JPS5831883Y2 - Electroless plating device for thin plates with through holes - Google Patents
Electroless plating device for thin plates with through holesInfo
- Publication number
- JPS5831883Y2 JPS5831883Y2 JP1981160242U JP16024281U JPS5831883Y2 JP S5831883 Y2 JPS5831883 Y2 JP S5831883Y2 JP 1981160242 U JP1981160242 U JP 1981160242U JP 16024281 U JP16024281 U JP 16024281U JP S5831883 Y2 JPS5831883 Y2 JP S5831883Y2
- Authority
- JP
- Japan
- Prior art keywords
- chemical liquid
- chemical
- tank
- thin plate
- electroless plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Coating Apparatus (AREA)
- Chemically Coating (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Description
【考案の詳細な説明】
本考案は、例えばプリント基板などのように透孔を穿っ
た薄板状の被加工物に無電解メッキを施す装置に関する
ものである。[Detailed Description of the Invention] The present invention relates to an apparatus that performs electroless plating on a thin plate-like workpiece with a through hole, such as a printed circuit board.
プリント基板を製造する際、回路の印刷及び電解メッキ
を施す前処理・とじて、電気絶縁性の薄板の表面に薄い
(例えば5〜35μ)の銅箔を形成し、多数の細い透孔
を穿ち、透孔内を清掃してから無電解メッキを施す。When manufacturing printed circuit boards, a thin (for example, 5 to 35μ) copper foil is formed on the surface of an electrically insulating thin plate and a large number of thin holes are punched in the pretreatment and binding process before circuit printing and electrolytic plating. , Clean the inside of the through hole and then apply electroless plating.
上記の細い透孔の径は、数mmのものもあるが1mm以
下のものもある。The diameter of the above-mentioned narrow through hole may be several mm, but it may also be 1 mm or less.
このような細い孔の内壁に無電解メッキを施すには被加
工物を薬液中に浸漬しただけでは薬液が孔の内壁に接触
しに<<、また孔内の薬液が流動しないので、従来一般
に被加工物を籠又は網に入れて薬液中に浸し、上記の籠
又は網に揺動を与えて被加工物を薬液中で揺り動かして
透孔の内壁面に薬液を接触・流動させる。To perform electroless plating on the inner wall of such a narrow hole, simply immersing the workpiece in the chemical solution would cause the chemical solution to come into contact with the inner wall of the hole, and the chemical solution within the hole would not flow, so conventional methods The workpiece is placed in a cage or a net and immersed in the chemical solution, and the cage or net is shaken to shake the workpiece in the chemical solution so that the chemical solution comes into contact with the inner wall surface of the through hole and flows.
しかし、上記のように被加工物を籠や網に入れて薬液内
で揺り動かす作業は多大の労力を要し、しかもこうした
作業は自動化が容易でない。However, as described above, placing the workpiece in a cage or a net and shaking it in a chemical solution requires a great deal of labor, and furthermore, such work is not easy to automate.
本考案は上述の事情に鑑みて為され、透孔を有する薄板
状の被加工物を自動的かつ連続的に薬液中を通過させる
とともに、透孔の内壁面に薬液を流動させて無電解メッ
キを施すことのできる装置を提供しようとするものであ
る。The present invention was developed in view of the above-mentioned circumstances, and involves automatically and continuously passing a thin plate-shaped workpiece having through-holes through a chemical solution, and flowing the chemical solution onto the inner wall surface of the through-holes for electroless plating. The aim is to provide a device that can perform this.
”上記の目的を遠戚するため、本考案は、所定の液面を
保たせるように溢流口を設けた無電解メッキ薬液槽と、
上記の薬液槽の液面下に薄板を水平方向に搬送するよう
に列設して送りローラと、前記の薬液槽から溢流した薬
液を貯える薬液貯槽と、上記薬液貯槽内の薬液を薬液槽
に汲み上げる薬液ポンプと、上記薬液ポンプによって汲
み上げられた薬液を前記のローラによって搬送されてい
る薄板の表面に吹きつけるように設置された薬液噴射ノ
ズルとを設け、かつ、前記の薬液槽の側面が前記の搬送
用ローラの列と交わる位置に薄板送り込み用の水平に細
長い開口と薄板送り出し用の水平に細長い開口とを設け
ることにより、被加工物である透孔を有する薄板を薬液
槽の液面下で水平に搬送しつつその板面に薬液を吹きつ
け得るように構成したことを特徴とする。``In order to achieve the above object, the present invention provides an electroless plating chemical tank having an overflow port to maintain a predetermined liquid level;
A feed roller is arranged in which thin plates are horizontally conveyed below the liquid surface of the chemical liquid tank, a chemical liquid storage tank stores the chemical liquid overflowing from the chemical liquid tank, and the chemical liquid in the chemical liquid storage tank is transferred to the chemical liquid tank. a chemical liquid pump that pumps the chemical liquid to By providing a horizontally elongated opening for feeding the thin plate and a horizontally elongated opening for feeding the thin plate at positions intersecting with the rows of the conveying rollers, the thin plate with through holes, which is the workpiece, can be moved to the liquid level of the chemical tank. It is characterized by being configured so that the chemical solution can be sprayed onto the plate surface while being conveyed horizontally below.
次に本考案の一実施例を第1図及び第3図について説明
する。Next, an embodiment of the present invention will be described with reference to FIGS. 1 and 3.
第1図は垂直縦断面図を示す。FIG. 1 shows a vertical longitudinal section.
無電解メッキの薬液槽1内に薬液2を入れ、この薬液の
液面が所定の液面Aよりも上昇しないよう、薬液槽1の
側面に溢流口3,3を穿つとともに、上記の溢流口3゜
3から溢流した薬液を受ける薬液貯槽4を薬液槽の下方
に設ける。A chemical solution 2 is put into a chemical solution tank 1 for electroless plating, and overflow ports 3, 3 are bored in the side of the chemical solution tank 1 so that the level of this chemical solution does not rise above a predetermined level A. A chemical liquid storage tank 4 is provided below the chemical liquid tank to receive the chemical liquid overflowing from the flow port 3°3.
Bは薬液貯槽4内の薬液の液面である。B is the liquid level of the chemical liquid in the chemical liquid storage tank 4.
被加工物である薄板は後に詳述する多数組の送りローラ
5 a 、5 bによって矢印C方向に薬液2内へ搬入
し、矢印り方向に搬出する。A thin plate, which is a workpiece, is carried into the chemical solution 2 in the direction of arrow C by a large number of sets of feed rollers 5 a and 5 b, which will be described in detail later, and is carried out in the direction of arrow C.
薬液槽1の側板が前記の搬入路Cと交わる個所に、水平
方向の細長い開口6を穿ち、同様に搬出路りと交わる個
所に開ロアを穿つ。An elongated horizontal opening 6 is bored at the location where the side plate of the chemical solution tank 1 intersects with the carry-in path C, and an open lower opening is similarly drilled at the location where the side plate intersects with the carry-out path.
上記の開口6,7から流出する薬液を前記の薬液貯槽4
に導くよう受板8,8を薬液槽1と薬液貯槽4との間に
固着する。The chemical liquid flowing out from the openings 6 and 7 is transferred to the chemical liquid storage tank 4.
The receiving plates 8, 8 are fixed between the chemical liquid tank 1 and the chemical liquid storage tank 4 so as to guide the chemical liquid.
上記の開口6,7は所定液面Aよりも下方に位置し、こ
こから薬液が流出するので、薬液槽1内の液面を所定の
液面Aに保たせるため薬液ポンプ9,9′を設けて薬液
貯槽4内の薬液を薬液槽1に汲み上げるように構成する
。The openings 6 and 7 are located below the predetermined liquid level A, and the chemical liquid flows out from there. Therefore, in order to maintain the liquid level in the chemical liquid tank 1 at the predetermined liquid level A, the chemical liquid pumps 9 and 9' are activated. The chemical liquid in the chemical liquid storage tank 4 is pumped up into the chemical liquid tank 1.
薬液槽内の薬液面が所定液面Aにあるとき、開口6,7
の水深りに相当する液圧によって開口6,7から流出す
る薬液の流量よりも薬液ポンプ9と同9′との吐出量合
計の方が大きいように設定し、かつ溢流口3,3の水平
方向の幅寸法Wを充分に大きく設定することにより所定
の液面Aを維持することができる。When the chemical liquid level in the chemical liquid tank is at the predetermined liquid level A, the openings 6 and 7
The total discharge amount of the chemical liquid pumps 9 and 9' is set to be larger than the flow rate of the chemical liquid flowing out from the openings 6 and 7 due to the hydraulic pressure corresponding to the water depth of . A predetermined liquid level A can be maintained by setting the horizontal width dimension W to be sufficiently large.
10はポンプ駆動用のモータである。前記の矢印Cおよ
び同りを結ぶ線に沿って送りローラ5 a 、5 bを
列設する。10 is a motor for driving the pump. The feed rollers 5a and 5b are arranged along the arrow C and the line connecting the same.
第2図は薬液槽1と薬液貯槽4とのII −II断面図
に一対の送りローラ5 a 、5 bを描いた説明図で
ある。FIG. 2 is an explanatory diagram showing a pair of feed rollers 5 a and 5 b in a sectional view taken along line II-II of the chemical liquid tank 1 and the chemical liquid storage tank 4.
溢流口3から流出する薬液流失口Eを矢印Fのように薬
液貯槽4に導くため、薬液貯槽4の片方の側板4aを上
方に延長して薬液槽1の側板の外側に対向離間させ、そ
の上端4bを薬液面Aよりも高くする。In order to guide the chemical outflow outlet E flowing out from the overflow port 3 to the chemical liquid storage tank 4 as shown by the arrow F, one side plate 4a of the chemical liquid storage tank 4 is extended upward and spaced apart from the side plate of the chemical liquid tank 1 to face the outside of the side plate. The upper end 4b is made higher than the chemical liquid level A.
送りローラ5aを薬液槽1内に回転自在に支承し、その
軸5a−1の一端を薬液槽1の側板及び薬液貯槽4の側
板4aから突出させ、その先端にスプロケット58−2
を固着し、駆動チェノ(図示せず)によって回転駆動し
得るように構成する。A feed roller 5a is rotatably supported in the chemical liquid tank 1, and one end of the shaft 5a-1 protrudes from the side plate of the chemical liquid tank 1 and the side plate 4a of the chemical liquid storage tank 4, and a sprocket 58-2 is attached to the tip of the shaft 5a-1.
is fixed and configured to be rotationally driven by a drive chino (not shown).
上記の軸5 a 1が薬液槽1の側板を貫通している
個所に若干の漏液があっても、漏液流矢印Gは前記の薬
液流Eと合流して薬液貯槽4に流入するから差支えない
。Even if there is some leakage at the point where the shaft 5a1 passes through the side plate of the chemical tank 1, the leakage flow arrow G will merge with the chemical flow E and flow into the chemical storage tank 4. No problem.
本実施例においては送りローラ5aおよび同5bはそれ
ぞれローラ軸5a+、5btに柔軟な弾性体(たとえば
スポンジゴム)の筒を嵌着して構成する。In this embodiment, the feed rollers 5a and 5b are constructed by fitting tubes of flexible elastic material (for example, sponge rubber) onto roller shafts 5a+ and 5bt, respectively.
そして送りローラ5bを同5aと平行に、軽く接触させ
て回転自在に支承する。Then, the feed roller 5b is rotatably supported in parallel with the feed roller 5a with light contact therebetween.
これにより、被加工物である薄板11が一対のローラ5
a 、5 b間に差し入れられると、第1図に示した
矢印C,D方向に搬送される。As a result, the thin plate 11 that is the workpiece is moved between the pair of rollers 5
When inserted between a and 5b, it is conveyed in the directions of arrows C and D shown in FIG.
(第1図参照)以上のようにして薄板11が送りローラ
5a、5b・・・・・・によって搬送される水平面を説
明の便宜上搬送面Hと名付ける。(See FIG. 1) The horizontal plane on which the thin plate 11 is conveyed by the feed rollers 5a, 5b, . . . in the above manner is named a conveyance surface H for convenience of explanation.
上記の搬送面Hの上方に薬液噴射ノズル12゜12・・
・・・・を列設し、前述の薬液汲み上げ用のポンプ9に
接続して薬液を搬送面Hに向けて噴出させる。A chemical liquid injection nozzle 12°12 is placed above the above conveyance surface H.
.
同様に、搬送面Hの下方にも薬液噴射ノズル12’、
12’・・・・・を列設して薬液ポンプ9′に接続し、
薬液を搬送面Hに向けて噴出させる。Similarly, below the conveyance surface H, there are also chemical liquid injection nozzles 12',
12'... are arranged in a row and connected to the chemical pump 9',
The chemical solution is ejected toward the transport surface H.
第3図は上記の薬液噴射ノズル12.12’の詳細を示
すための説明図で、薬液槽1のII−II面による断面
図に薬液噴射ノズル12.12’を記入し、読図を容易
にするため送りローラ5a、5bを省略しである。FIG. 3 is an explanatory drawing for showing the details of the above-mentioned chemical liquid injection nozzle 12.12', and the chemical liquid injection nozzle 12.12' is drawn in the cross-sectional view taken along the plane II-II of the chemical liquid tank 1 for easy reading. Therefore, the feed rollers 5a and 5b are omitted.
11は搬送面Hに沿って搬送されている薄板である。11 is a thin plate being conveyed along the conveyance surface H.
薬液噴射ノズル12は薬液槽1の幅寸法とほぼ等長の管
状に形成し、搬送面Hと適宜離間して搬送面Hと平行に
薬液槽1の内壁面に固着する。The chemical liquid injection nozzle 12 is formed into a tubular shape having approximately the same length as the width of the chemical liquid tank 1, and is fixed to the inner wall surface of the chemical liquid tank 1 in parallel with the transport surface H at an appropriate distance from the transport surface H.
上記の薬液噴射ノズル12の下面に、下方に向けた噴射
孔12 a 、12 a・・・・・・を列設する。On the lower surface of the chemical liquid injection nozzle 12, downwardly directed injection holes 12a, 12a, . . . are arranged in a row.
12bは薬液送入口であり、薬液ポンプ9に接続配管す
る。Reference numeral 12b is a chemical liquid inlet port, which is connected to the chemical liquid pump 9 by piping.
薬液噴射ノズル12′は上述の薬液噴射ノズル12と同
様に構威し、噴射孔12 a’、12 a’を搬送面H
に向け、該搬送面Hの下方に適宜離間させて水平に設置
する。The chemical liquid injection nozzle 12' is constructed in the same manner as the above-mentioned chemical liquid injection nozzle 12, and the injection holes 12a' and 12a' are connected to the conveying surface H.
It is installed horizontally below the conveyance surface H with an appropriate distance therebetween.
本考案装置は以上のような構成からなり、これを用いて
透孔を有する薄板に無電解メッキを施すには、送りロー
ラ5aを送り方向に回転させながら薄板を矢印C方向に
薬液槽1内へ送りこむとともに、薬液ポンプ9,9′を
運転して薬液貯槽4Dの薬液を汲み上げて薬液噴射ノズ
ル12.12’から噴出させる。The device of the present invention has the above-mentioned configuration, and in order to perform electroless plating on a thin plate having through-holes, the thin plate is moved in the direction of arrow C into the chemical bath 1 while rotating the feed roller 5a in the feeding direction. At the same time, the chemical liquid pumps 9 and 9' are operated to draw up the chemical liquid from the chemical liquid storage tank 4D and jet it out from the chemical liquid injection nozzle 12, 12'.
薄板11は開口6から薬液槽1内に搬送され、無電解メ
ッキ薬液2の中を通って開ロアから送り出される。The thin plate 11 is conveyed into the chemical bath 1 through the opening 6, passes through the electroless plating chemical 2, and is sent out from the open lower part.
以上のようにして薄板が薬液2内を搬送面Hに沿って水
平に送られている間、その上下両面に薬液噴射ノズル1
2.12’から薬液を噴射される。While the thin plate is being fed horizontally within the chemical solution 2 along the conveyance surface H as described above, the chemical solution injection nozzle 1 is placed on both the upper and lower surfaces of the thin plate.
2. Chemical liquid is sprayed from 12'.
噴射された薬液はその動圧により薄板に穿たれた細い透
孔内を流動し、透孔の内壁面にムラ無く接触する。The injected chemical solution flows through the thin hole bored in the thin plate due to its dynamic pressure, and evenly contacts the inner wall surface of the hole.
このため、薄板が薬液槽1内を通過する間に該薄板に穿
たれた透孔の内壁面に均一に無電解メッキが行なわれる
。Therefore, while the thin plate passes through the chemical bath 1, electroless plating is uniformly applied to the inner wall surface of the through hole formed in the thin plate.
上述の作用から明らかなように、本考案装置によれば多
数の薄板に無電解メッキを施す場合、これらの薄板を順
次に送りローラ5 a 、5 bの間に供給すると自動
的にメッキ処理が行われるので労力を要しないのみでな
く、各薄板に対して均一な処理が為されるので仕上がり
品質の均一性が保証される。As is clear from the above-mentioned operation, when electroless plating is applied to a large number of thin plates according to the apparatus of the present invention, the plating process is automatically performed when these thin plates are sequentially fed between the feed rollers 5a and 5b. Not only does this process require less labor, but it also guarantees uniformity in finished quality because each thin plate is treated uniformly.
また、透孔を穿った薄板状の被加工物であれば、その形
状や寸法が不同であっても別設の調節変更を要せずに各
種形状寸法の被加工物に無電解メッキを施すことができ
るので、本考案装置は特に多機種混合生産ライン中に無
電解メッキ装置を組みこむ場合に好適である。In addition, if the workpiece is a thin plate with a through hole, electroless plating can be applied to workpieces of various shapes and sizes without the need for separate adjustment changes even if the shapes and dimensions are different. Therefore, the device of the present invention is particularly suitable for incorporating an electroless plating device into a multi-product mixed production line.
その上、薬液槽1を蓋13で覆っても作動を妨げられる
ことが無いので薬液の蒸気や飛沫の発散を防止すること
が容易で作業環境を汚染する虞れが無い。Moreover, even if the chemical solution tank 1 is covered with the lid 13, the operation is not hindered, so it is easy to prevent the vapor and droplets of the chemical solution from dispersing, and there is no risk of contaminating the working environment.
以上に詳述した作用により、本考案を適用すると、透孔
を有する薄板状の被加工物に自動的かつ連続的に無電解
メッキを施し、細い透孔の内壁面にも均一なメッキ層を
付着させることができるという優れた実用的効果を奏す
る。Due to the effects detailed above, when the present invention is applied, electroless plating can be applied automatically and continuously to a thin plate-shaped workpiece having a through hole, and a uniform plating layer can be applied even to the inner wall surface of a narrow through hole. It has an excellent practical effect of being able to be attached.
