JPH07147298A - Mounting structure of semiconductor device and mounting method therefor - Google Patents

Mounting structure of semiconductor device and mounting method therefor

Info

Publication number
JPH07147298A
JPH07147298A JP5293127A JP29312793A JPH07147298A JP H07147298 A JPH07147298 A JP H07147298A JP 5293127 A JP5293127 A JP 5293127A JP 29312793 A JP29312793 A JP 29312793A JP H07147298 A JPH07147298 A JP H07147298A
Authority
JP
Japan
Prior art keywords
semiconductor chip
wiring board
semiconductor
chip
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5293127A
Other languages
Japanese (ja)
Other versions
JP2863426B2 (en
Inventor
Noriko Kakimoto
典子 柿本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP5293127A priority Critical patent/JP2863426B2/en
Publication of JPH07147298A publication Critical patent/JPH07147298A/en
Application granted granted Critical
Publication of JP2863426B2 publication Critical patent/JP2863426B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides

Abstract

PURPOSE:To prevent a tool from contacting with a temporary fixed or connected semiconductor chip when the semiconductor chip is temporary fixed or connected in a semiconductor device to be mounted by a face-down method. CONSTITUTION:After a semiconductor chip 1 of which the thickness of the semiconductor substrate is thin is mounted on a wiring board 3, a semiconductor chip 2 is mounted of which the thickness of the semiconductor substrate is thick. Thus, highly reliable and high density mounting is made possible.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置の実装構造に
関し、配線基板に複数の半導体チップをフェースダウン
方式で接続する半導体装置の実装構造及びその実装方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure of a semiconductor device, and more particularly to a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner and a mounting method thereof.

【0002】[0002]

【従来の技術】配線基板に半導チップをフェースダウン
方式で接続する半導体装置の実装方法として、半導体チ
ップのチップ電極にメッキ、ボールボンドなどにより形
成したバンプを介して接続する方法、半導体チップと配
線基板の間に異方性導電性フィルムを挟んで半導体チッ
プを押圧して接続する方法、チップ電極または基板電極
に導電性粒子を配置し半導体チップを押圧して接続する
方法などがある。これらの方法はいずれも、半導体チッ
プを半導体基板に仮止めする際、または、半導体チップ
を配線基板に接続する際などに、半導体チップの裏面か
らツ−ルを当てることになる。
2. Description of the Related Art As a semiconductor device mounting method for connecting a semiconductor chip to a wiring board in a face-down manner, a semiconductor chip is connected to a chip electrode of the semiconductor chip through bumps formed by plating, ball bonding, or the like. There are a method of pressing and connecting a semiconductor chip with an anisotropic conductive film sandwiched between wiring boards, a method of arranging conductive particles on a chip electrode or a substrate electrode and pressing the semiconductor chip to connect. In any of these methods, a tool is applied from the back surface of the semiconductor chip when the semiconductor chip is temporarily fixed to the semiconductor substrate or when the semiconductor chip is connected to the wiring substrate.

【0003】また、複数の半導体チップを実装する際、
これまでの技術では、半導体チップの半導体基板の厚
さ、半導体チップのチップ電極と配線基板の基板電極と
を接続する接続構造体、半導体チップを接続する配線基
板を特に変えることもなく、配線基板の基準面から半導
体チップの裏面までの接続後の高さは同一となってい
た。
When mounting a plurality of semiconductor chips,
According to the conventional technology, the thickness of the semiconductor substrate of the semiconductor chip, the connection structure for connecting the chip electrode of the semiconductor chip and the substrate electrode of the wiring board, and the wiring board for connecting the semiconductor chip are not particularly changed. After the connection, the height from the reference surface to the back surface of the semiconductor chip was the same.

【0004】[0004]

【発明が解決しようとする課題】近年、複数の半導体チ
ップを高密度に実装すべく、また、電気特性上から、隣
接する半導体チップとの間隔を小さくしたいという要求
が非常に高まってきている。
In recent years, in order to mount a plurality of semiconductor chips at a high density and in view of electrical characteristics, there is a great demand for reducing the distance between adjacent semiconductor chips.

【0005】ところが、これまでのように、配線基板の
基準面から半導体チップの裏面までの接続後の高さが同
一の場合、既に仮止めまたは接続された第1の半導体チ
ップの隣の第2の半導体チップを仮止めまたは接続しよ
うとする際、以下のような問題が生じる。
However, if the heights from the reference surface of the wiring board to the back surface of the semiconductor chip after connection are the same as before, the second semiconductor adjacent to the first semiconductor chip that has already been temporarily fixed or connected is used. When attempting to temporarily fix or connect the semiconductor chip described above, the following problems occur.

【0006】図7(a)に示すように、ツール4が第
1の半導体チップ1の裏面1rにも接し、通常発生する
若干のブレなどにより、第1の半導体チップ1が位置ず
れする。
As shown in FIG. 7 (a), the tool 4 also contacts the back surface 1r of the first semiconductor chip 1, and the first semiconductor chip 1 is displaced due to some normal blurring.

【0007】図7(b)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接し、通常発生する
若干のブレなどにより、第1の半導体チップ1が傾く。
As shown in FIG. 7 (b), the tool 4 contacts the back surface 1r of the first semiconductor chip 1 and the first semiconductor chip 1 is tilted due to a slight blur which is usually generated.

【0008】図7(c)に示すように、ツール4が第
1の半導体チップ1の裏面1rにも接し、通常発生する
若干のブレなどにより、第1の半導体チップ1にクラッ
ク、チッピングなどの破損が発生する。
As shown in FIG. 7 (c), the tool 4 also contacts the back surface 1r of the first semiconductor chip 1 and the first semiconductor chip 1 may be cracked or chipped due to slight deviations that normally occur. Damage occurs.

【0009】図7(d)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接するため、ツ−ル
4からの熱、荷重、超音波などが、第1の半導体チップ
1にもかかって、第2の半導体チップ2へ熱、荷重、超
音波などが十分かからず、第2の半導体チップ2の接続
が不十分になる。
As shown in FIG. 7 (d), since the tool 4 is in contact with the back surface 1r of the first semiconductor chip 1, heat, load, ultrasonic waves, etc. from the tool 4 are generated by the first tool. The semiconductor chip 1 is also applied, so that heat, load, ultrasonic waves, etc. are not sufficiently applied to the second semiconductor chip 2, and the connection of the second semiconductor chip 2 becomes insufficient.

【0010】図7(e)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接するため、ツ−ル
4からの熱、荷重、超音波などが、第1の半導体チップ
1にもかかって、例えば、AuとSnなどを用いた接続
の場合、第1の半導体チップ1へかかった熱などにより
金属拡散が進み過ぎ、第1の半導体チップ1の接続が悪
化する。
As shown in FIG. 7 (e), since the tool 4 is in contact with the back surface 1r of the first semiconductor chip 1, heat, load, ultrasonic waves, etc. from the tool 4 are the first. For example, in the case of connection using Au and Sn or the like on the semiconductor chip 1, metal diffusion proceeds too much due to heat applied to the first semiconductor chip 1 and the connection of the first semiconductor chip 1 deteriorates. .

【0011】図7(f)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接するため、ツ−ル
4からの熱、荷重、超音波などが、第1の半導体チップ
1にもかかって、例えば、熱に弱い材料構成の素子1x
などが、第1の半導体チップ1を接続するための熱では
影響を受けなかったものが、第2の半導体チップ2の接
続の際の熱が更にかかったために、第1の半導体チップ
1の素子1xの電気特性が悪化する。
As shown in FIG. 7 (f), the tool 4 is in contact with the back surface 1r of the first semiconductor chip 1, so that heat, load, ultrasonic waves, etc. from the tool 4 are generated by the first tool. For example, an element 1x made of a material that is weak against heat when applied to the semiconductor chip 1.
And the like were not affected by the heat for connecting the first semiconductor chip 1, but the heat for connecting the second semiconductor chip 2 was further applied. 1x electrical characteristics deteriorate.

【0012】このため、ツ−ルの押圧面を半導体チップ
と同サイズにする方法も一部試みられているが、半導体
チップの様々なサイズにあわせてツ−ルを作製する必要
がありコストアップを招き、また、半導体チップ毎にツ
−ルを交換しなければならないので作業工程が増えてラ
ンニングコストの増加につながる。また、半導体チップ
のサイズがある程度以上小さくなると、吸着穴、ヒータ
ー、荷重センサーなどをツ−ルに設けることができず、
そうしたツ−ル作製は不可能となる。加えて、ツ−ルの
押圧面が半導体チップと同じサイズの場合、ツ−ルと半
導体チップを十分にアライメントしなければ、図8に示
すように、通常発生する若干のブレなどにより、半導体
チップにクラック・チッピングなどの破損が発生する。
これは、ツ−ルの押圧面のサイズが半導体チップよりも
小さい場合も同様となる。このように、半導体チップと
の間隔を小さくしたいという要求に応えることは難しか
った。
For this reason, some methods have been attempted to make the pressing surface of the tool the same size as the semiconductor chip, but it is necessary to manufacture the tool according to various sizes of the semiconductor chip, which increases the cost. In addition, since the tool must be replaced for each semiconductor chip, the number of working steps increases and the running cost increases. Also, if the size of the semiconductor chip is reduced to a certain extent or more, suction holes, heaters, load sensors, etc. cannot be provided on the tool,
It is impossible to make such a tool. In addition, when the tool pressing surface has the same size as the semiconductor chip, unless the tool and the semiconductor chip are sufficiently aligned, as shown in FIG. Damage such as cracks and chipping occurs.
This also applies when the size of the pressing surface of the tool is smaller than that of the semiconductor chip. As described above, it has been difficult to meet the demand for reducing the distance from the semiconductor chip.

【0013】[0013]

【課題を解決するための手段】請求項1に記載の本発明
は、配線基板に複数の半導体チップをフェースダウン方
式で接続する半導体装置の実装構造において、上記配線
基板の基準面から第1の半導体チップの裏面までの高さ
よりも上記配線基板の基準面から第2の半導体チップの
裏面までの高さが高く、かつ上記配線基板の基準面から
第1の半導体チップの主面までの高さよりも上記配線基
板の基準面から第2の半導体チップの主面までの高さが
高く上記配線基板上に接続されたことを特徴とする。
According to a first aspect of the present invention, there is provided a semiconductor device mounting structure in which a plurality of semiconductor chips are connected to a wiring board by a face-down method. The height from the reference surface of the wiring board to the back surface of the second semiconductor chip is higher than the height from the back surface of the semiconductor chip, and from the height from the reference surface of the wiring board to the main surface of the first semiconductor chip. Also has a high height from the reference surface of the wiring board to the main surface of the second semiconductor chip and is connected to the wiring board.

【0014】請求項2に記載の本発明は、配線基板に複
数の半導体チップをフェースダウン方式で接続する半導
体装置の実装構造において、上記配線基板の基準面から
第1の半導体チップの裏面までの高さよりも上記配線基
板の基準面から第2の半導体チップの主面までの高さが
高く、上記配線基板上に接続されたことを特徴とする。
According to a second aspect of the present invention, in a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board by a face-down method, from a reference surface of the wiring board to a back surface of the first semiconductor chip. The height from the reference surface of the wiring board to the main surface of the second semiconductor chip is higher than the height, and the connection is made on the wiring board.

【0015】請求項3に記載の本発明は、配線基板に複
数の半導体チップをフェースダウン方式で接続する半導
体装置の実装構造において、上記配線基板の基準面から
第1の半導体チップの裏面までの高さよりも上記配線基
板の基準面から第2の半導体チップの主面までの高さが
高く、かつ第1の半導体チップの一部上に第2の半導体
チップ一部が重なり合うように上記配線基板上に接続さ
れたことを特徴とする。
According to a third aspect of the present invention, in a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board by a face-down method, from a reference surface of the wiring board to a back surface of the first semiconductor chip. The wiring board is higher than the height from the reference surface of the wiring board to the main surface of the second semiconductor chip, and the second semiconductor chip partially overlaps with the first semiconductor chip. It is characterized by being connected above.

【0016】請求項4に記載の本発明は、請求項1,
2、または3に記載の半導体装置の実装方法において、
第1の半導体チップを配線基板に接続した後、第2の半
導体チップを上記配線基板に接続することを特徴とす
る。
The present invention according to claim 4 provides the invention according to claim 1,
In the mounting method of the semiconductor device described in 2 or 3,
After connecting the first semiconductor chip to the wiring board, the second semiconductor chip is connected to the wiring board.

【0017】[0017]

【作用】本発明によれば、既に仮止めあるいは接続され
た第1の半導体チップの隣に第2の半導体チップを仮止
めまたは接続しようとする際、配線基板の基準面から第
1の半導体チップの裏面までの高さは、配線基板の基準
面から第2の半導体チップの裏面までの高さよりも低い
ため、第1の半導体チップの裏面には第2の半導体チッ
プを接続するためのツ−ルが接することはない。
According to the present invention, when attempting to temporarily fix or connect a second semiconductor chip next to a first semiconductor chip that has already been temporarily fixed or connected, the first semiconductor chip is removed from the reference surface of the wiring board. Since the height from the reference surface of the wiring substrate to the back surface of the second semiconductor chip is lower than the height from the reference surface of the wiring board to the back surface of the first semiconductor chip, a tool for connecting the second semiconductor chip to the back surface of the first semiconductor chip. Le never touches.

【0018】[0018]

【実施例】以下に、本発明の実施例を図面を参照しなが
ら説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0019】第1の実施例 図1(a)〜(e)に、本発明の第1の実施例の主要工
程断面図を示す。ここでは、チップ電極にバンプを形成
した複数の半導体チップを配線基板に実装する場合を示
している。
First Embodiment FIGS. 1A to 1E are sectional views showing main steps of a first embodiment of the present invention. Here, a case is shown in which a plurality of semiconductor chips having bumps formed on chip electrodes are mounted on a wiring board.

【0020】まず、配線3w、電極3eなどを形成した
配線基板3を用意する(図1(a))。ここでは、配線
3w、電極3eを形成したAIN基板3を用いたが、P
WB、ガラス基板、などいずれを用いてもよい。
First, the wiring board 3 on which the wiring 3w, the electrodes 3e, etc. are formed is prepared (FIG. 1A). Here, the AIN substrate 3 on which the wiring 3w and the electrode 3e are formed is used.
Any of WB, a glass substrate, or the like may be used.

【0021】次に、半導体基板1sの厚さを後述する第
2の半導体チップ2の半導体基板2sの厚さよりも薄く
した、第1の半導体チップ1を用意し、第1の半導体チ
ップ1のチップ電極1eと配線基板3の対応する基板電
極3eとを位置合わせする(図1(b))。ここでは、
GaAs半導体基板1sを用い、チップ電極1eにAu
バンプ1aを形成した半導体チップ1を用いたが、シリ
コンなどにハンダパンプ、Cuボールバンプなどを形成
したものを用いてもよい。
Next, the first semiconductor chip 1 in which the thickness of the semiconductor substrate 1s is made thinner than the thickness of the semiconductor substrate 2s of the second semiconductor chip 2 described later is prepared, and the chip of the first semiconductor chip 1 is prepared. The electrode 1e and the corresponding substrate electrode 3e of the wiring board 3 are aligned (FIG. 1 (b)). here,
Au is used for the chip electrode 1e using the GaAs semiconductor substrate 1s.
Although the semiconductor chip 1 on which the bumps 1a are formed is used, it is also possible to use a semiconductor chip on which solder bumps, Cu ball bumps, or the like are formed.

【0022】次に、第1の半導体チップ1を配線基板3
に接続する(図1(c))。ここでは、ツ−ル4を用い
て加熱しながら荷重をかけて接続したが、さらに、超音
波などをかけてもよい。
Next, the first semiconductor chip 1 is attached to the wiring board 3
(Fig. 1 (c)). Here, the tool 4 is used for connection while being heated while being heated, but ultrasonic waves may be further applied.

【0023】次に、半導体基板2sの厚さを第1の半導
体チップ1の半導体基板1sの厚さよりも厚くした、第
2の半導体チップ2を用意し、第2の半導体チップ2の
チップ電極2eと配線基板3の対応する基板電極3eと
を位置合わせする(図1(d))。
Next, the second semiconductor chip 2 in which the thickness of the semiconductor substrate 2s is made thicker than the thickness of the semiconductor substrate 1s of the first semiconductor chip 1 is prepared, and the chip electrode 2e of the second semiconductor chip 2 is prepared. And the corresponding substrate electrode 3e of the wiring substrate 3 are aligned (FIG. 1 (d)).

【0024】最後に、第2の半導体チップ2を配線基板
3に接続する(図1(e))。ここでは、図1(c)と
同様にして接続した。このとき、配線基板3の基準面3
aから第2の半導体チップ2の裏面2rまでの高さH2
は、配線基板3の基準面3aから第1の半導体チップ1
の裏面1rまでの高さH1よりも高いため、第2の半導
体チップ2を押圧するツ−ル4の押圧面が第2の半導体
チップ2よりはみ出した状態でも、ツ−ル4が第1の半
導体チップ1に当たることはない。
Finally, the second semiconductor chip 2 is connected to the wiring board 3 (FIG. 1 (e)). Here, connection was performed in the same manner as in FIG. At this time, the reference plane 3 of the wiring board 3
Height H 2 from a to the back surface 2r of the second semiconductor chip 2
Is the first semiconductor chip 1 from the reference surface 3a of the wiring board 3.
Since the height is higher than the height H 1 to the back surface 1r of the tool 4, even if the pressing surface of the tool 4 for pressing the second semiconductor chip 2 extends beyond the second semiconductor chip 2, the tool 4 is not the first. It does not hit the semiconductor chip 1.

【0025】第2の実施例 図2(a)〜(e)に、本発明の第2の実施例の主要工
程断面図を示す。ここでは、半導体チップのチップ電極
と配線基板の基板電極とを接続する接続構造体として、
チップ電極に導電性粒子を配置した半導体チップと、異
方性導電性フィルムを介して配線基板と接続する半導体
チップとを、配線基板に実装する場合を示している。
Second Embodiment FIGS. 2A to 2E are sectional views showing main steps of a second embodiment of the present invention. Here, as a connection structure for connecting the chip electrode of the semiconductor chip and the substrate electrode of the wiring board,
The case where a semiconductor chip in which conductive particles are arranged on chip electrodes and a semiconductor chip connected to a wiring board via an anisotropic conductive film are mounted on the wiring board is shown.

【0026】まず、配線3w、電極3eなどを形成した
配線基板3を用意する(図2(a))。ここでは、配線
3w、電極3eを形成したガラス基板3を用いたが、P
WB、セラミック基板、などいずれを用いてもよい。
First, the wiring board 3 on which the wiring 3w, the electrodes 3e, etc. are formed is prepared (FIG. 2A). Here, the glass substrate 3 on which the wiring 3w and the electrode 3e are formed is used.
Any of WB, a ceramic substrate, etc. may be used.

【0027】次に、チップ電極1eに小径の導電性粒子
1aを配置した第1の半導体チップ1を用意し、第1の
半導体チップ1のチップ電極1eと配線基板3の対応す
る基板電極3eとを位置合わせする(図2(b))。こ
こでは、シリコン半導体基板1sを用い、チップ電極1
eへ樹脂にAuコーティングした導電性粒子1aを配置
した半導体チップ1を用いた。なお、導電性粒子の配置
方法は、電極を形成したシリコンウェハに感光性樹脂を
塗布し、電極部以外の樹脂をUV照射して硬化し、導電
性粒子を散布後、洗浄などを行うと、硬化していない電
極部のみが粘着性を有しているため、電極部のみ導電性
粒子が付着してそれ以外の部分には導電性粒子が付着し
ていない状態となり、その後、電極部の感光性樹脂もU
V照射により硬化する、という方法である。
Next, the first semiconductor chip 1 in which the small-diameter conductive particles 1a are arranged on the chip electrode 1e is prepared, and the chip electrode 1e of the first semiconductor chip 1 and the corresponding substrate electrode 3e of the wiring board 3 are prepared. Are aligned (FIG. 2 (b)). Here, the silicon semiconductor substrate 1s is used, and the chip electrode 1
A semiconductor chip 1 was used in which conductive particles 1a obtained by coating a resin with Au were placed. The conductive particles are arranged by applying a photosensitive resin to a silicon wafer having electrodes formed thereon, irradiating the resin other than the electrode portion with UV to cure the conductive particles, and spraying the conductive particles, followed by washing, Since only the uncured electrode part has adhesiveness, the conductive particles adhere to only the electrode part and the conductive particles do not adhere to other parts. Resin is also U
It is a method of curing by V irradiation.

【0028】次に、第1の半導体チップ1を配線基板3
に接続する(図2(c))。ここでは、半導体チップ1
または配線基板3に感光性樹脂1a’を適量滴下し、ツ
−ル4で半導体チップ1を配線基板3に押圧しながらU
V照射を行っている。なお、ここで配線基板3はUV光
を透過するものを用いている。
Next, the first semiconductor chip 1 is attached to the wiring board 3
(Fig. 2 (c)). Here, the semiconductor chip 1
Alternatively, an appropriate amount of the photosensitive resin 1a ′ may be dropped onto the wiring board 3, and the tool 4 may press the semiconductor chip 1 against the wiring board 3 to make U
V irradiation is performed. The wiring substrate 3 used here is one that transmits UV light.

【0029】次に、第2の半導体チップ2を用意し、第
2の半導体チップ2のチップ電極2eと配線基板3の対
応する基板電極3eとを位置合わせする(図2
(d))。
Next, the second semiconductor chip 2 is prepared, and the chip electrode 2e of the second semiconductor chip 2 and the corresponding substrate electrode 3e of the wiring board 3 are aligned (FIG. 2).
(D)).

【0030】最後に、第2の半導体チップ2を配線基板
3に接続する(図2(e))。ここでは、第2のの半導
体チップ2と配線基板3との間に接続構造体2aと樹脂
2a’とからなる異方性導電性フィルム2a”を介して
ツ−ル4で荷重を加えて接続を行った。このとき、第1
の半導体チップ1の接続構造体として用いた導電性粒子
1aの接続後の、基板水平面に対して垂直方向の直径d
1は、第2の半導体チップ2の接続構造体として用いた
異方性導電性フィルム2a”の接続後の厚さd2よりも
小さく、配線基板3の基準面3aから第1の半導体チッ
プ1の素子面1fまでの間隔h1は配線基板3の基準面
3aから第2の半導体チップ2の素子面2fまでの間隔
2より小さい。すなわち、配線基板3の基準面3aか
ら第2の半導体チップ2の裏面2rまでの高さH2は、
配線基板3の基準面3aから第1の半導体チップ1の裏
面1rまでの高さH1よりも高くなり、第2の半導体チ
ップ2を押圧するツ−ル4の押圧面が第2の半導体チッ
プ2よりはみ出した状態でも、ツ−ル4が第1の半導体
チップ1に当たることはない。
Finally, the second semiconductor chip 2 is connected to the wiring board 3 (FIG. 2 (e)). Here, a connection is made between the second semiconductor chip 2 and the wiring board 3 by applying a load with a tool 4 via an anisotropic conductive film 2a ″ made of a connection structure 2a and a resin 2a ′. At this time, the first
After the connection of the conductive particles 1a used as the connection structure of the semiconductor chip 1 of FIG.
1 is smaller than the thickness d 2 of the anisotropic conductive film 2a ″ used as the connection structure of the second semiconductor chip 2 after the connection, and the distance from the reference surface 3a of the wiring substrate 3 to the first semiconductor chip 1 distance h 1 to the element surface 1f of smaller spacing h 2 from the reference surface 3a of the wiring board 3 to the second element surface 2f of the semiconductor chip 2. That is, the second semiconductor from the reference surface 3a of the wiring board 3 The height H 2 to the back surface 2r of the chip 2 is
The height from the reference surface 3a of the wiring board 3 to the back surface 1r of the first semiconductor chip 1 is higher than the height H 1 , and the pressing surface of the tool 4 for pressing the second semiconductor chip 2 is the second semiconductor chip. The tool 4 does not hit the first semiconductor chip 1 even if the tool 4 is out of the range.

【0031】なお、上述の実施例では、半導体チップの
チップ電極と配線基板の基板電極とを接続する接続構造
体として、第1のチップと第2のチップとに異なるもの
を使用したが、同種の接続構造体を使用して、その接続
構造体の大きさ、厚みなどを変えるという方法を用いて
もよいし、あるいは、同種同サイズの接続構造体を使用
して、一方は高荷重などによりかなり押し潰し、もう一
方は低荷重などにより弱めに押し潰すという接続条件を
変える方法を用いてもよい。
In the above-described embodiment, different connection structures for connecting the chip electrode of the semiconductor chip and the substrate electrode of the wiring board are used for the first chip and the second chip. You may use the method of changing the size, thickness, etc. of the connection structure by using the connection structure of, or by using the connection structure of the same kind and the same size, one side by high load etc. It is also possible to use a method of changing the connection condition of crushing considerably and crushing the other weakly by a low load or the like.

【0032】第3の実施例 図3(a)〜(f)に、本発明の第3の実施例の主要工
程断面図を示す。ここでは、チップ電極にバンプを形成
した複数の半導体チップを配線基板に実装する場合を示
している。
Third Embodiment FIGS. 3A to 3F are sectional views showing main steps of a third embodiment of the present invention. Here, a case is shown in which a plurality of semiconductor chips having bumps formed on chip electrodes are mounted on a wiring board.

【0033】まず、第2の半導体チップ2を接続する配
線基板3のエリア3hを配線基板3の基準面3aよりも
高くし、配線3w、電極3eなどを形成した配線基板3
を用意する(図3(a))。ここでは、第2の半導体チ
ップ2を接続する配線基板3のエリア3hに絶縁性樹脂
3xを塗布、硬化し、配線基板3の基準面3aよりも高
くして、配線3w、電極3eを形成したPWB3を用い
たが、該エリアはペーストを厚くして同時焼成したセラ
ミック基板、ガラス基板、などいずれを用いてもよい。
First, the area 3h of the wiring board 3 for connecting the second semiconductor chip 2 is made higher than the reference surface 3a of the wiring board 3, and the wiring board 3 in which the wiring 3w, the electrode 3e, etc. are formed.
Are prepared (FIG. 3 (a)). Here, the insulating resin 3x is applied and cured in the area 3h of the wiring board 3 connecting the second semiconductor chip 2 to a height higher than the reference surface 3a of the wiring board 3 to form the wiring 3w and the electrode 3e. Although PWB3 was used, any ceramic substrate, glass substrate, or the like in which paste is thickened and co-fired may be used in this area.

【0034】次に、第1の半導体チップ1を用意し、第
1の半導体チップ1のチップ電極1eと配線基板3対応
する基板電極3eとを位置合わせする(図3(b))。
ここでは、シリコン半導体基板1sを用い、チップ電極
1eにハンダバンプ1aを形成した半導体チップ1を用
いている。
Next, the first semiconductor chip 1 is prepared, and the chip electrode 1e of the first semiconductor chip 1 and the board electrode 3e corresponding to the wiring board 3 are aligned with each other (FIG. 3B).
Here, the semiconductor chip 1 in which the silicon semiconductor substrate 1s is used and the solder bumps 1a are formed on the chip electrodes 1e is used.

【0035】次に、第1の半導体チップ1を配線基板3
に仮止めする(図3(c))。ここでは、ツール4で半
導体チップ1を配線基板3に軽く押圧して仮止めしてい
る。
Next, the first semiconductor chip 1 is attached to the wiring board 3
Temporarily fix to (Fig. 3 (c)). Here, the tool 4 is used to temporarily press the semiconductor chip 1 against the wiring board 3 to temporarily fix it.

【0036】次に、第1の半導体チップと略同じ厚さの
第2の半導体チップ2を用意し、第2の半導体チップ2
のチップ電極2eと配線基板3の対応する基板電極3e
とを位置合わせする(図3(d))。
Next, a second semiconductor chip 2 having substantially the same thickness as the first semiconductor chip 2 is prepared, and the second semiconductor chip 2 is prepared.
Of the chip electrode 2e and the corresponding substrate electrode 3e of the wiring board 3
And are aligned (FIG. 3 (d)).

【0037】次に、第2の半導体チップ2を配線基板3
に仮止めする(図3(e))。ここでは、図3(c)と
同様にして仮止めした。このとき、第2の半導体チップ
2を接続する配線基板3のエリア3hは配線基板3の基
準面3aよりも高く、したがって、配線基板3の基準面
3aから第2の半導体チップ2の裏面2rまでの高さH
2は、配線基板3の基準面3aから第1の半導体チップ
1の裏面1rまでの高さH1よりも高いため、第2の半
導体チップ2を押圧するツール4の押圧面が第2の半導
体チップ2よりはみ出した状態でも、ツール4が第1の
半導体チップ1に当たることはない。最後に配線基板3
をリフローして、半導体チップとの接続を行う(図3
(f))。
Next, the second semiconductor chip 2 is attached to the wiring board 3
Temporarily fix to (Fig. 3 (e)). Here, it is temporarily fixed in the same manner as in FIG. At this time, the area 3h of the wiring board 3 connecting the second semiconductor chip 2 is higher than the reference surface 3a of the wiring board 3, and therefore, from the reference surface 3a of the wiring board 3 to the back surface 2r of the second semiconductor chip 2. Height H
Since 2 is higher than the height H 1 from the reference surface 3a of the wiring board 3 to the back surface 1r of the first semiconductor chip 1, the pressing surface of the tool 4 for pressing the second semiconductor chip 2 is the second semiconductor. The tool 4 does not hit the first semiconductor chip 1 even if the tool 4 protrudes from the chip 2. Finally the wiring board 3
Is reflowed to connect with the semiconductor chip (see FIG. 3).
(F)).

【0038】なお、上述の実施例では、第2の半導体チ
ップを接続する配線基板のエリアを配線基板の基準面よ
りも高くした配線基板を用いたが、反対に、第1の半導
体チップを接続する配線基板のエリアを配線基板の基準
面よりも低くした配線基板を用いてもよい。
In the above-described embodiment, the wiring board in which the area of the wiring board to which the second semiconductor chip is connected is made higher than the reference plane of the wiring board is used. On the contrary, the first semiconductor chip is connected. A wiring board in which the area of the wiring board is lower than the reference plane of the wiring board may be used.

【0039】また、上述の実施例では、接続構造体とし
てハンダバンプを用いており、工程を減らすため、第1
の半導体チップの仮止め、第2の半導体チップの仮止
め、第1および第2の半導体チップのリフローによる一
括接続、という順に工程を経たが、第1の半導体チップ
の仮止めとリフローによる接続、第2の半導体チップの
仮止めとリフローによる接続、という順の工程で行って
もよい。
Further, in the above-mentioned embodiment, the solder bump is used as the connection structure, and the first bump is used to reduce the number of steps.
The semiconductor chip is temporarily fixed, the second semiconductor chip is temporarily fixed, and the first and second semiconductor chips are collectively connected by reflow. The first semiconductor chip is temporarily fixed and reflowed. The steps may be performed in the order of temporary fixing of the second semiconductor chip and connection by reflow.

【0040】第4の実施例 図4(a)〜(c)に、本発明の実施例の主要工程断面
図を示す。上記第1から第3の実施例では、2ケの半導
体チップについて説明しているが、ここでは、更に多く
の半導体チップを用いて実装する場合を示している。ま
た、配線基板の基準面から半導体チップのそれぞれの高
さを様々に変えてもよい。なお、半導体基板の厚さ
1,D2,D3 の間には、D1<D2<D3 の関係があ
り、接続構造体は、略同一の大きさとなるようにしてい
る。
Fourth Embodiment FIGS. 4A to 4C are sectional views showing main steps of an embodiment of the present invention. In the first to third embodiments described above, two semiconductor chips have been described, but here, the case of mounting using more semiconductor chips is shown. Further, the height of each semiconductor chip from the reference surface of the wiring board may be variously changed. There is a relationship of D 1 <D 2 <D 3 among the thicknesses D 1 , D 2 and D 3 of the semiconductor substrate, and the connection structures are made to have substantially the same size.

【0041】まず、半導体基板1sの厚さがD1 の第1
の半導体チップ群1を配線基板3に接続する(図4
(a))。
Firstly, the first thickness of the semiconductor substrate 1s is D 1
The semiconductor chip group 1 is connected to the wiring board 3 (see FIG. 4).
(A)).

【0042】次に、半導体基板2sの厚さがD1の第2
の半導体チップ群2を配線基板3に接続する(図4
(b))。
Next, the second semiconductor substrate 2s whose thickness is D 1
The semiconductor chip group 2 is connected to the wiring board 3 (see FIG. 4).
(B)).

【0043】このとき、D1<D2 の関係があるため、
配線基板3の基準面3aから第1および第2の半導体チ
ップの裏面までの高さは、H1<H2 の関係となり、第
2の半導体チップ2を押圧するツール4は第1の半導体
チップ1に当たることはない。
At this time, since there is a relation of D 1 <D 2 ,
The height from the reference surface 3a of the wiring board 3 to the back surfaces of the first and second semiconductor chips has a relationship of H 1 <H 2 , and the tool 4 for pressing the second semiconductor chip 2 is the first semiconductor chip. It does not hit 1.

【0044】最後に半導体基板5sの厚さがD3の第3
の半導体チップ群5を配線基板3に接続する(図4
(c))。このとき、D1<D2<D3 の関係があるた
め、配線基板3の基準面3aから第1、第2および第3
の半導体チップの裏面までのそれぞれの高さは、H1
2<H3の関係となり、第3の半導体チップ5を押圧す
るツール4は第1の半導体チップ1および第2の半導体
チップ2に当たることはない。
Finally, the semiconductor substrate 5s has a third thickness D 3
The semiconductor chip group 5 is connected to the wiring board 3 (see FIG. 4).
(C)). At this time, since the relationship of D 1 <D 2 <D 3 is satisfied, the first, second and third parts from the reference surface 3 a of the wiring board 3
The height of each semiconductor chip to the back surface is H 1 <
Since H 2 <H 3 , the tool 4 for pressing the third semiconductor chip 5 does not hit the first semiconductor chip 1 and the second semiconductor chip 2.

【0045】第5の実施例 図5に、本発明の第5の実施例の半導体装置の断面図を
示す。ここで、第1の半導体チップ1は、配線基板3が
基準面3aより凹状に形成された低い部分3l上に実装
され、その裏面1rは、配線基板3に実装された第2の
半導体チップ2の素子面2fより低くなっている。な
お、この時の実装方法は、第1から第4までの実施例に
おいて説明したいづれの方法でも可能である。この場合
は、特に、接続構造体2aが、つぶれても直接、隣接し
た接続構造体1aとショートすることはなく、高密度実
装に適している。
Fifth Embodiment FIG. 5 shows a sectional view of a semiconductor device according to a fifth embodiment of the present invention. Here, the first semiconductor chip 1 is mounted on the lower portion 3l of the wiring substrate 3 which is formed in a concave shape with respect to the reference surface 3a, and the back surface 1r thereof is mounted on the wiring substrate 3 by the second semiconductor chip 2. It is lower than the element surface 2f. The mounting method at this time can be any of the methods described in the first to fourth embodiments. In this case, the connection structure 2a is not directly short-circuited with the adjacent connection structure 1a even if the connection structure 2a is crushed, which is suitable for high-density mounting.

【0046】第6の実施例 図6に、本発明の第6の実施例の半導体装置の断面図及
び平面図を示す。ここで、第1の半導体チップ1は、配
線基板3の基準面3a上に実装され、第2の半導体チッ
プ2は、配線基板3が基準面3aより凸状に形成された
高い部分3hに実装されている。半導体チップ1の裏面
1rは、半導体チップ2の素子面2fより低く実装さ
れ、かつ、図面から明らかなように、半導体チップが互
いに平面方向から見て重なり合うように実装されてい
る。この場合は特に高密度実装に向いている。
Sixth Embodiment FIG. 6 shows a sectional view and a plan view of a semiconductor device according to a sixth embodiment of the present invention. Here, the first semiconductor chip 1 is mounted on the reference surface 3a of the wiring board 3, and the second semiconductor chip 2 is mounted on the higher portion 3h of the wiring board 3 which is convexly formed than the reference surface 3a. Has been done. The back surface 1r of the semiconductor chip 1 is mounted lower than the element surface 2f of the semiconductor chip 2, and, as is clear from the drawing, the semiconductor chips are mounted so as to overlap each other when viewed in the planar direction. This case is particularly suitable for high-density mounting.

【0047】なお、本発明は、上記実施例に限定される
ものでなく、特許請求の範囲で種々の変更が可能であ
る。
The present invention is not limited to the above embodiment, but various modifications can be made within the scope of the claims.

【0048】[0048]

【発明の効果】以上のように、本発明によれば、配線基
板に半導体チップを仮止めあるいは接続した状態では、
配線基板の基準面から半導体チップの裏面までの高さ
が、隣接する半導体チップでは異なった実装構造であ
り、既に仮止めあるいは接続された第1の半導体チップ
の隣に第2の半導体チップを仮止めまたは接続しようと
する際、配線基板の基準面から第1の半導体チップの裏
面までの高さが、配線基板の基準面から第2の半導体チ
ップの裏面までの高さよりも低くなっているため、第1
の半導体チップの裏面には第2の半導体チップを接続す
るためのツールが接することはない。このため、ツール
を特に変えなくても、隣接する半導体チップとの間隔を
小さくすることができ、その結果、高信頼で、実装密
度、電気的特性などをあげることができる。
As described above, according to the present invention, when the semiconductor chip is temporarily fixed or connected to the wiring board,
The height from the reference surface of the wiring board to the back surface of the semiconductor chip is different in the mounting structure of the adjacent semiconductor chips, and the second semiconductor chip is temporarily mounted next to the first semiconductor chip which is already temporarily fixed or connected. When attempting to stop or connect, the height from the reference surface of the wiring board to the back surface of the first semiconductor chip is lower than the height from the reference surface of the wiring board to the back surface of the second semiconductor chip. , First
The tool for connecting the second semiconductor chip does not come into contact with the back surface of the semiconductor chip. Therefore, it is possible to reduce the distance between adjacent semiconductor chips without changing the tool, and as a result, it is possible to improve the mounting density and electrical characteristics with high reliability.

【0049】さらに、第1の半導体チップの裏面までの
高さが、第2の半導体チップの素子面までの高さよりも
低くした場合は、さらによい効果が得られる。
Further, when the height to the back surface of the first semiconductor chip is set lower than the height to the element surface of the second semiconductor chip, a better effect can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】第1の実施例での主要工程断面図である。FIG. 1 is a cross-sectional view of main steps in a first embodiment.

【図2】第2の実施例での主要工程断面図である。FIG. 2 is a cross-sectional view of main steps in a second embodiment.

【図3】第3の実施例での主要工程断面図である。FIG. 3 is a sectional view of a main process in the third embodiment.

【図4】第4の実施例での主要工程断面図である。FIG. 4 is a sectional view of a main process in the fourth embodiment.

【図5】第5の実施例での半導体装置の断面図である。FIG. 5 is a sectional view of a semiconductor device according to a fifth embodiment.

【図6】第6の実施例での半導体装置の断面図(a)及
び平面図(b)である。
FIG. 6 is a sectional view (a) and a plan view (b) of a semiconductor device according to a sixth embodiment.

【図7】従来技術の問題点を説明するための図である。FIG. 7 is a diagram for explaining a problem of the conventional technique.

【図8】他の従来技術の問題点を説明するための図であ
る。
FIG. 8 is a diagram for explaining a problem of another conventional technique.

【符号の説明】[Explanation of symbols]

1 第1の半導体チップ 1s 第1の半導体チップの半導体基板 1r 第1の半導体チップの裏面 1f 第1の半導体チップの素子面 1e 第1の半導体チップのチップ電極 1a 第1の半導体チップの接続構造体 2 第2の半導体チップ 2s 第2の半導体チップの半導体基板 2r 第2の半導体チップの裏面 2f 第2の半導体チップの素子面 2e 第2の半導体チップのチップ電極 2a 第2の半導体チップの接続構造体 3 配線基板 3a 配線基板の基準面 3h 配線基板の基準面よりも高い部分 3l 配線基板の基準面よりも低い部分 3w 配線基板の配線 3e 配線基板の基板電極 4 ツール 5 第3の半導体チップ 5s 第3の半導体チップの半導体基板 5r 第3の半導体チップの裏面 H 配線基板の基準面から半導体チップの裏面までの
高さ h 配線基板の基準面から半導体チップの素子面まで
の高さ D 半導体チップの半導体基板の厚さ d 半導体チップの接続構造体の接続後の厚さ
1 1st semiconductor chip 1s 1st semiconductor chip semiconductor substrate 1r 1st semiconductor chip back surface 1f 1st semiconductor chip element surface 1e 1st semiconductor chip chip electrode 1a 1st semiconductor chip connection structure Body 2 Second semiconductor chip 2s Semiconductor substrate of second semiconductor chip 2r Back surface of second semiconductor chip 2f Element surface of second semiconductor chip 2e Chip electrode of second semiconductor chip 2a Connection of second semiconductor chip Structure 3 Wiring board 3a Wiring board reference surface 3h Wiring board higher than reference surface 3l Wiring board lower than reference surface 3w Wiring board wiring 3e Wiring board substrate electrode 4 Tool 5 Third semiconductor chip 5s Semiconductor substrate of third semiconductor chip 5r Back surface of third semiconductor chip H Height from reference surface of wiring board to back surface of semiconductor chip Thickness after connection of the connecting structure of thickness d semiconductor chip height D semiconductor chip of the semiconductor substrate from the reference plane of the h wiring substrate to the element surface of the semiconductor chip

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 配線基板に複数の半導体チップをフェー
スダウン方式で接続する半導体装置の実装構造におい
て、 上記配線基板の基準面から第1の半導体チップの裏面ま
での高さよりも上記配線基板の基準面から第2の半導体
チップの裏面までの高さが高く、かつ上記配線基板の基
準面から第1の半導体チップの主面までの高さよりも上
記配線基板の基準面から第2の半導体チップの主面まで
の高さが高く上記配線基板上に接続されたことを特徴と
する半導体装置の実装構造。
1. In a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board by a face-down method, a reference of the wiring board is higher than a height from a reference surface of the wiring board to a back surface of the first semiconductor chip. The height from the surface to the back surface of the second semiconductor chip is high, and the height from the reference surface of the wiring board to the second semiconductor chip is higher than the height from the reference surface of the wiring board to the main surface of the first semiconductor chip. A mounting structure of a semiconductor device, characterized in that it has a high height to a main surface and is connected to the wiring board.
【請求項2】 配線基板に複数の半導体チップをフェー
スダウン方式で接続する半導体装置の実装構造におい
て、 上記配線基板の基準面から第1の半導体チップの裏面ま
での高さよりも上記配線基板の基準面から第2の半導体
チップの主面までの高さが高く、上記配線基板上に接続
されたことを特徴とする半導体装置の実装構造。
2. In a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down method, a reference of the wiring board is higher than a height from a reference surface of the wiring board to a back surface of the first semiconductor chip. A mounting structure of a semiconductor device, characterized in that the height from the surface to the main surface of the second semiconductor chip is high and is connected to the wiring board.
【請求項3】配線基板に複数の半導体チップをフェース
ダウン方式で接続する半導体装置の実装構造において、 上記配線基板の基準面から第1の半導体チップの裏面ま
での高さよりも上記配線基板の基準面から第2の半導体
チップの主面までの高さが高く、かつ第1の半導体チッ
プの一部上に第2の半導体チップ一部が重なり合うよう
に上記配線基板上に接続されたことを特徴とする半導体
装置の実装構造。
3. In a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down method, a reference of the wiring board is higher than a height from a reference surface of the wiring board to a back surface of the first semiconductor chip. The height from the surface to the main surface of the second semiconductor chip is high, and the second semiconductor chip is partially connected to the wiring board so that the second semiconductor chip partially overlaps the first semiconductor chip. And a semiconductor device mounting structure.
【請求項4】 請求項1,2、または3に記載の半導体
装置の実装方法において、 第1の半導体チップを配線基板に接続した後、第2の半
導体チップを上記配線基板に接続することを特徴とする
半導体装置の実装方法。
4. The method of mounting a semiconductor device according to claim 1, 2, or 3, wherein the first semiconductor chip is connected to a wiring board, and then the second semiconductor chip is connected to the wiring board. A characteristic method of mounting a semiconductor device.
JP5293127A 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof Expired - Fee Related JP2863426B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5293127A JP2863426B2 (en) 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5293127A JP2863426B2 (en) 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof

Publications (2)

Publication Number Publication Date
JPH07147298A true JPH07147298A (en) 1995-06-06
JP2863426B2 JP2863426B2 (en) 1999-03-03

Family

ID=17790773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5293127A Expired - Fee Related JP2863426B2 (en) 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof

Country Status (1)

Country Link
JP (1) JP2863426B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11195860A (en) * 1997-12-27 1999-07-21 Canon Inc Bonding member, multichip module with the bonding member and bonding method using the bonding member
JP2006245994A (en) * 2005-03-03 2006-09-14 Seiko Epson Corp Package structure for surface acoustic wave device, and surface acoustic wave device
JP2017050408A (en) * 2015-09-02 2017-03-09 株式会社ディスコ Manufacturing method for laminate wafer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11195860A (en) * 1997-12-27 1999-07-21 Canon Inc Bonding member, multichip module with the bonding member and bonding method using the bonding member
JP2006245994A (en) * 2005-03-03 2006-09-14 Seiko Epson Corp Package structure for surface acoustic wave device, and surface acoustic wave device
US7436105B2 (en) 2005-03-03 2008-10-14 Seiko Epson Corporation Package structure for surface acoustic wave device, and surface acoustic wave device
JP4554398B2 (en) * 2005-03-03 2010-09-29 セイコーエプソン株式会社 Surface acoustic wave device and method for manufacturing surface acoustic wave device
JP2017050408A (en) * 2015-09-02 2017-03-09 株式会社ディスコ Manufacturing method for laminate wafer

Also Published As

Publication number Publication date
JP2863426B2 (en) 1999-03-03

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