JPH0577067B2 - - Google Patents

Info

Publication number
JPH0577067B2
JPH0577067B2 JP61214842A JP21484286A JPH0577067B2 JP H0577067 B2 JPH0577067 B2 JP H0577067B2 JP 61214842 A JP61214842 A JP 61214842A JP 21484286 A JP21484286 A JP 21484286A JP H0577067 B2 JPH0577067 B2 JP H0577067B2
Authority
JP
Japan
Prior art keywords
block copolymer
photosensitive
block
polymer
double bond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61214842A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6370241A (ja
Inventor
Hiroto Kidokoro
Hideyoshi Sakurai
Mitsuhiro Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP21484286A priority Critical patent/JPS6370241A/ja
Priority to GB8719421A priority patent/GB2195349B/en
Priority to DE3727537A priority patent/DE3727537C2/de
Publication of JPS6370241A publication Critical patent/JPS6370241A/ja
Priority to US07/192,641 priority patent/US4980269A/en
Priority to US08/064,482 priority patent/US5281510A/en
Publication of JPH0577067B2 publication Critical patent/JPH0577067B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/048—Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP21484286A 1986-08-18 1986-09-11 感光性エラストマ−組成物 Granted JPS6370241A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP21484286A JPS6370241A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物
GB8719421A GB2195349B (en) 1986-08-18 1987-08-17 Photosensitive elastomeric composition
DE3727537A DE3727537C2 (de) 1986-08-18 1987-08-18 Photoempfindliche elastomere Masse
US07/192,641 US4980269A (en) 1986-08-18 1988-05-11 Photosensitive elastomeric composition
US08/064,482 US5281510A (en) 1986-08-18 1992-12-30 Photosensitive elastomeric composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21484286A JPS6370241A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物

Publications (2)

Publication Number Publication Date
JPS6370241A JPS6370241A (ja) 1988-03-30
JPH0577067B2 true JPH0577067B2 (enrdf_load_stackoverflow) 1993-10-25

Family

ID=16662445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21484286A Granted JPS6370241A (ja) 1986-08-18 1986-09-11 感光性エラストマ−組成物

Country Status (1)

Country Link
JP (1) JPS6370241A (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024460B2 (ja) * 1975-09-25 1985-06-13 日本曹達株式会社 感光材料
JPS5240594A (en) * 1975-09-29 1977-03-29 Nippon Soda Co Ltd Preparation of photosensitive polymers
JPS5922219B2 (ja) * 1980-07-07 1984-05-25 東京応化工業株式会社 フレキソ印刷版用感光性樹脂組成物

Also Published As

Publication number Publication date
JPS6370241A (ja) 1988-03-30

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