JPH06275864A - Light-to-light conversion element - Google Patents
Light-to-light conversion elementInfo
- Publication number
- JPH06275864A JPH06275864A JP5064892A JP6489293A JPH06275864A JP H06275864 A JPH06275864 A JP H06275864A JP 5064892 A JP5064892 A JP 5064892A JP 6489293 A JP6489293 A JP 6489293A JP H06275864 A JPH06275864 A JP H06275864A
- Authority
- JP
- Japan
- Prior art keywords
- light
- layer
- thin film
- organic thin
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光アドレス型の電界発
光表示装置、光演算装置、光波長変換装置、光空間変調
装置などの中心的素子として用いられる光−光変換素子
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-to-light conversion element used as a central element of an optical address type electroluminescent display device, an optical operation device, an optical wavelength conversion device, an optical spatial modulation device and the like.
【0002】[0002]
【従来の技術】本発明者らは、これまで、二つの電極間
に電荷注入し発光機能を有する発光性薄膜と、光を吸収
し光伝導性機能を有する光伝導性薄膜を挟み持つ、光か
ら光へ変換する素子(以下、光−光変換素子と呼ぶ)を
提案している(特願平02−174445、特願平02
−174446)。この光−光変換素子は、光伝導性薄
膜から発光性薄膜への電子注入を光で制御することによ
りもたらされる。かかる光伝導性薄膜として、無機アモ
ルファス薄膜(アモリファスシリコンカーバイド:a−
SiC:H)を用いて、光から光への変換効率(Φp
p)は0.91%が得られている。2. Description of the Related Art The inventors of the present invention have hitherto been known to use a light-emitting thin film having a light-emitting function by injecting electric charge between two electrodes and a photoconductive thin film having a light-conducting function by absorbing light. An element for converting light into light (hereinafter referred to as a light-light conversion element) has been proposed (Japanese Patent Application No. 02-174445 and Japanese Patent Application No. 02-174445).
-174446). This light-to-light conversion element is provided by controlling the electron injection from the photoconductive thin film to the light emitting thin film by light. As such a photoconductive thin film, an inorganic amorphous thin film (amorphous silicon carbide: a-
The conversion efficiency (Φp) from light to light using SiC: H)
As for p), 0.91% is obtained.
【0003】[0003]
【発明が解決しようとする課題】本発明は、光−光変換
素子において、光から光への変換効率を向上することで
ある。SUMMARY OF THE INVENTION The present invention is to improve the light-to-light conversion efficiency in a light-light conversion element.
【0004】[0004]
【課題を解決するための手段】すなわち、本発明は、2
つの電極間に、少なくとも1層以上の、光から電気に変
換する光伝導性薄膜と電気から光に変換する発光性有機
薄膜が挟持されている光−光変換素子において、該光伝
導性薄膜が、有機薄膜よりなることを特徴とする光−光
変換素子、であり、より好ましくは、該光伝導性薄膜か
ら発光性有機薄膜への電子注入障壁が、0.7eV以下
とされている光−光変換素子、である。以下、本発明の
各構成要件を図面を参照しながら説明する。That is, according to the present invention,
In a light-to-light conversion element, in which at least one layer of a photoconductive thin film for converting light to electricity and a luminescent organic thin film for converting electricity to light are sandwiched between two electrodes, the photoconductive thin film is , A light-to-light conversion element comprising an organic thin film, and more preferably a light-to-light conversion device in which an electron injection barrier from the photoconductive thin film to the luminescent organic thin film is 0.7 eV or less. A light conversion element. Hereinafter, each component of the present invention will be described with reference to the drawings.
【0005】図1は、その実施の形態の一例を示したも
のであるが、1は正孔を輸送する有機薄膜層、2は正孔
と電子が再結合し発光する発光性有機薄膜層、3は光を
吸収して正孔と電子を発生する光導伝性の有機薄膜層、
10はガラス基板等の支持基板、11は正孔を注入する
ための第1電極、12は電子を注入するための第2電極
である。FIG. 1 shows an example of the embodiment, wherein 1 is an organic thin film layer for transporting holes, 2 is a luminescent organic thin film layer for recombination of holes and electrons to emit light, 3 is a photoconductive organic thin film layer that absorbs light to generate holes and electrons,
Reference numeral 10 is a support substrate such as a glass substrate, 11 is a first electrode for injecting holes, and 12 is a second electrode for injecting electrons.
【0006】すなわち、ガラスなどの支持基板10上
に、正孔を注入するための電極層(第1電極)11、正
孔を輸送する有機薄膜層(第1層)1、正孔と電子が再
結合して光が発生する有機薄膜層(第2層)2、光から
正孔と電子を発生する有機薄膜からなる光伝導性薄膜
(第3層)3、電子を注入するための電極層(第2電
極)12を順次積層した光−光変換素子である。この素
子において、第3層は光から電気に変換する光伝導性薄
膜に、第2層は電気から光に変換する発光性薄膜にそれ
ぞれ対応している。光伝導性薄膜から発光性有機薄膜へ
の電子注入障壁とは、第3層から第2層への電子注入障
壁に対応している。この電子注入障壁は、極力小さく、
望ましくは0.7eV未満、より好ましくは0.3eV
以下とすることが望ましい。That is, an electrode layer (first electrode) 11 for injecting holes, an organic thin film layer (first layer) 1 for transporting holes, and holes and electrons are formed on a supporting substrate 10 such as glass. An organic thin film layer (second layer) 2 that recombines to generate light, a photoconductive thin film (third layer) 3 including an organic thin film that generates holes and electrons from light, and an electrode layer for injecting electrons This is a light-to-light conversion element in which (second electrode) 12 is sequentially laminated. In this device, the third layer corresponds to the photoconductive thin film that converts light into electricity, and the second layer corresponds to the light emitting thin film that converts electricity into light. The electron injection barrier from the photoconductive thin film to the light emitting organic thin film corresponds to the electron injection barrier from the third layer to the second layer. This electron injection barrier is as small as possible,
Desirably less than 0.7 eV, more preferably 0.3 eV
The following is desirable.
【0007】第3層は、光を吸収し電子と正孔を発生す
る機能が高い有機薄膜が用いられる。その材料は、光か
ら電気への変換効率が高く、さらに第3層から第2層を
見た場合の電子注入障壁が0.7eV未満であることが
好ましい。Me−PTCなどのペリレン誘導体等が好適
である。As the third layer, an organic thin film having a high function of absorbing light and generating electrons and holes is used. It is preferable that the material has a high conversion efficiency from light to electricity, and that the electron injection barrier when the second layer is viewed from the third layer is less than 0.7 eV. Perylene derivatives such as Me-PTC are suitable.
【0008】第2層は、正孔と電子が再結合して光を発
生する機能が高い有機薄膜が用いられる。その材料は特
に限定するものではないが、第3層の材料から見た電子
注入障壁が0.7eV未満の材料で、薄膜性がよくしか
も蛍光収量の高い材料が好ましい。t−BuPh−PT
Cなどのペリレン誘導体等が好適である。As the second layer, an organic thin film having a high function of generating light by recombination of holes and electrons is used. The material is not particularly limited, but a material having an electron injection barrier of less than 0.7 eV as seen from the material of the third layer, having a good thin film property and having a high fluorescence yield is preferable. t-BuPh-PT
Perylene derivatives such as C are suitable.
【0009】第1層は、正孔の輸送する機能の高い有機
薄膜が用いられる。その材料については特に限定するも
のではないが、発生する光に対して透明でしかも正孔の
移動度の大きい材料が好ましい。N、N、N’、N’−
tetrakis(m−methylphenyl)−
1、3−diaminobenzeneなどのジアミン
誘導体等が好適である。As the first layer, an organic thin film having a high hole transporting function is used. The material is not particularly limited, but a material that is transparent to generated light and has high hole mobility is preferable. N, N, N ', N'-
tetrakis (m-methylphenyl)-
Diamine derivatives such as 1,3-diaminobenzene are suitable.
【0010】有機薄膜の形成方法としては、ときに限定
するものではないが真空蒸着法、塗布法等が適宜用いら
れる。有機薄膜の膜厚は、特に限定するものではない
が、通常第1層が10〜100nm、第2層が10〜1
00nm、第3層が100〜1000nmの範囲が好適
に用いられる。As a method for forming the organic thin film, a vacuum deposition method, a coating method or the like is appropriately used, although not limited thereto. The thickness of the organic thin film is not particularly limited, but is usually 10 to 100 nm for the first layer and 10 to 1 for the second layer.
The range of 00 nm and the third layer of 100 to 1000 nm is preferably used.
【0011】第1電極は、第1層に正孔の注入効率がよ
く、出力の光に対して透明で電気伝導率の高い薄膜を用
いることが好ましい。その材料についてとくに限定する
ものではないが、好ましくは、酸化インジューム錫など
の透明導電薄膜が用いられる。第2電極は、第3層に対
する電子の注入効率がよく、入力の光に対して透明な薄
膜を用いるとよい。その材料についてとくに限定するも
のではないが、好ましくは、金の半透明膜や酸化インジ
ューム錫などの透明導電薄膜が用いられる。以下、実施
例により本発明の実施の態様の一例を説明する。As the first electrode, it is preferable to use a thin film which has a high hole injection efficiency in the first layer, is transparent to output light, and has a high electric conductivity. The material is not particularly limited, but a transparent conductive thin film such as indium tin oxide is preferably used. For the second electrode, it is preferable to use a thin film that has a high electron injection efficiency to the third layer and is transparent to the input light. The material is not particularly limited, but preferably, a semitransparent film of gold or a transparent conductive thin film such as indium tin oxide is used. Hereinafter, an example of an embodiment of the present invention will be described with reference to examples.
【0012】[0012]
【実施例】さらに実施例にて詳細に説明する。 〔実施例1〕ガラス基板上に酸化インジューム錫膜を形
成し、第1電極とした。その上にPDA(N、N、
N’、N’−tetrakis(m−methylph
enyl)−1、3−diaminobenzene)
の有機薄膜を、50nm形成し、第1層とした。その上
にt−BuPh−PTCの有機薄膜を、50nm形成
し、第2層とした。その上にMe−PTCの有機薄膜
を、500nm形成し、第3層とした。さらにその上に
Auの半透明薄膜を形成し、第2電極とし、第1図に示
すような光−光変換素子を得た。[Examples] Further examples will be described in detail. [Example 1] An indium tin oxide film was formed on a glass substrate to form a first electrode. On top of that PDA (N, N,
N ', N'-tetrakis (m-methylph
enyl) -1,3-diaminobenzene)
50 nm of the organic thin film of was formed as a first layer. An organic thin film of t-BuPh-PTC was formed thereon with a thickness of 50 nm to form a second layer. An organic thin film of Me-PTC was formed thereon to a thickness of 500 nm to form a third layer. Further, a semitransparent thin film of Au was formed on it to form a second electrode, and a light-light conversion element as shown in FIG. 1 was obtained.
【0013】この素子に、第1電極がプラス、第2電極
がマイナスになるように電圧を印加し、第2電極側から
光を入力し、第1電極側から出力光を取り出した。入力
光として、波長632.8nm、強度0.01mW/c
m2 において、出力光は680nmを中心としたブロー
ドな光で、強度0.00425mW/cm2 になった。
これは、光から光への変換効率が42.5%であること
を示している。従来の光−光変換素子に比較して変換効
率は約50倍ほど向上した。このとき、第2有機層と第
3有機層との電子障壁は、約0.3eVであり、従来の
素子での電子障壁約0.7eVよりも小さい。A voltage was applied to this element so that the first electrode was positive and the second electrode was negative, light was input from the second electrode side, and output light was extracted from the first electrode side. As input light, wavelength 632.8 nm, intensity 0.01 mW / c
At m 2 , the output light was broad light centered at 680 nm and had an intensity of 0.00425 mW / cm 2 .
This indicates that the conversion efficiency from light to light is 42.5%. The conversion efficiency is improved about 50 times as compared with the conventional light-light conversion element. At this time, the electron barrier between the second organic layer and the third organic layer is about 0.3 eV, which is smaller than the electron barrier of about 0.7 eV in the conventional device.
【0014】[0014]
【発明の効果】光−光変換素子において、光伝導度層を
有機薄膜とし、しかもこの層から有機の発光性薄膜への
電子障壁を、好ましくは0.7eV未満とすることによ
り、光から光への変換効率は従来よりも約50倍と飛躍
的に向上した。In the light-to-light conversion element, the photoconductivity layer is an organic thin film, and the electron barrier from this layer to the organic light-emitting thin film is preferably less than 0.7 eV, whereby light to light conversion is achieved. The efficiency of conversion to 50 times higher than before.
【図1】本発明の光−光変換素子の層構成の一例を示す
図FIG. 1 is a diagram showing an example of a layer structure of a light-light conversion element of the present invention.
1 正孔を輸送する有機薄膜層 2 正孔と電子が再結合し発光する有機薄膜層 3 光を吸収して正孔と電子を発生する有機薄膜層 10 ガラス基板等の支持基板 12 正孔を注入するための第1電極 13 電子を注入するための第2電極 1 Organic thin film layer that transports holes 2 Organic thin film layer that recombines holes and electrons to emit light 3 Organic thin film layer that absorbs light and generates holes and electrons 10 Support substrate such as a glass substrate 12 Holes First electrode for injecting 13 Second electrode for injecting electrons
Claims (2)
の、光から電気に変換する光伝導性薄膜と電気から光に
変換する発光性有機薄膜が挟持されている光−光変換素
子において、該光伝導性薄膜が、有機薄膜よりなること
を特徴とする光−光変換素子。1. A light-to-light conversion element in which at least one layer of a photoconductive thin film for converting light into electricity and a light emitting organic thin film for converting electricity into light are sandwiched between two electrodes, The light-to-light conversion element, wherein the photoconductive thin film is an organic thin film.
子注入障壁が、0.7eV未満とされている請求項1記
載の光−光変換素子。2. The light-to-light conversion element according to claim 1, wherein an electron injection barrier from the photoconductive thin film to the light emitting organic thin film is less than 0.7 eV.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5064892A JPH06275864A (en) | 1993-03-24 | 1993-03-24 | Light-to-light conversion element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5064892A JPH06275864A (en) | 1993-03-24 | 1993-03-24 | Light-to-light conversion element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06275864A true JPH06275864A (en) | 1994-09-30 |
Family
ID=13271196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5064892A Pending JPH06275864A (en) | 1993-03-24 | 1993-03-24 | Light-to-light conversion element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06275864A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001006876A (en) * | 1999-06-25 | 2001-01-12 | Futaba Corp | Light-light transducer |
WO2002021603A1 (en) * | 2000-09-01 | 2002-03-14 | Japan Science And Technology Corporation | Multiplication device comprising resin-dispersed organic semiconductor film and method for producing the same |
WO2002050920A1 (en) * | 2000-12-19 | 2002-06-27 | Japan Science And Technology Corporation | Quick response photocurrent multiplying device |
JP2003282934A (en) * | 2002-03-25 | 2003-10-03 | Japan Science & Technology Corp | Rapid response photoelectric current multiplying device formed of mixed thin film of heterologous organic semiconductor |
WO2004102681A1 (en) * | 2003-05-19 | 2004-11-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optoelectronic component comprising a light-emitting diode and a light sensor |
JP2006243626A (en) * | 2005-03-07 | 2006-09-14 | Ricoh Co Ltd | Light wavelength converting element |
JP2006251555A (en) * | 2005-03-11 | 2006-09-21 | Ricoh Co Ltd | Optical wavelength conversion element |
-
1993
- 1993-03-24 JP JP5064892A patent/JPH06275864A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001006876A (en) * | 1999-06-25 | 2001-01-12 | Futaba Corp | Light-light transducer |
WO2002021603A1 (en) * | 2000-09-01 | 2002-03-14 | Japan Science And Technology Corporation | Multiplication device comprising resin-dispersed organic semiconductor film and method for producing the same |
US6878960B2 (en) | 2000-09-01 | 2005-04-12 | Japan Science And Technology Corporation | Multiplication device comprising resin-dispersed organic semiconductor film and method for producing the same |
WO2002050920A1 (en) * | 2000-12-19 | 2002-06-27 | Japan Science And Technology Corporation | Quick response photocurrent multiplying device |
JP2003282934A (en) * | 2002-03-25 | 2003-10-03 | Japan Science & Technology Corp | Rapid response photoelectric current multiplying device formed of mixed thin film of heterologous organic semiconductor |
WO2004102681A1 (en) * | 2003-05-19 | 2004-11-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optoelectronic component comprising a light-emitting diode and a light sensor |
JP2006243626A (en) * | 2005-03-07 | 2006-09-14 | Ricoh Co Ltd | Light wavelength converting element |
JP2006251555A (en) * | 2005-03-11 | 2006-09-21 | Ricoh Co Ltd | Optical wavelength conversion element |
JP4567495B2 (en) * | 2005-03-11 | 2010-10-20 | 株式会社リコー | Optical wavelength conversion element |
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