JPH0696796B2 - Chemical processing equipment - Google Patents

Chemical processing equipment

Info

Publication number
JPH0696796B2
JPH0696796B2 JP29091191A JP29091191A JPH0696796B2 JP H0696796 B2 JPH0696796 B2 JP H0696796B2 JP 29091191 A JP29091191 A JP 29091191A JP 29091191 A JP29091191 A JP 29091191A JP H0696796 B2 JPH0696796 B2 JP H0696796B2
Authority
JP
Japan
Prior art keywords
printed wiring
wiring board
liquid
treatment
liquid tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP29091191A
Other languages
Japanese (ja)
Other versions
JPH06108297A (en
Inventor
喜三郎 新山
Original Assignee
東京化工機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京化工機株式会社 filed Critical 東京化工機株式会社
Priority to JP29091191A priority Critical patent/JPH0696796B2/en
Publication of JPH06108297A publication Critical patent/JPH06108297A/en
Publication of JPH0696796B2 publication Critical patent/JPH0696796B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、化学処理装置に関す
る。すなわち、プリント配線基板等の薄板材について、
その製造工程等に用いられ、これを処理液に浸漬して搬
送しつつ、電解ソフトエッチング処理,めっき処理,そ
の他の化学処理を行う化学処理装置に関するものであ
る。
FIELD OF THE INVENTION The present invention relates to a chemical processing apparatus. That is, for thin plate materials such as printed wiring boards,
The present invention relates to a chemical treatment apparatus which is used in the manufacturing process and the like, and which carries out electrolytic soft etching treatment, plating treatment and other chemical treatments while immersing and transporting the treatment liquid.

【0002】[0002]

【従来の技術】プリント配線基板等の薄板材の製造工程
等において、各種本処理の前処理は極めて重要であり、
その良否が次に行われる本処理の品質を左右することが
多い。例えば、プリント配線基板の製造工程において
は、レジスト貼付等の前処理として機械的研磨処理が従
来より行われているが、この機械的研磨処理は、プリン
ト配線基板の表面の酸化,汚れ,附着物等を除去してお
くと共に、プリント配線基板の表面を平滑かつ粗化して
微細な凹凸を形成しておき、もって、事後の本処理であ
るレジスト貼付時の貼付密着度を向上させ貼付密着面積
を拡大させるべく行われている。又最近、このような機
械的研磨処理に代え、電解ソフトエッチング処理が普及
しつつある。この電解ソフトエッチング処理は、プリン
ト配線基板を処理液に浸漬して化学処理を行うことによ
り、前述の機械的研磨処理と同様、プリント配線基板の
表面の酸化,汚れ,附着物等を除去すると共に、同表面
を平滑かつ粗化して微細な凹凸を形成し、もって事後の
レジスト貼付に備えるべく行われる。
2. Description of the Related Art Pretreatment of various main treatments is extremely important in the manufacturing process of thin plate materials such as printed wiring boards.
The quality often affects the quality of the main processing to be performed next. For example, in the manufacturing process of a printed wiring board, a mechanical polishing process has been conventionally performed as a pretreatment such as resist sticking. However, this mechanical polishing process involves oxidation, stains and adhering substances on the surface of the printed wiring board. Etc., and the surface of the printed wiring board is smoothed and roughened to form fine irregularities, which improves the adhesiveness of the adhesive during the resist application, which is the main process afterwards, to improve the adhesive adhesion area. It is being made to expand. Further, recently, an electrolytic soft etching process is becoming popular in place of such a mechanical polishing process. In this electrolytic soft etching treatment, the printed wiring board is immersed in a treatment liquid and subjected to a chemical treatment to remove the oxidation, dirt, adhering substances, etc. on the surface of the printed wiring board as well as the mechanical polishing treatment described above. The surface is smoothed and roughened to form fine irregularities so that the resist can be applied later.

【0003】さて、プリント配線基板等の薄板材の製造
工程等においては、その他各種の化学処理が行われてい
る。勿論、いわゆる本処理としても化学処理は行われて
おり、例えばめっき処理は、プリント配線基板をめっき
液である処理液に浸漬することにより、プリント配線基
板の所定箇所例えばスルホールにめっきを施すものであ
る。なお係るめっき処理は、従来よりプリント配線基板
を縦状態で上から吊り下げて、処理液中に浸漬すること
により行われていた。
Various other chemical treatments are carried out in the manufacturing process of thin plate materials such as printed wiring boards. Of course, a chemical treatment is also performed as a so-called main treatment, and for example, the plating treatment is performed by immersing the printed wiring board in a treatment liquid which is a plating solution to plate a predetermined portion of the printed wiring board, for example, a through hole. is there. Incidentally, such plating treatment has been conventionally performed by suspending a printed wiring board in a vertical state from above and immersing it in a treatment liquid.

【0004】[0004]

【発明が解決しようとする課題】ところで、このような
従来例にあっては、次の諸問題が指摘されていた。まず
第1に、前述した機械的研磨処理については次のとお
り。すなわち、プリント配線基板は最近ますます高密度
化,多層化,ファイン化,微細回路化が進み、その肉厚
も0.4mm以下程度まで極薄化されると共に、その材料
も極めて柔軟で腰がないものが用いられソフト化・フレ
キシブル化が進み、もって、その取り扱いには細心の注
意を要するようになっている。そこで、このようなプリ
ント配線基板に対し、ブラシ研磨装置,バフ研磨装置に
より機械的研磨処理を施すと、プリント配線基板がスム
ーズに搬送されず、回転方向へのはね上がり、めくれ,
折れ,曲がり,わん曲等の損傷が生じることが多く、
又、バフの回転摩擦熱のため、プリント配線基板が熱変
形して反り等の不良が生じることも多く、もって、歩留
まりが悪いという問題があった。
By the way, the following problems have been pointed out in such a conventional example. First, the mechanical polishing process described above is as follows. In other words, the printed wiring boards have recently become more dense, multilayered, finer, and finer circuits, and their thickness has been extremely thinned to about 0.4 mm or less, and the material is also extremely flexible. Those that do not exist are being used, and they are becoming softer and more flexible. Therefore, they must be handled with extreme caution. Therefore, when such a printed wiring board is mechanically polished by a brush polishing device and a buff polishing device, the printed wiring board is not smoothly transported, and the printed wiring board is flipped up in the rotation direction and turned over.
Damage such as bending, bending, and bending often occurs,
Further, due to the rotational frictional heat of the buff, the printed wiring board is often thermally deformed to cause defects such as warpage, which causes a problem of low yield.

【0005】第2に、前述した電解ソフトエッチング処
理については次のとおり。すなわち化学処理装置を用
い、プリント配線基板を搬送しつつ処理液に浸漬して化
学処理を行うので、上述した機械的研磨処理の場合の歩
留まりの悪さ等の問題は解消され、極薄化・フレキシブ
ル化には対応できる。しかしながらこの電解ソフトエッ
チング処理によると、プリント配線基板の表面の酸化,
汚れ,附着物等が多く・激しい場合には、これらの除去
が不十分で除去されず残ってしまい、表面の粗化も不十
分となることが多く、レジスト貼付不良の原因となり、
結局、プリント配線基板の高密度化,多層化,ファイン
化,微細回路化の障害となるという難点があった。
Secondly, the above-mentioned electrolytic soft etching treatment is as follows. That is, since a chemical treatment device is used to carry out the chemical treatment by immersing the printed wiring board in the treatment liquid while transporting the printed wiring board, the problems such as the poor yield in the mechanical polishing treatment described above are solved, and it is extremely thin and flexible. It can deal with However, this electrolytic soft etching process causes oxidation of the surface of the printed wiring board,
If there is a lot of dirt, attachments, etc., or if they are severe, they are not removed sufficiently and remain without being removed, and surface roughening often becomes insufficient, causing poor resist attachment,
In the end, there is a problem that it becomes an obstacle to high density, multi-layer, fine and fine circuit of the printed wiring board.

【0006】第3に、そこでこのように処理液に浸漬す
る静止浴方式によらず、スプレー方式も採用されていた
が、このスプレー方式の電解ソフトエッチング処理につ
いては、次の問題が指摘されていた。すなわちこのスプ
レー方式の化学処理装置を用い、搬送されるプリント配
線基板に対し、ポンプにより多数のスプレーノズルから
処理液を空気中で噴射した場合には、スプレーノズルの
配列を各種工夫しても、どうしてもスプレー圧により電
解ソフトエッチング処理にムラ・バラツキが生じてしま
うようになる。そして、このような電解ソフトエッチン
グ処理のムラ・バラツキに基づき、プリント配線基板の
表面の酸化,汚れ,附着物等の除去および粗化にもムラ
・バラツキが発生し、レジスト貼付不良の原因となり、
結局、プリント配線基板の高密度化,多層化,ファイン
化,微細回路化の障害となるという指摘があった。
Thirdly, a spray method was also adopted instead of the static bath method of immersing in the processing solution as described above, but the following problems have been pointed out with respect to the electrolytic soft etching processing of this spray method. It was That is, using this spray-type chemical treatment device, when a treatment liquid is jetted in air from a number of spray nozzles to a printed wiring board to be conveyed, even if various arrangements of spray nozzles are devised, The spray pressure inevitably causes unevenness and variation in the electrolytic soft etching process. Then, based on such unevenness / variation of the electrolytic soft etching treatment, unevenness / variation also occurs in the removal and roughening of the surface of the printed wiring board, such as oxidation, stains, attachments, etc., which causes resist sticking failure,
In the end, it was pointed out that it hinders high density, multi-layer, fine, and fine circuit of the printed wiring board.

【0007】第4に、更に従来の電解ソフトエッチング
処理については、次の問題も指摘されていた。すなわ
ち、プリント配線基板は、一定寸法毎に切断された短尺
材よりなるので、化学処理装置内で連続的に搬送しつ
つ、処理液に浸漬したりスプレーノズルから処理液を噴
射したりすることは、従来一般に困難とされていた。つ
まり、エンドレスな帯状のものを浸漬する場合は、連続
的に搬送しつつ電解ソフトエッチング処理のための浸
漬,噴射等を行うことは容易であるが、切断されたプリ
ント配線基板の場合これは困難視され、個別的に個々に
浸漬,噴射等が行われており、作業効率が悪かった。
Fourthly, the following problems have been pointed out regarding the conventional electrolytic soft etching treatment. That is, since the printed wiring board is made of a short material cut into a certain size, it is not possible to immerse it in the treatment liquid or spray the treatment liquid from the spray nozzle while continuously conveying it in the chemical treatment device. Conventionally, it was generally considered difficult. In other words, when dipping an endless strip, it is easy to carry out dipping, spraying, etc. for electrolytic soft etching while continuously transporting it, but this is difficult for a cut printed wiring board. The work efficiency was poor because they were individually viewed and individually dipped and sprayed.

【0008】第5に、このような電解ソフトエッチング
処理に限らず、プリント配線基板その他の薄板材を処理
液に浸漬して化学処理液を行う化学処理装置一般につい
ても、化学処理の不十分さおよびムラ・バラツキが指摘
されると共に、連続的に搬送しつつ化学処理を行うこと
は容易でないという指摘があった。
Fifthly, the chemical treatment is not limited to the electrolytic soft etching treatment as described above, and the chemical treatment is not sufficient for general chemical treatment apparatuses that perform chemical treatment by dipping a printed wiring board or other thin plate material in the treatment liquid. In addition, it was pointed out that unevenness and variations were also pointed out, and it was not easy to carry out chemical treatment while continuously transferring.

【0009】第6に、これらに加え更に、前述のめっき
処理については、次の問題が指摘されていた。すなわ
ち、化学処理の1例であるこのめっき処理は、従来より
プリント配線基板を縦状態で順次上から吊り下げて、処
理液中に浸漬することにより行われているが、他方、プ
リント配線基板のその他の各種製造工程において、プリ
ント配線基板は横状態つまり水平に搬送されつつ各種処
理が行われている。このようにプリント配線基板の製造
工程において、めっき処理を行う化学処理装置だけが縦
状態で、その他の装置が逆の横状態で処理が行われてい
たので、装置間の連結・連動化が困難であり、各製造工
程の自動ライン化の障害となっていた。
Sixth, in addition to these, the following problems have been pointed out regarding the above-mentioned plating treatment. That is, this plating treatment, which is an example of a chemical treatment, has conventionally been performed by sequentially suspending a printed wiring board in a vertical state from above and immersing the printed wiring board in a treatment liquid. In other various manufacturing processes, various processes are performed while the printed wiring board is transported in a horizontal state, that is, horizontally. In this way, in the printed wiring board manufacturing process, only the chemical processing equipment that performs the plating processing is in the vertical state, and the other equipment is in the horizontal orientation, so it is difficult to connect and link the equipment. This is a hindrance to the automatic production line of each manufacturing process.

【0010】第7に、更に前述のめっき処理について
は、次の問題も指摘されていた。すなわち、プリント配
線基板を縦状態で順次上から吊り下げて処理液中に浸漬
するので、このめっき処理を行う化学処理装置は、上面
が開放されていることを要し、密閉することができな
い。そこで、めっき液たる処理液から発生したガス,臭
気等が外部に流れ出て、工場内を汚染し機械・製品等を
腐食・劣化させたり、作業環境を悪化させ作業者の健康
にも悪影響を及ぼすことがあった。
Seventh, the following problems have been pointed out regarding the above-mentioned plating treatment. That is, since the printed wiring board is vertically suspended from the top and immersed in the treatment liquid, the chemical treatment apparatus for performing the plating treatment needs to have an open upper surface and cannot be hermetically sealed. Therefore, gas, odor, etc. generated from the plating solution, which is a processing solution, flows out to the outside, polluting the inside of the factory and corroding and deteriorating machines and products, and worsening the working environment and adversely affecting the health of workers. There was an occasion.

【0011】本発明は、このような実情に鑑み、上記従
来例の問題点を解決すべく、発明者の鋭意研究努力の結
果なされたものであって、請求項1,2,3共に、処理
液中にてプリント配線基板等の薄板材について、上下の
搬送ローラー群でその一側端縁を挟み込んで送ると共
に、下側の多数の噴出孔から処理液を噴射して水平に支
えるようにしたことにより、プリント配線基板等の薄板
材について、第1に、わん曲,反り,垂れ下がり等が防
止されスムーズかつ確実に水平に搬送でき、第2に、電
解ソフトエッチング処理その他の化学処理が、十分かつ
確実に、第3に、又ムラ・バラツキなく均一に、第4
に、しかも連続的に搬送しつつ行え、第5に、これに加
え請求項3のめっき処理に関しては、更に、他の装置と
の連結・連動化が可能になると共に、第6に、装置上面
の閉鎖・密閉が可能となる、化学処理装置を提案するこ
とを目的とする。
In view of the above situation, the present invention has been made as a result of earnest research efforts by the inventor in order to solve the problems of the above-mentioned conventional examples. A thin plate material such as a printed wiring board in a liquid is sent by sandwiching one edge of it with upper and lower conveying roller groups, and horizontally supporting the processing liquid by ejecting it from a number of lower ejection holes. As a result, with regard to thin plate materials such as printed wiring boards, firstly, bending, warping, sagging, etc. can be prevented, and smooth and reliable horizontal transportation can be performed. Secondly, electrolytic soft etching treatment and other chemical treatments are sufficient. And surely, thirdly, evenly, without unevenness and variation, fourth
In addition to the above, in addition to this, the plating treatment according to claim 3 can be further connected / interlocked with another device, and sixthly, the upper surface of the device can be connected. It is an object of the present invention to propose a chemical treatment device capable of closing / sealing.

【0012】[0012]

【課題を解決するための手段】この目的を達成する本発
明の技術的手段は、次のとおりである。まず、請求項1
については次のとおり。すなわちこの化学処理装置は、
薄板材を水平に搬送しつつ処理液に浸漬して化学処理を
行う装置に関する。そして、該処理液中で該薄板材の一
側端縁を挟み込んで送る上下の搬送ローラー群と、該処
理液中で該薄板材に向け下側から処理液を噴射して支え
る多数の噴出孔と、を有してなる。
The technical means of the present invention for achieving this object are as follows. First, claim 1
About: That is, this chemical processing device
The present invention relates to a device for carrying out a chemical treatment by immersing a thin plate material in a horizontal direction and immersing it in a treatment liquid. Then, a group of upper and lower conveying rollers that sandwich and feed one side edge of the thin plate material in the treatment liquid, and a large number of ejection holes that support the thin liquid material from below by ejecting the treatment liquid toward the thin plate material. And.

【0013】又、請求項2については次のとおり。この
化学処理装置は、プリント配線基板の製造工程で用いら
れ、該プリント配線基板を水平に搬送しつつ処理液に浸
漬して電解ソフトエッチング処理を行う装置に関する。
そして、該プリント配線基板が浸漬される該処理液の液
槽と、該液槽の処理液中に配され該プリント配線基板の
一側端縁を挟み込んで送る上下の搬送ローラー群と、該
液槽外に配され該搬送ローラー群を回転駆動する駆動機
構と、該液槽の処理液中に配され、搬送される該プリン
ト配線基板の下面に間隔を存しほぼ全面的に対向位置
し、プリント配線基板に向け処理液を噴射して下側から
支える多数の噴出孔と、該液槽の処理液中に水平に配さ
れ、搬送される該プリント配線基板の上面に対向位置
し、該噴出孔から噴射された該処理液にてプリント配線
基板が適宜下側から押し当てられるレベル規制バーと、
該液槽の処理液側に水平に配されたマイナス電極と、該
搬送ローラー群およびプリント配線基板側に配されたプ
ラス電極と、を有してなる。
The second aspect of the present invention is as follows. This chemical treatment apparatus is used in a manufacturing process of a printed wiring board, and relates to an apparatus for carrying out the electrolytic soft etching treatment by horizontally conveying the printed wiring board and immersing it in a treatment liquid.
Then, a liquid bath of the treatment liquid in which the printed wiring board is dipped, upper and lower conveying roller groups which are disposed in the treatment liquid of the liquid bath and which feed by sandwiching one side edge of the printed wiring board, and the liquid. A drive mechanism arranged outside the tank to rotate and drive the conveying roller group, and arranged in the treatment liquid of the liquid tank and substantially entirely opposed to the lower surface of the printed wiring board, which is conveyed, A large number of ejection holes for ejecting the treatment liquid toward the printed wiring board and supporting it from the lower side, and a plurality of ejection holes which are arranged horizontally in the treatment liquid in the liquid tank and are opposed to the upper surface of the printed wiring board to be conveyed. A level control bar to which the printed wiring board is appropriately pressed from the lower side by the processing liquid sprayed from the holes,
It has a minus electrode horizontally arranged on the side of the treatment liquid of the liquid tank, and a plus electrode arranged on the side of the transport rollers and the printed wiring board side.

【0014】更に、請求項3については次のとおり。す
なわちこの化学処理装置は、プリント配線基板の製造工
程で用いられ、該プリント配線基板を水平に搬送しつつ
処理液に浸漬してめっき処理を行う装置に関する。そし
て、該プリント配線基板が浸漬される該処理液の液槽
と、該液槽の処理液中に配され該プリント配線基板の一
側端縁を挟み込んで送る上下の搬送ローラー群と、該液
槽外に配され該搬送ローラー群を回転駆動する駆動機構
と、該液槽の処理液中に配され、搬送される該プリント
配線基板の下面に間隔を存しほぼ全面的に対向位置し、
プリント配線基板に向け処理液を噴射して下側から支え
る多数の噴出孔と、該液槽の処理液中に水平に配され、
搬送される該プリント配線基板の上面に対向位置し、該
噴出孔から噴射された該処理液にてプリント配線基板が
適宜下側から押し当てられるレベル規制バーと、該液槽
の処理液側に水平に配されたプラス電極と、該搬送ロー
ラー群およびプリント配線基板側に配されたマイナス電
極と、を有してなる。
Further, claim 3 is as follows. That is, this chemical treatment apparatus is used in a manufacturing process of a printed wiring board, and relates to an apparatus for carrying out a plating treatment by immersing the printed wiring board in a treatment liquid while horizontally conveying it. Then, a liquid bath of the treatment liquid in which the printed wiring board is dipped, upper and lower conveying roller groups which are disposed in the treatment liquid of the liquid bath and which feed by sandwiching one side edge of the printed wiring board, and the liquid. A drive mechanism arranged outside the tank to rotate and drive the conveying roller group, and arranged in the treatment liquid of the liquid tank and substantially entirely opposed to the lower surface of the printed wiring board, which is conveyed,
A large number of ejection holes for injecting the treatment liquid toward the printed wiring board and supporting the ejection liquid from the lower side, and arranged horizontally in the treatment liquid in the liquid tank,
A level control bar, which is positioned to face the upper surface of the printed wiring board being conveyed, and on which the printed wiring board is appropriately pressed from below by the processing liquid ejected from the ejection holes, and a processing liquid side of the liquid tank. It comprises a horizontally arranged positive electrode and a negative electrode arranged on the side of the transport rollers and the printed wiring board.

【0015】[0015]

【作用】本発明は、このような手段よりなるので、次の
ように作用する。この化学処理装置では、プリント配線
基板等の薄板材は、上下の搬送ローラー群にて一側端縁
を挟み込まれて送られると共に、その補助として、下側
の多数の噴出孔から噴射される処理液の噴流にて押し上
げられ水平に支えられる。そして、このようにして水平
に搬送されつつ、処理液に浸漬され化学処理が行われ
る。又、請求項2および請求項3では、プリント配線基
板は、駆動機構にて回転駆動される上下の搬送ローラー
群により、レベル規制バーで高さレベルを水平に規制さ
れつつ搬送される。そして所定のごとく電極を配したこ
とにより、請求項2では電解ソフトエッチング処理が、
請求項3ではめっき処理が行われる。
Since the present invention comprises such means, it operates as follows. In this chemical processing device, a thin plate material such as a printed wiring board is sent while being sandwiched at one end edge by a group of upper and lower conveying rollers, and as a supplement, a process of being ejected from a large number of lower ejection holes. It is pushed up by the jet of liquid and supported horizontally. Then, while being transported horizontally in this manner, it is immersed in the treatment liquid and subjected to chemical treatment. In the second and third aspects, the printed wiring board is transported while the height level is horizontally regulated by the level regulation bar by the upper and lower transportation roller groups which are rotationally driven by the drive mechanism. Then, by arranging the electrodes in a predetermined manner, the electrolytic soft etching treatment according to claim 2
In claim 3, plating treatment is performed.

【0016】そこでこの化学処理装置では、次のように
なる。第1に、プリント配線基板等の薄板材は極薄化・
フレキシブル化が進んでも、はね上がり,めくれ,折
れ,曲がり,わん曲,変形,反り,垂れ下がり等が防止
され、スムーズかつ確実に水平に搬送される。第2に、
プリント配線基板等の薄板材は、噴射された処理液の噴
流中にて化学処理が行われる。従って、この化学処理は
十分かつ確実に行われる。第3に、プリント配線基板等
の薄板材は、噴流中ではあるがあくまで処理液に浸漬さ
れて化学処理が行われる。従って、化学処理はムラ・バ
ラツキがなく全体的に均一に行われる。第4に、プリン
ト配線基板等の薄板材は、その一側端縁を上下の搬送ロ
ーラー群で挟み込まれて搬送される。そこで、連続的に
順次搬送しつつ、浸漬,噴流等による化学処理が可能と
なる。第5に、これらに加え請求項3の化学処理装置で
は、水平に搬送しつつめっき処理が行われるので、プリ
ント配線基板のその他の製造装置との連結・連動化が容
易となる。第6に、更にこの請求項3のものは、装置上
面を閉鎖し装置を密閉することができる。従って、めっ
き液たる処理液から発生したガス,臭気等が外部に流れ
出すことを防止可能となる。
Therefore, in this chemical processing apparatus, the following is performed. First, the thin plate materials such as printed wiring boards are extremely thin.
Even if it is made more flexible, it is prevented from springing up, turning over, bending, bending, bending, deforming, warping, sagging, etc., and conveys smoothly and reliably horizontally. Second,
A thin plate material such as a printed wiring board is chemically treated in a jet stream of the jetted treatment liquid. Therefore, this chemical treatment is sufficiently and reliably performed. Thirdly, a thin plate material such as a printed wiring board is immersed in a processing liquid for chemical treatment even though it is in a jet stream. Therefore, the chemical treatment is performed uniformly without unevenness or variation. Fourthly, a thin plate material such as a printed wiring board is conveyed with one end edge thereof being sandwiched by the upper and lower conveyance roller groups. Therefore, it becomes possible to carry out chemical treatment by dipping, jetting, etc. while continuously and sequentially transporting. Fifthly, in addition to these, in the chemical treatment apparatus according to the third aspect, the plating treatment is carried out while being conveyed horizontally, so that the printed wiring board can be easily connected and linked with other production apparatuses. Sixth, according to the third aspect, the upper surface of the device can be closed to seal the device. Therefore, it is possible to prevent the gas, odor, etc., generated from the processing liquid, which is the plating liquid, from flowing out.

【0017】[0017]

【実施例】以下本発明を図面に示すその実施例に基づい
て詳細に説明する。図1は本発明の実施例の正断面図で
あり、図2は同側面説明図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below based on the embodiments shown in the drawings. 1 is a front sectional view of an embodiment of the present invention, and FIG. 2 is a side view thereof.

【0018】この化学処理装置は、金属板製又は非金属
製の薄板材を水平に搬送しつつ、酸又はアルカリ性等の
薬剤若しくは単に水よりなる処理液Aに浸漬して、電解
処理,無電解めっき処理,電解めっき処理,その他の化
学処理を行う装置に関し、図示実施例は、薄板材の1例
であるプリント配線基板Pの製造工程で用いられ、プリ
ント配線基板Pを水平に搬送しつつ処理液Aに浸漬し
て、化学処理の1例である電解ソフトエッチング処理を
行う装置に関する。まず、プリント配線基板Pについて
述べる。プリント配線基板Pは、民生用の片面基板,O
A用の両面基板,コンピューター用の多層基板,計算機
用その他のフレキシブル基板等々、用途により多種多様
であり、もってその製造工程も多種多様である。例え
ば、両面基板よりなるプリント配線基板Pは、材料切
断,穴あけ加工,研磨・電解ソフトエッチング処理,ス
ルホールめっき,研磨・電解ソフトエッチング処理,レ
ジスト貼付,露光,現像,エッチング,レジスト剥膜,
等々の工程を辿って製造される。
In this chemical treatment apparatus, a metal plate or non-metal thin plate material is conveyed horizontally while being immersed in a treatment liquid A consisting of a chemical such as acid or alkali or simply water for electrolytic treatment and electroless treatment. Regarding an apparatus for performing plating processing, electrolytic plating processing, and other chemical processing, the illustrated embodiment is used in a manufacturing process of a printed wiring board P, which is an example of a thin plate material, and the processing is performed while the printed wiring board P is horizontally transported. The present invention relates to an apparatus that is immersed in a liquid A to perform an electrolytic soft etching process, which is an example of a chemical process. First, the printed wiring board P will be described. The printed wiring board P is a single-sided board for consumer use, O
There are various types of double-sided substrates for A, multi-layered substrates for computers, flexible substrates for computers, and so on, and there are various types of manufacturing processes. For example, a printed wiring board P made of a double-sided board is used for material cutting, drilling, polishing / electrolytic soft etching, through-hole plating, polishing / electrolytic soft etching, resist sticking, exposure, development, etching, resist stripping,
It is manufactured by following the process of etc.

【0019】すなわち、まず絶縁材の両面に銅箔が張り
合わされた両面銅張り積層材が、ワークサイズの短尺材
に切断され、次に、表裏導通用の穴あけ加工が施された
後、表面処理として両面研磨又は電解ソフトエッチング
処理が行われてから、めっき液を用いたスルホールのめ
っき処理が実施される。つまり、表面の電気回路と裏面
の電気回路を導通すべく、スルホールの内壁にめっき処
理が施される。しかる後、再び表面処理として両面研磨
又は電解ソフトエッチング処理が行われてから、レジス
トを膜状に貼付ける処理が行われ、それから回路写真を
あてて露光し、事後、レジストは露光され硬化した部分
を残し、他の部分は現像液の噴射により溶解除去され
る。それからエッチングマシンにて、このようにレジス
トが硬化した部分の銅箔を残し、レジストが溶解除去さ
れた部分の銅箔が腐食液の噴射により溶解除去される。
しかる後、残っていた上述の硬化したレジストが、剥離
液の噴射により溶解除去され、もって、電気回路が形成
されたプリント配線基板Pが製造されるに至る。このよ
うにプリント配線基板Pの製造工程では、めっき液,電
解ソフトエッチング処理用の処理液,現像液,腐食液,
剥離液,等々の各種の異なる処理液を用いた化学処理
が、各々の装置により実施されている。なおレジストと
は、電気回路を描き出すための感光性ドライフィルム,
液状感光性レジスト,電着レジスト等を言う。
That is, first, a double-sided copper-clad laminated material in which copper foil is laminated on both sides of an insulating material is cut into short-sized materials of a work size, and then a hole is bored for conducting on the front and back sides, and then a surface treatment After the double-side polishing or the electrolytic soft etching treatment is performed, the through-hole plating treatment using the plating solution is performed. That is, the inner wall of the through hole is plated so that the electric circuit on the front surface and the electric circuit on the rear surface are electrically connected. After that, after double-side polishing or electrolytic soft etching is again performed as the surface treatment, the resist is applied in the form of a film, and then a circuit photograph is exposed to expose the resist, after which the resist is exposed and cured. , And other parts are dissolved and removed by spraying the developing solution. Then, in the etching machine, the copper foil in the portion where the resist is hardened in this way is left, and the copper foil in the portion where the resist is dissolved and removed is dissolved and removed by jetting a corrosive liquid.
After that, the remaining hardened resist described above is dissolved and removed by spraying the stripping solution, and thus the printed wiring board P on which the electric circuit is formed is manufactured. As described above, in the manufacturing process of the printed wiring board P, the plating solution, the processing solution for the electrolytic soft etching processing, the developing solution, the corrosive solution,
A chemical treatment using various different treatment liquids such as a stripping liquid is carried out by each device. A resist is a photosensitive dry film for drawing an electric circuit,
Liquid photosensitive resist, electrodeposition resist, etc.

【0020】さて図示実施例は、このようなプリント配
線基板Pの製造工程のうち、電解ソフトエッチング処理
を行う化学処理装置に関し、次の液槽1,上下の搬送ロ
ーラー2群,その駆動機構3,噴出孔4,レベル規制バ
ー5,マイナス電極6,プラス電極7等を備えてなる。
これらについて詳述すると、まず液槽1は、プリント配
線基板Pが浸漬される電解ソフトエッチング処理用の薬
液である処理液Aの槽よりなり、この液槽1は、蓋8に
て閉鎖される化学処理装置の処理室9内に配設されてい
る。なお液槽1には、処理液Aの濃度計,循環ポンプ,
フィルター,温度管理用のヒーター,そのコントローラ
ー、および、マイナス電極6とプラス電極7による電解
に必要な電流制御を行う整流器、等々(図示せず)が付
設されている。
The illustrated embodiment relates to a chemical processing apparatus for performing electrolytic soft etching processing in the manufacturing process of such a printed wiring board P, and includes the following liquid tank 1, upper and lower conveying rollers 2 group, and driving mechanism 3 thereof. , An ejection hole 4, a level control bar 5, a minus electrode 6, a plus electrode 7 and the like.
To describe these in detail, first, the liquid tank 1 is composed of a tank of the processing liquid A which is a chemical liquid for electrolytic soft etching treatment in which the printed wiring board P is immersed, and the liquid tank 1 is closed by a lid 8. It is arranged in the processing chamber 9 of the chemical processing apparatus. In the liquid tank 1, a concentration meter for the processing liquid A, a circulation pump,
A filter, a heater for temperature control, a controller thereof, and a rectifier (not shown) for controlling the current required for electrolysis by the negative electrode 6 and the positive electrode 7, etc. are attached.

【0021】上下の搬送ローラー2群は、このような液
槽1の処理液A中に配され、プリント配線基板Pの一側
端縁を挟み込んで送るようになっている。つまり、この
上下の搬送ローラー2群は、液槽1内の一側に沿い上下
対をなし並んで多数設けられており、プリント配線基板
Pの四辺に形成された数10mm程度のつかみしろ(電気
回路が設けられない部分)のうちの1辺のものを、上下
から挟み込んで搬送方向に送る、上下で対応する凹凸を
備えた段付ローラーよりなる。そして、このような搬送
ローラー2群を回転駆動させる駆動機構3は、液槽1外
に配設されている。すなわち駆動機構3は、駆動源たる
モータ10と、モータ10の駆動軸に連結されたベル
ト,ウォームホイル,伝達軸等の伝達手段11と、伝達
手段11に一端部側が連結された多数のシャフト12
と、シャフト12の軸受13等よりなる。そして、各シ
ャフト12の他端部側は液槽1内に延出され、搬送ロー
ラー2群がそれぞれ連結固定されている。
The upper and lower conveying rollers 2 are arranged in the treatment liquid A in the liquid tank 1 and sandwich one end of the printed wiring board P for feeding. That is, a group of the upper and lower transport rollers 2 is provided in a line in a vertical pair along one side in the liquid tank 1, and a gripping margin (electricity of about several tens mm) formed on the four sides of the printed wiring board P is provided. One of the parts (where the circuit is not provided) is sandwiched from above and below and is fed in the transport direction. The drive mechanism 3 that rotationally drives the group of transport rollers 2 is arranged outside the liquid tank 1. That is, the drive mechanism 3 includes a motor 10 as a drive source, a transmission unit 11 such as a belt, a worm wheel, and a transmission shaft connected to the drive shaft of the motor 10, and a large number of shafts 12 connected to the transmission unit 11 at one end thereof.
And the bearing 13 of the shaft 12 and the like. The other end of each shaft 12 extends into the liquid tank 1, and the transport roller 2 groups are connected and fixed.

【0022】次に噴出孔4は、液槽1の処理液A中に多
数配され、搬送されるプリント配線基板Pの下面に間隔
を存しほぼ全面的に対向位置し、プリント配線基板Pに
向け処理液Aを噴射して下側から押し上げて支えるよう
になっている。そして図示例の噴出孔4は、液槽1内の
下側に水平に配された多孔板14上面に多数穿設されて
おり、多孔板14内の中空部に、液槽1内の処理液Aが
ポンプ(図示せず)にて供給されるようになっている。
なお噴出孔4は、図示例の多孔板14を用いたものに限
定されず、例えば多数のノズルを用いるようにしてもよ
い。他方レベル規制バー5は、液槽1の処理液A中に水
平に配され、搬送されるプリント配線基板Pの上面に対
向位置し、噴出孔から噴射された処理液Aにてプリント
配線基板Pが適宜下側から押し当てられる。つまりレベ
ル規制バー5は、プリント配線基板Pを介し噴出孔4と
は反対側の上側に配され、図示例では、プリント配線基
板Pの搬送方向に沿って設けられた複数本の丸棒よりな
る。そして、処理液Aの噴流により水平に支えられてい
るプリント配線基板Pは、適宜このレベル規制バー5に
下側から押し当てられるので、その高さレベルは常時確
実に水平に規制される。
Next, a large number of ejection holes 4 are arranged in the treatment liquid A in the liquid tank 1 and are positioned on the lower surface of the conveyed printed wiring board P with a space therebetween and are substantially opposed to each other on the printed wiring board P. The processing liquid A is sprayed and pushed up from below to support it. A large number of ejection holes 4 in the illustrated example are formed on the upper surface of the perforated plate 14 which is horizontally arranged on the lower side of the liquid tank 1, and the treatment liquid in the liquid tank 1 is provided in the hollow portion of the perforated plate 14. A is supplied by a pump (not shown).
The ejection holes 4 are not limited to those using the perforated plate 14 in the illustrated example, and for example, a large number of nozzles may be used. On the other hand, the level control bar 5 is horizontally disposed in the processing liquid A in the liquid tank 1 and is positioned to face the upper surface of the printed wiring board P that is transported, and the printed wiring board P is formed by the processing liquid A ejected from the ejection holes. Is pressed from below as appropriate. That is, the level regulation bar 5 is arranged on the upper side on the opposite side to the ejection hole 4 via the printed wiring board P, and is composed of a plurality of round bars provided along the conveyance direction of the printed wiring board P in the illustrated example. . The printed wiring board P, which is horizontally supported by the jet of the treatment liquid A, is appropriately pressed against the level regulation bar 5 from the lower side, so that the height level is always regulated horizontally.

【0023】マイナス電極6は、液槽1の処理液A側に
水平に配されており、図示例では搬送されるプリント配
線基板Pの上下にそれぞれ間隔を存し水平に配設され
た、多数の電極板よりなる。プラス電極7は、搬送ロー
ラー2群そしてプリント配線基板P側に配されており、
図示例ではカーボンブラシ電極が用いられ、スプリング
15にて駆動機構3のシャフト12に圧接されている。
このように、カーボンブラシ電極よりなるマイナス電極
6が、駆動機構3を介し搬送ローラー2群そしてプリン
ト配線基板Pに接続されている。
The minus electrodes 6 are arranged horizontally on the side of the treatment liquid A in the liquid tank 1, and in the illustrated example, a large number of them are arranged horizontally above and below the printed wiring board P to be conveyed. It consists of an electrode plate. The plus electrode 7 is arranged on the side of the transport roller 2 and the printed wiring board P,
In the illustrated example, a carbon brush electrode is used and is pressed against the shaft 12 of the drive mechanism 3 by a spring 15.
In this way, the negative electrode 6 made of a carbon brush electrode is connected to the transport roller 2 group and the printed wiring board P via the drive mechanism 3.

【0024】本発明は、以上説明したように構成されて
いる。そこで以下のようになる。この電解ソフトエッチ
ング処理用の化学処理装置では、薄板材の1例であるプ
リント配線基板Pは、上下の搬送ローラー2群にてその
一側端縁を挟み込まれて送られると共に、その補助とし
て、下側の多数の噴出孔4から噴射される処理液Aの噴
流にて、押し上げられて水平に支えられる。そしてプリ
ント配線基板Pは、このようにして水平に搬送されつ
つ、処理液Aに浸漬されて化学処理、つまり電解ソフト
エッチング処理がその両面に施される。すなわち、プリ
ント配線基板Pは、駆動機構3にて液槽1中を回転駆動
される上下の搬送ローラー2群により、又、レベル規制
バー5で高さレベルを水平に規制されつつ、このように
搬送される。そして、所定のごとくマイナス電極6とプ
ラス電極7を配したことにより、電解ソフトエッチング
処理が行われている。
The present invention is constructed as described above. Then it becomes as follows. In this chemical treatment apparatus for electrolytic soft etching treatment, the printed wiring board P, which is an example of a thin plate material, is fed with its one end edge sandwiched between the upper and lower conveyance rollers 2 groups, and as a supplement, It is pushed up by the jet stream of the treatment liquid A jetted from the large number of jet holes 4 on the lower side and supported horizontally. Then, the printed wiring board P is immersed in the treatment liquid A and subjected to a chemical treatment, that is, an electrolytic soft etching treatment, on both sides thereof while being conveyed horizontally in this manner. That is, the printed wiring board P is thus regulated by the upper and lower conveyance rollers 2 which are rotationally driven in the liquid tank 1 by the driving mechanism 3 and the height level is regulated horizontally by the level regulation bar 5. Be transported. The electrolytic soft etching process is performed by arranging the minus electrode 6 and the plus electrode 7 in a predetermined manner.

【0025】そこでこの電解ソフトエッチング処理を行
う化学処理装置では、次の第1,第2,第3,第4のよ
うになる。まず第1に、この種従来例のようにブラシ研
磨やバフ研磨等の機械的研磨処理ではなく、電解ソフト
エッチング処理つまり化学処理が行われるので、プリン
ト配線基板Pは極薄化・フレキシブル化が進んでも、は
ね上がり,めくれ,折れ,曲がり,わん曲,変形,反り
等が防止される。しかも、噴出孔4からの処理液Aの噴
流にて支えられつつ搬送されるので、プリント配線基板
Pはこの面からも、自重によるわん曲,反り,垂れ下が
り等が防止され、もって、スムーズかつ確実に水平に搬
送される。第2に、プリント配線基板Pは、噴出孔4か
ら噴射された処理液Aの噴流中にて処理液Aに浸漬さ
れ、電解ソフトエッチング処理が行われる。従って、プ
リント配線基板Pの表面の酸化,汚れ,附着物等が多く
・激しい場合でも、これを除去し表面を粗化する電解ソ
フトエッチング処理は、この種従来例の静止浴による浸
漬の場合に比し、十分かつ確実に行われる。
Then, in the chemical treatment apparatus for carrying out this electrolytic soft etching treatment, the following first, second, third and fourth are performed. First of all, since the electrolytic soft etching process, that is, the chemical process is performed instead of the mechanical polishing process such as the brush polishing and the buff polishing as in the conventional example of this kind, the printed wiring board P can be made extremely thin and flexible. Even if it advances, it is prevented from jumping up, turning over, bending, bending, bending, deforming, warping and the like. Moreover, since the printed wiring board P is transported while being supported by the jet flow of the processing liquid A from the ejection holes 4, the printed wiring board P is prevented from being bent, warped, drooped, or the like due to its own weight. Be transported horizontally. Secondly, the printed wiring board P is immersed in the treatment liquid A in the jet stream of the treatment liquid A ejected from the ejection holes 4, and the electrolytic soft etching treatment is performed. Therefore, even if the surface of the printed wiring board P is heavily oxidized or soiled or attached, the electrolytic soft etching treatment for removing the surface and roughening the surface can be performed by dipping in a still bath of this type of conventional example. In comparison, it is performed sufficiently and reliably.

【0026】第3に、プリント配線基板Pは、噴出孔4
から噴射された処理液Aの噴流中ではあるが、あくまで
処理液Aに浸漬されることにより、電解ソフトエッチン
グ処理が行われており、この種従来例のように、空気中
でスプレーノズルにより処理液Aの噴射が行われている
わけではない。従って、プリント配線基板Pの表面の酸
化,汚れ,附着物等を除去すると共に表面を粗化する電
解ソフトエッチング処理は、スプレー圧等の悪影響を受
けず、しかも何らの障害がない処理液A中で、ムラ・バ
ラツキがなく全体的に均一に行われる。更に、処理液A
中に水平に配されたマイナス電極6に対しプリント配線
基板Pも水平に搬送されるので、両者の間隔は一定であ
り、この面からも電解ソフトエッチング処理のムラ・バ
ラツキは防止される。第4に、プリント配線基板Pは、
その一側端縁を上下の搬送ローラー2群で挟み込まれ、
保持されつつ搬送される。そこで、一定の寸法毎に切断
された短尺材よりなるプリント配線基板Pではあるが、
この種従来例のように個別的に個々にではなく連続的に
順次搬送しつつ、浸漬,噴流等による電解ソフトエッチ
ング処理が可能となる。
Thirdly, the printed wiring board P has the ejection holes 4
Although it is in the jet stream of the treatment liquid A ejected from the above, the electrolytic soft etching treatment is performed only by being immersed in the treatment liquid A. As in the conventional example of this kind, the treatment is performed by a spray nozzle in air. The liquid A is not being jetted. Therefore, the electrolytic soft etching treatment for removing the oxidation, dirt, adhering substances, etc. on the surface of the printed wiring board P and roughening the surface is not affected by the spray pressure and the like, and there is no obstacle in the treatment liquid A. Therefore, there is no unevenness or variation, and it is performed uniformly as a whole. Furthermore, the processing liquid A
Since the printed wiring board P is also conveyed horizontally with respect to the minus electrode 6 arranged horizontally inside, the distance between the two is constant, and this aspect also prevents unevenness and variations in the electrolytic soft etching process. Fourth, the printed wiring board P is
The one side edge is sandwiched by two groups of upper and lower transport rollers,
It is transported while being held. Therefore, although the printed wiring board P is made of a short material cut into a certain size,
It is possible to carry out electrolytic soft etching treatment by dipping, jetting, etc. while sequentially and sequentially transporting them individually rather than individually as in the conventional example of this kind.

【0027】以上が、図示実施例の説明である。なお、
この図示実施例は、電解ソフトエッチング用の化学処理
装置に関するが、その処理液Aを、電解ソフトエッチン
グ処理用のものではなくめっき液とし、かつ、マイナス
電極6とプラス電極7のプラスマイナスを反対に設定す
ることにより、この化学処理装置はめっき処理用のもの
となる。つまり、処理液Aにめっき液を用い、かつ図示
のマイナス電極6をプラスに、図示のプラス電極7をマ
イナスに変更することにより、めっき処理用の化学処理
装置となる。そして、このめっき処理用の化学処理装置
は、電解ソフトエッチング処理用のものについて上述し
た第1,第2,第3,第4の各点に加え、更に次の第
5,第6のようになる。すなわち第5に、このめっき処
理用の化学処理装置では、この種従来例のように縦状態
ではなく横状態、つまり水平に搬送しつつめっき処理が
行われるので、その前後のプリント配線基板Pの他の各
種製造工程において、水平に搬送されつつ各種処理が行
われていることと、共通化される。従って、このような
他の装置とこのめっき処理を行う化学処理装置との連結
・連動化が容易となる。第6に、更にこのめっき処理用
の化学処理装置では、この種従来例のように縦状態で順
次上から処理液中に吊り下げられるのではなく、処理液
A中を水平に搬送しつつめっき処理が行われるので、装
置の処理室9の上面側を蓋8で閉鎖し、装置全体を密閉
することが容易となる。従って、めっき液たる処理液A
から発生したガス,臭気等が外部に流れ出すことは、防
止可能となる。
The above is the description of the illustrated embodiment. In addition,
Although the illustrated embodiment relates to a chemical treatment apparatus for electrolytic soft etching, the treating solution A is not a solution for electrolytic soft etching treatment but a plating solution, and the plus and minus of the negative electrode 6 and the plus electrode 7 are opposite to each other. By setting to, this chemical processing apparatus is for plating processing. That is, a plating solution is used as the processing solution A, and the minus electrode 6 shown in the figure is changed to plus and the plus electrode 7 shown in the figure is changed to minus, whereby a chemical treatment apparatus for plating treatment is obtained. In addition to the first, second, third, and fourth points described above for the electrolytic soft etching treatment, the chemical treatment apparatus for plating treatment further includes the following fifth and sixth treatments. Become. That is, fifthly, in this chemical processing apparatus for plating, the plating is performed while being conveyed horizontally, that is, horizontally instead of the vertical as in the conventional example of this kind. In other various manufacturing processes, it is common that various processes are performed while being transported horizontally. Therefore, it becomes easy to connect and interlock such another device with the chemical processing device for performing the plating process. Sixth, in this chemical processing apparatus for plating, the plating is carried out while the processing solution A is conveyed horizontally instead of being vertically suspended from above in the processing solution as in the conventional example of this kind. Since the processing is performed, it is easy to close the upper surface side of the processing chamber 9 of the apparatus with the lid 8 and seal the entire apparatus. Therefore, the treatment liquid A which is the plating liquid
It is possible to prevent the gas, odor, etc. generated from the product from flowing out.

