JPH0647758B2 - 電解槽と陽極 - Google Patents

電解槽と陽極

Info

Publication number
JPH0647758B2
JPH0647758B2 JP4050796A JP5079692A JPH0647758B2 JP H0647758 B2 JPH0647758 B2 JP H0647758B2 JP 4050796 A JP4050796 A JP 4050796A JP 5079692 A JP5079692 A JP 5079692A JP H0647758 B2 JPH0647758 B2 JP H0647758B2
Authority
JP
Japan
Prior art keywords
anode
cathode
strip
shell
cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4050796A
Other languages
English (en)
Japanese (ja)
Other versions
JPH04346697A (ja
Inventor
ジェラルド・アール・ポート
ゼイン・エイ・ウエイド
エイチ・カーク・フォウラー
アンドリュー・ジェイ・ニクサ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eltech Systems Corp
Original Assignee
Eltech Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eltech Systems Corp filed Critical Eltech Systems Corp
Publication of JPH04346697A publication Critical patent/JPH04346697A/ja
Publication of JPH0647758B2 publication Critical patent/JPH0647758B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Primary Cells (AREA)
  • Bipolar Transistors (AREA)
  • Inert Electrodes (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
JP4050796A 1991-03-21 1992-03-09 電解槽と陽極 Expired - Fee Related JPH0647758B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67298191A 1991-03-21 1991-03-21
US672981 1991-03-21

Publications (2)

Publication Number Publication Date
JPH04346697A JPH04346697A (ja) 1992-12-02
JPH0647758B2 true JPH0647758B2 (ja) 1994-06-22

Family

ID=24700825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4050796A Expired - Fee Related JPH0647758B2 (ja) 1991-03-21 1992-03-09 電解槽と陽極

Country Status (7)

Country Link
EP (1) EP0504939B1 (en, 2012)
JP (1) JPH0647758B2 (en, 2012)
KR (1) KR100249115B1 (en, 2012)
AT (1) ATE141962T1 (en, 2012)
CA (1) CA2062089A1 (en, 2012)
DE (1) DE69213060T2 (en, 2012)
TW (1) TW197534B (en, 2012)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003105598A (ja) * 2001-09-27 2003-04-09 Tdk Corp 電極装置
WO2023101419A1 (ko) * 2021-12-01 2023-06-08 에이티엑스 주식회사 동박 제조장치

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2714395B1 (fr) * 1993-12-28 1996-04-05 Lorraine Laminage Anode soluble pour dispositif d'électrodéposition.
JPH07316861A (ja) * 1994-05-24 1995-12-05 Permelec Electrode Ltd 電極構造体
JP3606932B2 (ja) * 1994-12-30 2005-01-05 石福金属興業株式会社 電解用複合電極
TW318320B (en, 2012) * 1995-08-07 1997-10-21 Eltech Systems Corp
WO1998017845A1 (fr) * 1996-10-24 1998-04-30 Ishifuku Metal Industry Co., Ltd. Electrolyseur
JPH11302900A (ja) * 1998-04-17 1999-11-02 Ishifuku Metal Ind Co Ltd 電解装置及びその組立て方法
JP3261582B2 (ja) * 2000-02-04 2002-03-04 株式会社三船鉄工所 電解銅箔の製造装置
US6585846B1 (en) * 2000-11-22 2003-07-01 3M Innovative Properties Company Rotary converting apparatus and method for laminated products and packaging
DE10235117B3 (de) * 2002-08-01 2004-02-12 EISENMANN Maschinenbau KG (Komplementär: Eisenmann-Stiftung) Anlage zur kataphoretischen Tauchlackierung von Gegenständen
BRPI0414384A (pt) * 2003-09-16 2006-11-21 Global Ionix Inc célula eletrolìtica para a remoção de material de uma solução
JP4038194B2 (ja) * 2004-03-03 2008-01-23 野▲崎▼工業株式会社 不溶性電極及びそれに使用される電極板並びにその使用方法
DE102004025669A1 (de) * 2004-05-21 2005-12-15 Diaccon Gmbh Funktionelle CVD-Diamantschichten auf großflächigen Substraten
US7494576B2 (en) * 2004-08-26 2009-02-24 General Electric Company Electroplating apparatus and method for making an electroplating anode assembly
JP5414257B2 (ja) * 2008-12-08 2014-02-12 株式会社昭和 電解用電極
KR101648537B1 (ko) * 2010-09-30 2016-08-16 가부시키가이샤 씽크. 라보라토리 실린더용 도금방법 및 장치
CN102321895B (zh) * 2011-09-01 2013-10-23 西安航天动力机械厂 一种整体式阳极槽
JP7005323B2 (ja) * 2017-12-08 2022-01-21 日鉄工材株式会社 金属箔製造装置
JP7045840B2 (ja) * 2017-12-08 2022-04-01 日鉄工材株式会社 金属箔製造装置及び電極板取付体
CN110565138B (zh) * 2019-09-06 2024-07-02 陕西汉和新材料科技有限公司 一种新型铜箔防氧化槽液下辊机制
WO2022164695A1 (en) * 2021-02-01 2022-08-04 Lam Research Corporation Spatially and dimensionally non-uniform channelled plate for tailored hydrodynamics during electroplating
CN113529117B (zh) * 2021-05-31 2022-12-06 宝鸡钛普锐斯钛阳极科技有限公司 一种电化学反应池
CN117926352B (zh) * 2024-03-19 2024-06-14 江苏兴虹科技有限公司 一种铜箔加工用生箔分切一体设备

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA682872A (en) * 1964-03-24 A. Mcneill John Apparatus for electroplating cylinders
US1881713A (en) * 1928-12-03 1932-10-11 Arthur K Laukel Flexible and adjustable anode
US3170699A (en) * 1963-03-25 1965-02-23 Sperry Rand Corp Manure spreader
US4340449A (en) * 1977-10-11 1982-07-20 Texas Instruments Incorporated Method for selectively electroplating portions of articles
US4318794A (en) * 1980-11-17 1982-03-09 Edward Adler Anode for production of electrodeposited foil
US5017275A (en) * 1989-10-23 1991-05-21 Eltech Systems Corporation Electroplating cell anode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003105598A (ja) * 2001-09-27 2003-04-09 Tdk Corp 電極装置
WO2023101419A1 (ko) * 2021-12-01 2023-06-08 에이티엑스 주식회사 동박 제조장치
JP2025504744A (ja) * 2021-12-01 2025-02-19 エーティーエックス株式会社 銅箔製造装置

Also Published As

Publication number Publication date
KR100249115B1 (ko) 2000-04-01
EP0504939A2 (en) 1992-09-23
JPH04346697A (ja) 1992-12-02
TW197534B (en, 2012) 1993-01-01
DE69213060D1 (de) 1996-10-02
EP0504939A3 (en) 1993-03-17
CA2062089A1 (en) 1992-09-22
KR920018247A (ko) 1992-10-21
EP0504939B1 (en) 1996-08-28
DE69213060T2 (de) 1997-01-23
ATE141962T1 (de) 1996-09-15

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