JP3244334B2 - Chemical plating equipment - Google Patents

Chemical plating equipment

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Publication number
JP3244334B2
JP3244334B2 JP09198393A JP9198393A JP3244334B2 JP 3244334 B2 JP3244334 B2 JP 3244334B2 JP 09198393 A JP09198393 A JP 09198393A JP 9198393 A JP9198393 A JP 9198393A JP 3244334 B2 JP3244334 B2 JP 3244334B2
Authority
JP
Japan
Prior art keywords
vibration
plating
chemical plating
baffle plate
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP09198393A
Other languages
Japanese (ja)
Other versions
JPH06280035A (en
Inventor
龍晋 大政
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Techno KK
Original Assignee
Nihon Techno KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Techno KK filed Critical Nihon Techno KK
Priority to JP09198393A priority Critical patent/JP3244334B2/en
Publication of JPH06280035A publication Critical patent/JPH06280035A/en
Application granted granted Critical
Publication of JP3244334B2 publication Critical patent/JP3244334B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【技術分野】本発明は、化学めっき装置に関する。TECHNICAL FIELD The present invention relates to a chemical plating apparatus.

【0002】[0002]

【従来技術】従来の一般的な化学めっき方法は次の工程
からなる。脱脂−水洗−デスマット−水洗−水洗−酸浸
漬−水洗−浸漬脱脂−水洗−活性化−水洗−水洗− −水洗−水洗−クロメート処理−水洗−水洗−浸漬−乾
燥 そして、前記化学めっきの工程においては、化学めっき
槽に化学めっき液を建浴した後、液を加温、たとえば9
0〜95℃に加熱し、金属などの被めっき体にめっきを
行うが、このさい、めっき槽の表面にめっきすべき金属
が析出するので、この対策として種々の撹拌手段が採用
されているが、いずれも一長一短であり満足すべき結果
は得られていない。もっとも一般的な撹拌手段は、ポン
プによる循環撹拌であるが、撹拌効率が悪いという問題
があり、エアレーションは有利な撹拌手段ではあるが、
めっき液を酸化させる傾向があるので、とくにめっき液
の温度が高い化学めっき液においては好ましいことでは
ない。また、従来技術においては、めっき液中に析出し
た析出物が核になってめっき槽の内面全体にわたって金
属が析出し、液の消耗や分解が促進される。したがっ
て、この傾向を最少限に抑えるため定期的にめっき槽内
の液を廃棄し、めっき槽内に硝酸を加えて一昼夜程度放
置することにより槽内に析出した金属類を溶解して清浄
化するという作業が必要であり、この作業はニッケルめ
っきの場合は、通常一週間毎に行わなければならない。
2. Description of the Related Art A conventional general chemical plating method comprises the following steps. Degreasing-Rinse-Desmut-Rinse-Rinse-Acid dipping-Rinse-Dip degreasing-Rinse-Activate-Rinse-Rinse- -Washing-Washing-Chromate treatment-Water washing-Water washing-Immersion-Drying In the chemical plating step, after a chemical plating solution is built in a chemical plating tank, the solution is heated, for example, to 9%.
Heating to 0 to 95 ° C. is performed to perform plating on the object to be plated such as a metal. At this time, a metal to be plated is deposited on the surface of the plating tank. However, none of them has advantages and disadvantages and satisfactory results have not been obtained. The most common stirring means is circulation stirring by a pump, but there is a problem of poor stirring efficiency, and aeration is an advantageous stirring means,
Since the plating solution tends to be oxidized, it is not preferable particularly for a chemical plating solution in which the temperature of the plating solution is high. Further, in the prior art, a precipitate deposited in the plating solution serves as a nucleus to deposit metal over the entire inner surface of the plating tank, thereby promoting consumption and decomposition of the solution. Therefore, in order to minimize this tendency, the solution in the plating tank is periodically discarded, nitric acid is added to the plating tank, and the metal deposited in the tank is dissolved and cleaned by leaving it for about 24 hours. In the case of nickel plating, this operation must usually be performed once a week.

【0003】[0003]

【目的】本発明の目的は、化学めっき槽の表面にめっき
すべき金属が、できるだけ析出しないような新らしい化
学めっき装置を提供する点にある。
An object of the present invention is to provide a new chemical plating apparatus in which metal to be plated on the surface of a chemical plating tank is not deposited as much as possible.

【0004】[0004]

【構成】本発明は、化学めっき槽内において、被めっき
体と振動撹拌手段との間に邪魔板を設けたことを特徴と
する化学めっき装置に関する。
The present invention relates to a chemical plating apparatus characterized in that a baffle plate is provided between an object to be plated and a vibration stirring means in a chemical plating tank.

【0005】振動撹拌手段は、15〜60Hz、好まし
くは20〜40Hzでの振動を発生させる、振動モータ
による振動を液中の振動板に伝え、液体にこの振動を伝
えることにもとづく本発明者が開発した新しい撹拌手段
であり、その基本的考え方は特開平3−275130号
公報に開示したとおりであり、また、その変形撹拌手段
は特願平4−286544号として平成4年9月14日
に出願している。この振動撹拌は、振動板による振動が
系全体に伝えられると、スクリューによる撹拌に較べて
系全体がすみやかに均一化されることは驚くべきことで
あり、この現象は、液体系のみならず、粉体、粒体系に
おいても同様であり、おが屑中に着色おが屑を加えた実
験でも立証できているところである。なお、振動板の振
幅は2〜30mm、好ましくは10〜15mmである。
The vibration stirring means generates vibration at 15 to 60 Hz, preferably 20 to 40 Hz, and transmits vibration from a vibration motor to a vibration plate in a liquid to transmit the vibration to the liquid. This is a newly developed stirring means, the basic concept of which is as disclosed in JP-A-3-275130, and its modified stirring means is disclosed in Japanese Patent Application No. 4-286544 on September 14, 1992. Filed. It is surprising that, when the vibration by the vibration plate is transmitted to the entire system, the vibration of the whole system is promptly homogenized as compared with the stirring by the screw. The same applies to powder and grain systems, and it has been proved by experiments in which colored sawdust is added to sawdust. The amplitude of the diaphragm is 2 to 30 mm, preferably 10 to 15 mm.

【0006】振動板の振動のさせ方は、前記公報や明細
書記載のように振動板を均一に振動させてもよいが、振
動板の1箇所または2箇所を振動軸に連結して振動させ
ることもできる。この場合、液槽が四角形のときは振動
板の一辺の両端部に振動軸を一本づつ二本設けてもよい
が、辺の中央に一本設けることもできる。また振動板の
一つの角部に一本の振動軸を設けてもよい。振動軸をと
りつけた辺の対角辺あるいは振動軸をとりつけた角部以
外の角部は固定軸により支持する。固定軸には弾性体、
たとえば、ゴム、スプリング、空気バネ等を介して振動
板を固定することが好ましいが、振動板自体の弾力にた
よることも可能である。図4にその一具体例を示す。振
動モーターに任意の手段で連結した振動伝達棒5を介し
て振動棒1,2を設け、この振動棒1,2にはゴム片
8,9を用いて振動板6を固定する一方、固定棒3,4
には、振動板6の振動を支持する支持用ゴム片10,1
1を固定し、これに振動板6を連結する。振動板6は、
支持用ゴム片10,11を支点として振動伝達棒1,2
の上下軸にあわせて扇をあおぐように振動するのでこれ
を槽中におさえることにより、液体、粉体、粒体等の混
合撹拌を行うことができる。
The diaphragm may be vibrated uniformly as described in the above-mentioned publication or the specification, but one or two portions of the diaphragm are connected to a vibration axis to vibrate. You can also. In this case, when the liquid tank is rectangular, two vibrating axes may be provided one by one at both ends of one side of the diaphragm, but one vibrating shaft may be provided at the center of the side. Also, one vibration axis may be provided at one corner of the diaphragm. Corners other than the diagonal sides of the side where the vibration axis is attached or corners where the vibration axis is attached are supported by fixed axes. An elastic body on the fixed shaft,
For example, it is preferable to fix the diaphragm via rubber, a spring, an air spring, or the like, but it is also possible to rely on the elasticity of the diaphragm itself. FIG. 4 shows one specific example. Vibration rods 1 and 2 are provided via vibration transmission rods 5 connected to the vibration motor by an arbitrary means. 3,4
The supporting rubber pieces 10, 1 for supporting the vibration of the diaphragm 6
1 is fixed, and the diaphragm 6 is connected thereto. The diaphragm 6
Vibration transmitting rods 1 and 2 with supporting rubber pieces 10 and 11 as fulcrums
The fan is vibrated so as to lift the fan in accordance with the vertical axis. By holding the fan in the tank, it is possible to mix and agitate liquids, powders, granules and the like.

【0007】振動撹拌手段における振動板の設け方は、
大別すると3つのタイプに分けることができる。 (1)化学めっき槽の周辺部に周辺に沿って幅2〜10
cm程度の振動板を上下に多数枚を設けるタイプ、(図
1〜3参照) (2)化学めっき槽の底部に槽のほぼ全面に1枚ないし
2枚の振動板を設けるタイプ、(図4参照) (3)化学めっき槽の中央部に、プロペラ撹拌翼のかわ
りに、プロペラの長さと同程度またはそれ以下の大きさ
の任意形状の振動板を上下に多数枚設けるタイプ、(特
願平4−286544号参照) があるが、とくに(1)のタイプのものが好ましい。
The method of providing the vibration plate in the vibration stirring means is as follows.
It can be roughly divided into three types. (1) A width of 2 to 10 around the periphery of the chemical plating tank
A type in which a large number of diaphragms of about cm are provided vertically (see FIGS. 1 to 3). (2) A type in which one or two diaphragms are provided at almost the entire bottom of a chemical plating tank at the bottom (see FIG. 4). (3) In the center of the chemical plating tank, instead of a propeller agitating blade, a number of upper and lower diaphragms of an arbitrary shape with the same size as or less than the length of the propeller are provided vertically. However, the type (1) is particularly preferable.

【0008】本発明で使用する振動撹拌手段を設けため
っき装置を図1〜3に示す。振動撹拌手段は、振動モー
ター21で発生した振動を振動枠22、振動棒23を介
して振動羽根群24、24……に伝える。振動羽根群は
図2、3に明示されているように化学めっき槽25の両
側に設置する。振動モーター21よりの振動が槽25本
体に影響しないようにするため、振動枠22はスプリン
グ26と台座27を介して架台28に取付けられてい
る。振動羽根は、水平であってもよいがやや傾斜をつけ
て取付けることが好ましい。傾斜の程度は水平方向を基
準にして0〜45°、好ましくは10〜20°の角度で
取付けることが好ましい。本実施例では15°でセット
した。振動羽根の幅は特に制限はないが30mm以上程
度あれば充分その効力を発揮する。通常30〜100m
m、好ましくは50〜80mm程度である。撹拌羽根同
士の間隔はとくに制限はないが通常10〜80mm、好
ましくは30〜40mmであり、本実施例では35mm
間隔とした。また、左右の振動羽根24の位置は、同一
の高さでもよいが、ややずらせた位置に設けることもで
きる。最上位の振動羽根は液面から約100mm下の位
置にすることが好ましい。これより上に設けるとその振
幅により多少異なるが、液が飛び散るので好ましくな
い。最下位の振動羽根は底から約50mm上の位置とす
ることが好ましい。本発明の振動羽根は幅80mm、長
さ400mm、間隔35mmとした。
FIGS. 1 to 3 show a plating apparatus provided with a vibration stirring means used in the present invention. The vibration stirring means transmits the vibration generated by the vibration motor 21 to the vibration blade groups 24, 24... Via the vibration frame 22 and the vibration bar 23. The vibrating blade group is installed on both sides of the chemical plating tank 25 as clearly shown in FIGS. In order to prevent the vibration from the vibration motor 21 from affecting the tank 25 main body, the vibration frame 22 is attached to a gantry 28 via a spring 26 and a pedestal 27. The vibrating blade may be horizontal, but is preferably mounted with a slight inclination. The degree of the inclination is preferably set at an angle of 0 to 45 °, preferably 10 to 20 ° with respect to the horizontal direction. In this embodiment, the angle is set at 15 °. The width of the vibrating blade is not particularly limited, but the effect is sufficiently exhibited if it is at least about 30 mm. Usually 30-100m
m, preferably about 50 to 80 mm. The interval between the stirring blades is not particularly limited, but is usually 10 to 80 mm, preferably 30 to 40 mm, and in this embodiment, 35 mm.
It was an interval. The positions of the left and right vibrating blades 24 may be the same height, but may be provided at slightly shifted positions. The uppermost vibrating blade is preferably located at a position about 100 mm below the liquid level. If it is provided above this, it slightly varies depending on its amplitude, but it is not preferable because the liquid scatters. The lowest vibrating blade is preferably located at a position about 50 mm above the bottom. The vibrating blade of the present invention had a width of 80 mm, a length of 400 mm, and an interval of 35 mm.

【0009】本発明においては、振動板による振動が直
接被めっき体に影響することがないよう振動板が存在す
る面には邪魔板を設けることが必要であり、それ以外の
個所は必ずしも邪魔板を設ける必要はない。邪魔板は、
多数の孔を設けた板すなわち多孔板とすることもでき
る。しかしながら、本発明の邪魔板は、4枚の邪魔板が
連結した形の筒体であってもよい。図5は、化学めっき
槽の左右両端に図1〜3にみられるような振動手段を設
けた場合における振動手段と邪魔板(とくに多孔化した
邪魔板とそうでない邪魔板との組合せを含む)との組合
せ例を示す上面図である。図5の(a)は、対向する振
動板31、31の間に四枚の多孔板32、32、32、
32よりなる邪魔板を囲って作った四角状の筒体を設け
たケースであり、本発明の最も代表的なケースである。
図5の(b)は、対向する振動板31、31の間に二枚
の多孔性板32、32と二枚の非多孔板33、33より
なる四枚の邪魔板を囲って作った筒体を設けたケースで
あり、図5の(c)は、対向する振動板31、31の間
に二枚の多孔性板32、32を設けたケースである。図
5の(d)は、図5の(a)のケースの変形例で円形の
筒体としたものであり、図5の(e)は、図5の(d)
のケースにおいて、振動板のない面を非多孔性としたケ
ースである。また、これらの図5における筒体の上下は
開放されていても閉止されていても、いずれであっても
差し支えない。
In the present invention, it is necessary to provide a baffle plate on the surface on which the diaphragm exists so that the vibration from the diaphragm does not directly affect the plated object. It is not necessary to provide. The baffle is
It may be a plate provided with a number of holes, that is, a perforated plate. However, the baffle plate of the present invention may be a cylindrical body in which four baffle plates are connected. FIG. 5 shows a vibration means and a baffle plate (including a combination of a baffle plate which is porous and a baffle plate which is not so) when vibration means as shown in FIGS. It is a top view which shows the example of a combination with. FIG. 5A shows four perforated plates 32, 32, 32, between opposed diaphragms 31, 31.
This is a case provided with a square tubular body formed by surrounding a baffle plate of 32, and is the most typical case of the present invention.
FIG. 5 (b) shows a tube formed by surrounding four baffle plates consisting of two porous plates 32, 32 and two non-porous plates 33, 33 between opposing diaphragms 31, 31. FIG. 5C shows a case in which two porous plates 32, 32 are provided between opposed diaphragms 31, 31. FIG. FIG. 5D shows a modification of the case shown in FIG. 5A in which a circular cylinder is formed. FIG. 5E shows a case shown in FIG.
In this case, the surface without the diaphragm is made non-porous. In addition, the upper and lower portions of the cylindrical body in FIG. 5 may be open or closed, whichever.

【0010】本発明の目的は、振動板による衝撃や振動
により、化学めっき槽の壁に金属粒子が析出するのを防
止するものであるが、反面、被めっき体に化学めっきす
るためには、金属粒子が被めっき体の表面に析出しなけ
ればならい。本発明においては、この矛盾を解決する手
段として邪魔板を使用するものであるが、化学めっき浴
の均一化のためには容器内の化学めっき浴が金属粒子の
ある程度の析出を許す程度で流動していることが好まし
い。そのため、邪魔板の少なくとも一部を多孔壁とする
ことが好ましい。通常有効開口面積は20〜60%であ
る。
An object of the present invention is to prevent metal particles from depositing on the wall of a chemical plating tank due to shock or vibration caused by a diaphragm. Metal particles must precipitate on the surface of the body to be plated. In the present invention, a baffle plate is used as a means for solving this inconsistency, but in order to make the chemical plating bath uniform, the chemical plating bath in the container is fluidized to such an extent that metal particles can be deposited to some extent. Is preferred. Therefore, it is preferable that at least a part of the baffle plate is a porous wall. Usually, the effective opening area is 20 to 60%.

【0011】本発明の装置は、亜鉛、銅、ニッケル、コ
バルト、金あるいは銀等の金属めっきは勿論、固体微粒
子を多量にめっき液に添加し、これをめっき中に共析さ
せるいわゆる複合めっきにおいても、有利に使用するこ
とができる。複合めっきの場合、複合分散粒子がめっき
中に均一に分散された状態で共析させるためには、まず
めっき液中に粒子が均一に懸濁していることが必要であ
る。一般の固体粒子は、その比重がめっき液よりも大で
あり、めっき液に添加した場合、これらの多くは沈降す
る。それ故、これら分散粒子を液中に均一に、しかも長
時間にわたって懸濁に保つためには撹拌が必要であるか
らである。
The apparatus of the present invention can be used for so-called composite plating in which a large amount of solid fine particles are added to a plating solution and this is co-deposited during plating, as well as metal plating such as zinc, copper, nickel, cobalt, gold or silver. Can also be used advantageously. In the case of composite plating, in order to cause eutectoids in a state where the composite dispersed particles are uniformly dispersed in the plating, it is necessary that the particles are first uniformly suspended in the plating solution. General solid particles have a specific gravity greater than that of the plating solution, and when added to the plating solution, many of them settle. Therefore, in order to keep these dispersed particles in the liquid uniformly and for a long period of time, stirring is necessary.

【0012】[0012]

【実施例】【Example】

実施例1 図2および3に示す構造の振動撹拌手段をもつ化学めっ
き槽内に、図5(a)で示されている位置で、振動撹拌
手段31、31、邪魔板32、32、32、32、被め
っき体30を配置する。振動モーター21は、0.4K
Wのものであり、振動羽根24は、幅80mm、長さ4
00mm、厚さ1.5mmのものを35mm間隔にとり
つけてある。邪魔板はプラスチック板4枚が連結した四
角筒体(底とフタは存在しない)であり、邪魔板は4枚
とも多数の径3mm位の孔を有する板であって、開口面
積率は50%である。めっき浴の温度を上げるために
は、電熱ヒーター、ジャケットなど通常の加熱手段を用
いる。前記付帯設備を有するSUS−316製化学めっ
き槽に下記のI液よりなるめっき浴を建浴し、液を90
〜95℃に加熱し、鉄、銅、銅合金あるいはアルミニウ
ム等よりなる金属の被めっき体にNi−Pめっきを行っ
た。被めっき体の浸漬時間はそれぞれ2分間であった。
1つのめっき浴で、4000時間以上、めっきをつづけ
ることができた。 I液 II液 硫酸ニッケル 24g/l 25g/l 次亜リン酸ナトリウム 20g/l 乳酸 27g/l 10g/l プロピオン酸 2g/l − pH 4.5 5.0
Example 1 In a chemical plating tank having a vibration stirrer having a structure shown in FIGS. 2 and 3, vibration stirrers 31 and 31 and baffles 32, 32 and 32 were placed at positions shown in FIG. 32, the plating object 30 is arranged. The vibration motor 21 is 0.4K
W, and the vibrating blade 24 has a width of 80 mm and a length of 4 mm.
Those having a thickness of 00 mm and a thickness of 1.5 mm are attached at intervals of 35 mm. The baffle plate is a quadrangular cylindrical body (the bottom and the lid do not exist) in which four plastic plates are connected. Each of the four baffle plates has a large number of holes with a diameter of about 3 mm, and the opening area ratio is 50%. It is. In order to raise the temperature of the plating bath, ordinary heating means such as an electric heater or a jacket is used. A plating bath consisting of the following solution I was set up in a chemical plating tank made of SUS-316 having the above-mentioned auxiliary facilities,
The substrate was heated to about 95 ° C., and Ni-P plating was performed on an object to be plated of a metal such as iron, copper, a copper alloy, or aluminum. The immersion time of each of the objects to be plated was 2 minutes.
In one plating bath, plating could be continued for 4000 hours or more. Liquid I Liquid II Nickel sulfate 24 g / l 25 g / l Sodium hypophosphite 20 g / l Lactic acid 27 g / l 10 g / l Propionic acid 2 g / l-pH 4.5 5.0

【0013】実施例2 めっき浴として前記II液を用いて実施例1と同様のテス
トを行った。やはり、1つのめっき浴で4000時間以
上のめっきが可能であった。
Example 2 The same test as in Example 1 was performed using the above-mentioned solution II as a plating bath. Again, plating for 4000 hours or more was possible in one plating bath.

【0014】[0014]

【効果】【effect】

(1)従来法では1週間に1回程度の割合でめっき液を
取り替える必要があったが、本発明によれば、その取り
替え回数は大幅に減少し、通常のニッケルめっきの場合
で、ほゞ2倍の期間使用できる。 (2)めっき液を取り替えた後、化学めっき槽を硝酸つ
いで水で、それぞれ洗浄しなければならないので、めっ
き液の取り替え回数が減るということは、これらの作業
回数および、硝酸や水の使用量の減少につながり、廃硝
酸の発生量も併せて減少する。 (3)複合めっきの場合、通常の液の使用期間の延長の
みでなく、液の沈殿発生に伴う不均一が防止できること
に伴い、製品の品質が大きく向上した。 (4)本発明により、従来技術の項に記載した化学めっ
き方法の工程からパシベーション(硝酸)の工程が不要
となり、下記の工程での化学めっきが可能となった。 脱脂−水洗−デスマット−水洗−水洗−酸浸漬−水洗−
浸漬脱脂−水洗−活性化−水洗−水洗−無電解メッキ−
無電解メッキ−水洗−水洗−クロメート処理−水洗−水
洗−浸漬−乾燥 めっき作業の中断をする必要がなくなる。約4000時
間以上化学めっきを行っても何らめっき槽内面に金属の
析出物がなく、液寿命が大巾に延長された。 (5)振動撹拌のみで邪魔板を設けないときのめっき不
良率に対し、邪魔板を設けた場合の不良率はほゞ1/3
に低減した。
(1) In the conventional method, it was necessary to change the plating solution at a rate of about once a week. However, according to the present invention, the number of times of the replacement is greatly reduced. Can be used for twice as long. (2) After the plating solution is replaced, the chemical plating tank must be washed with nitric acid and then with water. Therefore, the reduction in the number of plating solution replacements means that the number of these operations and the amount of nitric acid and water used And the amount of waste nitric acid generated is also reduced. (3) In the case of composite plating, the quality of the product has been greatly improved not only because the service life of the normal solution is extended but also because the non-uniformity due to the precipitation of the solution can be prevented. (4) According to the present invention, the step of passivation (nitric acid) is unnecessary from the step of the chemical plating method described in the section of the prior art, and the chemical plating can be performed in the following steps. Degreasing-Rinse-Desmut-Rinse-Rinse-Acid dipping-Rinse-
Immersion degreasing-water washing-activation-water washing-water washing-electroless plating-
Electroless plating-Rinse-Rinse-Chromate treatment-Rinse-Rinse-Immersion-Dry Eliminates the need to interrupt plating. Even if chemical plating was performed for about 4000 hours or more, there was no metal deposit on the inner surface of the plating tank, and the solution life was greatly extended. (5) The defective rate when the baffle plate is provided is about 1/3 of the plating defect rate when the baffle plate is not provided by only vibration stirring.
Reduced to

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例に用いた化学めっき装置の上面
図である。
FIG. 1 is a top view of a chemical plating apparatus used in an embodiment of the present invention.

【図2】本発明の実施例に用いた化学めっき装置の側面
図である。
FIG. 2 is a side view of the chemical plating apparatus used in the embodiment of the present invention.

【図3】本発明の実施例に用いた化学めっき装置のもう
一方の側からみた側面図である。
FIG. 3 is a side view of another side of the chemical plating apparatus used in the embodiment of the present invention.

【図4】本発明のめっき方法に用いる新規な振動撹拌装
置の概略を示す斜視図である。
FIG. 4 is a perspective view schematically showing a novel vibration stirrer used in the plating method of the present invention.

【図5】図5は、化学めっき槽の左右両端に図1〜3に
みられるような振動手段を設けた場合における振動手段
と邪魔板(とくに多孔化した邪魔板とそうでない邪魔板
との組合せを含む)との組合せ例を示す上面図であっ
て、(a)は、対向する振動板の間に四枚の多孔板より
なる邪魔板を囲って作った四角状の筒体を設けたケース
であり、(b)は、対向する振動板の間に二枚の多孔性
板と二枚の非多孔板よりなる四枚の邪魔板を囲って作っ
た筒体を設けたケースであり、(c)は、対向する振動
板の間に二枚の多孔性板を設けたケースであり、(d)
は、(a)のケースの変形例で円形の筒体としたもので
あり、(e)は、(d)のケースにおいて、振動板のな
い面を非多孔性としたケースである。
FIG. 5 is a diagram showing a vibration means and a baffle plate (particularly a porous baffle plate and a non-baffle baffle plate) in the case where vibration means as shown in FIGS. (A) is a top view showing an example of a combination with the above (including a combination), wherein (a) is a case in which a square tubular body formed by surrounding a baffle plate made of four perforated plates is provided between opposed diaphragms. (B) shows a case in which a cylinder formed by surrounding four baffle plates consisting of two porous plates and two non-porous plates is provided between opposed diaphragms, and (c) is a case where (D) a case in which two porous plates are provided between opposing diaphragms.
(A) is a modified example of the case (a) and is a circular cylinder, and (e) is a case of (d) in which the surface without the diaphragm is made non-porous.

【符号の説明】[Explanation of symbols]

1 振動棒 2 振動棒 3 固定棒 4 固定棒 5 振動伝達棒 6 振動板 7 槽底部 8 支持用ゴム片 9 支持用ゴム片 10 支持用ゴム片 11 支持用ゴム片 21 振動モーター 22 振動枠 23 振動棒 24 振動羽根(振動板) 25 化学めっき槽 26 スプリング 27 台座 28 架台 29 邪魔板 30 被めっき体 31 振動板 32 多孔板(邪魔板) 33 非多孔板(邪魔板) DESCRIPTION OF SYMBOLS 1 Vibration bar 2 Vibration bar 3 Fixed bar 4 Fixed bar 5 Vibration transmission bar 6 Vibration plate 7 Tank bottom 8 Support rubber piece 9 Support rubber piece 10 Support rubber piece 11 Support rubber piece 21 Vibration motor 22 Vibration frame 23 Vibration Rod 24 Vibrating blade (vibrating plate) 25 Chemical plating tank 26 Spring 27 Pedestal 28 Stand 29 Baffle plate 30 Plated object 31 Vibrating plate 32 Perforated plate (Baffle plate) 33 Non-porous plate (Baffle plate)

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 化学めっき槽内において、被めっき体と
振動撹拌手段との間に邪魔板を設けたことを特徴とする
化学めっき装置。
1. A chemical plating apparatus, wherein a baffle plate is provided between an object to be plated and a vibration stirring means in a chemical plating tank.
【請求項2】 前記邪魔板が多孔筒状体である請求項1
記載の化学めっき装置。
2. The baffle plate according to claim 1, wherein said baffle plate is a perforated cylindrical body.
The described chemical plating apparatus.
【請求項3】 前記多孔筒状体の孔部分が占める開孔面
積が20〜60%である請求項2記載の化学めっき装
置。
3. The chemical plating apparatus according to claim 2, wherein an opening area occupied by a hole portion of the porous cylindrical body is 20 to 60%.
JP09198393A 1993-03-26 1993-03-26 Chemical plating equipment Expired - Fee Related JP3244334B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09198393A JP3244334B2 (en) 1993-03-26 1993-03-26 Chemical plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09198393A JP3244334B2 (en) 1993-03-26 1993-03-26 Chemical plating equipment

Publications (2)

Publication Number Publication Date
JPH06280035A JPH06280035A (en) 1994-10-04
JP3244334B2 true JP3244334B2 (en) 2002-01-07

Family

ID=14041723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09198393A Expired - Fee Related JP3244334B2 (en) 1993-03-26 1993-03-26 Chemical plating equipment

Country Status (1)

Country Link
JP (1) JP3244334B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3098966B2 (en) * 1995-12-12 2000-10-16 日本ペイント株式会社 Phosphate conversion treatment method for metal moldings
KR100897203B1 (en) 2001-05-02 2009-05-14 니혼 테크노 가부시키가이샤 Hydrogen-oxygen gas generator and method of generating hydrogen-oxygen gas using the generator
KR100869462B1 (en) 2001-06-25 2008-11-19 니혼 테크노 가부시키가이샤 Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus
WO2004096432A1 (en) 2003-05-02 2004-11-11 Japan Techno Co. Ltd. Active antiseptic water or active antiseptic water system fluid, and method and device for production the same
CN101922002A (en) * 2010-04-12 2010-12-22 南京航空航天大学 Chemical composite plating bath
CN112725772B (en) * 2020-12-24 2022-12-02 北京青云航空仪表有限公司 Hanging tool and hanging method for chemical nickel plating of QFN independent chip

Also Published As

Publication number Publication date
JPH06280035A (en) 1994-10-04

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