JP2008019449A - Method of preparing epoxy resin - Google Patents

Method of preparing epoxy resin Download PDF

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JP2008019449A
JP2008019449A JP2007227355A JP2007227355A JP2008019449A JP 2008019449 A JP2008019449 A JP 2008019449A JP 2007227355 A JP2007227355 A JP 2007227355A JP 2007227355 A JP2007227355 A JP 2007227355A JP 2008019449 A JP2008019449 A JP 2008019449A
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epoxy resin
weight
parts
trimethylphenol
xylenol
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Kenichi Kuboki
健一 窪木
Yoshiro Shimamura
芳郎 嶋村
Katsuhiko Oshimi
克彦 押見
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Nippon Kayaku Co Ltd
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Nippon Kayaku Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of preparing an epoxy resin composition useful as a plastics raw material; a thermosetting resin material; an antioxidant; a component for an electric/electronic part insulating material, an adhesive, a paint, and a molding material; and an intermediate for various industrial uses. <P>SOLUTION: The method of preparing an epoxy resin composition comprises the steps of: condensation polymerizing, under an existence of a basic catalyst, one or more types of phenols selected from the group consisting of a cresol, a xylenol, a trimethylphenol, 2-tert-butyl-5-methyl-phenol, 2-tert-butyl-4-methylphenol, an octylphenol, a phenylphenol, a diphenylphenol, 2,3,6-trimethylphenol, guaiacol, hydroquinone, a resorcin, a catechol, a naphthol, a dihydroxynaphthalene, a methyl naphthol, and an allylphenol, and a compound represented by Formula 4 (wherein X is an oxygen atom or a sulfur atom, plural Qs are each an hydrogen atom or 1-5C alkyl group, and j is an integer of 1 to 3), to prepare a phenolic compound; and reacting the phenolic compound with an epihalohydrin. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は高信頼性半導体封止用を始めとする電気・電子部品絶縁材料用、及び積層板(プリント配線板)やCFRP(炭素繊維強化プラスチック)を始めとする各種複合材料用、接着剤、塗料等に有用なエポキシ樹脂の製造方法に関するものである。 The present invention is used for insulating materials for electrical and electronic parts including those for highly reliable semiconductor sealing, and for various composite materials including laminated boards (printed wiring boards) and CFRP (carbon fiber reinforced plastics), adhesives, The present invention relates to a method for producing an epoxy resin useful for paints and the like.

エポキシ樹脂は作業性及びその硬化物の優れた電気特性、耐熱性、接着性、耐湿性(耐水性)等により電気・電子部品、構造用材料、接着剤、塗料等の分野で幅広く用いられている。 Epoxy resins are widely used in the fields of electrical and electronic parts, structural materials, adhesives, paints, etc. due to their workability and excellent electrical properties, heat resistance, adhesion, moisture resistance (water resistance), etc. Yes.

しかし、近年特に電気・電子分野においてはその発展に伴い、高純度化をはじめ耐湿性、密着性、フィラーを高充填させるための低粘度化等の樹脂の諸特性の一層の向上が求められている。また、構造材としては航空宇宙材料、レジャー・スポーツ器具用途などにおいて軽量で機械物性の優れた材料が求められている。これらの要求に対し、エポキシ樹脂及びこれを含有する樹脂組成物について多くの提案がなされてはいるが、未だ充分とはいえない。 However, in recent years, especially in the electric and electronic fields, further improvements in various properties of the resin such as high purity, moisture resistance, adhesion, and low viscosity for high filler filling are required. Yes. In addition, as a structural material, a lightweight material with excellent mechanical properties is required for aerospace materials and leisure / sports equipment applications. In response to these requirements, many proposals have been made for epoxy resins and resin compositions containing them, but they are still not sufficient.

本発明は、その硬化物において優れた低粘度性、耐湿性(耐水性)、耐衝撃性、密着性を示す電気電子部品用絶縁材料(高信頼性半導体封止材料など)及び積層板(プリント配線板など)やCFRPを始めとする各種複合材料用、接着剤、塗料等に有用なエポキシ樹脂の製造方法を提供するものである。 The present invention provides an insulating material for electrical and electronic parts (such as a highly reliable semiconductor encapsulating material) and a laminate (print) that exhibit excellent low viscosity, moisture resistance (water resistance), impact resistance, and adhesion in the cured product. The present invention provides a method for producing an epoxy resin useful for various composite materials including wiring boards and the like, CFRP, adhesives, paints, and the like.

本発明者らは前記のような特性をエポキシ樹脂、エポキシ樹脂組成物及びその硬化物に付与する方法について鋭意研究の結果、本発明を完成した。即ち、本発明は、(1)クレゾール、キシレノール(ジメチルフェノール)、トリメチルフェノール、2−tertブチル−5−メチルフェノール、2−tertブチル−4−メチルフェノール、オクチルフェノール、フェニルフェノール、ジフェニルフェノール、2,3,6−トリメチルフェノール、グアヤコール、ヒドロキノン、レゾルシン、カテコール、ナフトール、ジヒドロキシナフタレン、メチルナフトール、アリルフェノールから選ばれる1種以上のフェノール類と下記式(4)

Figure 2008019449
(式中、Xは酸素原子または硫黄原子を示す。複数存在するQは独立して水素原子または炭素数1〜5のアルキル基を示す。jは1〜3の整数を示す)で表される化合物を塩基性触媒の存在下に縮重合し、フェノール性化合物を調製し、これとエピハロヒドリン類を反応させることを特徴とするエポキシ樹脂の製造方法
(2)フェノール類が2,6キシレノール、2,5−キシレノール、2,3,6−トリメチルフェノール、2−tertブチル−5−メチルフェノールから選ばれる1種以上である上記(1)記載のエポキシ樹脂の製造方法
に関する。 The inventors of the present invention have completed the present invention as a result of intensive studies on methods for imparting the above properties to epoxy resins, epoxy resin compositions and cured products thereof. That is, the present invention comprises (1) cresol, xylenol (dimethylphenol), trimethylphenol, 2-tertbutyl-5-methylphenol, 2-tertbutyl-4-methylphenol, octylphenol, phenylphenol, diphenylphenol, 2, One or more phenols selected from 3,6-trimethylphenol, guaiacol, hydroquinone, resorcin, catechol, naphthol, dihydroxynaphthalene, methylnaphthol, and allylphenol, and the following formula (4)
Figure 2008019449
(In the formula, X represents an oxygen atom or a sulfur atom. A plurality of Qs independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. J represents an integer of 1 to 3). A method for producing an epoxy resin characterized in that a compound is subjected to polycondensation in the presence of a basic catalyst to prepare a phenolic compound and this is reacted with an epihalohydrin. (2) The phenol is 2,6 xylenol, 2, It is related with the manufacturing method of the epoxy resin of the said (1) description which is 1 or more types chosen from 5-xylenol, 2,3,6-trimethylphenol, and 2-tertbutyl-5-methylphenol.

本発明の製造方法により得られるエポキシ樹脂を含有するエポキシ樹脂組成物はその硬化物において優れた耐湿性(耐水性)、耐衝撃性、密着性を有するため、電気電子部品用絶縁材料(高信頼性半導体封止材料など)及び積層板(プリント配線板など)やCFRPを始めとする各種複合材料、接着剤、塗料等に使用する場合に極めて有用である。特に、半導体封止材に用いた場合、優れた耐半田クラック性を有する。 Since the epoxy resin composition containing the epoxy resin obtained by the production method of the present invention has excellent moisture resistance (water resistance), impact resistance and adhesion in the cured product, it is an insulating material for electrical and electronic parts (high reliability) It is extremely useful when used for various composite materials including adhesive semiconductor sealing materials, laminated boards (printed wiring boards, etc.) and CFRP, adhesives, paints, and the like. In particular, when used as a semiconductor encapsulant, it has excellent solder crack resistance.

本発明の製造方法は、特定のフェノール類と下記(4)

Figure 2008019449
The production method of the present invention comprises a specific phenol and the following (4):
Figure 2008019449

(式中、Xは酸素原子または硫黄原子を示す。複数存在するQは独立して水素原子または炭素数1〜5のアルキル基を示す。jは1〜3の整数を示す)で表される化合物を塩基性触媒と必要により溶媒の存在下で縮重合して得られるフェノール性化合物とエピハロヒドリン類を反応させる。 (In the formula, X represents an oxygen atom or a sulfur atom. A plurality of Qs independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. J represents an integer of 1 to 3). A phenolic compound obtained by condensation polymerization of the compound in the presence of a basic catalyst and, if necessary, a solvent is reacted with an epihalohydrin.

式(4)の化合物としては例えばフルフラール、3−フルアルデヒド、3−メチルフルフラール、5−メチルフルフラール、5−エチルフルフラール、2−チオフェンカルボキシアルデヒド、3−チオフェンカルボキシアルデヒド、3−メチル−2−チオフェンカルボキシアルデヒド等が挙げられるが、これらに限定される物ではなく、単独でも2種以上併用してもよい。 Examples of the compound of the formula (4) include furfural, 3-furaldehyde, 3-methylfurfural, 5-methylfurfural, 5-ethylfurfural, 2-thiophenecarboxaldehyde, 3-thiophenecarboxaldehyde, 3-methyl-2-thiophene. Carboxaldehyde etc. are mentioned, However, It is not limited to these, You may use individually or in combination of 2 or more types.

フェノール類としては、クレゾール、キシレノール(ジメチルフェノール)、トリメチルフェノール、2−tertブチル−5−メチルフェノール、2−tertブチル−4−メチルフェノール、オクチルフェノール、フェニルフェノール、ジフェニルフェノール、2,3,6−トリメチルフェノール、グアヤコール、ヒドロキノン、レゾルシン、カテコール、ナフトール、ジヒドロキシナフタレン、メチルナフトール、アリルフェノール
から選ばれる1種以上が使用される。
フェノール類の使用量は、式(4)の化合物1モルに対し、通常1.5〜20倍モル、好ましくは1.8〜10倍モルである。
Examples of phenols include cresol, xylenol (dimethylphenol), trimethylphenol, 2-tertbutyl-5-methylphenol, 2-tertbutyl-4-methylphenol, octylphenol, phenylphenol, diphenylphenol, 2,3,6- One or more selected from trimethylphenol, guaiacol, hydroquinone, resorcin, catechol, naphthol, dihydroxynaphthalene, methylnaphthol, and allylphenol are used.
The usage-amount of phenol is 1.5-20 times mole normally with respect to 1 mol of compounds of Formula (4), Preferably it is 1.8-10 times mole.

溶媒としては、メタノール、エタノール、プロパノール、イソプロパノール、トルエン、キシレンなどが挙げられるがこれらに限定される物ではなく、単独でも2種以上併用してもよい。溶媒を使用する場合、その使用量はフェノール類100重量部に対し、通常5〜500重量部、好ましくは10〜300重量部の範囲である。 Examples of the solvent include methanol, ethanol, propanol, isopropanol, toluene, xylene and the like. However, the solvent is not limited to these and may be used alone or in combination of two or more. When a solvent is used, the amount used is usually 5 to 500 parts by weight, preferably 10 to 300 parts by weight, per 100 parts by weight of phenols.

触媒としては塩基性化合物を使用する。また、有機金属化合物を用いる方法もあるが、コスト的に不利である。塩基性触媒の具体例としては、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物、水酸化マグネシウム、水酸化カルシウム等のアルカリ土類金属水酸化物、ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド、カリウム−tert−ブトキシド等のアルカリ金属アルコキシド、マグネシウムメトキシド、マグネシウムエトキシド等のアルカリ土類金属アルコキシド等が挙げられるが、これらに限定される物ではなく、単独でも2種以上を併用してもよい。触媒の使用量は、フェノール類1モルに対し、通常0.005〜2.0倍モル、好ましくは0.01〜1.1倍モルである。 A basic compound is used as the catalyst. Moreover, although there is a method using an organometallic compound, it is disadvantageous in terms of cost. Specific examples of the basic catalyst include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide, alkaline earth metal hydroxides such as magnesium hydroxide and calcium hydroxide, sodium methoxide, sodium Alkali metal alkoxides such as ethoxide, potassium methoxide, potassium ethoxide, potassium tert-butoxide, and alkaline earth metal alkoxides such as magnesium methoxide and magnesium ethoxide are exemplified, but not limited thereto. These may be used alone or in combination of two or more. The usage-amount of a catalyst is 0.005-2.0 times mole normally with respect to 1 mol of phenols, Preferably it is 0.01-1.1 times mole.

反応は、式(4)の化合物とフェノール類と(必要により溶媒)の混合物中に塩基性触媒を加えて加熱して行う。また、フェノール類と触媒(必要により溶媒)の混合物を加熱しているところに式(4)の化合物を徐々に添加してもよい。反応時間は5〜100時間、反応温度は通常50〜150℃である。反応終了後は中和してから、濾過あるいは加熱減圧下において未反応原料及び溶媒類を除去する事によりフェノール性化合物が得られる。 The reaction is carried out by adding a basic catalyst to a mixture of the compound of formula (4), phenols and (optionally a solvent) and heating. Moreover, you may add the compound of Formula (4) gradually to the place which is heating the mixture of phenols and a catalyst (a solvent if needed). The reaction time is 5 to 100 hours, and the reaction temperature is usually 50 to 150 ° C. After completion of the reaction, neutralization is performed, and then the phenolic compound is obtained by removing unreacted raw materials and solvents under filtration or heating under reduced pressure.

フェノール性化合物のエポキシ化反応に使用されるエピハロヒドリン類としては、エピクロルヒドリン、エピブロムヒドリン、エピヨードヒドリン、β−メチルエピクロルヒドリン、β−メチルエピブロムヒドリン、β−エチルエピクロルヒドリン等があるが、工業的に入手し易く安価なエピクロルヒドリンが好ましい。この反応は従来公知の方法に準じて行うことが出来る。 Epihalohydrins used for the epoxidation reaction of phenolic compounds include epichlorohydrin, epibromhydrin, epiiodohydrin, β-methylepichlorohydrin, β-methylepibromhydrin, β-ethylepichlorohydrin, and the like. Epichlorohydrin that is industrially easily available and inexpensive is preferred. This reaction can be performed according to a conventionally known method.

例えばフェノール性化合物とエピハロヒドリン類の混合物に水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物の固体を一括または徐々に添加しながら20〜120℃で1〜20時間反応させる。この際アルカリ金属水酸化物は水溶液を使用してもよく、その場合は該アルカリ金属水酸化物を連続的に添加すると共に反応系内から減圧下、または常圧下、連続的に水及びエピハロヒドリン類を留出せしめ更に分液し水は除去しエピハロヒドリン類は反応系内に連続的に戻す方法でもよい。 For example, it is made to react at 20-120 degreeC for 1 to 20 hours, adding alkali metal hydroxide solids, such as sodium hydroxide and potassium hydroxide, to the mixture of a phenolic compound and epihalohydrins collectively or gradually. At this time, the alkali metal hydroxide may be used in the form of an aqueous solution. In that case, the alkali metal hydroxide is continuously added and water and epihalohydrins are continuously added under reduced pressure or normal pressure from within the reaction system. The water may be removed and the epihalohydrins may be continuously returned to the reaction system.

上記の方法においてエピハロヒドリン類の使用量はフェノール性化合物の水酸基1当量に対して通常0.5〜20モル、好ましくは0.7〜10モルである。アルカリ金属水酸化物の使用量はフェノール性化合物の水酸基1当量に対し通常0.5〜1.5モル、好ましくは0.7〜1.2モルである。また、上記反応においてジメチルスルホン、ジメチルスルホキシド、ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン等の非プロトン性極性溶媒を添加することにより加水分解性ハロゲン濃度の低いエポキシ樹脂が得られ、電子材料封止材としての用途に適する。非プロトン性極性溶媒の使用量はエピハロヒドリン類の重量に対し通常5〜200重量%、好ましくは10〜100重量%である。また前記の溶媒以外にもメタノール、エタノール等のアルコール類を添加することによっても反応が進み易くなる。またトルエン、キシレン、ジオキサン等も使用することができる。 In said method, the usage-amount of epihalohydrins is 0.5-20 mol normally with respect to 1 equivalent of hydroxyl groups of a phenolic compound, Preferably it is 0.7-10 mol. The usage-amount of an alkali metal hydroxide is 0.5-1.5 mol normally with respect to 1 equivalent of hydroxyl groups of a phenolic compound, Preferably it is 0.7-1.2 mol. In addition, an epoxy resin having a low hydrolyzable halogen concentration is obtained by adding an aprotic polar solvent such as dimethyl sulfone, dimethyl sulfoxide, dimethylformamide, 1,3-dimethyl-2-imidazolidinone in the above reaction, Suitable for use as an electronic material sealing material. The amount of the aprotic polar solvent used is usually 5 to 200% by weight, preferably 10 to 100% by weight, based on the weight of the epihalohydrin. In addition to the above solvent, the reaction can easily proceed by adding alcohols such as methanol and ethanol. In addition, toluene, xylene, dioxane and the like can also be used.

また、フェノール性化合物と過剰のエピハロヒドリン類の混合物にテトラメチルアンモニウムクロライド、テトラメチルアンモニウムブロマイド、トリメチルベンジルアンモニウムクロライドなどの第四級アンモニウム塩を触媒として使用し、50℃〜150℃で1〜20時間反応させて得られたフェノール性化合物のハロヒドリンエーテルに水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物の固体または水溶液を加え、20〜120℃で1〜20時間反応させてハロヒドリンエーテルを閉環させて本発明のエポキシ樹脂を得ることもできる。この場合の第四級アンモニウム塩の使用量はフェノール性化合物の水酸基1当量に対して通常0.001〜0.2モル、好ましくは0.05〜0.1モルである。 Moreover, quaternary ammonium salts such as tetramethylammonium chloride, tetramethylammonium bromide, and trimethylbenzylammonium chloride are used as a catalyst in a mixture of a phenolic compound and an excess of epihalohydrin, and the reaction is performed at 50 to 150 ° C. for 1 to 20 hours. A halohydrin ether of a phenolic compound obtained by the reaction is added with a solid or aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide and reacted at 20 to 120 ° C. for 1 to 20 hours to react with the halohydride. The epoxy resin of the present invention can also be obtained by ring closure of a phosphorus ether. In this case, the amount of the quaternary ammonium salt used is usually 0.001 to 0.2 mol, preferably 0.05 to 0.1 mol, relative to 1 equivalent of the hydroxyl group of the phenolic compound.

通常、これらの反応物は水洗後、または水洗無しに加熱減圧下過剰のエピハロヒドリン類を除去した後、トルエン、キシレン、メチルイソブチルケトン等の溶媒に溶解し、水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物の水溶液を加えて再び反応を行う。この場合アルカリ金属水酸化物の使用量はフェノール性化合物の水酸基1当量に対して通常0.01〜0.2モル、好ましくは0.05〜0.1モルである。反応温度は通常50〜120℃、反応時間は通常0.5〜2時間である。 Usually, these reactants are washed with water, or after removing excess epihalohydrin under heating and decompression without washing with water, and then dissolved in a solvent such as toluene, xylene, methyl isobutyl ketone, and the like, and then an alkali such as sodium hydroxide or potassium hydroxide. The reaction is carried out again by adding an aqueous solution of metal hydroxide. In this case, the amount of the alkali metal hydroxide used is usually 0.01 to 0.2 mol, preferably 0.05 to 0.1 mol, relative to 1 equivalent of the hydroxyl group of the phenolic compound. The reaction temperature is usually 50 to 120 ° C., and the reaction time is usually 0.5 to 2 hours.

反応終了後副生した塩をろ過、水洗などにより除去し、さらに加熱減圧下トルエン、キシレン、メチルイソブチルケトン等の溶媒を留去することにより加水分解性ハロゲンの少ないエポキシ樹脂を得ることができる。 After completion of the reaction, the by-produced salt is removed by filtration, washing with water, etc., and an epoxy resin with less hydrolyzable halogen can be obtained by distilling off a solvent such as toluene, xylene, methyl isobutyl ketone under heating and reduced pressure.

また、フェノール性化合物の合成工程とエポキシ化の工程を連続して行うこともできる。例えば、式(4)の化合物とフェノール類とを前記方法にて反応させた後、中和や濾過、加熱減圧下における蒸留などによって未反応原料及び溶媒類を除去する事なしに、系内に直接エピハロヒドリン類を加え、前記方法にてエポキシ化を行い、最後の溶媒留去の段階で未反応原料のエポキシ化物を溶媒と共に留去すればよい。 Moreover, the synthesis | combination process of a phenolic compound and the process of epoxidation can also be performed continuously. For example, after reacting the compound of formula (4) with phenols by the above-described method, neutralization, filtration, distillation under heating under reduced pressure, etc., without removing unreacted raw materials and solvents, The epihalohydrins are directly added, epoxidized by the above-mentioned method, and the epoxidized material of the unreacted raw material is distilled off together with the solvent at the final solvent distillation stage.

このようにして得られたエポキシ樹脂(以下、本発明のエポキシ樹脂という)は、硬化剤と混合してエポキシ樹脂組成物(以下、本発明のエポキシ樹脂組成物という)として使用することができる。本発明のエポキシ樹脂組成物において、本発明のエポキシ樹脂は、単独でまたは他のエポキシ樹脂と併用して使用することが出来る。併用する場合、本発明のエポキシ樹脂の全エポキシ樹脂中に占める割合は20重量%以上が好ましく、特に30重量%以上が好ましい。 The epoxy resin thus obtained (hereinafter referred to as the epoxy resin of the present invention) can be mixed with a curing agent and used as an epoxy resin composition (hereinafter referred to as the epoxy resin composition of the present invention). In the epoxy resin composition of the present invention, the epoxy resin of the present invention can be used alone or in combination with other epoxy resins. When used in combination, the proportion of the epoxy resin of the present invention in the total epoxy resin is preferably 20% by weight or more, particularly preferably 30% by weight or more.

本発明のエポキシ樹脂と併用されうるエポキシ樹脂の具体例としては、ノボラック型エポキシ樹脂、トリスフェノール型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、脂環式エポキシ樹脂、ビフェノ−ル型エポキシ樹脂、グリシジルアミン系エポキシ樹脂、グリシジルエステル系エポキシ樹脂等が挙げられるがこれらに限定されるものではない。これらは単独で用いてもよく、2種以上を混合して使用してもよい。 Specific examples of epoxy resins that can be used in combination with the epoxy resin of the present invention include novolac type epoxy resins, trisphenol type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, and alicyclic epoxies. Resins, biphenol type epoxy resins, glycidyl amine epoxy resins, glycidyl ester epoxy resins and the like are exemplified, but not limited thereto. These may be used alone or in combination of two or more.

本発明のエポキシ樹脂組成物において使用できる硬化剤の具体例としては、脂肪族ポリアミン、芳香族ポリアミン、ポリアミドポリアミン等のアミン系硬化剤、無水ヘキサヒドロフタル酸、無水メチルテトラヒドロフタル酸等の酸無水物系硬化剤、フェノール類ノボラック、トリスフェノールメタン、フェノール類・ジシクロペンタジエン重合物、フェノール類・キシリレングリコール類重縮合物、フェノール類・ビフェニルジメタノール類重縮合物等のフェノール系硬化剤、三弗化ホウ素等のルイス酸またはそれらの塩類、ジシアンジアミド類などが挙げられるが、これらに限定されるものではない。これらは単独で用いてもよく、2種以上併用してもよい。 Specific examples of curing agents that can be used in the epoxy resin composition of the present invention include amine-based curing agents such as aliphatic polyamines, aromatic polyamines, and polyamide polyamines, and acid anhydrides such as hexahydrophthalic anhydride and methyltetrahydrophthalic anhydride. Physical curing agents, phenolic novolaks, trisphenolmethane, phenolic / dicyclopentadiene polymer, phenolic / xylylene glycols polycondensates, phenolic / biphenyldimethanols polycondensates, Examples thereof include, but are not limited to, Lewis acids such as boron trifluoride or salts thereof, dicyandiamides, and the like. These may be used alone or in combination of two or more.

本発明のエポキシ樹脂組成物において、硬化剤の使用量は、エポキシ樹脂のエポキシ基1当量に対して0.5〜1.5当量が好ましく特に0.6〜1.2当量が好ましい。 In the epoxy resin composition of the present invention, the amount of the curing agent used is preferably 0.5 to 1.5 equivalents, particularly preferably 0.6 to 1.2 equivalents, relative to 1 equivalent of the epoxy group of the epoxy resin.

本発明のエポキシ樹脂組成物は必要により硬化促進剤を含有する。用いうる硬化促進剤の具体例としては、2−メチルイミダゾール、2−エチルイミダゾール等のイミダゾール系化合物、トリス−(ジメチルアミノメチル)フェノール等の第3アミン系化合物、トリフェニルホスフィン、トリオクチルホスフィン、トリシクロヘキシルホスフィン、トリフェニルホスフィン・トリフェニルボラン、テトラフェニルホスホニウム・テトラフェニルボレート等のホスフィン系化合物、三フッ化ホウ素等を始め公知の硬化促進剤が挙げられるが、これらに特に限定されるものではない。硬化促進剤はエポキシ樹脂100重量部に対して0.01〜15重量部が必要に応じ用いられる。 The epoxy resin composition of the present invention contains a curing accelerator as necessary. Specific examples of the curing accelerator that can be used include imidazole compounds such as 2-methylimidazole and 2-ethylimidazole, tertiary amine compounds such as tris- (dimethylaminomethyl) phenol, triphenylphosphine, trioctylphosphine, Known curing accelerators include phosphine compounds such as tricyclohexylphosphine, triphenylphosphine / triphenylborane, tetraphenylphosphonium / tetraphenylborate, and boron trifluoride, but are not particularly limited to these. Absent. If necessary, the curing accelerator is used in an amount of 0.01 to 15 parts by weight based on 100 parts by weight of the epoxy resin.

