JPH06267868A - Formation of silicon oxide semiconductor film - Google Patents
Formation of silicon oxide semiconductor filmInfo
- Publication number
- JPH06267868A JPH06267868A JP5054433A JP5443393A JPH06267868A JP H06267868 A JPH06267868 A JP H06267868A JP 5054433 A JP5054433 A JP 5054433A JP 5443393 A JP5443393 A JP 5443393A JP H06267868 A JPH06267868 A JP H06267868A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor film
- type
- silicon oxide
- oxide semiconductor
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 10
- 229910052814 silicon oxide Inorganic materials 0.000 title claims abstract description 8
- 230000015572 biosynthetic process Effects 0.000 title claims description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 19
- 238000010521 absorption reaction Methods 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims abstract description 9
- 238000000354 decomposition reaction Methods 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract description 10
- 230000031700 light absorption Effects 0.000 abstract description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 4
- 229910017872 a-SiO2 Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 40
- 239000007789 gas Substances 0.000 description 20
- 229910052799 carbon Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000001237 Raman spectrum Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 230000010748 Photoabsorption Effects 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、非晶質シリコン (以下
ａ−Siと記す) 系太陽電池の窓層として適しているシリ
コンオキサイド半導体膜の成膜方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a silicon oxide semiconductor film suitable as a window layer for an amorphous silicon (hereinafter referred to as a-Si) solar cell.
【０００２】[0002]
【従来の技術】原料ガスのグロー放電分解や光ＣＶＤ法
により形成されるａ−Siを主材料とした太陽電池は薄
膜、大面積化が容易という特長をもち、低コスト太陽電
池として期待されている。この種の太陽電池の構造とし
てはｐｉｎ接合を有するｐｉｎ型ａ−Si太陽電池が一般
的である。図２はこのような太陽電池の構造を示し、ガ
ラス基板１の上に、透明電極２、ｐ形ａ−Si層３、ｐ／
ｉ界面層４、ｉ質ａ−Si層５、ｎ形ａ−Si層６、金属電
極７を順次積層することにより作製される。この太陽電
池は、ガラス基板１を通して入射する光により発電が起
こる。2. Description of the Related Art A solar cell mainly composed of a-Si formed by glow discharge decomposition of a raw material gas or an optical CVD method has a feature that it can be easily formed into a thin film and has a large area, and is expected as a low cost solar cell. There is. As a structure of this type of solar cell, a pin-type a-Si solar cell having a pin junction is generally used. FIG. 2 shows the structure of such a solar cell, in which a transparent electrode 2, a p-type a-Si layer 3, p /
The i-interface layer 4, the i-type a-Si layer 5, the n-type a-Si layer 6, and the metal electrode 7 are sequentially laminated. In this solar cell, power is generated by light incident through the glass substrate 1.
【０００３】ここで、発電に寄与するフォトキャリアは
主にｉ層で発生し、ｐおよびｎ層はデッドレイヤーにな
っている。従って、図２のようにｐ層３から光が入射す
る太陽電池では、窓層にあたるｐ層の光吸収係数を低く
し、できるだけ多くの光がｉ層５まで到達できるように
することが出力を増加させる上で重要である。そのため
には、ｐ層の光学ギャップＥg を増加させて光学吸収ロ
スを減少させることが有効である。このような目的から
ｐ形ａ−Si層に、例えば特開昭56−64476 号公報などで
公知のように炭素原子を添加したり、特開昭57−181176
号公報で公知のように窒素原子を添加したり、特開昭56
−142680号公報で公知のように酸素原子を添加したり、
または特開昭58−196064号公報あるいは特開昭61−2420
85号公報で公知のように酸素原子と炭素原子を添加した
りすることが試みられている。Here, photocarriers that contribute to power generation are mainly generated in the i layer, and the p and n layers are dead layers. Therefore, in a solar cell in which light is incident from the p-layer 3 as shown in FIG. 2, it is necessary to reduce the light absorption coefficient of the p-layer, which is the window layer, so that as much light as possible can reach the i-layer 5. It is important to increase. For that purpose, it is effective to increase the optical gap Eg of the p layer to reduce the optical absorption loss. For this purpose, carbon atoms are added to the p-type a-Si layer, as known from JP-A-56-64476, or JP-A-57-181176.
Nitrogen atoms are added as is known in Japanese Patent Publication No.
Addition of oxygen atom as known in Japanese Patent Publication No. 142680,
Alternatively, JP-A-58-196064 or JP-A-61-2420
It is attempted to add an oxygen atom and a carbon atom, as is known in Japanese Patent Publication No. 85.
【０００４】また、最近では、特開昭64−51618 号公報
に示すようにＥＣＲ−ＣＶＤ法により、あるいはTechni
cal Digest of the International PVSEC-3 (1987)p.49
に記載されているようにプラズマＣＶＤ法により、炭素
原子を添加した非晶質シリコンカーバイド (以下ａ−Si
Ｃと記す) 膜に微結晶相を含ませることに成功してい
る。このような膜は、ａ−SiＣ相にSiの微結晶相を含む
ことにより、光導電率が高くなり、電気的特性が良好で
ある。Recently, as shown in Japanese Patent Laid-Open No. 64-51618, the ECR-CVD method is used, or
cal Digest of the International PVSEC-3 (1987) p.49
The amorphous silicon carbide (hereinafter referred to as a-Si) added with carbon atoms by the plasma CVD method as described in
It has succeeded in including a microcrystalline phase in the film. Such a film has a high photoconductivity and good electrical characteristics due to the inclusion of a Si microcrystalline phase in the a-SiC phase.
【０００５】[0005]
【発明が解決しようとする課題】上記のようにａ−Si系
膜にSiの微結晶相を含ませることは、ワイドギャップ化
のために他元素原子を添加した場合に低下する光導電率
を高めるので、太陽電池窓層としての特性を向上させる
のに有望であるが、公知のａ−SiＣ膜の微結晶化する方
法は、微結晶化のための成膜条件の範囲が狭く、付着率
を高めるのが困難であるなど工業化には難点がある。The inclusion of the Si microcrystalline phase in the a-Si-based film as described above reduces the photoconductivity that decreases when other element atoms are added for widening the gap. Since it is increased, it is promising for improving the characteristics as a solar cell window layer, but the known method for microcrystallizing an a-SiC film has a narrow range of film-forming conditions for microcrystallization, and the deposition rate is small. There is a problem in industrialization because it is difficult to increase
【０００６】本発明は、ａ−Si系膜のうち、酸素を含む
非晶質シリコンオキサイド (以下ａ−SiＯと記す) 膜を
微結晶化した、低光吸収係数で高光導電率のシリコンオ
キサイド (以下SiＯと記す) 半導体膜の工業化に適した
成膜方法を提供することにある。According to the present invention, an amorphous silicon oxide film containing oxygen (hereinafter referred to as a-SiO) film among a-Si films is microcrystallized, which is a silicon oxide film having a low photoabsorption coefficient and a high photoconductivity. It is to provide a film forming method suitable for industrialization of a semiconductor film.
【０００７】[0007]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明のSiの微結晶層を含むａ−SiＯよりなるSi
Ｏ半導体膜の成膜方法は、少なくともSiＨ4 、ＣＯ2 お
よびＨ2 を含み、ＣＯ 2 ／ (SiＨ4 ＋ＣＯ2 ) の値が0.
６以下である原料ガスの分解によるものとする。その場
合、混合ガスの分解のために40ｍＷ／cm2 以上の高周波
パワー密度でグロー放電を原料ガス中に発生させること
が有効である。また、得られたSiＯ半導体膜の340nm 以
上の波長の光の吸収係数が106 cm-1以下であり、光導電
率が10-6Ｓ／cm以上である。また、原料ガスにドーピン
グガスを混合して得られたｐ形あるいはｎ形の膜を太陽
電池の窓層として用いることが有効である。[Means for Solving the Problems]
In order to achieve the above, Si made of a-SiO containing the Si microcrystalline layer of the present invention is used.
The method for forming the O semiconductor film is at least SiH.Four, CO2Oh
And H2Including CO 2/ (SiHFour+ CO2) Has a value of 0.
It is assumed that the raw material gas of 6 or less is decomposed. On the spot
40mW / cm for decomposition of mixed gas2Higher frequency
Generation of glow discharge in raw material gas with power density
Is effective. Also, the thickness of the obtained SiO semiconductor film of 340 nm or less
The absorption coefficient of light of the upper wavelength is 106cm-1Below, photoconductive
Rate 10-6S / cm or more. In addition, doping the source gas
The p-type or n-type film obtained by mixing the gas with the sun
It is effective to use it as a window layer of a battery.
【０００８】[0008]
【作用】SiＨ4 、ＣＯ2 、Ｈ2 を含む原料ガスを用いて
太陽電池の窓層を形成することは、前掲の特開昭61−24
2085号公報で公知であるが、その場合のガス流量比ＣＯ
2 ／ (SiＨ4 ＋ＣＯ2 ) の値は0.83であり、得られたａ
−Si膜は、酸素原子および炭素原子を含む。これに対
し、ＣＯ2 ／ (SiＨ4 ＋ＣＯ2 ) を0.６以下とした場
合、特に高周波パワー密度40ｍＷ／cm2 以上でのグロー
放電分解により得られる膜では、炭素量は検出限界以下
であり、微結晶化したSi層とａ−SiＯ相とが混在してい
るSiＯ膜となって、10-6Ｓ／cm以上の高い光導電率で高
い光吸収係数を示す。[Function] SiHFour, CO2, H2Using source gas containing
The formation of the window layer of the solar cell is disclosed in the above-mentioned JP-A-61-24.
As disclosed in Japanese Patent No. 2085, the gas flow rate ratio CO in that case is
2/ (SiHFour+ CO2) Is 0.83 and the obtained a
The -Si film contains oxygen atoms and carbon atoms. Against this
And CO2/ (SiHFour+ CO2) Is less than 0.6
Especially high frequency power density 40mW / cm2Glow over
In the film obtained by discharge decomposition, the carbon content is below the detection limit.
And the microcrystallized Si layer and the a-SiO phase are mixed.
10-6High photoconductivity above S / cm
It shows the optical absorption coefficient.
【０００９】[0009]
【実施例】SiＨ4 、ＣＯ2 、Ｈ2 を混合し、ドーピング
ガスとしてＢ2 Ｈ6 あるいはＰＨ 3 を添加し、各ガスの
流量比を変化させて、次の成膜条件でｐ形およびｎ形の
SiＯ膜を形成した。 ＣＯ2 ／ (SiＨ4 ＋ＣＯ2 ) ０〜0.６ Ｈ2 ／SiＨ4 160〜320 Ｂ2 Ｈ6 ／SiＨ4 またはＰＨ3 ／SiＨ4 0.08 基板温度 150 ℃ 圧 力 0.５Torr 高周波パワー密度 50 ｍＷ／cm2 図３は、ドーピングガスとしてＢ2 Ｈ6 を添加して成膜
したｐ形の膜における340nm 〜500nm の波長の光に対す
る吸収係数のガス流量比ＣＯ2 ／ (SiＨ4 ＋ＣＯ2 ) 依
存性を表している。吸収係数は、短い波長の光に対して
も106 cm-3以下であり、波長が長くなると減少し、また
ＣＯ2 流量比が多くなるにつれて減少してくることがわ
かった。図４は、ドーピングガスとしてＰＨ3 を添加し
て成膜したｎ形の膜における吸収係数のガス流量比依存
性を表しており、ｐ形膜と同様の傾向を示す。形成され
たＰ形およびｎ形膜をＥＳＣＡで分析したところ、混合
するＣＯ2 の流量比の増加に伴って酸素量が増えてくる
ことが確認された。そして、酸素量は25〜40原子％であ
るのに対し、炭素量は１％以下の検出限界外になってい
た。[Example] SiHFour, CO2, H2Mixing and doping
B as gas2H6Or PH 3Of each gas
By changing the flow rate ratio, p-type and n-type
A SiO film was formed. CO2/ (SiHFour+ CO2) 0-0.6 H2/ SiHFour 160 ~ 320 B2H6/ SiHFourOr PH3/ SiHFour 0.08 Substrate temperature 150 ℃ Pressure 0.5 Torr High frequency power density 50 mW / cm2 FIG. 3 shows that B is used as a doping gas.2H6Film formation by adding
The light of the wavelength of 340nm-500nm in the formed p-type film
Absorption coefficient gas flow ratio CO2/ (SiHFour+ CO2)
It represents the existence. Absorption coefficient is for short wavelength light
Also 106cm-3And decreases with increasing wavelength, and
CO2It can be seen that it decreases as the flow rate ratio increases.
won. FIG. 4 shows that PH is used as a doping gas.3Added
Gas flow rate ratio dependence of absorption coefficient in n-type film
And shows the same tendency as the p-type film. Formed
When the P-type and n-type films were analyzed by ESCA,
CO2Oxygen amount increases with increasing flow rate ratio
It was confirmed. And the amount of oxygen is 25-40 atom%.
However, the carbon content is below the detection limit of 1% or less.
It was
【００１０】図５は、光導電率のガス流量比依存性を示
し、ＣＯ2 流量の増加と共に光導電率σphが低くなり、
線51で示すｎ形の方が線52で示すｐ形より光導電率が高
いということがわかった。そして、光導電率を10-6Ｓ／
cm以上に抑えるには流量比ＣＯ2 ／ (SiＨ4 ＋ＣＯ2 )
を0.６以下とすることが必要である。このようにして得
られたSiＯ膜についてラマン散乱を測定したところ、ラ
マンスペクトルにSi結晶の存在を示す530 cm-1付近のピ
ークが存在し、微結晶化したSi相とａ−SiＯ相が混在し
ていることが確認された。また、ＣＯ2 流量比の増加と
共に、530 cm-1付近のピークの強度が減少してくること
が確認された。FIG. 5 shows the dependence of the photoconductivity on the gas flow rate ratio, in which the photoconductivity σ ph decreases as the CO 2 flow rate increases.
It has been found that the n-type shown by line 51 has a higher photoconductivity than the p-type shown by line 52. And, the photoconductivity is 10 −6 S /
Flow rate ratio CO 2 / (SiH 4 + CO 2 )
Should be 0.6 or less. Raman scattering of the thus-obtained SiO film was measured. As a result, a Raman spectrum showed a peak near 530 cm −1 indicating the presence of Si crystals, and the microcrystallized Si phase and a-SiO phase were mixed. It was confirmed that It was also confirmed that the intensity of the peak around 530 cm -1 decreased as the CO 2 flow rate ratio increased.
【００１１】図１は、光導電率σphが太陽電池の窓層と
して用いることのできる最低限である10-6Ｓ／cm付近に
ある本発明の実施例によるSiＯ膜の吸収係数を従来のｐ
形ａ−SiＯ膜と比較したもので、線11に示す微結晶相を
含むａ−SiＯ膜の吸収係数は、広い波長域にわたって線
12に示す微結晶相を含まないａ−SiＯ膜の吸収係数の１
／３になっており、同様な特性をもつｎ形膜と共に太陽
電池の窓層の材料として有望であることがわかった。FIG. 1 shows the absorption coefficient of a conventional SiO film having a photoconductivity σ ph in the vicinity of 10 -6 S / cm, which is the minimum value that can be used as a window layer of a solar cell. p
Compared with the a-SiO film, the absorption coefficient of the a-SiO film containing the microcrystalline phase shown by line 11 shows that the absorption coefficient is linear over a wide wavelength range.
1 of the absorption coefficient of the a-SiO film not containing the microcrystalline phase shown in 12
It is / 3, and it has been found that it is promising as a material for a window layer of a solar cell together with an n-type film having similar characteristics.
【００１２】また、ＣＯ2 の代わりにＣ2 Ｈ2 を用い、
原料ガス以外は上記の実施例と同一の条件で成膜したと
ころ、得られた膜の炭素の量は20原子％と少ないにもか
かわらず、ラマンスペクトルはSi結晶相の存在を示す53
0 cm-1付近のピークが見られず、微結晶化していないこ
とが確認された。このことから、酸素原子と比較して炭
素原子の方がシリコンの微結晶化を妨げると考えられ、
ワイドギャップ化で吸収係数の減少が見られても導電率
の低下により、太陽電池の窓層の材料として不適当であ
ることがわかった。Also, C 2 H 2 is used instead of CO 2 ,
When a film was formed under the same conditions as in the above example except for the raw material gas, the Raman spectrum showed the presence of the Si crystal phase although the amount of carbon in the obtained film was as small as 20 atomic%.
No peak near 0 cm -1 was observed, confirming that no microcrystallization was observed. From this, it is considered that carbon atoms hinder microcrystallization of silicon as compared with oxygen atoms,
It was found that the material is not suitable as the material for the window layer of the solar cell due to the decrease in conductivity even though the absorption coefficient is decreased due to the widening of the gap.
【００１３】[0013]
【発明の効果】本発明によれば、混合比を低くしたＣＯ
2 を酸素源として用い、SiＨ4 、Ｈ2との混合ガスによ
りａ−SiＯを成膜することにより、炭素を含まず、Si微
結晶相を含んだａ−SiＯ相からなるSiＯ膜を成膜するこ
とができた。この結果、酸素原子によりワイドギャップ
化されて低吸収係数であり、かつ微結晶相の存在により
導電率の高いａ−Si系膜を得ることができ、ｐ形あるい
はｎ形の窓層としてａ−Si系太陽電池に極めて有効に用
いることができる。According to the present invention, CO having a low mixing ratio is used.
2 is used as an oxygen source, and a-SiO film is formed by a mixed gas of SiH 4 and H 2 to form a SiO film composed of a-SiO phase containing no carbon and containing Si microcrystalline phase. We were able to. As a result, it is possible to obtain an a-Si-based film which has a wide absorption band due to oxygen atoms and has a low absorption coefficient and which has a high conductivity due to the presence of a microcrystalline phase. It can be used very effectively for Si-based solar cells.
【図１】本発明の一実施例により成膜されたｐ形SiＯ膜
と従来のｐ形ａ−SiＯ膜との吸収係数と光エネルギーと
の関係線図FIG. 1 is a diagram showing the relationship between the absorption coefficient and light energy of a p-type SiO film formed according to an embodiment of the present invention and a conventional p-type a-SiO film.
【図２】本発明により成膜されるｐ形SiＯ膜を用いるこ
とのできる太陽電池の断面図FIG. 2 is a sectional view of a solar cell in which a p-type SiO 2 film formed according to the present invention can be used.
【図３】本発明の一実施例により成膜されたｐ形SiＯ膜
の成膜時のＣＯ2 ガス流量比をパラメータとした吸収係
数と光エネルギーとの関係線図FIG. 3 is a diagram showing the relationship between the absorption coefficient and the light energy with the CO 2 gas flow rate ratio as a parameter when forming a p-type SiO 2 film formed according to an embodiment of the present invention.
【図４】本発明の別の実施例により成膜されたｎ形SiＯ
膜の成膜時のＣＯ2 ガス流量比をパラメータとした吸収
係数と光エネルギーとの関係線図FIG. 4 is an n-type SiO film deposited according to another embodiment of the present invention.
Diagram of relationship between absorption coefficient and light energy with CO 2 gas flow rate ratio as parameter during film formation
【図５】本発明の実施例により成膜されたｐ形およびｎ
形SiＯ膜の光導電率とＣＯ2 ガス流量比との関係線図FIG. 5: p-type and n deposited according to an embodiment of the invention
Diagram of the relationship between the photoconductivity and the flow rate ratio of CO 2 gas in the SiO 2 film
１ ガラス基板 ２ 透明電極 ３ ｐ形ａ−Si層 ４ ｐ／ｉ界面層 ５ ｉ質ａ−Si層 ６ ｎ形ａ−Si層 ７ 金属電極 1 glass substrate 2 transparent electrode 3 p-type a-Si layer 4 p / i interface layer 5 i-type a-Si layer 6 n-type a-Si layer 7 metal electrode
Claims (5)
み、ＣＯ2 ／ (SiＨ 4 ＋ＣＯ2 ) の値が0.６以下である
原料ガスの分解によることを特徴とするシリコンの微結
晶相を含む非晶質シリコンオキサイドよりなるシリコン
オキサイド半導体膜の成膜方法。1. At least SiHFour, CO2And H2Including
Mi, CO2/ (SiH Four+ CO2) Is less than or equal to 0.6
Fine silicon formation characterized by decomposition of raw material gas
Silicon made of amorphous silicon oxide containing crystal phase
Method for forming oxide semiconductor film.
高周波パワー密度で原料ガス中にグロー放電を発生させ
る請求項１記載のシリコンオキサイド半導体膜の成膜方
法。2. The method for forming a silicon oxide semiconductor film according to claim 1, wherein glow discharge is generated in the raw material gas at a high frequency power density of 40 mW / cm or more for decomposing the mixed gas.
る吸収係数が106 cm -1以下である請求項１あるいは２記
載のシリコンオキサイド半導体膜の成膜方法。3. The obtained film is applied to light having a wavelength of 340 nm or more.
Absorption coefficient is 106cm -1The following are claims 1 and 2
A method for forming a silicon oxide semiconductor film according to claim 1.
ある請求項１、２あるいは３記載のシリコンオキサイド
半導体膜の成膜方法。4. The method for forming a silicon oxide semiconductor film according to claim 1, wherein the photoconductivity of the obtained film is 10 −6 S / cm or more.
れたｐ形あるいはｎ形の膜を太陽電池の窓層として用い
る請求項１、２、３あるいは４記載のシリコンオキサイ
ド半導体膜の成膜方法。5. A silicon oxide semiconductor film according to claim 1, wherein a p-type or n-type film obtained by mixing a source gas with a doping gas is used as a window layer of a solar cell. Method.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5054433A JP3047666B2 (en) | 1993-03-16 | 1993-03-16 | Method for forming silicon oxide semiconductor film |
| DE4408791A DE4408791B4 (en) | 1993-03-16 | 1994-03-15 | Process for producing a silicon oxide semiconductor film |
| US08/213,717 US5507881A (en) | 1991-09-30 | 1994-03-16 | Thin-film solar cell and method of manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5054433A JP3047666B2 (en) | 1993-03-16 | 1993-03-16 | Method for forming silicon oxide semiconductor film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06267868A true JPH06267868A (en) | 1994-09-22 |
| JP3047666B2 JP3047666B2 (en) | 2000-05-29 |
Family
ID=12970584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5054433A Expired - Fee Related JP3047666B2 (en) | 1991-09-30 | 1993-03-16 | Method for forming silicon oxide semiconductor film |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3047666B2 (en) |
| DE (1) | DE4408791B4 (en) |
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Also Published As
| Publication number | Publication date |
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| DE4408791A1 (en) | 1994-09-22 |
| JP3047666B2 (en) | 2000-05-29 |
| DE4408791B4 (en) | 2006-10-19 |
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