JPH0582728B2 - - Google Patents

Info

Publication number
JPH0582728B2
JPH0582728B2 JP59227504A JP22750484A JPH0582728B2 JP H0582728 B2 JPH0582728 B2 JP H0582728B2 JP 59227504 A JP59227504 A JP 59227504A JP 22750484 A JP22750484 A JP 22750484A JP H0582728 B2 JPH0582728 B2 JP H0582728B2
Authority
JP
Japan
Prior art keywords
substrate
flatness
vacuum
holes
vacuum chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59227504A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61105841A (ja
Inventor
Mutsumi Matsuo
Hiroyuki Ooshima
Satoshi Takenaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP59227504A priority Critical patent/JPS61105841A/ja
Publication of JPS61105841A publication Critical patent/JPS61105841A/ja
Publication of JPH0582728B2 publication Critical patent/JPH0582728B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59227504A 1984-10-29 1984-10-29 露光装置及び露光方法 Granted JPS61105841A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59227504A JPS61105841A (ja) 1984-10-29 1984-10-29 露光装置及び露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59227504A JPS61105841A (ja) 1984-10-29 1984-10-29 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JPS61105841A JPS61105841A (ja) 1986-05-23
JPH0582728B2 true JPH0582728B2 (fr) 1993-11-22

Family

ID=16861927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59227504A Granted JPS61105841A (ja) 1984-10-29 1984-10-29 露光装置及び露光方法

Country Status (1)

Country Link
JP (1) JPS61105841A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2691743B2 (ja) * 1988-09-07 1997-12-17 東京エレクトロン株式会社 Ｌｃｄ基板のガス処理装置
JP2005175016A (ja) * 2003-12-08 2005-06-30 Canon Inc 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
WO2015169616A1 (fr) * 2014-05-06 2015-11-12 Asml Netherlands B.V. Support de substrat, procédé de chargement d'un substrat sur un emplacement de support de substrat, appareil lithographique et procédé de fabrication de dispositif
CN110774077B (zh) * 2019-10-21 2021-08-10 无锡芯坤电子科技有限公司 一种晶圆加工减薄机

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5867026A (ja) * 1981-10-19 1983-04-21 Hitachi Ltd ステップアンドリピート方式の露光装置
JPS5917247A (ja) * 1982-07-21 1984-01-28 Hitachi Ltd 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5867026A (ja) * 1981-10-19 1983-04-21 Hitachi Ltd ステップアンドリピート方式の露光装置
JPS5917247A (ja) * 1982-07-21 1984-01-28 Hitachi Ltd 露光装置

Also Published As

Publication number Publication date
JPS61105841A (ja) 1986-05-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term