【0028】[0028]

【発明の効果】本発明に係る請求項1,2,3の化学処
理装置は、以上説明したごとく、処理液中にてプリント
配線基板等の薄板材について、上下の搬送ローラー群で
その一側端縁を挟み込んで送ると共に、下側の多数の噴
出孔から処理液を噴射して水平に支えるようにしたこと
により、次の効果を発揮する。まず第1に、プリント配
線基板等の薄板材について、わん曲,反り,垂れ下がり
等が防止される。すなわち、プリント配線基板等は、は
ね上がり,わん曲,変形,反り,垂れ下がり等が防止さ
れ、損傷することなくスムーズかつ確実に水平に搬送さ
れ、不良が少なく歩留まりが向上する。特に最近、極薄
化が進むと共に材料のソフト化・フレキシブル化が進む
プリント配線基板において、係る効果の意義は大きい。
As described above, the chemical treatment apparatus according to the first, second, and third aspects of the present invention has one side of the upper and lower conveying roller groups for the thin plate material such as the printed wiring board in the treatment liquid. The following effects are exhibited by sandwiching the edge and sending it, and by spraying the treatment liquid horizontally from a large number of ejection holes on the lower side. First, the thin plate material such as the printed wiring board is prevented from bending, warping, sagging, and the like. That is, the printed wiring board and the like are prevented from splashing, bending, deforming, warping, and drooping, and are smoothly and reliably transported horizontally without being damaged, and there are few defects and the yield is improved. In particular, in the printed wiring board, which has recently become ultra-thin and has become softer and more flexible as a material, such an effect is significant.

【0029】第2に、電解ソフトエッチング処理その他
の化学処理が、十分かつ確実に行われる。すなわち、プ
リント配線基板の表面の酸化,汚れ,附着物等が多く・
激しい場合でも、電解ソフトエッチング処理により、こ
れらが確実に除去されると共に、表面に微細な凹凸を形
成する粗化も十分に行われ、もって事後のレジスト貼付
も完全で、プリント配線基板の高密度化,多層化,ファ
イン化,微細回路化に容易に対応可能となる。その他、
プリント配線基板等の薄板材に対する化学処理が、十分
かつ確実に行われることにより、種々の利点を有してな
る。
Second, the electrolytic soft etching process and other chemical processes are sufficiently and surely performed. That is, the surface of the printed wiring board is often oxidized, soiled and attached.
Even in severe cases, the electrolytic soft etching treatment ensures that these are removed, and the surface is sufficiently roughened to form fine irregularities, so that post-application of resist is also complete, and high-density printed wiring boards can be obtained. It is possible to easily deal with the trend toward higher resolution, multi-layering, finer processing, and finer circuits. Other,
The chemical treatment of a thin plate material such as a printed wiring board is sufficiently and surely performed, so that it has various advantages.

【0030】第3に、電解ソフトエッチング処理その他
の化学処理が、ムラ・バラツキなく均一に行われる。す
なわち、プリント配線基板の表面の酸化,汚れ,附着物
等の除去および表面の粗化は、ムラ・バラツキがなく全
体的に均一に行われ、もってこの面からも、事後のレジ
スト貼付が完全で、プリント配線基板の高密度化,多層
化,ファイン化,微細回路化に十分対応可能となる。そ
の他、プリント配線基板等の薄板材に対する化学処理
が、ムラ・バラツキなく全体的に均一に行われることに
より、種々の利点を有してなる。
Thirdly, the electrolytic soft etching treatment and other chemical treatments are uniformly performed without unevenness or variation. That is, the surface of the printed wiring board is uniformly oxidized without any unevenness or variation in the removal of stains, adhering substances, etc. and the roughening of the surface. This makes it possible to sufficiently cope with higher density, multi-layer, finer, and finer circuits of printed wiring boards. In addition, the chemical treatment of a thin plate material such as a printed wiring board is uniformly performed on the whole without unevenness or variation, which has various advantages.

【0031】第4に、しかもこのような化学処理は、プ
リント配線基板等の薄板材を連続的に搬送しつつ行え
る。すなわち、一定寸法毎に切断された短尺材よりなる
プリント配線基板等の薄板材の場合でも、エンドレスな
帯状のものと同時に、連続的に搬送しつつ浸漬,噴流等
による化学処理が行え、作業効率が向上する。
Fourth, such chemical treatment can be performed while continuously transporting a thin plate material such as a printed wiring board. That is, even in the case of a thin plate material such as a printed wiring board made of a short material cut into a certain size, endless belt-like material can be simultaneously conveyed and chemically treated by dipping, jetting, etc. Is improved.

【0032】第5に、これらに加え請求項3のめっき処
理を行う化学処理装置に関しては、水平に搬送しつつこ
れが行われることにより、更に次の効果を発揮する。す
なわち、めっき処理の前後のプリント配線基板のその他
の各種製造工程において、水平に搬送されつつ各種処理
が行われていることと共通化されるので、他の装置とめ
っき処理を行う化学処理装置との連結・連動化が可能と
なり、各製造工程の自動ライン化への道が開ける。
Fifthly, in addition to these, as for the chemical treatment apparatus for carrying out the plating treatment of the third aspect, by carrying out this while horizontally conveying, the following effects are further exhibited. That is, in the various other manufacturing processes of the printed wiring board before and after the plating process, it is common that the various processes are performed while being horizontally transported. It will be possible to connect and interlock with each other, opening the way to an automated line for each manufacturing process.

【0033】第6に、これと共に請求項3のめっき処理
を行う化学処理装置は、更に次の効果も発揮する。すな
わち、この化学処理装置では、プリント配線基板を水平
に搬送しつつめっき処理が行われるので、装置の上面側
を閉鎖して装置を密閉することができ、この種従来例の
ように、めっき液たる処理液から発生したガス,臭気等
が外部に流れ出すことが、防止可能となる。そこで、こ
のようなガス,臭気等による工場内の汚染,機械・製品
等の腐食・劣化、作業環境の悪化、作業者の健康への悪
影響、等々が確実に回避されるようになる。以上のよう
に、この種従来例に存した問題点が一掃される等、本発
明の発揮する効果は顕著にして大なるものがある。
Sixth, the chemical treatment apparatus for carrying out the plating treatment according to the third aspect also exhibits the following effects. That is, in this chemical processing device, the plating process is performed while the printed wiring board is conveyed horizontally, so that the upper surface side of the device can be closed to hermetically seal the device. It is possible to prevent gas, odor, etc. generated from the barrel treatment liquid from flowing out. Therefore, it is possible to surely avoid contamination in the factory due to such gases and odors, corrosion / deterioration of machines / products, deterioration of working environment, adverse effects on the health of workers, and the like. As described above, the effects of the present invention can be remarkably large, such as the problems existing in this type of conventional example are eliminated.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る化学処理装置の実施例を示す、正
断面図である。
FIG. 1 is a front sectional view showing an embodiment of a chemical processing apparatus according to the present invention.

