JPH0671650B2 - Method and apparatus for replenishment of solder melt and removal of oxide film by rotary solder processing method - Google Patents

Method and apparatus for replenishment of solder melt and removal of oxide film by rotary solder processing method

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Publication number
JPH0671650B2
JPH0671650B2 JP5005090A JP5005090A JPH0671650B2 JP H0671650 B2 JPH0671650 B2 JP H0671650B2 JP 5005090 A JP5005090 A JP 5005090A JP 5005090 A JP5005090 A JP 5005090A JP H0671650 B2 JPH0671650 B2 JP H0671650B2
Authority
JP
Japan
Prior art keywords
solder
melt
solder bath
bath
peripheral wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5005090A
Other languages
Japanese (ja)
Other versions
JPH03254362A (en
Inventor
徹也 北城
基 上山
Original Assignee
富士プラント工業株式会社
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Filing date
Publication date
Application filed by 富士プラント工業株式会社 filed Critical 富士プラント工業株式会社
Priority to JP5005090A priority Critical patent/JPH0671650B2/en
Publication of JPH03254362A publication Critical patent/JPH03254362A/en
Publication of JPH0671650B2 publication Critical patent/JPH0671650B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Coating With Molten Metal (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】 発明の目的 〔産業上の利用分野〕 本発明は、被半田外装物例えばハイブリッドICやLSIの
如き半導体パッケージの主としてアウターリードに、半
田または錫(以下単に半田という)の膜を外装させる半
田外装処理を、回転式半田処理槽で行う場合に、該処理
槽へ半田溶融液を補給するとともに酸化膜を除去する方
法、およびそのための装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of use] The present invention relates to a package to be soldered, such as a semiconductor IC such as a hybrid IC or LSI, mainly on the outer leads of solder or tin (hereinafter simply referred to as solder). The present invention relates to a method for supplying a molten solder solution to a processing bath and removing an oxide film when performing a solder coating process for coating a film in a rotary solder processing bath, and an apparatus therefor.

〔従来の技術〕[Conventional technology]

被半田外装物例えば半導体パッケージの主としてアウタ
ーリードには、プリント基板上へ実装する際の処理を効
率的かつ精度良く行うため、予め半田膜が外装されてい
る。また半導体パッケージをプリント基板上へ実装後
に、裏面に突出したアウターリードに半田外装すること
もある。
An outer package to be soldered, for example, an outer lead of a semiconductor package, is preliminarily coated with a solder film in order to efficiently and accurately perform a process for mounting on a printed circuit board. In addition, after mounting the semiconductor package on a printed circuit board, the outer leads protruding on the back surface may be soldered.

この半田外装手段として従来一般に行われているのは、
電気メッキにより半導体パッケージのアウターリードに
半田膜を形成する半田メッキ法と、半田溶融液中に半導
体パッケージのアウターリードを浸漬させ、半田溶融液
を付着・凝固させて半田膜を形成する半田溶融液浸漬法
(ディップ法)である。
What has been generally performed conventionally as this solder exterior means is,
A solder plating method that forms a solder film on the outer leads of a semiconductor package by electroplating, and a solder melt that forms the solder film by immersing the outer leads of the semiconductor package in the solder melt and adhering and solidifying the solder melt It is a dipping method.

〔発明が解決しようとする課題〕 上記半田外装手段のうち、半田メッキ法はメッキ液中の
有機剤が、半田の濡れ性や性能面に悪影響を残し、また
メッキ処理に伴う廃液・排気等の郊外処理施設が必要な
ため、高いクリーン度が要求される半導体パッケージ組
立工程中へ組込むことは難しい。さらに半田メッキ処理
を各リードがタイバーで連結された状態で行い、その後
にタイバーをカットするので、カット端面で素地が露出
し、腐食して誤動作や故障の原因になった。
[Problems to be Solved by the Invention] Of the above-mentioned solder exterior means, in the solder plating method, the organic agent in the plating solution leaves an adverse effect on the wettability and performance of the solder, and also waste liquid and exhaust gas accompanying the plating process. Since a suburban treatment facility is required, it is difficult to incorporate it into a semiconductor package assembly process that requires high cleanliness. Further, solder plating treatment is performed in a state where each lead is connected by a tie bar, and then the tie bar is cut, so that the base material is exposed at the cut end surface, causing corrosion and malfunction or failure.

他方半田溶融液浸漬法は、半導体パッケージがFLATタイ
プのもの、即ちアウターリードが四方へ突出した平面状
のものは、アウターリードにだけ半田膜を形成すること
が難しいし、余分に付着した半田溶融液の除去も容易で
なく、アウターリード間に半田がブリッジ状に付着し
た。また、アウターリードに付着する半田溶融液の膜厚
の調節が難しく、半田膜の厚みが不均一や厚すぎたりし
た。
On the other hand, in the solder melt dipping method, it is difficult to form a solder film only on the outer leads when the semiconductor package is a FLAT type, that is, when the outer leads project in four directions. It was not easy to remove the liquid, and the solder adhered in a bridge shape between the outer leads. Further, it is difficult to control the film thickness of the solder melt that adheres to the outer leads, and the thickness of the solder film is uneven or too thick.

さらに半田溶融液は、表面に酸化膜が生じ易いし、また
フラックスも混じっている。それが付着すると半田の濡
れ性に悪影響を及ぼすため、半田溶融液を常に循環・噴
流させ濾過する必要がある。この半田溶融液の循環・噴
流を、従来はポンプで行っているので、装置が大型にな
る。また発生した酸化物等が、配管中に詰まって支障が
生じたり、そのための掃除・除去作業に手間がかかった
りする、等の問題点があった。
Further, the solder melt tends to form an oxide film on the surface and also contains a flux. If it adheres, it has an adverse effect on the wettability of the solder, so it is necessary to constantly circulate and jet the solder melt to filter it. Since the circulation / jet of the solder melt is conventionally performed by a pump, the device becomes large. In addition, the generated oxides and the like clog the pipes, which causes troubles, and cleaning and removal work for the troubles is troublesome.

そこで、本件出願人は先に回転式の半田外装方法および
装置を開発し、特許出願した(特願平2−5709号)。こ
れは、回転型の半田槽を中央の縦軸を中心に回転させ
て、遠心力で外周壁の内周面に沿って立ち上がった半田
溶融液に、被半田外装物を浸漬・付着させるとともに、
該被半田外装物も回転させて、付着した半田溶融物を遠
心力で振り払い薄く均一にし、その状態で凝固させるよ
うにしたものである。
Therefore, the present applicant previously developed a rotary solder coating method and device and applied for a patent (Japanese Patent Application No. 2-5709). This is to rotate the rotary solder bath around the central vertical axis, and to dip and attach the soldered outer package to the solder melt that has risen along the inner peripheral surface of the outer peripheral wall by centrifugal force,
The outer package to be soldered is also rotated so that the attached solder melt is spun off by centrifugal force to be thin and uniform, and solidified in that state.

これで、被半田外装物のアウターリードへの半田膜を薄
く均一化できるし、半田溶融液が常に循環移動し半田溶
融液表面は常に新しいので、酸化膜等が発生し難くな
り、高品質な半田膜を形成できるようになった。
As a result, the solder film on the outer leads of the soldered outer package can be made thin and uniform, and since the solder melt constantly circulates and the surface of the solder melt is always new, oxide films etc. are less likely to occur and high quality is achieved. It is now possible to form a solder film.

本発明は、この回転式の半田処理法において、半田溶融
液の供給・酸化膜等の除去を、一層効率よく行うための
方法および装置を提供することを目的としている。
It is an object of the present invention to provide a method and apparatus for more efficiently supplying a solder melt and removing an oxide film in this rotary solder processing method.

発明の構成 〔課題を解決するための手段〕 I 本発明に係る回転式半田処理法での半田溶融液供給
兼酸化膜等除去方法の第1は、 非回転型の外半田槽(1)内で、ドーナツ状の回転型内
半田槽(2)を中央の縦軸(7)を中心に回転させて、
遠心力で外周壁(9)の内周面に沿って立ち上がった半
田溶融液(5)に、被半田外装物(6)を浸漬・付着さ
せるとともに、該被半田外装物(6)も回転させて、付
着した半田溶融液(5)を遠心力で振り払い薄く均一に
して凝固させるようにした回転式半田処理法において、 上記内半田槽(2)の回転により、該内半田槽(2)の
外周壁(9)内周面に沿って立ち上がった半田溶融液
(5)を、外周壁(9)上端部から外半田槽(1)へオ
ーバーフローさせて、その途中に設けた濾過器(10)に
て酸化物等(15)を除去させるとともに、 半田溶融液(5)が減少した上記内半田槽(2)内に、
該内半田槽(2)下部寄りの半田溶融液補給用孔(8)
から、外半田槽(1)内の半田溶融液(5)を流入さ
せ、半田溶融液(5)が循環するようにしたものであ
る。
Configuration of the Invention [Means for Solving the Problems] I The first method of removing a solder melt and supplying an oxide film and the like in the rotary solder processing method according to the present invention is the non-rotating outer solder bath (1). Then, rotate the doughnut-shaped rotary solder bath (2) around the central vertical axis (7),
The outer package (6) to be soldered is immersed in and adhered to the solder melt (5) rising along the inner peripheral surface of the outer peripheral wall (9) by centrifugal force, and the outer package (6) to be soldered is also rotated. Then, in the rotary solder treatment method in which the attached solder melt (5) is shaken off by centrifugal force to be thinly and uniformly solidified, the inner solder bath (2) is rotated by rotating the inner solder bath (2). The solder molten liquid (5) rising along the inner peripheral surface of the outer peripheral wall (9) is overflowed from the upper end of the outer peripheral wall (9) to the outer solder bath (1), and a filter (10 ) To remove oxides (15), and in the inner solder bath (2) where the solder melt (5) has decreased,
Solder melt replenishment hole (8) near the bottom of the solder bath (2)
From this, the solder melt (5) in the outer solder bath (1) is caused to flow in, and the solder melt (5) is circulated.

II 本発明に係る回転式半田処理法での半田溶融液供給
兼酸化膜等除去方法の第2は、 上記第1の半田溶融液供給兼酸化膜等除去方法におい
て、 内半田槽(2)の回転による遠心力により、内半田槽
(2)からオーバーフローさせ、濾過させた後の外半田
槽(1)内の半田溶融液(5)を、外半田槽(1)内に
下部で連通するように立設した仕切り板(11)から再度
オーバーフローさせ、その途中に設けた副濾過器(13)
にて酸化物等(15)を再度除去するようにしたものであ
る。
II The second method of removing the solder melt and supplying the oxide film by the rotary solder processing method according to the present invention is the same as the first method of supplying the solder melt and removing the oxide film. The solder melt (5) in the outer solder bath (1) after being overflowed from the inner solder bath (2) and filtered by the centrifugal force generated by the rotation is communicated with the outer solder bath (1) at a lower portion. The sub-filter (13) provided in the middle of overflowing again from the partition plate (11) installed upright
The oxide etc. (15) are removed again.

