shows the manufacturing method of a printed wiring board [FIG. 3] Schematic which shows the manufacturing apparatus of the printed wiring board in one embodiment of this invention [FIG. 4] (a)-(c) is the conventional printed wiring board. FIG. 5 is a cross-sectional view showing a manufacturing method. FIG. 5 is a schematic diagram showing a conventional printed wiring board manufacturing apparatus.
DESCRIPTION OF SYMBOLS 1 Printed wiring board 2 Insulation board 3 Conductive pattern 4 Photosensitive solder resist ink 5 Solder resist 6 Mask film 7 Ultraviolet rays 8 in an irradiation part Ultraviolet rays 9 in an exposure part Drying gas 10 Drying part 11 Positioning part 12 Heating part or irradiation part 13 Exposure unit 14 Development unit

Claims (6)

感光性材料を導電パターンが形成された絶縁基板上に塗布・指触乾燥する工程と、この感光性材料を露光直前に加温または光あるいは熱線を照射する工程と、マスクフィルムをプリント配線板に真空密着し露光する工程と、未露光部を現像する工程とを有するプリント配線板の製造方法。Applying a photosensitive material on an insulating substrate on which a conductive pattern is formed, touching and drying it, heating the photosensitive material just before exposure or irradiating it with light or heat, and mask film on a printed circuit board A method for producing a printed wiring board, comprising: a step of vacuum-contacting and exposing; and a step of developing an unexposed portion. 感光性材料を低露光量の紫外線で加温または照射する請求項1記載のプリント配線板の製造方法。The method for producing a printed wiring board according to claim 1, wherein the photosensitive material is heated or irradiated with a low exposure ultraviolet ray. 感光性材料を感光性材料の適正露光量の50%以内の紫外線量で照射する請求項2記載のプリント配線板の製造方法。The method for producing a printed wiring board according to claim 2, wherein the photosensitive material is irradiated with an ultraviolet ray amount within 50% of an appropriate exposure amount of the photosensitive material. 感光性材料を赤外線または近赤外線で照射する請求項1記載のプリント配線板の製造方法。The method for producing a printed wiring board according to claim 1, wherein the photosensitive material is irradiated with infrared rays or near infrared rays. 感光性材料を加熱した低湿度の乾燥気体で加温する請求項1記載のプリント配線板の製造方法。The method for producing a printed wiring board according to claim 1, wherein the photosensitive material is heated with a dry gas having a low humidity. 導電パターンが形成され感光性材料を塗布・指触乾燥したプリント配線板の搬送位置決め部と、露光直前のプリント配線板を加温または光あるいは熱線を照射する手段と、プリント配線板を紫外線露光する露光部を備えたプリント配線板の製造装置。A printed wiring board transport and positioning unit in which a conductive pattern is formed and a photosensitive material is applied and dried by touch, a printed wiring board immediately before exposure or means for irradiating light or heat rays, and the printed wiring board is exposed to ultraviolet rays. A printed wiring board manufacturing apparatus including an exposure unit.
JP15204896A 1996-06-13 1996-06-13 Method and apparatus for manufacturing printed wiring board Expired - Fee Related JP3755193B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15204896A JP3755193B2 (en) 1996-06-13 1996-06-13 Method and apparatus for manufacturing printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15204896A JP3755193B2 (en) 1996-06-13 1996-06-13 Method and apparatus for manufacturing printed wiring board

Publications (2)

Publication Number Publication Date
JPH09331137A JPH09331137A (en) 1997-12-22
JP3755193B2 true JP3755193B2 (en) 2006-03-15

Family

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Family Applications (1)

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JP15204896A Expired - Fee Related JP3755193B2 (en) 1996-06-13 1996-06-13 Method and apparatus for manufacturing printed wiring board

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