JPH06239963A - Epoxy resin composition for laminate - Google Patents

Epoxy resin composition for laminate

Info

Publication number
JPH06239963A
JPH06239963A JP5028826A JP2882693A JPH06239963A JP H06239963 A JPH06239963 A JP H06239963A JP 5028826 A JP5028826 A JP 5028826A JP 2882693 A JP2882693 A JP 2882693A JP H06239963 A JPH06239963 A JP H06239963A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
reaction
bisphenol
carried out
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5028826A
Other languages
Japanese (ja)
Inventor
Kiyomi Yasuda
田 清 美 安
Hideo Nakamura
村 英 夫 中
Terufumi Suzuki
木 照 文 鈴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Petrochemical Industries Ltd
Original Assignee
Mitsui Petrochemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Petrochemical Industries Ltd filed Critical Mitsui Petrochemical Industries Ltd
Priority to JP5028826A priority Critical patent/JPH06239963A/en
Priority to MYPI9400355 priority patent/MY131546A/en
Priority to GB9403012A priority patent/GB2275682B/en
Priority to TW83101274A priority patent/TW307779B/zh
Priority to SG1996001462A priority patent/SG64861A1/en
Priority to CN94103299A priority patent/CN1037972C/en
Publication of JPH06239963A publication Critical patent/JPH06239963A/en
Priority to CN 97117195 priority patent/CN1176262A/en
Priority to CN 97117197 priority patent/CN1219546A/en
Pending legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Epoxy Resins (AREA)

Abstract

PURPOSE:To obtain the subject composition prepared by using an epoxy resin synthesized according to a specified method, excellent in ability for impregnating glass cloth, etc., and capable of forming a cured material excellent in heat resistance, blister resistance, etc., and suitable for a copper-clad epoxy laminate. CONSTITUTION:This resin composition is obtained by reacting a mixture of (A) a bisphenol (preferably bisphenol A) and (B) novolak resin with (C) a (methyl)epihalohydrin (preferably epichlorohydrin, etc.) and subsequently further reacting the resultant glycidyl etherified epoxy resin with (D) a halogenated bisphenol (preferably tetrabromobisphenol A, etc.). In addition, the reaction of the components (A) and (B) with the component (C) is carried out preferably by allowing an etherification reaction and a dehydrohalogenation reaction to take place in order. The etherification reaction is carried out generally in an inert atmosphere at 60 to 110 deg.C and the dehydrohalogenation reaction is carried out at 60 to 90 deg.C under 100 to 300mmHg for 1 to 6 hr in general.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は特にガラスクロスなどへ
の含浸性が良好でかつ、耐熱性、耐ブリスター性に優れ
た硬化物を与えることができ、このためプリント配線板
用途、多層プリント配線板用の銅張エポキシ樹脂板の製
造に好ましく使用されるエポキシ樹脂組成物に関する。
INDUSTRIAL APPLICABILITY The present invention can provide a cured product having particularly good impregnating ability for glass cloth and the like and excellent heat resistance and blister resistance. Therefore, it can be used for printed wiring boards and multilayer printed wiring. The present invention relates to an epoxy resin composition preferably used for producing a copper-clad epoxy resin plate for a plate.

【0002】[0002]

【従来の技術】近年、電子機器の種類は大きな広がりを
見せ、コンピュータ関連ばかりでなく、自動制御機器、
通信機器、事務用機器、ゲーム機器などもその機能向
上、小型化のため、多層プリント配線板の利用が増加す
るようになってきた。
2. Description of the Related Art In recent years, the variety of electronic devices has expanded greatly, and not only computer-related devices but also automatic control devices,
The use of multilayer printed wiring boards has come to increase due to improvements in functions and miniaturization of communication equipment, office equipment, game equipment and the like.

【0003】一方、コンピュータ分野では、ダウンサイ
ジングといわれるようにシステムの構成に変化が生じ、
ワークステーションを中心とした分散システムが台頭し
てきている。これらの機器に使用するプリント配線板は
高多層化の方向でなく、4〜10層が中心である。この
場合に用いるプリント配線板は、高密度実装化を図るた
めにファイパターンに加え、板厚の薄形化も検討されて
いる。これらのプリント配線板への要求に対応するため
には配線板に用いる基材の耐熱性、耐ブリスター性の一
層の向上が望まれている。
On the other hand, in the computer field, there is a change in the system configuration, which is called downsizing,
Distributed systems centering on workstations are emerging. The printed wiring boards used for these devices are mainly oriented to 4 to 10 layers, not in the direction of increasing the number of layers. The printed wiring board used in this case is being studied for thinning in addition to the phi pattern in order to achieve high-density mounting. In order to meet the demands on these printed wiring boards, further improvement in heat resistance and blister resistance of the base material used for the wiring boards is desired.

【0004】エポキシ樹脂硬化物の耐熱性向上のため
に、使用するエポキシ樹脂にフェノールノボラック型エ
ポキシ樹脂等の多官能エポキシ樹脂を添加することが行
なわれているが、これらの多官能エポキシ樹脂を添加す
るだけでは、耐熱性は充分といえなくなった。耐熱性の
向上のため、多官能エポキシ樹脂の添加量を増やした場
合、得られる組成物が固くてもろくなるために、これら
を用いて得た積層板を煮沸処理後に半田接合で処理する
と、ブリスターと呼ばれる層間剥離が発生することが多
くなる。
In order to improve the heat resistance of a cured epoxy resin product, it has been practiced to add a polyfunctional epoxy resin such as a phenol novolac type epoxy resin to the epoxy resin to be used, but these polyfunctional epoxy resins are added. Just by doing, the heat resistance was no longer sufficient. In order to improve heat resistance, when the amount of polyfunctional epoxy resin added is increased, the resulting composition becomes hard and brittle, so if the laminate obtained using these is treated by soldering after boiling, blister Delamination, which is referred to as, often occurs.