III 本発明に係る回転式半田処理法での半田溶融液供
給兼酸化膜等除去方法の第3は、 上記第1の半田溶融液供給兼酸化膜等除去方法におい
て、 内半田槽(2)の外周壁(9)上端部の内周縁部(14)
を、内側への寸法(t)が可変とすることにより、外周
壁(9)内周面に沿って立ち上がる半田溶融液(5)の
厚みを調節するようにしたものである。
III. The third method of removing the solder melt and supplying the oxide film by the rotary solder processing method according to the present invention is the same as the first method of supplying the solder melt and removing the oxide film. Outer peripheral wall (9) Inner peripheral edge of upper end (14)
By making the inward dimension (t) variable, the thickness of the solder melt (5) rising along the inner peripheral surface of the outer peripheral wall (9) is adjusted.

IV 本発明に係る回転式半田処理法での半田溶融液供給
兼酸化膜除去装置の第1は、 外部に加熱・保温手段(4)を有して、内部に半田溶融
液(5)を入れた非回転型の外半田槽(1)と、外半田
槽(1)内で回転する回転型の内半田槽(2)と、被半
田外装物(6)を保持し、内半田槽(2)とほぼ同一速
度で回転する保持・回転手段(3)とからなり、 上記内半田槽(2)は、上部開口のドーナツ形で、下半
部を外半田槽(1)内の半田溶融液(5)中に浸漬させ
て、外半田槽(1)中央部に立設した内半田槽回転用縦
軸(7)に接続するとともに、下部寄りに外半田槽
(1)と連通する半田溶融液補給用孔(8)を設け、 かつ内半田槽(2)の外周壁(9)の外方に、オバーフ
ロー溶融液の濾過器(10)を設けたものである。
IV The first of the solder melt supply and oxide film removing devices in the rotary solder processing method according to the present invention has a heating / heat retaining means (4) outside and puts the solder melt (5) inside. The non-rotating outer solder bath (1), the rotating inner solder bath (2) rotating in the outer solder bath (1), and the soldered outer package (6) are held, and the inner solder bath (2) is held. ) And a holding / rotating means (3) that rotates at substantially the same speed. The inner solder bath (2) is a donut shape with an upper opening, and the lower half of the inner solder bath (2) is the molten solder in the outer solder bath (1). (5) Immersed in the outer solder bath (1) and connected to the vertical axis (7) for rotating the inner solder bath standing at the center of the outer solder bath (1), and melted solder that communicates with the outer solder bath (1) near the bottom. A liquid replenishing hole (8) is provided, and an overflow molten liquid filter (10) is provided outside the outer peripheral wall (9) of the inner solder bath (2).

V 本発明に係る回転式半田処理法での半田溶融液供給
兼酸化膜除去装置の第2は、 上記第1の半田溶融液供給兼酸化膜等除去装置におい
て、 外半田槽(1)と内半田槽(2)の外周壁(9)との間
に、下部の通孔(12)で連通する仕切り板(11)を立設
して、該仕切り板(11)の外方にもオーバーフロー溶融
液の副濾過器(13)を設けたものである。
V The second solder melt supply / oxide film removing device in the rotary solder processing method according to the present invention is the same as the first solder melt supply / oxide film removing device, in which the outer solder bath (1) and the inner solder bath (1) A partition plate (11) that communicates with the lower hole (12) is erected between the outer wall (9) of the solder bath (2) and overflow melting also outside the partition plate (11). A liquid sub-filter (13) is provided.

VI 本発明に係る回転式半田処理法での半田溶融液供給
兼酸化膜除去装置の第3は、 上記第1の半田溶融液供給兼酸化膜等除去装置におい
て、 内半田槽(2)の外周壁(9)の上端部に、外周壁
(9)内周面に沿って立ち上がる半田溶融液(5)の厚
み調節用として、内側への寸法(t)を可変に内周縁部
(14)を設けたものである。
VI Third aspect of the solder melt supply / oxide film removing device in the rotary solder processing method according to the present invention is the outer periphery of the inner solder bath (2) in the first solder melt supply / oxide film removing device. An inner peripheral edge portion (14) is variably provided at the upper end of the wall (9) for adjusting the thickness of the solder melt (5) rising along the inner peripheral surface of the outer peripheral wall (9). It is provided.

〔作用〕[Action]

上記構成の本発明に係る回転式半田処理法での半田溶融
液供給兼酸化膜除去方法および装置の実施状態は以下の
如くである。
The implementation state of the method and apparatus for supplying the solder melt and removing the oxide film in the rotary solder processing method according to the present invention having the above-described configuration is as follows.

I 内半田槽が停止している場合(第2図参照) 加熱・保温手段(4)で外部を温められた外半田槽
(1)内の半田は溶融状態になっている。回転型の内半
田槽(2)が停止時には、内半田槽(2)および外半田
槽(1)における半田溶融液(5)は、外半田槽(1)
と内半田槽(2)とが内半田槽(2)下部寄りの半田溶
融液補給用孔(8)で連通し、かつ外半田槽(1)も仕
切り板(11)下部で連通している。そのため、半田溶融
液(5)は両槽(1)(2)内の各部で下半部に溜ま
り、同一液面になっている(第2図参照)。
I When the inner solder bath is stopped (see FIG. 2) The solder in the outer solder bath (1) whose outside has been heated by the heating / heat retaining means (4) is in a molten state. When the rotary type inner solder bath (2) is stopped, the solder melt (5) in the inner solder bath (2) and the outer solder bath (1) is discharged from the outer solder bath (1).
And the inner solder bath (2) communicate with each other through the molten solder replenishment hole (8) near the lower part of the inner solder bath (2), and the outer solder bath (1) also communicates with the lower part of the partition plate (11). . Therefore, the solder melt (5) is collected in the lower half of each part in both tanks (1) and (2) and has the same liquid level (see FIG. 2).

II 内半田槽が回転している場合(第1図・第図参照) 回転型の内半田槽(2)が回転時には、内半田槽(2)
内の半田溶融液(5)は、その回転に伴う遠心力によ
り、該内半田槽(2)の外周壁(9)内周面に沿って立
ち上がっている。
II When the inner solder bath is rotating (See Fig. 1 and Fig.) When the rotary type inner solder bath (2) is rotating, the inner solder bath (2)
The molten solder liquid (5) inside rises along the inner peripheral surface of the outer peripheral wall (9) of the inner solder bath (2) due to the centrifugal force caused by the rotation thereof.

上記の如く立ち上がった半田溶融液(5)は、外周壁
(9)上端部からオーバーフローするので、その途中に
設けた濾過器(10)により、連続的に酸化物等(15)が
濾過・除去され、不純物のない共晶半田の半田溶融液と
して外半田槽(1)へ入る。
The solder melt (5) rising as described above overflows from the upper end of the outer peripheral wall (9), so that the oxide (15) is continuously filtered and removed by the filter (10) provided on the way. And enters the outer solder bath (1) as a solder melt of eutectic solder containing no impurities.

また上記オーバーフローにより、内半田槽(2)内の半
田溶融液(5)は徐々に減少するが、該内半田槽(2)
下部寄りに外半田槽(1)と連通する半田溶融液補給用
孔(8)が設けてあるので、外半田槽(1)内の半田溶
融液(5)が連続的に補給されることになる。
Further, due to the overflow, the solder melt (5) in the inner solder bath (2) gradually decreases, but the inner solder bath (2)
Since the solder melt liquid replenishment hole (8) communicating with the outer solder bath (1) is provided near the lower part, the solder melt liquid (5) in the outer solder bath (1) is continuously replenished. Become.

なお、被半田外装物(6)への半田外装は、上記状態の
内半田槽(2)内に被半田外装物(6)を持ち込み、保
持・回転手段(3)により、被半田外装物(6)を内半
田槽(2)と同一速度で回転させながら外周方向へ移動
させて、アウターリード(16)に上記立ち上がった半田
溶融液(5)を付着させ、その後の回転による遠心力
で、付着した半田溶融液(5)を薄く均一にし、その状
態で凝固させればよい。
In addition, as the solder sheath for the solder sheath (6), the solder sheath (6) is brought into the inner solder bath (2) in the above state, and the solder sheath (3) is held by the holding / rotating means (3). 6) is moved in the outer peripheral direction while rotating at the same speed as the inner solder bath (2) to attach the rising solder melt (5) to the outer lead (16), and by centrifugal force due to the subsequent rotation, The attached solder melt (5) may be made thin and uniform, and then solidified in that state.

III 外半田槽に下部で連通する仕切り板を立設し、該
仕切り板の外側にもオーバーフロー溶融液の濾過器を設
けてある場合 内半田槽(2)が回転すると、その回転力が外半田槽
(1)内の半田溶融液(5)にも及び、遠心力が作用し
て、外半田槽(1)内の仕切り板(11)と内半田槽
(2)の外周壁(9)と間に半田溶融液(5)は仕切り
板(11)に沿って立ち上がる。
III In the case where a partition plate that communicates with the lower part of the outer solder tank is erected upright, and a filter for the overflow melt is also provided outside the partition plate. When the inner solder tank (2) rotates, its rotational force is A centrifugal force also acts on the solder melt (5) in the bath (1) to cause the partition plate (11) in the outer solder bath (1) and the outer peripheral wall (9) of the inner solder bath (2). In the meantime, the solder melt (5) rises along the partition plate (11).

そのため、立ち上がった半田溶融液(5)は、該仕切り
板(11)の上端部からオーバーフローして、仕切り板
(11)の外側へ流下する。この途中に設けた濾過器(1
0)により、先に一度濾過されている半田溶融液(5)
は、再度ここでも酸化物等(15)を濾過・除去される。
Therefore, the rising solder melt (5) overflows from the upper end of the partition plate (11) and flows down to the outside of the partition plate (11). A filter (1
Solder melt (5) which has been filtered once by (0)
Here again, the oxides and the like (15) are filtered and removed again.

そして一層不純物のない共晶半田となった半田溶融液
(5)は、仕切り板(11)下部の通孔(12)から外半田
槽(1)の中央寄りへ押しやられ、上記IIで述べた如
く、内半田槽(2)下部寄りの半田溶融液補給用孔
(8)を経て、内半田槽(2)内へ連続的に補給される
ことになる。
Then, the solder melt (5), which became more eutectic solder with no impurities, was pushed from the through hole (12) in the lower part of the partition plate (11) toward the center of the outer solder bath (1), and was described in II above. As described above, the solder is supplied continuously into the inner solder bath (2) through the solder melt supply hole (8) near the lower part of the inner solder bath (2).

IV 内半田槽の外周壁上端部に、内側への寸法を可変に
内周縁部を設けてある場合 内半田槽(2)の回転で、半田溶融液(5)が上記の如
く遠心力により外周壁(9)内周面に沿って立ち上がる
が、その半田溶融液(5)の厚みは、内周縁部(14)の
内側への寸法(t)より厚くなろうとしても、余分な量
はオーバーフローされてしまう。
In the case where the inner peripheral edge is provided at the upper end of the outer peripheral wall of the IV inner solder bath so that the inner dimension can be varied. When the inner solder bath (2) is rotated, the solder melt (5) is rotated by the centrifugal force as described above. It rises along the inner peripheral surface of the wall (9), but even if the thickness of the solder melt (5) becomes thicker than the inward dimension (t) of the inner peripheral edge portion (14), the excess amount overflows. Will be done.

そのため、外周壁(1)内周面に沿って立ち上がる半田
溶融液(5)の厚みは、該内周縁部(14)の厚み(t)
だけのものになる。そこで、アウターリード(16)の長
さその他被半田外装物(6)の違いに対応して、アウタ
ーリード(16)に付着する半田溶融液(5)の量が調節
可能となる。
Therefore, the thickness of the solder melt (5) rising along the inner peripheral surface of the outer peripheral wall (1) is the thickness (t) of the inner peripheral edge portion (14).
It's just something. Therefore, the amount of the solder melt (5) attached to the outer leads (16) can be adjusted according to the length of the outer leads (16) and other differences in the outer package (6) to be soldered.

〔実施例〕〔Example〕

第1図ないし第3図で示す実施例において、固定式の外
半田槽(1)は、その外周部を加熱・保温手段(4)で
囲繞して、内部には半田溶融液(5)が入れてあり、上
部には両側へ開放可能な蓋板(17)を設け、かつ中央下
部からは内半田槽回転用縦軸(7)が通挿可能な円筒部
(18)を立設してある。該外半田槽(1)の形状は、丸
型でも角型でもよい。
In the embodiment shown in FIGS. 1 to 3, the fixed type outer solder bath (1) is surrounded by a heating / heat retaining means (4), and a solder melt (5) is placed inside. A lid plate (17) that can be opened on both sides is provided in the upper part, and a cylindrical part (18) through which the vertical axis (7) for rotating the inner solder bath can be inserted is provided upright from the central lower part. is there. The shape of the outer solder bath (1) may be round or square.

回転式の内半田槽(2)は、上部開口のドーナツ形で、
その下半部を外半田槽(1)内の半田溶融液(5)中に
浸漬させてあり、中央部の水平状支持板(19)により、
上記外半田槽(1)中央の円筒部(18)に通挿された内
半田槽回転用縦軸(7)と接続してある。該内半田槽回
転用縦軸(7)は、円筒状で下部を内半田槽回転用モー
タ(20)とベルト(20)を介して連結してある。
The rotating inner solder bath (2) has a donut shape with an upper opening,
The lower half is immersed in the solder melt (5) in the outer solder bath (1), and by the horizontal support plate (19) at the center,
It is connected to the vertical axis (7) for rotating the inner solder bath, which is inserted through the cylindrical portion (18) at the center of the outer solder bath (1). The inner solder bath rotating vertical axis (7) is cylindrical and has a lower portion connected to the inner solder bath rotating motor (20) via a belt (20).

上記内半田槽(2)の外周壁(9)は、その上端部が立
ち上がった半田溶融液(5)がオーバーフローする部分
であるが、該外周壁(9)の外方には、オーバーフロー
溶融液から酸化物等(15)を濾過・除去するメッシュ状
の濾過器(10)を設けてある。該濾過器(10)は内半田
槽(2)とは別体であり、外半田槽(1)内に固定して
ある。
The outer peripheral wall (9) of the inner solder bath (2) is a portion where the solder melt (5) whose upper end has risen overflows, but outside the outer peripheral wall (9), the overflow melt is formed. A mesh-shaped filter (10) for filtering and removing oxides (15) is provided. The filter (10) is separate from the inner solder bath (2) and is fixed in the outer solder bath (1).

外半田槽(1)と内半田槽(2)間は、内半田槽(2)
の内周壁(22)の下部寄りに半田溶融液補給用孔(8)
を形成して、両槽(1)(2)を連通させるある。
The inner solder bath (2) is located between the outer solder bath (1) and the inner solder bath (2).
Hole (8) for replenishing solder melt near the bottom of the inner peripheral wall (22)
Is formed so that both tanks (1) and (2) communicate with each other.

また、内半田槽(2)の外周壁(9)の上端部に、立ち
上がった半田溶融液(5)の厚み調節用として、内側へ
の寸法(t)を可変に内周縁部(14)を設けてある。そ
の内側への寸法(t)を可変にするため、ここでは、内
径の異なる環状の内周縁部(14)を、上記外周壁(9)
上端部に交換可能に装着してある。
Further, an inner peripheral edge portion (14) is variably provided on the upper end portion of the outer peripheral wall (9) of the inner solder bath (2) for adjusting the thickness of the rising solder melt (5). It is provided. In order to make the inward dimension (t) variable, here, the annular inner peripheral edge portion (14) having a different inner diameter is connected to the outer peripheral wall (9).
It is replaceably attached to the upper end.

さらに、外半田槽(1)と内半田槽(2)の外周壁
(9)間には、下部が通孔(12)で連通する仕切り板
(11)を立設して、該仕切り板(11)の外方にもオーバ
ーフロー溶融液の副濾過器(13)を設けてある。
Further, a partition plate (11) whose lower portion communicates with a through hole (12) is erected between the outer peripheral wall (9) of the outer solder bath (1) and the inner solder bath (2), and the partition plate ( A sub-filter (13) for overflow melt is also provided outside of 11).

なお、外半田槽(1)上部の蓋板(17)の下部には、オ
ーバーフローする半田溶融液(5)を、内半田槽(2)
の外周壁(9)外側の濾過器(10)へ導く案内板(23)
を設けてある。
In the lower part of the lid plate (17) above the outer solder bath (1), the overflowing solder melt (5) is filled with the inner solder bath (2).
Plate (23) leading to the filter (10) outside the outer peripheral wall (9)
Is provided.

保持・回転手段(3)は、上部で被半田外装物(6)の
アウターリード(16)以外を保持し腕が外側方へ伸びる
保持治具(25)と連結するとともに、下部で保持治具回
転用モータ(26)に連結する保持治具回転用縦軸(24)
とからなる。該保持治具回転用縦軸(24)は、上記内半
田槽回転用縦軸(7)内に通挿してあり、かつ該内半田
槽回転用縦軸(24)とほぼ同一速度で回転可能としてあ
る。また該保持・回転手段(3)は、保持治具回転用縦
軸(26)の中央部で下半部と上半部とを分離可能とし
て、保持治具(2)を内半田槽(2)内・外へ移動可能
としてある。
The holding / rotating means (3) is connected to a holding jig (25) whose arms extend outside while holding the parts other than the outer leads (16) of the outer package (6) to be soldered at the upper part, and the holding jig at the lower part. Holding jig rotation axis (24) connected to rotation motor (26)
Consists of. The holding jig rotating vertical axis (24) is inserted into the inner solder bath rotating vertical axis (7) and can rotate at substantially the same speed as the inner solder bath rotating vertical axis (24). There is. The holding / rotating means (3) can separate the lower half part and the upper half part at the central part of the holding jig rotating vertical axis (26) so that the holding jig (2) can be connected to the inner solder bath (2). ) It is possible to move in and out.

発明の効果 以上で明らかな如く、本発明に係る回転式半田処理法で
の半田溶融液補給兼酸化膜除去方法および装置は、回転
式の半田処理法において、半田溶融液の補給や酸化膜等
の除去を、きわめて効率良く行うことができる。
EFFECTS OF THE INVENTION As is apparent from the above, the method and the device for replenishing the solder melt and the oxide film in the rotary solder treatment method according to the present invention are the replenishment of the solder melt and the oxide film in the rotary solder treatment method. Can be removed very efficiently.

I まず、半田溶融液の酸化物等の濾過に関し、本発明
では固定型外半田槽内で回転型の内半田槽を回転させ、
その遠心力で内半田槽の外周壁内周面に沿って立ち上が
った半田溶融液を、外周壁上端部からオーバーフローさ
せ、それを濾過器で濾過して外半田槽へ戻すものであ
る。
I First, regarding the filtration of oxides or the like of the solder melt, in the present invention, the rotating inner solder bath is rotated in the fixed outer solder bath,
The centrifugal force causes the molten solder that has risen along the inner peripheral surface of the outer peripheral wall of the inner solder tank to overflow from the upper end of the outer peripheral wall, and is filtered by a filter to be returned to the outer solder tank.

そのため、従来のようにポンプを用いて大型化すること
なく、半田溶融液は連続かつ自動的に循環して酸化物等
を除去することができ、不純物のない共晶半田の半田溶
融液による高品質の半田外装処理を行うことができる。
Therefore, the solder melt can be continuously and automatically circulated to remove oxides and the like without increasing the size by using a pump as in the conventional case, and the solder melt of eutectic solder without impurities can be enhanced by the solder melt. It is possible to perform quality solder exterior processing.

II 次に、半田外装を行う内半田槽への半田溶融液の補
給に関し、本発明では内半田槽を、半田溶融液が多量に
入った外半田槽内に下部で連通させて浸漬し、該内半田
槽を回転させるものである。
II Next, regarding the replenishment of the solder melt to the inner solder bath for solder exterior coating, in the present invention, the inner solder bath is immersed in the outer solder bath containing a large amount of the solder melt in the lower part, The inner solder bath is rotated.

そのため、上記オーバーフローで内半田槽内の半田溶融
液が減少しても、それに応じて外半田槽から内半田槽
へ、上記濾過された後の半田溶融液を、連続かつ自動的
に補給することができる。
Therefore, even if the solder melt in the inner solder bath decreases due to the overflow, the filtered solder melt can be continuously and automatically replenished from the outer solder bath to the inner solder bath accordingly. You can

III さらに、半田溶融液の酸化物等の濾過に関し、本
発明の図示実施例では外半田槽に下部で連通する仕切り
板を立設し、該仕切り板の外側にもオーバーフロー溶融
液の濾過器を設けてある。これにより、内半田槽の回転
で仕切り板と内半田槽外周壁との間の半田溶融液も、該
仕切り板に沿って立ち上がってオーバーフローされ、こ
でも連続かつ自動的に濾過される。
Further, regarding the filtration of oxides of the solder melt, in the illustrated embodiment of the present invention, a partition plate communicating with the lower part of the outer solder tank is erected, and a filter for the overflow melt is also provided outside the partition plate. It is provided. As a result, the molten solder liquid between the partition plate and the outer peripheral wall of the inner solder tank rises along the partition plate due to the rotation of the inner solder bath and overflows, and is continuously and automatically filtered.

そのため、半田溶融液は一層不純物のない共晶半田とな
り、高品質の半田外装処理を行うことができる。
Therefore, the solder melt becomes eutectic solder with less impurities, and high-quality solder coating processing can be performed.

IV しかも、本発明の図示実施例では内半田槽外周壁の
上端部に、内側への寸法が可変な内周縁部を設けてあ
る。これにより、内半田槽の回転で半田溶融液が外周壁
内周面に沿って立ち上った際、内周縁部の寸法より多い
半田溶融液はオーバーフローしてしまう。
In addition, in the illustrated embodiment of the present invention, the inner peripheral edge portion having a variable inward dimension is provided at the upper end portion of the outer peripheral wall of the inner solder bath. As a result, when the solder melt rises along the inner peripheral surface of the outer peripheral wall due to the rotation of the inner solder bath, the solder melt larger than the dimension of the inner peripheral edge overflows.

そのため、内周縁部の内側への寸法を変えることで、内
半田槽で立ち上がる半田溶融液の厚みを調節でき、被半
田外装物へ付着する半田溶融液の量を調節することがで
きる。
Therefore, by changing the inward dimension of the inner peripheral edge portion, the thickness of the solder melt that rises in the inner solder bath can be adjusted, and the amount of the solder melt that adheres to the package to be soldered can be adjusted.

【図面の簡単な説明】[Brief description of drawings]

図は本発明に係る回転式半田処理法での半田溶融液補給
兼酸化物除去方法を実施する装置の一例で、第1図は内
半田槽および保持治具が回転する作動状態時の全体の縦
断正面図、第2図は内半田槽および保持治具を止めた停
止状態時の要部の縦断正面図、第3図は内半田槽および
保持治具を回転させた作動状態時の要部の縦断正面図で
ある。 図面符号 (1)……外半田槽、(2)……内半田槽 (3)……保持・回転手段、(4)……加熱・保温手段 (5)……半田溶融液、(6)……被半田外装物 (7)……内半田槽回転用縦軸、(8)……補給孔 (9)……外周壁、(10)……濾過器 (11)……仕切り板、(12)……通孔 (13)……副濾過器、(14)……内周縁部 (15)……酸化物等、(16)……アウターリード (17)……蓋板、(18)……円筒部 (19)……水平支持板、(20)……モータ (21)……ベルト、(22)……内周壁 (23)……案内板、(24)……縦軸 (25)……保持治具、(26)……モータ (t)……厚み
FIG. 1 shows an example of an apparatus for carrying out a method for replenishing a solder melt and an oxide removing method in a rotary solder processing method according to the present invention, and FIG. 1 shows an entire apparatus in an operating state in which an inner solder bath and a holding jig rotate. FIG. 2 is a vertical sectional front view of a main portion when the inner solder bath and the holding jig are stopped, and FIG. 3 is a main portion when the inner solder bath and the holding jig are rotated. FIG. Drawing reference numeral (1) ... outer solder bath, (2) ... inner solder bath (3) ... holding / rotating means, (4) ... heating and heat retaining means (5) ... solder melt, (6) …… Solder to be soldered (7) …… Rotation axis for inner solder bath rotation, (8) …… Supply hole (9) …… Outer wall, (10) …… Filter (11) …… Partition plate, ( 12) ...... through hole (13) ...... sub-filter, (14) …… inner peripheral edge (15) …… oxide, etc. (16) …… outer lead (17) …… cover plate, (18) …… Cylindrical part (19) …… Horizontal support plate, (20) …… Motor (21) …… Belt, (22) …… Inner peripheral wall (23) …… Guide plate, (24) …… Vertical axis (25 ) …… Holding jig, (26) …… Motor (t) …… Thickness

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】非回転型の外半田槽(1)内で、ドーナツ
状の回転型内半田槽(2)を中央の縦軸(7)を中心に
回転させて、遠心力で外周壁(9)の内周面に沿って立
ち上がった半田溶融液(5)に、被半田外装物(6)を
浸漬・付着させるとともに、該被半田外装物(6)も回
転させて、付着した半田溶融液(5)を遠心力で振り払
い薄く均一にして凝固させるようにした回転式半田処理
法において、 上記内半田槽(2)の回転により、該内半田槽(2)の
外周壁(9)内周面に沿って立ち上がった半田溶融液
(5)を、外周壁(9)上端部から外半田槽(1)へオ
ーバーフローさせて、その途中に設けた濾過器(10)に
て酸化物等(15)を除去させるとともに、 半田溶融液(5)が減少した上記内半田槽(2)内に、
該内半田槽(2)下部寄りの半田溶融液補給用孔(8)
から、外半田槽(1)内の半田溶融液(5)を流入さ
せ、半田溶融液(5)が循環するようにした、回転式半
田処理法での半田溶融液補給兼酸化膜除去方法。
1. A non-rotating outer solder bath (1), wherein a doughnut-shaped inner rotating solder bath (2) is rotated around a central vertical axis (7) and centrifugal force is applied to the outer peripheral wall ( 9) The outer packaged object (6) to be soldered is immersed in and adhered to the molten solder liquid (5) rising along the inner peripheral surface of 9), and the outer packaged object (6) to be soldered is also rotated to melt the attached solder. In a rotary soldering method in which the liquid (5) is shaken off by centrifugal force to be thinly and uniformly solidified, the outer peripheral wall (9) of the inner solder bath (2) is rotated by rotating the inner solder bath (2). The solder melt (5) rising along the inner peripheral surface overflows from the upper end of the outer peripheral wall (9) to the outer solder bath (1), and oxides etc. are generated by a filter (10) provided on the way. (15) is removed, and in the inner solder bath (2) where the solder melt (5) is reduced,
Solder melt replenishment hole (8) near the bottom of the solder bath (2)
From the above, the solder melt solution (5) in the outer solder bath (1) is caused to flow in so that the solder melt solution (5) is circulated.
【請求項2】内半田槽(2)の回転による遠心力によ
り、内半田槽(2)からオーバーフローさせ、濾過させ
た後の外半田槽(1)内の半田溶融液(5)を、外半田
槽(1)内に下部で連通するように立設した仕切り板
(11)から再度オーバーフローさせ、その途中に設けた
副濾過器(13)にて酸化物等(15)を再度除去するよう
にした、請求項に記載した回転式半田処理法での半田
溶融液補給兼酸化膜除去方法。
2. The solder melt (5) in the outer solder bath (1) after being overflowed from the inner solder bath (2) and filtered by centrifugal force generated by the rotation of the inner solder bath (2) Overflow again from the partition plate (11) erected so as to communicate with the lower part in the solder bath (1), and remove the oxides (15) again by the sub-filter (13) provided in the middle. The method for replenishing a solder melt and also removing an oxide film by the rotary solder processing method according to claim 1.
【請求項3】内半田槽(2)の外周壁(9)上端部の内
周縁部(14)を、内側への寸法(t)が可変とすること
により、外周壁(9)内周面に沿って立ち上がる半田溶
融液(5)の厚みを調節するようにした、請求項に記
載の半田溶融液補給兼酸化膜除去方法。
3. An inner peripheral surface of an outer peripheral wall (9), wherein an inner peripheral edge portion (14) of an upper end portion of the outer peripheral wall (9) of the inner solder bath (2) has a variable inward dimension (t). The solder melt replenishment and oxide film removal method according to claim 1, wherein the thickness of the solder melt (5) rising along the line is adjusted.
【請求項4】外部に加熱・保温手段(4)を有して、内
部に半田溶融液(5)を入れた非回転型の外半田槽
(1)と、外半田槽(1)内で回転する回転型の内半田
槽(2)と、被半田外装物(6)を保持し、内半田槽
(2)とほぼ同一速度で回転する保持・回転手段(3)
とからなり、 上記内半田槽(2)は、上部開口のドーナツ形で、下半
部を外半田槽(1)内の半田溶融液(5)中に浸漬させ
て、外半田槽(1)中央部に立設した内半田槽回転用縦
軸(7)に接続するとともに、下部寄りに外半田槽
(1)と連通する半田溶融液補給用孔(8)を設け、 かつ内半田槽(2)の外周壁(9)の外方に、オバーフ
ロー溶融液の濾過器(10)を設けた、回転式半田処理法
での半田溶融液補給兼酸化膜除去装置。
4. A non-rotating outer solder bath (1) having a heating / heat-retaining means (4) outside and containing a solder melt (5) inside and an outer solder bath (1). Holding and rotating means (3) for holding the rotating inner solder bath (2) and the outer package to be soldered (6) and rotating at substantially the same speed as the inner solder bath (2).
The inner solder bath (2) has a donut shape with an upper opening, and the lower half is immersed in the solder melt (5) in the outer solder bath (1) to form the outer solder bath (1). It is connected to a vertical axis (7) for rotating the inner solder bath which is erected at the center, and a solder melt supply hole (8) communicating with the outer solder bath (1) is provided near the lower part, and the inner solder bath (7) A solder melt replenishment and oxide film removal device by a rotary solder treatment method, wherein an overflow melt filter (10) is provided outside the outer peripheral wall (9).
【請求項5】外半田槽(1)と内半田槽(2)の外周壁
(9)との間に、下部の通孔(12)で連通する仕切り板
(11)を立設して、該仕切り板(11)の外方にもオーバ
ーフロー溶融液の副濾過器(13)を設けた、請求項に
記載した回転式半田処理法での半田溶融液補給兼酸化膜
除去装置。
5. A partition plate (11) communicating with a lower through hole (12) is erected between the outer solder bath (1) and the outer peripheral wall (9) of the inner solder bath (2), The solder melt replenishment and oxide film removal device in the rotary solder processing method according to claim 1, further comprising an overflow melt subfilter (13) provided outside the partition plate (11).
【請求項6】内半田槽(2)の外周壁(9)の上端部
に、外周壁(9)内周面に沿って立ち上がる半田溶融液
(5)の厚み調節用として、内側への寸法(t)を可変
に内周縁部(14)を設けた、請求項に記載の回転式半
田処理法での半田溶融液補給兼酸化膜除去装置。
6. An inner dimension for adjusting the thickness of the solder melt (5) rising along the inner peripheral surface of the outer peripheral wall (9) at the upper end of the outer peripheral wall (9) of the inner solder bath (2). The solder melt replenishing and oxide film removing device in the rotary solder processing method according to claim 1, wherein the inner peripheral edge portion (14) is provided so that (t) is variable.
JP5005090A 1990-03-01 1990-03-01 Method and apparatus for replenishment of solder melt and removal of oxide film by rotary solder processing method Expired - Lifetime JPH0671650B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5005090A JPH0671650B2 (en) 1990-03-01 1990-03-01 Method and apparatus for replenishment of solder melt and removal of oxide film by rotary solder processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5005090A JPH0671650B2 (en) 1990-03-01 1990-03-01 Method and apparatus for replenishment of solder melt and removal of oxide film by rotary solder processing method

Publications (2)

Publication Number Publication Date
JPH03254362A JPH03254362A (en) 1991-11-13
JPH0671650B2 true JPH0671650B2 (en) 1994-09-14

Family

ID=12848167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5005090A Expired - Lifetime JPH0671650B2 (en) 1990-03-01 1990-03-01 Method and apparatus for replenishment of solder melt and removal of oxide film by rotary solder processing method

Country Status (1)

Country Link
JP (1) JPH0671650B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0741570Y2 (en) * 1992-05-08 1995-09-27 千住金属工業株式会社 Jet solder bath
JP2010155269A (en) 2008-12-27 2010-07-15 Senju Metal Ind Co Ltd Solder bath and method of heating solder contained in the solder bath
JP5458854B2 (en) * 2009-12-11 2014-04-02 千住金属工業株式会社 Jet solder bath

Also Published As

Publication number Publication date
JPH03254362A (en) 1991-11-13

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