JPH06240490A - Corrosion resistant chromium plating - Google Patents
Corrosion resistant chromium platingInfo
- Publication number
- JPH06240490A JPH06240490A JP2666793A JP2666793A JPH06240490A JP H06240490 A JPH06240490 A JP H06240490A JP 2666793 A JP2666793 A JP 2666793A JP 2666793 A JP2666793 A JP 2666793A JP H06240490 A JPH06240490 A JP H06240490A
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- JP
- Japan
- Prior art keywords
- plating
- nickel
- corrosion
- corrosion resistance
- phosphorus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は自動車、電気製品、もし
くはそれらの部品表面に施される装飾クロムめっきに関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to decorative chrome plating applied to the surface of automobiles, electric appliances, or parts thereof.
【0002】[0002]
【従来の技術】クロムめっきは、青みを帯びた色調の美
しい金属光沢があり、さらにこの光沢が大気中できわめ
て安定で、曇ったり変色したりしない。そのため、自動
車、電気製品、もしくはそれらの部品表面に銅−ニッケ
ル−クロムもしくはニッケル−クロムめっきを施すこと
で耐食性と装飾効果を高める装飾クロムめっきが多用さ
れている。2. Description of the Related Art Chromium plating has a beautiful metallic luster with a bluish tint, and this luster is extremely stable in the atmosphere and does not fog or discolor. For this reason, decorative chromium plating, which enhances corrosion resistance and decorative effect by applying copper-nickel-chromium or nickel-chromium plating to the surface of automobiles, electric products, or parts thereof, is often used.
【0003】この装飾クロムめっき工程は、従来から次
のようなものが用いられていた。 素地−銅めっき−光沢ニッケルめっき−クロムめっき そして、光沢めっきでは、めっき面に光沢の良い電着が
得られるだけでなく、素地あるいは下地めっき面のあら
さを減少させる平滑化作用がある。In the decorative chrome plating step, the following has been conventionally used. Base-Copper plating-Bright nickel plating-Chromium plating Then, the bright plating not only provides a bright electrodeposition on the plated surface, but also has a smoothing action to reduce the roughness of the base or the underlying plated surface.
【0004】しかし、これら銅−ニッケル−クロムもし
くはニッケル−クロムめっきはクロムめっき皮膜にきず
あるいはクラックを原因とした局部電池を形成して腐食
が起こり、素地の腐食に到り外観不良だけでなく製品の
致命的な欠陥となることがあった。特に、光沢ニッケル
めっきは電着ニッケル中に硫黄を含有しているため、硫
黄を含有しないニッケルよりも電位が卑であり耐食性が
劣り、腐食孔が半球状で腐食ピットがすぐに素地まで達
してしまう。However, these copper-nickel-chromium or nickel-chromium plating forms a local battery due to flaws or cracks in the chromium plating film to cause corrosion, resulting in corrosion of the base material and not only poor appearance but also product. Could be a fatal flaw in the. In particular, since bright nickel plating contains sulfur in electrodeposited nickel, it has a lower potential and poorer corrosion resistance than nickel that does not contain sulfur. I will end up.
【0005】そのため、従来は各めっき層の厚さを厚く
したり、めっき層を多層にしたり、クロムめっき層に微
小クラックや微小孔を設けて予め局部電池の分散化を図
る方法がとられている。Therefore, conventionally, a method has been adopted in which the thickness of each plating layer is increased, the plating layers are multilayered, or the chromium plating layer is provided with microcracks or micropores to disperse local batteries in advance. There is.
【0006】例えば、二層ニッケルめっきは硫黄を含ま
ない半光沢ニッケル上に硫黄(0.05%)を含む光沢
ニッケルめっきを行うもので、腐食環境下において硫黄
を含む光沢めっきが半光沢めっきに対してアノード的に
働き、腐食反応が光沢ニッケルめっき層で止まるので耐
食性が良い。[0006] For example, the two-layer nickel plating is a bright nickel plating containing sulfur (0.05%) on semi-bright nickel that does not contain sulfur. The bright plating containing sulfur becomes a semi-bright plating in a corrosive environment. On the other hand, it works as an anode and the corrosion reaction stops at the bright nickel plating layer, so it has good corrosion resistance.
【0007】また、マイクロクラッククロムは細かいク
ラックのある装飾クロムであって、その細かいクラック
によって発生する腐食点を分散させ、腐食の集中化を防
止して、深部への腐食を進行させない効果がある。ま
た、マイクロポーラスクロムめっきは、クロムめっきに
多数の微小な空孔を発生させて、腐食を分散させて耐食
性を向上させるものである。The microcrack chrome is a decorative chrome with fine cracks, and has the effect of dispersing the corrosion points generated by the fine cracks, preventing the concentration of the corrosion, and preventing the corrosion of deep areas. . The microporous chrome plating is to improve the corrosion resistance by generating a large number of minute holes in the chrome plating to disperse the corrosion.
【0008】マイクロポーラスクロムめっきの例として
は、特公昭56−15471号公報の発明があり、この
発明ではクロムめっきの下層となるニッケルめっきに不
溶性の微細な粒子を分散させ、このニッケルめっきの上
にクロムめっきをすると、非金属粒子のところがクロム
めっきされないので、クロムめっきに多数の空孔が生じ
るものである。As an example of the microporous chrome plating, there is an invention of Japanese Patent Publication No. 56-15471. In this invention, insoluble fine particles are dispersed in the nickel plating which is a lower layer of the chrome plating, and When chromium plating is performed on the non-metallic particles, the non-metallic particles are not plated with chromium, so that many holes are generated in the chromium plating.
【0009】[0009]
【発明が解決しようとする課題】しかしながら、二層ニ
ッケルめっきでは光沢ニッケルめっき層が犠牲陽極とな
り腐食が横に広がって行くが、腐食孔はいずれは半光沢
めっき層を侵し素地に至るものであり、マイクロクラッ
ククロムは光沢ニッケルめっきに応力の高い特殊なニッ
ケルストライプめっきをし、ニッケルの高応力でクロム
めっきに均一なクラックを生成させるが、ニッケルの厚
さ・応力を厳密に管理しないと逆に耐食性は低下する。
また、マイクロポーラスクロムめっきは、いったん疵が
付けば、そこから大きい腐食が起こる欠点がある。ま
た、微小孔を均一に生成するように微粒子を分散させ、
ニッケルと共析するように管理することが要求され、ま
た厳密に管理しなければ、共析量の不均一による光沢の
バラツキで外観不良が発生し、部分的な腐食によって耐
食性に問題を生じていた。However, in the two-layer nickel plating, the bright nickel plating layer serves as a sacrificial anode and the corrosion spreads laterally. Corrosion holes eventually penetrate the semi-bright plating layer and reach the substrate. , Microcrack chrome is a special nickel stripe plating with high stress on bright nickel plating to generate uniform cracks on chrome plating with high stress of nickel, but on the contrary, unless the thickness and stress of nickel are strictly controlled. Corrosion resistance decreases.
In addition, the microporous chrome plating has a drawback in that once a flaw is formed, a large amount of corrosion occurs from there. In addition, the fine particles are dispersed so that the micropores are uniformly generated,
It is required to control it so that it will co-deposit with nickel.If it is not strictly controlled, uneven appearance will occur due to uneven gloss due to the non-uniform amount of eutectoid, and corrosion resistance will be a problem due to partial corrosion. It was
【0010】本発明は装飾クロムめっきの前記のごとき
問題点を解決するためになされたものであって、複雑な
工程を経ることなく、かつ下地層の複雑な管理を必要と
せずに、耐食性に優れためっき層が得られる耐食クロム
めっきを提供することを目的とする。The present invention has been made in order to solve the above-mentioned problems of decorative chromium plating, and has corrosion resistance without complicated steps and without requiring complicated management of the underlayer. It is an object of the present invention to provide a corrosion-resistant chromium plating that can obtain an excellent plating layer.
【0011】[0011]
【課題を解決するための手段】発明者等はニッケル−リ
ン合金めっきが耐食性に優れていることに着目し、この
ニッケル−リン合金めっきをクロムめっきの下地層めっ
きとすることを着想した。そこでさらに、ニッケル−リ
ン合金めっきにおけるリン含有量およびめっき厚さと耐
食性の関連について鋭意研究を重ねた結果、所定のリン
含有量において所定のめっき厚さとすることにより、耐
食性が著しく向上することを見出して本発明を完成する
に到った。Means for Solving the Problems The present inventors have noticed that nickel-phosphorus alloy plating has excellent corrosion resistance, and have conceived that this nickel-phosphorus alloy plating is used as an underlayer plating of chromium plating. Then, as a result of further intensive studies on the relationship between the phosphorus content and the plating thickness and the corrosion resistance in the nickel-phosphorus alloy plating, it was found that the corrosion resistance is remarkably improved by setting the predetermined plating thickness at the predetermined phosphorus content. To complete the present invention.
【0012】本発明の耐食性クロムめっきは、リンを8
〜15重量%含有したニッケル−リン合金を下地層とし
て5〜20μmめっきした後、クロムめっきを施したこ
とを要旨とする。さらに、必要に応じて、前記ニッケル
−リンめっきの下地層として半光沢ニッケルめっき、光
沢ニッケルめっきを順次形成したことを要旨とする。The corrosion-resistant chromium plating of the present invention contains phosphorus of 8%.
The gist is that a nickel-phosphorus alloy containing ˜15 wt% is plated as a base layer for 5 to 20 μm and then chrome plated. Furthermore, the gist is that semi-bright nickel plating and bright nickel plating are sequentially formed as an underlayer of the nickel-phosphorus plating, if necessary.
【0013】下地層のニッケル−リン合金めっきは、電
気めっきあるいは無電解めっきのいずれの方法を用いて
も良い。ニッケル−リン合金めっきにより形成されるめ
っき層のリン含有量は、浴の組成、pH、電解条件等の
生成条件により広範囲に変動するから、リン含有量が8
〜15%になるようにこれら生成条件を適宜に選択す
る。For the nickel-phosphorus alloy plating of the underlayer, either electroplating or electroless plating may be used. The phosphorus content of the plating layer formed by nickel-phosphorus alloy plating varies widely depending on the production conditions such as bath composition, pH, and electrolysis conditions.
These generation conditions are appropriately selected so as to be ˜15%.
【0014】ニッケル−リン合金めっき層のリン含有量
を8%以上に管理することで皮膜は不動態化膜を形成し
耐食性に優れた皮膜となる。すなわち、リン含有量は8
〜15%とする必要がある。リン含有量が8%未満では
耐食性の効果はなく、通常のニッケルめっきと同じにな
るからであり、リン含有量が15%を越えると耐食性に
優れるが、電着速度が低下し、浴の管理、作業性に難が
あり実用的でなくなるからである。By controlling the phosphorus content of the nickel-phosphorus alloy plating layer to 8% or more, the film forms a passivation film and becomes a film excellent in corrosion resistance. That is, the phosphorus content is 8
It should be -15%. This is because if the phosphorus content is less than 8%, the corrosion resistance is not effective and it is the same as that of ordinary nickel plating. If the phosphorus content exceeds 15%, the corrosion resistance is excellent, but the electrodeposition rate decreases and bath management , Because it is difficult to work and is not practical.
【0015】また、ニッケル−リン合金めっき層の厚さ
は5〜20μmとする必要がある。このめっき層の厚さ
を5μm以上とすることでめっき皮膜に生ずる欠陥を防
ぎ耐食性に優れた皮膜となる。めっき厚さがが5μm未
満であると耐食性が劣化し、、厚さが20μmを越える
とめっきはくもりを生じ装飾目的に適さなくなる。The thickness of the nickel-phosphorus alloy plating layer must be 5 to 20 μm. By setting the thickness of the plating layer to 5 μm or more, defects that occur in the plating film are prevented and the film has excellent corrosion resistance. If the plating thickness is less than 5 μm, the corrosion resistance deteriorates, and if the thickness exceeds 20 μm, the plating becomes cloudy and unsuitable for decorative purposes.
【0016】また、この下地層のニッケル−リン合金め
っきを施す際に、めっき浴に微粒子を分散してめっき
し、この下地層にめっきされるクロムめっき層に意識的
に多数の微小孔を生成させて、局部電池を原因とする腐
食を分散させることにより、めっき層の耐食性をさらに
向上させることができる。When nickel-phosphorus alloy plating is applied to the underlayer, fine particles are dispersed and plated in a plating bath, and a large number of micropores are intentionally formed in the chromium plating layer plated on the underlayer. Thus, by dispersing the corrosion caused by the local battery, the corrosion resistance of the plating layer can be further improved.
【0017】クロムめっきは一般に使用されている装飾
用クロムめっき浴が使用できる。クロムめっきの厚さは
要求される耐擦傷性等により0.05μm以上にする必
要があるが、めっき厚さが3μmを越えると、灰色、コ
ゲ等の外観不良となり、装飾目的には適さない。ニッケ
ル−リン合金めっき皮膜に不働態化膜が形成されるとク
ロムめっきが均一に析出せず、灰色となり装飾目的での
使用は難しくなるので、ニッケル−リン合金めっき後直
ちにクロムめっきをすることが望ましい。For the chrome plating, a commonly used decorative chrome plating bath can be used. The thickness of the chrome plating needs to be 0.05 μm or more depending on the required scratch resistance and the like, but if the plating thickness exceeds 3 μm, the appearance is poor such as gray and kogation, which is not suitable for decorative purposes. If a passivation film is formed on the nickel-phosphorus alloy plating film, the chrome plating will not be evenly deposited and will be gray, making it difficult to use for decorative purposes. desirable.
【0018】本発明は耐食性をニッケル−リン合金めっ
きで確保することとし、クロムめっきで耐擦傷性とクロ
ム色を確保し、耐食性に優れる装飾クロムめっき皮膜を
形成している。なお、ニッケル−リン合金めっきは硬
度、耐摩耗性、磁性、耐薬品性に特徴があり、それぞれ
の特徴を生かしてシリンダ、ドラム製缶材等のめっきに
利用されている。According to the present invention, the corrosion resistance is ensured by nickel-phosphorus alloy plating, and the chromium plating is used to secure the scratch resistance and the chrome color, and the decorative chromium plating film excellent in corrosion resistance is formed. Nickel-phosphorus alloy plating is characterized by hardness, wear resistance, magnetism, and chemical resistance, and is utilized for plating cylinders, drum can-making materials, etc. by making the most of these characteristics.
【0019】[0019]
【作用】従来のめっき方法では予め局部電池を構成し、
起電力を分散して腐食の進行を抑制する腐食分散型の耐
食性めっき皮膜であり、クロムめっきの傷やクラックで
局部電池が作られても、あまり影響がない。腐食は図2
の断面図に示すように、ポーラス部分から電解反応で、
電位の低い光沢ニッケルから溶解が始まるが起電力が小
さいため腐食電流密度も小さく、溶解は遅い。[Function] In the conventional plating method, a local battery is configured in advance,
It is a corrosion-dispersion type corrosion-resistant plating film that disperses electromotive force and suppresses the progress of corrosion. Even if a local battery is formed by scratches or cracks in the chromium plating, it has little effect. Corrosion is Figure 2
As shown in the cross-sectional view of, by the electrolytic reaction from the porous portion,
Dissolution starts from bright nickel with a low potential, but since the electromotive force is small, the corrosion current density is also small and the dissolution is slow.