本発明のエポキシ樹脂組成物には、更に必要に応じて通常用いられる添加剤を配合することが出来る。用いうる添加剤の具体例としては、ポリブタジエン及びこの変性物、アクリロニトリル共重合体の変性物、ポリフェニレンエーテル、ポリスチレン、ポリエチレン、ポリイミド、フッ素樹脂、マレイミド系化合物、シアネートエステル系化合物、シリコーンゲル、シリコーンオイル、並びにシリカ、アルミナ、炭酸カルシウム、石英粉、アルミニウム粉末、グラファイト、タルク、クレー、酸化鉄、酸化チタン、窒化アルミニウム、アスベスト、マイカ、ガラス粉末、ガラス繊維、ガラス不織布または、カーボン繊維等の無機充填材、シランカップリング剤のような充填材の表面処理剤、離型剤、カーボンブラック、フタロシアニンブルー、フタロシアニングリーン等の着色剤が挙げられる。 The epoxy resin composition of the present invention may further contain additives that are usually used as necessary. Specific examples of additives that can be used include polybutadiene and modified products thereof, modified products of acrylonitrile copolymer, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, maleimide compounds, cyanate ester compounds, silicone gel, and silicone oil. As well as silica, alumina, calcium carbonate, quartz powder, aluminum powder, graphite, talc, clay, iron oxide, titanium oxide, aluminum nitride, asbestos, mica, glass powder, glass fiber, glass nonwoven fabric or carbon fiber, etc. Coloring agents such as materials, surface treatment agents for fillers such as silane coupling agents, mold release agents, carbon black, phthalocyanine blue, and phthalocyanine green.

本発明のエポキシ樹脂組成物は、上記各成分を所定の割合で均一に混合することにより得られ、通常130〜180℃で30〜500秒で予備硬化し、更に、150〜250℃で2〜15時間、後硬化することにより充分な硬化反応が進行し、硬化物が得られる。又、エポキシ樹脂組成物の成分を溶剤等に均一に分散または溶解させ、溶媒を除去した後硬化させることもできる。 The epoxy resin composition of the present invention is obtained by uniformly mixing the above components at a predetermined ratio, and is usually precured at 130 to 180 ° C. for 30 to 500 seconds, and further at 150 to 250 ° C. A sufficient curing reaction proceeds by post-curing for 15 hours, and a cured product is obtained. Alternatively, the components of the epoxy resin composition can be uniformly dispersed or dissolved in a solvent or the like, and the solvent can be removed and then cured.

こうして得られる硬化物は、高耐熱性、耐湿性、高接着性を有する。従って、本発明のエポキシ樹脂は、耐熱性、耐湿性、接着性の要求される広範な分野で用いることが出来る。具体的には、絶縁材料、積層板、封止材料等あらゆる電気・電子材料の配合成分として有用である。又、成形材料、複合材料の他、塗料材料、接着剤等の分野にも用いることが出来る。 The cured product thus obtained has high heat resistance, moisture resistance, and high adhesion. Therefore, the epoxy resin of the present invention can be used in a wide range of fields where heat resistance, moisture resistance and adhesion are required. Specifically, it is useful as a blending component for all electric / electronic materials such as insulating materials, laminates, and sealing materials. In addition to molding materials and composite materials, they can also be used in fields such as paint materials and adhesives.

以下本発明を製造例、実施例により更に詳細に説明する。尚、本発明はこれら実施例に限定されるものではない。また実施例において、エポキシ当量、溶融粘度、軟化点、加水分解性塩素濃度は以下の条件で測定した。
1)エポキシ当量:JIS K−7236に準じた方法で測定した。
2)溶融粘度:150℃におけるコーンプレート法における溶融粘度測定機械:コーンプレート(ICI)高温粘度計(RESEARCH EQUIPMENT(LONDON)LTD. 製)
コーンNo.;3(測定範囲0〜20ポイズ)
試料量;0.15±0.005(g)
3)軟化点:JIS K−7234に準じた方法で測定
4)加水分解性塩素濃度:試料のジオキサン溶液に1N−KOHエタノール溶液を添加し、30分間環流することにより遊離する塩素量を硝酸銀滴定法により測定し、試料の重量で除した値
Hereinafter, the present invention will be described in more detail with reference to production examples and examples. The present invention is not limited to these examples. In the examples, epoxy equivalent, melt viscosity, softening point, and hydrolyzable chlorine concentration were measured under the following conditions.
1) Epoxy equivalent: Measured by a method according to JIS K-7236.
2) Melt viscosity: Melt viscosity measuring machine in cone plate method at 150 ° C: Corn plate (ICI) high temperature viscometer (manufactured by RESEARCH EQUIPMENT (LONDON) LTD.)
Corn No. ; 3 (measuring range 0-20 poise)
Sample amount: 0.15 ± 0.005 (g)
3) Softening point: measured by a method according to JIS K-7234 4) Hydrolyzable chlorine concentration: 1N-KOH ethanol solution was added to the sample dioxane solution and refluxed for 30 minutes. Value measured by the method and divided by the weight of the sample

実施例1
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、2,6−キシレノール244重量部、メタノール122重量部、水酸化ナトリウム7重量部を仕込み、撹拌、溶解後、加熱して還流状態としたところへ、フルフラール96重量部を2時間で滴下した。その後還流温度で15時間反応させた後、20%燐酸二水素ナトリウム水溶液140重量部で中和し、水を500重量部加えた。ついで析出した結晶を濾過で回収し、メタノール:水=1:1の溶液で洗浄後、減圧乾燥器で乾燥させた。その結果、4,4’−(2−フリル−メチレン)ビス[2,6−ジメチルフェノール](重縮合物(P1))304重量部を得た。融点:147℃。
得られた重縮合物(P1)161重量部に対してエピクロルヒドリン(ECH、以下同様)500重量部、ジメチルスルホキシド(DMSO、以下同様)100重量部を反応容器に仕込み、加熱、撹拌、溶解後、温度を45℃に保持しながら、反応系内を45Torrに保って、40重量%水酸化ナトリウム水溶液100重量部を4時間かけて連続的に滴下した。この際共沸により留出してくるECHと水を冷却、分液した後、有機層であるECHだけを反応系内に戻しながら反応を行った。水酸化ナトリウム水溶液滴下完了後、45℃で3時間、70℃で30分更に反応を行った。ついで水洗を繰り返し、副成塩とジメチルスルホキシドを除去した後、油層から加熱減圧下において過剰のエピクロルヒドリンを留去し、残留物に500重量部のメチルイソブチルケトンを添加し溶解した。このメチルイソブチルケトン溶液を70℃に加熱し30%水酸化ナトリウム水溶液4重量部を添加し、1時間反応させた後、反応液の水洗を洗浄液が中性となるまで繰り返した。ついで油層から加熱減圧下においてメチルイソブチルケトンを留去することにより式(5)
Example 1
A flask equipped with a stirrer, a reflux condenser, and a stirrer was charged with 244 parts by weight of 2,6-xylenol, 122 parts by weight of methanol, and 7 parts by weight of sodium hydroxide, stirred and dissolved, and then heated to reflux. By the way, 96 parts by weight of furfural was dropped in 2 hours. Thereafter, the mixture was reacted at reflux temperature for 15 hours, neutralized with 140 parts by weight of a 20% aqueous sodium dihydrogen phosphate solution, and 500 parts by weight of water was added. Next, the precipitated crystals were collected by filtration, washed with a methanol: water = 1: 1 solution, and then dried in a vacuum dryer. As a result, 304 parts by weight of 4,4 ′-(2-furyl-methylene) bis [2,6-dimethylphenol] (polycondensate (P1)) was obtained. Melting point: 147 ° C.
To 161 parts by weight of the resulting polycondensate (P1), 500 parts by weight of epichlorohydrin (ECH, the same shall apply hereinafter) and 100 parts by weight of dimethyl sulfoxide (DMSO, the same shall apply hereinafter) are charged into a reaction vessel, heated, stirred and dissolved, While maintaining the temperature at 45 ° C., the reaction system was kept at 45 Torr, and 100 parts by weight of 40 wt% aqueous sodium hydroxide solution was continuously added dropwise over 4 hours. At this time, ECH and water distilled off by azeotropic distillation were cooled and separated, and then the reaction was carried out while returning only the organic layer ECH into the reaction system. After completion of dropping of the aqueous sodium hydroxide solution, the reaction was further carried out at 45 ° C. for 3 hours and at 70 ° C. for 30 minutes. Subsequently, washing with water was repeated to remove the by-product salt and dimethyl sulfoxide, and then excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure, and 500 parts by weight of methyl isobutyl ketone was added to the residue and dissolved. This methyl isobutyl ketone solution was heated to 70 ° C., 4 parts by weight of 30% aqueous sodium hydroxide solution was added and reacted for 1 hour, and then the reaction solution was washed with water until the washing solution became neutral. Then, methyl isobutyl ketone is distilled off from the oil layer under heating and reduced pressure to obtain the formula (5)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.03(平均値)である。)で表される本発明のエポキシ樹脂(E1)210重量部を得た。エポキシ樹脂(E1)のエポキシ当量は222g/eq、軟化点は45℃、溶融粘度は0.4ポイズ、加水分解性塩素濃度は370ppmであった。 (In the formula, G represents a glycidyl group, and m = 0.03 (average value).) 210 parts by weight of the epoxy resin (E1) of the present invention represented by the following formula was obtained. Epoxy resin (E1) had an epoxy equivalent of 222 g / eq, a softening point of 45 ° C., a melt viscosity of 0.4 poise, and a hydrolyzable chlorine concentration of 370 ppm.

実施例2
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、2−tertブチル−5−メチルフェノール328重量部、メタノール328重量部、水酸化ナトリウム8重量部を仕込み、撹拌、溶解後、加熱して還流状態としたところへ、フルフラール96重量部を2時間で滴下した。その後還流温度で35時間反応させた後、メタノール240重量部、水240重量部を加え、35%塩酸水溶液200重量部で中和し、ついで析出した結晶を濾過で回収し、メタノール:水=2:1の溶液で洗浄後、更にメタノールで洗浄し、減圧乾燥器で乾燥させた。その結果、4,4’−(2−フリル−メチレン)ビス[2−tertブチル−5−メチルフェノール](重縮合物(P2))332重量部を得た。融点:236〜237℃。
実施例1において重縮合物(P1)161重量部を前記で得られた重縮合物(P2)203重量部に、ECHを650重量部に、DMSOを120重量部に変えた以外は実施例1と同様の操作を行った。その結果、式(6)
Example 2
A flask equipped with a stirrer, a reflux condenser, and a stirrer was charged with 328 parts by weight of 2-tertbutyl-5-methylphenol, 328 parts by weight of methanol, and 8 parts by weight of sodium hydroxide. 96 parts by weight of furfural was dropped into the refluxed state in 2 hours. Then, after reacting at reflux temperature for 35 hours, 240 parts by weight of methanol and 240 parts by weight of water were added, neutralized with 200 parts by weight of 35% aqueous hydrochloric acid solution, and the precipitated crystals were collected by filtration, and methanol: water = 2. After washing with a 1: 1 solution, it was further washed with methanol and dried in a vacuum dryer. As a result, 332 parts by weight of 4,4 ′-(2-furyl-methylene) bis [2-tertbutyl-5-methylphenol] (polycondensate (P2)) was obtained. Melting point: 236-237 ° C.
Example 1 except that 161 parts by weight of the polycondensate (P1) in Example 1 was changed to 203 parts by weight of the polycondensate (P2) obtained above, 650 parts by weight of ECH, and 120 parts by weight of DMSO. The same operation was performed. As a result, equation (6)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.04(平均値)である。)で表される本発明のエポキシ樹脂(E2)245重量部を得た。エポキシ樹脂(E2)のエポキシ当量は270g/eq、軟化点は68℃、溶融粘度は0.4ポイズ、加水分解性塩素濃度は360ppmであった。 (In the formula, G represents a glycidyl group. M = 0.04 (average value).) 245 parts by weight of the epoxy resin (E2) of the present invention represented by the following formula was obtained. The epoxy equivalent of the epoxy resin (E2) was 270 g / eq, the softening point was 68 ° C., the melt viscosity was 0.4 poise, and the hydrolyzable chlorine concentration was 360 ppm.

実施例3
実施例1において、2,6−キシレノール244重量部を2,5−キシレノール244重量部に変えた以外は同様の操作を行ったところ、4,4’−(2−フリル−メチレン)ビス[2,5−ジメチルフェノール](重縮合物(P3))301重量部を得た。融点:192℃。
実施例1において重縮合物(P1)161重量部を前記で得られた重縮合物(P3)161重量部に変えた以外は実施例1と同様の操作を行った。その結果、式(8)
Example 3
In Example 1, the same operation was carried out except that 244 parts by weight of 2,6-xylenol was changed to 244 parts by weight of 2,5-xylenol, and 4,4 ′-(2-furyl-methylene) bis [2 , 5-dimethylphenol] (polycondensate (P3)) 301 parts by weight were obtained. Melting point: 192 ° C.
The same operation as in Example 1 was performed except that 161 parts by weight of the polycondensate (P1) in Example 1 was changed to 161 parts by weight of the polycondensate (P3) obtained above. As a result, equation (8)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.08(平均値)である。)で表される本発明のエポキシ樹脂(E3)221重量部を得た。エポキシ樹脂(E3)のエポキシ当量は232g/eq、軟化点は66℃、溶融粘度は0.5ポイズ、加水分解性塩素濃度は380ppmであった。 (In the formula, G represents a glycidyl group, and m = 0.08 (average value)). Thus, 221 parts by weight of the epoxy resin (E3) of the present invention represented by the following formula was obtained. Epoxy resin (E3) had an epoxy equivalent of 232 g / eq, a softening point of 66 ° C., a melt viscosity of 0.5 poise, and a hydrolyzable chlorine concentration of 380 ppm.

実施例4
実施例1において、2,6−キシレノール244重量部を2,3,6−トリメチルフェノール272重量部に、水酸化ナトリウムを水酸化リチウム5重量部に変えた以外は同様の操作を行ったところ、4,4’−(2−フリル−メチレン)ビス[2,3,5−トリメチルフェノール](重縮合物(P4))298重量部を得た。融点:176℃。
実施例1において重縮合物(P1)161重量部を前記で得られた重縮合物(P4)175重量部に変えた以外は実施例1と同様の操作を行った。その結果、式(9)
Example 4
In Example 1, the same operation was performed except that 244 parts by weight of 2,6-xylenol was changed to 272 parts by weight of 2,3,6-trimethylphenol and sodium hydroxide was changed to 5 parts by weight of lithium hydroxide. 298 parts by weight of 4,4 ′-(2-furyl-methylene) bis [2,3,5-trimethylphenol] (polycondensate (P4)) was obtained. Melting point: 176 ° C.
The same operation as in Example 1 was performed except that 161 parts by weight of the polycondensate (P1) in Example 1 was changed to 175 parts by weight of the polycondensate (P4) obtained above. As a result, equation (9)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.03(平均値)である。)で表される本発明のエポキシ樹脂(E4)219重量部を得た。エポキシ樹脂(E4)のエポキシ当量は238g/eq、軟化点は68℃、溶融粘度は1.0ポイズ、加水分解性塩素濃度は370ppmであった。 (In the formula, G represents a glycidyl group, and m = 0.03 (average value)). Thus, 219 parts by weight of the epoxy resin (E4) of the present invention was obtained. The epoxy equivalent of the epoxy resin (E4) was 238 g / eq, the softening point was 68 ° C., the melt viscosity was 1.0 poise, and the hydrolyzable chlorine concentration was 370 ppm.

実施例5
実施例1において、水酸化ナトリウムを水酸化リチウム5重量部に、フルフラールを2−チオフェンカルボキシアルデヒド112重量部に、反応時間を25時間に変えた以外は同様の操作を行ったところ、4,4’−(2−チエニル−メチレン)ビス[2,6−ジメチルフェノール](重縮合物(P5))307重量部を得た。融点:167℃。
実施例1において重縮合物(P1)161重量部を前記で得られた重縮合物(P5)169重量部に変えた以外は実施例1と同様の操作を行った。その結果、式(10)
Example 5
In Example 1, the same operation was performed except that sodium hydroxide was changed to 5 parts by weight of lithium hydroxide, furfural was changed to 112 parts by weight of 2-thiophenecarboxaldehyde, and the reaction time was changed to 25 hours. 307 parts by weight of '-(2-thienyl-methylene) bis [2,6-dimethylphenol] (polycondensate (P5)) was obtained. Melting point: 167 ° C.
The same operation as in Example 1 was performed except that 161 parts by weight of the polycondensate (P1) in Example 1 was changed to 169 parts by weight of the polycondensate (P5) obtained above. As a result, the formula (10)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.04(平均値)である。)で表される本発明のエポキシ樹脂(E5)216重量部を得た。エポキシ樹脂(E5)のエポキシ当量は233g/eq、軟化点は50℃、溶融粘度は0.4ポイズ、加水分解性塩素濃度は400ppmであった。 (In the formula, G represents a glycidyl group, and m = 0.04 (average value).) 216 parts by weight of the epoxy resin (E5) of the present invention represented by the following formula was obtained. Epoxy resin (E5) had an epoxy equivalent of 233 g / eq, a softening point of 50 ° C., a melt viscosity of 0.4 poise, and a hydrolyzable chlorine concentration of 400 ppm.

実施例6
実施例5において、2,6−キシレノール244重量部を2,5−キシレノール244重量部に、反応時間を30時間に変えた以外は同様の操作を行ったところ、4,4’−(2−チエニル−メチレン)ビス[2,5−ジメチルフェノール](重縮合物(P6))284重量部を得た。融点:216℃。
実施例1において重縮合物(P1)161重量部を前記で得られた重縮合物(P6)169重量部に変えた以外は実施例1と同様の操作を行った。その結果、式(11)
Example 6
In Example 5, the same operation was performed except that 244 parts by weight of 2,6-xylenol was changed to 244 parts by weight of 2,5-xylenol and the reaction time was changed to 30 hours, and 4,4 ′-(2- 284 parts by weight of thienyl-methylene) bis [2,5-dimethylphenol] (polycondensate (P6)) were obtained. Melting point: 216 ° C.
The same operation as in Example 1 was performed except that 161 parts by weight of the polycondensate (P1) in Example 1 was changed to 169 parts by weight of the polycondensate (P6) obtained above. As a result, the formula (11)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.07(平均値)である。)で表される本発明のエポキシ樹脂(E6)214重量部を得た。エポキシ樹脂(E6)のエポキシ当量は239g/eq、軟化点は71℃、溶融粘度は0.6ポイズ、加水分解性塩素濃度は390ppmであった。 (In the formula, G represents a glycidyl group, and m = 0.07 (average value)). 214 parts by weight of the epoxy resin (E6) of the present invention represented by the following formula was obtained. Epoxy resin (E6) had an epoxy equivalent of 239 g / eq, a softening point of 71 ° C., a melt viscosity of 0.6 poise, and a hydrolyzable chlorine concentration of 390 ppm.

実施例7
実施例5において、2,6−キシレノール244重量部を2,3,6−トリメチルフェノール272重量部に、反応時間を60時間に変えた以外は同様の操作を行ったところ、4,4’−(2−チエニル−メチレン)ビス[2,3,5−トリメチルフェノール](重縮合物(P7))284重量部を得た。融点:163℃。
実施例1において重縮合物(P1)161重量部を前記で得られた重縮合物(P7)183重量部に変えた以外は実施例1と同様の操作を行った。その結果、式(12)
Example 7
In Example 5, the same operation was carried out except that 244 parts by weight of 2,6-xylenol was changed to 272 parts by weight of 2,3,6-trimethylphenol and the reaction time was changed to 60 hours. 284 parts by weight of (2-thienyl-methylene) bis [2,3,5-trimethylphenol] (polycondensate (P7)) was obtained. Melting point: 163 ° C.
The same operation as in Example 1 was performed except that 161 parts by weight of the polycondensate (P1) in Example 1 was changed to 183 parts by weight of the polycondensate (P7) obtained above. As a result, equation (12)

Figure 2008019449
Figure 2008019449

(式中Gはグリシジル基を表す。またm=0.04(平均値)である。)で表される本発明のエポキシ樹脂(E7)214重量部を得た。エポキシ樹脂(E7)のエポキシ当量は248g/eq、軟化点は74℃、溶融粘度は1.4ポイズ、加水分解性塩素濃度は410ppmであった。 (Wherein G represents a glycidyl group, and m = 0.04 (average value)). 214 parts by weight of the epoxy resin (E7) according to the present invention was obtained. The epoxy equivalent of the epoxy resin (E7) was 248 g / eq, the softening point was 74 ° C., the melt viscosity was 1.4 poise, and the hydrolyzable chlorine concentration was 410 ppm.

実施例8〜14
実施例1〜7で得られたエポキシ樹脂(E1)〜(E7)を使用し、エポキシ樹脂1エポキシ当量に対して硬化剤(フェノールノボラック樹脂(日本化薬(株)製、PN−80、150℃における溶融粘度1.5ポイズ、軟化点86℃、水酸基当量106g/eq)を1水酸基当量配合し、更に硬化促進剤(トリフェニルホスフィン)をエポキシ樹脂100重量部当り1重量部配合し、トランスファー成型により樹脂成形体を調製し、160℃で2時間、更に180℃で8時間硬化させた。
Examples 8-14
The epoxy resins (E1) to (E7) obtained in Examples 1 to 7 were used, and a curing agent (phenol novolak resin (Nippon Kayaku Co., Ltd., PN-80, 150) was used for 1 epoxy equivalent of epoxy resin. Melt viscosity at 1.5 ° C., softening point of 86 ° C., hydroxyl group equivalent of 106 g / eq), 1 hydroxyl group equivalent, and further 1 part by weight of curing accelerator (triphenylphosphine) per 100 parts by weight of epoxy resin. A resin molded body was prepared by molding and cured at 160 ° C. for 2 hours and further at 180 ° C. for 8 hours.

このようにして得られた硬化物の物性を測定した結果を表1、2に示す。尚、物性値の測定は以下の方法で行った。
(a)吸水率:直径5cm×厚み4mmの円盤状の試験片を100℃の水中で24時間煮沸した後の重量増加率(%)
(b)銅箔剥離強度:180°剥離試験測定温度;30℃引っ張り速度;200mm/min銅箔;日鉱グールド(株)製 JTC箔 70μm
(c)アイゾット衝撃試験:JIS K7110に準拠して測定した。
The results of measuring the physical properties of the cured product thus obtained are shown in Tables 1 and 2. The physical property values were measured by the following methods.
(A) Water absorption rate: Rate of weight increase (%) after boiling a disk-shaped test piece having a diameter of 5 cm and a thickness of 4 mm in water at 100 ° C. for 24 hours.
(B) Copper foil peel strength: 180 ° peel test measurement temperature; 30 ° C. tensile speed; 200 mm / min copper foil; Nikko Gould Co., Ltd. JTC foil 70 μm
(C) Izod impact test: Measured according to JIS K7110.

Figure 2008019449
Figure 2008019449

Claims (2)

クレゾール、キシレノール、トリメチルフェノール、2−tertブチル−5−メチルフェノール、2−tertブチル−4−メチルフェノール、オクチルフェノール、フェニルフェノール、ジフェニルフェノール、2,3,6−トリメチルフェノール、グアヤコール、ヒドロキノン、レゾルシン、カテコール、ナフトール、ジヒドロキシナフタレン、メチルナフトール、アリルフェノールから選ばれる1種以上のフェノール類と下記式(4)
Figure 2008019449
(式中、Xは酸素原子または硫黄原子を示す。複数存在するQは独立して水素原子または炭素数1〜5のアルキル基を示す。jは1〜3の整数を示す)で表される化合物を塩基性触媒の存在下に縮重合し、フェノール性化合物を調製し、これとエピハロヒドリン類を反応させることを特徴とするエポキシ樹脂の製造方法。
Cresol, xylenol, trimethylphenol, 2-tertbutyl-5-methylphenol, 2-tertbutyl-4-methylphenol, octylphenol, phenylphenol, diphenylphenol, 2,3,6-trimethylphenol, guaiacol, hydroquinone, resorcin, One or more phenols selected from catechol, naphthol, dihydroxynaphthalene, methylnaphthol, and allylphenol, and the following formula (4)
Figure 2008019449
(In the formula, X represents an oxygen atom or a sulfur atom. A plurality of Qs independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. J represents an integer of 1 to 3). A method for producing an epoxy resin, comprising subjecting a compound to polycondensation in the presence of a basic catalyst, preparing a phenolic compound, and reacting this with an epihalohydrin.
フェノール類が2,6キシレノール、2,5−キシレノール、2,3,6−トリメチルフェノール、2−tertブチル−5−メチルフェノールから選ばれる1種以上である請求項1記載のエポキシ樹脂の製造方法。 2. The method for producing an epoxy resin according to claim 1, wherein the phenol is one or more selected from 2,6 xylenol, 2,5-xylenol, 2,3,6-trimethylphenol, and 2-tertbutyl-5-methylphenol. .
JP2007227355A 1997-01-10 2007-09-03 Method of preparing epoxy resin Pending JP2008019449A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113512175A (en) * 2021-03-31 2021-10-19 杭州安誉科技有限公司 Packaging method of photomultiplier

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07292070A (en) * 1994-04-28 1995-11-07 Toto Kasei Kk Improved novolak epoxy resin and resin composition for sealing electronic part

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07292070A (en) * 1994-04-28 1995-11-07 Toto Kasei Kk Improved novolak epoxy resin and resin composition for sealing electronic part

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113512175A (en) * 2021-03-31 2021-10-19 杭州安誉科技有限公司 Packaging method of photomultiplier
CN113512175B (en) * 2021-03-31 2023-03-24 杭州安誉科技有限公司 Packaging method of photomultiplier

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