JP2863426B2 - Semiconductor device mounting structure and mounting method thereof - Google Patents

Semiconductor device mounting structure and mounting method thereof

Info

Publication number
JP2863426B2
JP2863426B2 JP5293127A JP29312793A JP2863426B2 JP 2863426 B2 JP2863426 B2 JP 2863426B2 JP 5293127 A JP5293127 A JP 5293127A JP 29312793 A JP29312793 A JP 29312793A JP 2863426 B2 JP2863426 B2 JP 2863426B2
Authority
JP
Japan
Prior art keywords
semiconductor chip
wiring board
semiconductor
chip
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5293127A
Other languages
Japanese (ja)
Other versions
JPH07147298A (en
Inventor
典子 柿本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Consejo Superior de Investigaciones Cientificas CSIC
Original Assignee
Consejo Superior de Investigaciones Cientificas CSIC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consejo Superior de Investigaciones Cientificas CSIC filed Critical Consejo Superior de Investigaciones Cientificas CSIC
Priority to JP5293127A priority Critical patent/JP2863426B2/en
Publication of JPH07147298A publication Critical patent/JPH07147298A/en
Application granted granted Critical
Publication of JP2863426B2 publication Critical patent/JP2863426B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は半導体装置の実装構造に
関し、配線基板に複数の半導体チップをフェースダウン
方式で接続する半導体装置の実装構造及びその実装方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure of a semiconductor device, and more particularly to a mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner and a mounting method thereof.

【0002】[0002]

【従来の技術】配線基板に半導チップをフェースダウン
方式で接続する半導体装置の実装方法として、半導体チ
ップのチップ電極にメッキ、ボールボンドなどにより形
成したバンプを介して接続する方法、半導体チップと配
線基板の間に異方性導電性フィルムを挟んで半導体チッ
プを押圧して接続する方法、チップ電極または基板電極
に導電性粒子を配置し半導体チップを押圧して接続する
方法などがある。これらの方法はいずれも、半導体チッ
プを半導体基板に仮止めする際、または、半導体チップ
を配線基板に接続する際などに、半導体チップの裏面か
らツ−ルを当てることになる。
2. Description of the Related Art As a method of mounting a semiconductor device in which a semiconductor chip is connected to a wiring board in a face-down manner, a method of connecting to a chip electrode of the semiconductor chip via a bump formed by plating, ball bonding, or the like, There are a method of pressing and connecting a semiconductor chip with an anisotropic conductive film interposed between wiring substrates, a method of arranging conductive particles on a chip electrode or a substrate electrode, and pressing and connecting a semiconductor chip. In any of these methods, a tool is applied from the back surface of the semiconductor chip when the semiconductor chip is temporarily fixed to the semiconductor substrate or when the semiconductor chip is connected to the wiring substrate.

【0003】また、複数の半導体チップを実装する際、
これまでの技術では、半導体チップの半導体基板の厚
さ、半導体チップのチップ電極と配線基板の基板電極と
を接続する接続構造体、半導体チップを接続する配線基
板を特に変えることもなく、配線基板の基準面から半導
体チップの裏面までの接続後の高さは同一となってい
た。
When mounting a plurality of semiconductor chips,
In the conventional technologies, the thickness of the semiconductor substrate of the semiconductor chip, the connection structure for connecting the chip electrode of the semiconductor chip to the substrate electrode of the wiring substrate, and the wiring substrate for connecting the semiconductor chip are not changed. The height after connection from the reference surface to the back surface of the semiconductor chip was the same.

【0004】[0004]

【発明が解決しようとする課題】近年、複数の半導体チ
ップを高密度に実装すべく、また、電気特性上から、隣
接する半導体チップとの間隔を小さくしたいという要求
が非常に高まってきている。
In recent years, there has been an increasing demand for mounting a plurality of semiconductor chips at a high density and for reducing the distance between adjacent semiconductor chips in view of electrical characteristics.

【0005】ところが、これまでのように、配線基板の
基準面から半導体チップの裏面までの接続後の高さが同
一の場合、既に仮止めまたは接続された第1の半導体チ
ップの隣の第2の半導体チップを仮止めまたは接続しよ
うとする際、以下のような問題が生じる。
However, when the height after connection from the reference surface of the wiring board to the back surface of the semiconductor chip is the same as before, the second semiconductor chip adjacent to the first temporarily connected or connected first semiconductor chip is used. When the semiconductor chip is temporarily fixed or connected, the following problem occurs.

【0006】図7(a)に示すように、ツール4が第
1の半導体チップ1の裏面1rにも接し、通常発生する
若干のブレなどにより、第1の半導体チップ1が位置ず
れする。
As shown in FIG. 7A, the tool 4 is also in contact with the back surface 1r of the first semiconductor chip 1, and the first semiconductor chip 1 is displaced due to a slight blur or the like which normally occurs.

【0007】図7(b)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接し、通常発生する
若干のブレなどにより、第1の半導体チップ1が傾く。
As shown in FIG. 7B, the tool 4 is also in contact with the back surface 1r of the first semiconductor chip 1, and the first semiconductor chip 1 is tilted due to a slight blur or the like that normally occurs.

【0008】図7(c)に示すように、ツール4が第
1の半導体チップ1の裏面1rにも接し、通常発生する
若干のブレなどにより、第1の半導体チップ1にクラッ
ク、チッピングなどの破損が発生する。
As shown in FIG. 7C, the tool 4 is also in contact with the back surface 1r of the first semiconductor chip 1, and the first semiconductor chip 1 has cracks, chipping, etc. Damage occurs.

【0009】図7(d)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接するため、ツ−ル
4からの熱、荷重、超音波などが、第1の半導体チップ
1にもかかって、第2の半導体チップ2へ熱、荷重、超
音波などが十分かからず、第2の半導体チップ2の接続
が不十分になる。
As shown in FIG. 7D, since the tool 4 is also in contact with the back surface 1r of the first semiconductor chip 1, heat, load, ultrasonic waves, and the like from the tool 4 are applied to the first semiconductor chip 1. Heat, load, ultrasonic waves, and the like are not sufficiently applied to the second semiconductor chip 2, and the connection of the second semiconductor chip 2 is insufficient.

【0010】図7(e)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接するため、ツ−ル
4からの熱、荷重、超音波などが、第1の半導体チップ
1にもかかって、例えば、AuとSnなどを用いた接続
の場合、第1の半導体チップ1へかかった熱などにより
金属拡散が進み過ぎ、第1の半導体チップ1の接続が悪
化する。
As shown in FIG. 7 (e), since the tool 4 is also in contact with the back surface 1r of the first semiconductor chip 1, heat, load, ultrasonic waves, etc. from the tool 4 are applied to the first semiconductor chip 1. In the case of connection using, for example, Au and Sn, which also affects the semiconductor chip 1, metal diffusion excessively proceeds due to heat applied to the first semiconductor chip 1, and the connection of the first semiconductor chip 1 is deteriorated. .

【0011】図7(f)に示すように、ツ−ル4が第
1の半導体チップ1の裏面1rにも接するため、ツ−ル
4からの熱、荷重、超音波などが、第1の半導体チップ
1にもかかって、例えば、熱に弱い材料構成の素子1x
などが、第1の半導体チップ1を接続するための熱では
影響を受けなかったものが、第2の半導体チップ2の接
続の際の熱が更にかかったために、第1の半導体チップ
1の素子1xの電気特性が悪化する。
As shown in FIG. 7F, since the tool 4 is also in contact with the back surface 1r of the first semiconductor chip 1, heat, load, ultrasonic waves, etc. from the tool 4 are transmitted to the first semiconductor chip 1. For example, an element 1x having a material configuration weak to heat is applied to the semiconductor chip 1.
And the like, which were not affected by the heat for connecting the first semiconductor chip 1, but were further affected by the heat for connecting the second semiconductor chip 2. 1x electrical characteristics deteriorate.

【0012】このため、ツ−ルの押圧面を半導体チップ
と同サイズにする方法も一部試みられているが、半導体
チップの様々なサイズにあわせてツ−ルを作製する必要
がありコストアップを招き、また、半導体チップ毎にツ
−ルを交換しなければならないので作業工程が増えてラ
ンニングコストの増加につながる。また、半導体チップ
のサイズがある程度以上小さくなると、吸着穴、ヒータ
ー、荷重センサーなどをツ−ルに設けることができず、
そうしたツ−ル作製は不可能となる。加えて、ツ−ルの
押圧面が半導体チップと同じサイズの場合、ツ−ルと半
導体チップを十分にアライメントしなければ、図8に示
すように、通常発生する若干のブレなどにより、半導体
チップにクラック・チッピングなどの破損が発生する。
これは、ツ−ルの押圧面のサイズが半導体チップよりも
小さい場合も同様となる。このように、半導体チップと
の間隔を小さくしたいという要求に応えることは難しか
った。
For this reason, some attempts have been made to make the pressing surface of the tool the same size as the semiconductor chip. However, it is necessary to manufacture the tool according to various sizes of the semiconductor chip, and the cost increases. In addition, since the tool must be replaced for each semiconductor chip, the number of work steps increases, leading to an increase in running cost. Also, if the size of the semiconductor chip is reduced to a certain extent or more, suction holes, heaters, load sensors, etc. cannot be provided on the tool,
Such a tool cannot be produced. In addition, when the pressing surface of the tool has the same size as the semiconductor chip, if the tool and the semiconductor chip are not sufficiently aligned, as shown in FIG. Damage such as cracking and chipping occurs.
The same applies to the case where the size of the pressing surface of the tool is smaller than that of the semiconductor chip. Thus, it has been difficult to meet the demand for reducing the distance between the semiconductor chip and the semiconductor chip.

【0013】[0013]

【課題を解決するための手段】請求項1に記載の本発明
は、配線基板に複数の半導体チップをフェースダウン方
式で接続する半導体装置の実装構造において、上記配線
基板の基準面から第1の半導体チップの裏面までの高さ
よりも上記配線基板の基準面から第2の半導体チップの
裏面までの高さが高く、かつ上記配線基板の基準面から
第1の半導体チップの主面までの高さよりも上記配線基
板の基準面から第2の半導体チップの主面までの高さが
高く上記配線基板上に接続されたことを特徴とする。
According to a first aspect of the present invention, there is provided a semiconductor device mounting structure in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner. The height from the reference surface of the wiring board to the back surface of the second semiconductor chip is higher than the height to the back surface of the semiconductor chip, and the height from the reference surface of the wiring board to the main surface of the first semiconductor chip is higher than the height from the reference surface of the second semiconductor chip. Also, the height from the reference surface of the wiring board to the main surface of the second semiconductor chip is high, and the semiconductor chip is connected to the wiring board.

【0014】請求項2に記載の本発明は、配線基板に複
数の半導体チップをフェースダウン方式で接続する半導
体装置の実装構造において、上記配線基板の基準面から
第1の半導体チップの裏面までの高さよりも上記配線基
板の基準面から第2の半導体チップの主面までの高さが
高く、上記配線基板上に接続されたことを特徴とする。
According to a second aspect of the present invention, there is provided a semiconductor device mounting structure in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner, from a reference surface of the wiring board to a back surface of the first semiconductor chip. The height from the reference surface of the wiring substrate to the main surface of the second semiconductor chip is higher than the height, and the semiconductor device is connected to the wiring substrate.

【0015】請求項3に記載の本発明は、配線基板に複
数の半導体チップをフェースダウン方式で接続する半導
体装置の実装構造において、上記配線基板の基準面から
第1の半導体チップの裏面までの高さよりも上記配線基
板の基準面から第2の半導体チップの主面までの高さが
高く、かつ第1の半導体チップの一部上に第2の半導体
チップ一部が重なり合うように上記配線基板上に接続さ
れたことを特徴とする。
According to a third aspect of the present invention, there is provided a semiconductor device mounting structure in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner, from a reference surface of the wiring board to a back surface of the first semiconductor chip. The wiring board has a height from the reference surface of the wiring board to the main surface of the second semiconductor chip higher than the height, and the second semiconductor chip partially overlaps the first semiconductor chip. It is characterized by being connected above.

【0016】請求項4に記載の本発明は、請求項1,
2、または3に記載の半導体装置の実装方法において、
第1の半導体チップを配線基板に接続した後、第2の半
導体チップを上記配線基板に接続することを特徴とす
る。
The present invention described in claim 4 is based on claim 1,
2. The method for mounting a semiconductor device according to item 2 or 3,
After the first semiconductor chip is connected to the wiring board, the second semiconductor chip is connected to the wiring board.

【0017】[0017]

【作用】本発明によれば、既に仮止めあるいは接続され
た第1の半導体チップの隣に第2の半導体チップを仮止
めまたは接続しようとする際、配線基板の基準面から第
1の半導体チップの裏面までの高さは、配線基板の基準
面から第2の半導体チップの裏面までの高さよりも低い
ため、第1の半導体チップの裏面には第2の半導体チッ
プを接続するためのツ−ルが接することはない。
According to the present invention, when an attempt is made to temporarily fix or connect a second semiconductor chip next to a first semiconductor chip that has already been temporarily fixed or connected, the first semiconductor chip is moved from the reference surface of the wiring board to the first semiconductor chip. Is lower than the height from the reference surface of the wiring substrate to the back surface of the second semiconductor chip, so that the tool for connecting the second semiconductor chip is connected to the back surface of the first semiconductor chip. Do not touch.

【0018】[0018]

【実施例】以下に、本発明の実施例を図面を参照しなが
ら説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0019】第1の実施例 図1(a)〜(e)に、本発明の第1の実施例の主要工
程断面図を示す。ここでは、チップ電極にバンプを形成
した複数の半導体チップを配線基板に実装する場合を示
している。
First Embodiment FIGS. 1 (a) to 1 (e) are cross-sectional views showing main steps of a first embodiment of the present invention. Here, a case is shown in which a plurality of semiconductor chips having bumps formed on chip electrodes are mounted on a wiring board.

【0020】まず、配線3w、電極3eなどを形成した
配線基板3を用意する(図1(a))。ここでは、配線
3w、電極3eを形成したAIN基板3を用いたが、P
WB、ガラス基板、などいずれを用いてもよい。
First, a wiring board 3 on which wirings 3w, electrodes 3e, etc. are formed is prepared (FIG. 1A). Here, the AIN substrate 3 on which the wiring 3w and the electrode 3e are formed is used.
Any of WB, glass substrate, and the like may be used.

【0021】次に、半導体基板1sの厚さを後述する第
2の半導体チップ2の半導体基板2sの厚さよりも薄く
した、第1の半導体チップ1を用意し、第1の半導体チ
ップ1のチップ電極1eと配線基板3の対応する基板電
極3eとを位置合わせする(図1(b))。ここでは、
GaAs半導体基板1sを用い、チップ電極1eにAu
バンプ1aを形成した半導体チップ1を用いたが、シリ
コンなどにハンダパンプ、Cuボールバンプなどを形成
したものを用いてもよい。
Next, a first semiconductor chip 1 in which the thickness of the semiconductor substrate 1s is made smaller than the thickness of the semiconductor substrate 2s of the second semiconductor chip 2 described later is prepared, and the chip of the first semiconductor chip 1 is prepared. The electrode 1e and the corresponding substrate electrode 3e of the wiring board 3 are aligned (FIG. 1B). here,
Au is used for the chip electrode 1e using a GaAs semiconductor substrate 1s.
Although the semiconductor chip 1 on which the bumps 1a are formed is used, a semiconductor chip having solder bumps, Cu ball bumps, or the like formed on silicon or the like may be used.

【0022】次に、第1の半導体チップ1を配線基板3
に接続する(図1(c))。ここでは、ツ−ル4を用い
て加熱しながら荷重をかけて接続したが、さらに、超音
波などをかけてもよい。
Next, the first semiconductor chip 1 is connected to the wiring board 3
(FIG. 1 (c)). Here, the connection is performed by applying a load while heating using the tool 4, but an ultrasonic wave or the like may be further applied.

【0023】次に、半導体基板2sの厚さを第1の半導
体チップ1の半導体基板1sの厚さよりも厚くした、第
2の半導体チップ2を用意し、第2の半導体チップ2の
チップ電極2eと配線基板3の対応する基板電極3eと
を位置合わせする(図1(d))。
Next, a second semiconductor chip 2 is prepared in which the thickness of the semiconductor substrate 2s is larger than the thickness of the semiconductor substrate 1s of the first semiconductor chip 1, and the chip electrodes 2e of the second semiconductor chip 2 are prepared. And the corresponding substrate electrode 3e of the wiring substrate 3 are aligned (FIG. 1D).

【0024】最後に、第2の半導体チップ2を配線基板
3に接続する(図1(e))。ここでは、図1(c)と
同様にして接続した。このとき、配線基板3の基準面3
aから第2の半導体チップ2の裏面2rまでの高さH2
は、配線基板3の基準面3aから第1の半導体チップ1
の裏面1rまでの高さH1よりも高いため、第2の半導
体チップ2を押圧するツ−ル4の押圧面が第2の半導体
チップ2よりはみ出した状態でも、ツ−ル4が第1の半
導体チップ1に当たることはない。
Finally, the second semiconductor chip 2 is connected to the wiring board 3 (FIG. 1E). Here, the connection was made in the same manner as in FIG. At this time, the reference surface 3 of the wiring board 3
a to the back surface 2r of the second semiconductor chip 2
Is the first semiconductor chip 1 from the reference surface 3a of the wiring board 3.
Is higher than the height H1 up to the back surface 1r of the first semiconductor chip 2, even if the pressing surface of the tool 4 that presses the second semiconductor chip 2 protrudes from the second semiconductor chip 2, the tool 4 remains in the first position. Does not hit the semiconductor chip 1.

