JPH0580811B2 - - Google Patents

Info

Publication number
JPH0580811B2
JPH0580811B2 JP60103963A JP10396385A JPH0580811B2 JP H0580811 B2 JPH0580811 B2 JP H0580811B2 JP 60103963 A JP60103963 A JP 60103963A JP 10396385 A JP10396385 A JP 10396385A JP H0580811 B2 JPH0580811 B2 JP H0580811B2
Authority
JP
Japan
Prior art keywords
scanning
pattern
photosensitive substrate
key
drawing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60103963A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61263222A (ja
Inventor
Makoto Torigoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60103963A priority Critical patent/JPS61263222A/ja
Publication of JPS61263222A publication Critical patent/JPS61263222A/ja
Publication of JPH0580811B2 publication Critical patent/JPH0580811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60103963A 1985-05-17 1985-05-17 走査型描画装置 Granted JPS61263222A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60103963A JPS61263222A (ja) 1985-05-17 1985-05-17 走査型描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60103963A JPS61263222A (ja) 1985-05-17 1985-05-17 走査型描画装置

Publications (2)

Publication Number Publication Date
JPS61263222A JPS61263222A (ja) 1986-11-21
JPH0580811B2 true JPH0580811B2 (enExample) 1993-11-10

Family

ID=14368027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60103963A Granted JPS61263222A (ja) 1985-05-17 1985-05-17 走査型描画装置

Country Status (1)

Country Link
JP (1) JPS61263222A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1048835A (ja) * 1996-08-06 1998-02-20 Ibiden Co Ltd プリント配線板の製造装置及び製造方法
JP6743884B2 (ja) 2016-03-30 2020-08-19 株式会社ニコン パターン描画装置、パターン描画方法

Also Published As

Publication number Publication date
JPS61263222A (ja) 1986-11-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term