JPH10130364A - Phenols resin, epoxy resin, epoxy resin composition and its hardened material - Google Patents

Phenols resin, epoxy resin, epoxy resin composition and its hardened material

Info

Publication number
JPH10130364A
JPH10130364A JP30354496A JP30354496A JPH10130364A JP H10130364 A JPH10130364 A JP H10130364A JP 30354496 A JP30354496 A JP 30354496A JP 30354496 A JP30354496 A JP 30354496A JP H10130364 A JPH10130364 A JP H10130364A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin
weight
phenolic resin
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30354496A
Other languages
Japanese (ja)
Other versions
JP3636409B2 (en
Inventor
Kenichi Kuboki
健一 窪木
Yasumasa Akatsuka
泰昌 赤塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP30354496A priority Critical patent/JP3636409B2/en
Publication of JPH10130364A publication Critical patent/JPH10130364A/en
Application granted granted Critical
Publication of JP3636409B2 publication Critical patent/JP3636409B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a phenols resin useful as a raw material or a hardener for an epoxy resin, having a low viscosity and capable of providing a hardened resin capable of manifesting low water-absorbing properties and a high toughness by forming the resin into a specific structure. SOLUTION: This phenols resin has a structure of formula I [R is H, a halogen, a 1-8C alkyl or aryl; (h) is 1-9; (j) is 1 or 2; (m) and (n) are each a number larger than 0 with the proviso that (m+n)<=10]. The objective resin is preferably obtained by performing a condensation polymerization of (A) phenols, (B) a compound of formula II (X is a halogen, methoxy or hydroxyl group) and (C) a compound of formula III so that the molar ratio of the components B/C may be 0.1-4. The component A is preferably used in the proportion of 1.5-15mol per 1mol total of components B and C. An acidic catalyst used for the reaction is, for example, p-toluenesulfonic acid. An epoxy resin is obtained by reacting the objective resin with an epihalohydrin.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は高信頼性半導体封止
用を始めとする電気・電子部品絶縁材料用、及び積層板
(プリント配線板)やCFRP(炭素繊維強化プラスチ
ック)を始めとする各種複合材料用、接着剤、塗料等に
有用なフェノール類樹脂、エポキシ樹脂、エポキシ樹脂
組成物及びその硬化物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating material for electric and electronic parts such as a high-reliability semiconductor encapsulation, and various kinds of materials such as a laminate (printed wiring board) and CFRP (carbon fiber reinforced plastic). The present invention relates to phenolic resins, epoxy resins, epoxy resin compositions, and cured products thereof useful for composite materials, adhesives, paints, and the like.

【0002】[0002]

【従来の技術】エポキシ樹脂は作業性及びその硬化物の
優れた電気特性、耐熱性、接着性、耐湿性(耐水性)等
により電気・電子部品、構造用材料、接着剤、塗料等の
分野で幅広く用いられている。
2. Description of the Related Art Epoxy resins are used in the fields of electric and electronic parts, structural materials, adhesives, paints, etc. due to workability and excellent electrical properties, heat resistance, adhesiveness, moisture resistance (water resistance), etc. of the cured product. Widely used in

【0003】[0003]

【発明が解決しようとする課題】しかし、近年電気・電
子分野においてはその発展に伴い、高純度化をはじめ耐
熱性、耐湿性、密着性、高靭性、フィラー高充填のため
の低粘度性等の諸特性の一層の向上が求められている。
その一方では作業性の向上のために常温で固形であるこ
とが望まれている。また、構造材としては航空宇宙材
料、レジャー・スポーツ器具用途などにおいて軽量で機
械物性の優れた材料であることと同時に、作業性の向上
のためにやはり低粘度の樹脂が求められている。これら
の要求に対しエポキシ樹脂組成物について多くの提案が
なされてはいるが、未だ充分とはいえない。
However, in recent years, in the electric and electronic fields, with the development thereof, heat resistance, moisture resistance, adhesion, high toughness, low viscosity for high filling of filler, etc. There is a demand for further improvement of the various characteristics.
On the other hand, it is desired to be solid at room temperature in order to improve workability. In addition, as a structural material, a resin that is lightweight and has excellent mechanical properties for aerospace materials, leisure and sports equipment applications, and the like, and also has a low viscosity in order to improve workability is required. Many proposals have been made for epoxy resin compositions to meet these requirements, but they have not been satisfactory yet.

【0004】[0004]

【課題を解決するための手段】本発明者らは前記のよう
な特性を持つエポキシ樹脂について鋭意研究の結果、本
発明を完成した。即ち、本発明は、 (1)式(1)
Means for Solving the Problems The present inventors have made intensive studies on epoxy resins having the above-mentioned characteristics, and have completed the present invention. That is, the present invention provides:

【0005】[0005]

【化6】 Embedded image

【0006】(式中、複数存在するRは独立して水素原
子、ハロゲン原子、炭素数1〜8アルキル基またはアリ
ール基を示す。hは1〜9の整数を、またjは1〜2の
整数をそれぞれ表す。m、nはそれぞれ平均値を表し、
0より大きい実数であり、且つm+nが10以下であ
る。また、基
(Wherein, a plurality of Rs independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group. H is an integer of 1 to 9, and j is 1 to 2; M and n each represent an average value;
It is a real number greater than 0 and m + n is 10 or less. In addition,

【0007】[0007]

【化7】 Embedded image

【0008】と基And base

【0009】[0009]

【化8】 Embedded image

【0010】とは任意の順で配列している。)で表され
るフェノール類樹脂、 (2)上記(1)記載のフェノール類樹脂のフェノール
性水酸基をグリシジル化することにより得られるエポキ
シ樹脂、 (3)(a)フェノール類、(b)式(2)
Are arranged in an arbitrary order. (2) an epoxy resin obtained by glycidylation of the phenolic hydroxyl group of the phenolic resin described in (1), (3) (a) a phenol, and (b) a formula (b) 2)

【0011】[0011]

【化9】 Embedded image

【0012】(式中Xはハロゲン原子、メトキシ基また
は水酸基を示す。複数存在するRは独立して水素原子、
ハロゲン原子、炭素数1〜8アルキル基またはアリール
基を示す。)で表される化合物及び(c)式(3)
(Wherein X represents a halogen atom, a methoxy group or a hydroxyl group. A plurality of Rs independently represent a hydrogen atom,
It represents a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group. And a compound represented by formula (3):

【0013】[0013]

