JPH0580245B2 - - Google Patents

Info

Publication number
JPH0580245B2
JPH0580245B2 JP13163086A JP13163086A JPH0580245B2 JP H0580245 B2 JPH0580245 B2 JP H0580245B2 JP 13163086 A JP13163086 A JP 13163086A JP 13163086 A JP13163086 A JP 13163086A JP H0580245 B2 JPH0580245 B2 JP H0580245B2
Authority
JP
Japan
Prior art keywords
laser
silicon
sif
solid product
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP13163086A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62289224A (ja
Inventor
Shigeyoshi Arai
Masatsugu Kamioka
Shohei Isomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP13163086A priority Critical patent/JPS62289224A/ja
Publication of JPS62289224A publication Critical patent/JPS62289224A/ja
Publication of JPH0580245B2 publication Critical patent/JPH0580245B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/121—Coherent waves, e.g. laser beams

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
JP13163086A 1986-06-06 1986-06-06 レ−ザ−を用いたシリコンを主成分とする固体生成物の製造法 Granted JPS62289224A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13163086A JPS62289224A (ja) 1986-06-06 1986-06-06 レ−ザ−を用いたシリコンを主成分とする固体生成物の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13163086A JPS62289224A (ja) 1986-06-06 1986-06-06 レ−ザ−を用いたシリコンを主成分とする固体生成物の製造法

Publications (2)

Publication Number Publication Date
JPS62289224A JPS62289224A (ja) 1987-12-16
JPH0580245B2 true JPH0580245B2 (enrdf_load_stackoverflow) 1993-11-08

Family

ID=15062539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13163086A Granted JPS62289224A (ja) 1986-06-06 1986-06-06 レ−ザ−を用いたシリコンを主成分とする固体生成物の製造法

Country Status (1)

Country Link
JP (1) JPS62289224A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3021937U (ja) * 1995-05-09 1996-03-12 日泉化学株式会社 育苗用筒

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3590048B1 (ja) * 2003-09-30 2004-11-17 川崎重工業株式会社 同位体分離法および同位体分離用作業物質
RU2500618C2 (ru) * 2008-05-27 2013-12-10 Спонт Прайват С.А.Р.Л. Галогенидсодержащий кремний, способ его получения и его применение
DE102008036143A1 (de) 2008-08-01 2010-02-04 Berlinsolar Gmbh Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3021937U (ja) * 1995-05-09 1996-03-12 日泉化学株式会社 育苗用筒

Also Published As

Publication number Publication date
JPS62289224A (ja) 1987-12-16

Similar Documents

Publication Publication Date Title
Herman Laser-assisted deposition of thin films from gas-phase and surface-adsorbed molecules
Kamioka et al. Isotope-selective infrared multiple photon decomposition of hexafluorodisilane
JPH0580245B2 (enrdf_load_stackoverflow)
Hashimoto et al. Infrared spectroscopic detection of the HOSO2 radical in argon matrix at 11 K
Yabushita et al. Hydrogen peroxide formation following the vacuum ultraviolet photodissociation of water ice films at 90K
US4604274A (en) Photochemical process for the preparation of disilane
Pola et al. Excimer laser photolysis of hexamethyldisilazane
JPH0351675B2 (enrdf_load_stackoverflow)
JPS61224318A (ja) 気相薄膜形成装置及び方法
JPS60190566A (ja) 窒化珪素作製方法
Hama et al. Role of OH radicals in the formation of oxygen molecules following vacuum ultraviolet photodissociation of amorphous solid water
JPS60128264A (ja) 薄膜形成方法
JPS6187342A (ja) 多重ビ−ム照射Ｓｉ窒化法
Hess IR and UV laser-induced chemical vapor deposition: Chemical mechanism for a-Si: H and Cr (O, C) film formation
JPS5642350A (en) Formation of insulating film
JPS62254420A (ja) 水素化非晶質シリコン・炭素膜の製造方法
JPS61119028A (ja) 光化学気相成長装置
JPH04116171A (ja) 非晶質シリコン薄膜形成方法
JPH03225827A (ja) 絶縁膜の製造方法
JPS6365077A (ja) レ−ザｃｖｄ装置
Donnelly et al. Excimer Laser-Induced Deposition of InP and Indium-Oxide Films
Friedrich et al. Photodecomposition of 1, 2-difluoro-1, 2-di-iodoethene: formation of 1, 2-difluoroethyne
JP2754274B2 (ja) ダイヤモンド膜の製造方法及び製造装置
JPS6118122A (ja) 半導体製造装置
Yoshihara et al. BCSJ Award article'

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees