JPH0577179B2 - - Google Patents
Info
- Publication number
- JPH0577179B2 JPH0577179B2 JP60008953A JP895385A JPH0577179B2 JP H0577179 B2 JPH0577179 B2 JP H0577179B2 JP 60008953 A JP60008953 A JP 60008953A JP 895385 A JP895385 A JP 895385A JP H0577179 B2 JPH0577179 B2 JP H0577179B2
- Authority
- JP
- Japan
- Prior art keywords
- thickness
- flatness
- sample
- wafer
- station
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000523 sample Substances 0.000 claims description 66
- 238000005259 measurement Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 230000004044 response Effects 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 93
- 239000011159 matrix material Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000003750 conditioning effect Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 238000012512 characterization method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000003913 materials processing Methods 0.000 description 2
- 238000003908 quality control method Methods 0.000 description 2
- 238000013480 data collection Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000819 phase cycle Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/60—Other road transportation technologies with climate change mitigation effect
- Y02T10/62—Hybrid vehicles
Landscapes
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US57269584A | 1984-01-20 | 1984-01-20 | |
US572695 | 1984-01-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60170241A JPS60170241A (ja) | 1985-09-03 |
JPH0577179B2 true JPH0577179B2 (enrdf_load_stackoverflow) | 1993-10-26 |
Family
ID=24288957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60008953A Granted JPS60170241A (ja) | 1984-01-20 | 1985-01-21 | 平坦度ステーション及び平坦度を求める方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60170241A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19826319B4 (de) * | 1997-06-11 | 2011-08-11 | Kuroda Precision Industries Ltd., Kanagawa | Optische Vorrichtungen zur Messung von Profilen eines Wafers |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6233533B1 (en) * | 1998-06-04 | 2001-05-15 | Performance Friction Corporation | Turning center with integrated non-contact inspection system |
-
1985
- 1985-01-21 JP JP60008953A patent/JPS60170241A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19826319B4 (de) * | 1997-06-11 | 2011-08-11 | Kuroda Precision Industries Ltd., Kanagawa | Optische Vorrichtungen zur Messung von Profilen eines Wafers |
Also Published As
Publication number | Publication date |
---|---|
JPS60170241A (ja) | 1985-09-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |