JPH0581046B2 - - Google Patents

Info

Publication number
JPH0581046B2
JPH0581046B2 JP60291442A JP29144285A JPH0581046B2 JP H0581046 B2 JPH0581046 B2 JP H0581046B2 JP 60291442 A JP60291442 A JP 60291442A JP 29144285 A JP29144285 A JP 29144285A JP H0581046 B2 JPH0581046 B2 JP H0581046B2
Authority
JP
Japan
Prior art keywords
axis
interferometer
stage
reticle
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60291442A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62150721A (ja
Inventor
Yukio Kakizaki
Nobutaka Umagome
Susumu Mori
Yutaka Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP60291442A priority Critical patent/JPS62150721A/ja
Publication of JPS62150721A publication Critical patent/JPS62150721A/ja
Publication of JPH0581046B2 publication Critical patent/JPH0581046B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60291442A 1985-12-24 1985-12-24 投影型露光装置 Granted JPS62150721A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60291442A JPS62150721A (ja) 1985-12-24 1985-12-24 投影型露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60291442A JPS62150721A (ja) 1985-12-24 1985-12-24 投影型露光装置

Publications (2)

Publication Number Publication Date
JPS62150721A JPS62150721A (ja) 1987-07-04
JPH0581046B2 true JPH0581046B2 (OSRAM) 1993-11-11

Family

ID=17768919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60291442A Granted JPS62150721A (ja) 1985-12-24 1985-12-24 投影型露光装置

Country Status (1)

Country Link
JP (1) JPS62150721A (OSRAM)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2679186B2 (ja) * 1988-12-05 1997-11-19 株式会社ニコン 露光装置
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
JP3412704B2 (ja) 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JP3339630B2 (ja) * 1993-04-02 2002-10-28 株式会社ニコン 走査型露光装置
USRE38113E1 (en) 1993-04-02 2003-05-06 Nikon Corporation Method of driving mask stage and method of mask alignment
JP3305058B2 (ja) * 1993-09-13 2002-07-22 株式会社ニコン 露光方法及び装置
JP3600881B2 (ja) * 1993-12-27 2004-12-15 株式会社ニコン 干渉計及びステージ装置
JP3318440B2 (ja) * 1994-06-22 2002-08-26 富士通株式会社 ステージ原点位置決定方法及び装置並びにステージ位置検出器原点決定方法及び装置
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
KR970062820A (ko) * 1996-02-28 1997-09-12 고노 시게오 투영노광장치
JPH1050604A (ja) * 1996-04-04 1998-02-20 Nikon Corp 位置管理方法及び位置合わせ方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5021232A (OSRAM) * 1973-06-28 1975-03-06
JPS5239364A (en) * 1975-09-25 1977-03-26 Hitachi Ltd Apparatus for printing pattern for shadow mask on dry plate

Also Published As

Publication number Publication date
JPS62150721A (ja) 1987-07-04

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees