JPH064898Y2 - プラズマ装置 - Google Patents
プラズマ装置Info
- Publication number
- JPH064898Y2 JPH064898Y2 JP1986196798U JP19679886U JPH064898Y2 JP H064898 Y2 JPH064898 Y2 JP H064898Y2 JP 1986196798 U JP1986196798 U JP 1986196798U JP 19679886 U JP19679886 U JP 19679886U JP H064898 Y2 JPH064898 Y2 JP H064898Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- vacuum container
- applicator
- short
- circuit plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 7
- 239000013078 crystal Substances 0.000 claims description 5
- 238000004381 surface treatment Methods 0.000 claims description 4
- 230000035699 permeability Effects 0.000 claims description 2
- 230000005684 electric field Effects 0.000 description 16
- 239000007789 gas Substances 0.000 description 14
- 238000005192 partition Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004235 Orange GGN Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009461 vacuum packaging Methods 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986196798U JPH064898Y2 (ja) | 1986-12-23 | 1986-12-23 | プラズマ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986196798U JPH064898Y2 (ja) | 1986-12-23 | 1986-12-23 | プラズマ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63103737U JPS63103737U (enExample) | 1988-07-05 |
| JPH064898Y2 true JPH064898Y2 (ja) | 1994-02-09 |
Family
ID=31155933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986196798U Expired - Lifetime JPH064898Y2 (ja) | 1986-12-23 | 1986-12-23 | プラズマ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH064898Y2 (enExample) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5719567A (en) * | 1981-05-22 | 1982-02-01 | Hiroshi Adachi | Ice making vessel |
| JPS5849295A (ja) * | 1981-09-17 | 1983-03-23 | Konishiroku Photo Ind Co Ltd | 光学的情報記録媒体 |
-
1986
- 1986-12-23 JP JP1986196798U patent/JPH064898Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63103737U (enExample) | 1988-07-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4970435A (en) | Plasma processing apparatus | |
| US5714009A (en) | Apparatus for generating large distributed plasmas by means of plasma-guided microwave power | |
| US20030173030A1 (en) | Plasma processing apparatus | |
| JPH0197399A (ja) | プラズマ処理方法および装置並びにプラズマ処理装置用モード変換器 | |
| KR0174070B1 (ko) | 마이크로파 플라즈마 처리 장치 및 방법 | |
| JPH064898Y2 (ja) | プラズマ装置 | |
| JP3129814B2 (ja) | マイクロ波プラズマ装置 | |
| JP2552140B2 (ja) | プラズマ発生反応装置 | |
| JPH0544798B2 (enExample) | ||
| TW392215B (en) | Surface processing apparatus | |
| JP3156492B2 (ja) | プラズマ処理装置及びプラズマ処理方法 | |
| JPH0623569Y2 (ja) | プラズマ発生反応装置 | |
| JP3491190B2 (ja) | プラズマ処理装置 | |
| JPH0463284A (ja) | マイクロ波プラズマcvd装置 | |
| JPH05129095A (ja) | プラズマ処理装置 | |
| JP3337266B2 (ja) | 電子サイクロトロン共鳴プラズマの科学蒸着装置 | |
| JPH10106796A (ja) | プラズマ処理装置 | |
| JP2001284331A (ja) | プラズマプロセス装置 | |
| JPH10107011A (ja) | プラズマ処理装置 | |
| JP3042347B2 (ja) | プラズマ装置 | |
| JP3085155B2 (ja) | プラズマ処理装置 | |
| JP2972507B2 (ja) | マイクロ波プラズマ処理装置 | |
| JP2607832B2 (ja) | マイクロ波プラズマ処理方法 | |
| JP4514291B2 (ja) | マイクロ波プラズマ処理装置及びプラズマ処理方法 | |
| JPH01296599A (ja) | Ecrプラズマ発生装置 |