JPH06177214A - Crimp terminal and connecting method therefor and mounting method for semiconductor device - Google Patents

Crimp terminal and connecting method therefor and mounting method for semiconductor device

Info

Publication number
JPH06177214A
JPH06177214A JP9472893A JP9472893A JPH06177214A JP H06177214 A JPH06177214 A JP H06177214A JP 9472893 A JP9472893 A JP 9472893A JP 9472893 A JP9472893 A JP 9472893A JP H06177214 A JPH06177214 A JP H06177214A
Authority
JP
Japan
Prior art keywords
terminal
crimp terminal
crimp
adhesive
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9472893A
Other languages
Japanese (ja)
Inventor
Toshio Sakata
敏夫 坂田
Takashi Yuda
孝 湯田
Shinichi Kasahara
愼一 笠原
Toshiaki Suketa
俊明 助田
Hiromichi Watanabe
広道 渡▲辺▼
Yoshiaki Maruyama
嘉昭 丸山
Eiji Hinobori
栄治 日登
Kenichi Kuroiwa
健一 黒岩
Hiroaki Kobayashi
裕明 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9472893A priority Critical patent/JPH06177214A/en
Priority to US08/061,086 priority patent/US5517752A/en
Publication of JPH06177214A publication Critical patent/JPH06177214A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29005Structure
    • H01L2224/29007Layer connector smaller than the underlying bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29199Material of the matrix
    • H01L2224/2929Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • H01L2224/83851Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive

Abstract

PURPOSE:To improve reliability on electrical connection regarding a crimp terminal maintaining electrical connection abutted against an opposite terminal with adhesives, a crimping method an the mounting method of a semiconductor device utilizing said crimp terminal. CONSTITUTION:Grooves 17a, 17b are formed on the top face of crimp terminals 6d, 6e abutted against opposite terminals, and conventional abutting surfaces are divided into a plurality of abutting surfaces 6b. Projecting sections formed by such grooves 17a, 17b are plastically deformed easily when the projecting section are abutted against the opposite terminals, and adhesives held by connecting sections are made to flow out easily. Consequently, when the contact- bonding terminals 6d, 6e are connected to the opposite terminals, the areas of connection are ensured readily, are reliability is improved. Adhesive-filling grooves are shaped on the top faces of the crimp terminals, no adhesive adheres on the abutting surfaces with the opposite terminals, and the crimp terminals are pushed at two stages and the increase of the diameters of adhesives is controlled, thus enhancing the reliability of a connecting section.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は液晶表示装置等に利用す
る圧着端子とその圧着方法、特に半導体デバイスの実装
に際し、導電性粒子を混入した異方導電性樹脂を利用す
る従来の圧着接続に代わる圧着端子と、その端子を使用
した圧着方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a crimp terminal used in a liquid crystal display device and a crimping method therefor, and more particularly to a conventional crimp connection using an anisotropic conductive resin mixed with conductive particles when mounting a semiconductor device. An alternative crimp terminal and a crimping method using the terminal.

【0002】近時、LSIの高集積化,高密度化に伴っ
て半導体デバイスの圧着端子の数は増加し、サイズは小
さくなる。従って、個々の圧着端子が対応するそれぞれ
の相手端子に対して確実に接触することと、全部の圧着
端子が相手端子に対し確実に接続されることが要求され
るのみならず、接触抵抗値が均一であることが要求され
る。
In recent years, the number of crimp terminals of a semiconductor device has increased and the size thereof has decreased with the high integration and high density of LSI. Therefore, it is not only required that each crimping terminal surely contacts the corresponding mating terminal and that all crimping terminals are securely connected to the mating terminal. It is required to be uniform.

【0003】このように、最近においては圧着端子と相
手端子との接続に高い信頼性が必要である。
As described above, recently, high reliability is required for the connection between the crimp terminal and the mating terminal.

【0004】[0004]

【従来の技術】図29は液晶表示装置の表示ユニットの構
成例を示す平面図、図30は半導体装置を搭載した絶縁フ
ィルムの一例の概略構成を示す平面図、図31は異方導電
性樹脂フィルムを利用した従来の端子接続方法の説明
図、図32はCOG接続による半導体装置実装方法の説明
図、図33は半導体装置のバンプとその接続相手端子との
間に接着剤の侵入を防ぐ従来例の説明図である。
2. Description of the Related Art FIG. 29 is a plan view showing a configuration example of a display unit of a liquid crystal display device, FIG. 30 is a plan view showing a schematic configuration of an example of an insulating film on which a semiconductor device is mounted, and FIG. 31 is an anisotropic conductive resin. FIG. 32 is an explanatory view of a conventional terminal connection method using a film, FIG. 32 is an explanatory view of a semiconductor device mounting method by COG connection, and FIG. 33 is a conventional method for preventing an adhesive from entering between a bump of a semiconductor device and a connection partner terminal thereof. It is explanatory drawing of an example.

【0005】図29において、多数本の透明電極が形成さ
れた一対のガラス基板の間隙に液晶を充填した液晶表示
パネル1と3枚のプリント配線板2a とは、表示パネル
1の駆動用ICチップ(集積回路装置)を搭載した絶縁
フィルム3にて接続し、3枚のプリント配線板2a の間
および、表示パネル1に接続しないプリント配線板2b
とプリント配線板2a との間は、ジャンパーケーブル4
にて接続する。
In FIG. 29, a liquid crystal display panel 1 in which liquid crystal is filled in a gap between a pair of glass substrates on which a large number of transparent electrodes are formed and three printed wiring boards 2a are IC chips for driving the display panel 1. A printed wiring board 2b which is connected by an insulating film 3 having (integrated circuit device) mounted thereon, and is not connected to the display panel 1 between the three printed wiring boards 2a.
And the printed wiring board 2a between the jumper cable 4
Connect with.

【0006】かかる表示ユニットにおいて、液晶表示パ
ネル1に例えば50μm ピッチの高密度に形成した電極端
子と、その電極端子と同一ピッチで絶縁フィルム3に形
成した配線端子とは、一般に熱圧着によって接続する。
In such a display unit, the electrode terminals formed on the liquid crystal display panel 1 at a high density of, for example, 50 μm pitch and the wiring terminals formed on the insulating film 3 at the same pitch as the electrode terminals are generally connected by thermocompression bonding. .

【0007】図30において、ICチップを収容した2個
の集積回路装置5を実装した耐熱性絶縁フィルム(一般
にポリイミドフィルム)3には、集積回路装置5と液晶
表示パネル1に形成した電極端子とを接続する複数本の
導体パターン6、集積回路装置5とプリント配線板2a
に形成した導体パターンとを接続する複数本の導体パタ
ーン7とを形成する。
In FIG. 30, a heat-resistant insulating film (generally a polyimide film) 3 on which two integrated circuit devices 5 accommodating IC chips are mounted has an integrated circuit device 5 and electrode terminals formed on the liquid crystal display panel 1. A plurality of conductor patterns 6 for connecting the integrated circuit device 5 and the printed wiring board 2a
A plurality of conductor patterns 7 that connect to the conductor pattern formed in 1. are formed.

【0008】導体パターン6と7は、接着剤8(図31参
照)にて絶縁フィルム4に貼着した銅箔(図示せず)を
エッチングし形成するため、その断面形状はサイドエッ
チングによって台形である。
Since the conductor patterns 6 and 7 are formed by etching a copper foil (not shown) attached to the insulating film 4 with an adhesive 8 (see FIG. 31), the cross-sectional shape thereof is trapezoidal by side etching. is there.

【0009】図31において、液晶表示パネル1のガラス
基板1aに形成した電極端子 (相手端子) 11と、導体パ
ターン6の先端の圧着端子6a とは、一般に長さ3mm程
度に渡り、熱硬化性または光硬化性の接着剤9に混入さ
れた導電性粒子10の一部10′、即ち、圧着端子6a と電
極端子11に挟まれた導電性粒子10′を介して電気的に接
続し、その接続は、ガラス基板1aと絶縁フィルム3と
の間に充填し硬化せしめた接着剤9の接着力と収縮応力
により、維持されるようになる。
In FIG. 31, an electrode terminal (counter terminal) 11 formed on the glass substrate 1a of the liquid crystal display panel 1 and a crimping terminal 6a at the tip of the conductor pattern 6 generally have a length of about 3 mm and are thermosetting. Alternatively, a part of the conductive particles 10 mixed with the photo-curable adhesive 9 is electrically connected via the conductive particles 10 'sandwiched between the crimp terminal 6a and the electrode terminal 11, The connection is maintained by the adhesive force and shrinkage stress of the adhesive 9 filled and cured between the glass substrate 1a and the insulating film 3.

【0010】導電性粒子10を混入した接着剤フィルム
は、一般に異方導電性フィルム(ACF;Anisotropic
Conductive Film)として知られている。例えばピッチが
50μm でありサイドエッチングが生じた圧着端子6a の
断面形状は、絶縁フィルム3に貼着された下面幅が約25
μm であるのに対し、電極端子11に接続する上面幅は5
μm 〜10μm 程度になる。
An adhesive film containing conductive particles 10 is generally an anisotropic conductive film (ACF; Anisotropic).
Known as Conductive Film). For example, the pitch
The cross-sectional shape of the crimp terminal 6a, which is 50 μm and in which side etching has occurred, has a width of the bottom surface of the insulating film 3 of about 25.
The width of the upper surface connected to the electrode terminal 11 is 5 μm
It will be around 10 μm.

【0011】電極端子11と圧着端子6a との電気的接続
において、圧着端子6a の上面と電極端子11との当接点
を例えば20箇所程度にしようとする場合には、約20箇の
導電性粒子10を介在させる必要がある。その際、導電性
粒子10の粒径は約5μm 以上であり、ピッチ50μm の圧
着端子6a ではその幅方向に高々1個しか存在できない
ことになる。
In the electrical connection between the electrode terminal 11 and the crimp terminal 6a, when the contact points between the upper surface of the crimp terminal 6a and the electrode terminal 11 are set to, for example, about 20 points, about 20 conductive particles are used. It is necessary to intervene 10. At that time, the particle size of the conductive particles 10 is about 5 μm or more, and only one crimp terminal 6a having a pitch of 50 μm can exist in the width direction.

【0012】図32において、半導体チップ12の下面 (フ
ェース) には50μm ×50μm 程度の複数個のパッド(圧
着端子)13を形成し、ガラス基板14にはパッド13を接続
する導体端子15を形成し、パッド13を導体端子15に当接
せしめた電気的接続は、半導体チップ12と基板14との間
に充填し硬化させた接着剤16の接着力と収縮応力により
維持せしめる。一般に接着剤16には熱硬化性または光
(紫外線)硬化性のものを使用する。
In FIG. 32, a plurality of pads (crimp terminals) 13 of about 50 μm × 50 μm are formed on the lower surface (face) of the semiconductor chip 12, and conductor terminals 15 for connecting the pads 13 are formed on the glass substrate 14. Then, the electrical connection in which the pad 13 is brought into contact with the conductor terminal 15 is maintained by the adhesive force and shrinkage stress of the adhesive 16 filled and cured between the semiconductor chip 12 and the substrate 14. Generally, a thermosetting or light (ultraviolet) curable adhesive is used as the adhesive 16.

【0013】図33の従来方法は特開昭62−132331号公報
に開示されたものであり、先ず(イ)に示す如く配線42を
形成した配線基板41上に少量の第1の樹脂(接着剤)71
を塗布する。
The conventional method shown in FIG. 33 is disclosed in Japanese Unexamined Patent Publication No. 62-132331. First, a small amount of the first resin (adhesive) is applied onto the wiring board 41 on which the wiring 42 is formed as shown in (a). Agent) 71
Apply.

【0014】樹脂71の量は、半導体チップ12の電極(パ
ッド)13と配線基板41の配線42とを位置合わせし、図33
(ロ) に示すように、加圧ツール72により半導体チップ12
を配線基板41に押し付けたとき、電極13, 配線42に達し
ない程度である。
The amount of the resin 71 is determined by aligning the electrodes (pads) 13 of the semiconductor chip 12 with the wirings 42 of the wiring board 41, and the amount of resin shown in FIG.
As shown in (b), pressurizing tool 72
When the is pressed against the wiring board 41, the electrode 13 and the wiring 42 are not reached.

【0015】そこで、樹脂71を硬化させたのち加圧ツー
ル72の加圧を解除すれば、電極13と配線42の電気的接続
は樹脂71により維持されるようになる。さらに、図33
(ハ) に示すように、半導体チップ12と配線基板41との間
隙に第2の樹脂(接着剤)73を充填し、電極13と配線42
との電気的接続は一層強固なものとなる。
Therefore, when the pressure of the pressure tool 72 is released after the resin 71 is cured, the electrical connection between the electrode 13 and the wiring 42 is maintained by the resin 71. Furthermore, FIG.
As shown in (c), the gap between the semiconductor chip 12 and the wiring board 41 is filled with the second resin (adhesive) 73, and the electrode 13 and the wiring 42
The electrical connection with and becomes stronger.

【0016】[0016]

【発明が解決しようとする課題】以上説明したように、
金属箔より形成した導体パターン6は台形断面であり、
ピッチ50μm 程度である電極端子11と圧着端子6a との
間には、圧着端子6a の幅方向に1個の導電性粒子10し
か存在できず、端子間を当接させるとき電極端子11と圧
着端子6a との対向間の接着剤9は、圧着端子6a の外
に向けて流動するようになる。
As described above,
The conductor pattern 6 formed of metal foil has a trapezoidal cross section,
Only one conductive particle 10 can exist in the width direction of the crimp terminal 6a between the electrode terminal 11 and the crimp terminal 6a having a pitch of about 50 μm, and when the terminals are brought into contact with each other, the electrode terminal 11 and the crimp terminal 6a The adhesive 9 between the opposite side of 6a flows toward the outside of the crimp terminal 6a.

【0017】従って、接続前に電極端子11と圧着端子6
a との対向間にあった導電性粒子10の一部は、接着剤9
の硬化以前にその対向領域外に押し出されたり、図31の
中央部に示す如く辛うじて引っ掛かる程度のものができ
る。
Therefore, before connection, the electrode terminal 11 and the crimp terminal 6 are connected.
A part of the conductive particles 10 that were between the a and
Before being cured, it can be pushed out of the facing area or barely caught as shown in the central portion of FIG.

【0018】一般に、電極端子11と圧着端子6a との各
接続間には、20個以上の導電性粒子10を挟む必要がある
が、それらの中に接続不十分の導電性粒子10があると、
液晶表示パネル1と集積回路装置3との接続抵抗が大き
くなり、信頼性が損なわれるようになる。
Generally, it is necessary to sandwich 20 or more conductive particles 10 between each connection between the electrode terminal 11 and the crimp terminal 6a. ,
The connection resistance between the liquid crystal display panel 1 and the integrated circuit device 3 increases, and the reliability is impaired.

【0019】かかる欠点を従来技術によって解決しよう
とすると、電極端子11と圧着端子6a との重なり長さを
長くする必要がある。そのため、液晶表示パネル1は大
形化し,接続時の圧着力を大きくしなければならず、液
晶表示パネル1に損傷を与え易くなる。
In order to solve such a drawback by the conventional technique, it is necessary to increase the overlapping length of the electrode terminal 11 and the crimp terminal 6a. Therefore, the liquid crystal display panel 1 needs to be large-sized and the crimping force at the time of connection must be increased, and the liquid crystal display panel 1 is likely to be damaged.

