JPH0644536A - Magneto-resistance effect element and its production - Google Patents

Magneto-resistance effect element and its production

Info

Publication number
JPH0644536A
JPH0644536A JP19815792A JP19815792A JPH0644536A JP H0644536 A JPH0644536 A JP H0644536A JP 19815792 A JP19815792 A JP 19815792A JP 19815792 A JP19815792 A JP 19815792A JP H0644536 A JPH0644536 A JP H0644536A
Authority
JP
Japan
Prior art keywords
glass
insulating layer
substrate
conductor
effect element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19815792A
Other languages
Japanese (ja)
Other versions
JP2822793B2 (en
Inventor
Koichi Ikemoto
浩一 池本
Yasuhiro Shindo
泰宏 進藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4198157A priority Critical patent/JP2822793B2/en
Publication of JPH0644536A publication Critical patent/JPH0644536A/en
Application granted granted Critical
Publication of JP2822793B2 publication Critical patent/JP2822793B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To improve the characteristics of the magneto-resistance effect element having a magnetosensitive part consisting of fine patterns (<=several tenmum) and to shorten the size of the element by obtaining a ground surface substrate which warps less, has a smooth surface and is exact and small in the pitch of conductor electrodes and using this substrate. CONSTITUTION:The substrate consisting of an insulating layer 1 consisting of ceramics or glass which can be fired at <=1000 deg.C or a compsn. composed of the glass and the ceramics and a conductor metallized layer 3 formed on this insulating layer 1 is used. As a result, the smoothness and warpage of the surface of the insulating layer are decreased and the exactness and reduction of the pitch of the conductor electrodes are attained. The magnetosensitive part consisting of the fine (<=several tenmum) patterns free from the variation in shape is obtd., by which the characteristics are improved and the element is miniaturized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は磁気抵抗効果素子及びそ
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive effect element and its manufacturing method.

【0002】[0002]

【従来の技術】近年、磁気抵抗効果素子は検出感度や精
度向上のため、素子面を被検出物に対して平行、かつ最
近接に設置できるように、素子面の平滑なものが求めら
れている。また、薄膜素子の特性上の問題から、下地基
板の表面が平滑であることが求められている。そこで従
来は図5,図6に示すようにアルミナ基板1上に、表面
平滑性に優れるガラスグレーズ12を設けるとともに、
基板の角に表裏を結ぶ電極14を設け、そして前記ガラ
スグレーズ12上に強磁性体からなる感磁パターン15
を電極14と接続して設け、さらに裏面電極から端子を
取り出すという構造であった。
2. Description of the Related Art In recent years, in order to improve detection sensitivity and accuracy, magnetoresistive effect elements are required to have a smooth element surface so that the element surface can be placed in parallel with and closest to an object to be detected. There is. In addition, the surface of the base substrate is required to be smooth due to problems in the characteristics of the thin film element. Therefore, conventionally, as shown in FIGS. 5 and 6, a glass glaze 12 having excellent surface smoothness is provided on the alumina substrate 1, and
Electrodes 14 connecting the front and back are provided at the corners of the substrate, and a magnetic sensitive pattern 15 made of a ferromagnetic material is provided on the glass glaze 12.
Was connected to the electrode 14 and the terminal was taken out from the back electrode.

【0003】そして、その製造方法は、裏面にチップサ
イズ間隔でV溝を設けるとともに、V溝の交点にスルー
ホールを設けたアルミナ基板のスルーホールとランド以
外の全表面にガラスペーストをスクリーン印刷後焼成
し、さらに電極用の銀パラジウムペーストをランドとス
ルーホールにスクリーン印刷後焼成し、さらにグレーズ
側全面にパーマロイ等の強磁性体を蒸着し、レジスト塗
布、露光、現像、エッチング、レジスト剥離を経て電極
と接した目的形状の感磁パターンを得た後、分割して裏
面電極から端子を取り出すというものであった。
In addition, after the glass paste is screen-printed on the entire surface other than the through holes and lands of the alumina substrate having the V grooves at the chip size intervals on the back surface and the through holes at the intersections of the V grooves, the manufacturing method is as follows. After baking, silver-palladium paste for electrodes is screen-printed on the land and through holes, and then baked, and then a ferromagnetic material such as permalloy is vapor-deposited on the entire glaze side, followed by resist coating, exposure, development, etching, and resist stripping. After obtaining a magneto-sensitive pattern of a desired shape in contact with the electrode, the terminal was taken out from the back surface electrode by dividing it.

【0004】[0004]

【発明が解決しようとする課題】しかしながら上記のよ
うな構成では、アルミナ基板上のガラスが酸化珪素、酸
化アルミニウム、酸化バリウム、酸化カルシウム等を主
成分とするアルカリフリーの高転移点のものであって、
約1100〜1200℃の高温にて燃焼しているため、
得られた基板(以下、この様な構造のものをグレーズド
アルミナ基板という)は2インチ当り約100μm反
り、同基板をプロキシミティーアライナを用いて、基板
中心に焦点を合わせて、全面を一度に露光した場合、形
成されるパターンの形状は基板中心から離れるのに従っ
て、マスクのそれからかけ離れるため、分割後の製品の
抵抗値の分布が大きくなるという問題点が生じていた。
また、アルミナ焼成時の収縮率の差により生じるスルー
ホール間ピッチのばらつきがある基板に、表裏の導通を
取るべくスクリーン印刷によってスルーホール電極を形
成し、さらにスルーホールを4分割して各素子の電極と
するという工法を取っているため、素子寸法の縮小化
が、アルミナ基板とスルーホール電極の加工精度に依存
しており、既に限界に達しているという問題点と端子が
4ヵ所以下しか得られないという問題点があった。
However, in the above structure, the glass on the alumina substrate has an alkali-free high transition point containing silicon oxide, aluminum oxide, barium oxide, calcium oxide or the like as a main component. hand,
Since it burns at a high temperature of about 1100 to 1200 ° C,
The obtained substrate (hereinafter, such a structure is referred to as a glaze alumina substrate) is warped by about 100 μm per 2 inches, and the entire surface is exposed at one time by using the proximity aligner to focus on the substrate center. In this case, the shape of the formed pattern is separated from that of the mask as it is separated from the center of the substrate, which causes a problem that the distribution of the resistance value of the product after division becomes large.
In addition, a through hole electrode is formed by screen printing on the substrate where there is a variation in pitch between through holes caused by a difference in contraction rate during alumina firing to obtain conduction between the front and back sides, and the through hole is divided into four to divide each element into four elements. Since the method of using electrodes is adopted, the reduction of the element size depends on the processing accuracy of the alumina substrate and the through-hole electrode, and the problem that it has already reached its limit and only four or fewer terminals can be obtained. There was a problem that I could not do it.

【0005】本発明は上記課題に鑑み、反りが小さく、
かつ表面が平滑であって、導体電極がピッチが正確で小
さく、かつ従来以上の数存在した下地基板を得、薄膜の
微細な形状ばらつきの無い感磁部を有し、かつ小型であ
って、端子数に制限が無い磁器抵抗効果素子及びその製
造方法を提供するものである。
In view of the above problems, the present invention has a small warp,
And the surface is smooth, the pitch of the conductor electrodes is accurate and small, and there are a number of underlying substrates more than the conventional one, and the thin film has a magnetic sensitive portion without fine shape variation, and is small in size. A porcelain resistance effect element having an unlimited number of terminals and a method for manufacturing the same.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に本発明の磁気抵抗効果素子は、セラミックまたはガラ
スもしくはガラスとセラミック組成物からなる絶縁層
と、この絶縁層内部に表裏面間を結ぶように埋め込まれ
た導体メタライズ層と、この導体メタライズ層の表面に
露出した部分と接続されかつ絶縁層上に形成された所定
の形状の強磁性体薄膜からなる感磁部とで構成したもの
である。
In order to achieve the above object, the magnetoresistive effect element of the present invention comprises an insulating layer made of ceramic or glass or glass and a ceramic composition, and connecting the front and back surfaces inside the insulating layer. The conductor metallized layer embedded as described above, and the magnetic sensitive portion formed of a ferromagnetic thin film of a predetermined shape connected to the exposed portion of the conductor metallized layer and formed on the insulating layer. is there.

【0007】また、本発明の製造方法は、800〜10
00℃で焼成可能なセラミックもしくはガラス、あるい
はガラスとセラミックの原料粉とバインダと可塑剤から
なる生シートを作製し、前記生シートにスルーホールを
開口し、前記スルーホールに導電ペーストを充填した
後、高温で焼成する工程と、得られた基板の片面上に強
磁性体の薄膜を形成し、所定形状の感磁部を基板表面の
導体と接触させて形成する工程と、前記基板の裏面の導
体から端子を取り出す工程とを有することを特徴とする
ものである。
The manufacturing method of the present invention is 800 to 10
After preparing a raw sheet made of ceramic or glass that can be fired at 00 ° C., or raw material powder of glass and ceramics, a binder and a plasticizer, a through hole is opened in the raw sheet, and a conductive paste is filled in the through hole. , A step of baking at a high temperature, a step of forming a thin film of a ferromagnetic material on one surface of the obtained substrate, and forming a magnetically sensitive portion of a predetermined shape by contact with a conductor on the front surface of the substrate, And a step of taking out the terminal from the conductor.

【0008】[0008]

【作用】この構成によれば、反りが小さく、表面が平滑
であって、導体電極がピッチが正確で小さく、かつ従来
以上の数存在した下地基板を得、それを用いて磁気抵抗
効果素子を得るため、従来課題であった基板の反りに起
因していたパターンの露光ばらつきをなくすことがで
き、また基板と電極の加工精度が向上することによって
素子の縮小化が図れ、工法を変えることによって、端子
数の増加を図ることができる。
According to this structure, a warp is small, the surface is smooth, the pitch of the conductor electrodes is accurate and small, and there are a number of base substrates more than the conventional one. Therefore, it is possible to eliminate the exposure variation of the pattern due to the warp of the substrate, which has been a problem in the past, and to improve the processing accuracy of the substrate and the electrode to reduce the size of the element. Therefore, the number of terminals can be increased.

【0009】[0009]

【実施例】以下、本発明の一実施例の磁気抵抗効果素
子、及びその製造方法について図面を参照しながら説明
する。図1は本発明の一実施例における磁気抵抗効果素
子の断面図、図2は上面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A magnetoresistive effect element according to an embodiment of the present invention and a method of manufacturing the same will be described below with reference to the drawings. FIG. 1 is a sectional view of a magnetoresistive effect element according to an embodiment of the present invention, and FIG. 2 is a top view.

【0010】図1において、1はセラミックまたはガラ
スもしくはガラスとセラミックの組成物からなる絶縁
層、2は強磁性体薄膜、3は導体メタライズ層であり、
図2において、4は電流供給端子(+)、5はGND、
6,7は出力端子である。
In FIG. 1, 1 is an insulating layer made of ceramic or glass or a composition of glass and ceramic, 2 is a ferromagnetic thin film, 3 is a conductor metallized layer,
In FIG. 2, 4 is a current supply terminal (+), 5 is GND,
Reference numerals 6 and 7 are output terminals.

【0011】本発明の一実施例の磁気抵抗効果素子は、
ほう珪酸ガラスとアルミナを主成分とする組成物からな
る絶縁層1と、この絶縁層1の内部に表裏面間を結ぶよ
うに埋め込まれた、例えば銀:パラジウムの比が15:
85の導体メタライズ層3と、この導体メタライズ層3
の表面に露出した部分と接続されかつ絶縁層1上に厚み
が0.1μm、幅が10μmのパーマロイがストライプ
を折り返したような形状で形成された強磁性体膜薄膜2
とからなる構成である。絶縁層1の表面粗度は0.20
μmRa以下である。
The magnetoresistive element according to one embodiment of the present invention is
An insulating layer 1 made of a composition containing borosilicate glass and alumina as a main component, and embedded inside the insulating layer 1 so as to connect the front and back surfaces, for example, a silver: palladium ratio of 15:
85 conductor metallization layer 3 and this conductor metallization layer 3
A thin film of ferromagnetic material film 2 connected to the exposed portion of the surface of the insulating layer 1 and having a thickness of 0.1 μm and a width of 10 μm formed on the insulating layer 1 in the shape of folded stripes 2
It consists of and. The surface roughness of the insulating layer 1 is 0.20
It is below μmRa.

【0012】図3,図4は本発明の他の実施例を示す図
であり、図3に示す実施例では、導体メタライズ層3を
絶縁層1の表面に対しほぼ平行となるように内設した内
層3aを設け、そしてその内設された内層3aから絶縁
層1の表面及び裏面に向かって複数個の接続部3bを設
けたもので、また図4に示す実施例では、絶縁層1上に
ガラス層8を設け、そのガラス層8上に強磁性体薄膜2
を形成したものである。
FIGS. 3 and 4 are views showing another embodiment of the present invention. In the embodiment shown in FIG. 3, the conductor metallization layer 3 is internally provided so as to be substantially parallel to the surface of the insulating layer 1. The inner layer 3a is provided, and a plurality of connecting portions 3b are provided from the inner layer 3a provided therein to the front surface and the back surface of the insulating layer 1, and in the embodiment shown in FIG. The glass layer 8 is provided on the glass layer 8 and the ferromagnetic thin film 2 is formed on the glass layer 8.
Is formed.

【0013】次に、本発明の具体例について説明する。
ほう珪酸ガラス粉末とアルミナ粉末を重量比で60対4
0となるように配合して無機成分とし、有機バインダと
してポリビニルブチラール、可塑剤としてシブチルフタ
レート(DBP)、溶剤としてトルエンとエタノールの
混合液(60対40比)を無機成分100部、ポリビニ
ルブチラール5部、ジブチルフタレート(DBP)10
部、トルエンとエタノール30部の割合で混合し、湿式
微粉砕を行ってスラリーとした後、真空脱気処理により
スラリーから気泡を除去し、粘度調整を行った。スラリ
ーをドクターブレードを用いてポリエステル支持体上に
塗布し、炉を通して乾燥し、0.5ミリの厚さのグリー
ンシートを作製した。グリーンシートを支持体より取り
外すと共に、パンチングにより開口してスルーホールを
形成し、例えばパラジウムと銀の比が15:85である
導体ペーストをスルーホール内に充填し、乾燥した後、
400℃/hの速度で昇温して900℃で1時間保持し
た後、室温にて取り出した。得られた基板を真空蒸着機
に設置し、所定の真空度に排気した後、パーマロイを
0.1μmの厚さで蒸着し、レジスト塗布、露光、現
像、エッチング、レジスト剥離を経て、幅が10μmの
パーマロイがストライプを折り返したような形状の感磁
パターンを得た。素子寸法(例えば2×2mm)にダイ
シングした後、裏面電極にワイヤを取り付けた。
Next, a specific example of the present invention will be described.
Borosilicate glass powder and alumina powder in a weight ratio of 60: 4
100 parts by weight of polyvinyl butyral as an organic binder, cibutyl phthalate (DBP) as a plasticizer, and a mixed solution of toluene and ethanol (60:40 ratio) as a solvent, 100 parts of an inorganic component, polyvinyl butyral 5 parts, dibutyl phthalate (DBP) 10
Parts, toluene and ethanol at a ratio of 30 parts, were wet-pulverized to form a slurry, and bubbles were removed from the slurry by vacuum deaeration treatment to adjust the viscosity. The slurry was coated on a polyester support using a doctor blade and dried through an oven to prepare a green sheet having a thickness of 0.5 mm. While removing the green sheet from the support, the through hole is formed by punching to form a through hole. For example, a conductor paste having a ratio of palladium to silver of 15:85 is filled in the through hole and dried,
The temperature was raised at a rate of 400 ° C./h, the temperature was kept at 900 ° C. for 1 hour, and then the sheet was taken out at room temperature. The obtained substrate was placed in a vacuum vapor deposition machine, evacuated to a predetermined degree of vacuum, and then permalloy was vapor-deposited to a thickness of 0.1 μm. After resist coating, exposure, development, etching, and resist stripping, the width was 10 μm. To obtain a magnetic sensitive pattern having a shape in which stripes were folded back. After dicing to the element size (for example, 2 × 2 mm), a wire was attached to the back surface electrode.

【0014】尚、得られた基板の反りは50μm以下で
あった。また、今回得られた素子寸法は従来例では得ら
れていない。今回は端子を4個としたが、独立した感磁
部の数を増加し、端子数も5個以上に増加させることも
できる。
The warp of the obtained substrate was 50 μm or less. Further, the element size obtained this time has not been obtained in the conventional example. Although the number of terminals is four this time, the number of independent magnetic sensitive parts can be increased and the number of terminals can be increased to five or more.

【0015】以上のように構成された磁気抵抗効果素子
について、従来例の磁気抵抗効果素子と抵抗値の比較を
行った。抵抗値は5−6間(図2参照)を測定した。こ
の結果を(表1)に示す。
The resistance value of the magnetoresistive effect element having the above-described structure was compared with that of the conventional magnetoresistive effect element. The resistance value was measured between 5 and 6 (see FIG. 2). The results are shown in (Table 1).

【0016】(表1)より明らかなように、本発明の磁
気抵抗効果素子は従来例の磁気抵抗効果素子より、抵抗
値のばらつきが小さいことがわかる。
As is clear from Table 1, the magnetoresistive effect element of the present invention has a smaller variation in resistance value than the conventional magnetoresistive effect element.

【0017】以上のように本実施例によれば、特性の向
上と素子寸法の縮小化と端子数の増加を実現することが
できる。
As described above, according to this embodiment, it is possible to improve the characteristics, reduce the element size, and increase the number of terminals.

【0018】[0018]

【表1】 [Table 1]

【0019】[0019]

【発明の効果】以上のように本発明によれば、1000
℃以下で焼成可能なセラミックもしくはガラス、あるい
はガラスとセラミック組成物からなる絶縁層と、この絶
縁層に形成された導体メタライズ層とからなる基板を得
ることによって、絶縁層表面の平滑性と反りの低減によ
る形状ばらつきが無い微細な(数+μm以下)薄膜パタ
ーンからなる感磁部を有することとなり、特性が向上
し、電極用導体形成方法が容易かつ高精度になることに
より素子寸法の縮小化、端子数の増加を図ることができ
る。
As described above, according to the present invention, 1000
By obtaining a substrate composed of a ceramic or glass that can be fired at ℃ or below, or an insulating layer composed of glass and a ceramic composition, and a conductor metallized layer formed on the insulating layer, smoothness and warpage of the surface of the insulating layer can be obtained. Since it has a magnetic sensitive part consisting of a fine (several + μm or less) thin film pattern with no shape variation due to reduction, the characteristics are improved, and the element size is reduced by making the electrode conductor forming method easy and highly accurate, The number of terminals can be increased.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例による磁気抵抗効果素子の断
面図
FIG. 1 is a sectional view of a magnetoresistive effect element according to an embodiment of the present invention.

【図2】同磁気抵抗効果素子の上面図FIG. 2 is a top view of the magnetoresistive effect element.

【図3】本発明の他の実施例による磁気抵抗効果素子の
断面図
FIG. 3 is a sectional view of a magnetoresistive effect element according to another embodiment of the present invention.

【図4】本発明の他の実施例による磁気抵抗効果素子の
断面図
FIG. 4 is a sectional view of a magnetoresistive effect element according to another embodiment of the present invention.

【図5】従来の磁気抵抗効果素子の断面図FIG. 5 is a sectional view of a conventional magnetoresistive effect element.

【図6】従来の磁気抵抗効果素子の上面図FIG. 6 is a top view of a conventional magnetoresistive effect element.

【符号の説明】[Explanation of symbols]

1 絶縁層 2 強磁性体薄膜 3 導体メタライズ層 1 Insulating layer 2 Ferromagnetic thin film 3 Conductor metallized layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】セラミックまたはガラスもしくはガラスと
セラミックの組成物からなる絶縁層と、この絶縁層の内
部に表裏面間を結ぶように埋め込まれた導体メタライズ
層と、この導体メタライズ層の表面に露出した部分と接
続されかつ絶縁層上に形成された所定の形状の強磁性体
薄膜からなる感磁部とで構成した磁気抵抗効果素子。
1. An insulating layer made of ceramic or glass or a composition of glass and ceramic, a conductor metallization layer embedded inside the insulating layer so as to connect front and back surfaces, and exposed on the surface of the conductor metallization layer. A magnetoresistive effect element composed of a magnetic sensitive portion formed of a ferromagnetic thin film having a predetermined shape, which is connected to the above portion and is formed on an insulating layer.
【請求項2】800〜1000℃で焼成可能なセラミッ
クもしくはガラス、あるいはガラスとセラミックの原料
粉とバインダと可塑剤からなる生シートを作製し、前記
生シートにスルーホールを開口し、前記スルーホールに
導電ペーストを充填した後、高温で焼成する工程と、得
られた基板の片面上に強磁性体の薄膜を形成し、所定形
状の感磁部を基板表面の導体と接触させて形成する工程
と、前記基板の裏面の導体から端子を取り出す工程とを
有することを特徴とする磁気抵抗効果素子の製造方法。
2. A raw sheet made of ceramic or glass that can be fired at 800 to 1000 ° C., or raw material powder of glass and ceramics, a binder and a plasticizer is prepared, and a through hole is opened in the raw sheet to form the through hole. After the conductive paste is filled in, a step of baking at a high temperature and a step of forming a thin film of a ferromagnetic material on one surface of the obtained substrate and forming a magnetically sensitive portion of a predetermined shape in contact with a conductor on the surface of the substrate And a step of taking out a terminal from the conductor on the back surface of the substrate, the method for manufacturing a magnetoresistive element.
JP4198157A 1992-07-24 1992-07-24 Magnetoresistive element and method of manufacturing the same Expired - Fee Related JP2822793B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4198157A JP2822793B2 (en) 1992-07-24 1992-07-24 Magnetoresistive element and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4198157A JP2822793B2 (en) 1992-07-24 1992-07-24 Magnetoresistive element and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH0644536A true JPH0644536A (en) 1994-02-18
JP2822793B2 JP2822793B2 (en) 1998-11-11

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP4198157A Expired - Fee Related JP2822793B2 (en) 1992-07-24 1992-07-24 Magnetoresistive element and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP2822793B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223920A (en) * 1975-08-18 1977-02-23 Matsushita Electric Ind Co Ltd Manufacturing a magnetic flux response type multi-element magnetic hea d

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223920A (en) * 1975-08-18 1977-02-23 Matsushita Electric Ind Co Ltd Manufacturing a magnetic flux response type multi-element magnetic hea d

Also Published As

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JP2822793B2 (en) 1998-11-11

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