【0025】第2の実施例 図2(a)〜(e)に、本発明の第2の実施例の主要工
程断面図を示す。ここでは、半導体チップのチップ電極
と配線基板の基板電極とを接続する接続構造体として、
チップ電極に導電性粒子を配置した半導体チップと、異
方性導電性フィルムを介して配線基板と接続する半導体
チップとを、配線基板に実装する場合を示している。
Second Embodiment FIGS. 2A to 2E are cross-sectional views showing main steps of a second embodiment of the present invention. Here, as a connection structure for connecting the chip electrode of the semiconductor chip and the substrate electrode of the wiring board,
A case is shown in which a semiconductor chip in which conductive particles are arranged on chip electrodes and a semiconductor chip connected to a wiring board via an anisotropic conductive film are mounted on a wiring board.

【0026】まず、配線3w、電極3eなどを形成した
配線基板3を用意する(図2(a))。ここでは、配線
3w、電極3eを形成したガラス基板3を用いたが、P
WB、セラミック基板、などいずれを用いてもよい。
First, a wiring board 3 on which wirings 3w, electrodes 3e, etc. are formed is prepared (FIG. 2A). Here, the glass substrate 3 on which the wiring 3w and the electrode 3e are formed is used.
Any of WB, ceramic substrate, and the like may be used.

【0027】次に、チップ電極1eに小径の導電性粒子
1aを配置した第1の半導体チップ1を用意し、第1の
半導体チップ1のチップ電極1eと配線基板3の対応す
る基板電極3eとを位置合わせする(図2(b))。こ
こでは、シリコン半導体基板1sを用い、チップ電極1
eへ樹脂にAuコーティングした導電性粒子1aを配置
した半導体チップ1を用いた。なお、導電性粒子の配置
方法は、電極を形成したシリコンウェハに感光性樹脂を
塗布し、電極部以外の樹脂をUV照射して硬化し、導電
性粒子を散布後、洗浄などを行うと、硬化していない電
極部のみが粘着性を有しているため、電極部のみ導電性
粒子が付着してそれ以外の部分には導電性粒子が付着し
ていない状態となり、その後、電極部の感光性樹脂もU
V照射により硬化する、という方法である。
Next, a first semiconductor chip 1 in which small-diameter conductive particles 1a are arranged on the chip electrode 1e is prepared, and the chip electrode 1e of the first semiconductor chip 1 and the corresponding substrate electrode 3e of the wiring board 3 are connected. Are aligned (FIG. 2B). Here, a silicon semiconductor substrate 1s is used, and a chip electrode 1
e, a semiconductor chip 1 having conductive particles 1a obtained by coating a resin with Au was used. The method of arranging the conductive particles is to apply a photosensitive resin to the silicon wafer on which the electrodes are formed, to cure the resin other than the electrode portions by UV irradiation, to scatter the conductive particles, and to perform washing, etc. Since only the uncured electrode portion has tackiness, only the electrode portion has conductive particles attached thereto, and the other portions have no conductive particles attached thereto. Resin is also U
It is a method of curing by V irradiation.

【0028】次に、第1の半導体チップ1を配線基板3
に接続する(図2(c))。ここでは、半導体チップ1
または配線基板3に感光性樹脂1a’を適量滴下し、ツ
−ル4で半導体チップ1を配線基板3に押圧しながらU
V照射を行っている。なお、ここで配線基板3はUV光
を透過するものを用いている。
Next, the first semiconductor chip 1 is connected to the wiring board 3
(FIG. 2 (c)). Here, the semiconductor chip 1
Alternatively, an appropriate amount of the photosensitive resin 1a 'is dropped on the wiring board 3, and the tool 4 is pressed while pressing the semiconductor chip 1 against the wiring board 3 with the tool 4.
V irradiation is performed. Here, the wiring substrate 3 used is one that transmits UV light.

【0029】次に、第2の半導体チップ2を用意し、第
2の半導体チップ2のチップ電極2eと配線基板3の対
応する基板電極3eとを位置合わせする(図2
(d))。
Next, a second semiconductor chip 2 is prepared, and the chip electrodes 2e of the second semiconductor chip 2 are aligned with the corresponding substrate electrodes 3e of the wiring board 3 (FIG. 2).
(D)).

【0030】最後に、第2の半導体チップ2を配線基板
3に接続する(図2(e))。ここでは、第2のの半導
体チップ2と配線基板3との間に接続構造体2aと樹脂
2a’とからなる異方性導電性フィルム2a”を介して
ツ−ル4で荷重を加えて接続を行った。このとき、第1
の半導体チップ1の接続構造体として用いた導電性粒子
1aの接続後の、基板水平面に対して垂直方向の直径d
1は、第2の半導体チップ2の接続構造体として用いた
異方性導電性フィルム2a”の接続後の厚さd2よりも
小さく、配線基板3の基準面3aから第1の半導体チッ
プ1の素子面1fまでの間隔h1は配線基板3の基準面
3aから第2の半導体チップ2の素子面2fまでの間隔
2より小さい。すなわち、配線基板3の基準面3aか
ら第2の半導体チップ2の裏面2rまでの高さH2は、
配線基板3の基準面3aから第1の半導体チップ1の裏
面1rまでの高さH1よりも高くなり、第2の半導体チ
ップ2を押圧するツ−ル4の押圧面が第2の半導体チッ
プ2よりはみ出した状態でも、ツ−ル4が第1の半導体
チップ1に当たることはない。
Finally, the second semiconductor chip 2 is connected to the wiring board 3 (FIG. 2E). Here, a load is applied by a tool 4 between the second semiconductor chip 2 and the wiring board 3 via an anisotropic conductive film 2a ″ composed of a connection structure 2a and a resin 2a ′. At this time, the first
Diameter d in the direction perpendicular to the horizontal plane of the substrate after connection of the conductive particles 1a used as the connection structure of the semiconductor chip 1 of FIG.
1 is smaller than the thickness d 2 of the anisotropic conductive film 2a ″ used as the connection structure of the second semiconductor chip 2 after connection, and is smaller than the reference surface 3a of the wiring board 3 by the first semiconductor chip 1 distance h 1 to the element surface 1f of smaller spacing h 2 from the reference surface 3a of the wiring board 3 to the second element surface 2f of the semiconductor chip 2. That is, the second semiconductor from the reference surface 3a of the wiring board 3 The height H 2 up to the back surface 2r of the chip 2 is
From the reference surface 3a of the wiring board 3 becomes higher than the height H 1 to the first back 1r of the semiconductor chip 1, tool presses the second semiconductor chip 2 - pressing surface of the Le 4 a second semiconductor chip The tool 4 does not hit the first semiconductor chip 1 even if it extends beyond the second semiconductor chip 1.

【0031】なお、上述の実施例では、半導体チップの
チップ電極と配線基板の基板電極とを接続する接続構造
体として、第1のチップと第2のチップとに異なるもの
を使用したが、同種の接続構造体を使用して、その接続
構造体の大きさ、厚みなどを変えるという方法を用いて
もよいし、あるいは、同種同サイズの接続構造体を使用
して、一方は高荷重などによりかなり押し潰し、もう一
方は低荷重などにより弱めに押し潰すという接続条件を
変える方法を用いてもよい。
In the above embodiment, different connection structures for connecting the chip electrodes of the semiconductor chip and the substrate electrodes of the wiring board are used for the first chip and the second chip. May be used to change the size, thickness, etc. of the connection structure, or use a connection structure of the same type and size, one of which is subjected to a high load or the like. It is also possible to use a method of changing connection conditions in which the connection condition is considerably crushed and the other is crushed weakly by a low load or the like.

【0032】第3の実施例 図3(a)〜(f)に、本発明の第3の実施例の主要工
程断面図を示す。ここでは、チップ電極にバンプを形成
した複数の半導体チップを配線基板に実装する場合を示
している。
Third Embodiment FIGS. 3 (a) to 3 (f) are cross-sectional views showing main steps of a third embodiment of the present invention. Here, a case is shown in which a plurality of semiconductor chips having bumps formed on chip electrodes are mounted on a wiring board.

【0033】まず、第2の半導体チップ2を接続する配
線基板3のエリア3hを配線基板3の基準面3aよりも
高くし、配線3w、電極3eなどを形成した配線基板3
を用意する(図3(a))。ここでは、第2の半導体チ
ップ2を接続する配線基板3のエリア3hに絶縁性樹脂
3xを塗布、硬化し、配線基板3の基準面3aよりも高
くして、配線3w、電極3eを形成したPWB3を用い
たが、該エリアはペーストを厚くして同時焼成したセラ
ミック基板、ガラス基板、などいずれを用いてもよい。
First, the area 3h of the wiring board 3 to which the second semiconductor chip 2 is connected is made higher than the reference surface 3a of the wiring board 3, and the wiring board 3 on which the wiring 3w, the electrodes 3e and the like are formed.
Is prepared (FIG. 3A). Here, the insulating resin 3x is applied to the area 3h of the wiring board 3 to which the second semiconductor chip 2 is connected, cured, and made higher than the reference surface 3a of the wiring board 3 to form the wiring 3w and the electrode 3e. Although PWB3 was used, the area may be any of a ceramic substrate, a glass substrate, and the like, which are made by thickening the paste and co-firing.

【0034】次に、第1の半導体チップ1を用意し、第
1の半導体チップ1のチップ電極1eと配線基板3対応
する基板電極3eとを位置合わせする(図3(b))。
ここでは、シリコン半導体基板1sを用い、チップ電極
1eにハンダバンプ1aを形成した半導体チップ1を用
いている。
Next, the first semiconductor chip 1 is prepared, and the chip electrodes 1e of the first semiconductor chip 1 are aligned with the substrate electrodes 3e corresponding to the wiring board 3 (FIG. 3B).
Here, a semiconductor chip 1 in which a solder bump 1a is formed on a chip electrode 1e using a silicon semiconductor substrate 1s is used.

【0035】次に、第1の半導体チップ1を配線基板3
に仮止めする(図3(c))。ここでは、ツール4で半
導体チップ1を配線基板3に軽く押圧して仮止めしてい
る。
Next, the first semiconductor chip 1 is connected to the wiring board 3
(FIG. 3 (c)). Here, the semiconductor chip 1 is lightly pressed against the wiring board 3 by the tool 4 and temporarily fixed.

【0036】次に、第1の半導体チップと略同じ厚さの
第2の半導体チップ2を用意し、第2の半導体チップ2
のチップ電極2eと配線基板3の対応する基板電極3e
とを位置合わせする(図3(d))。
Next, a second semiconductor chip 2 having substantially the same thickness as that of the first semiconductor chip is prepared.
Chip electrode 2e and corresponding substrate electrode 3e of wiring substrate 3
Are aligned (FIG. 3D).

【0037】次に、第2の半導体チップ2を配線基板3
に仮止めする(図3(e))。ここでは、図3(c)と
同様にして仮止めした。このとき、第2の半導体チップ
2を接続する配線基板3のエリア3hは配線基板3の基
準面3aよりも高く、したがって、配線基板3の基準面
3aから第2の半導体チップ2の裏面2rまでの高さH
2は、配線基板3の基準面3aから第1の半導体チップ
1の裏面1rまでの高さH1よりも高いため、第2の半
導体チップ2を押圧するツール4の押圧面が第2の半導
体チップ2よりはみ出した状態でも、ツール4が第1の
半導体チップ1に当たることはない。最後に配線基板3
をリフローして、半導体チップとの接続を行う(図3
(f))。
Next, the second semiconductor chip 2 is connected to the wiring board 3
(FIG. 3 (e)). Here, temporary fixing was performed in the same manner as in FIG. At this time, the area 3h of the wiring board 3 to which the second semiconductor chip 2 is connected is higher than the reference surface 3a of the wiring board 3, and therefore, from the reference surface 3a of the wiring board 3 to the back surface 2r of the second semiconductor chip 2. Height H
2 is higher than the height H 1 from the reference surface 3a of the wiring board 3 to the first back 1r of the semiconductor chip 1, the pressing surface of the tool 4 that presses the second semiconductor chip 2 is the second semiconductor The tool 4 does not hit the first semiconductor chip 1 even if the tool 4 protrudes from the chip 2. Finally, the wiring board 3
Is reflowed to connect with the semiconductor chip (FIG. 3
(F)).

【0038】なお、上述の実施例では、第2の半導体チ
ップを接続する配線基板のエリアを配線基板の基準面よ
りも高くした配線基板を用いたが、反対に、第1の半導
体チップを接続する配線基板のエリアを配線基板の基準
面よりも低くした配線基板を用いてもよい。
In the above-described embodiment, the wiring board in which the area of the wiring board for connecting the second semiconductor chip is higher than the reference plane of the wiring board is used. On the contrary, the connection of the first semiconductor chip is performed. A wiring board in which the area of the wiring board to be formed is lower than the reference plane of the wiring board may be used.

【0039】また、上述の実施例では、接続構造体とし
てハンダバンプを用いており、工程を減らすため、第1
の半導体チップの仮止め、第2の半導体チップの仮止
め、第1および第2の半導体チップのリフローによる一
括接続、という順に工程を経たが、第1の半導体チップ
の仮止めとリフローによる接続、第2の半導体チップの
仮止めとリフローによる接続、という順の工程で行って
もよい。
In the above embodiment, the solder bump is used as the connection structure.
The steps of temporarily fixing the semiconductor chip, temporarily fixing the second semiconductor chip, and collectively connecting the first and second semiconductor chips by reflow, in this order. The steps may be performed in the order of temporary fixing of the second semiconductor chip and connection by reflow.

【0040】第4の実施例 図4(a)〜(c)に、本発明の実施例の主要工程断面
図を示す。上記第1から第3の実施例では、2ケの半導
体チップについて説明しているが、ここでは、更に多く
の半導体チップを用いて実装する場合を示している。ま
た、配線基板の基準面から半導体チップのそれぞれの高
さを様々に変えてもよい。なお、半導体基板の厚さ
1,D2,D3 の間には、D1<D2<D3 の関係があ
り、接続構造体は、略同一の大きさとなるようにしてい
る。
Fourth Embodiment FIGS. 4A to 4C are cross-sectional views showing main steps of an embodiment of the present invention. In the above-described first to third embodiments, two semiconductor chips are described. However, here, a case is shown in which mounting is performed using more semiconductor chips. Further, the height of each of the semiconductor chips from the reference plane of the wiring board may be variously changed. The thicknesses D 1 , D 2 , and D 3 of the semiconductor substrate have a relationship of D 1 <D 2 <D 3 , and the connection structures have substantially the same size.

【0041】まず、半導体基板1sの厚さがD1 の第1
の半導体チップ群1を配線基板3に接続する(図4
(a))。
Firstly, the first thickness of the semiconductor substrate 1s is D 1
4 is connected to the wiring board 3 (FIG. 4).
(A)).

【0042】次に、半導体基板2sの厚さがD1の第2
の半導体チップ群2を配線基板3に接続する(図4
(b))。
Next, the second semiconductor substrate 2s having a thickness of D 1
4 is connected to the wiring board 3 (see FIG. 4).
(B)).

【0043】このとき、D1<D2 の関係があるため、
配線基板3の基準面3aから第1および第2の半導体チ
ップの裏面までの高さは、H1<H2 の関係となり、第
2の半導体チップ2を押圧するツール4は第1の半導体
チップ1に当たることはない。
At this time, since there is a relationship of D 1 <D 2 ,
The height from the reference surface 3a of the wiring board 3 to the back surfaces of the first and second semiconductor chips has a relationship of H 1 <H 2 , and the tool 4 that presses the second semiconductor chip 2 is a first semiconductor chip. There is no one.

【0044】最後に半導体基板5sの厚さがD3の第3
の半導体チップ群5を配線基板3に接続する(図4
(c))。このとき、D1<D2<D3 の関係があるた
め、配線基板3の基準面3aから第1、第2および第3
の半導体チップの裏面までのそれぞれの高さは、H1
2<H3の関係となり、第3の半導体チップ5を押圧す
るツール4は第1の半導体チップ1および第2の半導体
チップ2に当たることはない。
The third of the thickness of the last semiconductor substrate 5s is D 3
4 is connected to the wiring board 3 (FIG. 4).
(C)). At this time, since there is a relationship of D 1 <D 2 <D 3 , the first, second and third positions are shifted from the reference surface 3 a of the wiring board 3.
The height of each of the semiconductor chips up to the back surface is H 1 <
H 2 <H 3 , and the tool 4 pressing the third semiconductor chip 5 does not hit the first semiconductor chip 1 and the second semiconductor chip 2.

【0045】第5の実施例 図5に、本発明の第5の実施例の半導体装置の断面図を
示す。ここで、第1の半導体チップ1は、配線基板3が
基準面3aより凹状に形成された低い部分3l上に実装
され、その裏面1rは、配線基板3に実装された第2の
半導体チップ2の素子面2fより低くなっている。な
お、この時の実装方法は、第1から第4までの実施例に
おいて説明したいづれの方法でも可能である。この場合
は、特に、接続構造体2aが、つぶれても直接、隣接し
た接続構造体1aとショートすることはなく、高密度実
装に適している。
Fifth Embodiment FIG. 5 shows a sectional view of a semiconductor device according to a fifth embodiment of the present invention. Here, the first semiconductor chip 1 is mounted on a lower portion 3l in which the wiring board 3 is formed concavely from the reference surface 3a, and the back surface 1r is mounted on the second semiconductor chip 2 mounted on the wiring board 3. Element surface 2f. The mounting method at this time can be any of the methods described in the first to fourth embodiments. In this case, even if the connection structure 2a is crushed, the connection structure 2a is not directly short-circuited with the adjacent connection structure 1a, which is suitable for high-density mounting.

【0046】第6の実施例 図6に、本発明の第6の実施例の半導体装置の断面図及
び平面図を示す。ここで、第1の半導体チップ1は、配
線基板3の基準面3a上に実装され、第2の半導体チッ
プ2は、配線基板3が基準面3aより凸状に形成された
高い部分3hに実装されている。半導体チップ1の裏面
1rは、半導体チップ2の素子面2fより低く実装さ
れ、かつ、図面から明らかなように、半導体チップが互
いに平面方向から見て重なり合うように実装されてい
る。この場合は特に高密度実装に向いている。
Sixth Embodiment FIG. 6 shows a sectional view and a plan view of a semiconductor device according to a sixth embodiment of the present invention. Here, the first semiconductor chip 1 is mounted on the reference surface 3a of the wiring substrate 3, and the second semiconductor chip 2 is mounted on a higher portion 3h where the wiring substrate 3 is formed more convexly than the reference surface 3a. Have been. The back surface 1r of the semiconductor chip 1 is mounted lower than the element surface 2f of the semiconductor chip 2 and, as is apparent from the drawing, mounted such that the semiconductor chips overlap each other when viewed from the plane. This case is particularly suitable for high-density mounting.

【0047】なお、本発明は、上記実施例に限定される
ものでなく、特許請求の範囲で種々の変更が可能であ
る。
It should be noted that the present invention is not limited to the above embodiment, and various modifications can be made within the scope of the claims.

【0048】[0048]

【発明の効果】以上のように、本発明によれば、配線基
板に半導体チップを仮止めあるいは接続した状態では、
配線基板の基準面から半導体チップの裏面までの高さ
が、隣接する半導体チップでは異なった実装構造であ
り、既に仮止めあるいは接続された第1の半導体チップ
の隣に第2の半導体チップを仮止めまたは接続しようと
する際、配線基板の基準面から第1の半導体チップの裏
面までの高さが、配線基板の基準面から第2の半導体チ
ップの裏面までの高さよりも低くなっているため、第1
の半導体チップの裏面には第2の半導体チップを接続す
るためのツールが接することはない。このため、ツール
を特に変えなくても、隣接する半導体チップとの間隔を
小さくすることができ、その結果、高信頼で、実装密
度、電気的特性などをあげることができる。
As described above, according to the present invention, when the semiconductor chip is temporarily fixed or connected to the wiring board,
The height from the reference surface of the wiring substrate to the back surface of the semiconductor chip is different in the mounting structure of the adjacent semiconductor chip, and the second semiconductor chip is temporarily mounted next to the temporarily fixed or connected first semiconductor chip. When stopping or connecting, the height from the reference surface of the wiring board to the back surface of the first semiconductor chip is lower than the height from the reference surface of the wiring board to the back surface of the second semiconductor chip. , First
The tool for connecting the second semiconductor chip does not come into contact with the back surface of the semiconductor chip. For this reason, the space between adjacent semiconductor chips can be reduced without changing the tool, and as a result, the reliability, the mounting density, the electrical characteristics, and the like can be increased.

【0049】さらに、第1の半導体チップの裏面までの
高さが、第2の半導体チップの素子面までの高さよりも
低くした場合は、さらによい効果が得られる。
Further, when the height to the back surface of the first semiconductor chip is set lower than the height to the element surface of the second semiconductor chip, a better effect can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1の実施例での主要工程断面図である。FIG. 1 is a sectional view of a main process in a first embodiment.

【図2】第2の実施例での主要工程断面図である。FIG. 2 is a sectional view of a main process in a second embodiment.

【図3】第3の実施例での主要工程断面図である。FIG. 3 is a sectional view of a main process in a third embodiment.

【図4】第4の実施例での主要工程断面図である。FIG. 4 is a sectional view of a main process in a fourth embodiment.

【図5】第5の実施例での半導体装置の断面図である。FIG. 5 is a sectional view of a semiconductor device according to a fifth embodiment.

【図6】第6の実施例での半導体装置の断面図(a)及
び平面図(b)である。
FIGS. 6A and 6B are a cross-sectional view and a plan view of a semiconductor device according to a sixth embodiment.

【図7】従来技術の問題点を説明するための図である。FIG. 7 is a diagram for explaining a problem of the related art.

【図8】他の従来技術の問題点を説明するための図であ
る。
FIG. 8 is a diagram for explaining a problem of another conventional technique.

【符号の説明】[Explanation of symbols]

1 第1の半導体チップ 1s 第1の半導体チップの半導体基板 1r 第1の半導体チップの裏面 1f 第1の半導体チップの素子面 1e 第1の半導体チップのチップ電極 1a 第1の半導体チップの接続構造体 2 第2の半導体チップ 2s 第2の半導体チップの半導体基板 2r 第2の半導体チップの裏面 2f 第2の半導体チップの素子面 2e 第2の半導体チップのチップ電極 2a 第2の半導体チップの接続構造体 3 配線基板 3a 配線基板の基準面 3h 配線基板の基準面よりも高い部分 3l 配線基板の基準面よりも低い部分 3w 配線基板の配線 3e 配線基板の基板電極 4 ツール 5 第3の半導体チップ 5s 第3の半導体チップの半導体基板 5r 第3の半導体チップの裏面 H 配線基板の基準面から半導体チップの裏面までの
高さ h 配線基板の基準面から半導体チップの素子面まで
の高さ D 半導体チップの半導体基板の厚さ d 半導体チップの接続構造体の接続後の厚さ
Reference Signs List 1 first semiconductor chip 1s semiconductor substrate of first semiconductor chip 1r back surface of first semiconductor chip 1f element surface of first semiconductor chip 1e chip electrode of first semiconductor chip 1a connection structure of first semiconductor chip Body 2 Second semiconductor chip 2s Semiconductor substrate of second semiconductor chip 2r Back surface of second semiconductor chip 2f Element surface of second semiconductor chip 2e Chip electrode of second semiconductor chip 2a Connection of second semiconductor chip Structure 3 Wiring board 3a Reference plane of wiring board 3h Part higher than reference plane of wiring board 3l Part lower than reference plane of wiring board 3w Wiring of wiring board 3e Board electrode of wiring board 4 Tool 5 Third semiconductor chip 5s Semiconductor substrate of third semiconductor chip 5r Back surface of third semiconductor chip H Height from reference surface of wiring substrate to back surface of semiconductor chip Thickness after connection of the connecting structure of thickness d semiconductor chip height D semiconductor chip of the semiconductor substrate from the reference plane of the h wiring substrate to the element surface of the semiconductor chip

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 配線基板に複数の半導体チップをフェー
スダウン方式で接続する半導体装置の実装構造におい
て、 上記配線基板の基準面から第1の半導体チップの裏面ま
での高さよりも上記配線基板の基準面から第2の半導体
チップの裏面までの高さが高く、かつ上記配線基板の基
準面から第1の半導体チップの主面までの高さよりも上
記配線基板の基準面から第2の半導体チップの主面まで
の高さが高く上記配線基板上に接続されたことを特徴と
する半導体装置の実装構造。
1. A mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner, wherein a reference height of the wiring board is higher than a height from a reference surface of the wiring board to a back surface of the first semiconductor chip. The height from the surface to the back surface of the second semiconductor chip is higher, and the height of the second semiconductor chip from the reference surface of the wiring board is higher than the height from the reference surface of the wiring substrate to the main surface of the first semiconductor chip. A mounting structure of a semiconductor device, wherein a height to a main surface is high and connected to the wiring board.
【請求項2】 配線基板に複数の半導体チップをフェー
スダウン方式で接続する半導体装置の実装構造におい
て、 上記配線基板の基準面から第1の半導体チップの裏面ま
での高さよりも上記配線基板の基準面から第2の半導体
チップの主面までの高さが高く、上記配線基板上に接続
されたことを特徴とする半導体装置の実装構造。
2. A mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner, wherein the reference of the wiring board is higher than the height from the reference surface of the wiring board to the back surface of the first semiconductor chip. A mounting structure of a semiconductor device, wherein a height from a surface to a main surface of a second semiconductor chip is high, and the semiconductor device is connected to the wiring board.
【請求項3】配線基板に複数の半導体チップをフェース
ダウン方式で接続する半導体装置の実装構造において、 上記配線基板の基準面から第1の半導体チップの裏面ま
での高さよりも上記配線基板の基準面から第2の半導体
チップの主面までの高さが高く、かつ第1の半導体チッ
プの一部上に第2の半導体チップ一部が重なり合うよう
に上記配線基板上に接続されたことを特徴とする半導体
装置の実装構造。
3. A mounting structure of a semiconductor device in which a plurality of semiconductor chips are connected to a wiring board in a face-down manner, wherein the reference of the wiring board is higher than the height from the reference surface of the wiring board to the back surface of the first semiconductor chip. The height from the surface to the main surface of the second semiconductor chip is high, and the semiconductor chip is connected to the wiring board so that a part of the second semiconductor chip overlaps a part of the first semiconductor chip. Mounting structure of a semiconductor device.
【請求項4】 請求項1,2、または3に記載の半導体
装置の実装方法において、 第1の半導体チップを配線基板に接続した後、第2の半
導体チップを上記配線基板に接続することを特徴とする
半導体装置の実装方法。
4. The method for mounting a semiconductor device according to claim 1, wherein after connecting the first semiconductor chip to the wiring board, connecting the second semiconductor chip to the wiring board. A method for mounting a semiconductor device.
JP5293127A 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof Expired - Fee Related JP2863426B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5293127A JP2863426B2 (en) 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5293127A JP2863426B2 (en) 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof

Publications (2)

Publication Number Publication Date
JPH07147298A JPH07147298A (en) 1995-06-06
JP2863426B2 true JP2863426B2 (en) 1999-03-03

Family

ID=17790773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5293127A Expired - Fee Related JP2863426B2 (en) 1993-11-24 1993-11-24 Semiconductor device mounting structure and mounting method thereof

Country Status (1)

Country Link
JP (1) JP2863426B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11195860A (en) * 1997-12-27 1999-07-21 Canon Inc Bonding member, multichip module with the bonding member and bonding method using the bonding member
JP4554398B2 (en) * 2005-03-03 2010-09-29 セイコーエプソン株式会社 Surface acoustic wave device and method for manufacturing surface acoustic wave device
JP2017050408A (en) * 2015-09-02 2017-03-09 株式会社ディスコ Manufacturing method for laminate wafer

Also Published As

Publication number Publication date
JPH07147298A (en) 1995-06-06

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