【0020】他方、図32に示す如く導電性粒子10を使用
しない電気的接続方法も、半導体装置(半導体チップ)
12の実装に利用されている。しかし、それらの接続方法
では当接面、即ち半導体チップ12に形成した多数のパッ
ド13の下面を、2μm 程度以下の誤差で同一平面に揃え
る必要があると共に、接続面の間に接着剤被膜が残り易
く電気的接続の信頼性が損なわれ易い、信頼性確保のた
めに接続時の加圧力を大きくすると実装歪が大きくなり
逆に信頼性が低下するという問題点があった。
On the other hand, as shown in FIG. 32, the electrical connection method which does not use the conductive particles 10 is also a semiconductor device (semiconductor chip).
Used in 12 implementations. However, in these connection methods, the contact surface, that is, the lower surfaces of the many pads 13 formed on the semiconductor chip 12 need to be aligned on the same plane with an error of about 2 μm or less, and an adhesive film is formed between the connection surfaces. There is a problem in that the reliability of the electrical connection is likely to remain and the reliability of the electrical connection is likely to be impaired, and if the pressing force at the time of connection is increased to secure the reliability, mounting distortion increases and conversely the reliability decreases.

【0021】しかも、各パッド13と基板14に形成した相
手端子15とは、厳密には数点で当接するに過ぎず、その
接続部に流す電流が少し大きくなり、例えば液晶表示パ
ネルにおいて50〜100mV程度電圧差が生じると表示むら
ができる。
Further, strictly speaking, each pad 13 and the mating terminal 15 formed on the substrate 14 are brought into contact with each other only at a few points in the strict sense, and the current flowing through the connection is slightly increased. If a voltage difference of about 100 mV occurs, display unevenness will occur.

【0022】また、2μm 程度以下の高精度にパッド13
を面揃えすることは、半導体チップ12が比較的小型であ
り, 大きさが50μm ×50μm 程度であるパッド13を対象
に可能であっても、液晶表示パネル1と絶縁フィルム3
との接続に対しては、技術的, 経済的に極めて困難であ
るため適用できない。
Further, the pad 13 can be highly accurately set to 2 μm or less.
Even if the semiconductor chip 12 is relatively small and the size of the pad 13 is about 50 μm × 50 μm, the liquid crystal display panel 1 and the insulating film 3 can be aligned.
It cannot be applied to the connection with, as it is extremely difficult technically and economically.

【0023】導電性粒子を使用せず,圧着端子6a を高
密度化する一方法として、圧着端子面に針状または塊状
の金属突起を電着法により形成させる構成が、特開平3
−142942号公報に開示さており、該公報によれ
ば、圧着端子のピッチは70μm程度にすることが可能で
ある。
As one method for densifying the crimp terminals 6a without using conductive particles, a structure in which needle-shaped or lump-shaped metal projections are formed on the surface of the crimp terminals by the electrodeposition method is known.
According to the publication, the pitch of the crimp terminals can be set to about 70 μm.

【0024】しかし、金属突起は電着法により形成させ
るため比較的剥がれ易く、剥がれた金属突起によって電
気的ショートが生じ易いと共に、圧着端子6a のピッチ
を50μm 程度に小さくすることが困難である。
However, since the metal protrusions are formed by the electrodeposition method, they are relatively easily peeled off, an electric short circuit is apt to occur due to the peeled metal protrusions, and it is difficult to reduce the pitch of the crimp terminals 6a to about 50 μm.

【0025】電気的接続の抵抗を低減し信頼性を改善す
る従来構成として、特開昭62−132331号公報で
は、第1の樹脂で基板に半導体素子を固着したのち、第
2の樹脂を電気的接続部に充填する方法が提案されてい
る。
As a conventional structure for reducing the resistance of electrical connection and improving the reliability, in Japanese Patent Laid-Open No. 62-133331, a semiconductor element is fixed to a substrate with a first resin, and then a second resin is electrically connected. A method of filling the static connection has been proposed.

【0026】しかしながら、第1の樹脂19が半導体チッ
プ12の中央部に固着しているため、半導体チップ12には
不均一な応力が作用し、その結果接触抵抗の経時変化を
生じ易いという問題点がある。
However, since the first resin 19 is fixed to the central portion of the semiconductor chip 12, uneven stress acts on the semiconductor chip 12, and as a result, the contact resistance tends to change over time. There is.

【0027】さらに、半導体チップ12には一般に 200個
程度の多数のバンプを形成させることになるが、そのよ
うに多数のバンプが所定の相手端子と接続されたかどう
かの検査が容易でないという問題点もあった。
Further, generally, about 200 bumps are formed on the semiconductor chip 12, but it is not easy to inspect whether such bumps are connected to a predetermined mating terminal. There was also.

【0028】[0028]

【課題を解決するための手段】本発明の目的は、導電性
粒子を使用することなく電気的接続の信頼性が高い圧着
端子と、その端子を使用した接続方法および、その端子
を使用した半導体装置の実装方法を提供することであ
る。
DISCLOSURE OF THE INVENTION An object of the present invention is to provide a crimp terminal having high reliability of electrical connection without using conductive particles, a connecting method using the terminal, and a semiconductor using the terminal. It is to provide a mounting method of a device.

【0029】本発明による圧着端子の代表例を示す図1
によれば、接続相手の端子に対向する圧着端子6d,6e の
上面には複数本の溝17a,17b を形成し、エッチングまた
は型押し加工で形成されるそれらの溝により、圧着端子
6d,6e の上面を複数個の当接面6bに分割する。
FIG. 1 showing a typical example of a crimp terminal according to the present invention.
According to the method, a plurality of grooves 17a, 17b are formed on the upper surface of the crimp terminal 6d, 6e facing the terminal of the connection partner, and the crimp terminal is formed by the grooves formed by etching or embossing.
The upper surfaces of 6d and 6e are divided into a plurality of contact surfaces 6b.

【0030】圧着端子6d,6e と相手端子との接続例は、
図7に示す如く、圧着端子6eが接着剤24,25 を押し退け
て相手端子11に当接せしめ、電気的に接続させたのち接
着剤24,25 を硬化させる。
An example of connecting the crimp terminals 6d, 6e and the mating terminal is
As shown in FIG. 7, the crimp terminal 6e pushes the adhesives 24 and 25 away to bring them into contact with the mating terminal 11, and after electrically connecting them, the adhesives 24 and 25 are cured.

【0031】接着剤が圧着端子当接面に被着しないよう
にするには、例えば図21の実施例に示す如く圧着端子6j
の上面に樹脂流入溝17d を設け、溝17d に流入した接着
剤を利用するまたは、図25に示す如く、表面に圧着端子
6nを形成した絶縁フィルム3に透孔63を設け、絶縁フィ
ルム3の裏面から表面に接着剤を注入させる。
In order to prevent the adhesive from adhering to the contact surface of the crimp terminal, for example, as shown in the embodiment of FIG. 21, the crimp terminal 6j
The resin inflow groove 17d is provided on the upper surface of the and the adhesive that has flowed into the groove 17d is used, or as shown in FIG.
A through hole 63 is provided in the insulating film 3 having 6n formed, and an adhesive is injected from the back surface to the front surface of the insulating film 3.

【0032】本発明による圧着端子は半導体装置のバン
プに適用し有効であるが、そのときバンプと相手端子と
の間に接着剤を挟まないようにすることで一層効果的と
なる。そこで、本発明では例えば図12の実施例に示す如
く、圧着端子31を相手端子42に当接せしめたとき接着剤
44が圧着端子31に達しないように接着剤44を定量化し、
押圧の進行によって接着剤44が圧着端子31を覆うことを
提案する。
The crimp terminal according to the present invention is effective when applied to a bump of a semiconductor device. At that time, it is more effective not to sandwich an adhesive between the bump and the mating terminal. Therefore, in the present invention, for example, as shown in the embodiment of FIG. 12, the adhesive when the crimp terminal 31 is brought into contact with the mating terminal 42.
Quantify the adhesive 44 so that 44 does not reach the crimp terminal 31,
It is proposed that the adhesive 44 covers the crimp terminal 31 as the pressing proceeds.

【0033】さらに、圧着端子と相手端子との接続状態
の検査を容易ならしめ手段として本発明では、例えば図
15に示す如く相手端子に当接しない補助バンプ47を設
け、レーザ顕微鏡を用いる等によって相手端子15とバン
プ47との間隙を測定する。
Further, in the present invention, as a means for facilitating the inspection of the connection state between the crimp terminal and the mating terminal, for example, in FIG.
As shown in 15, an auxiliary bump 47 that does not come into contact with the mating terminal is provided, and the gap between the mating terminal 15 and the bump 47 is measured by using a laser microscope or the like.

【0034】[0034]

【作用】溝によって上面を複数個の当接面に分割した圧
着端子は、例えば接着剤を押し退けて圧着端子を相手端
子に当接せしめたのち、接着剤を硬化させることによ
り、導体粒子を介在せしめることなく、従来方法より多
数の当接点で相手端子との接続を可能とし、かつ、溝に
充填された接着剤により当接接続に対する維持力が増大
し安定化するようになり、かかる圧着端子は半導体装置
のバンプに適用し、同等の効果が得られる。
With the crimp terminal whose upper surface is divided into a plurality of contact surfaces by the groove, for example, the adhesive is pushed away to bring the crimp terminal into contact with the mating terminal, and then the adhesive is cured to interpose conductive particles. Without crimping, it is possible to connect to the mating terminal at a larger number of contact points than in the conventional method, and the adhesive filled in the groove increases the maintenance force for the contact connection and stabilizes it. Is applied to a bump of a semiconductor device, and the same effect can be obtained.

【0035】また、圧着端子に設けた樹脂流入溝に接着
剤を充填させる前記手段および、絶縁フィルムに設けた
透孔から接着剤を注入させる前記手段および、接着剤の
定量化と圧着端子の二段階押圧を併用する前記手段によ
れば、圧着端子とその相手端子との間に接着剤の侵入し
ないため、圧着端子と相手端子との接続は一層安定化す
る。
Further, the means for filling the resin inflow groove provided in the crimp terminal with the adhesive, the means for injecting the adhesive from the through hole provided in the insulating film, and the quantification of the adhesive and the crimp terminal are used. According to the above-mentioned means which uses the stepwise pressing together, the adhesive does not enter between the crimp terminal and the mating terminal thereof, so that the connection between the crimp terminal and the mating terminal is further stabilized.

【0036】さらに、補助バンプを設ける前記手段によ
れば、電気的手段によるため従来困難であった圧着端子
と相手端子との接続状態を、顕微鏡で観察可能とし、特
に接着剤の完全硬化前の顕微鏡観察により、不良圧着端
子(半導体装置)の交換が容易になる。
Further, according to the above-mentioned means for providing the auxiliary bump, the connection state between the crimp terminal and the mating terminal, which has been difficult due to the electric means, can be observed with a microscope, and especially before the adhesive is completely cured. By observing with a microscope, the defective crimp terminal (semiconductor device) can be easily replaced.

【0037】[0037]

【実施例】図1は本発明による圧着端子の実施例を示す
斜視図(その1)、図2は本発明による圧着端子の実施
例を示す斜視図(その2)、図3は本発明による圧着端
子の実施例を示す斜視図(その3)、図4は本発明によ
る圧着端子の第1の製造例の説明図、図5は本発明によ
る圧着端子の第2の製造例の説明図、図6は本発明によ
る圧着端子の第3の製造例の説明図、図7は本発明の実
施例による圧着端子接続方法の説明図、図8は本発明に
よる圧着端子の実施例を示す斜視図(その4)とその接
続状態を示す断面図、図9は本発明の実施例によるCO
G接続の説明図、図10は本発明の他の実施例によるCO
G接続用圧着端子の説明図である。
1 is a perspective view showing an embodiment of a crimp terminal according to the present invention (No. 1), FIG. 2 is a perspective view showing an embodiment of a crimp terminal according to the present invention (No. 2), and FIG. 3 is according to the present invention. FIG. 5 is an explanatory view of a first manufacturing example of the crimp terminal according to the present invention, FIG. 5 is an explanatory view of a second manufacturing example of the crimp terminal according to the present invention, 6 is an explanatory view of a third manufacturing example of the crimp terminal according to the present invention, FIG. 7 is an explanatory view of a crimp terminal connecting method according to the embodiment of the present invention, and FIG. 8 is a perspective view showing an embodiment of the crimp terminal according to the present invention. FIG. 9 is a cross-sectional view showing (No. 4) and its connection state, and FIG.
Explanatory drawing of G connection, FIG. 10 shows CO according to another embodiment of the present invention.
It is explanatory drawing of the crimp terminal for G connection.

【0038】図1(イ) において、絶縁フィルム3にはエ
ッチングによる導体パターン6を形成し、接着剤8にて
絶縁フィルム3に貼着された導体パターン6の先端部の
圧着端子6d の上面、例えば長さ3mm程度である圧着端
子6d の上面には、導体パターン6の長さ方向に複数本
(図は2本)の溝17a を形成し、導体パターン6の幅方
向に複数本(図は多数本)の溝17b を形成する。
In FIG. 1A, a conductor pattern 6 is formed on the insulating film 3 by etching, and the upper surface of the crimp terminal 6d at the tip of the conductor pattern 6 adhered to the insulating film 3 with an adhesive 8 is formed. For example, a plurality of grooves 17a (two in the figure) are formed in the length direction of the conductor pattern 6 on the upper surface of the crimp terminal 6d having a length of about 3 mm, and a plurality of grooves 17a in the width direction of the conductor pattern 6 (the figure is shown). Multiple grooves 17b are formed.

【0039】溝17a,17bは例えば幅2μm,深さ1〜2μ
m 程度とし、接着剤を押し退けて相手端子に当接せしめ
るため、溝17a,17bにより形成された多数の当接面6b
の寸法は、例えば2μm ×2μm 程度の正方形とする。
The grooves 17a and 17b have a width of 2 μm and a depth of 1 to 2 μ, for example.
The contact surface 6b is formed by the grooves 17a and 17b so that the adhesive is pushed away and brought into contact with the mating terminal.
The dimension is, for example, a square of about 2 μm × 2 μm.

【0040】図1(ロ) において、絶縁フィルム3にはエ
ッチングによる導体パターン6を形成し、接着剤8にて
絶縁フィルム3に貼着された導体パターン6の先端部の
圧着端子6e の上面、例えば長さ3mm程度である圧着端
子6d の上面には、導体パターン6の長さ方向に複数本
(図は2本)の溝17a を形成し、導体パターン6の幅方
向に複数本(図は多数本)の溝17b を形成する。
In FIG. 1B, a conductive pattern 6 is formed on the insulating film 3 by etching, and the upper surface of the crimp terminal 6e at the tip of the conductive pattern 6 adhered to the insulating film 3 with an adhesive 8, For example, a plurality of grooves 17a (two in the figure) are formed in the length direction of the conductor pattern 6 on the upper surface of the crimp terminal 6d having a length of about 3 mm, and a plurality of grooves 17a in the width direction of the conductor pattern 6 (the figure is shown). Multiple grooves 17b are formed.

【0041】溝17a,17bは例えば幅2μm,深さ1〜2μ
m 程度とし、接着剤を押し退けて相手端子に当接せしめ
るため、溝17a,17bにより形成された多数の当接面6b
の寸法は、例えば2μm ×5μm 程度の長方形とする。
The grooves 17a and 17b are, for example, 2 μm wide and 1-2 μm deep.
The contact surface 6b is formed by the grooves 17a and 17b so that the adhesive is pushed away and brought into contact with the mating terminal.
The size of the rectangle is, for example, a rectangle of about 2 μm × 5 μm.

【0042】図2(イ) において、絶縁フィルム3には、
フォトエッチングによる導体パターン6を形成し、接着
剤8にて絶縁フィルム3に貼着された導体パターン6の
一端である圧着端子6f の上面、例えば長さ3mm程度で
ある圧着端子6f の上面には、導体パターン6の長さ方
向に複数本(図は2本)の溝17aを形成する。
In FIG. 2 (a), the insulating film 3 has
On the upper surface of the crimp terminal 6f, which is one end of the conductive pattern 6 adhered to the insulating film 3 by the adhesive 8 by forming the conductor pattern 6 by photoetching, for example, on the upper surface of the crimp terminal 6f having a length of about 3 mm. A plurality of (two in the figure) grooves 17a are formed in the length direction of the conductor pattern 6.

【0043】溝17aは例えば幅2μm,深さ1〜2μm 程
度とし、接着剤を押し退けて相手端子に当接する如く溝
17aにより形成された複数の帯状長方形の当接面6b
は、例えば幅が2μm 程度となるようにする。
The groove 17a has, for example, a width of 2 μm and a depth of 1 to 2 μm, and the groove is formed so that the adhesive is pushed away to abut the mating terminal.
A plurality of strip-shaped rectangular contact surfaces 6b formed by 17a
Has a width of, for example, about 2 μm.

【0044】図2(ロ) において、絶縁フィルム3には、
フォトエッチングによる導体パターン6を形成し、接着
剤8にて絶縁フィルム3に貼着された導体パターン6の
一端である圧着端子6g の上面、例えば長さ3mm程度で
ある圧着端子6g の上面には、導体パターン6の幅方向
に多数本(図は多数本)の溝17b を形成する。
In FIG. 2B, the insulating film 3 has
On the upper surface of the crimp terminal 6g, which is one end of the conductive pattern 6 adhered to the insulating film 3 with the adhesive 8 by forming the conductor pattern 6 by photoetching, for example, on the upper surface of the crimp terminal 6g having a length of about 3 mm. A large number (a large number in the figure) of grooves 17b are formed in the width direction of the conductor pattern 6.

【0045】溝17b は例えば幅2μm,深さ1〜2μm 程
度とし、接着剤を押し退けて相手端子に当接する如く溝
17b により形成された複数の短冊形当接面6b は、例え
ば幅が2μm 程度となるようにする。
The groove 17b has a width of 2 μm and a depth of 1 to 2 μm, for example, so that the adhesive may be pushed away to abut the mating terminal.
The width of the plurality of strip contact surfaces 6b formed by 17b is, for example, about 2 μm.

【0046】図3(イ) において、絶縁フィルム3には、
フォトエッチングによる導体パターン6を形成し、接着
剤8にて絶縁フィルム3に貼着された導体パターン6の
一端である圧着端子6h の上面、例えば長さ3mm程度で
ある圧着端子6h の上面には、導体パターン6の長さ方
向に複数本(図は多数本)の溝17bを形成する。
In FIG. 3A, the insulating film 3 has
On the upper surface of the crimp terminal 6h, which is one end of the conductor pattern 6 adhered to the insulating film 3 by the adhesive 8 by forming the conductor pattern 6 by photoetching, for example, on the upper surface of the crimp terminal 6h having a length of about 3 mm. A plurality of (a large number in the figure) grooves 17b are formed in the lengthwise direction of the conductor pattern 6.

【0047】溝17bは例えば幅2μm,深さ1〜2μm 程
度とし、接着剤を押し退けて相手端子に当接する如く溝
17bによりほぼ正方形に形成された複数の当接面6b
は、例えば一辺が3μm 程度となるようにする。
The groove 17b has a width of 2 μm and a depth of 1 to 2 μm, for example, so that the adhesive may be pushed away to contact the mating terminal.
A plurality of contact surfaces 6b formed in a substantially square shape by 17b
Is, for example, about 3 μm on a side.

【0048】図3(ロ) において、絶縁フィルム3には、
フォトエッチングによる導体パターン6を形成し、接着
剤8にて絶縁フィルム3に貼着された導体パターン6の
一端である圧着端子6i の上面、例えば長さ3mm程度で
ある圧着端子6i の上面には、導体パターン6の長さ方
向に例えば45度で傾斜する多数本(図は多数本)の溝17
c を形成する。
In FIG. 3B, the insulating film 3 has
A conductor pattern 6 is formed by photo-etching, and is attached to the upper surface of the crimp terminal 6i which is one end of the conductor pattern 6 adhered to the insulating film 3 with the adhesive 8, for example, the upper surface of the crimp terminal 6i having a length of about 3 mm. , A large number of grooves 17 (a large number are shown in the figure) which are inclined in the longitudinal direction of the conductor pattern 6 by, for example, 45 degrees
form c.

【0049】溝17c は例えば幅2μm,深さ1〜2μm 程
度とし、接着剤を押し退けて相手端子に当接する如く溝
17c により形成された複数の短冊形当接面6b は、例え
ば幅が2μm 程度となるようにする。
The groove 17c has, for example, a width of 2 μm and a depth of 1 to 2 μm.
The plurality of strip-shaped contact surfaces 6b formed by 17c have a width of, for example, about 2 μm.

【0050】図4(イ) において、接着剤8にて絶縁フィ
ルム3に貼着された導体パターン6を形成したのち、導
体パターン6の圧着端子部の溝(17aまたは17a と17b ま
たは17b)に対応する透孔18があけられたレジストパター
ン19を形成する。
In FIG. 4 (a), after forming the conductor pattern 6 adhered to the insulating film 3 with the adhesive 8, the groove (17a or 17a and 17b or 17b) of the crimp terminal portion of the conductor pattern 6 is formed. A resist pattern 19 having corresponding through holes 18 is formed.

【0051】次いで、図4(ロ) に示す如く、レジストパ
ターン19を用いたエッチングにより、溝17a(または17a
と17b または17b または17c)を形成する。溝17a の深さ
は、エッチング時間の管理により適当な値例えば2μm
とする。
Then, as shown in FIG. 4B, the groove 17a (or 17a) is formed by etching using the resist pattern 19.
And 17b or 17b or 17c). The depth of the groove 17a is set to an appropriate value by controlling the etching time, for example, 2 μm.
And

【0052】しかるのち、レジストパターン19を除去す
ると図4(ハ) に示す如く、圧着端子6f(または6dまたは
6eまたは6gまたは6hまたは6i) が完成する。図5(イ) に
おいて、接着剤8にて絶縁フィルム3に貼着された導体
パターン6を形成したのち、導体パターン6に対し選択
エッチング可能な金属層、例えば銅にてなる導体パター
ン6に対し選択エッチング可能なニッケル層20を、導体
パターン6の上に形成し、導体パターン6の圧着端子形
成部圧着端子形成部の溝(17aまたは17a と17b または17
b または17c)に対応する透孔18があけられたレジストパ
ターン19を形成する。
After that, when the resist pattern 19 is removed, as shown in FIG. 4C, the crimp terminal 6f (or 6d or
6e or 6g or 6h or 6i) is completed. In FIG. 5 (a), after forming the conductor pattern 6 adhered to the insulating film 3 with the adhesive 8, the conductor pattern 6 is selectively etched with respect to the metal layer, for example, the conductor pattern 6 made of copper. A nickel layer 20 capable of selective etching is formed on the conductor pattern 6, and a groove (17a or 17a and 17b or 17) of the crimp terminal formation portion of the conductor pattern 6 is formed.
A resist pattern 19 having a through hole 18 corresponding to b or 17c) is formed.

【0053】次いで、図5(ロ) に示す如く、レジストパ
ターン19を用いたエッチングによりニッケル層20をエッ
チングすると、深さが揃った溝17a(または17a と17b ま
たは17b または17c)が形成される。
Next, as shown in FIG. 5B, the nickel layer 20 is etched by using the resist pattern 19 to form grooves 17a (or 17a and 17b or 17b or 17c) having a uniform depth. .

【0054】しかるのち、レジストパターン19を除去す
ると図5(ハ) に示す如く、圧着端子6f(または6dまたは
6eまたは6gまたは6hまたは6i) と同形状の圧着端子6f′
(または端子6d, 6e, 6g, 6h, 6iと同形状端子)が完成
する。
After that, when the resist pattern 19 is removed, as shown in FIG. 5C, the crimp terminal 6f (or 6d or
6e or 6g or 6h or 6i) Crimp terminal 6f ′ with the same shape as
(Or terminals with the same shape as terminals 6d, 6e, 6g, 6h, 6i) are completed.

【0055】図6(イ) において、接着剤8にて絶縁フィ
ルム3に貼着された導体パターン6を形成したのち、図
6(ロ) に示す如く絶縁フィルム3を台21に固定し、導体
パターン6の圧着端子形成部の溝(17aまたは17a と17b
または17b または17c)に対応する凸部23が形成された押
し型22にて導体パターン6を押圧する。
In FIG. 6 (a), after forming the conductor pattern 6 adhered to the insulating film 3 with the adhesive 8, the insulating film 3 is fixed to the base 21 as shown in FIG. Groove (17a or 17a and 17b) of the crimp terminal formation part of pattern 6
Alternatively, the conductor pattern 6 is pressed by the pressing die 22 having the convex portion 23 corresponding to 17b or 17c).

【0056】しかるのち、押し型22を取り除くと図6
(ハ) に示す如く、塑性変形によって溝17a(または17a と
17b または17b)を形成した圧着端子6f(または6dまたは
6eまたは6gまたは6hまたは6i) が完成する。
Then, when the pressing die 22 is removed, FIG.
As shown in (c), the groove 17a (or 17a and
17b or 17b) formed crimp terminal 6f (or 6d or
6e or 6g or 6h or 6i) is completed.

【0057】図7(イ) において、相手端子11と圧着端子
6f(または6d または6e または6g または6h または
6i)で接着剤シート24を挟むように、相手端子11が形成
されたガラス基板1a と、熱硬化性樹脂または熱可塑性
樹脂または光硬化性樹脂または熱硬化性樹脂と熱可塑性
樹脂との混合樹脂にてなる接着剤シート24と、絶縁フィ
ルム3とを重ねる。
In FIG. 7A, the mating terminal 11 and the glass substrate 1a on which the mating terminal 11 is formed so that the adhesive sheet 24 is sandwiched between the crimping terminals 6f (or 6d or 6e or 6g or 6h or 6i). The adhesive sheet 24 made of a thermosetting resin, a thermoplastic resin, a photocurable resin, or a mixed resin of a thermosetting resin and a thermoplastic resin is placed on the insulating film 3.

【0058】図7(ロ) は接着剤シート24に替えて流動性
樹脂を使用する実施例であり、相手端子11が形成された
ガラス基板1a に、熱硬化性樹脂または熱可塑性樹脂ま
たは光硬化性樹脂または熱硬化性樹脂と熱可塑性樹脂と
の混合樹脂にてなる接着剤25を塗布し、相手端子11と圧
着端子6f(または6d または6e または6g または6h
または6i)とが対向する如く、接着剤25に絶縁フィルム
3を重ねる。
FIG. 7B shows an embodiment in which a fluid resin is used instead of the adhesive sheet 24, and a thermosetting resin, a thermoplastic resin, or a photocuring resin is applied to the glass substrate 1a on which the mating terminals 11 are formed. Adhesive 25, which is made of a thermosetting resin or a mixed resin of a thermosetting resin and a thermoplastic resin, is applied, and the mating terminal 11 and the crimp terminal 6f (or 6d or 6e or 6g or 6h) are applied.
Alternatively, the insulating film 3 is overlaid on the adhesive 25 so that it faces 6i).

【0059】次いで、図7(ハ) に示す如く加圧加熱ヘッ
ド26を使用し、絶縁フィルム3をガラス基板1a に適当
な押圧力、例えば30kg/cm2程度の押圧力で押圧し、相手
端子11と圧着端子6e の当接面6b とを当接せしめたの
ち、熱硬化性, 熱可塑性の接着剤シート24あるいは接着
剤25はその硬化温度に加熱してから冷却し、光硬化性の
接着剤シート24あるいは接着剤25にはその硬化に必要な
エネルギ強度の光を照射する。
Then, as shown in FIG. 7 (c), a pressure heating head 26 is used to press the insulating film 3 against the glass substrate 1a with an appropriate pressing force, for example, a pressing force of about 30 kg / cm 2 , and the mating terminal. After the 11 and the contact surface 6b of the crimp terminal 6e are brought into contact with each other, the thermosetting or thermoplastic adhesive sheet 24 or the adhesive 25 is heated to its curing temperature and then cooled to be photocured. The agent sheet 24 or the adhesive 25 is irradiated with light having an energy intensity necessary for curing.

【0060】すると、接着剤シート24あるいは接着剤25
が硬化してなる接着剤9は、圧着端子6f(または6d ま
たは6e または6g または6h または6i)とその相手端
子11とが当接した状態で、ガラス基板1a と絶縁フィル
ム3とに接着し、該当接による電気的接続は接着剤9の
接着力と収縮応力で維持されるようになる。
Then, the adhesive sheet 24 or the adhesive 25
The adhesive 9 formed by curing is bonded to the glass substrate 1a and the insulating film 3 in a state where the crimp terminal 6f (or 6d or 6e or 6g or 6h or 6i) and its mating terminal 11 are in contact with each other, The electrical connection by the contact is maintained by the adhesive force of the adhesive 9 and the contraction stress.

【0061】図8(イ) において、ガラス基板1a には導
体パターン端子11′を形成したのち、端子11′の上に圧
着端子6d(または6e,6f,6g,6h,6i) を形成してなる。か
かる圧着端子6d は、端子11′の上に例えば金またはア
ルミニウム等にてなる導体層を数μm に形成し、該導体
層をエッチングして溝17a と17b(または17a のみまたは
17b のみまたは17c)を形成する。
In FIG. 8A, after forming the conductor pattern terminal 11 'on the glass substrate 1a, the crimp terminal 6d (or 6e, 6f, 6g, 6h, 6i) is formed on the terminal 11'. Become. The crimping terminal 6d is such that a conductor layer made of, for example, gold or aluminum is formed on the terminal 11 'to a thickness of several μm, and the conductor layer is etched to form grooves 17a and 17b (or only 17a or
Form 17b only or 17c).

【0062】図8(ロ) において、絶縁フィルム3には接
着剤8にて接着する導体端子(相手端子)6′を形成
し、端子11′の上に形成した圧着端子6d と導体端子
6′とは、同一ピッチで形成したそれらを当接せしめた
のち、図7を用いて説明した前記方法と同一方法によ
り、接着剤9の接着力と収縮応力を利用し該当接(電気
的接続)を維持せしめるようになる。
In FIG. 8B, a conductor terminal (counter terminal) 6'which is adhered with an adhesive 8 is formed on the insulating film 3, and the crimp terminal 6d and the conductor terminal 6'formed on the terminal 11 'are formed. After making them contact with each other formed at the same pitch, the corresponding contact (electrical connection) is made by using the adhesive force and shrinkage stress of the adhesive 9 by the same method as described above with reference to FIG. You will be able to maintain it.

【0063】図9において、(イ) は本発明の実施例によ
るCOG接続の側面図、(ロ) は(イ)に示すCOG接続用
圧着端子を拡大した下面図、(ハ) は(イ) に示すCOG接
続用圧着端子を拡大した側面図である。
In FIG. 9, (A) is a side view of the COG connection according to the embodiment of the present invention, (B) is an enlarged bottom view of the COG connection crimp terminal shown in (A), and (C) is (A). It is the side view which expanded the crimp terminal for COG connection shown in FIG.

【0064】図9(イ) において、半導体装置(半導体チ
ップ)12の下面には、50μm ×50μm 程度の複数個のC
OG(Chip on Glass) 接続用圧着端子31を形成し、ガラ
ス基板14には圧着端子31を接続する導体端子15を形成
し、圧着端子31を導体端子15に当接せしめた電気的接続
は、半導体チップ12と基板14との間に充填し硬化させた
熱硬化性樹脂または、熱可塑性樹脂または、熱硬化性樹
脂と熱可塑性樹脂の混合樹脂または、光 (紫外線) 硬化
性樹脂の接着剤16の収縮応力により維持せしめるように
なる。
In FIG. 9A, a plurality of Cs of about 50 μm × 50 μm are provided on the lower surface of the semiconductor device (semiconductor chip) 12.
The OG (Chip on Glass) connection crimp terminal 31 is formed, the conductor terminal 15 for connecting the crimp terminal 31 is formed on the glass substrate 14, and the crimp terminal 31 is brought into contact with the conductor terminal 15 for electrical connection. Adhesive 16 of thermosetting resin filled between semiconductor chip 12 and substrate 14 and cured, or thermoplastic resin, or mixed resin of thermosetting resin and thermoplastic resin, or light (ultraviolet) curable resin 16 It can be maintained by the contraction stress of.

【0065】図9(ロ),(ハ) において、例えば厚さが10μ
m 〜20μm 程度であり金等にてなる圧着端子31は、めっ
きにより形成した従来のパッド13 (図14参照) の下面
に、複数本(図は4本)の縦方向溝32と複数本(図は4
本)の横方向溝33を、エッチングまたは機械加工により
形成したものであり、圧着端子31の下面には複数個(図
は25個)の当接面31a が形成される。
In FIGS. 9B and 9C, for example, the thickness is 10 μm.
The crimp terminal 31 having a size of about m to 20 μm and made of gold or the like has a plurality of vertical grooves 32 (four in the figure) and a plurality of vertical grooves (four in the figure) on the lower surface of the conventional pad 13 (see FIG. 14) formed by plating. The figure shows 4
The horizontal groove 33 is formed by etching or machining, and a plurality of contact surfaces 31a (25 in the figure) are formed on the lower surface of the crimp terminal 31.

【0066】溝32,33 は例えば幅2μm 程度, 深さ1μ
m 〜10μm 程度であり、当接面31aは一辺が2μm 〜10
μm 程度の正方形または長方形とする。従って、複数個
の当接面31a を具えた圧着端子31、例えば25個の当接面
31a を具えた圧着端子31は、導体端子15に対し10〜25点
で当接するようになるため、導体端子15に対する電気的
接続の信頼性が確実になる。
The grooves 32 and 33 are, for example, about 2 μm wide and 1 μ deep.
The contact surface 31a has a side of 2 μm to 10 μm.
Make a square or rectangle of about μm. Therefore, a crimp terminal 31 having a plurality of contact surfaces 31a, for example, 25 contact surfaces
Since the crimp terminal 31 including 31a comes into contact with the conductor terminal 15 at 10 to 25 points, the reliability of the electrical connection to the conductor terminal 15 is ensured.

【0067】図10において、(イ) はパッド36に複数本の
縦方向溝34と横方向溝35を設け突起36a を形成した拡大
下面図、(ロ) は(イ) に示すパッド36の側面図であり、パ
ッド36には(ハ) に示す如く、パッド36の下面に例えばニ
ッケルめっき層37を被着し、突起36a をめっき層37で被
覆し圧着端子38が完成する。
In FIG. 10, (a) is an enlarged bottom view in which a plurality of vertical grooves 34 and horizontal grooves 35 are provided on the pad 36 to form the protrusion 36a, and (b) is a side surface of the pad 36 shown in (a). As shown in FIG. 3C, the lower surface of the pad 36 is covered with, for example, a nickel plating layer 37, and the protrusion 36a is covered with the plating layer 37 to complete the crimp terminal 38.

【0068】かかる圧着端子38は各当接面38a が凸曲面
となり、従って、当接面38a を相手端子に当接せしめた
とき当接面38a の先端部に塑性変形が発生し易くなり、
図8に示す如く形成し平坦である当接面31a に較べ、相
手端子に対する接触面積が大きくなる利点を有する。
In the crimp terminal 38, each contact surface 38a has a convex curved surface. Therefore, when the contact surface 38a is brought into contact with the mating terminal, the tip end of the contact surface 38a is apt to be plastically deformed,
Compared to the flat contact surface 31a formed as shown in FIG. 8, it has an advantage that the contact area with the mating terminal is larger.

【0069】図11は本発明のさらに他の実施例による圧
着端子の斜視説明図(イ) とCOG接続の説明図(ロ) であ
る。図11(イ) において、導体パターン6に形成した圧着
端子6h は、圧着端子6hの幅方向にその上面を分割す
る複数本の溝17b を形成し、ほぼ正方形である当接面6
b を形成したものである。かかる圧着端子6h は、整列
する導体パターン6をさらに高密度にする等により、台
形断面である導体パターン6の上辺幅が例えば3μm 程
度となったときに適用し、当接面形成溝の本数が少なく
て済む。
FIG. 11 is a perspective explanatory view (a) of a crimp terminal according to still another embodiment of the present invention and an explanatory view (b) of COG connection. In FIG. 11 (a), the crimp terminal 6h formed on the conductor pattern 6 has a plurality of grooves 17b for dividing the upper surface in the width direction of the crimp terminal 6h, and has a substantially square contact surface 6.
b is formed. The crimp terminal 6h is applied when the width of the upper side of the conductor pattern 6 having a trapezoidal cross section becomes, for example, about 3 μm by increasing the density of the conductor patterns 6 to be aligned. It can be small.

【0070】図11(ロ) において、半導体チップ12の下面
には、50μm ×50μm 程度の複数個のCOG接続用端子
(バンプ) 31′を形成し、ガラス基板14には本発明に係
わる圧着端子15′を形成し、複数の溝を形成することに
よって上面が複数の当接面に分割された圧着端子15′と
フラットな端子31′とを当接せしめ、その当接による電
気的接続は、光硬化性樹脂の接着剤または, 熱硬化樹脂
の接着剤または,熱可塑性脂の接着剤または,熱硬化樹
脂と熱可塑性脂を混合させた接着剤16の接着力と収縮応
力により維持せしめた構成である。
In FIG. 11B, the bottom surface of the semiconductor chip 12 has a plurality of COG connection terminals of about 50 μm × 50 μm.
(Bumps) 31 'are formed, and the crimp terminal 15' according to the present invention is formed on the glass substrate 14, and the crimp terminal 15 'whose upper surface is divided into a plurality of contact surfaces by forming a plurality of grooves. The flat terminals 31 'are brought into contact with each other, and the electrical connection by the contact is made by a photo-curing resin adhesive, a thermosetting resin adhesive, a thermoplastic resin adhesive, or a thermosetting resin and a thermosetting resin. It is configured to be maintained by the adhesive force and shrinkage stress of the adhesive agent 16 in which a plastic oil is mixed.

【0071】図12は半導体装置のバンプとその相手端子
とをその間に接着剤を挟まないように二段階押圧で接続
する本発明方法の実施例の説明図、図13は図12の本発明
方法に使用した接着剤の硬化反応率と加熱温度との関係
を示す図、図14は図12の本発明方法により得られた接続
部の接触抵抗の経時変化を示す図、図15は補助バンプを
使用する本発明の基本構成の説明図、図16は補助バンプ
を使用する本発明の実施例の説明図 (その1)、図17は
補助バンプを使用する本発明の実施例の説明図(その
2)、図18は本発明の実施例に適用する半導体装置実装
方法の説明図、図19は本発明の実施例に適用する新しい
バンプ配列の説明図、図20は本発明を適用したバンプの
実施例の説明図、図21は本発明により接着剤流入溝を設
けた圧着端子の説明図(その1)、図22は本発明により
接着剤流入溝を設けた圧着端子の説明図(その2)、図
23は本発明により接着剤流入溝を設けた圧着端子の説明
図(その3)、図24は本発明により接着剤流入溝を設け
た圧着端子の説明図(その4)、図25は本発明により接
着剤流入溝を設けた圧着端子の説明図(その5)、図26
は本発明により接着剤流入溝を設けた圧着端子の説明図
(その6)、図27は図25,26 に示す圧着端子の接続方法
の説明図である。
FIG. 12 is an explanatory view of an embodiment of the method of the present invention in which the bumps of the semiconductor device and their mating terminals are connected by two-step pressing so that no adhesive agent is sandwiched between them, and FIG. 13 is the method of the present invention shown in FIG. FIG. 14 is a diagram showing the relationship between the curing reaction rate and the heating temperature of the adhesive used in FIG. 14, FIG. 14 is a diagram showing the change over time in the contact resistance of the connection portion obtained by the method of the present invention in FIG. 12, and FIG. 15 is an auxiliary bump. FIG. 16 is an explanatory view of the basic configuration of the present invention to be used, FIG. 16 is an explanatory view of an embodiment of the present invention which uses an auxiliary bump (No. 1), and FIG. 17 is an explanatory view of an embodiment of the present invention which uses an auxiliary bump (that. 2), FIG. 18 is an explanatory diagram of a semiconductor device mounting method applied to the embodiment of the present invention, FIG. 19 is an explanatory diagram of a new bump array applied to the embodiment of the present invention, and FIG. 20 is a diagram of a bump to which the present invention is applied. FIG. 21 is an explanatory diagram of an embodiment, and FIG. 21 is an explanatory diagram of a crimp terminal provided with an adhesive inflow groove according to the present invention (part 1). , 22 is an explanatory view of the crimp terminals provided an adhesive inflow groove by the present invention (Part 2), Fig.
23 is an explanatory view (3) of the crimp terminal provided with the adhesive inflow groove according to the present invention, FIG. 24 is an explanatory view (4) of the crimp terminal provided with the adhesive inflow groove according to the present invention, and FIG. 25 is the present invention 26 is an explanatory view (5) of the crimp terminal provided with the adhesive inflow groove by FIG.
Is an explanatory view (6) of a crimp terminal provided with an adhesive inflow groove according to the present invention, and FIG. 27 is an explanatory view of a connection method of the crimp terminal shown in FIGS.

【0072】図12(イ) において、印刷配線基板 (または
ガラス基板) 41の表面には、図紙の厚さ方向に2列に整
列する電極端子42を形成し、電極端子42の列間には接着
剤例えば光硬化性の接着剤44を被着させる。そして、半
導体装置(半導体チップ)12には、本発明による圧着端
子(バンプ)31を形成する。
In FIG. 12A, electrode terminals 42 aligned in two rows in the thickness direction of the drawing paper are formed on the surface of the printed wiring board (or glass substrate) 41, and the electrode terminals 42 are arranged between the rows. Applies an adhesive, for example a photocurable adhesive 44. Then, the crimp terminals (bumps) 31 according to the present invention are formed on the semiconductor device (semiconductor chip) 12.

【0073】接着剤44には熱硬化性樹脂, 熱可塑性樹
脂, 熱硬化性と熱可塑性樹脂の混合樹脂, 光硬化性樹脂
が、そして液状またはシート状のものが使用可能であ
り、さらに接着剤44は半導体チップ12に被着させてもよ
い。
As the adhesive 44, a thermosetting resin, a thermoplastic resin, a mixed resin of thermosetting and thermoplastic resins, a photocurable resin, and a liquid or sheet type can be used. 44 may be attached to the semiconductor chip 12.

【0074】かかる接着剤44の量は、半導体チップ12と
配線基板41との位置合わせを行ったのち、図12(ロ) に示
す如く半導体チップ12を押圧し圧着端子31の当接面 (突
部先端面)31aを電極端子42の先端部に当接せしめ拡径さ
せたとき、圧着端子31, 電極端子42に達しない量である
と共に、半導体チップ12をさらに強く押圧し圧着端子31
と電極端子42との接続が十分になるように圧着端子31の
突部を押し潰したとき、図12(ハ) に示す如く半導体チッ
プ12の下面全体に拡径し圧着端子31および電極端子42の
先端部を覆う量であり、接着剤44がシート状のときその
最適幅bは、接着剤44の厚さをh,圧着端子31の対向間
隔をa,圧着端子31の高さをh0 とすれば、b=a・h
0 /hから決定される。
After the semiconductor chip 12 and the wiring board 41 have been aligned with each other, the amount of the adhesive 44 is adjusted by pressing the semiconductor chip 12 as shown in FIG. (The end surface of the part) 31a is brought into contact with the tip of the electrode terminal 42 to expand the diameter, and the amount is such that it does not reach the crimp terminal 31 and the electrode terminal 42, and the semiconductor chip 12 is pressed further strongly and the crimp terminal 31
When the protrusion of the crimp terminal 31 is crushed so that the connection between the crimp terminal 31 and the electrode terminal 42 is sufficient, the crimp terminal 31 and the electrode terminal 42 are expanded to the entire lower surface of the semiconductor chip 12 as shown in FIG. 12C. When the adhesive 44 is in the form of a sheet, the optimum width b is the thickness of the adhesive 44, the facing distance of the crimp terminal 31 is a, and the height of the crimp terminal 31 is h 0. If so, b = a · h
It is determined from 0 / h.

【0075】そこで、接着剤44を硬化,例えば 180℃に
加熱して硬化せしめ、図12(ニ) に示すように、半導体チ
ップ12の下面全面に接着剤44が被着する半導体チップ12
の実装が完了する。接着剤44を二段階に分けて押し拡げ
ることで、圧着端子31を完全に被覆し, 不均一な残留歪
を生じないようにした一実施例において、半導体チップ
12の押圧力は、大きさが4×9mmであり 180個の圧着端
子31を形成した半導体チップ12に対し、一回目の押圧力
は約5kg, 二回目の押圧力は20〜25kgとし良い結果が得
られた。
Therefore, the adhesive 44 is hardened, for example, heated to 180 ° C. to be hardened, and as shown in FIG. 12D, the adhesive 44 is adhered to the entire lower surface of the semiconductor chip 12.
Is completed. In one embodiment in which the adhesive 44 is pushed and spread in two steps to completely cover the crimp terminal 31 and prevent non-uniform residual strain,
The pressing force of 12 is 4 × 9 mm and the pressing force of the first pressing is about 5 kg and the pressing force of the second pressing is 20-25 kg against the semiconductor chip 12 on which 180 crimp terminals 31 are formed. was gotten.

【0076】なお、図12を用いて説明した実施例は、一
回目の押圧力と二回目の押圧力をはっきり分けて説明し
た。しかし、一回目の押圧力は最終的に必要な押圧力
(二回目の押圧力)を付与した過程において得ることも
できるため、前記説明の如く明確に分ける必要はない。
In the embodiment described with reference to FIG. 12, the first pressing force and the second pressing force are clearly explained. However, since the first pressing force can be obtained in the process of finally applying the required pressing force (second pressing force), it is not necessary to clearly separate it as described above.

【0077】図13において、横軸は加熱温度 (℃),縦軸
は熱硬化性樹脂の硬化反応率 (%)であり、図から明ら
かなように加熱温度の上昇と共に進む熱硬化性樹脂の硬
化反応は、硬化温度が約 180℃であるとき、約 140℃が
硬化反応率が30〜60%となり仮接着が可能になる。
In FIG. 13, the horizontal axis represents the heating temperature (° C.) and the vertical axis represents the curing reaction rate (%) of the thermosetting resin. As is clear from the figure, Regarding the curing reaction, when the curing temperature is about 180 ° C, the curing reaction rate at about 140 ° C becomes 30 to 60%, and temporary adhesion becomes possible.

【0078】従って、図12を用いて説明した実施例にお
いて、熱硬化性接着剤44の硬化反応率が30〜60%の状態
となる加熱条件で一回目の押圧力を付与して圧着端子31
と電極端子42とを当接せしめ、圧着端子31と電極端子42
との接続状態を試験したのち、二回目の押圧力を付与す
ると共に加熱温度を高め、接着剤44を完全に硬化させ
る。
Therefore, in the embodiment described with reference to FIG. 12, the first pressing force is applied under the heating condition in which the curing reaction rate of the thermosetting adhesive 44 is 30 to 60%, and the crimp terminal 31 is applied.
The electrode terminal 42 and the crimp terminal 31 and the electrode terminal 42.
After the connection state with and is tested, the second pressing force is applied and the heating temperature is raised to completely cure the adhesive 44.

【0079】図14において、横軸は時間(hr), 縦軸は図
12を用いて説明した圧着端子31と電極端子42との接触抵
抗(mΩ) である。図中、▽で示す実測値を結ぶ特性(a),
○で示す実測値を結ぶ特性(b),△で示す実測値を結ぶ特
性(c),●で示す実測値を結ぶ特性(d) は、温度85℃, 湿
度85%の環境中における接触抵抗と経過時間との関係を
示すものである。
In FIG. 14, the horizontal axis represents time (hr) and the vertical axis represents the figure.
It is the contact resistance (mΩ) between the crimp terminal 31 and the electrode terminal 42 described using 12. In the figure, the characteristic (a) connecting the measured values shown by ▽,
The characteristics (b) connecting the measured values shown by ○, the characteristics connecting the measured values shown by △ (c), and the characteristics connecting the measured values shown by ● (d) are the contact resistance in an environment of temperature 85 ° C and humidity 85%. And the elapsed time.

【0080】ただし、実測値▽, 特性(a) は図12を用い
て説明した接続部を有する試料、実測値○, 特性(b) は
図32を用いて説明した従来のCOG接続部を有する試
料、実測値△,特性(c) は図33を用いて説明した従来の
接続部を有する試料、実測値●,特性(d) は図31を用い
て説明した従来の接続部を有する試料に対応する。
However, the measured value ∇, the characteristic (a) has a sample having the connecting portion described with reference to FIG. 12, and the measured value ◯, the characteristic (b) has the conventional COG connecting portion described with reference to FIG. 32. Sample, measured value △, characteristic (c) is the sample with the conventional connection described with reference to FIG. 33, measured value ●, characteristic (d) is the sample with the conventional connection described with reference to FIG. Correspond.

【0081】図14から明らかなように、図12を用いて説
明した接続部の接触抵抗は、他の試料より低く、かつ、
400 時間を超えても殆ど変化しない。それに反し、初期
において特性(b),(d) より低抵抗である特性(c) では、
20時間後から急峻に接触抵抗が増大する。特性(c) にお
ける接触抵抗の増大は、硬化させた接着用樹脂19の内部
応力が緩やかに弛緩し、電極13と配線18との接触面積が
減少することに起因するものと推測される。
As is clear from FIG. 14, the contact resistance of the connection portion described with reference to FIG. 12 is lower than that of the other samples, and
Almost no change over 400 hours. On the contrary, the characteristic (c), which has a lower resistance than the characteristics (b) and (d) in the initial stage,
The contact resistance sharply increases after 20 hours. It is speculated that the increase in contact resistance in the characteristic (c) is caused by the gradual relaxation of the internal stress of the cured adhesive resin 19 and the decrease in the contact area between the electrode 13 and the wiring 18.

【0082】図15(イ),(ロ) において、半導体チップ12に
設けられ例えば二辺が 120μm × 120μm であり高さが
約10μm のバンプ45の上に、例えば二辺が 100μm ×60
μmであり高さが10μm のメインバンプ (圧着端子) 46
と、例えば二辺が50μm ×25μm であり高さが5μm の
補助バンプ (補助端子) 47とを設ける。メインバンプ46
には、交差する二方向(縦横)に溝31,32 を設け、複数
個(図は12個)の当接面31a を形成させる。
15 (a) and 15 (b), for example, on a bump 45 provided on the semiconductor chip 12 and having two sides of 120 μm × 120 μm and a height of about 10 μm, for example, two sides of 100 μm × 60.
Main bumps (crimp terminals) of μm and height of 10 μm 46
And an auxiliary bump (auxiliary terminal) 47 having two sides of 50 μm × 25 μm and a height of 5 μm. Main bump 46
The grooves 31 and 32 are provided in two intersecting directions (vertical and horizontal) to form a plurality of (12 in the figure) abutting surfaces 31a.

【0083】金等にてなり従来バンプ45の上に設けるバ
ンプ46,47 は通常の製造方法、例えばガラス基板上にI
TO膜を被着し、その上に所定の透孔を有するレジスト
マスクを形成し、その透孔内に露呈するITO膜に金を
めっき形成させたのち、バンプ45に転写する。
The bumps 46 and 47, which are made of gold or the like and are provided on the conventional bump 45, are formed by a usual manufacturing method, for example, I on a glass substrate.
A TO film is deposited, a resist mask having a predetermined through hole is formed thereon, gold is plated on the ITO film exposed in the through hole, and then transferred to the bump 45.

【0084】ただし、背の低い補助バンプ47は背の高い
メインバンプ46に先立って転写し、しかるのち、メイン
バンプ46の溝31,32 は型押し等によって形成させる。図
15(ハ) において、ガラス基板14にはバンプ46を接続する
導体端子15を形成し、バンプ46を導体端子15に接続せし
めるのに適切なバンプ46の潰れ量が約3μmであるとす
ると、バンプ47と導体端子15との間隙は約2μm であ
る。
However, the short auxiliary bumps 47 are transferred prior to the tall main bumps 46, and then the grooves 31, 32 of the main bumps 46 are formed by stamping or the like. Figure
In 15 (c), if the conductor terminals 15 for connecting the bumps 46 are formed on the glass substrate 14 and the crush amount of the bumps 46 suitable for connecting the bumps 46 to the conductor terminals 15 is about 3 μm, The gap between 47 and the conductor terminal 15 is about 2 μm.

【0085】従って、レーザ顕微鏡等を用いる等により
全ての補助バンプ47と導体端子15との間隙を測定し、そ
の値が2μm 以下であればバンプ47の接続が正常と見做
せることになる。
Therefore, the gaps between all the auxiliary bumps 47 and the conductor terminals 15 are measured by using a laser microscope or the like, and if the value is 2 μm or less, the connection of the bumps 47 can be regarded as normal.

【0086】なお、バンプ46と導体端子15との接続の維
持には接着剤が必要であるため、補助バンプ47と導体端
子15との間隙測定は接着剤を通して行うことになる。か
かる測定においてレーザ顕微鏡は、接着剤に邪魔される
ことなく検出可能である。
Since an adhesive is required to maintain the connection between the bumps 46 and the conductor terminals 15, the gap between the auxiliary bumps 47 and the conductor terminals 15 is measured through the adhesive. In such a measurement, the laser microscope can detect without being obstructed by the adhesive.

【0087】図16は、楕円形のメインバンプ (圧着端
子) と補助バンプを示す平面図(イ) と、メインバンプを
相手端子に接続させたときのX−X′断面図(ロ) であ
る。図16(イ) において、半導体チップ12に設けられ二辺
が 120μm × 120μm であり高さが約10μm であるバン
プ45の上には、長径が 100μm,短径が60μm,高さが10μ
m のメインバンプ48と、長径が40μm,短径が25μm,高さ
が5μm の補助バンプ49とを設ける。
FIG. 16 is a plan view (a) showing an elliptical main bump (crimp terminal) and an auxiliary bump, and a sectional view (b) taken along the line XX ′ when the main bump is connected to a mating terminal. . In Figure 16 (a), the major axis is 100 μm, the minor axis is 60 μm, and the height is 10 μm on the bump 45, which has 120 μm × 120 μm on two sides and a height of about 10 μm.
A main bump 48 of m 2 and an auxiliary bump 49 having a long diameter of 40 μm, a short diameter of 25 μm and a height of 5 μm are provided.

【0088】ただし、金のメインバンプ48と補助バンプ
49とは千鳥状に配設し、バンプ48の潰れ過ぎが生じた場
合でも、隣接するバンプ48間の短絡を防止する構成であ
り、メインバンプ48の上面は、溝31,32(図15参照) の形
成によって複数の当接面31a(図15参照) に分割してあ
る。
However, the gold main bump 48 and the auxiliary bump
49 is arranged in a zigzag pattern and is configured to prevent a short circuit between the adjacent bumps 48 even when the bumps 48 are excessively crushed, and the upper surface of the main bump 48 has grooves 31, 32 (see FIG. 15). ), It is divided into a plurality of contact surfaces 31a (see FIG. 15).

【0089】そこで、メインバンプ48とその接続相手で
ある導体端子15との位置合わせをしたのち、半導体チッ
プ12を 200℃程度に加熱しながら例えば10kg/cm2程度の
圧力を20秒程度加え、半導体チップ12をガラス基板14に
押圧させると図16(ロ) に示す如く、溝(31,32) の形成に
よるバンプ48の突部が塑性変形し導体端子15と電気的に
接続されるようになる。
Therefore, after the main bump 48 and the conductor terminal 15 which is the connection partner thereof are aligned, a pressure of, for example, about 10 kg / cm 2 is applied for about 20 seconds while heating the semiconductor chip 12 to about 200 ° C. When the semiconductor chip 12 is pressed against the glass substrate 14, the projections of the bumps 48 due to the formation of the grooves (31, 32) are plastically deformed and electrically connected to the conductor terminals 15, as shown in FIG. 16B. Become.

【0090】従って、バンプ48の潰れ量の適否, 即ちバ
ンプ48と導体端子15との電気的接続の良否は、図15を用
いて説明した如く補助バンプ49と導体端子15との間隙を
レーザ顕微鏡等にて測定し、確認可能になる。
Therefore, whether the crush amount of the bump 48 is appropriate, that is, whether the electrical connection between the bump 48 and the conductor terminal 15 is good or not is determined by checking the gap between the auxiliary bump 49 and the conductor terminal 15 with a laser microscope as described with reference to FIG. It will be possible to measure and confirm with such as.

【0091】図17は、楕円形のメインバンプ (圧着端
子) と一対の補助バンプを示す平面図(イ) と、メインバ
ンプを相手端子に接続させたときのX−X′断面図(ロ)
である。
FIG. 17 is a plan view showing an elliptical main bump (crimp terminal) and a pair of auxiliary bumps (a), and a sectional view taken along the line XX 'when the main bump is connected to a mating terminal (b).
Is.

【0092】図17(イ) において、半導体チップ12に設け
られ二辺が 120μm × 120μm であり高さが約10μm で
あるバンプ45の上には、長径が35μm,短径が10μm,高さ
が5μm の第2の補助バンプ50と、長径が50μm,短径が
35μm,高さが7μm の第1 の補助バンプ51と、長径が 1
00μm,短径が40μm,高さが10μm のメインバンプ52を設
ける。
In FIG. 17 (a), on the bump 45 provided on the semiconductor chip 12 with two sides of 120 μm × 120 μm and a height of about 10 μm, the major axis is 35 μm, the minor axis is 10 μm, and the height is The second auxiliary bump 50 of 5 μm has a major axis of 50 μm and a minor axis of
1st auxiliary bump 51 with 35 μm and height of 7 μm and major axis 1
A main bump 52 having a diameter of 00 μm, a short diameter of 40 μm and a height of 10 μm is provided.

【0093】ただし、金にてなる一対の補助バンプ50,5
1 とメインバンプ52とはそれぞれが千鳥状配設であり、
バンプ52の潰れ過ぎが生じた場合でも、隣接するバンプ
52間の短絡を防止する構成であり、メインバンプ52の上
面は、溝31,32(図15参照) の形成によって複数の当接面
31a(図15参照) に分割してある。
However, a pair of auxiliary bumps 50, 5 made of gold
1 and the main bump 52 are arranged in a staggered pattern,
Even if the bump 52 is over-crushed, the adjacent bump
It is configured to prevent a short circuit between 52, and the upper surface of the main bump 52 has a plurality of contact surfaces formed by forming grooves 31 and 32 (see FIG. 15).
It is divided into 31a (see Fig. 15).

【0094】そこで、メインバンプ52とその接続相手で
ある導体端子15との位置合わせをしたのち、半導体チッ
プ12を 200℃程度に加熱しながら例えば10kg/cm2程度の
圧力を20秒程度加え、半導体チップ12をガラス基板14に
押圧させると図17(ロ) に示す如く、溝(31,32) の形成に
よるバンプ52の突部が塑性変形し導体端子15と電気的に
接続されるようになる。
Therefore, after aligning the main bump 52 and the conductor terminal 15 which is a connection partner thereof, while heating the semiconductor chip 12 to about 200 ° C., for example, a pressure of about 10 kg / cm 2 is applied for about 20 seconds, When the semiconductor chip 12 is pressed against the glass substrate 14, the protrusions of the bumps 52 due to the formation of the grooves (31, 32) are plastically deformed and electrically connected to the conductor terminals 15, as shown in FIG. 17B. Become.

【0095】補助バンプ51は、半導体チップ12をガラス
基板14に向けて押圧したとき、メインバンプ52の所定の
潰れ量3μm に対するストッパーの役割を果たし、バン
プ52の潰れ量の適否, 即ちバンプ52と導体端子15との電
気的接続の良否は、図15を用いて説明した如く補助バン
プ50と導体端子15との間隙をレーザ顕微鏡等にて測定
し、確認可能になる。
When the semiconductor chip 12 is pressed toward the glass substrate 14, the auxiliary bump 51 plays a role of a stopper for the predetermined crush amount of the main bump 52 of 3 μm. The quality of the electrical connection with the conductor terminal 15 can be confirmed by measuring the gap between the auxiliary bump 50 and the conductor terminal 15 with a laser microscope or the like as described with reference to FIG.

【0096】図18に示す実施例は、半導体チップ12を配
線基板41に向けて押圧し、配線基板41または半導体チッ
プ12の一方に被着させた接着剤44を拡径せしめるに際
し、半導体チップ12の押圧力をできるだけ小さくさせる
構成である。
In the embodiment shown in FIG. 18, the semiconductor chip 12 is pressed toward the wiring board 41 to expand the diameter of the adhesive 44 adhered to one of the wiring board 41 and the semiconductor chip 12. The pressing force of is as small as possible.

【0097】図18において、(イ) は一回目の押圧により
半導体チップ12のバンプ(圧着端子)31を電極端子42に
当接させた側面図であり、次いで一回目の押圧力より強
い二回目の押圧力を付加すると、側面図(ロ) の状態を経
て、全バンプ31が接着剤44に覆われた側面図(ハ) のよう
になる。
In FIG. 18, (a) is a side view in which the bumps (crimping terminals) 31 of the semiconductor chip 12 are brought into contact with the electrode terminals 42 by the first pressing, and then the second pressing force stronger than the first pressing force. When the pressing force is applied, all the bumps 31 are covered with the adhesive 44 as shown in the side view (b) through the state of the side view (b).

【0098】なお図中において、(ニ) は側面図(イ) にお
けるバンプ31と接着剤44との関係を示す図、(ホ) は側面
図(ロ) におけるバンプ31と接着剤44との関係を示す図、
(ヘ)は側面図(ハ) におけるバンプ31と接着剤44との関係
を示す図である。
In the figure, (d) shows the relationship between the bump 31 and the adhesive 44 in the side view (a), and (e) shows the relationship between the bump 31 and the adhesive 44 in the side view (b). Showing the figure,
(F) is a diagram showing the relationship between the bump 31 and the adhesive 44 in the side view (C).

【0099】電極端子42を形成した配線基板41と半導体
チップ12との間に接着剤44を挟み、一回目の押圧例えば
5kgの押圧力で半導体チップ12を配線基板41に向けて押
圧すると、図18(イ) および(ニ) に示す如く、バンプ31に
形成した当接面31a(図9参照)は電極端子42の先端部と
電気的に接続する。そのとき、予め定量化された接着剤
44は、バンプ31および電極端子42の先端部に達しない程
度に拡径するようになる。
When the adhesive 44 is sandwiched between the wiring board 41 on which the electrode terminals 42 are formed and the semiconductor chip 12, and the semiconductor chip 12 is pressed toward the wiring board 41 by the first pressing, for example, a pressing force of 5 kg, As shown in 18 (a) and 18 (d), the contact surface 31a (see FIG. 9) formed on the bump 31 is electrically connected to the tip of the electrode terminal 42. At that time, the pre-quantified adhesive
The diameter of the 44 is increased so that it does not reach the tip of the bump 31 and the electrode terminal 42.

【0100】次いで、半導体チップ12を配線基板41に向
けて二回目の押圧力を加える、例えば10kg程度の押圧力
で押圧すると、図18(ロ) と(ホ) に示す如く接着剤44が同
一列中央部のバンプ31に掛かる程度に拡径する状態を経
て、図18(ハ) と(ヘ) に示す如く、全バンプ31が覆われる
ように接着剤44が拡径し、その状態で接着剤44を硬化せ
しめ半導体チップ12の実装が完了する。
Next, when the semiconductor chip 12 is pressed toward the wiring board 41 for the second time, for example, with a pressing force of about 10 kg, the adhesive 44 is the same as shown in FIGS. 18 (b) and 18 (e). After the diameter is expanded to the extent that it covers the bumps 31 in the center of the row, the adhesive 44 expands so that all the bumps 31 are covered, as shown in FIGS. The agent 44 is cured to complete the mounting of the semiconductor chip 12.

【0101】かかる半導体チップ12の実装において、本
発明によるバンプ31を適用することで二回目の押圧力
は、従来のバンプ13 (図33参照)を使用したときの1/2
程度、例えば従来技術で20kg程度であったものが10kg程
度に低減できる。
In the mounting of the semiconductor chip 12, by applying the bumps 31 according to the present invention, the second pressing force is 1/2 that when the conventional bumps 13 (see FIG. 33) are used.
For example, it is possible to reduce from about 20 kg in the prior art to about 10 kg.

【0102】図18の実施例よりもさらに半導体チップ押
圧力を低減させる実施例の説明図である図19において、
バンプ31を二列に形成した半導体チップ12′は、バンプ
31の列間距離をaとしたとき、列端バンプ31と半導体チ
ップ端との間隔bを距離aの1/2以上とする。
FIG. 19 is an explanatory view of an embodiment for further reducing the semiconductor chip pressing force as compared with the embodiment of FIG.
The semiconductor chip 12 'with the bumps 31 formed in two rows is
When the column-to-column distance of 31 is a, the distance b between the column-end bump 31 and the semiconductor chip end is set to 1/2 or more of the distance a.

【0103】図18(ホ) に示すように、押圧力による接着
剤44の拡がりは半導体チップ12の四隅で拡がり難くな
る。かかる課題を解決することにより、半導体チップ押
圧力を低減させたのが図19の実施例であり、そのことに
よって図19に破線で示す如く、全バンプ31を覆うような
接着剤44の拡径には、図18の実施例の二回目の押圧力に
対応する押圧力を80%程度に低減可能とする。
As shown in FIG. 18 (e), the spread of the adhesive 44 due to the pressing force is hard to spread at the four corners of the semiconductor chip 12. It is the embodiment of FIG. 19 that the semiconductor chip pressing force is reduced by solving such a problem, and as a result, as shown by the broken line in FIG. 19, the diameter of the adhesive 44 that covers all the bumps 31 is expanded. In addition, the pressing force corresponding to the second pressing force in the embodiment of FIG. 18 can be reduced to about 80%.

【0104】なお、図18または図19を用いて説明した実
施例において、一回目の押圧力と二回目の押圧力をはっ
きり分けて説明した。しかし、一回目の押圧力は最終的
に必要な押圧力(二回目の押圧力)を付与した過程にお
いて得ることもできるため、前記説明の如く明確に分け
る必要はない。
In the embodiment described with reference to FIG. 18 or FIG. 19, the first pressing force and the second pressing force have been clearly explained. However, since the first pressing force can be obtained in the process of finally applying the required pressing force (second pressing force), it is not necessary to clearly separate it as described above.

【0105】図20において、エッチングまたは形押し手
段によってバンプ31-1〜31-6には、連続する山形突条53
または, 不連続の山形突条54または, 角形突起55また
は,角形突起56または,円錐状突起57または,円柱状突
起58を形成したものであり、かかるバンプ31-1〜31
-6は、溝32,33(図9参照)により当接面31a を形成した
バンプ31 (図9参照)と同様に使用することができる。
In FIG. 20, continuous chevron-shaped projections 53 are formed on the bumps 31 -1 to 31 -6 by etching or stamping means.
Alternatively, a discontinuous chevron ridge 54, a square protrusion 55, a square protrusion 56, a conical protrusion 57, or a columnar protrusion 58 is formed, and such bumps 31 -1 to 31
-6 can be used similarly to the bump 31 (see FIG. 9) in which the contact surface 31a is formed by the grooves 32 and 33 (see FIG. 9).

【0106】図21において、絶縁フィルム3には、フォ
トエッチングによる導体パターン6を形成し、接着剤8
にて絶縁フィルム3に貼着された導体パターン6の一端
である圧着端子6j の上面、例えば長さ3mm程度である
各圧着端子6j の上面には、導体パターン6の長さ方向
の溝17dと、導体パターン6を幅方向に横切る複数本
(図は2本)の溝60とを形成する。
In FIG. 21, a conductor pattern 6 is formed on the insulating film 3 by photoetching, and an adhesive 8 is formed.
On the upper surface of the crimp terminal 6j which is one end of the conductor pattern 6 adhered to the insulating film 3, for example, on the upper surface of each crimp terminal 6j having a length of about 3 mm, a groove 17d in the length direction of the conductor pattern 6 is formed. , A plurality of conductor patterns 6 across the width direction
(FIG. 2 shows two grooves).

【0107】接着剤流入用の溝17dは例えば幅2μm,深
さ1〜2μm 程度とし、帯状の接着剤44を貼付する溝60
は溝17dより深く,広幅であり、溝17d,60はエッチング
または型押しにより形成する。
The groove 17d for the inflow of the adhesive has a width of 2 μm and a depth of 1 to 2 μm, for example, and the groove 60 for adhering the adhesive 44 in a band shape.
Is deeper and wider than the groove 17d, and the grooves 17d and 60 are formed by etching or embossing.

【0108】図22(イ) において、絶縁フィルム3には、
フォトエッチングによる導体パターン6を形成し、接着
剤8にて絶縁フィルム3に貼着された導体パターン6の
一端である圧着端子6k の上面、例えば長さ3mm程度で
ある各圧着端子6k の上面には、導体パターン6の長さ
方向の溝17dと、導体パターン6を幅方向に横切る複数
本の溝17e と、導体パターン6を幅方向に横切る複数本
(図は2本)の溝60とを形成する。
In FIG. 22A, the insulating film 3 has
The conductor pattern 6 is formed by photo-etching, and is attached to the upper surface of the crimp terminal 6k which is one end of the conductor pattern 6 adhered to the insulating film 3 with the adhesive 8, for example, the upper surface of each crimp terminal 6k having a length of about 3 mm. Is a groove 17d in the length direction of the conductor pattern 6, a plurality of grooves 17e crossing the conductor pattern 6 in the width direction, and a plurality of grooves 17e crossing the conductor pattern 6 in the width direction.
(FIG. 2 shows two grooves).

【0109】接着剤流入用の溝17dおよび17e とは、例
えば幅2μm,深さ1〜2μm 程度とし、帯状の接着剤44
を貼付する溝60は溝17d および17e より深く,広幅であ
り、溝17d,17e,60はエッチングまたは型押しにより形成
する。
The grooves 17d and 17e for inflowing the adhesive have a width of 2 μm and a depth of 1 to 2 μm, for example, and the band-shaped adhesive 44
The groove 60 for adhering is deeper and wider than the grooves 17d and 17e, and the grooves 17d, 17e, 60 are formed by etching or embossing.

【0110】図22(ロ),(ハ) および(ニ),(ホ) は、圧着端子
6k と同類の圧着端子6l,6m の平面図とその側面図で
ある。図22(ロ),(ハ) において、導体パターン6の一端で
あり圧着端子6k と同類の圧着端子6l は、導体パター
ン6を幅方向に横切る複数本の三角溝17f と、複数本
(図は2本)の溝60とを形成してなる。溝17f,60はエッ
チングまたは型押しにより形成する。
22 (b), 22 (c), 22 (d), and 22 (e) are a plan view and a side view of the crimp terminals 6l, 6m, which are similar to the crimp terminal 6k. 22 (b) and 22 (c), the crimp terminal 6l, which is one end of the conductor pattern 6 and is similar to the crimp terminal 6k, has a plurality of triangular grooves 17f crossing the conductor pattern 6 in the width direction and a plurality of crimp terminals 17f.
(Two in the figure). The grooves 17f and 60 are formed by etching or embossing.

【0111】図22(ニ),(ホ) において、導体パターン6の
一端であり圧着端子6k と同類の圧着端子6m は、導体
パターン6の長さ方向の溝17dと、導体パターン6を幅
方向に横切る複数本の丸み付き三角溝17g と、複数本
(図は2本)の溝60とを形成してなる。溝17d,17g,60は
エッチングまたは型押しにより形成する。
22 (d) and 22 (e), a crimp terminal 6m, which is one end of the conductor pattern 6 and is similar to the crimp terminal 6k, has a groove 17d in the length direction of the conductor pattern 6 and the conductor pattern 6 in the width direction. 17g with multiple rounded triangular grooves across
(Two in the figure). The grooves 17d, 17g, 60 are formed by etching or embossing.

【0112】かかる圧着端子6j,6k,6l,6m は、図21
(ロ) に示す如く溝60に接着剤44を貼付し、相手端子11
(図7参照)に重ね加熱,加圧すると、圧着端子6j,6
k,6l,6m と相手端子11とは直接に当接し電気的に接続
すると共に、接着剤44の一部は溝17d,17e,17f,17g に流
入して硬化し、圧着端子6j,6k,6l,6m と相手端子11
との電気的当接面に付くことなく、圧着端子6j,6k,6
l,6m と相手端子11との接続が維持するようになる。
The crimp terminals 6j, 6k, 6l, 6m are shown in FIG.
As shown in (b), attach the adhesive 44 to the groove 60, and
(See Fig. 7) When heated and pressed on top of each other, the crimp terminals 6j, 6
The k, 6l, 6m and the mating terminal 11 directly contact and electrically connect to each other, and a part of the adhesive 44 flows into the grooves 17d, 17e, 17f, 17g and hardens, and the crimping terminals 6j, 6k, 6l, 6m and mating terminal 11
Crimping terminals 6j, 6k, 6 without sticking to the electrical contact surface with
The connection between l and 6m and the mating terminal 11 will be maintained.

【0113】図23(イ) において、絶縁フィルム3には、
フォトエッチングによる導体パターン6を形成し、接着
剤8にて絶縁フィルム3に貼着された導体パターン6の
一端である圧着端子6n の上面、例えば長さ3mm程度で
ある各圧着端子6n の上面には、導体パターン6の長さ
方向の溝17dを形成し、圧着端子6n の先端より適当な
間隔だけ離れた接着剤8には、導体パターン6の厚さよ
りやや厚い堤61を形成する。
In FIG. 23A, the insulating film 3 has
The conductor pattern 6 is formed by photoetching, and is attached to the upper surface of the crimp terminal 6n, which is one end of the conductor pattern 6 adhered to the insulating film 3 with the adhesive 8, for example, the upper surface of each crimp terminal 6n having a length of about 3 mm. Forms a groove 17d in the lengthwise direction of the conductor pattern 6 and forms a bank 61 which is slightly thicker than the thickness of the conductor pattern 6 in the adhesive 8 which is separated from the tip of the crimp terminal 6n by an appropriate distance.

【0114】導体パターン6の長さ方向に対し直交する
方向に延在する堤61と、導体パターン6との間は、図23
(ロ) に示すように、導体パターン6とほぼ同じ厚さの接
着剤44を貼付する領域である。
The space between the bank 61 extending in the direction orthogonal to the lengthwise direction of the conductor pattern 6 and the conductor pattern 6 is shown in FIG.
As shown in (b), this is a region where the adhesive 44 having substantially the same thickness as the conductor pattern 6 is attached.

【0115】図23(ハ) に示すように、圧着端子6n と配
線基板41に形成した電極端子42との電気的接続は、接着
剤44の一部が溝17dに流入し硬化するも、接着剤44が電
気的当接面に接着剤44が付くことなく、維持されるよう
になる。
As shown in FIG. 23 (C), the electrical connection between the crimp terminal 6n and the electrode terminal 42 formed on the wiring board 41 is performed even if a part of the adhesive 44 flows into the groove 17d and hardens. The agent 44 is maintained without the adhesive 44 sticking to the electrical contact surface.

【0116】図24(イ) において、耐熱性の保護フィルム
62には、少なくとも幅方向に接着剤流入溝を設けた圧着
端子のピッチと同一ピッチで、複数本の帯状接着剤44を
貼着する。
In FIG. 24 (a), a heat-resistant protective film
A plurality of strip adhesives 44 are attached to 62 at the same pitch as the pitch of the crimp terminals provided with the adhesive inflow grooves at least in the width direction.

【0117】そして、図24(ロ) に示す如く、幅方向に接
着剤流入溝を設けた圧着端子6p と接着剤44とが互いに
入り込むように、圧着端子6p を形成した絶縁フィルム
3と保護フィルム62とを重ね加熱, 加圧する。ただし、
接着剤44が熱硬化性樹脂のときの該加熱は、該樹脂が転
写可能かつ完全硬化しない温度とする。
Then, as shown in FIG. 24 (b), the insulation film 3 and the protective film having the crimping terminal 6p formed so that the crimping terminal 6p having the adhesive inflow groove in the width direction and the adhesive 44 enter each other. Overlap 62 and heat and pressurize. However,
When the adhesive 44 is a thermosetting resin, the heating is performed at a temperature at which the resin is transferable and does not completely cure.

【0118】その結果、図24(ハ) に示す如く軟化した接
着剤44は、圧着端子6p の形成間と接着剤流入溝に充填
して硬化するも、圧着端子6p の電気的当接面6b に接
着剤44が付くことなく被着する。
As a result, the softened adhesive 44 as shown in FIG. 24 (c) is filled between the formation of the crimp terminal 6p and the adhesive inflow groove and hardened, but the electrical contact surface 6b of the crimp terminal 6p. It is applied without the adhesive 44 attached to.

【0119】従って、当接面6b とその接続相手との電
気的接続に際しては、圧着端子6pに被着した接着剤44
を利用しその接続を維持させることになる。図25におい
て、絶縁フィルム3および複数本の圧着端子6n を貼着
するための接着剤8には、圧着端子6n の長さ方向に交
差する複数本の線状透孔、例えば幅が数十μm の透孔63
があけられている。
Therefore, at the time of electrical connection between the contact surface 6b and the connection partner, the adhesive 44 applied to the crimp terminal 6p.
Will be used to maintain the connection. In FIG. 25, the insulating film 3 and the adhesive 8 for adhering the plurality of crimp terminals 6n include a plurality of linear through holes intersecting in the length direction of the crimp terminals 6n, for example, a width of several tens of μm. Through hole 63
Has been opened.

【0120】図26(イ),(ロ) において、絶縁フィルム3お
よび複数本の圧着端子6n を貼着するための接着剤8に
は、(イ) に示す如くその全面に渡ってまたは、(ロ) に示
す如く圧着端子6n の貼着部を避けて、多数の透孔、例
えば直径数十μm の透孔64があけられている。
In FIGS. 26 (a) and 26 (b), the adhesive 8 for adhering the insulating film 3 and the plurality of crimp terminals 6n is provided on the entire surface thereof or as shown in FIG. As shown in (b), a large number of through holes, for example, a through hole 64 having a diameter of several tens of μm, are formed while avoiding the pasted portion of the crimp terminal 6n.

【0121】図27を用いて透孔63,64 の利用方法を説明
する。図27(イ) において、接着剤8を介し表面に圧着端
子6n を貼着した絶縁フィルム3の裏面には、透孔63,6
4 を塞ぐように接着剤44を貼付または塗付し、圧着端子
6n をその接続相手である電極端子42に対向させる。
A method of using the through holes 63 and 64 will be described with reference to FIG. In FIG. 27 (a), through holes 63, 6 are provided on the back surface of the insulating film 3 having the pressure-bonding terminals 6n attached to the front surface via the adhesive 8.
Adhesive 44 is applied or coated so as to close 4 and the crimp terminal 6n is opposed to the electrode terminal 42 which is the connection partner.

【0122】そこで、接着剤44に対向せしめ配設した加
熱・加圧用ウエッジ65を使用し、圧着端子6n を電極端
子42に当接させると、図27(ロ) に示す如く、軟化した接
着剤44は透孔63または64を通って、圧着端子6n と電極
端子42との接続部の周囲に流れ込むようになり、その接
着剤44を硬化させて圧着端子6n と電極端子42との接続
が完了する。
Therefore, when the heating / pressurizing wedge 65 disposed so as to face the adhesive 44 is used and the crimp terminal 6n is brought into contact with the electrode terminal 42, the softened adhesive is obtained as shown in FIG. 27 (b). 44 passes through the through holes 63 or 64 and flows into the periphery of the connection portion between the crimp terminal 6n and the electrode terminal 42, and the adhesive 44 is cured to complete the connection between the crimp terminal 6n and the electrode terminal 42. To do.

【0123】図28は接着剤を使用せずクリップにより本
発明の圧着端子を接続する実施例の説明図である。図28
において、配線基板66には保護膜67に保護された導体パ
ターン68が形成され、導体パターン68の一端は半田によ
り電極端子42に接続する。そして、導体パターン68の他
端には本発明による圧着端子、例えば圧着端子6d を形
成し、電極端子11と圧着端子6d とは、ばね性を有する
クリップ67の圧縮力を利用し圧着させる。
FIG. 28 is an explanatory view of an embodiment in which the crimp terminal of the present invention is connected by a clip without using an adhesive. Figure 28
In, the conductor pattern 68 protected by the protective film 67 is formed on the wiring board 66, and one end of the conductor pattern 68 is connected to the electrode terminal 42 by soldering. Then, a crimp terminal according to the present invention, for example, a crimp terminal 6d is formed on the other end of the conductor pattern 68, and the electrode terminal 11 and the crimp terminal 6d are crimped by utilizing the compressive force of the clip 67 having spring property.

【0124】かかる圧着に際し、図1を用いて既に説明
した圧着端子6d は、溝17a,17b の形成に伴う突部の先
端が当接面6b であり、該突部はクリップ67の圧縮力に
よって塑性変形するため、簡便かつ安定性の電気的接続
が確保されるようになる。
At the time of such crimping, in the crimping terminal 6d which has already been described with reference to FIG. 1, the tips of the projections due to the formation of the grooves 17a and 17b are the contact surfaces 6b, and the projections are compressed by the clip 67. Because of plastic deformation, a simple and stable electrical connection can be secured.

【0125】[0125]

【発明の効果】以上説明したように、本発明による圧着
端子とその端子を用いた接続方法および半導体装置の実
装方法は、従来の圧着端子,その端子を用いた接続より
多数の点で当接可能とし、かつ、圧着端子上面の溝に充
填された接着剤が圧着端子の接続維持に寄与するため、
電気的接続に対する安定性・信頼性を改善した効果を有
する。
As described above, the crimp terminal according to the present invention, the connecting method using the terminal, and the mounting method of the semiconductor device are contacted at a number of points more than the conventional crimp terminal and the connection using the terminal. It is possible, and since the adhesive filled in the groove on the top of the crimp terminal contributes to maintaining the connection of the crimp terminal,
It has the effect of improving stability and reliability for electrical connection.

【0126】特に、本発明により圧着端子と相手端子と
の当接面に接着剤が侵入させない構成、接着剤による歪
の影響を低減させる二段階押圧構成、圧着端子と相手端
子との接続を顕微鏡で確認可能な構成の適用により、前
記効果は一層顕著になる。
In particular, according to the present invention, a structure in which the adhesive does not enter the contact surface between the crimp terminal and the mating terminal, a two-step pressing structure for reducing the influence of distortion due to the adhesive, and a connection between the crimping terminal and the mating terminal are made by a microscope. By applying the configuration that can be confirmed by the above, the above effect becomes more remarkable.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明による圧着端子の実施例を示す斜視図
(その1)
FIG. 1 is a perspective view showing an embodiment of a crimp terminal according to the present invention (No. 1)

【図2】 本発明による圧着端子の実施例を示す斜視図
(その2)
FIG. 2 is a perspective view showing an embodiment of the crimp terminal according to the present invention (No. 2)

【図3】 本発明による圧着端子の実施例を示す斜視図
(その3)
FIG. 3 is a perspective view showing an embodiment of the crimp terminal according to the present invention (part 3).

【図4】 本発明による圧着端子の第1の製造例の説明
FIG. 4 is an explanatory view of a first manufacturing example of the crimp terminal according to the present invention.

【図5】 本発明による圧着端子の第2の製造例の説明
FIG. 5 is an explanatory view of a second manufacturing example of the crimp terminal according to the present invention.

【図6】 本発明による圧着端子の第3の製造例の説明
FIG. 6 is an explanatory view of a third manufacturing example of the crimp terminal according to the present invention.

【図7】 本発明の実施例による圧着端子接続方法の説
明図
FIG. 7 is an explanatory diagram of a crimp terminal connection method according to an embodiment of the present invention.

【図8】 本発明による圧着端子の実施例を示す斜視図
(その4)とその接続状態を示す断面図
FIG. 8 is a perspective view (No. 4) showing an embodiment of the crimp terminal according to the present invention and a cross-sectional view showing a connection state thereof.

【図9】 本発明の実施例によるCOG接続の説明図FIG. 9 is an explanatory diagram of COG connection according to an embodiment of the present invention.

【図10】 本発明の他の実施例によるCOG接続用圧着
端子の説明図
FIG. 10 is an explanatory view of a crimp terminal for COG connection according to another embodiment of the present invention.

【図11】 本発明のさらに他の実施例による圧着端子と
そのCOG接続の説明図
FIG. 11 is an explanatory view of a crimp terminal and its COG connection according to still another embodiment of the present invention.

【図12】 半導体装置を二段階に押圧する本発明方法の
実施例の説明図
FIG. 12 is an explanatory view of an embodiment of the method of the present invention for pressing a semiconductor device in two steps.

【図13】 熱硬化性接着剤の硬化反応率と加熱温度との
関係を示す図
FIG. 13 is a diagram showing the relationship between the curing reaction rate of the thermosetting adhesive and the heating temperature.

【図14】 図12の本発明方法による接続部の接触抵抗の
経時変化を示す図
FIG. 14 is a diagram showing the change over time in the contact resistance of the connection portion according to the method of the present invention in FIG.

【図15】 補助バンプを使用する本発明の基本構成の説
明図
FIG. 15 is an explanatory diagram of a basic configuration of the present invention using an auxiliary bump.

【図16】 補助バンプを使用する本発明の実施例の説明
図 (その1)
FIG. 16 is an explanatory diagram of an embodiment of the present invention using an auxiliary bump (No. 1)

【図17】 補助バンプを使用する本発明の実施例の説明
図 (その2)
FIG. 17 is an explanatory diagram of an embodiment of the present invention using an auxiliary bump (No. 2)

【図18】 本発明の実施例に適用する半導体装置実装方
法の説明図
FIG. 18 is an explanatory diagram of a semiconductor device mounting method applied to the embodiment of the present invention.

【図19】 本発明の実施例に適用する新しいバンプ配列
の説明図
FIG. 19 is an explanatory diagram of a new bump array applied to the embodiment of the present invention.

【図20】 本発明を適用したバンプの実施例の説明図FIG. 20 is an explanatory diagram of an example of a bump to which the present invention has been applied.

【図21】 本発明により接着剤流入溝を設けた圧着端子
の説明図(その1)
FIG. 21 is an explanatory view of a crimp terminal provided with an adhesive inflow groove according to the present invention (No. 1)

【図22】 本発明により接着剤流入溝を設けた圧着端子
の説明図(その2)
FIG. 22 is an explanatory view of a crimp terminal provided with an adhesive inflow groove according to the present invention (part 2).

【図23】 本発明により接着剤流入溝を設けた圧着端子
の説明図(その3)
FIG. 23 is an explanatory view of a crimp terminal provided with an adhesive inflow groove according to the present invention (part 3).

【図24】 本発明により接着剤流入溝を設けた圧着端子
の説明図(その4)
FIG. 24 is an explanatory view of a crimp terminal provided with an adhesive inflow groove according to the present invention (Part 4).

【図25】 本発明により接着剤流入溝を設けた圧着端子
の説明図(その5)
FIG. 25 is an explanatory view (5) of the crimp terminal provided with the adhesive inflow groove according to the present invention.

【図26】 本発明により接着剤流入溝を設けた圧着端子
の説明図(その6)
FIG. 26 is an explanatory view (6) of the crimp terminal provided with the adhesive inflow groove according to the present invention.

【図27】 図25,26 に示す圧着端子の接続方法の説明図FIG. 27 is an explanatory diagram of a connection method for the crimp terminals shown in FIGS.

【図28】 クリップにより本発明圧着端子の接続例の説
明図
FIG. 28 is an explanatory view of an example of connecting the crimp terminal of the present invention with a clip.

【図29】 液晶表示装置の表示ユニットの構成例を示す
平面図
FIG. 29 is a plan view showing a configuration example of a display unit of a liquid crystal display device.

【図30】 半導体装置搭載絶縁フィルムの一例の概略構
成を示す平面図
FIG. 30 is a plan view showing a schematic configuration of an example of a semiconductor device mounting insulating film.

【図31】 異方導電性樹脂フィルムを利用した従来の端
子接続方法の説明図
FIG. 31 is an explanatory view of a conventional terminal connection method using an anisotropic conductive resin film.

【図32】 COG接続による半導体装置実装方法の説明
FIG. 32 is an explanatory diagram of a semiconductor device mounting method by COG connection.

【図33】 バンプとその相手端子の間に接着剤を挟まな
い従来例の説明図
FIG. 33 is an explanatory view of a conventional example in which an adhesive is not sandwiched between a bump and its mating terminal.

【符号の説明】[Explanation of symbols]

1a はガラス基板(耐熱性絶縁基板) 3は耐熱性絶縁フィルム 6は金属箔をパターニングした導体パターン 6b,31a,38aは圧着端子の当接面 6d,6e,6f,6g,6h,6i,6j,6k,6l,6m,6n,31,36,46,48,52 は
圧着端子 9,16,25,44は接着剤 11,15,42は相手端子 12は半導体装置 (半導体チップ) 14は半導体装置実装基板 16は熱硬化性樹脂または熱可塑性樹脂または熱硬化性樹
脂と熱可塑性樹脂の混合樹脂または光硬化性樹脂の接着
剤 17a,17b,17c,32,33,34,35 は圧着端子の上面に形成した
溝 17d は接着剤流入溝 47,49,50は補助バンプ
1a is a glass substrate (heat resistant insulating substrate) 3 is a heat resistant insulating film 6 is a conductor pattern formed by patterning a metal foil 6b, 31a, 38a is a contact surface of a crimp terminal 6d, 6e, 6f, 6g, 6h, 6i, 6j , 6k, 6l, 6m, 6n, 31,36,46,48,52 are crimp terminals 9,16,25,44 are adhesives 11,15,42 are mating terminals 12 are semiconductor devices (semiconductor chips) 14 are semiconductors The device mounting board 16 is a thermosetting resin, a thermoplastic resin, or a mixed resin of thermosetting resin and thermoplastic resin, or an adhesive of a photocurable resin.17a, 17b, 17c, 32, 33, 34, 35 are crimp terminals. Groove 17d formed on the upper surface is an adhesive inflow groove 47, 49, 50 is an auxiliary bump.

フロントページの続き (72)発明者 助田 俊明 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 渡▲辺▼ 広道 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 丸山 嘉昭 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 日登 栄治 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 黒岩 健一 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 小林 裕明 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内Front page continued (72) Inventor Toshiaki Sukeda 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa, Fujitsu Limited 72) Inventor Yoshiaki Maruyama 1015 Kamiodanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture, Fujitsu Limited (72) Inventor Eiji Hito, 1015, Kamikodanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Japan Within Fujitsu Limited (72) Inventor Hiroaki Kobayashi 1015, Kamikodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Within Fujitsu Limited

Claims (19)

【特許請求の範囲】[Claims] 【請求項1】 圧着端子の当接面を相手端子に当接せし
め、該当接による電気的接続を接着剤により維持する圧
着接続において、 該相手端子(11,15) に対向する該圧着端子(6d,6e,6f,6
g,6h,6i,31,36,46,48,52)の上面には複数本の溝(17a,17
b,17c,32,33,34,35) を形成し、該複数本の溝により該
上面が複数個の該当接面(6b,31a,38a)に分割されてなる
ことを特徴とする圧着端子。
1. In a crimp connection in which an abutting surface of the crimp terminal is brought into contact with a mating terminal and an electrical connection by the contact is maintained by an adhesive, the crimp terminal (11, 15) facing the mating terminal (11, 15) is provided. 6d, 6e, 6f, 6
g, 6h, 6i, 31,36,46,48,52) has multiple grooves (17a, 17
b, 17c, 32, 33, 34, 35), and the upper surface is divided into a plurality of corresponding contact surfaces (6b, 31a, 38a) by the plurality of grooves. .
【請求項2】 金属箔よりパターン形成し該金属箔と同
じ厚さである前記圧着端子(6d,6e,31,36,46)の上面の前
記当接面(6b)が、該上面をその長さ方向に分割する第1
の溝 (17a)と該上面をその幅方向に分割する第2の溝
(17b)により形成されてなること、を特徴とする請求項
1記載の圧着端子。
2. The contact surface (6b) of the upper surface of the crimp terminal (6d, 6e, 31, 36, 46) which is patterned from a metal foil and has the same thickness as that of the metal foil has the upper surface thereof First divided in the length direction
Groove (17a) and a second groove that divides the upper surface in the width direction
It is formed by (17b), The crimp terminal of Claim 1 characterized by the above-mentioned.
【請求項3】 金属箔よりパターン形成し該金属箔と同
じ厚さである前記圧着端子(6f)の上面の前記当接面(6b)
が、該上面をその長さ方向に分割する溝(17a) により形
成されてなること、を特徴とする請求項1記載の圧着端
子。
3. The contact surface (6b) on the upper surface of the crimp terminal (6f), which is patterned from a metal foil and has the same thickness as the metal foil.
The crimp terminal according to claim 1, wherein the crimp terminal is formed by a groove (17a) that divides the upper surface in the longitudinal direction.
【請求項4】 金属箔よりパターン形成し該金属箔と同
じ厚さである前記圧着端子(6g,6h) の上面の前記当接面
(6b)が、該上面をその幅方向に分割する溝(17b) により
形成されてなること、を特徴とする請求項1記載の圧着
端子。
4. The abutting surface on the upper surface of the crimp terminal (6g, 6h), which has a pattern formed from a metal foil and has the same thickness as the metal foil.
The crimp terminal according to claim 1, wherein the (6b) is formed by a groove (17b) dividing the upper surface in the width direction.
【請求項5】 金属箔よりパターン形成し該金属箔と同
じ厚さである前記圧着端子(6i)の上面の前記当接面(6b)
が、該上面をその長さ方向に対し斜め方向に分割する溝
(17c) により形成されてなること、を特徴とする請求項
1記載の圧着端子。
5. The contact surface (6b) on the upper surface of the crimp terminal (6i), which is patterned from a metal foil and has the same thickness as the metal foil.
Is a groove that divides the upper surface in an oblique direction with respect to the length direction.
The crimp terminal according to claim 1, wherein the crimp terminal is formed of (17c).
【請求項6】 前記圧着端子(6d,6e,6f,6g,6h,6i) が配
線基板に形成した導体パターン(6) の端部に形成したも
のであること、を特徴とする請求項2または請求項3ま
たは請求項4または請求項5記載の圧着端子。
6. The crimp terminal (6d, 6e, 6f, 6g, 6h, 6i) is formed at an end of a conductor pattern (6) formed on a wiring board. Alternatively, the crimp terminal according to claim 3, claim 4, or claim 5.
【請求項7】 前記圧着端子(31,36,46,48,52)が半導体
装置(12)に形成したバンプであり、該バンプの上面が前
記溝(32,33,34,35) により分割されてなること、を特徴
とする請求項1記載の圧着端子。
7. The crimp terminal (31, 36, 46, 48, 52) is a bump formed on a semiconductor device (12), and the upper surface of the bump is divided by the groove (32, 33, 34, 35). The crimp terminal according to claim 1, wherein
【請求項8】 前記溝(17a,17b,17c,32,33,34,35) がエ
ッチング加工により形成されたものであること、を特徴
とする請求項1記載の圧着端子。
8. The crimp terminal according to claim 1, wherein the groove (17a, 17b, 17c, 32, 33, 34, 35) is formed by etching.
【請求項9】 前記溝(17a,17b,17c,32,33,34,35) が金
型を押し付ける塑性変形加工により形成されたものであ
ること、を特徴とする請求項1記載の圧着端子。
9. The crimp terminal according to claim 1, wherein the groove (17a, 17b, 17c, 32, 33, 34, 35) is formed by a plastic deformation process for pressing a die. .
【請求項10】 耐熱性絶縁フィルム(3) と耐熱性絶縁基
板(1a)との一方には請求項6記載の圧着端子(6d,6e,6f,
6g,6h,6i) を,該耐熱性絶縁フィルム(3) と該耐熱性絶
縁基板(1a)との他方には該圧着端子と接続する相手端子
(11)を形成し、接着剤(24,25) を挟んで該相手端子と該
圧着端子とを重ね、該相手端子に該圧着端子の当接面を
当接せしめ、該相手端子と該当接面とが当接した状態で
該接着剤を硬化せしめること、を特徴とする圧着端子の
接続方法。
10. The crimp terminal (6d, 6e, 6f, 6f, 6e, 6f,
6g, 6h, 6i) on the other side of the heat-resistant insulating film (3) and the heat-resistant insulating substrate (1a) with the crimp terminal
(11) is formed, the mating terminal and the crimping terminal are overlapped with the adhesive (24, 25) interposed, and the contact surface of the crimping terminal is brought into contact with the mating terminal, and the mating terminal and the corresponding contact are contacted. A method for connecting crimp terminals, characterized in that the adhesive is cured in a state in which the surfaces are in contact with each other.
【請求項11】 半導体装置(12)には請求項7記載の圧着
端子(31,36,46,48,52)を形成し、該半導体装置を実装す
る基板(14)には該圧着端子に接続する相手端子(15)を形
成し、接着剤(16)を挟んで該相手端子と該圧着端子とを
重ね、該相手端子に該圧着端子の当接面(31a,38a) を当
接させた状態で該接着剤を硬化せしめること、を特徴と
する半導体装置の実装方法。
11. A crimp terminal (31, 36, 46, 48, 52) according to claim 7 is formed on a semiconductor device (12), and the crimp terminal is provided on a substrate (14) on which the semiconductor device is mounted. The mating terminal (15) to be connected is formed, the mating terminal and the crimping terminal are overlapped with the adhesive (16) interposed, and the abutting surface (31a, 38a) of the crimping terminal is brought into contact with the mating terminal. A method for mounting a semiconductor device, wherein the adhesive is cured in a closed state.
【請求項12】 半導体装置(12)には請求項7記載の圧着
端子(31,36,46,48,52)を形成し、該半導体装置を実装す
る基板(14)には該圧着端子に接続する相手端子(15)を形
成し、該半導体装置の圧着端子形成面または該基板の相
手端子形成面には、該半導体装置を該基板に向けて押圧
したとき該圧着端子を該相手端子に当接させても該圧着
端子の形成領域まで拡がることなく、かつ、該押圧の進
行によって該圧着端子を覆うように拡がる接着剤(44)を
被着し、該接着剤が該圧着端子を覆った状態で硬化させ
ること、を特徴とする半導体装置の実装方法。
12. The semiconductor device (12) is formed with the crimp terminal (31, 36, 46, 48, 52) according to claim 7, and the board (14) on which the semiconductor device is mounted is provided with the crimp terminal. A mating terminal (15) to be connected is formed, and the crimping terminal is formed on the mating terminal forming surface of the semiconductor device or the mating terminal forming surface of the substrate when the semiconductor device is pressed toward the substrate. An adhesive (44) is applied that does not spread to the formation area of the crimp terminal even if it abuts, and that spreads so as to cover the crimp terminal due to the progress of the pressing, and the adhesive covers the crimp terminal. A method for mounting a semiconductor device, which comprises: curing in an open state.
【請求項13】 圧着端子の当接面を相手端子に当接せし
め、該当接による電気的接続を接着剤により維持する圧
着接続において、 該相手端子(11)に対向する該圧着端子(6j,6k,6l,6m) の
上面には、接着剤流入溝(17d,17f,17g) と該接着剤流入
溝が連通する接着剤貼付溝(60)とを設け、該接着剤貼付
溝に貼付し流動化させた接着剤(44)が該接着剤流入溝に
充填されてなること、を特徴とする圧着端子。
13. A crimp connection (6j, 6j, which opposes the mating terminal (11) in a crimp connection in which an abutting surface of the crimp terminal is brought into contact with the mating terminal and the electrical connection by the corresponding contact is maintained by an adhesive. 6k, 6l, 6m) is provided with an adhesive inflow groove (17d, 17f, 17g) and an adhesive sticking groove (60) communicating with the adhesive inflow groove on the upper surface of the adhesive sticking groove. A crimp terminal, characterized in that the fluidized adhesive (44) is filled in the adhesive inflow groove.
【請求項14】 圧着端子の当接面を相手端子に当接せし
め、該当接による電気的接続を接着剤により維持する圧
着接続において、 該相手端子(11)に対向する該圧着端子(6n)の上面には、
その先端面に開口し,かつ,その長さ方向に延在する接
着剤流入溝(17d) を設け、該圧着端子を形成した基板に
は該圧着端子の先端面から適当距離だけ離れ, かつ,該
圧着端子より適当に高い堤を設け、該圧着端子の先端面
と該堤との間に貼付し流動化させた接着剤(44)を該接着
剤流入溝(17d) に充填せしめ、該圧着端子と相手端子と
の電気的接続を維持させること、を特徴とする圧着端子
の接続方法。
14. The crimping terminal (6n) facing the mating terminal (11) in a crimping connection in which the contact surface of the crimping terminal is brought into contact with the mating terminal and the electrical connection by the corresponding contact is maintained by an adhesive. On the upper surface of
An adhesive inflow groove (17d) is provided which is open at the tip surface and extends in the lengthwise direction, and the board on which the crimp terminal is formed is separated from the tip surface of the crimp terminal by an appropriate distance, and An embankment that is appropriately higher than the crimp terminal is provided, and the adhesive (44) that is affixed and fluidized between the tip surface of the crimp terminal and the embankment is filled in the adhesive inflow groove (17d), and the crimp A method for connecting crimp terminals, characterized in that the electrical connection between the terminal and the mating terminal is maintained.
【請求項15】 圧着端子の当接面を相手端子に当接せし
め、該当接による電気的接続を接着剤により維持する圧
着接続において、 該圧着端子(6n)を表面に形成した基板には、該基板をそ
の厚さ方向に貫通する透孔が設けられ、該基板の裏面に
貼付した接着剤(44)を流動化させて該基板の表面に流し
込み、該圧着端子と該相手端子との電気的当接面の周囲
を接着せしめ、該電気的当接の接続を維持させること、
を特徴とする圧着端子の接続方法。
15. In a crimp connection in which an abutting surface of the crimp terminal is brought into contact with a mating terminal and the electrical connection by the contact is maintained by an adhesive, the substrate having the crimp terminal (6n) formed on the surface is: A through hole is provided through the substrate in its thickness direction, and the adhesive (44) attached to the back surface of the substrate is fluidized and poured into the surface of the substrate, and the electrical connection between the crimp terminal and the mating terminal is made. The periphery of the electrical contact surface to be adhered to maintain the connection of the electrical contact.
A method for connecting crimp terminals characterized in.
【請求項16】 請求項12記載の半導体装置の実装方法に
おいて、前記接着剤(44)が前記圧着端子(31,36,46,48,5
2)の形成領域まで拡がることなく押圧した状態で、該接
着剤を硬化反応率が30〜60%になるように硬化させた仮
接合を行い、その仮接合状態で前記相手端子に通電して
該圧着端子に対する電気的接続状態を試験したのち、該
接着剤が該圧着端子を覆うように該押圧を進行させたの
ち、該接着剤を完全硬化させること、を特徴とする半導
体装置の実装方法。
16. The method for mounting a semiconductor device according to claim 12, wherein the adhesive (44) is the crimp terminal (31, 36, 46, 48, 5).
In the state of pressing without spreading to the formation region of 2), temporary bonding is performed by curing the adhesive so that the curing reaction rate becomes 30 to 60%, and in the temporary bonding state, the mating terminal is energized. A method for mounting a semiconductor device, comprising: testing an electrical connection state to the crimp terminal, advancing the pressing so that the adhesive covers the crimp terminal, and then completely curing the adhesive. .
【請求項17】 請求項12記載の半導体装置の実装方法に
おいて、半導体装置(12)には前記圧着端子(46,48) と対
をなし, かつ、該圧着端子を前記相手端子(15)に当接さ
せたとき該相手端子との間に所定の間隙ができる高さの
補助バンプ(47,49) を配設し、該間隙の測定し該圧着端
子と相手端子との当接の良否を判断すること、を特徴と
する半導体装置の実装方法。
17. The method of mounting a semiconductor device according to claim 12, wherein the semiconductor device (12) is paired with the crimp terminal (46, 48), and the crimp terminal is used as the mating terminal (15). Auxiliary bumps (47, 49) having a height that allows a predetermined gap to be formed between the contact terminal and the mating terminal are arranged, and the gap is measured to determine whether or not the crimp terminal and the mating terminal are in contact with each other. A method for mounting a semiconductor device, comprising: determining.
【請求項18】 請求項12記載の半導体装置の実装方法に
おいて、前記圧着端子(52)と、該圧着端子より所定に低
く, かつ,硬質金属よりなる第1の補助バンプ(51)と、
該第1の補助バンプよりも低い第2の補助バンプ(50)と
を併設せしめ、前記一回目の押圧力では前記相手端子(1
5)に当接した該圧着端子の先端部を押し潰すと共に該第
1の補助バンプを該相手端子に当接せしめ、該第2の補
助バンプと該相手端子との間隙によって該圧着端子の先
端部の潰れ量を確認すること、を特徴とする半導体装置
の実装方法。
18. The method for mounting a semiconductor device according to claim 12, wherein the crimp terminal (52), a first auxiliary bump (51) which is lower than the crimp terminal by a predetermined amount, and which is made of hard metal,
A second auxiliary bump (50), which is lower than the first auxiliary bump, is placed side by side so that the mating terminal (1
5) The tip portion of the crimp terminal that is in contact with 5) is crushed and the first auxiliary bump is brought into contact with the mating terminal, and the tip of the crimp terminal is formed by the gap between the second auxiliary bump and the mating terminal. A method for mounting a semiconductor device, comprising: checking a crushed amount of a portion.
【請求項19】 請求項17記載の圧着端子(46,48) と補助
バンプ(47,49) とをまたは、請求項18記載の圧着端子(5
2)と第1の補助バンプ(51)と第2の補助バンプ(50)と
を、それぞれ千鳥状に配設し、該圧着端子と前記相手端
子との接続の高密度化を可能ならしめること、を特徴と
する半導体装置の実装方法。
19. The crimp terminal (46, 48) and the auxiliary bump (47, 49) according to claim 17, or the crimp terminal (5 according to claim 18).
2), the first auxiliary bumps (51) and the second auxiliary bumps (50) are arranged in a zigzag pattern so that the crimp terminals and the mating terminals can be connected at high density. A method for mounting a semiconductor device, comprising:
JP9472893A 1992-05-13 1993-04-22 Crimp terminal and connecting method therefor and mounting method for semiconductor device Withdrawn JPH06177214A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9472893A JPH06177214A (en) 1992-05-13 1993-04-22 Crimp terminal and connecting method therefor and mounting method for semiconductor device
US08/061,086 US5517752A (en) 1992-05-13 1993-05-13 Method of connecting a pressure-connector terminal of a device with a terminal electrode of a substrate

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP11936392 1992-05-13
JP4-119363 1992-05-13
JP4-267752 1992-10-07
JP26775292 1992-10-07
JP9472893A JPH06177214A (en) 1992-05-13 1993-04-22 Crimp terminal and connecting method therefor and mounting method for semiconductor device

Publications (1)

Publication Number Publication Date
JPH06177214A true JPH06177214A (en) 1994-06-24

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