JPS6370241A - 感光性エラストマ−組成物 - Google Patents

感光性エラストマ−組成物

Info

Publication number
JPS6370241A
JPS6370241A JP21484286A JP21484286A JPS6370241A JP S6370241 A JPS6370241 A JP S6370241A JP 21484286 A JP21484286 A JP 21484286A JP 21484286 A JP21484286 A JP 21484286A JP S6370241 A JPS6370241 A JP S6370241A
Authority
JP
Japan
Prior art keywords
photosensitive
compsn
block
block copolymer
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21484286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0577067B2 (enrdf_load_stackoverflow
Inventor
Hiroto Kidokoro
広人 木所
Hideyoshi Sakurai
桜井　英嘉
Mitsuhiro Tamura
光宏 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP21484286A priority Critical patent/JPS6370241A/ja
Priority to GB8719421A priority patent/GB2195349B/en
Priority to DE3727537A priority patent/DE3727537C2/de
Publication of JPS6370241A publication Critical patent/JPS6370241A/ja
Priority to US07/192,641 priority patent/US4980269A/en
Priority to US08/064,482 priority patent/US5281510A/en
Publication of JPH0577067B2 publication Critical patent/JPH0577067B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/048—Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP21484286A 1986-08-18 1986-09-11 感光性エラストマ−組成物 Granted JPS6370241A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP21484286A JPS6370241A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物
GB8719421A GB2195349B (en) 1986-08-18 1987-08-17 Photosensitive elastomeric composition
DE3727537A DE3727537C2 (de) 1986-08-18 1987-08-18 Photoempfindliche elastomere Masse
US07/192,641 US4980269A (en) 1986-08-18 1988-05-11 Photosensitive elastomeric composition
US08/064,482 US5281510A (en) 1986-08-18 1992-12-30 Photosensitive elastomeric composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21484286A JPS6370241A (ja) 1986-09-11 1986-09-11 感光性エラストマ−組成物

Publications (2)

Publication Number Publication Date
JPS6370241A true JPS6370241A (ja) 1988-03-30
JPH0577067B2 JPH0577067B2 (enrdf_load_stackoverflow) 1993-10-25

Family

ID=16662445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21484286A Granted JPS6370241A (ja) 1986-08-18 1986-09-11 感光性エラストマ−組成物

Country Status (1)

Country Link
JP (1) JPS6370241A (enrdf_load_stackoverflow)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5239742A (en) * 1975-09-25 1977-03-28 Nippon Soda Co Ltd Sensitized materials
JPS5240594A (en) * 1975-09-29 1977-03-29 Nippon Soda Co Ltd Preparation of photosensitive polymers
JPS5659230A (en) * 1980-07-07 1981-05-22 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for flexographic plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5239742A (en) * 1975-09-25 1977-03-28 Nippon Soda Co Ltd Sensitized materials
JPS5240594A (en) * 1975-09-29 1977-03-29 Nippon Soda Co Ltd Preparation of photosensitive polymers
JPS5659230A (en) * 1980-07-07 1981-05-22 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for flexographic plate

Also Published As

Publication number Publication date
JPH0577067B2 (enrdf_load_stackoverflow) 1993-10-25

Similar Documents

Publication Publication Date Title
JP3157295B2 (ja) フレキソグラフイツク印刷用プレートのための感光性エラストマー系ポリマー組成物
EP0699961B1 (en) Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate
JPS607261B2 (ja) 感光性エラストマ−組成物
EP1676173B1 (en) Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
KR100753261B1 (ko) 광경화성 조성물 및 이를 함유하는 플렉소그래피 인쇄판
JPH0495960A (ja) 感光性フレキソ印刷版組成物
WO1992015046A1 (fr) Composition elastomere photosensible
JPS606941A (ja) 印刷版の製造法
JP2000155418A (ja) 感光性エラストマー組成物
JPS5922219B2 (ja) フレキソ印刷版用感光性樹脂組成物
US7785765B2 (en) Photosensitive resin composition
US4980269A (en) Photosensitive elastomeric composition
GB2064151A (en) Photopolymerisable composition
JP3144870B2 (ja) 感光性エラストマー組成物
JP2025037999A (ja) フレキソ印刷用感光性樹脂組成物
JPH059017B2 (enrdf_load_stackoverflow)
JPS5950971B2 (ja) 硬化性組成物
JP7105240B2 (ja) 耐摩耗性に優れた感光性印刷版材用ブロック共重合体及びその製造方法
US5281510A (en) Photosensitive elastomeric composition
JPS6370241A (ja) 感光性エラストマ−組成物
WO2019188604A1 (ja) フレキソ版用ブロック共重合体組成物
JPH0541979B2 (enrdf_load_stackoverflow)
JPS62138845A (ja) 感光性エラストマ−組成物
JPS6375740A (ja) 感光性ゴム組成物
JPS62231248A (ja) 感光性エラストマ−組成物