JPH0648834Y2 - プラズマcvd装置 - Google Patents
プラズマcvd装置Info
- Publication number
- JPH0648834Y2 JPH0648834Y2 JP1989016877U JP1687789U JPH0648834Y2 JP H0648834 Y2 JPH0648834 Y2 JP H0648834Y2 JP 1989016877 U JP1989016877 U JP 1989016877U JP 1687789 U JP1687789 U JP 1687789U JP H0648834 Y2 JPH0648834 Y2 JP H0648834Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- electrode
- plasma cvd
- wafers
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989016877U JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマcvd装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989016877U JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマcvd装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02108335U JPH02108335U (US06534493-20030318-C00166.png) | 1990-08-29 |
JPH0648834Y2 true JPH0648834Y2 (ja) | 1994-12-12 |
Family
ID=31230188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989016877U Expired - Fee Related JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマcvd装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0648834Y2 (US06534493-20030318-C00166.png) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60258924A (ja) * | 1984-06-06 | 1985-12-20 | Hitachi Ltd | プラズマ処理装置 |
JPH0719751B2 (ja) * | 1984-07-02 | 1995-03-06 | 鐘淵化学工業株式会社 | 成膜方法 |
JPS6257213A (ja) * | 1985-09-06 | 1987-03-12 | Fuji Electric Corp Res & Dev Ltd | プラズマcvd装置 |
JPH01127237U (US06534493-20030318-C00166.png) * | 1988-02-24 | 1989-08-31 |
-
1989
- 1989-02-17 JP JP1989016877U patent/JPH0648834Y2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH02108335U (US06534493-20030318-C00166.png) | 1990-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS63187619A (ja) | プラズマcvd装置 | |
US4424096A (en) | R-F Electrode type workholder and methods of supporting workpieces during R-F powered reactive treatment | |
JPH0648834Y2 (ja) | プラズマcvd装置 | |
JPS5914633A (ja) | プラズマcvd装置 | |
JP3117366B2 (ja) | プラズマ処理装置 | |
JPS63190173A (ja) | プラズマ処理方法 | |
JPS6056793B2 (ja) | プラズマ表面処理装置 | |
JP3006029B2 (ja) | 真空成膜装置 | |
JPS62299031A (ja) | 平行平板型エツチング装置の電極構造 | |
JPH0590939U (ja) | プラズマcvd装置 | |
JPH0751755B2 (ja) | プラズマcvd装置 | |
JP2501843B2 (ja) | 薄膜製造装置 | |
JPH0338730B2 (US06534493-20030318-C00166.png) | ||
JPS5843508A (ja) | 量産型成膜装置 | |
JPS62280372A (ja) | プラズマ気相成長装置 | |
JPS59211219A (ja) | プラズマcvd装置 | |
JPH02303029A (ja) | プラズマ電極 | |
JP3130525B2 (ja) | プラズマ気相成長装置 | |
JPS59161828A (ja) | 反応装置 | |
JP3002294B2 (ja) | プラズマcvdによる絶縁膜の形成方法 | |
JPH03214723A (ja) | プラズマcvd装置 | |
JPH0351971Y2 (US06534493-20030318-C00166.png) | ||
JP3261795B2 (ja) | プラズマ処理装置 | |
JP2993813B2 (ja) | プラズマcvd装置 | |
JP2793821B2 (ja) | プラズマ処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |