JPH0693504B2 - Image sensor manufacturing method - Google Patents

Image sensor manufacturing method

Info

Publication number
JPH0693504B2
JPH0693504B2 JP59190693A JP19069384A JPH0693504B2 JP H0693504 B2 JPH0693504 B2 JP H0693504B2 JP 59190693 A JP59190693 A JP 59190693A JP 19069384 A JP19069384 A JP 19069384A JP H0693504 B2 JPH0693504 B2 JP H0693504B2
Authority
JP
Japan
Prior art keywords
adhesive
solid
image sensor
curing
state imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59190693A
Other languages
Japanese (ja)
Other versions
JPS6169256A (en
Inventor
敬介 前村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59190693A priority Critical patent/JPH0693504B2/en
Publication of JPS6169256A publication Critical patent/JPS6169256A/en
Publication of JPH0693504B2 publication Critical patent/JPH0693504B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Solid State Image Pick-Up Elements (AREA)
  • Facsimile Heads (AREA)

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明はイメージセンサの製造方法に係り、特にCCD等
の固体撮像素子を高抵抗基材上に載置する方法に関す
る。
Description: TECHNICAL FIELD OF THE INVENTION The present invention relates to a method for manufacturing an image sensor, and more particularly to a method for mounting a solid-state image sensor such as a CCD on a high resistance substrate.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

近年、ファクシミリなどに用いられる画像読み取り装置
を小型化するために、イメージセンサ、特に密着型イメ
ージセンサの開発が盛んである。この密着型イメージセ
ンサの多くは、レンズ系にロッドレンズアレイを用いて
原稿と同一寸法に設けたフォトセルアレイ上に原稿の正
立等倍像を結像させ、フォトセルアレイから原稿の画情
報を得る構造をとる。従って、この構造によれば、ロッ
ドレンズアレイの物像間距離が略17mmと短いため装置の
大幅な小型化を図れる利点がある。
2. Description of the Related Art In recent years, image sensors, particularly contact image sensors, have been actively developed in order to reduce the size of image reading apparatuses used in facsimiles and the like. Many of these contact image sensors use a rod lens array for a lens system to form an erecting equal-magnification image of a document on a photo cell array provided with the same size as the document, and obtain image information of the document from the photo cell array. Take structure. Therefore, according to this structure, since the distance between the object images of the rod lens array is as short as about 17 mm, there is an advantage that the size of the device can be greatly reduced.

この密着型イメージセンサに大別すると二種類がある。
第一の密着型イメージセンサは、アルミナ等の絶縁基板
上に原稿と同一寸法のCdSeやCdS等の光導電膜を設けた
もの、あるいはアモルファスシリコン膜を設けたもので
ある。しかしながら、第一の密着型イメージセンサは、
応答性・解像度等の諸特性に問題がある。この問題を回
避したものが、CCD等の固体撮像素子を用いた第二の密
着型イメージセンサである。この第二の密着型イメージ
センサは高速・高解像度であるが、次のような欠点があ
る。すなわち、固体撮像素子は小型であり、センサ部の
幅が最大のものでも約60mmである。このため、原稿と同
寸法の等倍像を読み取るため、特開昭57−129065号公報
に開示されているようにフォトセルアレイの中心からず
らせて配置した固体撮像素子を複数個千鳥状に、かつそ
れぞれのチップのフォトセルアレイが互いに接近する方
向に並べる構造をとる必要がある。
There are roughly two types of contact image sensors.
The first contact-type image sensor is one in which a photoconductive film of CdSe, CdS or the like having the same size as the original is provided on an insulating substrate of alumina or the like, or an amorphous silicon film is provided. However, the first contact image sensor
There are problems with various characteristics such as responsiveness and resolution. A second contact-type image sensor using a solid-state imaging device such as a CCD is a device that avoids this problem. Although this second contact-type image sensor has high speed and high resolution, it has the following drawbacks. That is, the solid-state image sensor is small, and the maximum width of the sensor unit is about 60 mm. Therefore, in order to read an equal-magnification image of the same size as the original, a plurality of solid-state image pickup devices arranged in a staggered manner from the center of the photocell array as disclosed in Japanese Patent Laid-Open No. 57-129065 are staggered, and It is necessary to have a structure in which the photo cell arrays of the respective chips are arranged in a direction in which they approach each other.

ところで、千鳥状に配列された固体撮像素子の位置精度
が悪い場合には、固体撮像素子と固体撮像素子との隣接
部すなわち画情報のつなぎ部で画情報が不連続となり読
取画像に歪みが生じる危険がある。従って固体撮像素子
を複数個千鳥状に並べたイメージセンサにおいては、画
質に影響を与えることなく、固体撮像素子を位置精度良
く並べることが要求されている。その上、この様な密着
型イメージセンサばかりでなく、従来より球面レンズと
組み合わせて用いられているCCDやMOS型のICセンサにお
いても光学系の調整を容易するために、固体撮像素子を
絶縁基板の外形に対して精度良く配置することが必要と
なる。
By the way, when the position accuracy of the staggered solid-state image pickup devices is poor, the image information becomes discontinuous at the adjacent portion between the solid-state image pickup devices, that is, the connection portion of the image information, and the read image is distorted. There is danger. Therefore, in an image sensor in which a plurality of solid-state image pickup devices are arranged in a staggered pattern, it is required to arrange the solid-state image pickup devices with high positional accuracy without affecting the image quality. In addition to the contact type image sensor like this, the CCD or MOS type IC sensor conventionally used in combination with a spherical lens has a solid-state image sensor as an insulating substrate in order to easily adjust the optical system. It is necessary to arrange them accurately with respect to the outer shape of.

一般に固体撮像素子は裏面より電気的接続をとる必要が
あり、これを満足させるための導電性接着剤を用いて絶
縁基板上に固定されている。しかしながら、導電性接着
剤として用いられる接着剤は、一般にエポキシ系熱硬化
型接着剤に代表されるように加熱硬化型である。この加
熱硬化型の接着剤を用いた場合、接着剤を硬化させる前
の段階で固体撮像素子を基板上に精度良く並べておいて
も、硬化中に接着剤からガスが発生し、このガスの発生
により固体撮像素子が動いてしまったり、また、硬化前
に粘度が低下し接着剤が流れ出したりして接着剤の硬化
中に固体撮像素子が動いてしまい、予定していた配置の
位置からズレが生じてしまう危険等がある。従って、接
着剤の硬化後も固体撮像素子がその位置精度を保持する
ことは極めて困難である。
In general, a solid-state image sensor needs to be electrically connected from the back surface, and is fixed on an insulating substrate by using a conductive adhesive to satisfy this. However, the adhesive used as the conductive adhesive is generally a heat-curable adhesive as represented by an epoxy thermosetting adhesive. When this heat-curable adhesive is used, gas is generated from the adhesive during curing even if the solid-state image sensor is accurately arranged on the substrate before the adhesive is cured, and this gas is generated. May cause the solid-state image sensor to move, or the viscosity may drop before curing and the adhesive may flow out, causing the solid-state image sensor to move during curing of the adhesive, causing a deviation from the planned position. There is a risk that it will occur. Therefore, it is extremely difficult for the solid-state imaging device to maintain its positional accuracy even after the adhesive is cured.

〔発明の目的〕[Object of the Invention]

本発明は上述の問題点を鑑みてなされたものであり、読
取画像に歪みがなく良質な画情報を得、その上光学系の
調整が容易なイメージセンサの製造方法を提供すること
を目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a method for manufacturing an image sensor in which a read image has no distortion and high-quality image information is obtained and the optical system can be easily adjusted. To do.

〔発明の概要〕[Outline of Invention]

本発明のイメージセンサの製造方法は、少なくとも1個
の固体撮像素子を、接着剤高抵抗基材の固体撮像素子に
対向する載置面端部の少なくとも一部及びその一部に隣
接する載置面外側近傍に速硬化型接着剤を塗布する工程
と、載置面の速硬化型接着剤を塗布していない部分を覆
うように加熱硬化型導電性接着剤を塗布する工程と、固
体撮像素子を速硬化型接着剤及び加熱硬化型導電性接着
剤上に配置し、固体撮像素子を高抵抗基材上に速硬化型
接着剤により固定する工程と、加熱硬化型導電性接着剤
を硬化させて高抵抗基材上に固体撮像素子を固定する工
程とを有することを特徴とする。より詳しく説明するな
らば、アルミナ基板上に配設されたダイパッド上の少な
くとも一点にエポキシ・アクリル系紫外線硬化型接着剤
を取着し、残りの部分にエポキシ系加熱硬化型導電性接
着剤を取着し、この接着剤上に固体撮像素子を載置した
ものである。従って、まずエポキシ・アクリル系紫外線
硬化型接着剤に紫外線を照射し、固体撮像素子をアルミ
ナ基板上に仮止めした後に、加熱してエポキシ系加熱硬
化型導電性接着剤を硬化させ固体撮像素子を固定する。
従って、固体撮像素子をアルミナ基版に強固に精度良
く、且つ電気的接続を損なうことなく固定することがで
きる。
According to the method of manufacturing an image sensor of the present invention, at least one solid-state imaging device is mounted on at least a part of a mounting surface end portion facing the solid-state imaging device of the adhesive high-resistance base material and a mounting surface adjacent to the mounting surface end part. A step of applying a quick-curing adhesive near the outside of the surface, a step of applying a heat-curing conductive adhesive so as to cover a portion of the mounting surface on which the quick-curing adhesive has not been applied, and a solid-state image sensor Is placed on the fast-curing adhesive and the heat-curing conductive adhesive, and the solid-state image sensor is fixed on the high-resistance substrate with the fast-curing adhesive, and the heat-curing conductive adhesive is cured. And a step of fixing the solid-state imaging device on the high resistance substrate. More specifically, an epoxy / acrylic UV curable adhesive is attached to at least one point on the die pad provided on the alumina substrate, and an epoxy heat curable conductive adhesive is attached to the rest. The solid-state image sensor is mounted on this adhesive. Therefore, first, the epoxy-acrylic UV-curable adhesive is irradiated with ultraviolet rays, and the solid-state imaging device is temporarily fixed on the alumina substrate, and then heated to cure the epoxy-based heat-curable conductive adhesive to form the solid-state imaging device. Fix it.
Therefore, the solid-state imaging device can be firmly and accurately fixed to the alumina base plate without damaging the electrical connection.

〔発明の実施例〕Example of Invention

次の第1図及び第2図(a)、(b)を参照して本発明
のイメージセンサの実施例を説明する。
An embodiment of the image sensor of the present invention will be described with reference to FIGS. 1 and 2 (a) and (b) below.

第2図(a)、(b)において、本発明によるイメージ
センサの概略は、アルミナ基板(5)上に配置したCCD
に電圧をかけるダイパッド(図示せず)上にエポキシ・
アクリル系紫外線硬化型接着剤(図示せず)とエポキシ
系加熱硬化型接着剤(図示せず)とを介してCCD(1
a)、(1b)、…(1n)が固着され構成されている。こ
のCCD(1a)、(1b)、…(1n-1)はフォトセルアレイ
(2)が平行な2本の直線(3)、(4)上に位置する
ように千鳥状に配列されている。この直線(3)、
(4)上のCDD(1a)、(1b)、…(1n-1)及び(1
b)、(1d)、…(1n)のフォトセルアレイ(2)上に
はロッドレンズアレイ(6)によりそれぞれ原稿面
(7)の走査線(8)及び走査線(9)上の画像が等倍
結像される。これにより、直線(3)上のCCD(1a)、
(1b)、…(1n-1)からは原稿面(7)の走査線(8)
上の画情報が得られる。同様に直線(4)上の固体撮像
素子(1b)、(1d)、…(1n)からは走査線(9)上の
画情報が得られる。また、本発明のイメージセンサのCC
D(1a)、(1b)、…(1n)が精度良くアルミナ基板
(5)上に並べられているため、原稿の送り方向(10)
に対して先にある走査線(9)を読むCCD(1b)、(1
d)、…(1n)からの画情報を走査線(8)と走査線
(9)との間隔にはいる画情報の分だけメモリ等で遅延
させ、CCD(1a)、(1c)、…(1n-1)からの画情報と
電気的に接続し、走査線(8)上の画情報を1つの時系
列信号として得られる。
2 (a) and 2 (b), an image sensor according to the present invention is schematically shown by a CCD arranged on an alumina substrate (5).
Apply epoxy to the die pad (not shown)
CCD (1) via an acrylic UV curable adhesive (not shown) and an epoxy heat curable adhesive (not shown)
a), (1b), ... (1n) are fixedly configured. The CCDs (1a), (1b), ... (1 n-1 ) are arranged in a staggered pattern so that the photocell array (2) is located on two parallel straight lines (3) and (4). . This straight line (3),
(4) CDD (1a), (1b), ... (1 n-1 ) and (1
b), (1d), ... (1n) on the photo cell array (2), the image on the scanning line (8) and the scanning line (9) on the document surface (7) is equal by the rod lens array (6). The image is doubled. As a result, CCD (1a) on line (3),
(1b), ... (1 n-1 ) to scan line (8) on the document surface (7)
The above image information is obtained. Similarly, image information on the scanning line (9) is obtained from the solid-state image pickup devices (1b), (1d), ... (1n) on the straight line (4). Further, the CC of the image sensor of the present invention
Since the D (1a), (1b), ... (1n) are accurately arranged on the alumina substrate (5), the original feeding direction (10)
Read the scan line (9) above for CCD (1b), (1
d), ... Delays the image information from (1n) by the amount of image information in the interval between the scanning line (8) and the scanning line (9) in the memory or the like, and CCDs (1a), (1c) ,. The image information from (1 n-1 ) is electrically connected to obtain the image information on the scanning line (8) as one time-series signal.

次に第1図を参照してCCD(1a)、(1b)、…(1n)と
アルミナ基板(5)との固定状態を説明する。第1図に
おいて、CCD(1a)、(1b)、…(1n)の中央部には速
硬化性接着剤としてのエポキシ・アクリル系紫外線硬化
型接着剤(12)によりアルミナ基板(5)上に固定さ
れ、CCD(1a)、(1b)、…(1n)のその他の部分はエ
ポキシ系加熱硬化型の導電性接着剤(11)により固定さ
れている。
Next, the fixing state of the CCDs (1a), (1b), ... (1n) and the alumina substrate (5) will be described with reference to FIG. In FIG. 1, an epoxy / acrylic UV-curable adhesive (12) as a quick-curing adhesive is used on the alumina substrate (5) at the center of the CCD (1a), (1b), ... (1n). The other parts of the CCDs (1a), (1b), ... (1n) are fixed, and are fixed by an epoxy heat-curable conductive adhesive (11).

上述の構成により、CCD(1a)、(1b)、…(1n)は精
度良くアルミナ基板(5)上に配置されるので、画質の
良い密着型イメージセンサが得られる。その上アルミナ
基板(5)外形から精度良くCCD(1a)、(1b)、…(1
n)を固定することができることにより、光学系の調整
が容易なイメージセンサを得られる。更に、CCD(1
a)、(1b)、…(1n)とアルミナ基板(5)のダイパ
ッドはエポキシ系加熱硬化型の導電性接着剤(11)を主
を用いていることにより、CCD(1a)、(1b)、…(1
n)はダイパッドと充分に電気的接続をとることができ
る。
With the above configuration, since the CCDs (1a), (1b), ... (1n) are accurately arranged on the alumina substrate (5), a contact image sensor with good image quality can be obtained. In addition, CCD (1a), (1b),… (1
Since n) can be fixed, an image sensor in which the optical system can be easily adjusted can be obtained. In addition, CCD (1
The die pads of a), (1b), ... (1n) and the alumina substrate (5) mainly use an epoxy-based heat-curable conductive adhesive (11), so that the CCD (1a), (1b) ,… (1
n) can be sufficiently electrically connected to the die pad.

次に第3図を参照して第1図に示すCCD(1a)、(1
b)、…(1n)のマウント方法を説明する。第3図にお
いて、CCD(1b)はコレット(13)によって固定された
状態でエポキシ系加熱硬化型の導電性接着剤(11)とエ
ポキシ・アクリル系紫外線硬化型接着剤(12)とが塗布
されたアルミナ基板(5)の載置面上に精度良く配置さ
れている。この後、CCD(1b)の中央部のエポキシ・ア
クリル系紫外線硬化型接着剤(12)に紫外線(14)を照
射し、エポキシ・アクリル系紫外線硬化型接着剤(12)
がCCD(1b)の載置面よりはみ出ている部分を硬化さ
せ、CCD(1b)をその位置精度を保ったままアルミナ基
板(5)上に仮に固定させる。この後、コレット(13)
を取り外し、更に全体を加熱してエポキシ系加熱硬化型
の導電性接着剤(11)を硬化させる。加熱の際、CCD(1
b)はエポキシ・アクリル系紫外線硬化型接着剤(12)
のはみ出し部分で固定されており、CCD(1b)には特に
過大な力が加わらないため接着剤の加熱硬化中も動くこ
とはない。なお、この際、エポキシ・アクリル系紫外線
硬化型接着剤(12)が加熱によって硬化するものを用い
た場合には、一層の効果があるのは言うまでもない。
Next, referring to FIG. 3, the CCD (1a), (1
b), ... (1n) How to mount is explained. In FIG. 3, the CCD (1b) is fixed with a collet (13), and is coated with an epoxy heat-curable conductive adhesive (11) and an epoxy-acrylic UV-curable adhesive (12). It is accurately arranged on the mounting surface of the alumina substrate (5). After this, the epoxy / acrylic UV curable adhesive (12) in the center of the CCD (1b) is irradiated with UV light (14) to produce an epoxy / acrylic UV curable adhesive (12).
The part of the CCD (1b) protruding from the mounting surface is cured, and the CCD (1b) is temporarily fixed on the alumina substrate (5) while maintaining its positional accuracy. After this, collet (13)
Is removed, and the whole is further heated to cure the epoxy heat-curable conductive adhesive (11). When heating, CCD (1
b) Epoxy / acrylic UV curable adhesive (12)
Since it is fixed at the protruding part of the CCD (1b), no excessive force is applied to the CCD (1b), so it does not move even during heat curing of the adhesive. At this time, needless to say, when the epoxy / acrylic ultraviolet curing adhesive (12) that is cured by heating is used, the effect is further enhanced.

上述の製造方法により、CCD(1b)はエポキシ系加熱硬
化型の導電性接着剤(11)の硬化後も充分な位置精度を
保ち、CCD(1b)の裏面全体でアルミナ基板(5)に固
定されており、充分にCCD(1b)の裏面より電気的に接
続をとることができる。また、CCD(1a)、(1c)、(1
d)、…(1n-1)、(1n)も同様にアルミナ基板上に固
定される。
By the manufacturing method described above, the CCD (1b) maintains sufficient positional accuracy even after the epoxy-based heat-curable conductive adhesive (11) is cured, and the entire back surface of the CCD (1b) is fixed to the alumina substrate (5). The CCD (1b) can be sufficiently electrically connected from the back surface of the CCD (1b). In addition, CCD (1a), (1c), (1
Similarly, d), ... (1 n-1 ), (1 n) are also fixed on the alumina substrate.

また、接着剤(11)、(12)の塗布の方法は、上記の方
法に限定されるものではなく、接着剤(11)、(12)を
交互に並べたものや、接着剤(11)をCCD(1b)の裏面
につけ、接着剤(12)をCCD(1b)の周辺部につけた方
法でも良い。特に後者の方法であると、紫外線が接着剤
(12)を完全に照射することになるため、加熱硬化の性
質を有する接着剤(12)を用いる必要が全なくなるとい
う効果もある。
Further, the method of applying the adhesives (11) and (12) is not limited to the above-mentioned method, and the adhesives (11) and (12) are alternately arranged or the adhesive (11). Alternatively, the adhesive may be applied to the back surface of the CCD (1b) and the adhesive (12) may be applied to the peripheral portion of the CCD (1b). In particular, the latter method has the effect of completely irradiating the adhesive (12) with ultraviolet rays, so that it is not necessary to use the adhesive (12) having the property of heat curing.

なお、本発明のイメージセンサの製造方法は上述の実施
例に限定されることなく、例えば固体撮像素子を一直線
上に並べたものや固体撮像素子が1個のもの、或いは従
来より用いられているCCDやMOS型ICセンサで基板外形を
基準に固体撮像素子を実装したもの等にも用いることが
できる。換言するならば、本発明はその要旨を逸脱しな
い範囲内で種々変形して実施できる。
The method of manufacturing the image sensor of the present invention is not limited to the above-described embodiment, and for example, the solid-state image pickup elements are arranged in a straight line, the solid-state image pickup element is one, or conventionally used. It can also be used for a CCD or MOS type IC sensor mounted with a solid-state image sensor based on the outer shape of the substrate. In other words, the present invention can be variously modified and implemented without departing from the scope of the invention.

〔発明の効果〕〔The invention's effect〕

本発明のイメージセンサの製造方法は、少なくとも1個
の固体撮像素子を速硬化型接着剤と加熱硬化型接着剤と
により高抵抗基板上に配置するものであるため、複数個
の固体撮像素子を用いたイメージセンサにおいて要求さ
れる固体撮像素子の位置精度も容易に実現でき、画質の
良いイメージセンサを得ることができる。
According to the method of manufacturing an image sensor of the present invention, at least one solid-state imaging device is arranged on a high-resistance substrate with a quick-curing adhesive and a heat-curing adhesive, so that a plurality of solid-state imaging devices are used. The position accuracy of the solid-state image sensor required in the image sensor used can be easily realized, and an image sensor with high image quality can be obtained.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明のイメージセンサの実施例を示す要部拡
大模式断面図、第2図(a)乃至第2図(b)は本発明
のイメージセンサの実施例を説明するための模式図、第
3図は第1図に示すイメージセンサの実装方法を説明す
るための断面簡略図である。 (1a)、(1b)、…、(1n)…CCD (2)…フォトセルアレイ (5)…アルミナ基板 (11)…エポキシ系加熱硬化型接着剤 (12)…エポキシ・アクリル系紫外線硬化型接着剤
FIG. 1 is an enlarged schematic sectional view of an essential part showing an embodiment of an image sensor of the present invention, and FIGS. 2 (a) and 2 (b) are schematic views for explaining an embodiment of the image sensor of the present invention. , FIG. 3 is a simplified sectional view for explaining a mounting method of the image sensor shown in FIG. (1a), (1b), ..., (1n) ... CCD (2) ... Photo cell array (5) ... Alumina substrate (11) ... Epoxy heat curing adhesive (12) ... Epoxy / acrylic UV curing adhesive Agent

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】高抵抗基材上に少なくとも1個の固体撮像
素子を載置するイメージセンサの製造方法において、 前記高抵抗基材の前記固体撮像素子に対向する載置面端
部の少なくとも一部及びその一部に隣接する載置面外側
近傍に速硬化型接着剤を塗布する工程と、 前記載置面の前記速硬化型接着剤を塗布していない部分
を覆うように加熱硬化型導電性接着剤を塗布する工程
と、 前記固体撮像素子を前記速硬化型接着剤及び前記加熱硬
化型導電性接着剤上に配置し、前記固体撮像素子を前記
高抵抗基材上に前記速硬化型接着剤により固定する工程
と、 前記加熱硬化型導電性接着剤を硬化させて前記高抵抗基
材上に前記固体撮像素子を固定する工程とを有すること
を特徴とするイメージセンサの製造方法。
1. A method of manufacturing an image sensor in which at least one solid-state imaging device is mounted on a high-resistance base material, wherein at least one end of a mounting surface of the high-resistance base material facing the solid-state imaging device. Part and a portion of the mounting surface adjacent to the outside of the mounting surface adjacent to the mounting surface, and the heat-curing conductive material so as to cover the portion of the mounting surface not coated with the rapid curing adhesive. A step of applying a conductive adhesive, arranging the solid-state imaging device on the fast-curing adhesive and the heat-curing conductive adhesive, and placing the solid-state imaging device on the high-resistance substrate in the fast-curing type. A method of manufacturing an image sensor, comprising: a step of fixing with an adhesive; and a step of curing the heat-curable conductive adhesive to fix the solid-state imaging device on the high-resistance substrate.
【請求項2】前記固体撮像素子を前記速硬化型接着剤に
より固定する工程は、紫外線を照射することにより前記
速硬化型接着剤を硬化させて固定する工程であることを
特徴とする特許請求の範囲第1項記載のイメージセンサ
の製造方法。
2. The step of fixing the solid-state imaging device with the fast-curing adhesive is a step of curing the fast-curing adhesive by irradiating ultraviolet rays to fix the solid-state imaging element. An image sensor manufacturing method according to claim 1.
JP59190693A 1984-09-13 1984-09-13 Image sensor manufacturing method Expired - Lifetime JPH0693504B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59190693A JPH0693504B2 (en) 1984-09-13 1984-09-13 Image sensor manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59190693A JPH0693504B2 (en) 1984-09-13 1984-09-13 Image sensor manufacturing method

Publications (2)

Publication Number Publication Date
JPS6169256A JPS6169256A (en) 1986-04-09
JPH0693504B2 true JPH0693504B2 (en) 1994-11-16

Family

ID=16262289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59190693A Expired - Lifetime JPH0693504B2 (en) 1984-09-13 1984-09-13 Image sensor manufacturing method

Country Status (1)

Country Link
JP (1) JPH0693504B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02105458A (en) * 1988-10-13 1990-04-18 Nec Corp Solid-state image sensing device and its manufacture
US4954197A (en) * 1989-03-30 1990-09-04 Xerox Corporation Process for assembling smaller arrays together to form a longer array
JP2005297679A (en) * 2004-04-08 2005-10-27 Kasai Kogyo Co Ltd Interior trim structure of automobile

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55159677A (en) * 1979-05-31 1980-12-11 Toshiba Corp Solidstate image sensor
JPS58170052A (en) * 1982-03-31 1983-10-06 Sony Corp Manufacture of solid state image pickup device

Also Published As

Publication number Publication date
JPS6169256A (en) 1986-04-09

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