【0005】[0005]

【発明が解決しようとする課題】本発明はプリント配線
板、特に多層板に使用される銅張エポキシ樹脂積層板な
どの製造に適する、ガラスクロス等への含浸性が良好
で、かつ耐熱性、耐ブリスター性、銅箔との密着性に優
れた硬化物を与えるエポキシ樹脂組成物を提供しようと
するものである。
The present invention is suitable for the production of printed wiring boards, particularly copper-clad epoxy resin laminates used for multilayer boards, and has good impregnability into glass cloth and heat resistance, It is intended to provide an epoxy resin composition which gives a cured product having excellent blister resistance and adhesion to a copper foil.

【0006】[0006]

【課題を解決するための手段】本発明者等は、上述の問
題を解決するため種々研究を重ね、特定のエポキシ樹脂
を用いた組成物においてその目的に到達できることがわ
かった。即ち本発明のエポキシ樹脂組成物は、エポキシ
樹脂、硬化剤、硬化促進剤および溶剤からなる組成物に
おいて、エポキシ樹脂が、ビスフェノール類(I)とノ
ボラック樹脂(II)の混合物をエピハロヒドリンまた
はメチルエピハロヒドリンと付加反応および閉環反応さ
せてグリシジルエーテル化してなるエポキシ樹脂をハロ
ゲン化ビスフェノール類(III)とオニウム塩または
塩基触媒で反応させて得られるエポキシ樹脂組成物であ
る。
The inventors of the present invention have conducted various studies to solve the above-mentioned problems and found that a composition using a specific epoxy resin can achieve its purpose. That is, the epoxy resin composition of the present invention is a composition comprising an epoxy resin, a curing agent, a curing accelerator and a solvent, wherein the epoxy resin is a mixture of a bisphenol (I) and a novolak resin (II) with epihalohydrin or methylepihalohydrin. An epoxy resin composition obtained by reacting an epoxy resin obtained by addition reaction and ring-closing reaction to form a glycidyl ether with halogenated bisphenols (III) with an onium salt or a base catalyst.

【0007】本発明におけるエポキシ樹脂の原料である
ビスフェノール類(I)は、下記一般式で示されるビス
フェノール類であり、ビスフェノールA、ビスフェノー
ルF、ビスフェノールADが例示される。
The bisphenols (I) used as the raw material of the epoxy resin in the present invention are bisphenols represented by the following general formula, and include bisphenol A, bisphenol F and bisphenol AD.

【化1】 R′:炭素数1〜5以下の炭化水素基または水素原子 n:0〜4の整数[Chemical 1] R ': a hydrocarbon group or hydrogen atom having 1 to 5 carbon atoms n: an integer of 0 to 4

【0008】ここでRがイソプロピリデン基で、R′が
水素原子であるビスフェノールAの使用が好ましい。
It is preferable to use bisphenol A in which R is an isopropylidene group and R'is a hydrogen atom.

【0009】本発明に用いるノボラック樹脂(II)
は、ホルムアルデヒドと前述のビスフェノール類または
下記一般式で示されるフェノール類との縮合物である。
本発明のノボラック樹脂の軟化点は、110℃以下が好
ましい。さらに好ましくは30℃〜100℃の範囲であ
る。その軟化点が30℃未満のものは硬化物の耐熱性が
十分でなく、110℃超になると高分子量が多くなり、
ハロゲン化ビスフェノール類(III)との反応におい
て高分子化反応がおこりガラスクロスへの含浸性が悪く
なる。また、数平均分子量は、好ましくは、1000〜
300、より好ましくは600〜300、さらに好まし
くは600〜350であり、好ましくは分散度が2以
下、より好ましくは1.1〜1.8である。ここで、分
散度は、重量平均分子量/数平均分子量(Mw/Mn)
を意味する。
Novolak resin (II) used in the present invention
Is a condensate of formaldehyde and the above-mentioned bisphenols or phenols represented by the following general formula.
The softening point of the novolak resin of the present invention is preferably 110 ° C. or lower. More preferably, it is in the range of 30 ° C to 100 ° C. If the softening point is less than 30 ° C, the heat resistance of the cured product is insufficient, and if it exceeds 110 ° C, the high molecular weight increases,
In the reaction with halogenated bisphenols (III), a polymerizing reaction occurs and the impregnability into glass cloth deteriorates. The number average molecular weight is preferably 1000 to
300, more preferably 600 to 300, further preferably 600 to 350, preferably 2 or less, and more preferably 1.1 to 1.8. Here, the dispersity is the weight average molecular weight / number average molecular weight (Mw / Mn)
Means

【化2】 [Chemical 2]

【0010】R1 、R2 は水素原子または炭素数1〜1
0以下の炭化水素基である。ホルムアルデヒドと縮合さ
れるフェノール類は、フェノール、O−クレゾール、パ
ラ−t−オクチルフェノール、P−クレゾールが好まし
い。
R 1 and R 2 are hydrogen atoms or have 1 to 1 carbon atoms.
It is a hydrocarbon group of 0 or less. The phenols condensed with formaldehyde are preferably phenol, O-cresol, para-t-octylphenol and P-cresol.

【0011】同様にホルムアルデヒドと縮合されるビス
フェノール類は先に一般式で述べている。この場合は、
ビスフェノールA、ビスフェノールADが好ましい。
Bisphenols, which are likewise condensed with formaldehyde, have been mentioned above in the general formula. in this case,
Bisphenol A and bisphenol AD are preferred.

【0012】ノボラック樹脂(II)中の官能基数が2
以上の多核体成分の、グリシジル化反応前の全フェノー
ル類成分中に占める割合は、好ましくは3〜50重量
%、より好ましくは5〜40重量%である。多核体の含
有率が3重量%未満になると、エポキシ樹脂組成物の硬
化物のガラス転移温度を高める効果が悪くなり、また5
0重量%を超えると、ハロゲン化ビスフェノール類(I
II)との反応において高分子化反応がおこり、ガラス
クロスへの含浸性が悪くなる。
The number of functional groups in the novolak resin (II) is 2
The proportion of the above polynuclear component in the total phenolic components before the glycidylation reaction is preferably 3 to 50% by weight, more preferably 5 to 40% by weight. When the content of the polynuclear body is less than 3% by weight, the effect of increasing the glass transition temperature of the cured product of the epoxy resin composition is deteriorated.
If it exceeds 0% by weight, halogenated bisphenols (I
In the reaction with II), a polymerizing reaction occurs and the impregnation property into the glass cloth deteriorates.

【0013】(グリシジル化工程)成分(I)、(I
I)とエピハロヒドリンまたはメチルエピハロヒドリン
との反応は、従来公知の反応にならって種々の方法で行
なうことができる。しかし、エーテル化工程と脱ハロゲ
ン化水素工程とを順次行なう方が安定した品質のグリシ
ジルエーテル化されたエポキシ樹脂(B)を得ることが
できるので好ましい。エピハロヒドリンまたはメチルエ
ピハロヒドリンとしては、エピクロルヒドリンまたは2
−メチルエピクロルヒドリンが好ましい。
(Glycidylation Step) Components (I), (I
The reaction of I) with epihalohydrin or methylepihalohydrin can be carried out by various methods following the conventionally known reaction. However, it is preferable to sequentially perform the etherification step and the dehydrohalogenation step because a stable glycidyl etherified epoxy resin (B) can be obtained. As epihalohydrin or methyl epihalohydrin, epichlorohydrin or 2
-Methylepichlorohydrin is preferred.

【0014】エーテル化工程は成分(I)、(II)の
混合物中のフェノール性水酸基1当量に対して、0.1
〜5モル%のエーテル化触媒、例えばトリメチルアミ
ン、トリエチルアミンなどの3級アミン、トリフェニル
ホスフィン、トリブチルホスフィンなどの3級ホスフィ
ン、テトラメチルアンモニウムクロライド、テトラエチ
ルベンジルアンモニウムクロリド、テトラメチルアンモ
ニウムブロマイド、塩化コリン等の第4級アンモニウム
塩、テトラメチルホスホニウムブロマイド、テトラフェ
ニルホスホニウムブロマイドなどの第4級ホスホニウム
塩、および水酸化ナトリウム、水酸化カリウム等の無機
塩基の存在で反応が行なわれる。
The etherification step is carried out by adding 0.1 to 1 equivalent of the phenolic hydroxyl group in the mixture of the components (I) and (II).
To 5 mol% of an etherification catalyst, for example, tertiary amines such as trimethylamine and triethylamine, tertiary phosphines such as triphenylphosphine and tributylphosphine, tetramethylammonium chloride, tetraethylbenzylammonium chloride, tetramethylammonium bromide, choline chloride and the like. The reaction is carried out in the presence of a quaternary ammonium salt, a quaternary phosphonium salt such as tetramethylphosphonium bromide and tetraphenylphosphonium bromide, and an inorganic base such as sodium hydroxide and potassium hydroxide.

【0015】このエーテル化工程では、フェノール性水
酸基の少なくとも約50モル%以上、好ましくは70モ
ル%以上がエーテル化されるまで反応が行なわれる。こ
の反応は一般に60〜110℃の温度で不活性雰囲気
下、1〜12時間行なわれる。この際の系内水分は3.
0wt%以下が好ましい。
In this etherification step, the reaction is carried out until at least about 50 mol%, preferably 70 mol% or more of the phenolic hydroxyl group is etherified. This reaction is generally carried out at a temperature of 60 to 110 ° C. under an inert atmosphere for 1 to 12 hours. The water content in the system at this time was 3.
It is preferably 0 wt% or less.

【0016】脱ハロゲン化水素工程は、反応混合物を共
沸しながら減圧下に脱塩化水素を進行させるが、60℃
〜90℃の範囲で、100mmHg〜500mmHgの
減圧下で、1〜6時間程度行なわれる。通常、残存加水
分解可能塩素量が0.5〜2.0wt%で反応を終了さ
せる。ビスフェノール類とノボラック樹脂の重量比は、
1〜95/99〜5、好ましくは5〜95/95〜5、
より好ましくは10〜90/90〜10とするのがよ
い。ノボラック成分が多すぎると高分子量体の生成が著
しく、プリプレグ作成時にクロスへの含浸性が悪くな
り、積層板とした時に耐熱衝撃性が悪くなる。ノボラッ
ク成分が少ないと十分な耐熱性を得ることができない。
In the dehydrohalogenation step, dehydrochlorination is carried out under reduced pressure while azeotropically boiling the reaction mixture.
It is carried out under a reduced pressure of 100 mmHg to 500 mmHg in the range of ˜90 ° C. for about 1 to 6 hours. Usually, the reaction is terminated when the amount of residual hydrolyzable chlorine is 0.5 to 2.0 wt%. The weight ratio of bisphenols and novolac resin is
1-95 / 99-5, preferably 5-95 / 95-5,
More preferably, it is 10 to 90/90 to 10. When the amount of the novolac component is too large, a high molecular weight product is remarkably produced, impregnating ability of the cloth with the prepreg is deteriorated, and thermal shock resistance is deteriorated when the laminated plate is formed. If the novolac component is small, sufficient heat resistance cannot be obtained.

【0017】上述の反応で得られるグリシジルエーテル
化エポキシ樹脂(B)は、軟化点50℃以下、エポキシ
当量170〜220、ハロゲン化物含有量0.1重量%
以下である。
The glycidyl etherified epoxy resin (B) obtained by the above reaction has a softening point of 50 ° C. or lower, an epoxy equivalent of 170 to 220 and a halide content of 0.1% by weight.
It is the following.

【0018】得られたグリシジルエーテル化エポキシ樹
脂(B)と、ハロゲン化ビスフェノール類(III)と
の重付加反応は、120℃〜170℃、4〜15時間、
不活性雰囲気下で行なわれる。触媒を用いる場合は、第
4級アンモニウム塩、第4級スルホニウム塩等を用い
る。その触媒量は、10〜300ppmがよい。溶媒を
用いる場合は、トルエン、キシレン、シクロヘキサノン
等を用いる。その時の固型分は30重量%以下がよい。
The polyaddition reaction between the obtained glycidyl etherified epoxy resin (B) and the halogenated bisphenol (III) is carried out at 120 ° C. to 170 ° C. for 4 to 15 hours.
It is performed under an inert atmosphere. When using a catalyst, a quaternary ammonium salt, a quaternary sulfonium salt, or the like is used. The catalyst amount is preferably 10 to 300 ppm. When a solvent is used, toluene, xylene, cyclohexanone or the like is used. The solid content at that time is preferably 30% by weight or less.

【0019】この重付加反応に用いるハロゲン化ビスフ
ェノール類(III)は、ブロム化ビスフェノール類が
好ましく、特に、テトラブロムビスフェノールA、テト
ラブロムビスフェノールF、1,1−ビス(3,5−ジ
ブロム−4−ヒドロキシフェニル)エタンが好ましい。
The halogenated bisphenols (III) used in this polyaddition reaction are preferably brominated bisphenols, particularly tetrabromobisphenol A, tetrabromobisphenol F, 1,1-bis (3,5-dibromo-4). -Hydroxyphenyl) ethane is preferred.

【0020】グリシジルエーテル化エポキシ樹脂(B)
と、ハロゲン化ビスフェノール類との割合は、74:2
6〜55:45の比率で反応させるとよい。ハロゲン化
ビスフェノール類が多いと高分子量体の生成が著しく、
プリプレグ作成時のクロスへの含浸性が悪くなる。ハロ
ゲン化ビスフェノール類が少ないと十分な難燃性を有す
ることができなくなる。
Glycidyl etherified epoxy resin (B)
And the ratio of halogenated bisphenols are 74: 2
It is advisable to react at a ratio of 6 to 55:45. When the amount of halogenated bisphenols is large, the formation of high molecular weight compounds is remarkable,
Impregnating ability of the cloth when making the prepreg deteriorates. When the amount of halogenated bisphenols is small, it becomes impossible to have sufficient flame retardancy.

【0021】重付加反応には、上記の必須成分以外に、
汎用のエポキシ樹脂およびまたはハロゲン化ビスフェノ
ール類のエポキシ化物が共存していてもよい。また、ハ
ロゲン化ビスフェノール類のエポキシ化物は、前述のハ
ロゲン化ビスフェノール類(III)をエピハロヒドリ
ンまたはメチルエピハロヒドリンでグリシジルエーテル
化して得られるが、これを共存させる場合は、全量に対
して0〜15重量%の割合で用いると、積層板の加熱着
色が起こらない。
In the polyaddition reaction, in addition to the above essential components,
A general-purpose epoxy resin and / or an epoxy compound of a halogenated bisphenol may coexist. The epoxidized halogenated bisphenols can be obtained by glycidyl etherification of the aforementioned halogenated bisphenols (III) with epihalohydrin or methylepihalohydrin. When coexisting with the halogenated bisphenols (III), 0 to 15% by weight based on the total amount is obtained. When used at a ratio of 1, the coloring of the laminate by heating does not occur.

【0022】上述のようにしてグリシジルエーテル化エ
ポキシ樹脂(B)をハロゲン化ビスフェノール類と重付
加反応して得られる本発明のエポキシ樹脂組成物(以
下、重付加反応樹脂と呼ぶことがある)は、エポキシ当
量350〜500、Mn500〜1000、Mw/Mn
比1.7〜3.0、ハロゲン化物量15〜25、多官能
物3〜40%であり、低分子量成分および高分子量成分
がともに少なく、分子量分布が狭い粘稠物が得られる。
The epoxy resin composition of the present invention obtained by polyaddition reaction of the glycidyl etherified epoxy resin (B) with halogenated bisphenols as described above (hereinafter sometimes referred to as polyaddition reaction resin) is , Epoxy equivalent 350 to 500, Mn 500 to 1000, Mw / Mn
The ratio is 1.7 to 3.0, the amount of halide is 15 to 25, and the polyfunctional compound is 3 to 40%. Both the low molecular weight component and the high molecular weight component are small, and a viscous substance having a narrow molecular weight distribution is obtained.

【0023】またこれらの組成物をジシアンジアミド、
フェノール型ノボラック樹脂等の硬化剤により硬化した
硬化物は、特定のエポキシ樹脂(B)を用いないでこれ
らの成分をブレンドしたり、重付加反応した従来の組成
物の硬化物に比べTgが2〜10℃高く、かつ耐ブリス
ター性に優れ、また、未硬化物のガラスクロスへの含浸
性が優れている。
Further, these compositions are treated with dicyandiamide,
A cured product obtained by curing with a curing agent such as a phenol type novolac resin has a Tg of 2 as compared with a cured product of a conventional composition obtained by blending these components without using a specific epoxy resin (B) or polyaddition reaction. It has a high -10 ° C and excellent blister resistance, and also has an excellent impregnation property of an uncured material into glass cloth.

【0024】本発明のエポキシ樹脂組成物においては、
その特定のグリシジルエーテル化エポキシ樹脂が使用さ
れるが、このエポキシ樹脂はこれを単独でエポキシ樹脂
として使用してもよいし、これに1分子中に2個以上の
エポキシ基を有する他のエポキシ樹脂を併用することも
可能である。その併用できる他のエポキシ樹脂として
は、たとえばビスフェノールA型エポキシ樹脂、フェノ
ールノボラック型エポキシ樹脂、クレゾールノボラック
型エポキシ樹脂などのグリシジルエーテル型エポキシ樹
脂、グリシジルエステルエポキシ樹脂、グリシジルアミ
ン型エポキシ樹脂、線状脂肪族エポキシ樹脂、脂環式エ
ポキシ樹脂、複素環式エポキシ樹脂、ハロゲン化エポキ
シ樹脂などの種々の多官能エポキシ樹脂があげられる。
これらの他のエポキシ樹脂の併用量は、エポキシ樹脂の
全量、すなわちエポキシ樹脂および併用する他のエポキ
シ樹脂の合計量100重量部に対して50重量部以下に
すべきである。その併用する他のエポキシ樹脂量が多く
なりすぎると、本発明の組成物の特性が損なわれる。
In the epoxy resin composition of the present invention,
The specific glycidyl etherified epoxy resin is used, but this epoxy resin may be used alone as an epoxy resin, or other epoxy resin having two or more epoxy groups in one molecule. It is also possible to use together. Examples of other epoxy resins that can be used in combination include glycidyl ether type epoxy resins such as bisphenol A type epoxy resins, phenol novolac type epoxy resins, and cresol novolac type epoxy resins, glycidyl ester epoxy resins, glycidyl amine type epoxy resins, and linear fats. Examples thereof include various polyfunctional epoxy resins such as group epoxy resins, alicyclic epoxy resins, heterocyclic epoxy resins, halogenated epoxy resins and the like.
The amount of these other epoxy resins used in combination should be 50 parts by weight or less based on the total amount of the epoxy resin, that is, 100 parts by weight of the total amount of the epoxy resin and the other epoxy resin used in combination. If the amount of the other epoxy resin used in combination is too large, the properties of the composition of the present invention are impaired.

【0025】本発明のエポキシ樹脂組成物に用いる硬化
剤は、たとえば芳香族ポリアミン、ジシアンジアミド、
酸無水物、各種のフェノール型ノボラック樹脂などがあ
げられる。
The curing agent used in the epoxy resin composition of the present invention is, for example, aromatic polyamine, dicyandiamide,
Examples thereof include acid anhydrides and various phenol type novolac resins.

【0026】本発明のエポキシ樹脂組成物に用いられる
硬化促進剤としては種々のものが使用できる。たとえば
ベンジルジメチルアミン、各種のイミダゾール系化合物
などのアミン類、トリフェニルホスフィンなどの三級ホ
スフィン類等があげられる。
Various curing accelerators can be used in the epoxy resin composition of the present invention. Examples thereof include benzyldimethylamine, amines such as various imidazole compounds, and tertiary phosphines such as triphenylphosphine.

【0027】本発明のエポキシ樹脂組成物に用いる溶剤
としては、種々のものが使用できる。たとえば、アセト
ン、メチルエチルケトン、トルエン、キシレン、メチル
イソブチルケトン、酢酸エチル、エチレングリコールモ
ノメチルエーテル、N,N−ジメチルホルムアミド、
N,N−ジメチルアセトアミド、メタノール、エタノー
ルなどがあげられ、これらの溶剤は適宜に2種またはそ
れ以上の混合溶剤として使用することも可能である。
Various solvents can be used as the solvent for the epoxy resin composition of the present invention. For example, acetone, methyl ethyl ketone, toluene, xylene, methyl isobutyl ketone, ethyl acetate, ethylene glycol monomethyl ether, N, N-dimethylformamide,
Examples thereof include N, N-dimethylacetamide, methanol and ethanol, and these solvents can be appropriately used as a mixed solvent of two or more kinds.

【0028】本発明のエポキシ樹脂組成物には、さらに
必要に応じて種々の他の添加剤、たとえば難燃剤や充填
剤等を適宜に配合することができる。
The epoxy resin composition of the present invention may further contain various other additives such as flame retardants and fillers, if necessary.

【0029】本発明のエポキシ樹脂組成物を用いて、た
とえば銅張エポキシ樹脂積層板を製造するには、常法に
したがって行なうことができる。たとえば、このエポキ
シ樹脂組成物を溶剤に溶かしてワニスとし、ガラスクロ
ス等の補強材に含浸・塗布してから加熱乾燥して溶剤を
除去してプリプレグとし、このプリプレグの1枚もしく
は複数枚重ねたものの片面もしくは両面に銅箔を重ね、
次いで常法にしたがって加熱加圧して積層成形する。
Production of a copper-clad epoxy resin laminate, for example, using the epoxy resin composition of the present invention can be carried out by a conventional method. For example, this epoxy resin composition is dissolved in a solvent to form a varnish, which is impregnated and applied to a reinforcing material such as glass cloth, and then dried by heating to remove the solvent to form a prepreg, and one or more prepregs are laminated. Layer copper foil on one or both sides of the object,
Then, heating and pressurization are carried out according to a conventional method to form a laminate.

【0030】[0030]

