JPH0584867B2 - - Google Patents
Info
- Publication number
- JPH0584867B2 JPH0584867B2 JP61232885A JP23288586A JPH0584867B2 JP H0584867 B2 JPH0584867 B2 JP H0584867B2 JP 61232885 A JP61232885 A JP 61232885A JP 23288586 A JP23288586 A JP 23288586A JP H0584867 B2 JPH0584867 B2 JP H0584867B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- fluid
- resistor
- measured
- heat generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012530 fluid Substances 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000010409 thin film Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000011810 insulating material Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000009529 body temperature measurement Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P5/00—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft
- G01P5/10—Measuring speed of fluids, e.g. of air stream; Measuring speed of bodies relative to fluids, e.g. of ship, of aircraft by measuring thermal variables
Landscapes
- Engineering & Computer Science (AREA)
- Aviation & Aerospace Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Indicating Or Recording The Presence, Absence, Or Direction Of Movement (AREA)
- Measuring Volume Flow (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61232885A JPS6385364A (ja) | 1986-09-29 | 1986-09-29 | フローセンサ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61232885A JPS6385364A (ja) | 1986-09-29 | 1986-09-29 | フローセンサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6385364A JPS6385364A (ja) | 1988-04-15 |
| JPH0584867B2 true JPH0584867B2 (ru) | 1993-12-03 |
Family
ID=16946366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61232885A Granted JPS6385364A (ja) | 1986-09-29 | 1986-09-29 | フローセンサ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6385364A (ru) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04240566A (ja) * | 1991-01-24 | 1992-08-27 | Anritsu Corp | 流量方向センサ |
| JP3175887B2 (ja) | 1992-10-27 | 2001-06-11 | 株式会社半導体エネルギー研究所 | 測定装置 |
| JPH06281666A (ja) * | 1993-03-26 | 1994-10-07 | Takuwa:Kk | 流体の流向測定方法およびその測定装置 |
| DE19509555B4 (de) * | 1995-03-16 | 2006-01-19 | Robert Bosch Gmbh | Durchflußsensor |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59231417A (ja) * | 1983-05-18 | 1984-12-26 | ブロンクホルスト・ハイ−テク・ベ−・ブイ | 流体流れ測定装置 |
| JPS60131466A (ja) * | 1983-12-20 | 1985-07-13 | Toshiba Corp | 半導体流速検出器 |
-
1986
- 1986-09-29 JP JP61232885A patent/JPS6385364A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59231417A (ja) * | 1983-05-18 | 1984-12-26 | ブロンクホルスト・ハイ−テク・ベ−・ブイ | 流体流れ測定装置 |
| JPS60131466A (ja) * | 1983-12-20 | 1985-07-13 | Toshiba Corp | 半導体流速検出器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6385364A (ja) | 1988-04-15 |
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