JPH0586675B2 - - Google Patents
Info
- Publication number
- JPH0586675B2 JPH0586675B2 JP58021177A JP2117783A JPH0586675B2 JP H0586675 B2 JPH0586675 B2 JP H0586675B2 JP 58021177 A JP58021177 A JP 58021177A JP 2117783 A JP2117783 A JP 2117783A JP H0586675 B2 JPH0586675 B2 JP H0586675B2
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- insulating film
- diffusion layer
- floating gate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
Landscapes
- Non-Volatile Memory (AREA)
- Static Random-Access Memory (AREA)
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58021177A JPS59147461A (ja) | 1983-02-10 | 1983-02-10 | 半導体不揮発性メモリ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58021177A JPS59147461A (ja) | 1983-02-10 | 1983-02-10 | 半導体不揮発性メモリ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59147461A JPS59147461A (ja) | 1984-08-23 |
JPH0586675B2 true JPH0586675B2 (en, 2012) | 1993-12-13 |
Family
ID=12047647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58021177A Granted JPS59147461A (ja) | 1983-02-10 | 1983-02-10 | 半導体不揮発性メモリ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59147461A (en, 2012) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7154779B2 (en) | 2004-01-21 | 2006-12-26 | Sandisk Corporation | Non-volatile memory cell using high-k material inter-gate programming |
JP6206546B1 (ja) * | 2016-06-23 | 2017-10-04 | 株式会社明電舎 | 電界放射装置および改質処理方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52142980A (en) * | 1976-05-25 | 1977-11-29 | Toshiba Corp | Non-volatile semiconductor memory |
JPS57107076A (en) * | 1980-12-25 | 1982-07-03 | Fujitsu Ltd | Non-volatile semiconductor memory unit |
-
1983
- 1983-02-10 JP JP58021177A patent/JPS59147461A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59147461A (ja) | 1984-08-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5761126A (en) | Single-poly EPROM cell that utilizes a reduced programming voltage to program the cell | |
US6277689B1 (en) | Nonvolatile memory | |
US4173791A (en) | Insulated gate field-effect transistor read-only memory array | |
JPH0258788B2 (en, 2012) | ||
US4503519A (en) | Semiconductor non-volatile memory element of an electrically erasable type | |
US5455791A (en) | Method for erasing data in EEPROM devices on SOI substrates and device therefor | |
US6894340B2 (en) | Non-volatile semiconductor memory cell utilizing poly-edge discharge | |
JP2007511076A (ja) | ゲートによるジャンクションリーク電流を使用してフラッシュメモリをプログラミングする技術 | |
US20050247972A1 (en) | Ballistic direct injection NROM cell on strained silicon structures | |
JPH0368542B2 (en, 2012) | ||
JPS649741B2 (en, 2012) | ||
US4432075A (en) | Electrically programmable non-volatile memory | |
US4462089A (en) | Nonvolatile semiconductor memory device | |
KR20040031655A (ko) | 단일비트 비휘발성 메모리셀 및 그것의 프로그래밍 및삭제방법 | |
KR100324191B1 (ko) | 비휘발성반도체기억장치내에서의데이터소거방법 | |
US6528845B1 (en) | Non-volatile semiconductor memory cell utilizing trapped charge generated by channel-initiated secondary electron injection | |
US5019881A (en) | Nonvolatile semiconductor memory component | |
JPH0586675B2 (en, 2012) | ||
JP2928973B2 (ja) | 3重ウェルcmos構造を有するフラッシュeeprom | |
JPH01212472A (ja) | 不揮発性半導体記憶装置 | |
JPH1032272A (ja) | フラッシュメモリセルのプログラム方法 | |
JPH10223784A (ja) | フラッシュメモリセル | |
US4123771A (en) | Nonvolatile semiconductor memory | |
JP2806552B2 (ja) | 半導体不揮発性記憶装置 | |
JPS62183161A (ja) | 半導体集積回路装置 |