【0020】本発明におけるめっき方法では、ニッケル
−リン合金めっき皮膜がクロムめっきの傷やクラックで
露出しても、図1の断面図に示すように、ニッケル−リ
ン合金皮膜が局部電池の形成で溶解が始まると同時にリ
ンの凝縮層が作られて不動態化がおこり局部電池の起電
力は消滅し、腐食は停止する。このように、本発明は局
部電池の起電力を分散した腐食分散型ではなく不動態化
による腐食停止型にしためっき方法であり、耐食性は著
しく向上する。According to the plating method of the present invention, even if the nickel-phosphorus alloy plating film is exposed due to scratches or cracks in the chromium plating, the nickel-phosphorus alloy film can form a local battery as shown in the sectional view of FIG. At the same time as the melting starts, a phosphorus condensed layer is formed and passivation occurs, the electromotive force of the local battery disappears, and the corrosion stops. As described above, the present invention is a plating method in which the electromotive force of the local battery is not dispersed by corrosion but by corrosion inhibition by passivation, and the corrosion resistance is significantly improved.
【0021】[0021]
【実施例】本発明の実施例を比較例と対比して説明し、
本発明の効果を明らかにする。 (実施例1)ABS樹脂を素材としこれに無電解ニッケ
ルめっきを施した後、以下の手法で本発明の実施例1と
して電気めっきをした。 酸浸漬 液組成 硫酸 25〜80g/l 浴温度 室温 浸漬 5秒〜1分 水洗EXAMPLES Examples of the present invention will be described in comparison with comparative examples,
The effect of the present invention will be clarified. (Example 1) An ABS resin was used as a raw material, electroless nickel plating was applied thereto, and then electroplating was performed as Example 1 of the present invention by the following method. Acid immersion Liquid composition Sulfuric acid 25-80 g / l Bath temperature Room temperature Immersion 5 seconds to 1 minute Rinse with water
【0022】 銅ストライクめっき 液組成 ピロリン酸銅3水塩 15〜25g/l ピロリン酸カリウム 60〜100g/l シュウ酸カリウム 10〜15g/l P比 11〜13 浴温度 40〜50℃ PH 8〜9 陰極電流密度 1〜5A/dm2 かくはん 空気かくはん 水洗Copper Strike Plating Liquid Composition Copper Pyrophosphate Trihydrate 15-25 g / l Potassium Pyrophosphate 60-100 g / l Potassium Oxalate 10-15 g / l P Ratio 11-13 Bath Temperature 40-50 ° C. PH 8-9 Cathode current density 1-5A / dm 2 Stirring Air stirring Water washing
【0023】 酸浸漬 液組成 硫酸 30〜60g/l 浴温度 室温 浸漬 5秒〜1分Acid immersion Liquid composition Sulfuric acid 30 to 60 g / l Bath temperature Room temperature Immersion 5 seconds to 1 minute
【0024】 銅めっき 液組成 硫酸銅5水塩 150〜200g/l 硫酸 50〜90g/l 塩酸 40〜100g/l 光沢剤(チオ尿素) 3〜7ml/l 光沢剤(デキストリン) 0.5〜1ml/l 浴温度 15〜25℃ 陰極電流密度 1〜5A/dm2 かくはん 空気かくはん 水洗Copper plating solution composition Copper sulfate pentahydrate 150 to 200 g / l Sulfuric acid 50 to 90 g / l Hydrochloric acid 40 to 100 g / l Brightening agent (thiourea) 3 to 7 ml / l Brightening agent (dextrin) 0.5 to 1 ml / L Bath temperature 15 to 25 ° C Cathode current density 1 to 5 A / dm 2 Stirring Air stirring Water washing
【0025】 酸浸漬 液組成 塩酸 5〜10g/l 浴温度 室温 浸漬 30秒〜1分 水洗Acid immersion Liquid composition Hydrochloric acid 5 to 10 g / l Bath temperature Room temperature Immersion 30 seconds to 1 minute Rinsing with water
【0026】 半光沢ニッケルめっき 液組成 硫酸ニッケル6水塩 250〜350g/l 塩化ニッケル6水塩 35〜50g/l ホウ酸 30〜60g/l 光沢剤(5−ナフタレンジスルホン酸ソーダ) 0.1〜0.2g/l 液温度 40〜60℃ PH 3.5〜4.5 陰極電流密度 1〜5A/dm2 かくはん 空気かくはんSemi-bright nickel plating solution composition Nickel sulfate hexahydrate 250 to 350 g / l Nickel chloride hexahydrate 35 to 50 g / l Boric acid 30 to 60 g / l Brightening agent (sodium naphthalenedisulfonate) 0.1 0.2g / l Liquid temperature 40-60 ° C PH 3.5-4.5 Cathode current density 1-5A / dm 2 Stirring Air stirring
【0027】 光沢ニッケルめっき 液組成 硫酸ニッケル6水塩 250〜360g/l 塩化ニッケル6水塩 35〜60g/l ホウ酸 30〜50g/l 光沢剤(5−ナフタレンジスルホン酸ソーダ) 5〜40g/l 光沢剤(2−ブチン−1,4−ヂオール) 0.1〜10g/l 液温度 40〜60℃ PH 3.5〜4.5 陰極電流密度 1〜5A/dm2 かくはん 空気かくはん 水洗Bright Nickel Plating Liquid Composition Nickel Sulfate Hexahydrate 250-360 g / l Nickel Chloride Hexahydrate 35-60 g / l Boric Acid 30-50 g / l Brightening Agent (5-Naphthalenedisulfonate Sodium) 5-40 g / l Brightener (2-butyne-1,4-diol) 0.1 to 10 g / l Liquid temperature 40 to 60 ° C PH 3.5 to 4.5 Cathode current density 1 to 5 A / dm 2 Stirring Air stirring Water washing
【0028】 リン−ニッケル合金めっき 液組成 硫酸ニッケル6水塩 180〜220g/l 塩化ニッケル6水塩 70〜90g/l 添加剤(リン化合物) 200〜250cc/l 浴温度 55〜65℃ PH 0.5〜1.5 陰極電流密度 3〜10A/dm2 かくはん 空気かくはん 水洗Phosphorus-nickel alloy plating solution composition Nickel sulfate hexahydrate 180 to 220 g / l Nickel chloride hexahydrate 70 to 90 g / l Additive (phosphorus compound) 200 to 250 cc / l Bath temperature 55 to 65 ° C. PH 0. 5 to 1.5 Cathode current density 3 to 10 A / dm 2 Stirring Air stirring Water washing
【0029】 クロムめっき 液組成 無水クロム酸 150〜400g/l 硫酸 0.5〜4g/l ケイフッ化塩 0.5〜10g/l 浴温度 35〜55℃ 陰極電流密度 5〜25A/dm2 水洗 得られためっき皮膜は標準的な二層めっきであり、従来
のものと比べ外観は同等以上であった。Chromium plating solution composition Chromic anhydride 150 to 400 g / l Sulfuric acid 0.5 to 4 g / l Fluorosilicate 0.5 to 10 g / l Bath temperature 35 to 55 ° C. Cathode current density 5 to 25 A / dm 2 Washing with water The obtained plating film was a standard two-layer plating, and the appearance was equivalent to or better than the conventional one.
【0030】(実施例2)ABS樹脂を素材としこれに
無電解ニッケルめっきを施した後、実施例1の工程を
省いたもので、本発明の実施例2として電気めっきをし
た。本実施例は半光沢ニッケルめっきを省略したもので
あるが、めっき皮膜の外観は従来のものと同等であっ
た。Example 2 An ABS resin was used as a raw material, electroless nickel plating was applied thereto, and then the steps of Example 1 were omitted, and electroplating was performed as Example 2 of the present invention. In this example, the semi-bright nickel plating was omitted, but the appearance of the plating film was the same as the conventional one.
【0031】(実施例3)鉄材を素材とし実施例1の工
程〜で、本発明の実施例3として電気めっきをし
た。この実施例は鉄材を素材とするものであるが、めっ
き皮膜の外観は従来のものと比較して遜色なかった。(Embodiment 3) Using an iron material as a raw material, electroplating was carried out as a third embodiment of the present invention in the steps 1 to 3. In this example, an iron material was used as the raw material, but the appearance of the plating film was comparable to that of the conventional one.
【0032】(実施例4)ABS樹脂を素材としこれに
無電解ニッケルめっきを施した後、実施例1と同様のの
工程〜を用いて、本発明の実施例4として電気めっ
きをした。但し、工程の液組成に以下に示すように無
機微粒子をいれてめっきをした。 ’リン−ニッケル合金めっき 液組成 硫酸ニッケル6水塩 180〜220g/l 塩化ニッケル6水塩 70〜90g/l 酸化アルミニウム 10〜15g/l 添加剤(リン化合物) 200〜250cc/l 浴温度 55〜65℃ PH 0.5〜1.5 陰極電流密度 3〜10A/dm2 かくはん 空気かくはん 水洗 本実施例はめっき浴に微粒子を分散してめっきし、この
下地層にめっきされるクロムめっき層に意識的に多数の
微小孔を生成させて、さらに耐食性を向上させたもので
あるが、得られためっき皮膜は少し光沢が落ちるが問題
ない範囲であった。Example 4 An ABS resin was used as a raw material, electroless nickel plating was applied thereto, and then electroplating was performed as Example 4 of the present invention by using the same steps as in Example 1. However, plating was performed by adding inorganic fine particles to the liquid composition of the process as shown below. 'Phosphorus-nickel alloy plating solution composition Nickel sulfate hexahydrate 180-220 g / l Nickel chloride hexahydrate 70-90 g / l Aluminum oxide 10-15 g / l Additive (phosphorus compound) 200-250 cc / l Bath temperature 55-55 65 ° C. PH 0.5 to 1.5 Cathode current density 3 to 10 A / dm 2 Stirring Air stirring Washing with water In this example, fine particles are dispersed in a plating bath for plating, and the chromium plating layer plated on this underlayer is conscious. Although a large number of micropores were generated to further improve the corrosion resistance, the obtained plated film had a slight loss of gloss, but it was within the range.
【0033】(実施例5)実施例2の工程の後に下記
のニッケルめっきを施し,その上にクロムめっきをし
た。 液組成 硫酸ニッケル6水塩 250〜360g/l 塩化ニッケル6水塩 35〜60g/l ホウ酸 30〜50g/l 無機質微粒子 15〜20g/l 光沢剤(2−ブチン−1,4ヂオール) 0.1〜10g/l 浴温度 40〜60℃ PH 3.5〜4.5 陰極電流密度 1〜5A/dm2 本実施例はめっき浴に微粒子を分散してめっきし、この
下地層にめっきされるクロムめっき層に意識的に多数の
微小孔を生成させて、さらに耐食性を向上させたもので
あるが、得られためっき膜は少し光沢が落ちるが問題な
い範囲であった。Example 5 After the steps of Example 2, the following nickel plating was applied, and then chromium plating was applied thereon. Liquid composition nickel sulfate hexahydrate 250 to 360 g / l nickel chloride hexahydrate 35 to 60 g / l boric acid 30 to 50 g / l inorganic fine particles 15 to 20 g / l brightener (2-butyne-1,4 diol) 0. 1 to 10 g / l Bath temperature 40 to 60 ° C. PH 3.5 to 4.5 Cathode current density 1 to 5 A / dm 2 In this example, fine particles are dispersed and plated in a plating bath, and this underlayer is plated. The chrome plating layer was intentionally formed with a large number of micropores to further improve the corrosion resistance, but the obtained plating film had a slight loss of gloss, but it was within the range.
【0034】(耐食性評価)実施例1および実施例3に
より、銅めっき、半光沢ニッケルめっき、光沢ニッケル
めっき、ニッケル−リン合金めっき、クロムめっきの各
膜厚を表1に示す膜厚としてめっきした。なお、ニッケ
ル−リン合金めっきの膜厚はいずれも5μmとしたが、
比較例は下地層を実施例1と同一にしてニッケル−リン
合金めっき層を2μmとした。得られためっき皮膜につ
き、日本工業規格JISD0201「自動車部品の電気
めっき通則」付属書1コロードコート試験、付属書2キ
ャス試験に従い、耐食性を評価した。比較のために従来
例として特公昭56−15471号公報明細書の実施例
3の(d)に従ってめっきした試料についても同様の方
法で耐食性を評価した。なお、この従来例ではニッケル
−リン合金めっきは微粒子分散ニッケルめっきとした。
得られた評価の結果はレイテングナンバーとして表1に
まとめて示した。(Evaluation of Corrosion Resistance) According to Examples 1 and 3, copper plating, semi-bright nickel plating, bright nickel plating, nickel-phosphorus alloy plating, and chrome plating were plated as the film thicknesses shown in Table 1. . The thickness of the nickel-phosphorus alloy plating was 5 μm in all cases,
In the comparative example, the underlayer was the same as in Example 1 and the nickel-phosphorus alloy plating layer was 2 μm. Corrosion resistance of the obtained plating film was evaluated according to Japanese Industrial Standard JIS D0201 "General rules for electroplating of automobile parts", Annex 1, Corrode coat test, and Annex 2, Cass test. For comparison, as a conventional example, a sample plated according to Example 3 (d) of Japanese Patent Publication No. 56-15471 was evaluated for corrosion resistance by the same method. In this conventional example, the nickel-phosphorus alloy plating was fine particle dispersed nickel plating.
The obtained evaluation results are summarized in Table 1 as a latency number.
【0035】[0035]
【表1】 [Table 1]
【0036】なお、表1において、 Cu : 銅めっき SNi : 半光沢ニッケルめっき BNi : 光沢ニッケルめっき 合金 : ニッケル−リン合金めっき(従来例では微
粒子分散ニッケルめっき) Cr : クロムめっき である。また、コロードコート試験は3サイクル、キャ
ス試験は200時間行ったものである。In Table 1, Cu: copper plating SNi: semi-bright nickel plating BNi: bright nickel plating alloy: nickel-phosphorus alloy plating (fine particle dispersed nickel plating in the conventional example) Cr: chromium plating. The corrode coat test was conducted for 3 cycles and the cast test was conducted for 200 hours.
【0037】表1に示したように、比較例はニッケル−
リン合金めっき層の膜厚が2μmと薄かったため、コロ
ードコート試験のレイテングナンバが6.0、キャス試
験のレイテングナンバが6.5であって、耐食性に劣っ
た。また、従来例はコロードコート試験のレイテングナ
ンバが8.0で高い値を示したが、キャス試験のレイテ
ングナンバが6以下であって耐食性に劣った。As shown in Table 1, the comparative example is nickel-
Since the thickness of the phosphorus alloy plating layer was as thin as 2 μm, the latency number in the corrode coat test was 6.0 and the latency number in the cass test was 6.5, and the corrosion resistance was poor. In the conventional example, the latency number in the corrode coat test was 8.0, which was a high value, but the latency number in the cass test was 6 or less, and the corrosion resistance was poor.
【0038】これに対して本発明の実施例1および実施
例3は、ニッケル−リン合金めっき層の膜厚が5μmで
あったので、充分な耐食性を有し、ニッケル−リン合金
めっき層の不動態化により、コロードコート試験のレイ
テングナンバが9.0および8.0、キャス試験のレイ
テングナンバが9.8および8.0であって、本発明の
効果を確認することができた。On the other hand, in Examples 1 and 3 of the present invention, since the nickel-phosphorus alloy plating layer had a thickness of 5 μm, it had sufficient corrosion resistance and no nickel-phosphorus alloy plating layer was formed. By mobilization, the latency numbers of the corrode coat test were 9.0 and 8.0, and the latency numbers of the cass test were 9.8 and 8.0, confirming the effect of the present invention. .
【0039】次に、実施例1に示しためっき工程に従
い、表1に示した膜厚で、ニッケル−リン合金めっき層
のリン含有量を0〜25%の間で変化させて、めっき皮
膜を形成した。形成されためっき皮膜の耐食性および電
着速度を評価したところ図3に示すような結果を得た。
なお、耐食性の評価の基準は○、△、×で示し、○は外
観変化なし(レイテングナンバ9.8〜10)、△は外
観変化はしているもののそれほど気にならない(レイテ
ングナンバ8〜9.0)、×は外観見栄え品質上問題で
あると感じる(レイテングナンバ5以下)である。Next, according to the plating process shown in Example 1, the phosphorus content of the nickel-phosphorus alloy plating layer was varied between 0 and 25% with the film thickness shown in Table 1 to form a plating film. Formed. When the corrosion resistance and the electrodeposition rate of the formed plating film were evaluated, the results shown in FIG. 3 were obtained.
The evaluation criteria of corrosion resistance are indicated by ○, △, ×, ○ indicates no change in appearance (latency number 9.8 to 10), and △ indicates change in appearance but not so noticeable (latency number 8 ~ 9.0), x is a problem in appearance and quality (latency number 5 or less).
【0040】図3に示したように、ニッケル−リン合金
めっき層のリン含有量が8%未満になると耐食性が急激
に劣化することが判明した。また、ニッケル−リン合金
めっき層のリン含有量が15%を越えると、電着速度が
急激に低下することが判明した。その結果、ニッケル−
リン合金めっき層のリン含有量を8〜15%とすること
により最良の結果が得られることが確認された。As shown in FIG. 3, it was found that when the phosphorus content of the nickel-phosphorus alloy plating layer was less than 8%, the corrosion resistance deteriorated sharply. It was also found that when the phosphorus content of the nickel-phosphorus alloy plating layer exceeds 15%, the electrodeposition rate sharply decreases. As a result, nickel
It was confirmed that the best results were obtained by setting the phosphorus content of the phosphorus alloy plating layer to 8 to 15%.
【0041】続いて、実施例1に示しためっき工程に従
い、表1に示した膜厚で、ニッケル−リン合金めっき層
の膜厚を0〜25μmの間で変化させて、めっき皮膜を
形成した。形成されためっき皮膜の耐食性および外観を
評価したところ図4に示すような結果を得た。Then, according to the plating process shown in Example 1, the film thickness of the nickel-phosphorus alloy plating layer was changed from 0 to 25 μm to form a plating film with the film thickness shown in Table 1. . When the corrosion resistance and appearance of the formed plating film were evaluated, the results shown in FIG. 4 were obtained.
【0042】図4に示したように、ニッケル−リン合金
めっき層の膜厚が5μm未満になると耐食性が急激に劣
化し、膜厚が20μmを越えると外観が悪くなることが
判明し、ニッケル−リン合金めっき層の膜厚を5〜20
μmとすることにより最良の結果が得られることが確認
された。As shown in FIG. 4, it was found that when the thickness of the nickel-phosphorus alloy plated layer was less than 5 μm, the corrosion resistance deteriorated sharply, and when the thickness exceeded 20 μm, the appearance deteriorated. The thickness of the phosphorus alloy plating layer is 5 to 20
It was confirmed that the best result was obtained by setting the thickness to μm.
【0043】[0043]
【発明の効果】本発明の耐食クロムめっきは以上詳述し
たように、リンを8〜15重量%含有したニッケル−リ
ン合金を下地層として5〜20μmめっきした後、クロ
ムめっきを施したことを特徴とするものであって、ニッ
ケル−リン合金めっき皮膜がクロムめっきの傷やクラッ
クで露出しても、ニッケル−リン合金皮膜が局部電池の
形成で溶解が始まると同時にリンの凝縮層が作られて不
動態化がおこり局部電池の起電力は消滅し、腐食は停止
するので、耐食性を著しく向上させることができた。As described above in detail, the corrosion-resistant chromium plating of the present invention is performed by plating the nickel-phosphorus alloy containing 8 to 15% by weight of phosphorus as an underlayer for 5 to 20 μm and then performing the chromium plating. The feature is that even if the nickel-phosphorus alloy plating film is exposed due to scratches or cracks in the chromium plating, the nickel-phosphorus alloy film begins to dissolve in the formation of the local battery and at the same time a phosphorus condensation layer is formed. Since the passivation occurs, the electromotive force of the local battery disappears and the corrosion stops, so the corrosion resistance could be significantly improved.
【図1】本発明のクロムめっき皮膜における腐食機構を
示す説明図である。FIG. 1 is an explanatory view showing a corrosion mechanism in a chromium plating film of the present invention.
【図2】従来のクロムめっき皮膜における腐食機構を示
す説明図である。FIG. 2 is an explanatory view showing a corrosion mechanism in a conventional chromium plating film.
【図3】ニッケル−リン合金皮膜のリン含有量と耐食性
および電着速度の関係を示す線図である。FIG. 3 is a diagram showing the relationship between the phosphorus content of a nickel-phosphorus alloy coating and the corrosion resistance and electrodeposition rate.
【図4】ニッケル−リン合金皮膜の膜厚と耐食性および
外観の関係を示す線図である。FIG. 4 is a diagram showing a relationship between a film thickness of a nickel-phosphorus alloy film and corrosion resistance and appearance.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 土田 昭人 神奈川県横須賀市長沢1487 (72)発明者 鈴木 滋 神奈川県横須賀市二葉町2−19 ─────────────────────────────────────────────────── --- Continuation of the front page (72) Inventor Akito Tsuchida 1487 Nagasawa, Yokosuka City, Kanagawa Prefecture (72) Inventor Shigeru Suzuki 2-19 Futabacho, Yokosuka City, Kanagawa Prefecture
Claims (2)
−リン合金を下地層として5〜20μmめっきした後、
クロムめっきを施したことを特徴とする耐食性クロムめ
っき。1. A nickel-phosphorus alloy containing 8 to 15% by weight of phosphorus is plated as a base layer for 5 to 20 μm,
Corrosion-resistant chrome plating characterized by being plated with chrome.
半光沢ニッケルめっき、光沢ニッケルめっきを順次形成
したことを特徴とする請求項1に記載の耐食性クロムめ
っき。2. The corrosion resistant chromium plating according to claim 1, wherein a semi-bright nickel plating and a bright nickel plating are sequentially formed as a lower layer of the nickel-phosphorus plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2666793A JPH06240490A (en) | 1993-02-16 | 1993-02-16 | Corrosion resistant chromium plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2666793A JPH06240490A (en) | 1993-02-16 | 1993-02-16 | Corrosion resistant chromium plating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06240490A true JPH06240490A (en) | 1994-08-30 |
Family
ID=12199760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2666793A Pending JPH06240490A (en) | 1993-02-16 | 1993-02-16 | Corrosion resistant chromium plating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06240490A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07278845A (en) * | 1994-04-14 | 1995-10-24 | Marui Kogyo Kk | Chromium-plated product and its production |
JPH08100273A (en) * | 1995-07-12 | 1996-04-16 | Marui Kogyo Kk | Production of chromium-plated product |
JP2007039772A (en) * | 2005-08-05 | 2007-02-15 | Kakihara Kogyo Kk | Method for forming copper-free plated film on resin |
WO2017051001A1 (en) * | 2015-09-25 | 2017-03-30 | Enthone Gmbh | Multicorrosion protection system for decorative parts with chrome finish |
JP2017107732A (en) * | 2015-12-09 | 2017-06-15 | 日本特殊陶業株式会社 | Ceramic heater, gas sensor and method of manufacturing ceramic heater |
-
1993
- 1993-02-16 JP JP2666793A patent/JPH06240490A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07278845A (en) * | 1994-04-14 | 1995-10-24 | Marui Kogyo Kk | Chromium-plated product and its production |
JPH08100273A (en) * | 1995-07-12 | 1996-04-16 | Marui Kogyo Kk | Production of chromium-plated product |
JP2007039772A (en) * | 2005-08-05 | 2007-02-15 | Kakihara Kogyo Kk | Method for forming copper-free plated film on resin |
JP4494310B2 (en) * | 2005-08-05 | 2010-06-30 | 柿原工業株式会社 | Film formation method for copper-free resin plating |
WO2017051001A1 (en) * | 2015-09-25 | 2017-03-30 | Enthone Gmbh | Multicorrosion protection system for decorative parts with chrome finish |
EP3147389B1 (en) * | 2015-09-25 | 2019-04-17 | MacDermid Enthone GmbH | Multicorrosion protection system for decorative parts with chrome finish |
US10865495B2 (en) | 2015-09-25 | 2020-12-15 | Macdermid Enthone Gmbh | Multicorrosion protection system for decorative parts with chrome finish |
US11566338B2 (en) | 2015-09-25 | 2023-01-31 | Macdermid Enthone Gmbh | Multicorrosion protection system for decorative parts with chrome finish |
JP2017107732A (en) * | 2015-12-09 | 2017-06-15 | 日本特殊陶業株式会社 | Ceramic heater, gas sensor and method of manufacturing ceramic heater |
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