JPH059017B2 - - Google Patents

Info

Publication number
JPH059017B2
JPH059017B2 JP61214843A JP21484386A JPH059017B2 JP H059017 B2 JPH059017 B2 JP H059017B2 JP 61214843 A JP61214843 A JP 61214843A JP 21484386 A JP21484386 A JP 21484386A JP H059017 B2 JPH059017 B2 JP H059017B2
Authority
JP
Japan
Prior art keywords
photosensitive
block copolymer
elastomeric
present
elastomer composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61214843A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6370242A (ja
Inventor
Hiroto Kidokoro
Hideyoshi Sakurai
Mitsuhiro Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP21484386A priority Critical patent/JPS6370242A/ja
Publication of JPS6370242A publication Critical patent/JPS6370242A/ja
Publication of JPH059017B2 publication Critical patent/JPH059017B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP21484386A 1986-09-11 1986-09-11 感光性エラストマ−組成物 Granted JPS6370242A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21484386A JPS6370242A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21484386A JPS6370242A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物

Publications (2)

Publication Number Publication Date
JPS6370242A JPS6370242A (ja) 1988-03-30
JPH059017B2 true JPH059017B2 (enrdf_load_stackoverflow) 1993-02-03

Family

ID=16662462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21484386A Granted JPS6370242A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物

Country Status (1)

Country Link
JP (1) JPS6370242A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2681537B2 (ja) * 1990-09-14 1997-11-26 東京応化工業 株式会社 感光性樹脂組成物
DE69225277T2 (de) * 1991-02-15 1998-12-24 Asahi Kasei Kogyo K.K., Osaka Lichtempfindliche Elastomerzusammensetzung
US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
JP3510393B2 (ja) * 1994-08-10 2004-03-29 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー 光硬化性エラストマー組成物から得られるフレキソグラフ印刷プレート
JP4230085B2 (ja) * 2000-03-16 2009-02-25 旭化成ケミカルズ株式会社 改良されたフレキソ印刷版用感光性構成体
JP4675334B2 (ja) 2004-11-11 2011-04-20 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
JP4868920B2 (ja) * 2006-04-07 2012-02-01 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物

Also Published As

Publication number Publication date
JPS6370242A (ja) 1988-03-30

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