【化10】 Embedded image

【0014】(式中Xはハロゲン原子、メトキシ基また
は水酸基を示す。複数存在するRは独立して水素原子、
ハロゲン原子、炭素数1〜8アルキル基またはアリール
基を示す。)で表される化合物とを重縮合させ得られる
フェノール類樹脂の製造方法において、(b)成分と
(c)成分の配合比がモル比で(b)/(c)=0.1
以上、4以下であることを特徴とする上記(1)記載の
フェノール類樹脂の製造方法、 (4)上記(3)記載の製造方法により得られるフェノ
ール類樹脂のフェノール性水酸基をグリシジル化するこ
とにより得られるエポキシ樹脂、 (5)上記(1)または(3)記載のフェノール類樹脂
を含有するエポキシ樹脂組成物、 (6)上記(2)または(4)記載のエポキシ樹脂を含
有するエポキシ樹脂組成物、 (7)上記(1)または(3)記載のフェノール類樹脂
と、上記(2)または(4)記載のエポキシ樹脂を含有
するエポキシ樹脂組成物、 (8)半導体封止用に調製された上記(5)、(6)及
び(7)のいずれか1項に記載のエポキシ樹脂組成物、 (9)上記(5)、(6)、(7)及び(8)のいずれ
か1項に記載のエポキシ樹脂組成物を硬化してなる硬化
物に関する。
(Wherein X represents a halogen atom, a methoxy group or a hydroxyl group. A plurality of Rs independently represent a hydrogen atom,
It represents a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group. In the method for producing a phenolic resin obtained by polycondensing the compound represented by the formula (1), the compounding ratio of the component (b) to the component (c) is (b) / (c) = 0.1 in a molar ratio.
(4) The method for producing a phenolic resin according to the above (1), wherein the phenolic hydroxyl group of the phenolic resin obtained by the production method according to the above (3) is glycidylated. (5) an epoxy resin composition containing the phenolic resin described in the above (1) or (3); (6) an epoxy resin containing the epoxy resin described in the above (2) or (4) (7) an epoxy resin composition containing the phenolic resin described in the above (1) or (3) and the epoxy resin described in the above (2) or (4); (8) prepared for semiconductor encapsulation The epoxy resin composition according to any one of the above (5), (6) and (7), (9) any one of the above (5), (6), (7) and (8) Epoxy tree described in item A cured product obtained by curing the composition.

【0015】[0015]

【発明の実施の形態】本発明のフェノール類樹脂は、例
えば(a)フェノール類、(b)前記式(2)の化合
物、(c)前記式(3)の化合物とを、必要により酸性
触媒の存在下において加熱して重縮合することにより得
られる。
BEST MODE FOR CARRYING OUT THE INVENTION The phenolic resin of the present invention comprises, for example, (a) a phenol, (b) a compound of the formula (2), and (c) a compound of the formula (3), if necessary. By heating and polycondensation in the presence of

【0016】(a)成分として用いうるフェノール類の
具体例としては、フェノール、クレゾール、エチルフェ
ノール、tert−ブチルフェノール、2,5−ジメチ
ルフェノール、2−tertブチル−5−メチルフェノ
ール等のアルキルフェノール、グアヤコール、グエトー
ル、アリルフェノール、ハイドロキノン、レゾルシン、
カテコール、ナフトール、ジヒドロキシナフタレン等が
挙げられるがこれらに限定されることはなく、これらは
単独でも二種以上併用しても良い。フェノール類の使用
量は、成分(b)+成分(c)1モルに対し、通常1〜
20モル、好ましくは1.5〜15モルである。また、
前記式(2)で表される成分(b)及び前記式(3)で
表される成分(c)の配合比は、(b)/(c)で通常
0.05〜10、好ましくは0.1〜4である。
Specific examples of phenols that can be used as component (a) include phenol, cresol, ethylphenol, tert-butylphenol, 2,5-dimethylphenol, alkylphenols such as 2-tertbutyl-5-methylphenol, and guaiacol. , Guetor, allylphenol, hydroquinone, resorcinol,
Examples include, but are not limited to, catechol, naphthol, and dihydroxynaphthalene, and these may be used alone or in combination of two or more. The amount of the phenol used is usually 1 to 1 mol of the component (b) + the component (c).
20 mol, preferably 1.5 to 15 mol. Also,
The compounding ratio of the component (b) represented by the formula (2) and the component (c) represented by the formula (3) is (b) / (c), usually 0.05 to 10, preferably 0. .

【0017】酸触媒としては例えば塩酸、燐酸、硫酸、
蟻酸、塩化亜鉛、塩化第二鉄、p−トルエンスルホン酸
等が挙げられる。これらは単独でも二種以上併用しても
良い。触媒の使用量は成分(a)+成分(b)+成分
(c)の全重量に対し、通常0.01〜10重量%、好
ましくは0.05〜5重量%である。
Examples of the acid catalyst include hydrochloric acid, phosphoric acid, sulfuric acid,
Formic acid, zinc chloride, ferric chloride, p-toluenesulfonic acid and the like can be mentioned. These may be used alone or in combination of two or more. The amount of the catalyst to be used is generally 0.01 to 10% by weight, preferably 0.05 to 5% by weight, based on the total weight of component (a) + component (b) + component (c).

【0018】反応温度は100〜250℃、反応時間は
1〜20時間であり、反応中に生々するアルコールや
水、ハロゲン化水素は適宜系外にトラップする。また、
未半応のフェノール類は、反応終了後に酸性触媒を失活
あるいは除去してから、加熱真空下で留去するか、水蒸
気蒸留などで留去する。
The reaction temperature is 100 to 250 ° C. and the reaction time is 1 to 20 hours. Alcohol, water and hydrogen halide which grow during the reaction are appropriately trapped outside the system. Also,
Unreacted phenols are removed by deactivating or removing the acidic catalyst after completion of the reaction, and then distilling off under heating vacuum or distilling off by steam distillation or the like.

【0019】本発明のエポキシ樹脂は前記の方法で得ら
れたフェノール類樹脂を原料としてエピハロヒドリンと
反応させることにより得られる。このエポキシ化反応に
使用されるエピハロヒドリン類の用いうる具体例として
は、エピクロルヒドリン、β−メチルエピクロルヒドリ
ン、エピブロムヒドリン、β−メチルエピブロムヒドリ
ン、エピヨードヒドリン、β−エチルエピクロルヒドリ
ン等が挙げられるが、工業的に入手し易く安価なエピク
ロルヒドリンが好ましい。このエポキシ化反応は従来公
知の方法に準じて行うことが出来る。
The epoxy resin of the present invention can be obtained by reacting the phenolic resin obtained by the above method with epihalohydrin as a raw material. Specific examples of the epihalohydrins that can be used in the epoxidation reaction include epichlorohydrin, β-methyl epichlorohydrin, epibromohydrin, β-methyl epibromohydrin, epiiodohydrin, β-ethyl epichlorohydrin, and the like. However, epichlorohydrin, which is industrially available and inexpensive, is preferred. This epoxidation reaction can be performed according to a conventionally known method.

【0020】エポキシ化反応は、例えば上記のフェノー
ル類樹脂とエピハロヒドリン類の混合物に水酸化ナトリ
ウム、水酸化カリウムなどのアルカリ金属水酸化物の固
体を一括添加または徐々に添加しながら20〜120℃
で0.5〜10時間反応させる。この際アルカリ金属水
酸化物は水溶液を使用してもよく、その場合は該アルカ
リ金属水酸化物を連続的に添加すると共に反応混合物中
から減圧下、または常圧下、連続的に水及びエピハロヒ
ドリン類を留出せしめ、更に分液して水は除去し、エピ
ハロヒドリン類は反応混合物中に連続的に戻す方法でも
よい。
The epoxidation reaction is carried out, for example, by adding a solid of alkali metal hydroxide such as sodium hydroxide or potassium hydroxide to a mixture of the above-mentioned phenolic resin and epihalohydrin at a temperature of 20 to 120 ° C.
For 0.5 to 10 hours. At this time, an aqueous solution of the alkali metal hydroxide may be used. In such a case, the alkali metal hydroxide is continuously added, and water and epihalohydrin are continuously added to the reaction mixture under reduced pressure or normal pressure. May be further distilled off, water may be removed therefrom, and epihalohydrins may be continuously returned to the reaction mixture.

【0021】上記の方法においてエピハロヒドリン類の
使用量はフェノール類樹脂の水酸基1当量に対して通常
0.5〜10モル、好ましくは1.0〜5.0モルであ
る。アルカリ金属水酸化物の使用量はフェノール混合物
中の水酸基1当量に対し通常0.5〜1.5モル、好ま
しくは0.7〜1.2モルである。ジメチルスルホン、
ジメチルスルホキシド、ジメチルホルムアミド、1,3
−ジメチル−2−イミダゾリジノン等の非プロトン性極
性溶媒を添加することにより下記に定義する加水分解性
ハロゲン濃度の低いエポキシ樹脂が得られ、このエポキ
シ樹脂は電子材料封止用の用途に適する。非プロトン性
極性溶媒の使用量はエピハロヒドリン類の重量に対し5
〜200重量%、好ましくは10〜100重量%であ
る。上記の溶媒以外にもメタノール、エタノール等のア
ルコール類、1,4−ジオキサン等の環状及び鎖状エー
テル類を添加することによっても反応が進み易くなり、
加水分解性ハロゲン濃度も非プロトン性極性溶媒を使用
した場合よりは高いが、これら溶媒を使用しないときよ
りは低くなる。またトルエン、キシレン等も使用するこ
とができる。ここで加水分解性ハロゲン濃度とは、例え
ば該エポキシ樹脂をジオキサンと1N−KOH/エタノ
ール溶液に入れ、数十分間還流した後、硝酸銀溶液で滴
定することにより測定することができる。
In the above method, the amount of the epihalohydrin used is usually 0.5 to 10 mol, preferably 1.0 to 5.0 mol, per equivalent of the hydroxyl group of the phenol resin. The amount of the alkali metal hydroxide to be used is generally 0.5 to 1.5 mol, preferably 0.7 to 1.2 mol, per 1 equivalent of the hydroxyl group in the phenol mixture. Dimethyl sulfone,
Dimethylsulfoxide, dimethylformamide, 1,3
By adding an aprotic polar solvent such as -dimethyl-2-imidazolidinone, an epoxy resin having a low concentration of hydrolyzable halogen as defined below is obtained, and this epoxy resin is suitable for use in sealing electronic materials. . The amount of the aprotic polar solvent used is 5 to the weight of the epihalohydrin.
The content is from 200 to 200% by weight, preferably from 10 to 100% by weight. In addition to the above solvents, methanol, alcohols such as ethanol, and the addition of cyclic and chain ethers such as 1,4-dioxane facilitate the reaction,
The concentration of the hydrolyzable halogen is also higher than when the aprotic polar solvent is used, but lower than when these solvents are not used. Further, toluene, xylene and the like can be used. Here, the hydrolyzable halogen concentration can be measured, for example, by placing the epoxy resin in a dioxane and 1N-KOH / ethanol solution, refluxing for several tens minutes, and then titrating with a silver nitrate solution.

【0022】またフェノール類樹脂と過剰のエピハロヒ
ドリン類の混合物にテトラメチルアンモニウムクロライ
ド、テトラメチルアンモニウムブロマイド、トリメチル
ベンジルアンモニウムクロライドなどの第四級アンモニ
ウム塩を触媒として使用し、50℃〜150℃で1〜1
0時間反応させ、得られるフェノール類樹脂のハロヒド
リンエーテルに水酸化ナトリウム、水酸化カリウムなど
のアルカリ金属水酸化物の固体または水溶液を加え、2
0〜120℃で1〜10時間反応させてハロヒドリンエ
ーテルを閉環させて本発明のエポキシ樹脂を得ることも
できる。この場合の第四級アンモニウム塩の使用量はフ
ェノール類樹脂の水酸基1当量に対して通常0.001
〜0.2モル、好ましくは0.05〜0.1モルであ
る。アルカリ金属水酸化物の使用量は、フェノール類樹
脂の水酸基1当量に対し通常0.8〜1.5モル、好ま
しくは0.9〜1.1モルである。
A quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide or trimethylbenzylammonium chloride is used as a catalyst in a mixture of a phenolic resin and an excess epihalohydrin at 50 ° C. to 150 ° C. 1
After reacting for 0 hour, a solid or aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is added to the resulting halohydrin ether of the phenolic resin,
The epoxy resin of the present invention can also be obtained by reacting at 0 to 120 ° C. for 1 to 10 hours to close the ring of the halohydrin ether. In this case, the amount of the quaternary ammonium salt used is usually 0.001 to 1 equivalent of the hydroxyl group of the phenolic resin.
To 0.2 mol, preferably 0.05 to 0.1 mol. The amount of the alkali metal hydroxide to be used is generally 0.8 to 1.5 mol, preferably 0.9 to 1.1 mol, per equivalent of the hydroxyl group of the phenolic resin.

【0023】通常、これらの反応生成物は水洗後、また
は水洗無しに加熱減圧下過剰のエピハロヒドリン類や、
その他使用した溶媒等を除去した後、トルエン、メチル
イソブチルケトン、メチルエチルケトン等の溶媒に溶解
し、水酸化ナトリウム、水酸化カリウムなどのアルカリ
金属水酸化物の水溶液を加えて再び反応を行うことによ
り加水分解性ハロゲン濃度の低いエポキシ樹脂を得るこ
とが出来る。この場合アルカリ金属水酸化物の使用量は
フェノール類樹脂の水酸基1当量に対して通常0.01
〜0.2モル、好ましくは0.05〜0.1モルであ
る。反応温度は通常50〜120℃の間で行われ、反応
時間は通常0.5〜2時間である。反応終了後副生した
塩をろ過、水洗などにより除去し、さらに加熱減圧下ト
ルエン、メチルイソブチルケトン等の溶媒を留去するこ
とにより加水分解性ハロゲン濃度が低い本発明のエポキ
シ樹脂を得ることができる。
Usually, these reaction products are washed with water or without water, and then heated under reduced pressure to obtain an excess of epihalohydrins,
After removing the used solvent and the like, the mixture is dissolved in a solvent such as toluene, methyl isobutyl ketone, and methyl ethyl ketone, and an aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is added thereto, and the reaction is carried out again. An epoxy resin having a low decomposable halogen concentration can be obtained. In this case, the amount of the alkali metal hydroxide used is usually 0.01 to 1 equivalent of the hydroxyl group of the phenolic resin.
To 0.2 mol, preferably 0.05 to 0.1 mol. The reaction temperature is usually between 50 and 120 ° C., and the reaction time is usually 0.5 to 2 hours. After the completion of the reaction, salts produced as by-products are removed by filtration, washing with water, and the like, and the epoxy resin of the present invention having a low hydrolyzable halogen concentration can be obtained by distilling off solvents such as toluene and methyl isobutyl ketone under reduced pressure with heating. it can.

【0024】以下、本発明のエポキシ樹脂組成物につい
て説明する。前記(5)、(8)記載のエポキシ樹脂組
成物において本発明のフェノール類樹脂はエポキシ樹脂
の硬化剤として作用し、この場合本発明のフェノール類
樹脂を単独でまたは他の硬化剤と併用することが出来
る。併用する場合、本発明のフェノール類樹脂の全硬化
剤中に占める割合は20重量%以上が好ましく、特に3
0重量%以上が好ましい。
Hereinafter, the epoxy resin composition of the present invention will be described. In the epoxy resin composition according to (5) or (8), the phenolic resin of the present invention acts as a curing agent for the epoxy resin. In this case, the phenolic resin of the present invention is used alone or in combination with another curing agent. I can do it. When used in combination, the proportion of the phenolic resin of the present invention in the total curing agent is preferably at least 20% by weight, particularly preferably 3% by weight.
0% by weight or more is preferred.

【0025】本発明のフェノール類樹脂と併用されうる
他の硬化剤としては、例えばアミン系化合物、酸無水物
系化合物、アミド系化合物、フェノ−ル系化合物などが
挙げられる。用いうる硬化剤の具体例としては、ジアミ
ノジフェニルメタン、ジエチレントリアミン、トリエチ
レンテトラミン、ジアミノジフェニルスルホン、イソホ
ロンジアミン、ジシアンジアミド、リノレン酸の2量体
とエチレンジアミンとより合成されるポリアミド樹脂、
無水フタル酸、無水トリメリット酸、無水ピロメリット
酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチ
ルテトラヒドロ無水フタル酸、無水メチルナジック酸、
ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フ
タル酸、ビスフェノール類、フェノール(フェノール、
アルキル置換フェノール、ナフトール、アルキル置換ナ
フトール、ジヒドロキシベンゼン、ジヒドロキシナフタ
レン等)類と各種アルデヒドとの重縮合物、フェノール
類と各種ジエン化合物との重合物、フェノール類と芳香
族ジメチロールとの重縮合物、ビフェノール類及びこれ
らの変性物、イミダゾ−ル、BF3 −アミン錯体、グア
ニジン誘導体などが挙げられる。
Other curing agents that can be used in combination with the phenolic resin of the present invention include, for example, amine compounds, acid anhydride compounds, amide compounds, phenol compounds and the like. Specific examples of the curing agent that can be used include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, a polyamide resin synthesized from a dimer of linolenic acid and ethylenediamine,
Phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride,
Hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, bisphenols, phenol (phenol,
Polycondensates of alkyl-substituted phenols, naphthol, alkyl-substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) with various aldehydes, polymers of phenols with various diene compounds, polycondensates of phenols with aromatic dimethylol, Biphenols and modified products thereof, imidazole, BF 3 -amine complex, guanidine derivative and the like can be mentioned.

【0026】前記(6)、(8)記載のエポキシ樹脂組
成物において本発明のエポキシ樹脂は単独でまたは他の
エポキシ樹脂と併用して使用することが出来る。併用す
る場合、本発明のエポキシ樹脂の全エポキシ樹脂中に占
める割合は30重量%以上が好ましく、特に40重量%
以上が好ましい。
In the epoxy resin compositions described in the above (6) and (8), the epoxy resin of the present invention can be used alone or in combination with other epoxy resins. When used in combination, the proportion of the epoxy resin of the present invention in the total epoxy resin is preferably 30% by weight or more, particularly 40% by weight.
The above is preferred.

【0027】本発明のエポキシ樹脂と併用されうる他の
エポキシ樹脂の具体例としてはビスフェノール類、フェ
ノール(フェノール、アルキル置換フェノール、ナフト
ール、アルキル置換ナフトール、ジヒドロキシベンゼ
ン、ジヒドロキシナフタレン等)類と各種アルデヒドと
の重縮合物、フェノール類と各種ジエン化合物との重合
物、フェノール類と芳香族ジメチロールとの重縮合物、
ビフェノール類、アルコール類等をグリシジル化したグ
リシジルエーテル系エポキシ樹脂、脂環式エポキシ樹
脂、グリシジルアミン系エポキシ樹脂、グリシジルエス
テル系エポキシ樹脂等が挙げられるが、通常用いられる
エポキシ樹脂であればこれらに限定されるものではな
い。これらは単独で用いてもよく、2種以上を用いても
よい。
Specific examples of other epoxy resins that can be used in combination with the epoxy resin of the present invention include bisphenols, phenols (phenol, alkyl-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) and various aldehydes. Polycondensates of phenols and various diene compounds, polycondensates of phenols and aromatic dimethylol,
Glycidyl ether-based epoxy resins obtained by glycidylation of biphenols, alcohols, etc., alicyclic epoxy resins, glycidylamine-based epoxy resins, glycidyl ester-based epoxy resins, and the like are included. It is not something to be done. These may be used alone or in combination of two or more.

【0028】前記(7)、(8)のエポキシ樹脂組成物
において、硬化剤として本発明のフェノール類樹脂を用
いる場合、エポキシ樹脂としては前記で他のエポキシ樹
脂として例示したエポキシ樹脂や本発明のエポキシ樹脂
を用いることが出来る。
In the epoxy resin compositions (7) and (8), when the phenolic resin of the present invention is used as a curing agent, the epoxy resin exemplified above as the other epoxy resin or the epoxy resin of the present invention may be used. Epoxy resin can be used.

【0029】また前記(7)、(8)のエポキシ樹脂組
成物において、エポキシ樹脂として本発明のエポキシ樹
脂を用いる場合、硬化剤としては前記で他の硬化剤とし
て例示した硬化剤や本発明のフェノール類樹脂を用いる
ことが出来る。
In the epoxy resin compositions (7) and (8), when the epoxy resin of the present invention is used as the epoxy resin, the curing agent exemplified above as the other curing agent or the curing agent of the present invention may be used. Phenolic resins can be used.

【0030】本発明のエポキシ樹脂組成物において硬化
剤の使用量は、エポキシ樹脂のエポキシ基1当量に対し
て通常0.5〜1.5当量、好ましくは、0.6〜1.
2当量である。エポキシ基1当量に対して、0.5当量
に満たない場合、あるいは1.5当量を超える場合、い
ずれも硬化が不完全となり良好な硬化物性が得られない
恐れがある。
The amount of the curing agent used in the epoxy resin composition of the present invention is usually 0.5 to 1.5 equivalents, preferably 0.6 to 1.
Two equivalents. If the amount is less than 0.5 equivalents or more than 1.5 equivalents with respect to 1 equivalent of the epoxy group, curing may be incomplete and good cured physical properties may not be obtained.

【0031】また本発明のエポキシ樹脂組成物には、必
要により硬化促進剤を含有せしめても差し支えない。用
いうる硬化促進剤の具体例としては2−メチルイミダゾ
ール、2−エチルイミダゾール、2−エチル−4−メチ
ルイミダゾール等のイミダゾ−ル類、2−(ジメチルア
ミノメチル)フェノール等の第3級アミン類、トリフェ
ニルホスフィン等のホスフィン類、オクチル酸スズなど
の金属化合物などが挙げられる。硬化促進剤はエポキシ
樹脂100重量部に対して0.01〜15重量部が必要
に応じ用いられる。さらに、本発明のエポキシ樹脂組成
物には、必要に応じてシリカ、アルミナ、タルク等の充
填材やシランカップリング剤、離型剤、顔料等の種々の
配合剤を添加することができる。
The epoxy resin composition of the present invention may contain a curing accelerator if necessary. Specific examples of the curing accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole and 2-ethyl-4-methylimidazole, and tertiary amines such as 2- (dimethylaminomethyl) phenol. And phosphines such as triphenylphosphine, and metal compounds such as tin octylate. The hardening accelerator is used in an amount of 0.01 to 15 parts by weight based on 100 parts by weight of the epoxy resin as required. Further, the epoxy resin composition of the present invention may contain various additives such as fillers such as silica, alumina and talc, silane coupling agents, release agents and pigments, if necessary.

【0032】本発明のエポキシ樹脂組成物は、上記各成
分を所定の割合で均一に混合することにより得られる。
本発明のエポキシ樹脂組成物は従来知られている方法と
同様の方法で容易にその硬化物とすることができる。例
えば本発明のエポキシ樹脂と硬化剤、必要により硬化促
進剤及び充填材やその他配合剤とを必要に応じて押出
機、ニ−ダ、ロ−ル等を用いて均一になるまで充分に混
合して本発明のエポキシ樹脂組成物を得、そのエポキシ
樹脂組成物を、溶融注型法あるいはトランスファ−成型
法やインジェクション成型法、圧縮成型法などによって
成形し、必要であれば、さらに50〜200℃で加熱す
ることにより本発明の硬化物を得ることができる。
The epoxy resin composition of the present invention can be obtained by uniformly mixing the above components at a predetermined ratio.
The epoxy resin composition of the present invention can be easily made into a cured product by a method similar to a conventionally known method. For example, the epoxy resin of the present invention and a curing agent, if necessary, a curing accelerator, a filler and other compounding agents are sufficiently mixed, if necessary, using an extruder, a kneader, a roll, or the like until they become uniform. To obtain an epoxy resin composition of the present invention, and molding the epoxy resin composition by a melt casting method, a transfer molding method, an injection molding method, a compression molding method, and the like. To obtain the cured product of the present invention.

【0033】また本発明のエポキシ樹脂組成物をトルエ
ン、キシレン、アセトン、メチルエチルケトン、メチル
イソブチルケトン等の溶剤に溶解させ、ガラス繊維、カ
−ボン繊維、ポリエステル繊維、ポリアミド繊維、アル
ミナ繊維、紙などの基材に含浸させ加熱乾燥して得たプ
リプレグを熱プレス成形して本発明の硬化物を得ること
もできる。
Further, the epoxy resin composition of the present invention is dissolved in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, and the like, and is used to prepare glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper, etc. The prepreg obtained by impregnating the substrate with heat and drying can be subjected to hot press molding to obtain the cured product of the present invention.

【0034】その際溶剤は本発明のエポキシ樹脂組成物
と溶剤の合計重量に対し溶剤の占める割合が、通常10
〜70重量%、好ましくは15〜65重量%となる量使
用する。
In this case, the proportion of the solvent to the total weight of the epoxy resin composition of the present invention and the solvent is usually 10%.
7070% by weight, preferably 15-65% by weight.

【0035】[0035]

【実施例】以下本発明を実施例により更に詳細に説明す
る。尚、本発明はこれら実施例に限定されるものではな
い。また、エポキシ当量、ICI粘度、軟化点は以下の
条件で測定した。 エポキシ当量 JIS K−7236に準じた方法で測定した。。 ICI粘度 150℃におけるコーンプレート法における溶融粘度 測定機械:コーンプレート(ICI)高温粘度計(RESE
ARCH EQUIPMENT(LONDON)LTD. 製) コーンNo.:3(測定範囲0〜20ポイズ) 試料量:0.15±0.01 軟化点 JIS K−7234に準じた方法で測定
The present invention will be described in more detail with reference to the following examples. Note that the present invention is not limited to these examples. The epoxy equivalent, ICI viscosity and softening point were measured under the following conditions. Epoxy equivalent It measured by the method according to JISK-7236. . ICI viscosity Melt viscosity in cone plate method at 150 ° C Measurement machine: cone plate (ICI) high temperature viscometer (RESE)
ARCH EQUIPMENT (LONDON) LTD. : 3 (measurement range: 0 to 20 poise) Sample amount: 0.15 ± 0.01 Softening point Measured by a method according to JIS K-7234

【0036】実施例1 コンデンサー、撹拌装置を備えたフラスコに、フェノー
ル940重量部、下記式(4)
Example 1 A flask equipped with a condenser and a stirrer was charged with 940 parts by weight of phenol and the following formula (4)

【0037】[0037]

【化11】 Embedded image

【0038】で表される化合物169重量部、下記式
(5)
169 parts by weight of a compound represented by the following formula (5)

【0039】[0039]

【化12】 Embedded image

【0040】で表される化合物49重量部、p−トルエ
ンスルフォン酸12重量部を仕込、130〜160℃に
保ちながら5時間反応を行った。この際、生成するメタ
ノールは随時系外へ除去した。反応終了後、炭酸ナトリ
ウムで中和し、未反応のフェノールを加熱減圧下で留去
し、メチルイソブチルケトン400重量部に溶解し、水
洗を繰り返して塩類を除去した。次いで加熱減圧下に於
て未反応のフェノールとメチルイソブチルケトンを留去
して本発明のフェノール類樹脂(P1)380重量部を
得た。得られたフェノール類樹脂(P1)の軟化点は6
1℃、ICI粘度は0.8ポイズ、水酸基当量は194
g/eqであった。
49 parts by weight of the compound represented by the formula (1) and 12 parts by weight of p-toluenesulfonic acid were charged and reacted at 130 to 160 ° C. for 5 hours. At this time, generated methanol was removed from the system as needed. After completion of the reaction, the reaction mixture was neutralized with sodium carbonate, unreacted phenol was distilled off under heating and reduced pressure, dissolved in 400 parts by weight of methyl isobutyl ketone, and washed repeatedly with water to remove salts. Then, unreacted phenol and methyl isobutyl ketone were distilled off under reduced pressure under heating to obtain 380 parts by weight of the phenolic resin (P1) of the present invention. The softening point of the obtained phenolic resin (P1) is 6
1 ° C., ICI viscosity 0.8 poise, hydroxyl equivalent 194
g / eq.

【0041】実施例2 実施例1においてフェノールを188重量部に変えた以
外は同様の操作を行い本発明のフェノール類樹脂(P
2)244重量部を得た。得られたフェノール類樹脂
(2)の軟化点は78℃、ICI粘度は3.3ポイズ、
水酸基当量は207g/eqであった。
Example 2 A phenolic resin (P) of the present invention was prepared in the same manner as in Example 1 except that phenol was changed to 188 parts by weight.
2) 244 parts by weight were obtained. The obtained phenolic resin (2) has a softening point of 78 ° C., an ICI viscosity of 3.3 poise,
The hydroxyl equivalent was 207 g / eq.

【0042】実施例3 実施例1において式(4)の化合物を121重量部に、
式(5)の化合物を82重量部に変えた以外は同様の操
作を行い本発明のフェノール類樹脂(P3)252重量
部を得た。得られたフェノール類樹脂(P3)の軟化点
は58℃、ICI粘度は0.7ポイズ、水酸基当量は1
86g/eqであった。
Example 3 In Example 1, the compound of the formula (4) was added to 121 parts by weight,
The same operation was carried out except that the compound of the formula (5) was changed to 82 parts by weight to obtain 252 parts by weight of the phenolic resin (P3) of the present invention. The obtained phenolic resin (P3) has a softening point of 58 ° C., an ICI viscosity of 0.7 poise and a hydroxyl equivalent of 1
It was 86 g / eq.

【0043】実施例4 実施例2において式(4)の化合物を121重量部に、
式(5)の化合物を82重量部に変えた以外は同様の操
作を行い本発明のフェノール類樹脂(P4)231を得
た。得られたフェノール類樹脂(P4)の軟化点は76
℃、ICI粘度は3.4ポイズ、水酸基当量は198g
/eqであった。
Example 4 In Example 2, the compound of the formula (4) was added to 121 parts by weight,
The same operation was performed except that the compound of the formula (5) was changed to 82 parts by weight to obtain a phenolic resin (P4) 231 of the present invention. The softening point of the obtained phenolic resin (P4) is 76
° C, ICI viscosity is 3.4 poise, hydroxyl equivalent is 198g
/ Eq.

【0044】実施例5 実施例1において式(4)の化合物を73重量部に、式
(5)の化合物を115重量部に変えた以外は同様の操
作を行い本発明のフェノール類樹脂(P5)238重量
部を得た。得られたフェノール類樹脂(P5)の軟化点
は54℃、ICI粘度は0.5ポイズ、水酸基当量は1
77g/eqであった。
Example 5 A phenolic resin of the present invention (P5) was prepared in the same manner as in Example 1 except that the compound of the formula (4) was changed to 73 parts by weight and the compound of the formula (5) was changed to 115 parts by weight. ) 238 parts by weight were obtained. The obtained phenolic resin (P5) has a softening point of 54 ° C., an ICI viscosity of 0.5 poise and a hydroxyl equivalent of 1
77 g / eq.

【0045】実施例6 実施例2において式(4)の化合物を73重量部に、式
(5)の化合物を115重量部に変えた以外は同様の操
作を行い本発明のフェノール類樹脂(P5)217重量
部を得た。得られたフェノール類樹脂(P6)の軟化点
は75℃、ICI粘度は3.5ポイズ、水酸基当量は1
89g/eqであった。
Example 6 A phenolic resin (P5) of the present invention was prepared in the same manner as in Example 2 except that the compound of the formula (4) was changed to 73 parts by weight and the compound of the formula (5) was changed to 115 parts by weight. ) 217 parts by weight were obtained. The obtained phenolic resin (P6) has a softening point of 75 ° C., an ICI viscosity of 3.5 poise and a hydroxyl equivalent of 1
It was 89 g / eq.

【0046】実施例7 フェノール類樹脂(P1)200重量部、エピクロルヒ
ドリン(ECH、以下同様)800重量部、ジメチルス
ルホキシド(DMSO、以下同様)100重量部を反応
容器に仕込、加熱、撹拌、溶解後、温度を45℃に保持
しながら、反応系内を45Torrに保って、40%水
酸化ナトリウム水溶液103重量部を4時間かけて連続
的に滴下した。この際共沸により留出してくるECHと
水を冷却、分液した後、有機層であるECHだけを反応
系内に戻しながら反応を行った。水酸化ナトリウム水溶
液滴下完了後、45℃で2時間、70℃で1時間更に反
応を行った。ついで水洗を繰り返し、副成塩とジメチル
スルホキシドを除去した後、油層から加熱減圧下におい
て過剰のエピクロルヒドリンを留去し、残留物に600
重量部のメチルイソブチルケトンを添加し溶解した。こ
のメチルイソブチルケトンの溶液を70℃に加熱し30
%水酸化ナトリウム水溶液10重量部を添加し、1時間
反応させた後、反応液の水洗を洗浄液が中性となるまで
繰り返した。ついで油層から加熱減圧下においてメチル
イソブチルケトンを留去することにより本発明のエポキ
シ樹脂(E1)242重量部を得た。得られたエポキシ
樹脂(E1)のエポキシ当量は288g/eq、軟化点
53℃、ICI粘度0.7ポイズであった。
Example 7 A reaction vessel was charged with 200 parts by weight of a phenolic resin (P1), 800 parts by weight of epichlorohydrin (ECH, the same applies hereinafter), and 100 parts by weight of dimethyl sulfoxide (DMSO, the same applies hereinafter). While maintaining the temperature at 45 ° C. and maintaining the inside of the reaction system at 45 Torr, 103 parts by weight of a 40% aqueous sodium hydroxide solution was continuously dropped over 4 hours. At this time, after cooling and separating the ECH and water distilled off by azeotropic distillation, the reaction was performed while returning only the organic layer, ECH, into the reaction system. After the completion of the dropwise addition of the aqueous sodium hydroxide solution, the reaction was further performed at 45 ° C. for 2 hours and at 70 ° C. for 1 hour. Subsequently, washing with water was repeated to remove by-product salts and dimethyl sulfoxide, and then excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure, and 600 mg
A part by weight of methyl isobutyl ketone was added and dissolved. This solution of methyl isobutyl ketone was heated to 70 ° C.
After adding 10 parts by weight of a 10% aqueous sodium hydroxide solution and reacting for 1 hour, washing of the reaction solution with water was repeated until the washing solution became neutral. Then, methyl isobutyl ketone was distilled off from the oil layer under heating and reduced pressure to obtain 242 parts by weight of the epoxy resin (E1) of the present invention. The epoxy equivalent of the obtained epoxy resin (E1) was 288 g / eq, the softening point was 53 ° C., and the ICI viscosity was 0.7 poise.

【0047】実施例8 実施例7においてフェノール類樹脂(P1)をフェノー
ル類樹脂(P2)200重量部に、40%水酸化ナトリ
ウム水溶液を97重量部をに変えた以外は実施例1と同
様の操作を行った。その結果、本発明のエポキシ樹脂
(E2)235重量部を得た。得られたエポキシ樹脂
(E2)のエポキシ当量は316g/eq、軟化点68
℃、ICI粘度3.0ポイズであった。
Example 8 The procedure of Example 7 was repeated except that the phenolic resin (P1) was changed to 200 parts by weight of the phenolic resin (P2) and the 40% aqueous sodium hydroxide solution was changed to 97 parts by weight. The operation was performed. As a result, 235 parts by weight of the epoxy resin (E2) of the present invention was obtained. The obtained epoxy resin (E2) has an epoxy equivalent of 316 g / eq and a softening point of 68.
C. and an ICI viscosity of 3.0 poise.

【0048】実施例9 実施例7においてフェノール類樹脂(P1)をフェノー
ル類樹脂(P3)200重量部に、40%水酸化ナトリ
ウム水溶液を108重量部をに変えた以外は実施例1と
同様の操作を行った。その結果、本発明のエポキシ樹脂
(E3)221重量部を得た。得られたエポキシ樹脂
(E3)のエポキシ当量は281g/eq、軟化点51
℃、ICI粘度0.6ポイズであった。
Example 9 The same procedure as in Example 1 was carried out except that the phenolic resin (P1) was changed to 200 parts by weight of the phenolic resin (P3) and the 40% aqueous sodium hydroxide solution was changed to 108 parts by weight. The operation was performed. As a result, 221 parts by weight of the epoxy resin (E3) of the present invention was obtained. The obtained epoxy resin (E3) has an epoxy equivalent of 281 g / eq and a softening point of 51.
C. and an ICI viscosity of 0.6 poise.

【0049】実施例10 実施例7においてフェノール類樹脂(P1)をフェノー
ル類樹脂(P4)200重量部に、40%水酸化ナトリ
ウム水溶液を101重量部をに変えた以外は実施例1と
同様の操作を行った。その結果、本発明のエポキシ樹脂
(E4)230重量部を得た。得られたエポキシ樹脂
(E4)のエポキシ当量は310g/eq、軟化点67
℃、ICI粘度2.9ポイズであった。
Example 10 The same as Example 1 except that the phenolic resin (P1) was changed to 200 parts by weight of the phenolic resin (P4) and the 40% aqueous sodium hydroxide solution was changed to 101 parts by weight. The operation was performed. As a result, 230 parts by weight of the epoxy resin (E4) of the present invention was obtained. The obtained epoxy resin (E4) has an epoxy equivalent of 310 g / eq and a softening point of 67.
C., ICI viscosity was 2.9 poise.

【0050】実施例11 実施例7においてフェノール類樹脂(P1)をフェノー
ル類樹脂(P5)200重量部に、40%水酸化ナトリ
ウム水溶液を113重量部をに変えた以外は実施例1と
同様の操作を行った。その結果、本発明のエポキシ樹脂
(E5)235重量部を得た。得られたエポキシ樹脂
(E5)のエポキシ当量は273g/eq、軟化点50
℃、ICI粘度0.5ポイズであった。
Example 11 The same procedure as in Example 1 was carried out except that the phenolic resin (P1) was changed to 200 parts by weight of the phenolic resin (P5) and the 40% aqueous sodium hydroxide solution was changed to 113 parts by weight. The operation was performed. As a result, 235 parts by weight of the epoxy resin (E5) of the present invention was obtained. The obtained epoxy resin (E5) has an epoxy equivalent of 273 g / eq and a softening point of 50.
° C, ICI viscosity 0.5 poise.

【0051】実施例12 実施例7においてフェノール類樹脂(P1)をフェノー
ル類樹脂(P6)200重量部に、40%水酸化ナトリ
ウム水溶液を106重量部をに変えた以外は実施例1と
同様の操作を行った。その結果、本発明のエポキシ樹脂
(E6)233重量部を得た。得られたエポキシ樹脂
(E6)のエポキシ当量は301g/eq、軟化点68
℃、ICI粘度2.8ポイズであった。
Example 12 The same procedure as in Example 1 was carried out except that the phenolic resin (P1) was changed to 200 parts by weight of the phenolic resin (P6) and the 40% aqueous sodium hydroxide solution was changed to 106 parts by weight. The operation was performed. As a result, 233 parts by weight of the epoxy resin (E6) of the present invention was obtained. The obtained epoxy resin (E6) has an epoxy equivalent of 301 g / eq and a softening point of 68.
C., ICI viscosity was 2.8 poise.

【0052】実施例13〜21 実施例で得られたエポキシ樹脂(E1)〜(E6)また
はo−クレゾールノボラックエポキシ樹脂(日本化薬
(株)製 EOCN−1020 軟化点65℃150℃
に於けるICI粘度 2.9ポイズ)を使用し、これら
エポキシ樹脂のエポキシ基1当量に対して硬化剤として
フェノールノボラック樹脂(日本化薬(株)製、PN−
80、150℃におけるICI粘度1.5ポイズ、軟化
点86℃、水酸基当量106g/eq、以下PN)また
は本発明のフェノール類樹脂を1水酸基当量配合し、更
に硬化促進剤(トリフェニルフォスフィン)をエポキシ
樹脂100重量部当り1重量部配合し、トランスファー
成型により樹脂成形体を調製し、160℃で2時間、更
に180℃で8時間で硬化させた。
Examples 13 to 21 Epoxy resins (E1) to (E6) or o-cresol novolak epoxy resin obtained in Examples (EOCN-1020 manufactured by Nippon Kayaku Co., Ltd.).
Phenol novolak resin (manufactured by Nippon Kayaku Co., Ltd., PN-
(ICI viscosity at 80 and 150 ° C. 1.5 poise, softening point 86 ° C., hydroxyl equivalent 106 g / eq, hereinafter PN) or phenolic resin of the present invention is mixed with one hydroxyl equivalent, and a curing accelerator (triphenylphosphine) is further added. Was blended in an amount of 1 part by weight per 100 parts by weight of the epoxy resin, and a resin molded article was prepared by transfer molding and cured at 160 ° C. for 2 hours and further at 180 ° C. for 8 hours.

【0053】このようにして得られた硬化物の物性を測
定した結果を表1及び2に示す。尚、硬化物の物性は、
下記の方法で測定した。 ・ガラス転移温度(TMA):真空理工(株)製 TM
−7000 昇温度速度 2℃/min. ・アイゾット衝撃試験:JIS K7710に準拠して
行った。 ・吸水率:直径5cm×厚み4mmの円盤状の試験片を
100℃の水中で24時間煮沸した後の重量増加率
(%)
The results of measuring the physical properties of the cured product thus obtained are shown in Tables 1 and 2. The physical properties of the cured product are as follows:
It was measured by the following method. -Glass transition temperature (TMA): TM manufactured by Vacuum Riko Co., Ltd.
-7000 Temperature rise rate 2 ° C / min. -Izod impact test: Conducted in accordance with JIS K7710. Water absorption: Weight increase rate (%) after boiling a disc-shaped test piece of 5 cm in diameter x 4 mm in water at 100 ° C for 24 hours.

【0054】[0054]

【表1】 表1 実施例 13 14 15 16 17 エポキシ樹脂 ECN ECN E1 E2 E3 硬化剤 P1 P2 PN PN PN ガラス転移温度(℃) 137 135 133 142 134 吸水率(%) 0.9 0.9 0.7 0.8 0.7 アイゾット 17 19 23 20 22Table 1 Example 13 14 15 16 17 Epoxy resin ECN ECN E1 E2 E3 Curing agent P1 P2 PN PN PN Glass transition temperature (° C.) 137 135 135 133 142 134 Water absorption (%) 0.9 0.90 0.7 0.8 0.7 Izod 17 19 23 20 22

【0055】[0055]

【表2】 表2 実施例 18 19 20 21 エポキシ樹脂 E4 E5 E6 E1 硬化剤 PN PN PN PN ガラス転移温度(℃) 144 130 140 129 吸水率(%) 0.8 0.8 0.6 0.3 アイゾット 19 21 22 29Table 2 Example 18 19 20 21 Epoxy resin E4 E5 E6 E1 Curing agent PN PN PN PN Glass transition temperature (° C) 144 130 140 129 Water absorption (%) 0.8 0.8 0.6 0. 3 Izod 19 21 22 29

【0056】[0056]

【発明の効果】本発明のフェノール類樹脂、エポキシ樹
脂は共に、従来知られている、化合物(b)とフェノー
ル類の重縮合物及びそのエポキシ化物よりも、低粘度で
あり、且つ、化合物(c)とフェノール類の重縮合物及
びそのエポキシ化物よりも、その硬化物に於て低吸水
性、高靭性を発現することが出来るため、電気・電子部
品料用、積層板(プリント配線板)やCFRP(炭素繊
維強化プラスチック)を始めとする各種複合材料、接着
剤、塗料等使用する場合に有用である。特に半導体封止
材料に使用した場合、極めて優れた耐パッケージクラッ
ク性の材料が得られる。
The phenolic resin and the epoxy resin of the present invention both have a lower viscosity than the conventionally known polycondensates of compound (b) and phenols and their epoxidized compounds, and have the compound ( c) A cured product thereof can exhibit lower water absorption and higher toughness than a polycondensation product of c) and phenols and an epoxidized product thereof. It is useful when various composite materials including CFRP (carbon fiber reinforced plastic) and the like, adhesives, paints and the like are used. In particular, when used as a semiconductor encapsulating material, an extremely excellent package crack resistant material can be obtained.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】式(1) 【化1】 (式中、複数存在するRは独立して水素原子、ハロゲン
原子、炭素数1〜8アルキル基またはアリール基を示
す。hは1〜9の整数を、またjは1〜2の整数をそれ
ぞれ表す。m、nはそれぞれ平均値を表し、0より大き
い実数であり、且つm+nが10以下である。また、基 【化2】 と基 【化3】 とは任意の順で配列している。)で表されるフェノール
類樹脂。
(1) Formula (1) (Wherein, a plurality of Rs independently represent a hydrogen atom, a halogen atom, an alkyl group or an aryl group having 1 to 8 carbon atoms. H is an integer of 1 to 9, and j is an integer of 1 to 2. M and n each represent an average value, are real numbers larger than 0, and m + n is 10 or less. And the group And are arranged in any order. The phenolic resin represented by).
【請求項2】請求項1記載のフェノール類樹脂のフェノ
ール性水酸基をグリシジル化することにより得られるエ
ポキシ樹脂。
2. An epoxy resin obtained by glycidylating a phenolic hydroxyl group of the phenolic resin according to claim 1.
【請求項3】(a)フェノール類、(b)式(2) 【化4】 (式中Xはハロゲン原子、メトキシ基または水酸基を示
す。複数存在するRは独立して水素原子、ハロゲン原
子、炭素数1〜8アルキル基またはアリール基を示
す。)で表される化合物及び(c)式(3) 【化5】 (式中Xはハロゲン原子、メトキシ基または水酸基を示
す。複数存在するRは独立して水素原子、ハロゲン原
子、炭素数1〜8アルキル基またはアリール基を示
す。)で表される化合物とを重縮合させ得られるフェノ
ール類樹脂の製造方法において、(b)成分と(c)成
分の配合比がモル比で(b)/(c)=0.1以上、4
以下であることを特徴とする請求項1記載のフェノール
類樹脂の製造方法。
(3) (a) a phenol, (b) a compound of the formula (2) (Wherein X represents a halogen atom, a methoxy group or a hydroxyl group; a plurality of Rs independently represent a hydrogen atom, a halogen atom, a C1-8 alkyl group or an aryl group) and ( c) Formula (3) (Wherein X represents a halogen atom, a methoxy group or a hydroxyl group; a plurality of Rs independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group). In the method for producing a phenolic resin obtained by polycondensation, the mixing ratio of the component (b) and the component (c) is (b) / (c) = 0.1 or more in a molar ratio.
The method for producing a phenolic resin according to claim 1, wherein:
【請求項4】請求項3記載の製造方法により得られるフ
ェノール類樹脂のフェノール性水酸基をグリシジル化す
ることにより得られるエポキシ樹脂。
4. An epoxy resin obtained by glycidylating a phenolic hydroxyl group of a phenolic resin obtained by the production method according to claim 3.
【請求項5】請求項1または3記載のフェノール類樹脂
を含有するエポキシ樹脂組成物。
5. An epoxy resin composition containing the phenolic resin according to claim 1.
【請求項6】請求項2または4記載のエポキシ樹脂を含
有するエポキシ樹脂組成物。
6. An epoxy resin composition containing the epoxy resin according to claim 2 or 4.
【請求項7】請求項1または3記載のフェノール類樹脂
と、請求項2または4記載のエポキシ樹脂を含有するエ
ポキシ樹脂組成物。
7. An epoxy resin composition comprising the phenolic resin according to claim 1 or 3 and the epoxy resin according to claim 2 or 4.
【請求項8】半導体封止用に調製された請求項5、6及
び7のいずれか1項に記載のエポキシ樹脂組成物。
8. The epoxy resin composition according to claim 5, which is prepared for encapsulating a semiconductor.
【請求項9】請求項5、6、7及び8のいずれか1項に
記載のエポキシ樹脂組成物を硬化してなる硬化物。
9. A cured product obtained by curing the epoxy resin composition according to any one of claims 5, 6, 7, and 8.
JP30354496A 1996-10-30 1996-10-30 Phenolic resins, epoxy resins, epoxy resin compositions and cured products thereof Expired - Fee Related JP3636409B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008156553A (en) * 2006-12-26 2008-07-10 Ube Ind Ltd Low-melt-viscosity phenol novolak resin, its preparation method and its use
JP2008189708A (en) * 2007-02-01 2008-08-21 Ube Ind Ltd Low-melt viscosity phenol novolak resin, method for producing the same and cured product of epoxy resin using the same
JP2012167289A (en) * 2005-08-31 2012-09-06 Ube Industries Ltd Phenol novolac resin, method for producing the same, and epoxy resin composition and cured product produced by using the same
KR20160133017A (en) * 2011-12-09 2016-11-21 아사히 가세이 이-매터리얼즈 가부시키가이샤 Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012167289A (en) * 2005-08-31 2012-09-06 Ube Industries Ltd Phenol novolac resin, method for producing the same, and epoxy resin composition and cured product produced by using the same
JP2008156553A (en) * 2006-12-26 2008-07-10 Ube Ind Ltd Low-melt-viscosity phenol novolak resin, its preparation method and its use
JP2008189708A (en) * 2007-02-01 2008-08-21 Ube Ind Ltd Low-melt viscosity phenol novolak resin, method for producing the same and cured product of epoxy resin using the same
KR20160133017A (en) * 2011-12-09 2016-11-21 아사히 가세이 이-매터리얼즈 가부시키가이샤 Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device

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