JPH06280035A - Chemical plating device - Google Patents

Chemical plating device

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Publication number
JPH06280035A
JPH06280035A JP9198393A JP9198393A JPH06280035A JP H06280035 A JPH06280035 A JP H06280035A JP 9198393 A JP9198393 A JP 9198393A JP 9198393 A JP9198393 A JP 9198393A JP H06280035 A JPH06280035 A JP H06280035A
Authority
JP
Japan
Prior art keywords
vibrating
vibration
plating
chemical plating
baffle plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9198393A
Other languages
Japanese (ja)
Other versions
JP3244334B2 (en
Inventor
Tatsuaki Omasa
龍晋 大政
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Techno KK
Original Assignee
Nihon Techno KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Techno KK filed Critical Nihon Techno KK
Priority to JP09198393A priority Critical patent/JP3244334B2/en
Publication of JPH06280035A publication Critical patent/JPH06280035A/en
Application granted granted Critical
Publication of JP3244334B2 publication Critical patent/JP3244334B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To minimize the deposition of a plating metal on the surface of a plating tank by providing a baffle plate between a body to be plated and a vibrating and agitating means. CONSTITUTION:The vibration generated by a motor 21 is transmitted to a vibrating blade group 24 by a vibrating and agitating means through a vibrpting frame 22 and a vibrating rod 23. A baffle plate 29 is provided between the vibrating and agitating means and a body to be plated so that the body is not directly vibrated. The baffle plate 29 is formed with a perforated cylinder, etc. Consequently, a metal grain is not deposited on the wall of a chemical plating tank by the impact and vibration of a diaphragm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【技術分野】本発明は、化学めっき装置に関する。TECHNICAL FIELD The present invention relates to a chemical plating apparatus.

【0002】[0002]

【従来技術】従来の一般的な化学めっき方法は次の工程
からなる。脱脂−水洗−デスマット−水洗−水洗−酸浸
漬−水洗−浸漬脱脂−水洗−活性化−水洗−水洗− −水洗−水洗−クロメート処理−水洗−水洗−浸漬−乾
燥 そして、前記化学めっきの工程においては、化学めっき
槽に化学めっき液を建浴した後、液を加温、たとえば9
0〜95℃に加熱し、金属などの被めっき体にめっきを
行うが、このさい、めっき槽の表面にめっきすべき金属
が析出するので、この対策として種々の撹拌手段が採用
されているが、いずれも一長一短であり満足すべき結果
は得られていない。もっとも一般的な撹拌手段は、ポン
プによる循環撹拌であるが、撹拌効率が悪いという問題
があり、エアレーションは有利な撹拌手段ではあるが、
めっき液を酸化させる傾向があるので、とくにめっき液
の温度が高い化学めっき液においては好ましいことでは
ない。また、従来技術においては、めっき液中に析出し
た析出物が核になってめっき槽の内面全体にわたって金
属が析出し、液の消耗や分解が促進される。したがっ
て、この傾向を最少限に抑えるため定期的にめっき槽内
の液を廃棄し、めっき槽内に硝酸を加えて一昼夜程度放
置することにより槽内に析出した金属類を溶解して清浄
化するという作業が必要であり、この作業はニッケルめ
っきの場合は、通常一週間毎に行わなければならない。
2. Description of the Related Art A conventional general chemical plating method comprises the following steps. Degreasing-Washing-Desmut-Water washing-Water washing-Acid dipping-Water washing-Dip Degreasing-Water washing-Activation-Water washing-Water washing- -Washing-Washing-Chromate treatment-Washing-Water washing-Dip-Dry Then, in the chemical plating step, after bathing the chemical plating solution in the chemical plating bath, the solution is heated, for example, 9
Although the object to be plated such as metal is heated by heating to 0 to 95 ° C., at this time, the metal to be plated is deposited on the surface of the plating tank. Therefore, various stirring means are adopted as a countermeasure against this. However, both have advantages and disadvantages, and satisfactory results have not been obtained. The most common stirring means is circulation stirring by a pump, but there is a problem that the stirring efficiency is poor, and aeration is an advantageous stirring means,
Since it tends to oxidize the plating solution, it is not preferable especially in a chemical plating solution in which the temperature of the plating solution is high. Further, in the prior art, the deposits deposited in the plating solution serve as nuclei to deposit the metal on the entire inner surface of the plating bath, which accelerates the consumption and decomposition of the solution. Therefore, in order to minimize this tendency, the liquid in the plating tank is regularly discarded, nitric acid is added to the plating tank, and the metal that has precipitated in the tank is dissolved and cleaned by leaving it for about one day and night. In the case of nickel plating, this work usually has to be done once a week.

【0003】[0003]

【目的】本発明の目的は、化学めっき槽の表面にめっき
すべき金属が、できるだけ析出しないような新らしい化
学めっき装置を提供する点にある。
[Purpose] An object of the present invention is to provide a new chemical plating apparatus in which the metal to be plated on the surface of the chemical plating tank is not deposited as much as possible.

【0004】[0004]

【構成】本発明は、化学めっき槽内において、被めっき
体と振動撹拌手段との間に邪魔板を設けたことを特徴と
する化学めっき装置に関する。
The present invention relates to a chemical plating apparatus in which a baffle plate is provided between an object to be plated and a vibration stirring means in a chemical plating tank.

【0005】振動撹拌手段は、15〜60Hz、好まし
くは20〜40Hzでの振動を発生させる、振動モータ
による振動を液中の振動板に伝え、液体にこの振動を伝
えることにもとづく本発明者が開発した新しい撹拌手段
であり、その基本的考え方は特開平3−275130号
公報に開示したとおりであり、また、その変形撹拌手段
は特願平4−286544号として平成4年9月14日
に出願している。この振動撹拌は、振動板による振動が
系全体に伝えられると、スクリューによる撹拌に較べて
系全体がすみやかに均一化されることは驚くべきことで
あり、この現象は、液体系のみならず、粉体、粒体系に
おいても同様であり、おが屑中に着色おが屑を加えた実
験でも立証できているところである。なお、振動板の振
幅は2〜30mm、好ましくは10〜15mmである。
The vibrating and stirring means transmits the vibration by the vibrating motor to the vibrating plate in the liquid for generating the vibration at 15 to 60 Hz, preferably 20 to 40 Hz, and the present inventor based on transmitting this vibration to the liquid. This is a newly developed stirring means, the basic idea of which is as disclosed in JP-A-3-275130, and the modified stirring means is Japanese Patent Application No. 4-286544 on September 14, 1992. I am applying. It is surprising that this vibration agitation, when vibration by the vibrating plate is transmitted to the entire system, makes the entire system promptly homogenized as compared with stirring by a screw, and this phenomenon is not limited to liquid systems. The same is true for powders and granules, and it is being verified in an experiment in which colored sawdust was added to sawdust. The vibration plate has an amplitude of 2 to 30 mm, preferably 10 to 15 mm.

【0006】振動板の振動のさせ方は、前記公報や明細
書記載のように振動板を均一に振動させてもよいが、振
動板の1箇所または2箇所を振動軸に連結して振動させ
ることもできる。この場合、液槽が四角形のときは振動
板の一辺の両端部に振動軸を一本づつ二本設けてもよい
が、辺の中央に一本設けることもできる。また振動板の
一つの角部に一本の振動軸を設けてもよい。振動軸をと
りつけた辺の対角辺あるいは振動軸をとりつけた角部以
外の角部は固定軸により支持する。固定軸には弾性体、
たとえば、ゴム、スプリング、空気バネ等を介して振動
板を固定することが好ましいが、振動板自体の弾力にた
よることも可能である。図4にその一具体例を示す。振
動モーターに任意の手段で連結した振動伝達棒5を介し
て振動棒1,2を設け、この振動棒1,2にはゴム片
8,9を用いて振動板6を固定する一方、固定棒3,4
には、振動板6の振動を支持する支持用ゴム片10,1
1を固定し、これに振動板6を連結する。振動板6は、
支持用ゴム片10,11を支点として振動伝達棒1,2
の上下軸にあわせて扇をあおぐように振動するのでこれ
を槽中におさえることにより、液体、粉体、粒体等の混
合撹拌を行うことができる。
The vibrating plate may be vibrated uniformly as described in the above-mentioned publications and specifications, but one or two parts of the vibrating plate are connected to the vibrating shaft to vibrate. You can also In this case, when the liquid tank has a quadrangular shape, two vibration shafts may be provided at both ends of one side of the diaphragm, but one vibration axis may be provided at the center of the side. Further, one vibration shaft may be provided at one corner of the diaphragm. The diagonal side of the side to which the vibration axis is attached or the corners other than the corner to which the vibration axis is attached are supported by the fixed shaft. An elastic body on the fixed shaft,
For example, it is preferable to fix the diaphragm via rubber, spring, air spring or the like, but it is also possible to rely on the elasticity of the diaphragm itself. FIG. 4 shows a specific example thereof. The vibrating rods 1 and 2 are provided via a vibration transmitting rod 5 connected to a vibrating motor by any means, and the vibrating plate 6 is fixed to the vibrating rods 1 and 9 by using rubber pieces 8 and 9, while the fixed rod is fixed. 3,4
The supporting rubber pieces 10, 1 for supporting the vibration of the diaphragm 6.
1 is fixed, and the diaphragm 6 is connected thereto. The diaphragm 6 is
Vibration transmission rods 1, 2 with the supporting rubber pieces 10, 11 as fulcrums
Since the fan vibrates like a vertical axis in line with the vertical axis, it is possible to mix and stir liquids, powders, granules, etc. by holding this in a tank.

【0007】振動撹拌手段における振動板の設け方は、
大別すると3つのタイプに分けることができる。 (1)化学めっき槽の周辺部に周辺に沿って幅2〜10
cm程度の振動板を上下に多数枚を設けるタイプ、(図
1〜3参照) (2)化学めっき槽の底部に槽のほぼ全面に1枚ないし
2枚の振動板を設けるタイプ、(図4参照) (3)化学めっき槽の中央部に、プロペラ撹拌翼のかわ
りに、プロペラの長さと同程度またはそれ以下の大きさ
の任意形状の振動板を上下に多数枚設けるタイプ、(特
願平4−286544号参照) があるが、とくに(1)のタイプのものが好ましい。
The vibrating plate in the vibrating stirring means is
It can be roughly divided into three types. (1) Width 2 to 10 along the periphery of the chemical plating tank
A type in which a large number of diaphragms of about cm are provided on the upper and lower sides (see FIGS. 1 to 3) (2) A type in which one or two diaphragms are provided on the bottom of the chemical plating bath almost all over the bath (see FIG. 4) (3) In the center of the chemical plating tank, instead of the propeller agitating blades, a large number of diaphragms of arbitrary shape having a size equal to or smaller than the length of the propeller are provided above and below (Patent application No. 4-286544), but the type (1) is particularly preferable.

【0008】本発明で使用する振動撹拌手段を設けため
っき装置を図1〜3に示す。振動撹拌手段は、振動モー
ター21で発生した振動を振動枠22、振動棒23を介
して振動羽根群24、24……に伝える。振動羽根群は
図2、3に明示されているように化学めっき槽25の両
側に設置する。振動モーター21よりの振動が槽25本
体に影響しないようにするため、振動枠22はスプリン
グ26と台座27を介して架台28に取付けられてい
る。振動羽根は、水平であってもよいがやや傾斜をつけ
て取付けることが好ましい。傾斜の程度は水平方向を基
準にして0〜45°、好ましくは10〜20°の角度で
取付けることが好ましい。本実施例では15°でセット
した。振動羽根の幅は特に制限はないが30mm以上程
度あれば充分その効力を発揮する。通常30〜100m
m、好ましくは50〜80mm程度である。撹拌羽根同
士の間隔はとくに制限はないが通常10〜80mm、好
ましくは30〜40mmであり、本実施例では35mm
間隔とした。また、左右の振動羽根24の位置は、同一
の高さでもよいが、ややずらせた位置に設けることもで
きる。最上位の振動羽根は液面から約100mm下の位
置にすることが好ましい。これより上に設けるとその振
幅により多少異なるが、液が飛び散るので好ましくな
い。最下位の振動羽根は底から約50mm上の位置とす
ることが好ましい。本発明の振動羽根は幅80mm、長
さ400mm、間隔35mmとした。
1 to 3 show a plating apparatus provided with a vibration stirring means used in the present invention. The vibration stirring means transmits the vibration generated by the vibration motor 21 to the vibrating blade groups 24, 24, ... Through the vibrating frame 22 and the vibrating rod 23. The vibrating blade groups are installed on both sides of the chemical plating bath 25 as clearly shown in FIGS. The vibration frame 22 is attached to a pedestal 28 via a spring 26 and a pedestal 27 so that the vibration from the vibration motor 21 does not affect the tank 25 main body. The vibrating blade may be horizontal, but is preferably attached with a slight inclination. The degree of inclination is preferably 0 to 45 ° with respect to the horizontal direction, preferably 10 to 20 °. In this example, the setting was made at 15 °. The width of the vibrating blade is not particularly limited, but if it is about 30 mm or more, its effect is sufficiently exhibited. Usually 30-100m
m, preferably about 50 to 80 mm. The interval between the stirring blades is not particularly limited, but is usually 10 to 80 mm, preferably 30 to 40 mm, and 35 mm in this embodiment.
The interval. The positions of the left and right vibrating blades 24 may be at the same height, but they may be provided at slightly displaced positions. The uppermost vibrating blade is preferably located about 100 mm below the liquid surface. If it is provided above this, the liquid will be scattered, although it is somewhat different depending on the amplitude, which is not preferable. The lowest vibrating blade is preferably located about 50 mm above the bottom. The vibrating blade of the present invention has a width of 80 mm, a length of 400 mm, and an interval of 35 mm.

【0009】本発明においては、振動板による振動が直
接被めっき体に影響することがないよう振動板が存在す
る面には邪魔板を設けることが必要であり、それ以外の
個所は必ずしも邪魔板を設ける必要はない。邪魔板は、
多数の孔を設けた板すなわち多孔板とすることもでき
る。しかしながら、本発明の邪魔板は、4枚の邪魔板が
連結した形の筒体であってもよい。図5は、化学めっき
槽の左右両端に図1〜3にみられるような振動手段を設
けた場合における振動手段と邪魔板(とくに多孔化した
邪魔板とそうでない邪魔板との組合せを含む)との組合
せ例を示す上面図である。図5の(a)は、対向する振
動板31、31の間に四枚の多孔板32、32、32、
32よりなる邪魔板を囲って作った四角状の筒体を設け
たケースであり、本発明の最も代表的なケースである。
図5の(b)は、対向する振動板31、31の間に二枚
の多孔性板32、32と二枚の非多孔板33、33より
なる四枚の邪魔板を囲って作った筒体を設けたケースで
あり、図5の(c)は、対向する振動板31、31の間
に二枚の多孔性板32、32を設けたケースである。図
5の(d)は、図5の(a)のケースの変形例で円形の
筒体としたものであり、図5の(e)は、図5の(d)
のケースにおいて、振動板のない面を非多孔性としたケ
ースである。また、これらの図5における筒体の上下は
開放されていても閉止されていても、いずれであっても
差し支えない。
In the present invention, it is necessary to provide a baffle plate on the surface where the vibrating plate is present so that the vibration of the vibrating plate does not directly affect the object to be plated. Need not be provided. The baffle is
It can also be a plate provided with a large number of holes, that is, a perforated plate. However, the baffle plate of the present invention may be a cylindrical body in which four baffle plates are connected. FIG. 5 shows a vibrating means and a baffle plate when the vibrating means as shown in FIGS. 1 to 3 are provided on the left and right ends of the chemical plating tank (including a combination of a baffle plate made porous and a baffle plate not so). It is a top view which shows the example of a combination with. FIG. 5A shows four perforated plates 32, 32, 32 between the vibrating plates 31, 31 facing each other.
This is a case provided with a rectangular tubular body formed by surrounding a baffle plate made of 32, which is the most typical case of the present invention.
FIG. 5B is a cylinder formed by surrounding four baffle plates consisting of two porous plates 32 and 32 and two non-perforated plates 33 and 33 between opposed diaphragms 31 and 31. FIG. 5C shows a case where a body is provided, and two porous plates 32 and 32 are provided between the diaphragms 31 facing each other. 5D shows a modified example of the case of FIG. 5A, which is a circular cylinder, and FIG. 5E shows FIG. 5D.
In this case, the surface without the diaphragm is made non-porous. Further, the upper and lower sides of the cylindrical body in FIG. 5 may be open or closed, whichever is acceptable.

【0010】本発明の目的は、振動板による衝撃や振動
により、化学めっき槽の壁に金属粒子が析出するのを防
止するものであるが、反面、被めっき体に化学めっきす
るためには、金属粒子が被めっき体の表面に析出しなけ
ればならい。本発明においては、この矛盾を解決する手
段として邪魔板を使用するものであるが、化学めっき浴
の均一化のためには容器内の化学めっき浴が金属粒子の
ある程度の析出を許す程度で流動していることが好まし
い。そのため、邪魔板の少なくとも一部を多孔壁とする
ことが好ましい。通常有効開口面積は20〜60%であ
る。
The object of the present invention is to prevent metal particles from precipitating on the wall of the chemical plating tank due to impact or vibration by the vibrating plate. On the other hand, in order to chemically plate the object to be plated, Metal particles must be deposited on the surface of the object to be plated. In the present invention, a baffle plate is used as a means for resolving this contradiction. However, in order to make the chemical plating bath uniform, the chemical plating bath in the container flows to such an extent that it allows some precipitation of metal particles. It is preferable that Therefore, it is preferable that at least a part of the baffle plate is a porous wall. Usually, the effective opening area is 20 to 60%.

【0011】本発明の装置は、亜鉛、銅、ニッケル、コ
バルト、金あるいは銀等の金属めっきは勿論、固体微粒
子を多量にめっき液に添加し、これをめっき中に共析さ
せるいわゆる複合めっきにおいても、有利に使用するこ
とができる。複合めっきの場合、複合分散粒子がめっき
中に均一に分散された状態で共析させるためには、まず
めっき液中に粒子が均一に懸濁していることが必要であ
る。一般の固体粒子は、その比重がめっき液よりも大で
あり、めっき液に添加した場合、これらの多くは沈降す
る。それ故、これら分散粒子を液中に均一に、しかも長
時間にわたって懸濁に保つためには撹拌が必要であるか
らである。
The apparatus of the present invention can be used not only for metal plating of zinc, copper, nickel, cobalt, gold, silver or the like, but also for so-called composite plating in which a large amount of solid fine particles are added to a plating solution and co-deposited during plating. Can also be used to advantage. In the case of composite plating, it is necessary that the particles are first uniformly suspended in the plating solution in order to co-deposit the composite dispersed particles in the state of being uniformly dispersed during plating. The general solid particles have a specific gravity larger than that of the plating solution, and when added to the plating solution, most of them settle. Therefore, stirring is necessary to keep these dispersed particles in the liquid uniformly and in suspension for a long time.

【0012】[0012]

【実施例】【Example】

実施例1 図2および3に示す構造の振動撹拌手段をもつ化学めっ
き槽内に、図5(a)で示されている位置で、振動撹拌
手段31、31、邪魔板32、32、32、32、被め
っき体30を配置する。振動モーター21は、0.4K
Wのものであり、振動羽根24は、幅80mm、長さ4
00mm、厚さ1.5mmのものを35mm間隔にとり
つけてある。邪魔板はプラスチック板4枚が連結した四
角筒体(底とフタは存在しない)であり、邪魔板は4枚
とも多数の径3mm位の孔を有する板であって、開口面
積率は50%である。めっき浴の温度を上げるために
は、電熱ヒーター、ジャケットなど通常の加熱手段を用
いる。前記付帯設備を有するSUS−316製化学めっ
き槽に下記のI液よりなるめっき浴を建浴し、液を90
〜95℃に加熱し、鉄、銅、銅合金あるいはアルミニウ
ム等よりなる金属の被めっき体にNi−Pめっきを行っ
た。被めっき体の浸漬時間はそれぞれ2分間であった。
1つのめっき浴で、4000時間以上、めっきをつづけ
ることができた。 I液 II液 硫酸ニッケル 24g/l 25g/l 次亜リン酸ナトリウム 20g/l 乳酸 27g/l 10g/l プロピオン酸 2g/l − pH 4.5 5.0
Example 1 At a position shown in FIG. 5A, in a chemical plating tank having a vibration stirring means having the structure shown in FIGS. 2 and 3, the vibration stirring means 31, 31, baffles 32, 32, 32, 32 and the plated object 30 are arranged. Vibration motor 21 is 0.4K
The vibrating blade 24 has a width of 80 mm and a length of 4
Those having a thickness of 00 mm and a thickness of 1.5 mm are attached at intervals of 35 mm. The baffle plate is a square cylinder (no bottom and lid) in which four plastic plates are connected, and the baffle plates are plates having a large number of holes with a diameter of about 3 mm, and the opening area ratio is 50%. Is. To raise the temperature of the plating bath, an ordinary heating means such as an electric heater or a jacket is used. A chemical plating bath made of SUS-316 having the above-mentioned auxiliary equipment is provided with a plating bath consisting of the following solution I, and the solution is adjusted to 90
It was heated to ˜95 ° C., and Ni—P plating was performed on the object to be plated of metal such as iron, copper, copper alloy or aluminum. The immersion time of the object to be plated was 2 minutes each.
Plating could be continued for more than 4000 hours with one plating bath. Liquid I Liquid II Nickel sulfate 24 g / l 25 g / l Sodium hypophosphite 20 g / l Lactic acid 27 g / l 10 g / l Propionic acid 2 g / l-pH 4.5 5.0

【0013】実施例2 めっき浴として前記II液を用いて実施例1と同様のテス
トを行った。やはり、1つのめっき浴で4000時間以
上のめっきが可能であった。
Example 2 The same test as in Example 1 was conducted using the above-mentioned solution II as a plating bath. After all, it was possible to perform plating for 4000 hours or more with one plating bath.

【0014】[0014]

【効果】【effect】

(1)従来法では1週間に1回程度の割合でめっき液を
取り替える必要があったが、本発明によれば、その取り
替え回数は大幅に減少し、通常のニッケルめっきの場合
で、ほゞ2倍の期間使用できる。 (2)めっき液を取り替えた後、化学めっき槽を硝酸つ
いで水で、それぞれ洗浄しなければならないので、めっ
き液の取り替え回数が減るということは、これらの作業
回数および、硝酸や水の使用量の減少につながり、廃硝
酸の発生量も併せて減少する。 (3)複合めっきの場合、通常の液の使用期間の延長の
みでなく、液の沈殿発生に伴う不均一が防止できること
に伴い、製品の品質が大きく向上した。 (4)本発明により、従来技術の項に記載した化学めっ
き方法の工程からパシベーション(硝酸)の工程が不要
となり、下記の工程での化学めっきが可能となった。 脱脂−水洗−デスマット−水洗−水洗−酸浸漬−水洗−
浸漬脱脂−水洗−活性化−水洗−水洗−無電解メッキ−
無電解メッキ−水洗−水洗−クロメート処理−水洗−水
洗−浸漬−乾燥 めっき作業の中断をする必要がなくなる。約4000時
間以上化学めっきを行っても何らめっき槽内面に金属の
析出物がなく、液寿命が大巾に延長された。 (5)振動撹拌のみで邪魔板を設けないときのめっき不
良率に対し、邪魔板を設けた場合の不良率はほゞ1/3
に低減した。
(1) In the conventional method, it was necessary to replace the plating solution at a rate of about once a week, but according to the present invention, the number of times of replacement is significantly reduced, and in the case of normal nickel plating, it is almost the same. Can be used for twice as long. (2) After replacing the plating solution, the chemical plating bath must be washed with nitric acid and then with water, so the number of replacements of the plating solution is reduced, which means the number of operations and the amount of nitric acid and water used. The amount of waste nitric acid is also reduced. (3) In the case of composite plating, not only the extension of the normal use period of the solution but also the prevention of non-uniformity due to the occurrence of precipitation of the solution significantly improves the product quality. (4) According to the present invention, the step of passivation (nitric acid) is unnecessary from the steps of the chemical plating method described in the section of the prior art, and the chemical plating in the following steps is possible. Degreasing-Washing-Desmut-Washing-Washing-Acid immersion-Washing-
Immersion degreasing-water washing-activation-water washing-water washing-electroless plating-
Electroless plating-Washing-Washing-Chromate treatment-Washing-Washing-Dip-Dry It is not necessary to interrupt the plating operation. Even if chemical plating was performed for about 4000 hours or more, there was no metal deposit on the inner surface of the plating tank, and the liquid life was greatly extended. (5) The defective rate when the baffle plate is installed is about 1/3 of the plating defect rate when only the vibration stirring is used and the baffle plate is not installed.
Reduced to.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例に用いた化学めっき装置の上面
図である。
FIG. 1 is a top view of a chemical plating apparatus used in an example of the present invention.

【図2】本発明の実施例に用いた化学めっき装置の側面
図である。
FIG. 2 is a side view of the chemical plating apparatus used in the example of the present invention.

【図3】本発明の実施例に用いた化学めっき装置のもう
一方の側からみた側面図である。
FIG. 3 is a side view of the chemical plating apparatus used in the embodiment of the present invention as seen from the other side.

【図4】本発明のめっき方法に用いる新規な振動撹拌装
置の概略を示す斜視図である。
FIG. 4 is a perspective view showing an outline of a novel vibration stirrer used in the plating method of the present invention.

【図5】図5は、化学めっき槽の左右両端に図1〜3に
みられるような振動手段を設けた場合における振動手段
と邪魔板(とくに多孔化した邪魔板とそうでない邪魔板
との組合せを含む)との組合せ例を示す上面図であっ
て、(a)は、対向する振動板の間に四枚の多孔板より
なる邪魔板を囲って作った四角状の筒体を設けたケース
であり、(b)は、対向する振動板の間に二枚の多孔性
板と二枚の非多孔板よりなる四枚の邪魔板を囲って作っ
た筒体を設けたケースであり、(c)は、対向する振動
板の間に二枚の多孔性板を設けたケースであり、(d)
は、(a)のケースの変形例で円形の筒体としたもので
あり、(e)は、(d)のケースにおいて、振動板のな
い面を非多孔性としたケースである。
FIG. 5 shows a vibrating means and a baffle plate (particularly a baffle plate that is made porous and a baffle plate that is not so) when the vibrating means as shown in FIGS. FIG. 4A is a top view showing an example of a combination with a combination of FIG. 4A and FIG. 4A, and FIG. 4A is a case in which a square tubular body formed by surrounding a baffle plate made of four perforated plates between opposing diaphragms Yes, (b) is a case in which a cylindrical body made by surrounding four baffle plates consisting of two porous plates and two non-perforated plates between opposing diaphragms is provided, and (c) is a case , A case in which two porous plates are provided between opposed diaphragms, (d)
In the modified example of the case of (a), a circular cylindrical body is used. In the case of (d), the surface without the diaphragm is made non-porous.

【符号の説明】[Explanation of symbols]

1 振動棒 2 振動棒 3 固定棒 4 固定棒 5 振動伝達棒 6 振動板 7 槽底部 8 支持用ゴム片 9 支持用ゴム片 10 支持用ゴム片 11 支持用ゴム片 21 振動モーター 22 振動枠 23 振動棒 24 振動羽根(振動板) 25 化学めっき槽 26 スプリング 27 台座 28 架台 29 邪魔板 30 被めっき体 31 振動板 32 多孔板(邪魔板) 33 非多孔板(邪魔板) 1 Vibration Rod 2 Vibration Rod 3 Fixed Rod 4 Fixed Rod 5 Vibration Transmission Rod 6 Vibration Plate 7 Tank Bottom 8 Supporting Rubber Piece 9 Supporting Rubber Piece 10 Supporting Rubber Piece 11 Supporting Rubber Piece 21 Vibration Motor 22 Vibration Frame 23 Vibration Rod 24 Vibration blade (vibration plate) 25 Chemical plating tank 26 Spring 27 Pedestal 28 Stand 29 Baffle plate 30 Plated object 31 Vibration plate 32 Perforated plate (baffle plate) 33 Non-perforated plate (baffle plate)

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 化学めっき槽内において、被めっき体と
振動撹拌手段との間に邪魔板を設けたことを特徴とする
化学めっき装置。
1. A chemical plating apparatus, characterized in that a baffle plate is provided between an object to be plated and a vibration stirring means in a chemical plating tank.
【請求項2】 前記邪魔板が多孔筒状体である請求項1
記載の化学めっき装置。
2. The baffle plate is a perforated cylindrical body.
The described chemical plating apparatus.
【請求項3】 前記多孔筒状体の孔部分が占める開孔面
積が20〜60%である請求項2記載の化学めっき装
置。
3. The chemical plating apparatus according to claim 2, wherein the open area occupied by the holes of the porous tubular body is 20 to 60%.
JP09198393A 1993-03-26 1993-03-26 Chemical plating equipment Expired - Fee Related JP3244334B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09198393A JP3244334B2 (en) 1993-03-26 1993-03-26 Chemical plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09198393A JP3244334B2 (en) 1993-03-26 1993-03-26 Chemical plating equipment

Publications (2)

Publication Number Publication Date
JPH06280035A true JPH06280035A (en) 1994-10-04
JP3244334B2 JP3244334B2 (en) 2002-01-07

Family

ID=14041723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09198393A Expired - Fee Related JP3244334B2 (en) 1993-03-26 1993-03-26 Chemical plating equipment

Country Status (1)

Country Link
JP (1) JP3244334B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100296372B1 (en) * 1995-12-12 2001-09-13 후지이 히로시 Pretreatment method for coating on metal molded article
US7338586B2 (en) 2001-06-25 2008-03-04 Japan Techno Co., Ltd. Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus
US7459071B2 (en) 2001-05-02 2008-12-02 Japan Techno Co., Ltd. Hydrogen-oxygen gas generator and method of generating hydrogen-oxygen gas using the generator
CN101922002A (en) * 2010-04-12 2010-12-22 南京航空航天大学 Chemical composite plating bath
US7964104B2 (en) 2003-05-02 2011-06-21 Japan Techno Co., Ltd. Active antiseptic water or active water-based fluid, and production method and apparatus for the same
CN112725772A (en) * 2020-12-24 2021-04-30 北京青云航空仪表有限公司 Hanging tool and hanging method for chemical nickel plating of QFN independent chip

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100296372B1 (en) * 1995-12-12 2001-09-13 후지이 히로시 Pretreatment method for coating on metal molded article
US7459071B2 (en) 2001-05-02 2008-12-02 Japan Techno Co., Ltd. Hydrogen-oxygen gas generator and method of generating hydrogen-oxygen gas using the generator
US7338586B2 (en) 2001-06-25 2008-03-04 Japan Techno Co., Ltd. Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus
US7678246B2 (en) 2001-06-25 2010-03-16 Japan Techno Co., Ltd. Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus
US7964104B2 (en) 2003-05-02 2011-06-21 Japan Techno Co., Ltd. Active antiseptic water or active water-based fluid, and production method and apparatus for the same
CN101922002A (en) * 2010-04-12 2010-12-22 南京航空航天大学 Chemical composite plating bath
CN112725772A (en) * 2020-12-24 2021-04-30 北京青云航空仪表有限公司 Hanging tool and hanging method for chemical nickel plating of QFN independent chip

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