JPH0568094B2 - - Google Patents

Info

Publication number
JPH0568094B2
JPH0568094B2 JP1315618A JP31561889A JPH0568094B2 JP H0568094 B2 JPH0568094 B2 JP H0568094B2 JP 1315618 A JP1315618 A JP 1315618A JP 31561889 A JP31561889 A JP 31561889A JP H0568094 B2 JPH0568094 B2 JP H0568094B2
Authority
JP
Japan
Prior art keywords
substrate
cup
spin chuck
processing liquid
airflow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1315618A
Other languages
English (en)
Japanese (ja)
Other versions
JPH03175617A (ja
Inventor
Hiroshi Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP1315618A priority Critical patent/JPH03175617A/ja
Publication of JPH03175617A publication Critical patent/JPH03175617A/ja
Publication of JPH0568094B2 publication Critical patent/JPH0568094B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1315618A 1989-12-04 1989-12-04 基板の回転式表面処理装置 Granted JPH03175617A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1315618A JPH03175617A (ja) 1989-12-04 1989-12-04 基板の回転式表面処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1315618A JPH03175617A (ja) 1989-12-04 1989-12-04 基板の回転式表面処理装置

Publications (2)

Publication Number Publication Date
JPH03175617A JPH03175617A (ja) 1991-07-30
JPH0568094B2 true JPH0568094B2 (Sortimente) 1993-09-28

Family

ID=18067532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1315618A Granted JPH03175617A (ja) 1989-12-04 1989-12-04 基板の回転式表面処理装置

Country Status (1)

Country Link
JP (1) JPH03175617A (Sortimente)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05109612A (ja) * 1991-10-18 1993-04-30 Fujitsu Ltd レジスト塗布装置
US7030039B2 (en) 1994-10-27 2006-04-18 Asml Holding N.V. Method of uniformly coating a substrate
US7018943B2 (en) 1994-10-27 2006-03-28 Asml Holding N.V. Method of uniformly coating a substrate
US6977098B2 (en) 1994-10-27 2005-12-20 Asml Holding N.V. Method of uniformly coating a substrate
JPH0945611A (ja) * 1995-07-27 1997-02-14 Dainippon Screen Mfg Co Ltd 回転式基板塗布装置
JP5802444B2 (ja) * 2011-06-15 2015-10-28 東京応化工業株式会社 塗布装置及び塗布方法
JP6543534B2 (ja) 2015-08-26 2019-07-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Also Published As

Publication number Publication date
JPH03175617A (ja) 1991-07-30

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