【図2】同側面説明図である。FIG. 2 is an explanatory side view of the same.

【符号の説明】[Explanation of symbols]

1 液槽 2 搬送ローラー 3 駆動機構 4 噴出孔 5 レベル規制バー 6 マイナス電極 7 プラス電極 8 蓋 9 処理室 10 モータ 11 伝達手段 12 シャフト 13 軸受 14 多孔板 15 スプリング A 処理液 P プリント配線基板(薄板材) DESCRIPTION OF SYMBOLS 1 Liquid tank 2 Conveying roller 3 Driving mechanism 4 Jet hole 5 Level regulation bar 6 Minus electrode 7 Positive electrode 8 Lid 9 Processing chamber 10 Motor 11 Transmission means 12 Shaft 13 Bearing 14 Perforated plate 15 Spring A Treatment liquid P Printed wiring board (thin) Plate material)

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C25F 7/00 C 8414−4K L 8414−4K H05K 3/06 Q 9443−4E 3/18 G 7511−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical display location C25F 7/00 C 8414-4K L 8414-4K H05K 3/06 Q 9443-4E 3/18 G 7511 -4E

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 薄板材を水平に搬送しつつ処理液に浸漬
して化学処理を行う装置であって、該処理液中で該薄板
材の一側端縁を挟み込んで送る上下の搬送ローラー群
と、該処理液中で該薄板材に向け下側から処理液を噴射
して支える多数の噴出孔と、を有してなることを特徴と
する化学処理装置。
1. A device for performing a chemical treatment by immersing a thin plate material in a horizontal direction while immersing it in a treatment liquid, and a group of upper and lower conveying rollers for feeding by sandwiching one side edge of the thin plate material in the treatment liquid. And a plurality of ejection holes for ejecting and supporting the treatment liquid from the lower side toward the thin plate material in the treatment liquid.
【請求項2】 プリント配線基板の製造工程で用いら
れ、該プリント配線基板を水平に搬送しつつ処理液に浸
漬して電解ソフトエッチング処理を行う装置であって、
該プリント配線基板が浸漬される該処理液の液槽と、該
液槽の処理液中に配され該プリント配線基板の一側端縁
を挟み込んで送る上下の搬送ローラー群と、該液槽外に
配され該搬送ローラー群を回転駆動する駆動機構と、該
液槽の処理液中に配され、搬送される該プリント配線基
板の下面に間隔を存しほぼ全面的に対向位置し、プリン
ト配線基板に向け処理液を噴射して下側から支える多数
の噴出孔と、該液槽の処理液中に水平に配され、搬送さ
れる該プリント配線基板の上面に対向位置し、該噴出孔
から噴射された該処理液にてプリント配線基板が適宜下
側から押し当てられるレベル規制バーと、該液槽の処理
液側に水平に配されたマイナス電極と、該搬送ローラー
群およびプリント配線基板側に配されたプラス電極と、
を有してなることを特徴とする化学処理装置。
2. An apparatus used in a manufacturing process of a printed wiring board, which carries out the electrolytic soft etching treatment by immersing the printed wiring board in a treatment liquid while horizontally conveying the printed wiring board,
A liquid tank of the processing liquid in which the printed wiring board is dipped, a group of upper and lower conveying rollers which are arranged in the processing liquid of the liquid tank and which sandwiches one side edge of the printed wiring board to feed the liquid, and the outside of the liquid tank. And a drive mechanism for rotating and driving the transport roller group, and a printed wiring board that is disposed in the processing liquid in the liquid tank and is substantially entirely opposed to the lower surface of the printed wiring board that is transported, A large number of ejection holes for ejecting the treatment liquid toward the substrate and supporting the treatment liquid from below, and a plurality of ejection holes which are arranged horizontally in the treatment liquid in the liquid tank and which are opposed to the upper surface of the printed wiring board to be conveyed. A level control bar on which the printed wiring board is appropriately pressed by the jetted processing liquid from the lower side, a negative electrode horizontally arranged on the processing liquid side of the liquid tank, the transfer roller group and the printed wiring board side A plus electrode arranged in
A chemical processing apparatus comprising:
【請求項3】 プリント配線基板の製造工程で用いら
れ、該プリント配線基板を水平に搬送しつつ処理液に浸
漬してめっき処理を行う装置であって、該プリント配線
基板が浸漬される該処理液の液槽と、該液槽の処理液中
に配され該プリント配線基板の一側端縁を挟み込んで送
る上下の搬送ローラー群と、該液槽外に配され該搬送ロ
ーラー群を回転駆動する駆動機構と、該液槽の処理液中
に配され、搬送される該プリント配線基板の下面に間隔
を存しほぼ全面的に対向位置し、プリント配線基板に向
け処理液を噴射して下側から支える多数の噴出孔と、該
液槽の処理液中に水平に配され、搬送される該プリント
配線基板の上面に対向位置し、該噴出孔から噴射された
該処理液にてプリント配線基板が適宜下側から押し当て
られるレベル規制バーと、該液槽の処理液側に水平に配
されたプラス電極と、該搬送ローラー群およびプリント
配線基板側に配されたマイナス電極と、を有してなるこ
とを特徴とする化学処理装置。
3. An apparatus which is used in a manufacturing process of a printed wiring board, and which carries out a plating treatment by immersing the printed wiring board in a treatment liquid while horizontally conveying the printed wiring board, wherein the treatment is performed in which the printed wiring board is immersed. A liquid tank of liquid, upper and lower conveying roller groups arranged in the processing liquid of the liquid tank and sandwiching one side edge of the printed wiring board to send, and rotationally driving the conveying roller group arranged outside the liquid tank. Driving mechanism and the processing liquid in the liquid tank, which is disposed on the lower surface of the printed wiring board to be conveyed and is almost entirely opposed to the lower surface, and sprays the processing liquid toward the printed wiring board. A large number of ejection holes supported from the side, and the printed wiring board is positioned opposite to the upper surface of the printed wiring board that is horizontally arranged and conveyed in the treatment liquid of the liquid tank, and the treatment liquid ejected from the ejection holes Level regulation bar where the board is pressed from below as appropriate And a plus electrode horizontally arranged on the treatment liquid side of the liquid tank, and a minus electrode arranged on the transport roller group and the printed wiring board side.
JP29091191A 1991-10-08 1991-10-08 Chemical processing equipment Expired - Fee Related JPH0696796B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29091191A JPH0696796B2 (en) 1991-10-08 1991-10-08 Chemical processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29091191A JPH0696796B2 (en) 1991-10-08 1991-10-08 Chemical processing equipment

Publications (2)

Publication Number Publication Date
JPH06108297A JPH06108297A (en) 1994-04-19
JPH0696796B2 true JPH0696796B2 (en) 1994-11-30

Family

ID=17762106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29091191A Expired - Fee Related JPH0696796B2 (en) 1991-10-08 1991-10-08 Chemical processing equipment

Country Status (1)

Country Link
JP (1) JPH0696796B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3120073B2 (en) * 1999-02-22 2000-12-25 東京化工機株式会社 Chemical treatment equipment
CN100428871C (en) * 2003-12-19 2008-10-22 财团法人工业技术研究院 Method for forming plain conductor pattern by means of ink-jet
KR100928951B1 (en) * 2008-06-09 2009-11-30 세메스 주식회사 Method of flowing chemical, and method and apparatus of manufacturing integrated circuit device using the same
KR101538431B1 (en) * 2013-12-11 2015-07-22 주식회사 엠엠테크 apparatus for chemically reinforcing glass

Also Published As

Publication number Publication date
JPH06108297A (en) 1994-04-19

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