図面は本考案に係る透孔を有する薄板の無電解メッキ装
置の一実施例を示し、第1図は垂直面による縦断面図、
第2図は送すローラ機構の説明図、第3図は薬液噴射ノ
ズルの説明図である。
1・・・・・・薬液槽、2・・・・・・無電解メッキの
薬液、3・・・・・・溢流口、4・・・・・・薬液貯槽
、5a、5b・・・・・・送りローラ、5a−1,5b
t・・・・・・送りローラ軸、5a−2・・・・・・ス
プロケット、6,7・・・・・・開口、9・・・・・・
薬液ポンプ、11・・・・・・薄板、12.12’・・
・・・・薬液噴射ノズル、12a、12a′・・・・・
・噴射孔、13・・・・・・蓋。The drawings show an embodiment of the electroless plating apparatus for thin plates having through-holes according to the present invention, and FIG. 1 is a vertical cross-sectional view taken in a vertical plane;
FIG. 2 is an explanatory diagram of the feeding roller mechanism, and FIG. 3 is an explanatory diagram of the chemical liquid injection nozzle. 1... Chemical solution tank, 2... Chemical solution for electroless plating, 3... Overflow port, 4... Chemical solution storage tank, 5a, 5b... ...Feed roller, 5a-1, 5b
t...Feed roller shaft, 5a-2...Sprocket, 6, 7...Opening, 9...
Chemical pump, 11...Thin plate, 12.12'...
...Medical liquid injection nozzle, 12a, 12a'...
・Injection hole, 13... Lid.
Claims (1)
キ薬液槽と、上記の薬液槽の液面下で水平方向に薄板を
搬送するように列設した送りローラと、前記の薬液槽か
ら溢流した薬液を貯える薬液貯槽と、上記薬液貯槽内の
薬液を薬液槽に汲み上げる薬液ポンプと、上記薬液ポン
プによって汲み上げられた薬液を前記のローラによって
搬送されている薄板の表面に吹きつけるように配設され
た薬液噴射ノズルとよりなり、かつ、前記の薬液槽の側
面が前記の搬送用ローラの列と交わる位置に薄板送り込
み用の水平に細長い開口と薄板送り出し用の水平に細長
い開口とを設けることにより、被加工物である透孔を有
する薄板を薬液槽の液面下に水平に搬送しつつその板面
に薬液を吹きつけ得るように構成したことを特徴とする
透孔を有する薄板の無電解メッキ装置。An electroless plating chemical tank provided with an overflow port to maintain a predetermined liquid level, a feed roller arranged in a row to convey the thin plate horizontally below the liquid level of the chemical tank, and the chemical liquid A chemical liquid storage tank that stores the chemical liquid overflowing from the tank, a chemical liquid pump that pumps the chemical liquid in the chemical liquid storage tank to the chemical liquid tank, and a chemical liquid pumped by the chemical liquid pump and sprays it onto the surface of the thin plate being conveyed by the roller. A horizontally elongated opening for feeding the thin plate and a horizontally elongated opening for feeding the thin plate at a position where the side surface of the chemical liquid tank intersects with the row of the conveying rollers. By providing a through-hole, the thin plate having the through-hole, which is a workpiece, can be conveyed horizontally below the liquid surface of the chemical tank and the chemical liquid can be sprayed onto the plate surface. Electroless plating equipment for thin plates.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1981160242U JPS5831883Y2 (en) | 1981-10-29 | 1981-10-29 | Electroless plating device for thin plates with through holes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1981160242U JPS5831883Y2 (en) | 1981-10-29 | 1981-10-29 | Electroless plating device for thin plates with through holes |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5865361U JPS5865361U (en) | 1983-05-02 |
JPS5831883Y2 true JPS5831883Y2 (en) | 1983-07-14 |
Family
ID=29952661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1981160242U Expired JPS5831883Y2 (en) | 1981-10-29 | 1981-10-29 | Electroless plating device for thin plates with through holes |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5831883Y2 (en) |
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ATE550573T1 (en) | 2004-10-05 | 2012-04-15 | Fallbrook Technologies Inc | CONTINUOUSLY ADJUSTABLE GEARBOX |
CN101346266B (en) | 2005-10-28 | 2011-11-23 | 福博科技术公司 | Electromotive drives |
KR101422475B1 (en) | 2005-11-22 | 2014-07-28 | 폴브룩 인텔렉츄얼 프로퍼티 컴퍼니 엘엘씨 | A bicycle with continuously variable transmission |
WO2008002457A2 (en) | 2006-06-26 | 2008-01-03 | Fallbrook Technologies Inc. | Continuously variable transmission |
US8738255B2 (en) | 2007-02-01 | 2014-05-27 | Fallbrook Intellectual Property Company Llc | Systems and methods for control of transmission and/or prime mover |
CN101657653B (en) | 2007-02-12 | 2014-07-16 | 福博科知识产权有限责任公司 | Continuously variable transmissions and methods therefor |
EP2700843A3 (en) | 2007-02-16 | 2017-11-08 | Fallbrook Intellectual Property Company LLC | Infinitely variable transmissions, continuously variable transmissions, methods, assemblies, subassemblies, and components therefor |
CN101720397B (en) | 2007-04-24 | 2013-01-02 | 福博科技术公司 | Electric traction drives |
CN103697120B (en) | 2007-07-05 | 2017-04-12 | 福博科技术公司 | Continuously variable transmission |
CA2708634C (en) | 2007-12-21 | 2017-08-01 | Fallbrook Technologies Inc. | Automatic transmissions and methods therefor |
US8313405B2 (en) | 2008-02-29 | 2012-11-20 | Fallbrook Intellectual Property Company Llc | Continuously and/or infinitely variable transmissions and methods therefor |
CN102084155B (en) | 2008-06-23 | 2014-06-11 | 福博科知识产权有限责任公司 | Continuously variable transmission |
CA2732668C (en) | 2008-08-05 | 2017-11-14 | Fallbrook Technologies Inc. | Methods for control of transmission and prime mover |
US8469856B2 (en) | 2008-08-26 | 2013-06-25 | Fallbrook Intellectual Property Company Llc | Continuously variable transmission |
US8167759B2 (en) | 2008-10-14 | 2012-05-01 | Fallbrook Technologies Inc. | Continuously variable transmission |
WO2010120933A1 (en) | 2009-04-16 | 2010-10-21 | Fallbrook Technologies Inc. | Stator assembly and shifting mechanism for a continuously variable transmission |
US8512195B2 (en) | 2010-03-03 | 2013-08-20 | Fallbrook Intellectual Property Company Llc | Infinitely variable transmissions, continuously variable transmissions, methods, assemblies, subassemblies, and components therefor |
US8888643B2 (en) | 2010-11-10 | 2014-11-18 | Fallbrook Intellectual Property Company Llc | Continuously variable transmission |
AU2012240435B2 (en) | 2011-04-04 | 2016-04-28 | Fallbrook Intellectual Property Company Llc | Auxiliary power unit having a continuously variable transmission |
JP6160147B2 (en) * | 2013-03-19 | 2017-07-12 | Tdk株式会社 | Electronic component module manufacturing method, electroless plating method, and electroless plating apparatus |
US11174922B2 (en) | 2019-02-26 | 2021-11-16 | Fallbrook Intellectual Property Company Llc | Reversible variable drives and systems and methods for control in forward and reverse directions |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51142868A (en) * | 1975-06-03 | 1976-12-08 | Fujitsu Ltd | Horizontal conveyor-type dip treatment apparatus |
JPS5452985A (en) * | 1977-10-04 | 1979-04-25 | Kyushu Nippon Electric | Etching device |
JPS5511868B2 (en) * | 1976-10-26 | 1980-03-28 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5919727Y2 (en) * | 1978-07-11 | 1984-06-07 | 秀夫 椿 | etching machine |
-
1981
- 1981-10-29 JP JP1981160242U patent/JPS5831883Y2/en not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51142868A (en) * | 1975-06-03 | 1976-12-08 | Fujitsu Ltd | Horizontal conveyor-type dip treatment apparatus |
JPS5511868B2 (en) * | 1976-10-26 | 1980-03-28 | ||
JPS5452985A (en) * | 1977-10-04 | 1979-04-25 | Kyushu Nippon Electric | Etching device |
Also Published As
Publication number | Publication date |
---|---|
JPS5865361U (en) | 1983-05-02 |
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