JPH0581047B2 - - Google Patents

Info

Publication number
JPH0581047B2
JPH0581047B2 JP845086A JP845086A JPH0581047B2 JP H0581047 B2 JPH0581047 B2 JP H0581047B2 JP 845086 A JP845086 A JP 845086A JP 845086 A JP845086 A JP 845086A JP H0581047 B2 JPH0581047 B2 JP H0581047B2
Authority
JP
Japan
Prior art keywords
resist
filter
pump
air
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP845086A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62165919A (ja
Inventor
Hideo Nakatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP845086A priority Critical patent/JPS62165919A/ja
Publication of JPS62165919A publication Critical patent/JPS62165919A/ja
Publication of JPH0581047B2 publication Critical patent/JPH0581047B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP845086A 1986-01-17 1986-01-17 レジスト供給装置 Granted JPS62165919A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP845086A JPS62165919A (ja) 1986-01-17 1986-01-17 レジスト供給装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP845086A JPS62165919A (ja) 1986-01-17 1986-01-17 レジスト供給装置

Publications (2)

Publication Number Publication Date
JPS62165919A JPS62165919A (ja) 1987-07-22
JPH0581047B2 true JPH0581047B2 (xx) 1993-11-11

Family

ID=11693460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP845086A Granted JPS62165919A (ja) 1986-01-17 1986-01-17 レジスト供給装置

Country Status (1)

Country Link
JP (1) JPS62165919A (xx)

Also Published As

Publication number Publication date
JPS62165919A (ja) 1987-07-22

Similar Documents

Publication Publication Date Title
US6056208A (en) Apparatus for preventing dripping from conduit openings
JPH0581047B2 (xx)
JP2594657Y2 (ja) 充填ノズル
US5569375A (en) Apparatus for filtering liquids in a closed system
JP2007145384A (ja) オイル真空充填装置
KR100436550B1 (ko) 반도체 제조 공정에서 사용되는 약액 공급 장치
JPH07263335A (ja) 感光膜溶液塗布装置のドレイン感光膜溶液再使用システム
JPS62129178A (ja) 薬液供給装置用薬液回収装置
JP5142464B2 (ja) フォトレジスト供給装置
KR20030021691A (ko) 화학용액 내에 포함된 기포를 제거하기 위한 기포제거장치및 이를 이용한 기포제거방법
JP2009029448A (ja) 充填装置
KR200184788Y1 (ko) 반도체 웨이퍼 현상장치
JP2005019272A (ja) 制御弁式鉛蓄電池の安全弁室の洗浄方法及び洗浄装置
KR20000008432A (ko) 포토레지스트 공급 시스템
JP4406105B2 (ja) 給液方法および給液装置
US6979427B2 (en) Apparatus for preparing solution
JPH0159191B2 (xx)
JP3283190B2 (ja) レジスト処理装置及びレジスト処理方法
JPS5993595A (ja) オイル注入装置
JP2000237929A (ja) 逆流洗浄機能を具備した濾過装置
KR0126398Y1 (ko) 브라운관 세척시 사용되는 불산액 공급장치의 자동농도조절장치
KR100194289B1 (ko) 화학약품의 순환장치
JPH068297U (ja) 窒素シール槽用水封装置
JPH0851065A (ja) フォトレジスト用脱気装置
JPS6241048B2 (xx)