JPH0581668B2 - - Google Patents
Info
- Publication number
- JPH0581668B2 JPH0581668B2 JP27017986A JP27017986A JPH0581668B2 JP H0581668 B2 JPH0581668 B2 JP H0581668B2 JP 27017986 A JP27017986 A JP 27017986A JP 27017986 A JP27017986 A JP 27017986A JP H0581668 B2 JPH0581668 B2 JP H0581668B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- amorphous
- alloy
- target
- amorphous alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 27
- 229910045601 alloy Inorganic materials 0.000 claims description 25
- 239000000956 alloy Substances 0.000 claims description 25
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000013076 target substance Substances 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 2
- 238000002425 crystallisation Methods 0.000 description 12
- 230000008025 crystallization Effects 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229910008423 Si—B Inorganic materials 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910008938 W—Si Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27017986A JPS63125663A (ja) | 1986-11-12 | 1986-11-12 | Ta−W系非晶質合金薄膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27017986A JPS63125663A (ja) | 1986-11-12 | 1986-11-12 | Ta−W系非晶質合金薄膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63125663A JPS63125663A (ja) | 1988-05-28 |
JPH0581668B2 true JPH0581668B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-11-15 |
Family
ID=17482623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27017986A Granted JPS63125663A (ja) | 1986-11-12 | 1986-11-12 | Ta−W系非晶質合金薄膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63125663A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01165761A (ja) * | 1987-12-22 | 1989-06-29 | Mitsui Eng & Shipbuild Co Ltd | 雰囲気中における低摩擦性、耐焼付性並びに低摩耗性部材 |
JPH084495B2 (ja) * | 1988-08-19 | 1996-01-24 | 帝人株式会社 | 接着性動物細胞の培養方法 |
EP3175017A4 (en) * | 2014-07-30 | 2018-02-21 | Hewlett-Packard Development Company, L.P. | Wear resistant coating |
JP2023117618A (ja) * | 2022-02-14 | 2023-08-24 | 東京エレクトロン株式会社 | 成膜方法及び成膜システム |
-
1986
- 1986-11-12 JP JP27017986A patent/JPS63125663A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63125663A (ja) | 1988-05-28 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |