JPH0568692B2 - - Google Patents

Info

Publication number
JPH0568692B2
JPH0568692B2 JP59182587A JP18258784A JPH0568692B2 JP H0568692 B2 JPH0568692 B2 JP H0568692B2 JP 59182587 A JP59182587 A JP 59182587A JP 18258784 A JP18258784 A JP 18258784A JP H0568692 B2 JPH0568692 B2 JP H0568692B2
Authority
JP
Japan
Prior art keywords
resist
pattern
forming
acid ester
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59182587A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161152A (ja
Inventor
Yoshio Yamashita
Takaharu Kawazu
Takateru Asano
Kenji Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Original Assignee
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Oki Electric Industry Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP59182587A priority Critical patent/JPS6161152A/ja
Publication of JPS6161152A publication Critical patent/JPS6161152A/ja
Publication of JPH0568692B2 publication Critical patent/JPH0568692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59182587A 1984-09-03 1984-09-03 ネガ型レジストのパタ−ン形成方法 Granted JPS6161152A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59182587A JPS6161152A (ja) 1984-09-03 1984-09-03 ネガ型レジストのパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59182587A JPS6161152A (ja) 1984-09-03 1984-09-03 ネガ型レジストのパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6161152A JPS6161152A (ja) 1986-03-28
JPH0568692B2 true JPH0568692B2 (Direct) 1993-09-29

Family

ID=16120891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59182587A Granted JPS6161152A (ja) 1984-09-03 1984-09-03 ネガ型レジストのパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6161152A (Direct)

Also Published As

Publication number Publication date
JPS6161152A (ja) 1986-03-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term