JPH0573326B2 - - Google Patents

Info

Publication number
JPH0573326B2
JPH0573326B2 JP62253556A JP25355687A JPH0573326B2 JP H0573326 B2 JPH0573326 B2 JP H0573326B2 JP 62253556 A JP62253556 A JP 62253556A JP 25355687 A JP25355687 A JP 25355687A JP H0573326 B2 JPH0573326 B2 JP H0573326B2
Authority
JP
Japan
Prior art keywords
reactor
time
heating
vapor phase
phase growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62253556A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63126216A (ja
Inventor
Hitoshi Ehata
Juji Matsunaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP25355687A priority Critical patent/JPS63126216A/ja
Publication of JPS63126216A publication Critical patent/JPS63126216A/ja
Publication of JPH0573326B2 publication Critical patent/JPH0573326B2/ja
Granted legal-status Critical Current

Links

JP25355687A 1987-10-09 1987-10-09 半導体気相成長装置 Granted JPS63126216A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25355687A JPS63126216A (ja) 1987-10-09 1987-10-09 半導体気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25355687A JPS63126216A (ja) 1987-10-09 1987-10-09 半導体気相成長装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57011997A Division JPS58128728A (ja) 1982-01-28 1982-01-28 半導体気相成長装置

Publications (2)

Publication Number Publication Date
JPS63126216A JPS63126216A (ja) 1988-05-30
JPH0573326B2 true JPH0573326B2 (OSRAM) 1993-10-14

Family

ID=17253008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25355687A Granted JPS63126216A (ja) 1987-10-09 1987-10-09 半導体気相成長装置

Country Status (1)

Country Link
JP (1) JPS63126216A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03164498A (ja) * 1989-11-22 1991-07-16 Nec Corp 半導体気相成長装置の制御方式
JP2003068650A (ja) * 2001-08-23 2003-03-07 Toshiba Mach Co Ltd 気相成長装置の運転方法
JP5283352B2 (ja) * 2007-06-26 2013-09-04 大日本スクリーン製造株式会社 基板処理装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID STATE TECHNOLOGY=1972 *

Also Published As

Publication number Publication date
JPS63126216A (ja) 1988-05-30

Similar Documents

Publication Publication Date Title
JPS6328495B2 (OSRAM)
JP4464979B2 (ja) 処理システム、処理方法、及び、プログラム
US7625609B2 (en) Formation of silicon nitride film
EP1548809B1 (en) Heat treatment method and heat treatment apparatus
JP5049303B2 (ja) 熱処理装置、熱処理装置の温度調整方法、及び、プログラム
JP5766647B2 (ja) 熱処理システム、熱処理方法、及び、プログラム
US20090078197A1 (en) Substrate processing system, control method for substrate processing apparatus and program
JP6541599B2 (ja) 制御装置、基板処理システム、基板処理方法及びプログラム
TWI411039B (zh) 氣體供應系統、氣體供應方法、薄膜形成裝置之清潔方法、薄膜形成方法及薄膜形成裝置
KR100882633B1 (ko) 열처리 장치, 열처리 방법, 제어 장치 및 프로그램을 기록한 컴퓨터 판독 가능한 기록 매체
JP5049302B2 (ja) 熱処理装置、熱処理装置の温度調整方法、及び、プログラム
US4982693A (en) Semiconductor vapor phase growing apparatus
JPH0573326B2 (OSRAM)
KR20130111388A (ko) 열처리 시스템, 열처리 방법 및 기록 매체
JP2022134502A (ja) 表示方法、制御装置
KR20240073974A (ko) 멀티-스테이션 프로세싱 챔버 컴포넌트들의 선택적인 제어
EP0085397B1 (en) Semiconductor vapor phase growing apparatus
TW202227661A (zh) 基板處理裝置、半導體裝置之製造方法、基板處理方法及程式
US20040261704A1 (en) Method and device for monitoring a CVD-process
JPS63126215A (ja) 半導体気相成長装置
JPH02125421A (ja) 熱処理装置
JPH0570299B2 (OSRAM)
JP2005516119A (ja) パルス状ガスフローcvdによるタングステン堆積プロセス
JPH0570298B2 (OSRAM)
KR19990039171A (ko) 질소화 시스템 및 질소화 공정