【実施例】次に本発明の実施例を示す。 ノボラック樹脂の合成例 合成例1 冷却器、温度計、撹拌器、滴下容器を備え付けた1Lセ
パラブルフラスコにビスフェノールA456g、トルエ
ン335gを仕込み、撹拌しながら昇温した。フラスコ
内の温度が70℃になった時点で触媒の蓚酸2水和物を
2.52g加えた。90℃で37%ホルマリン水溶液1
30gを2時間かけて滴下した。さらに1時間還流下撹
拌を続けた。温度を上げながら水、トルエンを系外に除
去した。150℃に達してから1時間常圧で濃縮した
後、減圧し20mmHg、150℃で1時間濃縮し、ノ
ボラック樹脂(1)を得た。得られた樹脂の軟化点はメ
トラー社の自動軟化点測定装置で、樹脂中に含まれる残
存ビスフェノールA単量体および分子量はゲルパーミエ
ーションクロマトグラフィー(GPC)を利用して測定
した。この時の分離カラムは、残存ビスフェノール単量
体量はShim−pack−HSG10を2本、15、
20(島津製作所製)各1本を、分子量はHSG−2
0、40、50、60を各直列に連結し、溶離液として
はテトラヒドロフランを用いた。また、ノボラック樹脂
(2)〜(4)を、仕込量を表1に示すようにして合成
例1と同様にして合成した。
EXAMPLES Examples of the present invention will be described below. Synthesis Example of Novolac Resin Synthesis Example 1 A 1 L separable flask equipped with a cooler, a thermometer, a stirrer, and a dropping container was charged with 456 g of bisphenol A and 335 g of toluene, and the temperature was raised with stirring. When the temperature in the flask reached 70 ° C., 2.52 g of oxalic acid dihydrate as a catalyst was added. 37% formalin aqueous solution at 90 ℃ 1
30 g was added dropwise over 2 hours. The stirring was continued for another hour under reflux. Water and toluene were removed from the system while raising the temperature. After reaching 150 ° C., the mixture was concentrated at atmospheric pressure for 1 hour, then decompressed and concentrated at 20 mmHg and 150 ° C. for 1 hour to obtain a novolak resin (1). The softening point of the obtained resin was measured by an automatic softening point measuring device manufactured by METTLER CORPORATION, and the residual bisphenol A monomer and the molecular weight contained in the resin were measured by gel permeation chromatography (GPC). The separation column at this time was such that the amount of residual bisphenol monomer was 2 for Shim-pack-HSG10, 15,
20 (manufactured by Shimadzu Corporation), each with a molecular weight of HSG-2
0, 40, 50 and 60 were connected in series, and tetrahydrofuran was used as an eluent. Further, the novolac resins (2) to (4) were synthesized in the same manner as in Synthesis Example 1 with the charged amounts shown in Table 1.

【0031】 [0031]

【0032】グリシジルエーテル化エポキシ樹脂の合成
例(共グリシジル化) 合成例5 温度計、撹拌器、分液器、冷却器、滴下容器を備え付け
た2L丸底フラスコに合成例1のノボラック樹脂(1)
を200g、エピクロルヒドリン1206gを仕込み、
撹拌しながら90℃に昇温した。90℃で水30g、テ
トラメチルアンモニウムクロライド3gを加え4時間撹
拌した。温度を70℃に下げ、減圧し圧力を500mm
Hgに保ちながら滴下容器から48%水酸化ナトリウム
溶液137gを3時間かけて加えた。この間、水は分液
器で分離し系外に除去した。水酸化ナトリウム滴下後、
さらに30分脱水操作を行なってから、減圧し20mm
Hg、120℃で1時間濃縮した。減圧を解除後、水3
50g、トルエン250gを加えてから90℃で30分
撹拌した。静置分液して水層を除去した後、樹脂層を2
0mmHg、150℃で1時間濃縮しグリシジルエーテ
ル化エポキシ樹脂(5)264gを得た。得られた樹脂
のエポキシ当量は塩酸−ジオキサン法を用い、軟化点は
メトラー社の自動軟化点測定装置でおよび成分割合は前
記ノボラック樹脂と同様GPCで測定した。また、エポ
キシ樹脂(6)〜(14)を、仕込量を表2に示すよう
に変えて合成例5と同様にして合成した。
Synthetic Example of Glycidyl Etherified Epoxy Resin (Coglycidylation) Synthetic Example 5 A 2 L round bottom flask equipped with a thermometer, a stirrer, a separator, a cooler and a dropping container was used to synthesize the novolak resin (1 )
200 g and 1206 g of epichlorohydrin,
The temperature was raised to 90 ° C. with stirring. 30 g of water and 3 g of tetramethylammonium chloride were added at 90 ° C., and the mixture was stirred for 4 hours. Lower the temperature to 70 ° C and reduce the pressure to 500 mm
While maintaining Hg, 137 g of 48% sodium hydroxide solution was added from a dropping container over 3 hours. During this period, water was separated by a separator and removed outside the system. After dropping sodium hydroxide,
After dehydration for another 30 minutes, reduce the pressure to 20 mm.
Concentrated at 120 ° C. for 1 hour at Hg. After releasing the decompression, water 3
After adding 50 g and 250 g of toluene, the mixture was stirred at 90 ° C. for 30 minutes. After separating by standing to remove the water layer,
The mixture was concentrated at 0 mmHg and 150 ° C. for 1 hour to obtain 264 g of glycidyl etherified epoxy resin (5). The epoxy equivalent of the obtained resin was measured by the hydrochloric acid-dioxane method, the softening point was measured by an automatic softening point measuring device manufactured by METTLER CORPORATION, and the component ratio was measured by GPC as in the above novolak resin. Further, the epoxy resins (6) to (14) were synthesized in the same manner as in Synthesis Example 5 except that the charged amount was changed as shown in Table 2.

【0033】[0033]

【表1】 [Table 1]

【0034】重付加反応樹脂の合成例 合成例15 攪拌器、温度計を備え付けた1Lセパラブルフラスコに
ビスフェノールA型エポキシ樹脂(エポキシ当量18
8)171g、合成例5のグリシジル化エポキシ樹脂5
を29.4g、テトラブロムブスフェノールA94.3
gを仕込み、撹拌しながら昇温した。100℃になった
ところでテトラエチルアンモニウムクロライドを0.2
g加え、160℃で5時間反応させ重付加反応樹脂(1
5)を得た。得られた樹脂のエポキシ当量は前記と同じ
方法で、分子量は、GPC(カラムはShimipac
k−HSG20、40、50、60を直列に連結)で測
定した。また、重付加反応樹脂(16)〜(24)を、
仕込量を表3に示すようにして、合成例15と同様にし
て合成した。また、重付加反応樹脂(25)、(26)
を仕込量を表3に示すようにして、合成例15と同様に
して合成した。
Synthesis Example of Polyaddition Reaction Resin Synthesis Example 15 Bisphenol A type epoxy resin (epoxy equivalent: 18) was placed in a 1 L separable flask equipped with a stirrer and a thermometer.
8) 171 g, glycidylated epoxy resin 5 of Synthesis Example 5
29.4 g, tetrabromobusphenol A 94.3
g was charged and the temperature was raised with stirring. When the temperature reached 100 ° C, 0.2% tetraethylammonium chloride was added.
g, and react at 160 ° C. for 5 hours to give a polyaddition reaction resin (1
5) was obtained. The epoxy equivalent of the obtained resin was the same as that described above, and the molecular weight was GPC (column: Simipac
k-HSG 20, 40, 50, 60 were connected in series). Further, the polyaddition reaction resins (16) to (24) are
Synthesis was carried out in the same manner as in Synthesis Example 15 with the charged amounts shown in Table 3. Further, polyaddition reaction resins (25), (26)
Was prepared in the same manner as in Synthesis Example 15 with the charged amounts shown in Table 3.

【0035】[0035]

【表2】 [Table 2]

【0036】表3注 *ビスフェノールA型エポキシ樹脂:エポキシ当量18
8g/eq **テトラブロムビスフェノールAエポキシ樹脂 大日本インキ化学工業(株)製 EPICLON 152−S 軟化点 62℃ エポキシ当量 364g/eq ブロム含量 47.6wt%
Table 3 Note * Bisphenol A type epoxy resin: Epoxy equivalent 18
8 g / eq ** Tetrabrom Bisphenol A Epoxy resin manufactured by Dainippon Ink and Chemicals, Inc. EPICLON 152-S Softening point 62 ° C Epoxy equivalent 364 g / eq Brom content 47.6 wt%

【0037】実施例1〜8 (実施例1)重付加反応樹脂(19)100gを25g
のメチルエチルケトンに溶解した溶液にエチレングリコ
ールモノメチルエーテル20gに溶解したジシアンジア
ミド2.5gおよび2−エチル−4メチルイミダゾール
0.15gを加え、エポキシ樹脂組成物のワニスを作成
し、実施例1とした。このワニスをガラスクロス(日東
紡績(株)WEA−18W105F)に含浸させてか
ら、140℃で6分乾燥炉中で乾燥しプリプレグを作成
し、実施例1とした。このプリプレグの樹脂組成物含有
量は49重量%であった。このプリプレグの外観を目視
判定し、実施例1とした。また、プリプレグから樹脂を
揉み解し1mm厚の型に入れ、170℃で1時間加熱硬
化させシートを作りガラス転移温度Tgを東洋紡績
(株)レオロソリッドで2℃/minの昇温速度で測定
した。さらに上記プリプレグを4枚積層し、170℃で
1時間、20kg/cm2 の圧力でプレス成形して積層
板を得た。この積層板を121℃で2kg/cm2 の水
槽中に一定時間静置した後、260℃の半田浴中に20
sec浸漬してPCT後の半田耐熱性を見た(○ 板の
ふくれ、はがれが全くない、△ わずかにある、× あ
る)。以下の結果を表4に示す。また、重付加反応樹脂
(19)のかわりに表5に示す重付加反応樹脂(20)
〜(26)を用いて、実施例1と同様にして実施例2〜
8のワニス、プリプレグとした。実施例2〜8のワニ
ス、プリプレグをそれぞれ用いて、実施例1と同様の測
定を行い、結果を表4に示した。
Examples 1 to 8 (Example 1) 25 g of 100 g of polyaddition reaction resin (19)
Example 2 was prepared by adding 2.5 g of dicyandiamide dissolved in 20 g of ethylene glycol monomethyl ether and 0.15 g of 2-ethyl-4 methylimidazole to a solution dissolved in 20 g of methyl ethyl ketone to prepare a varnish of an epoxy resin composition. A glass cloth (WEA-18W105F, manufactured by Nitto Boseki Co., Ltd.) was impregnated with this varnish and then dried in a drying oven at 140 ° C. for 6 minutes to prepare a prepreg, which was referred to as Example 1. The resin composition content of this prepreg was 49% by weight. The appearance of this prepreg was visually determined and set as Example 1. Further, the resin was kneaded from the prepreg, put in a mold with a thickness of 1 mm, and heat-cured at 170 ° C. for 1 hour to form a sheet, and the glass transition temperature Tg was measured with a Toyobo Co., Ltd. Rheorosolid at a heating rate of 2 ° C./min. . Further, four prepregs were laminated and press-molded at 170 ° C. for 1 hour under a pressure of 20 kg / cm 2 to obtain a laminated plate. This laminate was allowed to stand in a 2 kg / cm 2 water bath at 121 ° C. for a certain period of time and then placed in a solder bath at 260 ° C. for 20 minutes.
After immersing for sec, the solder heat resistance after PCT was observed (○ plate has no swelling or peeling at all, Δ is slightly present, × is present). The following results are shown in Table 4. Further, instead of the polyaddition reaction resin (19), the polyaddition reaction resin (20) shown in Table 5 is used.
~ (26) in the same manner as in Example 1 to Example 2
8 varnish and prepreg. The same measurements as in Example 1 were carried out using the varnishes of Examples 2 to 8 and the prepreg, and the results are shown in Table 4.

【0038】[0038]

【表3】 [Table 3]

【0039】比較例1〜7 表2に示すエポキシ樹脂(5)〜(8)と、表3に示す
重付加反応樹脂(15)〜(18)を用いて表5に示す
組成で実施例1と同様にエポキシ樹脂組成物を作成し、
実施例1と同様に比較例1〜7のワニスとし、これをそ
れぞれ比較例1〜7のプリプレグとした。比較例1〜7
のワニス、プリプレグをそれぞれ用いて実施例1と同様
の測定を行い、結果を表5に示した。
Comparative Examples 1 to 7 Using the epoxy resins (5) to (8) shown in Table 2 and the polyaddition reaction resins (15) to (18) shown in Table 3 with the composition shown in Table 5, Example 1 Create an epoxy resin composition in the same manner as
As in Example 1, the varnishes of Comparative Examples 1 to 7 were used as the prepregs of Comparative Examples 1 to 7, respectively. Comparative Examples 1-7
The same measurements as in Example 1 were carried out using the varnish and the prepreg, and the results are shown in Table 5.

【0040】[0040]

【表4】 [Table 4]

【0041】[0041]

【発明の効果】本発明の特定の共グリシジルエーテル化
されたエポキシ樹脂を用いて重付加反応させた積層板用
エポキシ樹脂組成物は、ガラスクロス等への含浸性が良
好で、かつ耐熱性、耐ブリスター性、銅箔との密着性に
優れた硬化物を与える。
The epoxy resin composition for laminates obtained by the polyaddition reaction using the specific co-glycidyl etherified epoxy resin of the present invention has good impregnability into glass cloth and the like, and heat resistance, It gives a cured product with excellent blister resistance and adhesion to copper foil.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】ビスフェノール類(I)およびノボラック
樹脂(II)の共存下に、エピハロヒドリンあるいはメ
チルエピハロヒドリンでグリシジルエーテル化してなる
エポキシ樹脂(B)を、さらにハロゲン化ビスフェノー
ル類(III)と反応させて得られることを特徴とする
積層板用エポキシ樹脂組成物。
1. An epoxy resin (B) obtained by glycidyl etherification with epihalohydrin or methylepihalohydrin in the presence of a bisphenol (I) and a novolak resin (II) is further reacted with a halogenated bisphenol (III). An epoxy resin composition for laminated boards, which is obtained.
【請求項2】請求項1記載の前記反応に、さらに(A)
エポキシ樹脂および/または(D)ハロゲン化ビスフェ
ノール類のエポキシ化物を共存させる請求項1記載の積
層板用エポキシ樹脂組成物。
2. The reaction according to claim 1, further comprising (A)
The epoxy resin composition for laminates according to claim 1, wherein an epoxy resin and / or (D) an epoxidized product of a halogenated bisphenol are coexistent.
【請求項3】前記ノボラック樹脂(II)の軟化点が1
10℃以下であり、数平均分子量が1000〜300で
あり、分散度が2以下である請求項1または2に記載の
積層板用エポキシ樹脂組成物。
3. The novolak resin (II) has a softening point of 1
The epoxy resin composition for a laminate according to claim 1 or 2, which has a temperature of 10 ° C or lower, a number average molecular weight of 1,000 to 300, and a dispersity of 2 or lower.
【請求項4】前記ビスフェノール類と前記ノボラック樹
脂の重量比が1〜95:99〜5である請求項1ないし
3のいずれかに記載の積層板用エポキシ樹脂組成物。
4. The epoxy resin composition for laminates according to claim 1, wherein the weight ratio of the bisphenols to the novolac resin is 1 to 95:99 to 5.
【請求項5】前記ハロゲン化ビスフェノール類のエポキ
シ化物が0〜15重量%である請求項2〜4のいずれか
に記載の積層板用エポキシ樹脂組成物。
5. The epoxy resin composition for a laminate according to claim 2, wherein the epoxidized halogenated bisphenol is 0 to 15% by weight.
【請求項6】請求項1〜5のいずれかに記載の積層板用
エポキシ樹脂組成物と溶媒とを主成分とするワニス。
6. A varnish containing the epoxy resin composition for laminates according to claim 1 and a solvent as main components.
【請求項7】請求項6に記載のワニスを補強材に含浸さ
せてなる積層板。
7. A laminated plate obtained by impregnating a reinforcing material with the varnish according to claim 6.
JP5028826A 1993-02-18 1993-02-18 Epoxy resin composition for laminate Pending JPH06239963A (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP5028826A JPH06239963A (en) 1993-02-18 1993-02-18 Epoxy resin composition for laminate
MYPI9400355 MY131546A (en) 1993-02-18 1994-02-17 Epoxy resin and epoxy resin composition
GB9403012A GB2275682B (en) 1993-02-18 1994-02-17 Epoxy resin and epoxy resin composition
TW83101274A TW307779B (en) 1993-02-18 1994-02-17
SG1996001462A SG64861A1 (en) 1993-02-18 1994-02-17 Epoxy resin and epoxy resin composition
CN94103299A CN1037972C (en) 1993-02-18 1994-02-18 Epoxy resin and epoxy resin composition
CN 97117195 CN1176262A (en) 1993-02-18 1997-08-05 Polyadduct resin (B) and use thereof
CN 97117197 CN1219546A (en) 1993-02-18 1997-08-05 Polymer resin and uses thereof

Applications Claiming Priority (1)

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JP5028826A JPH06239963A (en) 1993-02-18 1993-02-18 Epoxy resin composition for laminate

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JPH06239963A true JPH06239963A (en) 1994-08-30

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61179221A (en) * 1985-02-04 1986-08-11 Toshiba Chem Corp Epoxy glass/copper laminate
JPS6337138A (en) * 1986-07-31 1988-02-17 Shin Kobe Electric Mach Co Ltd Production of laminated sheet
JPH05163373A (en) * 1991-12-13 1993-06-29 Sumitomo Bakelite Co Ltd Production of laminate board
JPH05309789A (en) * 1992-05-13 1993-11-22 Toshiba Chem Corp Production of composite copper clad laminated sheet
JPH069759A (en) * 1992-06-26 1994-01-18 Dainippon Ink & Chem Inc Epoxy resin composition for laminated board

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61179221A (en) * 1985-02-04 1986-08-11 Toshiba Chem Corp Epoxy glass/copper laminate
JPS6337138A (en) * 1986-07-31 1988-02-17 Shin Kobe Electric Mach Co Ltd Production of laminated sheet
JPH05163373A (en) * 1991-12-13 1993-06-29 Sumitomo Bakelite Co Ltd Production of laminate board
JPH05309789A (en) * 1992-05-13 1993-11-22 Toshiba Chem Corp Production of composite copper clad laminated sheet
JPH069759A (en) * 1992-06-26 1994-01-18 Dainippon Ink & Chem Inc Epoxy resin composition for laminated board

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