JPH0580555B2 - - Google Patents
Info
- Publication number
- JPH0580555B2 JPH0580555B2 JP61191232A JP19123286A JPH0580555B2 JP H0580555 B2 JPH0580555 B2 JP H0580555B2 JP 61191232 A JP61191232 A JP 61191232A JP 19123286 A JP19123286 A JP 19123286A JP H0580555 B2 JPH0580555 B2 JP H0580555B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- plasma
- substrate
- thin film
- ion plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 16
- 238000001704 evaporation Methods 0.000 claims description 12
- 238000007733 ion plating Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 11
- 239000010408 film Substances 0.000 description 32
- 239000010409 thin film Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19123286A JPS6347362A (ja) | 1986-08-15 | 1986-08-15 | イオンプレ−テイング装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19123286A JPS6347362A (ja) | 1986-08-15 | 1986-08-15 | イオンプレ−テイング装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6347362A JPS6347362A (ja) | 1988-02-29 |
JPH0580555B2 true JPH0580555B2 (zh) | 1993-11-09 |
Family
ID=16271097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19123286A Granted JPS6347362A (ja) | 1986-08-15 | 1986-08-15 | イオンプレ−テイング装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6347362A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999016924A1 (fr) * | 1996-03-25 | 1999-04-08 | Sumitomo Heavy Industries, Ltd. | Appareil de plaquage ionique |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6160350A (en) * | 1996-03-25 | 2000-12-12 | Sumitomo Heavy Industries, Ltd. | Ion plating apparatus |
JP6054249B2 (ja) * | 2013-05-27 | 2016-12-27 | 住友重機械工業株式会社 | 成膜装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS512017A (zh) * | 1974-05-28 | 1976-01-09 | Anthony Mfg Corp | |
JPS5520792A (en) * | 1978-07-29 | 1980-02-14 | Beecham Group Ltd | Clavaranic acid derivative*its manufacture and composition |
JPS5873770A (ja) * | 1981-10-28 | 1983-05-04 | Joshin Uramoto | 磁石とコイルの磁場を利用した高能率イオンプレ−テング装置 |
JPS60110872A (ja) * | 1983-11-21 | 1985-06-17 | Sumitomo Electric Ind Ltd | イオンプレ−テイング法 |
JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
-
1986
- 1986-08-15 JP JP19123286A patent/JPS6347362A/ja active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS512017A (zh) * | 1974-05-28 | 1976-01-09 | Anthony Mfg Corp | |
JPS5520792A (en) * | 1978-07-29 | 1980-02-14 | Beecham Group Ltd | Clavaranic acid derivative*its manufacture and composition |
JPS5873770A (ja) * | 1981-10-28 | 1983-05-04 | Joshin Uramoto | 磁石とコイルの磁場を利用した高能率イオンプレ−テング装置 |
JPS60110872A (ja) * | 1983-11-21 | 1985-06-17 | Sumitomo Electric Ind Ltd | イオンプレ−テイング法 |
JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999016924A1 (fr) * | 1996-03-25 | 1999-04-08 | Sumitomo Heavy Industries, Ltd. | Appareil de plaquage ionique |
Also Published As
Publication number | Publication date |
---|---|
JPS6347362A (ja) | 1988-02-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |