JPH0570299B2 - - Google Patents

Info

Publication number
JPH0570299B2
JPH0570299B2 JP58184954A JP18495483A JPH0570299B2 JP H0570299 B2 JPH0570299 B2 JP H0570299B2 JP 58184954 A JP58184954 A JP 58184954A JP 18495483 A JP18495483 A JP 18495483A JP H0570299 B2 JPH0570299 B2 JP H0570299B2
Authority
JP
Japan
Prior art keywords
vapor phase
phase growth
data
batch
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58184954A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6077415A (ja
Inventor
Hitoshi Ehata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP18495483A priority Critical patent/JPS6077415A/ja
Publication of JPS6077415A publication Critical patent/JPS6077415A/ja
Priority to US06/873,119 priority patent/US4772485A/en
Priority to US07/418,724 priority patent/US5244500A/en
Publication of JPH0570299B2 publication Critical patent/JPH0570299B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Feedback Control In General (AREA)
JP18495483A 1983-10-05 1983-10-05 半導体気相成長装置のプロセス制御装置 Granted JPS6077415A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP18495483A JPS6077415A (ja) 1983-10-05 1983-10-05 半導体気相成長装置のプロセス制御装置
US06/873,119 US4772485A (en) 1983-10-05 1986-06-10 Process control system of semiconductor vapor phase growing apparatus
US07/418,724 US5244500A (en) 1983-10-05 1989-10-03 Process control system of semiconductor vapor phase growth apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18495483A JPS6077415A (ja) 1983-10-05 1983-10-05 半導体気相成長装置のプロセス制御装置

Publications (2)

Publication Number Publication Date
JPS6077415A JPS6077415A (ja) 1985-05-02
JPH0570299B2 true JPH0570299B2 (OSRAM) 1993-10-04

Family

ID=16162251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18495483A Granted JPS6077415A (ja) 1983-10-05 1983-10-05 半導体気相成長装置のプロセス制御装置

Country Status (1)

Country Link
JP (1) JPS6077415A (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2501444B2 (ja) * 1987-03-19 1996-05-29 東京エレクトロン株式会社 アツシング装置
JP2544666B2 (ja) * 1989-09-21 1996-10-16 ウシオ電機株式会社 ウエハ周辺露光方法
JPH04125947A (ja) * 1990-09-17 1992-04-27 Fujitsu Ltd 成膜システムのフィードバック装置
JP7521494B2 (ja) * 2021-06-18 2024-07-24 株式会社Sumco 枚葉式エピタキシャル成長装置の制御装置及び制御方法、並びにエピタキシャルウェーハの製造システム

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID STATE TECHNOLOGY=1972 *

Also Published As

Publication number Publication date
JPS6077415A (ja) 1985-05-02

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